JPH0460436A - Melting method of sample for analysis of inclusion - Google Patents
Melting method of sample for analysis of inclusionInfo
- Publication number
- JPH0460436A JPH0460436A JP17047390A JP17047390A JPH0460436A JP H0460436 A JPH0460436 A JP H0460436A JP 17047390 A JP17047390 A JP 17047390A JP 17047390 A JP17047390 A JP 17047390A JP H0460436 A JPH0460436 A JP H0460436A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- electron beam
- dimensionally
- melted
- scan
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002844 melting Methods 0.000 title claims abstract description 14
- 230000008018 melting Effects 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims description 9
- 238000010894 electron beam technology Methods 0.000 claims abstract description 27
- 238000001304 sample melting Methods 0.000 claims description 2
- 238000005259 measurement Methods 0.000 abstract description 3
- 230000001678 irradiating effect Effects 0.000 abstract 2
- 238000004090 dissolution Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000009089 cytolysis Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
- Investigating And Analyzing Materials By Characteristic Methods (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、メタル中に含まれている少量の介在物を効果
的に分析する技術分野において、分析する前のメタル試
料の溶解方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for dissolving a metal sample before analysis in the technical field of effectively analyzing small amounts of inclusions contained in metal.
「従来の技術]
かかるメタル試料の溶解を行う装置としては、第2図に
示すようなものが実用に供されている。"Prior Art" As an apparatus for melting such a metal sample, one shown in FIG. 2 is in practical use.
同図において、1は装置本体、2はその上面に気密を保
って着脱可能に載置された真空ベッセルで、このベッセ
ル内は図示外の真空ポンプに接続され真空に保たれる。In the figure, 1 is a main body of the apparatus, and 2 is a vacuum vessel removably placed on the upper surface of the apparatus in an airtight manner.The interior of this vessel is connected to a vacuum pump (not shown) to maintain a vacuum.
また、このベッセル1内には銅製でかつ冷却された円形
状のハース3か設置しである。前記バー、スは装置本体
1の土壁を気密を保って貫通した回転軸4により回転可
能に保持されており、また、このハースの上面には多数
の凹部状に形成された溶解室5が回転中心を中心とした
同一円周状に等間隔に形成されている。前記各溶解室に
は試料6か収容される。7は前記回転軸4を回転させる
ためのモータである。8は前記ハース近傍に設けられた
電子銃で、発生した電子ビームEは相対向するように配
置された2つのポールピース9aと9b(9bは第1図
参照)間からの磁場によって偏向され、溶解室内の試料
上を照射する。Moreover, a circular hearth 3 made of copper and cooled is installed inside the vessel 1. The bars are rotatably held by a rotary shaft 4 that penetrates the earthen wall of the apparatus body 1 in an airtight manner, and the upper surface of the hearth has a melting chamber 5 formed in the shape of many recesses. They are formed at equal intervals around the same circumference around the center of rotation. A sample 6 is accommodated in each of the dissolution chambers. 7 is a motor for rotating the rotating shaft 4. Reference numeral 8 denotes an electron gun installed near the hearth, and the generated electron beam E is deflected by a magnetic field between two pole pieces 9a and 9b (see FIG. 1 for 9b) arranged to face each other. Irradiates the sample inside the lysis chamber.
かかる装置において、図示外のモータ制御回路によりモ
ータ7の回転、停止を繰り返してハース3上に載置され
た各試料6を順次電子ビーム照射位置にセットすれば、
試料は電子ビームEにより溶解され介在物か浮上分離す
る。In such an apparatus, if the motor 7 is repeatedly rotated and stopped by a motor control circuit (not shown) and each sample 6 placed on the hearth 3 is sequentially set at the electron beam irradiation position,
The sample is melted by the electron beam E, and inclusions are floated and separated.
[発明か解決しようとする課題]
ところで、このように試料中の微小介在物を溶解して浮
上させる試料溶解装置においては、介在物の形状に基づ
いて同定を行ったり、その量を測定することから各試料
における溶解状態を一定にすることか望まれる。しかし
ながら、かかる従来装置では、各試料の溶解状態を一定
に保つことが困難であり、測定結果に悪影響が出ること
は避けられなかった。[Problem to be solved by the invention] By the way, in a sample dissolving device that dissolves and floats minute inclusions in a sample, it is difficult to identify the inclusions based on their shape or measure their amount. Therefore, it is desirable to maintain a constant state of dissolution in each sample. However, with such a conventional device, it is difficult to maintain a constant state of dissolution of each sample, and it is inevitable that the measurement results will be adversely affected.
本発明者はこの点について実験した結果、試料が電子ビ
ーム照射位置にセットされるとき、溶解室内で動くこと
が原因であることを究明した。これは、電子ビーム偏向
用の一対のポルピース9a。As a result of experiments on this point, the present inventor found that the cause was movement within the melting chamber when the sample was set at the electron beam irradiation position. This is a pair of pol pieces 9a for electron beam deflection.
9b先端がハース3の溶解室5の上方まで張り出してい
るため、このポールピースからの磁場の影響を受けて試
料か動くことにある。一方、試料を照射する電子ビーム
のスポット径は、試料の大きさと略同じ大きさに選定さ
れている。その結果、試料が電子ビーム照射位置にセッ
トされたとき、電子ビームの中心と試料の中心とかすれ
る。このように両者の中心がすれると、電子ビームの強
度分布はガウス分布をしているため試料全体を均一に加
熱することかできす、溶解状態を一定に保つことができ
ないわけである。Since the tip of 9b extends above the melting chamber 5 of the hearth 3, the sample moves under the influence of the magnetic field from this pole piece. On the other hand, the spot diameter of the electron beam that irradiates the sample is selected to be approximately the same size as the sample. As a result, when the sample is set at the electron beam irradiation position, the center of the electron beam and the center of the sample are blurred. If the centers of the two are misaligned in this way, the intensity distribution of the electron beam has a Gaussian distribution, so it is only possible to uniformly heat the entire sample, and it is not possible to maintain a constant melting state.
そこで、本発明はかかる点に鑑みてなされたものであり
、試料の移動に関係なく試料全体を均一に加熱して溶解
状態を一定にすることのできる装置を提供すること目的
とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the present invention is to provide an apparatus that can uniformly heat the entire sample and maintain a constant melting state regardless of the movement of the sample.
[課題を解決するための手段]
上記目的を達成するため、本発明の介在物分析試料溶解
方法は、真空ベッセル中に設けたハース上に保持された
試料を電子ビームにより溶解し、試料中の介在物をその
表面に浮上させる介在物分析試料溶解方法において、前
記電子ビームによる試料の溶解は、この電子ビームをあ
る一定領域内を2次元的に走査させることにより行うこ
とを特徴とする。[Means for Solving the Problem] In order to achieve the above object, the inclusion analysis sample melting method of the present invention melts a sample held on a hearth provided in a vacuum vessel with an electron beam, and dissolves the sample in the sample. In the method for dissolving a sample for inclusion analysis in which inclusions are floated to the surface thereof, the sample is dissolved by the electron beam by scanning the electron beam two-dimensionally within a certain area.
以下、本発明の実施例を図面に基づいて詳説する。Hereinafter, embodiments of the present invention will be described in detail based on the drawings.
[実施例]
第1図は本発明の方法を実施するための装置の一例を示
す要部拡大平面図で、第2図と同一番号のものは同一構
成要素を示す。[Example] FIG. 1 is an enlarged plan view of essential parts showing an example of an apparatus for carrying out the method of the present invention, and the same numbers as in FIG. 2 indicate the same components.
即ち、本実施例では電子銃8の直前にトロイダル状の偏
向コイル10を設け、このコイルにより試料6を照射す
る電子ビームEを一点鎖線Aで示すように一定領域にわ
たって2次元的に走査することにより試料を加熱溶解す
ることを特徴とする。That is, in this embodiment, a toroidal deflection coil 10 is provided immediately before the electron gun 8, and the electron beam E that irradiates the sample 6 is two-dimensionally scanned over a certain area by this coil as shown by the dashed line A. It is characterized by heating and melting the sample.
このとき、試料を照射する電子ビームの径は、従来装置
と同様に試料の大きさと同等にしである。At this time, the diameter of the electron beam that irradiates the sample is equal to the size of the sample, similar to the conventional apparatus.
このように電子ビームを2次元的に走査すれば、試料6
か溶解室5内で動いても試料全体を電子ビームにて照射
することができるため、従来のようにムラなく試料を均
一に溶解することができる。If the electron beam is scanned two-dimensionally in this way, the sample 6
Since the entire sample can be irradiated with the electron beam even if the sample moves within the dissolution chamber 5, the sample can be dissolved uniformly and evenly unlike the conventional method.
ここで、実験の結果、電子ビームの走査領域は、試料を
電子ビーム照射方向から見た時の表面積の2倍とした場
合に、最適な溶解状態が得られた。Here, as a result of experiments, an optimal melting state was obtained when the electron beam scanning area was twice the surface area of the sample when viewed from the electron beam irradiation direction.
以上詳述した本発明によれば、溶解室内における試料の
移動に関係なく各試料を均一に加熱することかできるた
め、溶解条件を一定に保つことができ介在物の量の測定
や同定等を正確に行うことかできる。According to the present invention described in detail above, each sample can be heated uniformly regardless of the movement of the sample in the melting chamber, so the melting conditions can be kept constant and the amount of inclusions can be measured and identified. Can be done accurately.
第1図は本発明の方法を実施するための装置の一例を示
す要部拡大平面図、第2図は従来例を説明するための構
成略図である。
1:装置本体、 2:真空ベッセル3:ハース
4:回転軸
5、溶解室 6:試料
7:モータ 8:電子銃
9a、9b:ポールピース
10:偏向コイルFIG. 1 is an enlarged plan view of essential parts showing an example of an apparatus for carrying out the method of the present invention, and FIG. 2 is a schematic diagram of the configuration for explaining a conventional example. 1: Equipment body, 2: Vacuum vessel 3: Hearth
4: Rotating shaft 5, melting chamber 6: Sample 7: Motor 8: Electron gun 9a, 9b: Pole piece 10: Deflection coil
Claims (1)
子ビームにより溶解し、試料中の介在物をその表面に浮
上させる介在物分析試料溶解方法において、前記電子ビ
ームによる試料の溶解は、この電子ビームをある一定領
域内を2次元的に走査させることにより行うことを特徴
とする介在物分析試料溶解方法。In an inclusion analysis sample melting method in which a sample held on a hearth provided in a vacuum vessel is melted by an electron beam and inclusions in the sample float to the surface, the melting of the sample by the electron beam is A method for dissolving a sample for inclusion analysis, characterized in that the method is carried out by scanning a beam two-dimensionally within a certain area.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17047390A JPH0460436A (en) | 1990-06-28 | 1990-06-28 | Melting method of sample for analysis of inclusion |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17047390A JPH0460436A (en) | 1990-06-28 | 1990-06-28 | Melting method of sample for analysis of inclusion |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0460436A true JPH0460436A (en) | 1992-02-26 |
Family
ID=15905599
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17047390A Pending JPH0460436A (en) | 1990-06-28 | 1990-06-28 | Melting method of sample for analysis of inclusion |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0460436A (en) |
-
1990
- 1990-06-28 JP JP17047390A patent/JPH0460436A/en active Pending
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