JPH0458469B2 - - Google Patents

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Publication number
JPH0458469B2
JPH0458469B2 JP59241375A JP24137584A JPH0458469B2 JP H0458469 B2 JPH0458469 B2 JP H0458469B2 JP 59241375 A JP59241375 A JP 59241375A JP 24137584 A JP24137584 A JP 24137584A JP H0458469 B2 JPH0458469 B2 JP H0458469B2
Authority
JP
Japan
Prior art keywords
resin
compound
present
benzotriazolylphenol
tert
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59241375A
Other languages
Japanese (ja)
Other versions
JPS61118373A (en
Inventor
Naohiro Kubota
Jun Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Original Assignee
Asahi Denka Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Denka Kogyo KK filed Critical Asahi Denka Kogyo KK
Priority to JP24137584A priority Critical patent/JPS61118373A/en
Publication of JPS61118373A publication Critical patent/JPS61118373A/en
Publication of JPH0458469B2 publication Critical patent/JPH0458469B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、合成重合体等の有機物質用の光安定
剤として有用な2,2′−メチレンビス(4−第三
オクチル−6−ベンゾトリアゾリルフエノール)
を提供するものである。 2−ヒドロキシフエニルベンゾトリアゾール化
合物は合成樹脂等の各種有機材料用の光安定剤で
あることが知られているが、該化合物は低分子量
であるために樹脂の加工中に揮発したり、あるい
は水、有機溶剤等によつて樹脂中から抽出されて
しまい、結果として有機物質を長期に渡つて安定
化することができなかつた。 このため、大きな置換基を導入したり、あるい
は該化合物をアルデヒド類で二量化することも提
案されている。 例えば、特公昭55−39180号公報には高級アル
デヒド類で二量化することが記載されており、特
開昭49−61071号公報には特定の結合手で二量化
することが記載されており、また、同公報にはメ
チレンビス(ベンゾトリアゾリルフエノール)も
記載されている。 しかしながら、これらの化合物の効果は未だ充
分満足し得るものではなく、更に光安定化効果の
優れた化合物が求められていた。 本発明者等は光安定化効果に優れ、しかも耐熱
性及び耐抽出性の良好な化合物を得るために鋭意
検討を重ねた結果、次の式を有する2,2′−メチ
レンビス(4−第三オクチル−6−ベンゾトリア
ゾリルフエノール)が上記課題を全て解決するこ
とを見出し本発明に到達した。 上記化合物は、例えば、2−ベンゾトリアゾリ
ル−4−第三オクチルフエノールをホルムアルデ
ヒド類により二量化する方法、2,2′−メチレン
ビス(4−第三オクチルフエノール)を常法に従
いベンゾトリアゾリル化する方法等によつて容易
に製造することができる。 本発明の2,2′−メチレンビス(4−第三オク
チル−6−ベンゾトリアゾリルフエノール)は各
種合成樹脂、ゴム、ワツクス、油脂等の有機材料
ようの光安定剤として有用である。 本発明の化合物により安定化される有機材料と
しては、例えば、ポリエチレン、ポリプロピレ
ン、ポリブテン−1、ポリ−3−メチルペンテン
等のα−オレフイン重合体またはエチレン−酢酸
ビニル共重合体、エチレン−プロピレン共重合体
等のα−オレフイン共重合体、ポリ塩化ビニル、
ポリ臭化ビニル、ポリ弗化ビニル、ホリ塩化ビニ
リデン、塩素化ポリエチレン、塩素化ポリプロピ
レン、ポリ弗化ビニリデン、塩化ゴム、塩化ビニ
ル−酢酸ビニル共重合体、塩化ビニル−エチレン
共重合体、塩化ビニル−塩化ビニリデン共重合
体、塩化ビニル−ウレタン共重合体等の含ハロゲ
ン樹脂、石油樹脂、クマロン樹脂、ポリスチレ
ン、ポリ酢酸ビニル、アクリル樹脂、メタクリル
樹脂、ポリアクリロニトリル、スチレンと他の単
量体(例えば無水マレイン酸、ブタジエン、アク
リロニトリル等)との共重合体、アクリロニトリ
ル−ブタジエン−スチレン三元共重合体、メタク
リル酸エステル−ブタジエン−スチレン三元共重
合体、ポリビニルアルコール、ポリビニルブチラ
ール、ポリエチレンテレフタレート、ポリブチレ
ンテレフタレート、ポリテトラメチレンエーテル
グリコールテレフタレート等の直鎖ポリエステル
またはポリエーテルエステル、ポリフエニレンオ
キシド、ポリアミド、ポリカーボネート、ポリア
セタール、ポリウレタン、繊維素系樹脂、フエノ
ール樹脂、ユリア樹脂、メラミン樹脂、エポキシ
樹脂、不飽和ポリエステル樹脂、シリコーン樹
脂、イソプレンゴム、ブタジエンゴム、アクリロ
ニトリル−ブタジエンゴム、スチレン−ブタジエ
ンゴム等の高分子物質及びこれらのブレンド物、
天然油脂、合成エステル油、鉱油等があげられ
る。 本発明を、以下の実施例によつて更に詳細に説
明するが、本発明はこれらの実施例によつて制限
されるものではない。 実施例 1 2,2′−メチレンビス(4−第三オクチル−6
−ベンゾトリアゾリルフエノール)の製造 2−ベンゾトリアゾリル−4−第三オクチルフ
エノール32.3g、ジエチルアミン11.0g及びパラ
ホルムアルデヒド5.2gをブタノール25mlに溶解
し、還流下24時間撹拌した。 その後、減圧下に脱溶媒して2−ジエチルアミ
ノメチル−4−第三オクチル−6−ベンゾトリア
ゾリルフエノール39.2gを得た。 上記生成物37g及び2−ベンゾトリアゾリル−
4−第三オクチルフエノール25gをキシレン60ml
に溶解し、ナトリウムメトキサイド(28%メタノ
ール溶液)3.1gを添加した。 窒素ガスを通気しながら還流下に10時間撹拌
し、その後減圧下に脱溶媒し、粗生成物55.2gを
得、これをn−ヘプタンより再結晶し、融点200
℃の白色結晶を得た。 上記生成物を重クロロホルムに溶解し、NMR
を測定するとδ値4.9に一重線があり、目的物で
あることを確認した。 実施例 2 本発明化合物の優れた光安定化効果をみるため
に、下記配合により厚さ0.3mmのプレスシートを
作成し、このシートについて高圧水銀ランプによ
る耐光性の試験を行つた。また、80℃の熱水に48
時間浸漬後のシートについても耐光性の試験を行
つた。その結果を表−1に示す。 〔配合〕 ポリプロピレン 100重量部 ステアリン酸カルシウム 0.2 ペンタエリスリトールテトラキス(3,5−ジ第
三ブチル−4−ヒドロキシフエニル)プロピオネ
ート 0.1 安定剤(表−1参照) 0.2
The present invention discloses 2,2'-methylenebis(4-tert-octyl-6-benzotriazolylphenol) useful as a light stabilizer for organic materials such as synthetic polymers.
It provides: 2-Hydroxyphenylbenzotriazole compounds are known to be light stabilizers for various organic materials such as synthetic resins, but because of their low molecular weight, they may volatilize during resin processing or The organic substances were extracted from the resin by water, organic solvents, etc., and as a result, the organic substances could not be stabilized for a long period of time. For this reason, it has been proposed to introduce large substituents or to dimerize the compound with aldehydes. For example, Japanese Patent Publication No. 55-39180 describes dimerization with higher aldehydes, and Japanese Patent Publication No. 49-61071 describes dimerization with specific bonds. The publication also describes methylenebis(benzotriazolylphenol). However, the effects of these compounds are still not fully satisfactory, and there has been a demand for compounds with even better photostabilizing effects. The inventors of the present invention have made intensive studies to obtain a compound with excellent photostabilizing effect and good heat resistance and extraction resistance. The inventors have discovered that octyl-6-benzotriazolylphenol) can solve all of the above problems and have arrived at the present invention. The above compound can be produced by, for example, dimerizing 2-benzotriazolyl-4-tertiary octylphenol with formaldehydes, or converting 2,2'-methylenebis(4-tertiary octylphenol) into benzotriazolyl by a conventional method. It can be easily manufactured by a method such as oxidation. The 2,2'-methylenebis(4-tert-octyl-6-benzotriazolylphenol) of the present invention is useful as a light stabilizer for organic materials such as various synthetic resins, rubbers, waxes, oils and fats. Examples of the organic material stabilized by the compound of the present invention include α-olefin polymers such as polyethylene, polypropylene, polybutene-1, poly-3-methylpentene, ethylene-vinyl acetate copolymers, ethylene-propylene copolymers, etc. α-olefin copolymers such as polymers, polyvinyl chloride,
Polyvinyl bromide, polyvinyl fluoride, polyvinylidene chloride, chlorinated polyethylene, chlorinated polypropylene, polyvinylidene fluoride, chlorinated rubber, vinyl chloride-vinyl acetate copolymer, vinyl chloride-ethylene copolymer, vinyl chloride Halogen-containing resins such as vinylidene chloride copolymer, vinyl chloride-urethane copolymer, petroleum resin, coumaron resin, polystyrene, polyvinyl acetate, acrylic resin, methacrylic resin, polyacrylonitrile, styrene and other monomers (e.g. anhydrous (maleic acid, butadiene, acrylonitrile, etc.), acrylonitrile-butadiene-styrene terpolymer, methacrylic acid ester-butadiene-styrene terpolymer, polyvinyl alcohol, polyvinyl butyral, polyethylene terephthalate, polybutylene terephthalate , linear polyester or polyether ester such as polytetramethylene ether glycol terephthalate, polyphenylene oxide, polyamide, polycarbonate, polyacetal, polyurethane, cellulose resin, phenolic resin, urea resin, melamine resin, epoxy resin, unsaturated polyester polymeric substances such as resins, silicone resins, isoprene rubber, butadiene rubber, acrylonitrile-butadiene rubber, styrene-butadiene rubber, and blends thereof;
Examples include natural oils and fats, synthetic ester oils, and mineral oils. The present invention will be explained in more detail with reference to the following examples, but the present invention is not limited by these examples. Example 1 2,2'-methylenebis(4-tert-octyl-6
32.3 g of 2-benzotriazolyl-4-tertiary octylphenol, 11.0 g of diethylamine and 5.2 g of paraformaldehyde were dissolved in 25 ml of butanol and stirred under reflux for 24 hours. Thereafter, the solvent was removed under reduced pressure to obtain 39.2 g of 2-diethylaminomethyl-4-tert-octyl-6-benzotriazolylphenol. 37 g of the above product and 2-benzotriazolyl-
25g of 4-tertiary octylphenol and 60ml of xylene
3.1 g of sodium methoxide (28% methanol solution) was added. The mixture was stirred under reflux for 10 hours while bubbling nitrogen gas, and then the solvent was removed under reduced pressure to obtain 55.2 g of a crude product, which was recrystallized from n-heptane to give a product with a melting point of 200.
℃ white crystals were obtained. The above product was dissolved in deuterated chloroform and NMR
When measured, there was a singlet line at a δ value of 4.9, confirming that it was the target object. Example 2 In order to examine the excellent photostabilizing effect of the compound of the present invention, a press sheet with a thickness of 0.3 mm was prepared using the following formulation, and a light resistance test was conducted on this sheet using a high-pressure mercury lamp. In addition, 48% in hot water at 80℃
A light resistance test was also conducted on the sheet after being immersed for a period of time. The results are shown in Table-1. [Formulation] Polypropylene 100 parts by weight Calcium stearate 0.2 Pentaerythritol tetrakis (3,5-di-tert-butyl-4-hydroxyphenyl) propionate 0.1 Stabilizer (see Table 1) 0.2

【表】【table】

【表】 実施例 3 本発明の化合物は優れた耐熱性を有しており、
過酷な加工条件下でもその効果を減ずることがな
い。本実施例においては、高温における押し出し
加工を繰り返すことによる影響をみた。 次の配合により樹脂と添加剤をミキサーで5分
間混合したあど、押し出し機でコンパウンドを作
成した(シリンダー温度230℃及び240℃、ヘツド
ダイス温度250℃、回転数20rpm)。 押し出しを5回繰り返した後、このコンパウン
ドを用いて試験片を射出成形機で作成した(シリ
ンダー温度240℃、ノズル温度250℃、射出圧475
Kg/cm2)。 得られた試験片を用いて高圧水銀ランプで耐光
性試験を行つた。また、押し出し1回のコンパウ
ンドを用いた試験片についても耐光性試験を行つ
た。 その結果を表−2に示す。 〔配合〕 エチレン−プロピレン共重合樹脂 100重量部 ステアリン酸カルシウム 0.2 ステアリル−3,5−ジ第三ブチル−4−ヒドロ
キシフエニルプロピオネート 0.1 ジラウリルチオジプロピオネート 0.2 安定剤(表−2参照) 0.2
[Table] Example 3 The compound of the present invention has excellent heat resistance,
Its effectiveness remains unchanged even under harsh processing conditions. In this example, the effect of repeating extrusion processing at high temperatures was examined. The resin and additives were mixed in a mixer for 5 minutes according to the following formulation, and then a compound was prepared in an extruder (cylinder temperature 230°C and 240°C, head die temperature 250°C, rotation speed 20 rpm). After repeating extrusion five times, test pieces were made using this compound using an injection molding machine (cylinder temperature 240°C, nozzle temperature 250°C, injection pressure 475°C).
kg/ cm2 ). A light resistance test was conducted using the obtained test piece using a high-pressure mercury lamp. In addition, a light resistance test was also conducted on a test piece using a compound that had been extruded once. The results are shown in Table-2. [Formulation] Ethylene-propylene copolymer resin 100 parts by weight Calcium stearate 0.2 Stearyl-3,5-di-tert-butyl-4-hydroxyphenylpropionate 0.1 Dilaurylthiodipropionate 0.2 Stabilizer (see Table 2) 0.2

【表】 表−1及び表−2の結果から、本願発明の化合
物は単量体ベンゾトリアゾリルフエノール及び類
似の二量体化合物よりも光安定化効果が著しく大
きく、しかも、耐抽出性及び耐熱性に優れている
ことが明らかである。
[Table] From the results in Tables 1 and 2, the compound of the present invention has a significantly greater photostabilizing effect than monomeric benzotriazolylphenol and similar dimeric compounds, and has excellent extraction resistance and It is clear that it has excellent heat resistance.

Claims (1)

【特許請求の範囲】 1 次の式で表される2,2′−メチレンビス(4
−第三オクチル−6−ベンゾトリアゾリルフエノ
ール)。
[Scope of Claims] 1 2,2'-methylenebis(4
-tertiary octyl-6-benzotriazolylphenol).
JP24137584A 1984-11-15 1984-11-15 Bis(benzotriazolylphenol) compound Granted JPS61118373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24137584A JPS61118373A (en) 1984-11-15 1984-11-15 Bis(benzotriazolylphenol) compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24137584A JPS61118373A (en) 1984-11-15 1984-11-15 Bis(benzotriazolylphenol) compound

Publications (2)

Publication Number Publication Date
JPS61118373A JPS61118373A (en) 1986-06-05
JPH0458469B2 true JPH0458469B2 (en) 1992-09-17

Family

ID=17073347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24137584A Granted JPS61118373A (en) 1984-11-15 1984-11-15 Bis(benzotriazolylphenol) compound

Country Status (1)

Country Link
JP (1) JPS61118373A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3709779A1 (en) * 1987-03-25 1988-10-06 Bayer Ag POLYDIORGANOSILOXANE-POLYCARBONATE BLOCK COCONDENSATES WITH IMPROVED PROTECTION AGAINST UV LIGHT
EP0630758B1 (en) * 1993-06-21 1998-10-07 Mitsubishi Paper Mills, Ltd. Heat-sensitive recording material
KR960007643A (en) * 1994-08-17 1996-03-22 김준웅 Method for producing UV-protective polyester polymer
JP4162274B2 (en) * 1996-07-31 2008-10-08 城北化学工業株式会社 Process for producing bis (2-hydroxyphenyl-3-benzotriazole) methanes
JP2001106677A (en) * 1999-10-06 2001-04-17 Osaka Seika Kogyo Kk Benzotriazole-based compound and light stabilizer
JP4993421B2 (en) 2001-06-07 2012-08-08 株式会社Adeka Synthetic resin composition
KR101773536B1 (en) 2009-09-04 2017-08-31 가부시키가이샤 아데카 Sunscreen cosmetic composition containing ultraviolet absorber

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1670951A1 (en) * 1967-11-21 1971-02-18 Bayer Ag Alkylene bis (benzotriazolyl phenols)
US3936305A (en) * 1973-12-03 1976-02-03 Mitsubishi Paper Mills, Ltd. Color photographic photosensitive material containing ultraviolet ray-absorbing compound
JPS61113667A (en) * 1984-11-07 1986-05-31 Adeka Argus Chem Co Ltd Thermosetting synthetic resin coating composition with improved light resistance

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1670951A1 (en) * 1967-11-21 1971-02-18 Bayer Ag Alkylene bis (benzotriazolyl phenols)
US3936305A (en) * 1973-12-03 1976-02-03 Mitsubishi Paper Mills, Ltd. Color photographic photosensitive material containing ultraviolet ray-absorbing compound
JPS61113667A (en) * 1984-11-07 1986-05-31 Adeka Argus Chem Co Ltd Thermosetting synthetic resin coating composition with improved light resistance

Also Published As

Publication number Publication date
JPS61118373A (en) 1986-06-05

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