JPH0456858A - Developer for dampening waterless photosensitive planographic printing plate - Google Patents
Developer for dampening waterless photosensitive planographic printing plateInfo
- Publication number
- JPH0456858A JPH0456858A JP16487390A JP16487390A JPH0456858A JP H0456858 A JPH0456858 A JP H0456858A JP 16487390 A JP16487390 A JP 16487390A JP 16487390 A JP16487390 A JP 16487390A JP H0456858 A JPH0456858 A JP H0456858A
- Authority
- JP
- Japan
- Prior art keywords
- water
- developer
- printing plate
- acid
- meth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 50
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 24
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 17
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims abstract description 16
- 229920000642 polymer Polymers 0.000 claims abstract description 16
- 239000003513 alkali Substances 0.000 claims abstract description 7
- 229920002379 silicone rubber Polymers 0.000 claims description 20
- 239000004945 silicone rubber Substances 0.000 claims description 17
- 239000003960 organic solvent Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 8
- 238000005187 foaming Methods 0.000 abstract description 9
- 239000010802 sludge Substances 0.000 abstract description 8
- 239000002904 solvent Substances 0.000 abstract description 6
- 230000035943 smell Effects 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 53
- 239000000975 dye Substances 0.000 description 29
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 22
- 229920001296 polysiloxane Polymers 0.000 description 22
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- 239000000203 mixture Substances 0.000 description 15
- -1 amine compounds Chemical class 0.000 description 14
- 238000004043 dyeing Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 150000001735 carboxylic acids Chemical class 0.000 description 9
- 239000004094 surface-active agent Substances 0.000 description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 7
- 239000003431 cross linking reagent Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 230000001476 alcoholic effect Effects 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000000016 photochemical curing Methods 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 3
- 229940075420 xanthine Drugs 0.000 description 3
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 description 2
- KUIZKZHDMPERHR-UHFFFAOYSA-N 1-phenylprop-2-en-1-one Chemical compound C=CC(=O)C1=CC=CC=C1 KUIZKZHDMPERHR-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 2
- KYARBIJYVGJZLB-UHFFFAOYSA-N 7-amino-4-hydroxy-2-naphthalenesulfonic acid Chemical compound OC1=CC(S(O)(=O)=O)=CC2=CC(N)=CC=C21 KYARBIJYVGJZLB-UHFFFAOYSA-N 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 2
- AOMZHDJXSYHPKS-DROYEMJCSA-L Amido Black 10B Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C1=CC2=CC(S([O-])(=O)=O)=C(\N=N\C=3C=CC=CC=3)C(O)=C2C(N)=C1\N=N\C1=CC=C(N(=O)=O)C=C1 AOMZHDJXSYHPKS-DROYEMJCSA-L 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KCXZNSGUUQJJTR-UHFFFAOYSA-N Di-n-hexyl phthalate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCC KCXZNSGUUQJJTR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- ZFOZVQLOBQUTQQ-UHFFFAOYSA-N Tributyl citrate Chemical compound CCCCOC(=O)CC(O)(C(=O)OCCCC)CC(=O)OCCCC ZFOZVQLOBQUTQQ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- KSCQDDRPFHTIRL-UHFFFAOYSA-N auramine O Chemical compound [H+].[Cl-].C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 KSCQDDRPFHTIRL-UHFFFAOYSA-N 0.000 description 2
- 239000000981 basic dye Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 239000012975 dibutyltin dilaurate Substances 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 2
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- JTHNLKXLWOXOQK-UHFFFAOYSA-N hex-1-en-3-one Chemical compound CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 2
- 150000002440 hydroxy compounds Chemical class 0.000 description 2
- 229940107698 malachite green Drugs 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229940057867 methyl lactate Drugs 0.000 description 2
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 235000012752 quinoline yellow Nutrition 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- SHBDDIJUSNNBLQ-UHFFFAOYSA-M sodium;3-[[4-[(2-chlorophenyl)-[4-[ethyl-[(3-sulfonatophenyl)methyl]azaniumylidene]cyclohexa-2,5-dien-1-ylidene]methyl]-n-ethylanilino]methyl]benzenesulfonate Chemical compound [Na+].C=1C=C(C(=C2C=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=2C(=CC=CC=2)Cl)C=CC=1N(CC)CC1=CC=CC(S([O-])(=O)=O)=C1 SHBDDIJUSNNBLQ-UHFFFAOYSA-M 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- JADVWWSKYZXRGX-UHFFFAOYSA-M thioflavine T Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C1=[N+](C)C2=CC=C(C)C=C2S1 JADVWWSKYZXRGX-UHFFFAOYSA-M 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- QBZIEGUIYWGBMY-FUZXWUMZSA-N (5Z)-5-hydroxyimino-6-oxonaphthalene-2-sulfonic acid iron Chemical compound [Fe].O\N=C1/C(=O)C=Cc2cc(ccc12)S(O)(=O)=O.O\N=C1/C(=O)C=Cc2cc(ccc12)S(O)(=O)=O.O\N=C1/C(=O)C=Cc2cc(ccc12)S(O)(=O)=O QBZIEGUIYWGBMY-FUZXWUMZSA-N 0.000 description 1
- WXWYJCSIHQKADM-ZNAKCYKMSA-N (e)-n-[bis[[(e)-butan-2-ylideneamino]oxy]-ethenylsilyl]oxybutan-2-imine Chemical compound CC\C(C)=N\O[Si](O\N=C(/C)CC)(O\N=C(/C)CC)C=C WXWYJCSIHQKADM-ZNAKCYKMSA-N 0.000 description 1
- ZBBLRPRYYSJUCZ-GRHBHMESSA-L (z)-but-2-enedioate;dibutyltin(2+) Chemical compound [O-]C(=O)\C=C/C([O-])=O.CCCC[Sn+2]CCCC ZBBLRPRYYSJUCZ-GRHBHMESSA-L 0.000 description 1
- QCGOYKXFFGQDFY-UHFFFAOYSA-M 1,3,3-trimethyl-2-[3-(1,3,3-trimethylindol-1-ium-2-yl)prop-2-enylidene]indole;chloride Chemical compound [Cl-].CC1(C)C2=CC=CC=C2N(C)\C1=C\C=C\C1=[N+](C)C2=CC=CC=C2C1(C)C QCGOYKXFFGQDFY-UHFFFAOYSA-M 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- GYSCBCSGKXNZRH-UHFFFAOYSA-N 1-benzothiophene-2-carboxamide Chemical compound C1=CC=C2SC(C(=O)N)=CC2=C1 GYSCBCSGKXNZRH-UHFFFAOYSA-N 0.000 description 1
- LHORZPMPPHTXFQ-UHFFFAOYSA-N 1-chloroethanesulfonic acid Chemical compound CC(Cl)S(O)(=O)=O LHORZPMPPHTXFQ-UHFFFAOYSA-N 0.000 description 1
- LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical compound CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 description 1
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- LXFQSRIDYRFTJW-UHFFFAOYSA-N 2,4,6-trimethylbenzenesulfonic acid Chemical compound CC1=CC(C)=C(S(O)(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-N 0.000 description 1
- IKQCSJBQLWJEPU-UHFFFAOYSA-N 2,5-dihydroxybenzenesulfonic acid Chemical compound OC1=CC=C(O)C(S(O)(=O)=O)=C1 IKQCSJBQLWJEPU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- YEVQZPWSVWZAOB-UHFFFAOYSA-N 2-(bromomethyl)-1-iodo-4-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(I)C(CBr)=C1 YEVQZPWSVWZAOB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 description 1
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 1
- DKHZGIKPBFMBBY-UHFFFAOYSA-N 2-cyano-n-[4-(diethylamino)phenyl]-2-phenylacetamide Chemical compound C1=CC(N(CC)CC)=CC=C1NC(=O)C(C#N)C1=CC=CC=C1 DKHZGIKPBFMBBY-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- CWBAMDVCIHSKNW-UHFFFAOYSA-N 2-iminonaphthalene-1,4-dione Chemical compound C1=CC=C2C(=O)C(=N)CC(=O)C2=C1 CWBAMDVCIHSKNW-UHFFFAOYSA-N 0.000 description 1
- YZTJKOLMWJNVFH-UHFFFAOYSA-N 2-sulfobenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1S(O)(=O)=O YZTJKOLMWJNVFH-UHFFFAOYSA-N 0.000 description 1
- REEBWSYYNPPSKV-UHFFFAOYSA-N 3-[(4-formylphenoxy)methyl]thiophene-2-carbonitrile Chemical compound C1=CC(C=O)=CC=C1OCC1=C(C#N)SC=C1 REEBWSYYNPPSKV-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- MGUKYHHAGPFJMC-UHFFFAOYSA-N 4-[3-(4-hydroxy-2,5-dimethylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-2,5-dimethylphenol Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C(=CC(O)=C(C)C=2)C)=C1C MGUKYHHAGPFJMC-UHFFFAOYSA-N 0.000 description 1
- OLQIKGSZDTXODA-UHFFFAOYSA-N 4-[3-(4-hydroxy-2-methylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-3-methylphenol Chemical compound CC1=CC(O)=CC=C1C1(C=2C(=CC(O)=CC=2)C)C2=CC=CC=C2S(=O)(=O)O1 OLQIKGSZDTXODA-UHFFFAOYSA-N 0.000 description 1
- ACPXHHDRVABPNY-UHFFFAOYSA-N 4-acetylbenzenesulfonic acid Chemical compound CC(=O)C1=CC=C(S(O)(=O)=O)C=C1 ACPXHHDRVABPNY-UHFFFAOYSA-N 0.000 description 1
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- NTDQQZYCCIDJRK-UHFFFAOYSA-N 4-octylphenol Chemical compound CCCCCCCCC1=CC=C(O)C=C1 NTDQQZYCCIDJRK-UHFFFAOYSA-N 0.000 description 1
- JAJIPIAHCFBEPI-UHFFFAOYSA-N 9,10-dioxoanthracene-1-sulfonic acid Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)O JAJIPIAHCFBEPI-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- RGCKGOZRHPZPFP-UHFFFAOYSA-N Alizarin Natural products C1=CC=C2C(=O)C3=C(O)C(O)=CC=C3C(=O)C2=C1 RGCKGOZRHPZPFP-UHFFFAOYSA-N 0.000 description 1
- 239000004229 Alkannin Substances 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- RTMBGDBBDQKNNZ-UHFFFAOYSA-L C.I. Acid Blue 3 Chemical compound [Ca+2].C1=CC(N(CC)CC)=CC=C1C(C=1C(=CC(=C(O)C=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1.C1=CC(N(CC)CC)=CC=C1C(C=1C(=CC(=C(O)C=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1 RTMBGDBBDQKNNZ-UHFFFAOYSA-L 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N Decanoic acid Natural products CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 1
- WZKXBGJNNCGHIC-UHFFFAOYSA-N Leucomalachite green Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=CC=C1 WZKXBGJNNCGHIC-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- SJEYSFABYSGQBG-UHFFFAOYSA-M Patent blue Chemical compound [Na+].C1=CC(N(CC)CC)=CC=C1C(C=1C(=CC(=CC=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1 SJEYSFABYSGQBG-UHFFFAOYSA-M 0.000 description 1
- 240000007320 Pinus strobus Species 0.000 description 1
- RVGRUAULSDPKGF-UHFFFAOYSA-N Poloxamer Chemical compound C1CO1.CC1CO1 RVGRUAULSDPKGF-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- JJLKTTCRRLHVGL-UHFFFAOYSA-L [acetyloxy(dibutyl)stannyl] acetate Chemical compound CC([O-])=O.CC([O-])=O.CCCC[Sn+2]CCCC JJLKTTCRRLHVGL-UHFFFAOYSA-L 0.000 description 1
- JQNJIBYLKBOSCM-UHFFFAOYSA-N [acetyloxy(diethyl)silyl] acetate Chemical compound CC(=O)O[Si](CC)(CC)OC(C)=O JQNJIBYLKBOSCM-UHFFFAOYSA-N 0.000 description 1
- RQVFGTYFBUVGOP-UHFFFAOYSA-N [acetyloxy(dimethyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(C)OC(C)=O RQVFGTYFBUVGOP-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- KXJLGCBCRCSXQF-UHFFFAOYSA-N [diacetyloxy(ethyl)silyl] acetate Chemical compound CC(=O)O[Si](CC)(OC(C)=O)OC(C)=O KXJLGCBCRCSXQF-UHFFFAOYSA-N 0.000 description 1
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 description 1
- VLFKGWCMFMCFRM-UHFFFAOYSA-N [diacetyloxy(phenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C1=CC=CC=C1 VLFKGWCMFMCFRM-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- HFVAFDPGUJEFBQ-UHFFFAOYSA-M alizarin red S Chemical compound [Na+].O=C1C2=CC=CC=C2C(=O)C2=C1C=C(S([O-])(=O)=O)C(O)=C2O HFVAFDPGUJEFBQ-UHFFFAOYSA-M 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- BDFZFGDTHFGWRQ-UHFFFAOYSA-N basic brown 1 Chemical compound NC1=CC(N)=CC=C1N=NC1=CC=CC(N=NC=2C(=CC(N)=CC=2)N)=C1 BDFZFGDTHFGWRQ-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- ZLFVRXUOSPRRKQ-UHFFFAOYSA-N chembl2138372 Chemical compound [O-][N+](=O)C1=CC(C)=CC=C1N=NC1=C(O)C=CC2=CC=CC=C12 ZLFVRXUOSPRRKQ-UHFFFAOYSA-N 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- OBRMNDMBJQTZHV-UHFFFAOYSA-N cresol red Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C=C(C)C(O)=CC=2)=C1 OBRMNDMBJQTZHV-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 230000009615 deamination Effects 0.000 description 1
- 238000006481 deamination reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical class C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- WTOSNONTQZJEBC-UHFFFAOYSA-N erythrosin Chemical compound OC(=O)C1=CC=CC=C1C(C1C(C(=C(O)C(I)=C1)I)O1)=C2C1=C(I)C(=O)C(I)=C2 WTOSNONTQZJEBC-UHFFFAOYSA-N 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical class CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 1
- XJELOQYISYPGDX-UHFFFAOYSA-N ethenyl 2-chloroacetate Chemical compound ClCC(=O)OC=C XJELOQYISYPGDX-UHFFFAOYSA-N 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- HNPDNOZNULJJDL-UHFFFAOYSA-N ethyl n-ethenylcarbamate Chemical class CCOC(=O)NC=C HNPDNOZNULJJDL-UHFFFAOYSA-N 0.000 description 1
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- FCQJEPASRCXVCB-UHFFFAOYSA-N flavianic acid Chemical compound C1=C(S(O)(=O)=O)C=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FCQJEPASRCXVCB-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- SXQCTESRRZBPHJ-UHFFFAOYSA-M lissamine rhodamine Chemical compound [Na+].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=C(S([O-])(=O)=O)C=C1S([O-])(=O)=O SXQCTESRRZBPHJ-UHFFFAOYSA-M 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical group [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- DWCZIOOZPIDHAB-UHFFFAOYSA-L methyl green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)[N+](C)(C)C)=C1C=CC(=[N+](C)C)C=C1 DWCZIOOZPIDHAB-UHFFFAOYSA-L 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- SHXOKQKTZJXHHR-UHFFFAOYSA-N n,n-diethyl-5-iminobenzo[a]phenoxazin-9-amine;hydrochloride Chemical compound [Cl-].C1=CC=C2C3=NC4=CC=C(N(CC)CC)C=C4OC3=CC(=[NH2+])C2=C1 SHXOKQKTZJXHHR-UHFFFAOYSA-N 0.000 description 1
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 1
- HLTMZOHBXCJAMY-UHFFFAOYSA-N n-[4-(2-hydroxyethyl)phenyl]-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(CCO)C=C1 HLTMZOHBXCJAMY-UHFFFAOYSA-N 0.000 description 1
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 1
- PMJFVKWBSWWAKT-UHFFFAOYSA-N n-cyclohexylprop-2-enamide Chemical compound C=CC(=O)NC1CCCCC1 PMJFVKWBSWWAKT-UHFFFAOYSA-N 0.000 description 1
- BNTUIAFSOCHRHV-UHFFFAOYSA-N n-ethyl-n-phenylprop-2-enamide Chemical compound C=CC(=O)N(CC)C1=CC=CC=C1 BNTUIAFSOCHRHV-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- NXURUGRQBBVNNM-UHFFFAOYSA-N n-nitro-2-phenylprop-2-enamide Chemical compound [O-][N+](=O)NC(=O)C(=C)C1=CC=CC=C1 NXURUGRQBBVNNM-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- JMXROTHPANUTOJ-UHFFFAOYSA-H naphthol green b Chemical compound [Na+].[Na+].[Na+].[Fe+3].C1=C(S([O-])(=O)=O)C=CC2=C(N=O)C([O-])=CC=C21.C1=C(S([O-])(=O)=O)C=CC2=C(N=O)C([O-])=CC=C21.C1=C(S([O-])(=O)=O)C=CC2=C(N=O)C([O-])=CC=C21 JMXROTHPANUTOJ-UHFFFAOYSA-H 0.000 description 1
- CTIQLGJVGNGFEW-UHFFFAOYSA-L naphthol yellow S Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C=C2C([O-])=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 CTIQLGJVGNGFEW-UHFFFAOYSA-L 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 239000001005 nitro dye Substances 0.000 description 1
- 239000001006 nitroso dye Substances 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 235000012736 patent blue V Nutrition 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- PCYCKXJRAKEYSM-UHFFFAOYSA-N phenyl-(1,5,6-trihydroxycyclohexa-2,4-dien-1-yl)methanone Chemical compound OC1C(O)=CC=CC1(O)C(=O)C1=CC=CC=C1 PCYCKXJRAKEYSM-UHFFFAOYSA-N 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 229940051201 quinoline yellow Drugs 0.000 description 1
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- 239000004172 quinoline yellow Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- OARRHUQTFTUEOS-UHFFFAOYSA-N safranin Chemical compound [Cl-].C=12C=C(N)C(C)=CC2=NC2=CC(C)=C(N)C=C2[N+]=1C1=CC=CC=C1 OARRHUQTFTUEOS-UHFFFAOYSA-N 0.000 description 1
- SOUHUMACVWVDME-UHFFFAOYSA-N safranin O Chemical compound [Cl-].C12=CC(N)=CC=C2N=C2C=CC(N)=CC2=[N+]1C1=CC=CC=C1 SOUHUMACVWVDME-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000003707 silyl modified polymer Substances 0.000 description 1
- LGZQSRCLLIPAEE-UHFFFAOYSA-M sodium 1-[(4-sulfonaphthalen-1-yl)diazenyl]naphthalen-2-olate Chemical compound [Na+].C1=CC=C2C(N=NC3=C4C=CC=CC4=CC=C3O)=CC=C(S([O-])(=O)=O)C2=C1 LGZQSRCLLIPAEE-UHFFFAOYSA-M 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000001016 thiazine dye Substances 0.000 description 1
- 239000001017 thiazole dye Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- YZVRVDPMGYFCGL-UHFFFAOYSA-N triacetyloxysilyl acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O YZVRVDPMGYFCGL-UHFFFAOYSA-N 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- LLWJPGAKXJBKKA-UHFFFAOYSA-N victoria blue B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[NH+]C1=CC=CC=C1 LLWJPGAKXJBKKA-UHFFFAOYSA-N 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は湿し水不要感光性平版印刷版用現像液に関し、
詳しくは、ジアゾ系感光層を有する湿し水不要感光性平
版印刷版に用いる現像液に関する。[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to a developer for photosensitive lithographic printing plates that does not require dampening water;
Specifically, the present invention relates to a developer used in a photosensitive lithographic printing plate that does not require dampening water and has a diazo-based photosensitive layer.
[従来の技術]
従来、平版印刷においては、画線部の親油性と非画線部
の親水性を利用し、水とインキの微妙なバランスにより
印刷を行なう必要かあり、かなりの熟練度か必要とされ
る。[Prior art] Conventionally, in planographic printing, it has been necessary to perform printing by making use of the lipophilicity of the imaged area and the hydrophilicity of the non-imaged area, with a delicate balance of water and ink, which requires considerable skill. Needed.
すなわち従来の湿し水を必要とする印刷方式では親水性
の支持体上に親油性の感光層が塗設された版材に画像フ
ィルムを通して露光した後現像する事により画像状の親
油部分と非画線部である親水部分を設けて印刷版とする
。印刷にあたってはまず非画線部に水を転移させ次にイ
ンキを転移させる。インキは水が存在する非画線部には
付着せず、画線部のみに付着する。しかしこの方式は、
湿し水とインキの微妙なバランスのコントロールが難し
くインキの乳化をひきおこしたり、湿し水にインキがま
ざったりしてインキ濃度不良や地汚れをひきおこし損紙
の大きな原因となるなど大きな問題点を有していた。In other words, in the conventional printing method that requires dampening water, an image-like lipophilic portion is formed by passing an image film through a plate material coated with a lipophilic photosensitive layer on a hydrophilic support, and then developing it. A printing plate is prepared by providing a hydrophilic area which is a non-image area. During printing, water is first transferred to the non-image areas, and then ink is transferred. Ink does not adhere to non-print areas where water is present, but only to print areas. However, this method
It is difficult to control the delicate balance between the dampening water and the ink, which can cause emulsification of the ink, or the ink may mix with the dampening water, causing poor ink density and background smudges, which can lead to major problems such as wasted paper. had.
このため湿し水を必要としない平版印刷版の開発が試み
られており、このようなものとして支持体上にプライマ
ー層、感光層、シリコーン層をこの順に設けた構造の湿
し水不要感光性平版印刷版が知られている。For this reason, attempts have been made to develop lithographic printing plates that do not require dampening water, and such plates have a structure in which a primer layer, a photosensitive layer, and a silicone layer are provided in this order on a support. Lithographic printing plates are known.
特に、本発明者等は特願平1−104286号公報にお
いて感光層に水酸基含有ポリマーとジアゾ樹脂を含有す
る湿し水不要感光性平版印刷版を提案した。In particular, the present inventors proposed in Japanese Patent Application No. 1-104286 a photosensitive lithographic printing plate that does not require dampening water and contains a hydroxyl group-containing polymer and a diazo resin in the photosensitive layer.
このような平版印刷版を現像処理するために用いられる
現像液としては、従来、例えば特開昭61275759
号公報記載の水、界面活性剤及び有機溶剤からなる現像
液、特開平1−159644号公報記載の水、界面活性
剤及び20%以下の有機溶剤からなる現像液、更に特開
平1−257847号公報記載の水、界面活性剤、有機
溶剤及び塩基性化合物からなる現像液等が知られている
。As a developer used for developing such a lithographic printing plate, conventionally, for example, Japanese Patent Application Laid-Open No. 61275759 has been used.
A developer comprising water, a surfactant and an organic solvent as described in JP-A-1-159644, a developer comprising water, a surfactant and 20% or less of an organic solvent as described in JP-A No. 1-257847 A developing solution containing water, a surfactant, an organic solvent, and a basic compound is known as described in the publication.
[発明が解決しようとする課題]
しかしながら、前記特願平1−104286号公報に記
載の如き平版印刷版を種々の現像液で現像処理した場合
、現像液によって臭気や発泡性に差があるのみならす、
ヘドロ発生等の原因となる現像液への溶解性、耐傷性、
画質、染色性等が異なることが明らかになってきた。[Problems to be Solved by the Invention] However, when a lithographic printing plate as described in the above-mentioned Japanese Patent Application No. 1-104286 is developed with various developers, there is only a difference in odor and foaming properties depending on the developer. smooth,
Solubility in developer, scratch resistance, which causes sludge generation, etc.
It has become clear that image quality, stainability, etc. are different.
特に、前記各公報記載の現像液の場合は、発泡性、画質
、染色性等に劣り、上記の特性すべてを満足する現像液
は得られていなかった。In particular, the developing solutions described in the above-mentioned publications are inferior in foaming properties, image quality, dyeing properties, etc., and no developing solution satisfying all of the above characteristics has been obtained.
従って本発明の目的は、臭気がほとんどなく、ヘドロの
発生が少なく、かつ極めて発泡の少ない湿し水不要感光
性平版印刷版用現像液を提供することにある。また、本
発明の目的は、優れた耐傷性、画質及び染色性が得られ
る湿し水不要感光性平版印刷版用現像液を提供すること
にある。更に、本発明の目的は、ポジ型感光性平版印刷
版の現像も併用して行なうことのできる湿し水不要感光
性平版印刷版用現像液を提供することにある。Therefore, an object of the present invention is to provide a developer for a photosensitive lithographic printing plate that has almost no odor, generates little sludge, and exhibits extremely low foaming, requiring no dampening water. Another object of the present invention is to provide a developer for photosensitive lithographic printing plates that does not require dampening water and provides excellent scratch resistance, image quality, and dyeability. A further object of the present invention is to provide a developer for photosensitive lithographic printing plates that does not require dampening water and can also be used to develop positive-working photosensitive lithographic printing plates.
[課題を解決するための手段]
本発明者等は上記課題に鑑みて鋭意研究の結果、本発明
の上記目的は、基板上に該基板側から少なくとも光重合
系プライマー層、感光層およびシリコーンゴム層をこの
順に有し、かつ該感光層が少なくとも水酸基含有ポリマ
ーとジアゾ樹脂を含有する湿し水不要感光性平版印刷版
に用いられる現像液であって、少なくとも、水、アルカ
リ及び水に対する溶解度が20重量%以上の有機溶剤、
を含有することを特徴とする湿し水不要感光性平版印刷
版用現像液を提供することにより達成されることを見出
した。[Means for Solving the Problems] In view of the above problems, the present inventors have conducted extensive research, and found that the above object of the present invention is to provide at least a photopolymerizable primer layer, a photosensitive layer, and a silicone rubber onto a substrate from the substrate side. A developer for use in a dampening water-free photosensitive lithographic printing plate having layers in this order and in which the photosensitive layer contains at least a hydroxyl group-containing polymer and a diazo resin, the developer having at least water, an alkali, and a solubility in water. 20% by weight or more of an organic solvent,
We have found that this can be achieved by providing a developer for photosensitive lithographic printing plates that does not require dampening water and is characterized by containing:
以下に本発明を更に詳細に説明する。The present invention will be explained in more detail below.
本発明の現像液は少なくとも水、アルカリ及び水に対す
る溶解度が20重口%以上の有機溶剤を含有するが、好
ましくは水が30重量%以上、特に50重量%以上、ア
ルカリが0.5〜30重量%、特に2〜20重量%、ま
た水に対する溶解度が20重量%以上の有機溶剤が20
重量%以下、特に10重量%以下の組成のものが用いら
れる。The developer of the present invention contains at least water, an alkali, and an organic solvent having a solubility in water of 20% by weight or more, preferably 30% by weight or more, especially 50% by weight or more of water, and 0.5 to 30% by weight of alkali. % by weight, especially 2 to 20% by weight, and 20% by weight of an organic solvent with a solubility in water of 20% by weight or more.
The composition used is less than 10% by weight, especially less than 10% by weight.
本発明の現像液に用いられる水に対する溶解度が20重
量%以上の有機溶剤としては、具体的には、メタノール
、エタノール、プロピレングリコール、β−アニリノエ
タノール等のアルコール類、メチルセロソルブ、エチル
セロソルブ等のセロソルブ類、アセトン、メチルエチル
ケトン等のケトン類が挙げられる。Specifically, the organic solvent having a solubility in water of 20% by weight or more used in the developer of the present invention includes alcohols such as methanol, ethanol, propylene glycol, and β-anilinoethanol, methyl cellosolve, ethyl cellosolve, etc. Examples include cellosolves, acetone, and ketones such as methyl ethyl ketone.
また、アルカリ剤としては、ケイ酸ナトリウム、ケイ酸
カリウム、水酸化カリウム、水酸化ナトリウム、水酸化
リチウム、第二または第三リン酸ナトリウムまたはアン
モニウム塩、メタケイ酸ナトリウム、炭酸ナトリウム、
アンモニア等の無機アルカリ剤、モノ、ジまたはトリメ
チルアミン、モノ、ジまたはトリエチルアミン、モノま
たはジイソフロビルアミン、n−ブチルアミン、モノ、
ジまたはトリエタノールアミン、モノ、ジまたはトリイ
ソプロパツールアミン、エチレンイミン、エチレンジイ
ミン等の有機アミン化合物等が挙げられる。In addition, alkaline agents include sodium silicate, potassium silicate, potassium hydroxide, sodium hydroxide, lithium hydroxide, dibasic or tribasic sodium or ammonium phosphate, sodium metasilicate, sodium carbonate,
Inorganic alkaline agents such as ammonia, mono-, di- or trimethylamine, mono-, di- or triethylamine, mono- or diisofurobilamine, n-butylamine, mono-,
Examples include organic amine compounds such as di- or triethanolamine, mono-, di- or triisopropanolamine, ethyleneimine, and ethylenediimine.
また、本発明の現像液は必要に応じて、本発明の目的を
損わない範囲内で染料、界面活性剤、有機溶剤等の各成
分を含有することができる。Further, the developer of the present invention may contain components such as a dye, a surfactant, and an organic solvent, if necessary, within a range that does not impair the object of the present invention.
本発明に用いられる湿し水不要感光性平版印刷版におい
て、プライマー層は水酸基含有ポリマーエチレン性不飽
和モノマー又はオリゴマー、及び光重合開始剤を含有し
ている。In the photosensitive lithographic printing plate that does not require dampening water and is used in the present invention, the primer layer contains a hydroxyl group-containing polymer, an ethylenically unsaturated monomer or oligomer, and a photopolymerization initiator.
水酸基含有ポリマーとしては、アルコール性水酸基含有
ポリ(メタ)アクリル酸のエステル又はアミドが好まし
く用いられる。As the hydroxyl group-containing polymer, esters or amides of alcoholic hydroxyl group-containing poly(meth)acrylic acid are preferably used.
尚、本発明においては、以下アクリル系化合物及びメタ
クリル系化合物を併称する場合は、「(メタ)アクリル
・・・」のように記載する。In the present invention, when an acrylic compound and a methacrylic compound are referred to below, they will be written as "(meth)acrylic...".
アルコール性水酸基を有するポリマーとしては、例えば
2−ヒドロキシエチル(メタ)アクリレート、N−(4
−ヒドロキシエチルフェニル)メタクリルアミド、ヒド
ロキシ−メチルジアセトン(メタ)アクリルアミド等の
モノマーから誘導される構成単位を有するものが挙げら
れる。特に、2−ヒドロキシエチル(メタ)アクリレー
トから誘導される構成単位を有するポリマーが好ましい
。Examples of polymers having alcoholic hydroxyl groups include 2-hydroxyethyl (meth)acrylate, N-(4
-Hydroxyethylphenyl)methacrylamide, hydroxymethyldiacetone(meth)acrylamide, and the like having structural units derived from monomers such as (meth)acrylamide and the like. In particular, polymers having structural units derived from 2-hydroxyethyl (meth)acrylate are preferred.
上記アルコール性水酸基含有ポリマーは共重合体であっ
てもよく、その共重合成分モノマーとしては、
(1)芳香族水酸基を有するモノマー、例えばN−(4
−ヒドロキシフェニル)(メタ)アクリルアミド、○−
1m−p−ヒドロキシスチレン、o−1m−p−ヒドロ
キシフェニル−(メタ)アクリレート、
(2)(メタ)アクリル酸、無水マレイン酸等のα、β
−不飽和カルボン酸、
(3)メチル(メタ)アクリレート、エチル(メタ)ア
クリレート、プロピル(メタ)アクリレート、ブチル(
メタ)アクリレート、アミル(メタ)アクリレート、ヘ
キシル(メタ)アクリレート、オクチル(メタ)アクリ
レート、2−クロロエチルアクリレート、2−ヒドロキ
シエチル(メタ)アクリレート、4−ヒドロキシブチル
(メタ)アクリレート、グリシジル(メタ)アクリレー
ト、N−ジメチルアミノエチル(メタ)アクリレート等
の置換されていてもよいアルキル(メタ)アクリレート
、
(4)(メタ)アクリルアミド、N−メチロール(メタ
)アクリルアミド、N−エチルアクリルアミド、N−へ
キシルメタクリルアミド、N−シクロヘキシルアクリル
アミド、N−ヒドロキシエチルアクリルアミド、N−フ
ェニルアクリルアミド、N−ニトロフェニルアクリルア
ミド、N−エチル−N−フェニルアクリルアミド等の置
換されてもよい(メタ)アクリルアミド類、
(5)エチルビニルエーテル、2−クロロエチルビニル
エーテル、ヒドロキシエチルビニルエーテル、プロピル
ビニルエーテル、ブチルビニルエーテル、オクチルビニ
ルエーテル、フェニルビニルエーテル等のビニルエーテ
ル類、
(6)ビニルアセテート、ビニルクロロアセテート、ビ
ニルブチレート、安息香酸ビニル等のビニルエステル類
、
(7)スチレン、α−メチルスチレン、クロロメチルス
チレン等のスチレン類、
(8)メチルビニルケトン、エチルビニルケトン、プロ
ピルビニルケトン、フェニルビニルケトン等のビニルケ
トン類、
(9)エチレン、プロピレン、イソブチレン、ブタジェ
ン、イソプレン等のオレフィン類、(10) N−ビニ
ルピロリドン、N−ビニルカルバゾール、4−ビニルピ
リジン、アクリロニトリル、メタクリロニトリル、
等が挙げられる。特に(3)が好ましい。The alcoholic hydroxyl group-containing polymer may be a copolymer, and the copolymer monomers include (1) a monomer having an aromatic hydroxyl group, such as N-(4
-Hydroxyphenyl)(meth)acrylamide,○-
α, β of 1m-p-hydroxystyrene, o-1m-p-hydroxyphenyl-(meth)acrylate, (2) (meth)acrylic acid, maleic anhydride, etc.
-Unsaturated carboxylic acids, (3) methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (
meth)acrylate, amyl(meth)acrylate, hexyl(meth)acrylate, octyl(meth)acrylate, 2-chloroethyl acrylate, 2-hydroxyethyl(meth)acrylate, 4-hydroxybutyl(meth)acrylate, glycidyl(meth)acrylate acrylate, optionally substituted alkyl (meth)acrylate such as N-dimethylaminoethyl (meth)acrylate, (4) (meth)acrylamide, N-methylol (meth)acrylamide, N-ethylacrylamide, N-hexyl Optionally substituted (meth)acrylamides such as methacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N-ethyl-N-phenylacrylamide, (5) ethyl Vinyl ethers such as vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether, etc. (6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl benzoate, etc. (7) Styrenes such as styrene, α-methylstyrene, and chloromethylstyrene; (8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone; (9) ethylene, propylene, and isobutylene. (10) N-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine, acrylonitrile, methacrylonitrile, and the like. Particularly preferred is (3).
上記水酸基含有ポリマー中における水酸基含有上ツマー
基は特に限定されないが、好ましくは5〜100重量%
、特に好ましくは20〜100重1%である。The hydroxyl group-containing upper group in the hydroxyl group-containing polymer is not particularly limited, but is preferably 5 to 100% by weight.
, particularly preferably 20 to 100% by weight.
本発明の水酸基含有ポリマーをゲルパーミェーションク
ロマトグラフィー(GPC)法で測定した重量平均分子
量は5,000〜1,000,000 (スチレン換算
)が好ましい。s、oooより低い値の場合、光硬化後
も感光層の塗布溶剤あるいは現像液にやられる場合があ
り、1,000,000より大きい値の場合、塗布溶剤
の選択が難しい。The weight average molecular weight of the hydroxyl group-containing polymer of the present invention measured by gel permeation chromatography (GPC) is preferably 5,000 to 1,000,000 (in terms of styrene). If the value is lower than s, ooo, the coating solvent or developer of the photosensitive layer may be affected even after photocuring, and if the value is greater than 1,000,000, it is difficult to select a coating solvent.
上記水酸基含有ポリマーのプライマー層中に占める割合
は通常10〜99重量%で、好ましくは40〜97重量
%である。The proportion of the hydroxyl group-containing polymer in the primer layer is usually 10 to 99% by weight, preferably 40 to 97% by weight.
また、エチレン性不飽和モノマー又はオリゴマーとして
は、常圧下の沸点が100℃以上で2個以上の重合可能
な末端エチレン基を含有する化合物であり、公知の種々
のものが使用できる。例えば、不飽和カルボン酸、不飽
和カルボン酸と脂肪族ポリヒドロキシ化合物とのエステ
ル、不飽和カルボン酸と芳香族ポリヒドロキシ化合物と
のエステル、不飽和カルボン酸と多価カルボン酸及び前
述の脂肪族ポリヒドロキシ化合物、芳香族ポリヒドロキ
シ化合物等の多価ヒドロキシ化合物とのエステル化反応
により得られるエステル等が挙げられ、具体的には、特
開昭59−71048号公報に記載されており、例えば
ジエチレングリコールジ(メタ)アクリレート、トリエ
チレングリコールジ(メタ)アクリレート、トリメチロ
ールプロパントリ (メタ)アクリレート、ペンタエリ
スリトールトリアクリレート、ヒドロキノンジ(メタ)
アクリレート、ピロガロールトリアクリレート、2.2
’ −ビス(4−アクリロキシ−ジェトキシフェニル)
プロパン等が挙げられる。その他には、エチレンビス(
メタ)アクリルアミド、ヘキサメチレンビス(メタ)ア
クリルアミド等の(メタ)アクリルアミド類、あるいは
ビニルウレタン化合物やエポキシ(メタ)アクリレート
等を挙げることができる。Moreover, as the ethylenically unsaturated monomer or oligomer, it is a compound having a boiling point of 100° C. or more under normal pressure and containing two or more polymerizable terminal ethylene groups, and various known ones can be used. For example, unsaturated carboxylic acids, esters of unsaturated carboxylic acids and aliphatic polyhydroxy compounds, esters of unsaturated carboxylic acids and aromatic polyhydroxy compounds, unsaturated carboxylic acids and polyhydric carboxylic acids, and the aforementioned aliphatic polyhydroxy compounds. Examples include esters obtained by esterification reactions with polyhydric hydroxy compounds such as hydroxy compounds and aromatic polyhydroxy compounds. (meth)acrylate, triethylene glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol triacrylate, hydroquinone di(meth)acrylate
Acrylate, pyrogallol triacrylate, 2.2
' -bis(4-acryloxy-jethoxyphenyl)
Examples include propane. In addition, ethylene bis (
Examples include (meth)acrylamides such as meth)acrylamide and hexamethylenebis(meth)acrylamide, vinyl urethane compounds, and epoxy(meth)acrylate.
本発明における上記エチレン性不飽和モノマー又はオリ
ゴマーのプライマー層中における量は10〜90重量%
であり、好ましくは20〜80重量%である。In the present invention, the amount of the ethylenically unsaturated monomer or oligomer in the primer layer is 10 to 90% by weight.
and preferably 20 to 80% by weight.
又、光重合開始剤としては、従来公知のものか使用でき
、例えばベンゾイン、ヘンジインアルキルエーテル、ベ
ンゾフェノン、アントラキノン、ベンジル、ミヒラーズ
ケトン、ビイミダゾールとミヒラーズケトンとの複合体
系等いずれも好適に用いることができる。Furthermore, as the photopolymerization initiator, any conventionally known initiator can be used, and for example, benzoin, hendiin alkyl ether, benzophenone, anthraquinone, benzyl, Michler's ketone, a complex system of biimidazole and Michler's ketone, etc. can all be suitably used. .
上記光重合開始剤のプライマー層中の量は01〜20重
量%、好ましくは02〜10重量%である。The amount of the photopolymerization initiator in the primer layer is 01 to 20% by weight, preferably 02 to 10% by weight.
本発明においてはプライマー層には上記成分に加えて必
要に応じて他の充填剤あるいはハレーション防止剤、染
料、顔料等の着色剤、塗布性改良剤、可塑剤、安定剤、
感脂化剤等を10重量%を越えない範囲で含んでも良い
。また、通常プライマー層に用いられる従来公知の種々
のポリマー、例えばポリアミド、ポリウレタン等を併用
することも可能である。In the present invention, in addition to the above components, the primer layer may contain other fillers or antihalation agents, colorants such as dyes and pigments, coating improvers, plasticizers, stabilizers,
It may also contain an oil sensitizing agent or the like in an amount not exceeding 10% by weight. It is also possible to use various conventionally known polymers, such as polyamide and polyurethane, which are usually used in primer layers.
上記プライマー層に含むことのできる染料としては、例
えばビクトリアピュアーブルーBOH。Examples of dyes that can be included in the primer layer include Victoria Pure Blue BOH.
オイルブルー# 603、オイルピンク#312、パテ
ントピュアブルー、クリスタルバイオレット、ロイコク
リスタルバイオレット、ブリリアントグリーン、エチル
バイオレット、メチルグリーン、エリスロシンB1ベイ
シックツクシン、マラカイトグリーン、ロイコマラカイ
トグリーン、m−クレゾールパープル、クレゾールレッ
ド、キシレノールブルー、ローダミンB1オーラミン、
4−p−ジエチルアミノフェニルイミノナフトキノン、
シアノ−p−ジエチルアミノフェニルアセトアニリド等
に代表されるトリフェニルメタン系、ジフェニルメタン
系、オキサジン系、キサンチン系、イミノナフトキノン
系、アゾメチン系またはアントラキノン系の色素が挙げ
られる。Oil Blue #603, Oil Pink #312, Patent Pure Blue, Crystal Violet, Leuco Crystal Violet, Brilliant Green, Ethyl Violet, Methyl Green, Erythrosin B1 Basic Tsushin, Malachite Green, Leucomalachite Green, m-Cresol Purple, Cresol Red , xylenol blue, rhodamine B1 auramine,
4-p-diethylaminophenylimino naphthoquinone,
Examples include triphenylmethane-based, diphenylmethane-based, oxazine-based, xanthine-based, iminonaphthoquinone-based, azomethine-based, and anthraquinone-based dyes represented by cyano-p-diethylaminophenylacetanilide.
塗布性向上剤としては、アルキルエーテル類(例えばエ
チルセルロー2、メチルセルロース)、フッ素系界面活
性剤類や、ノニオン系界面活性剤(例えば、プルロニッ
クL−64(旭電化社製))FC−430(住友3M製
)等が挙げられる。Examples of coating properties improvers include alkyl ethers (e.g., ethyl cellulose 2, methyl cellulose), fluorine-based surfactants, nonionic surfactants (e.g., Pluronic L-64 (manufactured by Asahi Denka)), FC-430 ( manufactured by Sumitomo 3M).
塗膜の柔軟性、耐摩耗性を付与するための可塑剤として
は、例えばブチルフタリル、ポリエチレングリコール、
クエン酸トリブチル、フタル酸ジエチル、フタル酸ジブ
チル、フタル酸ジヘキシル、フタル酸ジオクチル、リン
酸トリクレジル、リン酸トリブチル、リン酸トリオクチ
ル、オレイン酸テトラヒドラフルフリル、アクリル酸ま
たはメタクリル酸のオリゴマー等が挙げられる。Examples of plasticizers for imparting flexibility and abrasion resistance to coating films include butylphthalyl, polyethylene glycol,
Examples include tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrafurfuryl oleate, oligomers of acrylic acid or methacrylic acid, etc. .
また、画像の印刷インキ着肉性を高めるために、疎水性
基を有する各種添加剤、例えばp−オクチルフェノール
・ホルマリンノボラック樹脂、p−t−ブチルフェノー
ル・ホルマリンノボラック樹脂、p−t−ブチルフェノ
ール・ベンズアルデヒド樹脂、ロジン変性ノボラック樹
脂等の変性ノボラック樹脂、また、更にこれら変性ノボ
ラック樹脂のO−ナフトキノンジアジドスルホン酸エス
テル(OH基のエステル化率20〜70モル%)を添加
して用いることができる。In addition, in order to improve the printing ink adhesion of images, various additives having hydrophobic groups, such as p-octylphenol/formalin novolac resin, pt-butylphenol/formalin novolak resin, pt-butylphenol/benzaldehyde resin, are also used. , a modified novolak resin such as a rosin-modified novolak resin, or an O-naphthoquinonediazide sulfonic acid ester (esterification rate of OH group: 20 to 70 mol %) of these modified novolac resins can be added.
上記プライマー組成物は、顔料が含有されているような
場合、必要に応じて適当な有機溶剤で公知の分散方法(
SG■、ホモジナイザー等)で分散後、濾過される。そ
の分散液を支持体上に塗布・乾燥した後、光硬化させる
事により本発明のプライマー層が形成される。If the primer composition contains a pigment, the primer composition may be prepared using a known dispersion method (
After dispersing with a homogenizer (SG■, homogenizer, etc.), it is filtered. The primer layer of the present invention is formed by applying the dispersion onto a support, drying it, and then photocuring it.
光硬化は、水銀灯、キセノンランプ、自然光等の公知の
光源を用い、プライマー層が硬化するに充分な露光量(
通常例えば50mJ / cm〜5J/cmI″の範囲
)で露光する事によって行なうことができる。For photocuring, a known light source such as a mercury lamp, xenon lamp, or natural light is used, and the amount of exposure (
This can be carried out by exposing to light (usually in the range of 50 mJ/cm to 5 J/cmI'', for example).
また上記硬化は少なくとも感光層の塗布が終了する前進
に行なうことが望ましい。Further, it is desirable that the above-mentioned curing be performed at least in advance after the coating of the photosensitive layer is completed.
本発明においてはプライマー層の厚さは1mg/di〜
500mg/diであることが好ましく、より好ましく
は3 mg/ di 〜300mg/ drr?である
。In the present invention, the thickness of the primer layer is 1 mg/di~
It is preferably 500 mg/di, more preferably 3 mg/di to 300 mg/drr? It is.
本発明においては、前記プライマー層の上に感光層が設
けられるが本発明においては感光層としてジアゾ樹脂及
び水酸基含有ポリマーを含むものが用いられる。In the present invention, a photosensitive layer is provided on the primer layer, and in the present invention, a layer containing a diazo resin and a hydroxyl group-containing polymer is used as the photosensitive layer.
上記ジアゾ樹脂としては、例えば、フォトグラフィック
・サイエンス・アンド・エンジニアリング(Photo
、 Sci、 Eng、)第17巻、第33頁(197
3)、米国特許第2,063,631号、同第2,67
9,498号、同第3.050,502号各明細書、特
開昭59−78340号公報等にその製造方法が記載さ
れているジアゾ化合物と活性カルボニル化合物(例えば
ホルムアルデヒド、アセトアルデヒドあるいはベンズア
ルデヒド等)とを、硫酸、リン酸、塩酸等の酸性媒体中
で縮合させて得られたジアゾ樹脂、特公昭49−400
1号公報にその製造方法が記載されているジアゾ化合物
とジフェニルエーテル誘導体とを縮合反応させて得られ
るジアゾ樹脂等を使用することができる。As the diazo resin, for example, Photographic Science and Engineering (Photo
, Sci, Eng,) Volume 17, Page 33 (197
3), U.S. Patent No. 2,063,631, U.S. Patent No. 2,67
Diazo compounds and active carbonyl compounds (e.g. formaldehyde, acetaldehyde, benzaldehyde, etc.) whose production methods are described in the specifications of No. 9,498, No. 3.050,502, JP-A-59-78340, etc. Diazo resin obtained by condensing the above in an acidic medium such as sulfuric acid, phosphoric acid, or hydrochloric acid,
It is possible to use a diazo resin obtained by subjecting a diazo compound and a diphenyl ether derivative to a condensation reaction, the manufacturing method of which is described in Publication No. 1.
本発明において使用されるジアゾ樹脂の対アニオンは、
該ジアゾ樹脂と安定な塩を形成し、且つ該樹脂を有機溶
媒に可溶となすアニオンを含む。The counter anion of the diazo resin used in the present invention is
It contains an anion that forms a stable salt with the diazo resin and makes the resin soluble in organic solvents.
これらは、デカン酸及び安息香酸等の有機カルボン酸、
フェニルリン酸等の有機リン酸及びスルホン酸を含み、
典型的な例としては、メタンスルホン酸、クロロエタン
スルホン酸、ドデカンスルホン酸、ベンゼンスルホン酸
、トルエンスルホン酸、メシチレンスルホン酸及びアン
トラキノンスルホン酸、2−ヒドロキシ−4−メトキシ
ベンゾフェノン−5−スルホン酸、ヒドロキノンスルホ
ン酸、4−アセチルベンゼンスルホン酸、ジメチル−5
スルホイソフタレート等の脂肪族並びに芳香族スルホン
酸、2.2’ 、4.4’ −テトラヒドロキシベンゾ
フェノン、1,2.3−トリヒドロキシベンゾフェノン
、2.2’ 、4−トリヒドロキシベンゾフェノン等の
水酸基含有芳香族化合物、ヘキサフルオロリン酸、テト
ラフルオロホウ酸等のハロゲン化ルイス酸、C2O4、
IO4等の過ハロゲン酸等が挙げられるが、これに限ら
れるものではない。β−ナフトールとのカップリング体
をゲルパーミェーションクロマトグラフィー法(GPC
)で測定した重量平均分子量は200〜10000(ス
チレン換算)の範囲が好ましく、500〜5000の範
囲がより好ましい。These include organic carboxylic acids such as decanoic acid and benzoic acid;
Contains organic phosphoric acids and sulfonic acids such as phenyl phosphoric acid,
Typical examples include methanesulfonic acid, chloroethanesulfonic acid, dodecanesulfonic acid, benzenesulfonic acid, toluenesulfonic acid, mesitylenesulfonic acid and anthraquinonesulfonic acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, hydroquinone Sulfonic acid, 4-acetylbenzenesulfonic acid, dimethyl-5
Aliphatic and aromatic sulfonic acids such as sulfoisophthalate, hydroxyl groups such as 2.2', 4.4'-tetrahydroxybenzophenone, 1,2.3-trihydroxybenzophenone, 2.2', 4-trihydroxybenzophenone, etc. Containing aromatic compounds, halogenated Lewis acids such as hexafluorophosphoric acid and tetrafluoroboric acid, C2O4,
Examples include, but are not limited to, perhalogen acids such as IO4. The coupled product with β-naphthol was analyzed using gel permeation chromatography (GPC).
The weight average molecular weight measured in ) is preferably in the range of 200 to 10,000 (in terms of styrene), more preferably in the range of 500 to 5,000.
上記ジアゾ樹脂の感光層中に占める割合は1〜90重量
%が好ましく、更に好ましくは3〜60重量%である。The proportion of the diazo resin in the photosensitive layer is preferably 1 to 90% by weight, more preferably 3 to 60% by weight.
また、感光層に含有される水酸基含有ポリマーとしては
前記の如きプライマー層に用いられた水酸基含有ポリマ
ーと同様のものが使用できる。The hydroxyl group-containing polymer contained in the photosensitive layer may be the same as the hydroxyl group-containing polymer used in the primer layer as described above.
また、感光層には、以上に説明した各素材の他に必要に
応じて更に染料や顔料あるいは公知の露光可視画剤、塗
布性向上剤等を添加し、現像可視画性、露光可視画性及
び塗布性を向上させる事ができる。Furthermore, in addition to the above-mentioned materials, dyes, pigments, known exposure-visible image agents, coating property improvers, etc. may be added to the photosensitive layer as needed to improve the development visible image properties and exposure visible image properties. It is also possible to improve the coating properties.
感光層の膜厚は0.1mg/ di 〜30mg/ d
iか好ましく 、0.5mg/ di 〜10mg/
diかより好ましい。The thickness of the photosensitive layer is 0.1mg/di to 30mg/d
i or preferably 0.5mg/di ~ 10mg/
di is more preferable.
本発明においては上記感光層上に更にシリコーンゴム層
が設けられるか、該シリコーンゴム層に用いられるシリ
コーンゴムとしては、線状あるいはある程度架橋したオ
ルガノポリシロキサンが好ましい。該オルガノポリシロ
キサンは、分子量が通常壬ないし数十万のものであり、
常温では液体ないしはワックスまたは餅状に適度に架橋
されたものである。該オルガノポリシロキサンは架橋の
方法により縮合環と付加型に分けられる。In the present invention, a silicone rubber layer is further provided on the photosensitive layer, or the silicone rubber used in the silicone rubber layer is preferably linear or crosslinked organopolysiloxane. The organopolysiloxane usually has a molecular weight of 100,000 to several hundred thousand,
At room temperature, it is suitably cross-linked in the form of a liquid, wax, or rice cake. The organopolysiloxanes are classified into fused ring type and addition type depending on the crosslinking method.
縮合環は縮合反応によって架橋が行なわれるもので反応
によって水、アルコール、有機酸などが放出される。特
に有用な縮合環のシリコーンゴムとしては、両末端ある
いは主鎖の一部に水酸基を有する線状オルガノポリシロ
キサンとシリコーン架橋剤の混合物か、水酸基にシリコ
ーン架橋剤を反応させたものが挙げられ、いずれも縮合
触媒を加えた方か架橋速度の点で有利である。The fused ring is crosslinked by a condensation reaction, and water, alcohol, organic acid, etc. are released by the reaction. Particularly useful condensed ring silicone rubbers include a mixture of a linear organopolysiloxane having hydroxyl groups at both ends or a part of the main chain and a silicone crosslinking agent, or one in which the hydroxyl groups are reacted with a silicone crosslinking agent. In either case, the addition of a condensation catalyst is advantageous in terms of crosslinking speed.
上記オルガノポリシロキサンは主鎖に下記の繰り返し単
位を有する。The organopolysiloxane has the following repeating units in its main chain.
−(−S i −0←
式中、R1及びR2は各々シアノ基、ハロゲン原子、水
酸基等の置換基を有していてもよいアルキル、アリール
、アルケニルまたはその組み合わせでありメチル基、フ
ェニル基、ビニル基、トリフルオロプロピル基が好まし
く、特にメチル基が好ましい。-(-S i -0← In the formula, R1 and R2 are alkyl, aryl, alkenyl, or a combination thereof, each of which may have a substituent such as a cyano group, a halogen atom, or a hydroxyl group, and a methyl group, a phenyl group, A vinyl group and a trifluoropropyl group are preferred, and a methyl group is particularly preferred.
上記シリコーン架橋剤としては、
または−OH(式中、RとR′はアルキル基である)で
表わされる官能基を持つ、いわゆる脱酢酸型、脱オキシ
ム型、脱アルコール型、脱アミノ型、脱水型などの縮合
環シリコーン架橋剤が挙げられる。このような架橋剤の
例としては、テトラアセトキシシラン、メチルトリアセ
トキシシラン、エチルトリアセトキシシラン、フェニル
トリアセトキシシラン、ジメチルジアセトキシシラン、
ジエチルジアセトキシシラン、ビニルトリアセトキシシ
ラン、メチルトリメトキシシラン、ジメチルジメトキシ
シラン、ビニルトリメトキシシラン、メチルトリス(ア
セトンオキシム)シラン、メチルトリ (N−メチル、
N−アセチルアミノ)シラン、ビニルトリ (メチルエ
チルケトオキシム)シラン、メチルトリ(メチルエチル
ケトオキシム)シランまたはそのオリゴマー、イソシア
ヌレート基を有する反応性シラン化合物などを挙げるこ
とができる。The above-mentioned silicone crosslinking agents include the so-called acetic acid-removal type, oxime-elimination type, alcohol-elimination type, deamination type, dehydration type, and those having a functional group represented by -OH (in the formula, R and R' are alkyl groups). Examples include fused ring silicone crosslinking agents such as molds. Examples of such crosslinking agents include tetraacetoxysilane, methyltriacetoxysilane, ethyltriacetoxysilane, phenyltriacetoxysilane, dimethyldiacetoxysilane,
Diethyldiacetoxysilane, vinyltriacetoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, vinyltrimethoxysilane, methyltris(acetoneoxime)silane, methyltri(N-methyl,
Examples include N-acetylamino)silane, vinyltri(methylethylketoxime)silane, methyltri(methylethylketoxime)silane or its oligomer, and reactive silane compounds having an isocyanurate group.
これらの架橋剤はいずれもオルガノポリシロキサン10
0重量部に対して0.5〜30重量部の範囲とするのが
よい。All of these crosslinking agents are organopolysiloxane 10
The amount is preferably in the range of 0.5 to 30 parts by weight relative to 0 parts by weight.
前記縮合触媒としては、ジブチル錫ジラウレート、ジブ
チル錫アセテート、ジブチル錫マレエート等が挙げられ
る。Examples of the condensation catalyst include dibutyltin dilaurate, dibutyltin acetate, dibutyltin maleate, and the like.
付加型とは、本体中に不飽和基、例えばビニル基(−C
H=CH,)に架橋剤中の水素基が付加して架橋するよ
うなものを言う。Addition type refers to an unsaturated group in the main body, such as a vinyl group (-C
It refers to something that is crosslinked by the addition of a hydrogen group in a crosslinking agent to H=CH,).
具体的にはビニル基含有オルガノポリシロキサン、水素
化オルガノポリシロキサン等に白金系触媒(例えば塩化
白金酸)等を混合させたものが挙げられる。Specifically, examples include vinyl group-containing organopolysiloxanes, hydrogenated organopolysiloxanes, and the like mixed with platinum-based catalysts (for example, chloroplatinic acid).
該オルガノポリシロキサンは主鎖に前記縮合環と同様の
繰り返し単位を有する。The organopolysiloxane has a repeating unit similar to the above-mentioned condensed ring in the main chain.
シリコーンゴム層には、縮合環及び付加型シリコーンゴ
ムのいずれかあるいは両方用いる事が可能である。For the silicone rubber layer, it is possible to use either or both of a condensed ring type silicone rubber and an addition type silicone rubber.
また1つのオルガノポリシロキサンの中に水酸基、不飽
和基等を有する縮合かつ付加型のものを使用する事も可
能である。It is also possible to use condensed and addition type organopolysiloxanes having hydroxyl groups, unsaturated groups, etc. in one organopolysiloxane.
本発明に用いるシリコーンゴムとして入手しうる市販品
の内、好ましい例としては、信越■製KS−705F、
KE−41,42,44、東芝シリコーン(製)
YE5505. YF3057、東しシリコーン(製)
5H−781,PRX−305,5H−237等の縮
合環シリコーンゴム及び信越■製K S −837゜K
E−103,KE−106,KE−1300、東芝シリ
コーン(製)TSE−3032,RTU−B、東しシリ
コーン(製)SH−9555等の付加型シリコーンゴム
があげられる。Among the commercially available silicone rubbers used in the present invention, preferred examples include KS-705F manufactured by Shin-Etsu,
KE-41, 42, 44, manufactured by Toshiba Silicone (manufactured by Toshiba Silicone)
YE5505. YF3057, manufactured by Toshi Silicone (manufactured by Toshi Silicone)
Condensed ring silicone rubber such as 5H-781, PRX-305, 5H-237 and Shin-Etsu K S-837°K
Additive silicone rubbers include E-103, KE-106, KE-1300, TSE-3032, RTU-B manufactured by Toshiba Silicone, and SH-9555 manufactured by Toshi Silicone.
また、シリコーンゴムの強度を向上させる目的で、シリ
カ、酸化チタン、酸化アルミニウムなどの無機質充填剤
を添加しても良く、特にシリカは好ましく用いられる。Furthermore, for the purpose of improving the strength of silicone rubber, inorganic fillers such as silica, titanium oxide, and aluminum oxide may be added, and silica is particularly preferably used.
このような充填剤としては分散性あるいは分散安定性の
点から平均粒子径500nm以下のものが好ましい。From the viewpoint of dispersibility or dispersion stability, such fillers preferably have an average particle diameter of 500 nm or less.
本発明においてシリコーンゴム層の膜厚は、画質及び現
像性の点からは薄い程好ましく、耐刷性、印刷汚れ等の
点からは逆にある程度の厚さを必要とするため、一般に
は3mg/d耐〜50mg/d耐が好ましく、5 mg
/ d m 〜30mg/ d rr?がより好ましい
。In the present invention, the thickness of the silicone rubber layer is preferably as thin as possible from the point of view of image quality and developability, but on the other hand, a certain degree of thickness is required from the point of view of printing durability and printing stains. d resistance to 50 mg/d resistance is preferable, and 5 mg/d resistance is preferable.
/dm ~30mg/drr? is more preferable.
更に本発明の湿し水不要感光性平版印刷版はシリコーン
ゴム層の上に保護層を設けても良く、該保護層を設ける
方法として特公昭61−614号に記載のポリプロピレ
ンフィルム等をラミネートする方法や特開昭61−27
545号に記載の高分子重合体を塗布する方法等が知ら
れている。Further, the photosensitive lithographic printing plate that does not require dampening water of the present invention may have a protective layer on the silicone rubber layer, and a method for providing the protective layer is to laminate a polypropylene film or the like as described in Japanese Patent Publication No. 61-614. Method and JP-A-61-27
A method of coating a high molecular weight polymer described in No. 545 is known.
本発明において用いられる基板としては、通常の平版印
刷機にセットできるたわみ性を有し、印刷時にかかる荷
重に耐えうるちのであればいかなるものも用いることが
でき、層構成も含めて特に制限されない。例えば、コー
ト紙などの紙類、アルミニウム板などの金属板、あるい
は、ポリエチレンテレフタレートなどのプラスチックフ
ィルムを例として挙げることができるが、アルミニウム
板、又は、アルミニウム箔と他の複合材が好ましく、耐
刷性の点から、アルミニウム板が特に好ましい。As the substrate used in the present invention, any substrate can be used as long as it has the flexibility to be set in a normal lithographic printing machine and can withstand the load applied during printing, and there are no particular restrictions on the substrate including the layer structure. . For example, paper such as coated paper, metal plate such as aluminum plate, or plastic film such as polyethylene terephthalate can be cited as examples, but aluminum plate or a composite material of aluminum foil and other materials is preferable and has a long printing life. From the viewpoint of properties, aluminum plates are particularly preferred.
本発明においては、上述の如く作製した感光性平版印刷
版を像様露光した後、現像液で現像して感光層を溶解し
、その上のシリコーンゴム層と共に除去した結果プライ
マー層が画像部として露出し、水なし平版が形成される
。In the present invention, the photosensitive lithographic printing plate prepared as described above is imagewise exposed, developed with a developer to dissolve the photosensitive layer, and removed together with the silicone rubber layer thereon, resulting in the primer layer forming an image area. Exposure and a waterless lithography is formed.
この場合、現像時あるいは現像後に染料により画像部を
染色することが好ましい。In this case, it is preferable to dye the image area with a dye during or after development.
このような染色には水を主成分として、染料を必須成分
として含む染色液が用いられる。For such dyeing, a dyeing solution containing water as a main component and a dye as an essential component is used.
好ましい染料としては、具体的には以下のような酸性染
料又は塩基性染料が挙げられる。Preferred dyes include specifically the following acidic dyes and basic dyes.
酸性染料としては、ニトロ染料、例えばナフトール・イ
エロー(c、r、アシッド・イエロー1)、モノアゾ染
料、例えばファースト・レッドA (C。Acidic dyes include nitro dyes, such as naphthol yellow (C, R, Acid Yellow 1), monoazo dyes, such as Fast Red A (C.
■、アシッド・レッド88)、ジスアゾ染料、例えばナ
フトール・ブルーブラック(C,1,アシッド・ブラッ
ク1)、ニトロソ染料、例えばナフトール・グリーンB
(C,1,アシッド・グリーン1)、トリフェニルメ
タン染料、例えばパテント・ブルー(C,1,アシッド
・ブルー3)、ブリリアント・ミリング・グリーンB
(C,1,アシッド・グリーン9)、キサンチン染料、
例えばスルホ・ローダミナB (C,1,アシッド・レ
ッド52)、アントラキノン染料、例えばアリザリン・
デイレクト・ブルーA2G(C,Iアシッド・ブルー4
0)、アジン染料、例えばウールファースト・ブルーG
L (C,1,アシッド・ブルー102) 、キノリン
染料、例えばキノリン・イエロー(C,Iアシッド・イ
エロー3)等が挙げられ、好ましい塩基性染料としては
、具体的には、以下のものが挙げられる。■, Acid Red 88), disazo dyes such as naphthol blue black (C,1, acid black 1), nitroso dyes such as naphthol green B
(C,1, Acid Green 1), triphenylmethane dyes such as Patent Blue (C,1, Acid Blue 3), Brilliant Milling Green B
(C, 1, acid green 9), xanthine dye,
For example, sulforhodamina B (C,1, acid red 52), anthraquinone dyes, such as alizarin.
Direct Blue A2G (C, I Acid Blue 4
0), azine dyes such as Woolfast Blue G
L (C, 1, Acid Blue 102), quinoline dyes, such as Quinoline Yellow (C, I Acid Yellow 3), etc., and preferable basic dyes include, specifically, the following: It will be done.
ジフェニルメタン染料、例えばオーラミンO(C,1,
ベーシック・イエロー2)、トリフェニルメタン染料、
例えばマゼンタ(C,1,ベーシック・バイオレット1
4)、メチル・バイオレット(C,I。Diphenylmethane dyes, such as auramine O (C,1,
Basic Yellow 2), triphenylmethane dye,
For example, magenta (C, 1, basic violet 1
4), Methyl Violet (C,I.
ベーシック・バイオレット1)、マラカイト・グリーン
(C,1,ベーシック・グリーン4)、チアゾール染料
、例えばチオフラビンT (C,Iベーシック・イエロ
ー1)、キサンチン染料、例えばローダミンB (C,
1,ベーシック・バイオレット10)、オキザジン染料
、例えばニール・ブルーBX(C。Basic Violet 1), malachite green (C,1, Basic Green 4), thiazole dyes such as Thioflavin T (C,I Basic Yellow 1), xanthine dyes such as Rhodamine B (C,
1, Basic Violet 10), oxazine dyes such as Neil Blue BX (C.
■、ベーシック・ブルー12)、チアジン染料、例えば
メチレン・ブルーB (C,Iベーシック・ブルー9)
、アジン染料、例えばサフラニンT (C,1,ベーシ
ック・レッド2)、アゾ染料、例えばビスマーり・ブラ
ウンG (C,1,ベーシック・ブラウン1)、インド
シアニン染料、例えばアストラフラキシンFF(C,1
,ベーシック・レッド12)等。本発明においては、特
にトリフェニルメタン系染料が好ましく用いられる。こ
れらの染料は、水溶液で用いられ、その濃度は0.1g
、、’x〜10g/ 1が好ましい。■, Basic Blue 12), thiazine dyes, such as methylene blue B (C, I Basic Blue 9)
, azine dyes such as Safranine T (C,1, Basic Red 2), azo dyes such as Bismary Brown G (C,1, Basic Brown 1), indocyanine dyes such as Astrafracin FF (C, 1
, Basic Red12) etc. In the present invention, triphenylmethane dyes are particularly preferably used. These dyes are used in aqueous solution, the concentration of which is 0.1 g
,,'x~10g/1 is preferable.
本発明では、これらの染料水溶液を用いて染色する場合
、その濃度は10℃〜50℃である。また染色方法は、
現像後の印刷版を染色液へ浸漬するか、または該印刷版
上に染料水溶液を塗布もしくはシャワー散布することに
より行われる。この染料水溶液には必要に応じて染色助
剤を添加することができる。In the present invention, when dyeing is performed using these dye aqueous solutions, the concentration thereof is 10°C to 50°C. In addition, the dyeing method is
This is carried out by immersing the developed printing plate in a dye solution, or by coating or shower-spraying an aqueous dye solution onto the printing plate. A dyeing aid can be added to this aqueous dye solution as required.
染色助剤としては、プライマー層を染色しやすくするた
め、水溶性の有機溶剤や界面活性剤等が用いられる。As the dyeing aid, a water-soluble organic solvent, a surfactant, etc. are used in order to facilitate dyeing of the primer layer.
有機溶剤としては、エタノール、ツルフィツト、ベンジ
ルアルコール等が好ましく用いられ、界面活性剤として
はノニオン系が発泡性の点で好ましい。As the organic solvent, ethanol, tulfite, benzyl alcohol, etc. are preferably used, and as the surfactant, nonionic surfactants are preferred from the viewpoint of foaming properties.
露光に用いられる光源としては、180mm以上の紫外
線、可視光線を含む汎用の光源ならばどのようなもので
も良いが、特にカーボンアーク灯、水銀灯、キセノンラ
ンプ、メタルハライドランプ、ストロボ等がよい。As the light source used for exposure, any general-purpose light source including ultraviolet rays of 180 mm or more and visible light may be used, but carbon arc lamps, mercury lamps, xenon lamps, metal halide lamps, strobes, etc. are particularly preferred.
現像は、例えば上記のような現像液を含む現像用パッド
でこすったり、現像液を版面に注いだ後に現像ブラシで
こするなど、公知の種々の方法で行なうことができる。Development can be carried out by various known methods, such as rubbing with a developing pad containing a developer as described above, or pouring a developer onto the printing plate and then rubbing with a developing brush.
[実施例]
以下本発明を実施例により更に詳述するが本発明は実施
例に限定されるものではない。[Examples] The present invention will be described in more detail below with reference to Examples, but the present invention is not limited to the Examples.
(ジアゾ樹脂−1の合成)
p−ジアゾジフェニルアミン硫酸塩14.5gを水冷下
で40.9gの濃硫酸に溶解した。この反応液に1、O
gのパラホルムアルデヒドを反応温度が10℃を越えな
いようにゆっくり滴下した。その後、2時間水冷下にて
攪拌を続けた。この反応混合物を水冷下、500m1の
エタノールに滴下し、生じた沈澱を濾過した。エタノー
ルで洗浄後、この沈澱物を100m(lの純水に溶解し
、この液に6.8gの塩化亜鉛を溶解した冷濃厚水溶液
を加えた。生じた沈澱を濾過した後、エタノールで洗浄
し、これを150m、9の純水に溶解した。この液に、
8gのへキサフルオロリン酸アンモニウムを溶解した冷
濃厚水溶液を加えた。生じた沈澱を濾取し水洗した後、
30℃で一昼夜乾燥してジアゾ樹脂−1を得た。(Synthesis of Diazo Resin-1) 14.5 g of p-diazodiphenylamine sulfate was dissolved in 40.9 g of concentrated sulfuric acid under water cooling. This reaction solution contains 1, O
g of paraformaldehyde was slowly added dropwise so that the reaction temperature did not exceed 10°C. Thereafter, stirring was continued for 2 hours under water cooling. This reaction mixture was added dropwise to 500 ml of ethanol under water cooling, and the resulting precipitate was filtered. After washing with ethanol, this precipitate was dissolved in 100 ml (l) of pure water, and a cold concentrated aqueous solution containing 6.8 g of zinc chloride was added to this solution. After filtering the formed precipitate, it was washed with ethanol. , this was dissolved in 150 m, 9 pure water.In this solution,
A cold concentrated aqueous solution of 8 g of ammonium hexafluorophosphate was added. After filtering the resulting precipitate and washing with water,
Diazo resin-1 was obtained by drying at 30°C for one day.
β−ナフトールとのカップリング物をGPC法で測定し
た該ジアゾ樹脂のスチレン換算の重量平均分子量(Mw
)は1500、数平均分子量は500であった。The styrene-equivalent weight average molecular weight (Mw
) was 1500, and the number average molecular weight was 500.
実施例−1
厚さ0,24闘の化成処理されたアルミニウム基板(三
菱アルミ■製)上に下記プライマー層組成物をホワラー
により60℃で塗布し、100°Cで2分乾燥させプラ
イマー層を設けた。乾燥膜厚は、130mg/ a r
r?であった。Example-1 The following primer layer composition was applied at 60°C using a whirler on a chemically treated aluminum substrate (manufactured by Mitsubishi Aluminum) with a thickness of 0.24mm, and dried at 100°C for 2 minutes to form a primer layer. Established. Dry film thickness is 130mg/a r
r? Met.
尚、プライマー層組成物の分散は、高圧バルブホモジナ
イザーによって行なった。The primer layer composition was dispersed using a high-pressure bulb homogenizer.
(プライマー層組成物)
(1)2−ヒドロキシエチルメタクリレート、メチルメ
タクリレートのモル比34766の共重合樹脂(Mw=
4.OX to’) 100部(2)ペンタ
エリスリトール・トリアクリレート60部
(3) DA−314(ナガセ化成■)20部(4)D
ETX
(5)EPA
3部
(6)KET−YELLOW402
(犬日本インキ■製 黄色顔料) 8部(7)酸化
亜鉛(平均粒径: 0.12μ)20部(8) T S
L 8331 (H2N(CH2)3si(OEt
)s)10部
(9)乳酸メチル 600部塗布乾
燥後、ユニキュア(ウシオ電機■製)−160W、
4m/分で露光を行なった。(Primer layer composition) (1) Copolymer resin of 2-hydroxyethyl methacrylate and methyl methacrylate in a molar ratio of 34,766 (Mw=
4. OX to') 100 parts (2) Pentaerythritol triacrylate 60 parts (3) DA-314 (Nagase Kasei ■) 20 parts (4) D
ETX (5) EPA 3 parts (6) KET-YELLOW402 (yellow pigment manufactured by Inu Nippon Ink ■) 8 parts (7) Zinc oxide (average particle size: 0.12μ) 20 parts (8) T S
L 8331 (H2N(CH2)3si(OEt
) s) 10 parts (9) Methyl lactate 600 parts After coating and drying, Unicure (manufactured by Ushio Denki ■) -160W,
Exposure was carried out at 4 m/min.
次に上記プライマー層上に下記の組成の感光性組成物を
塗布し、80℃で2分間乾燥して厚さ03μmの感光層
を形成した。Next, a photosensitive composition having the composition shown below was coated on the primer layer and dried at 80° C. for 2 minutes to form a photosensitive layer having a thickness of 03 μm.
(感光性組成物)
(1)ジアゾ樹脂−1100部
(2)2−ヒドロキシエチルメタクリレート、N−(4
−ヒドロキシフェニル)メタクリルアミド、メタクリル
酸のモル比40/ 5515の共重合樹脂−2(Mw=
4.2X 10’)100部
(3)オレンジ■8部
(4)乳酸メチル 900部次い
で上記感光層上に下記シリコーンゴム組成物を厚さ2.
0g/mになるように塗布し、100℃で4分間乾燥し
た。(Photosensitive composition) (1) Diazo resin - 1100 parts (2) 2-hydroxyethyl methacrylate, N-(4
Copolymer resin-2 (Mw=
4.2X 10') 100 parts (3) Orange 8 parts (4) Methyl lactate 900 parts Next, the following silicone rubber composition was applied to the photosensitive layer to a thickness of 2.
It was coated at a concentration of 0 g/m and dried at 100° C. for 4 minutes.
(シリコーンゴム層組成物)
(1)両末端に水酸基を有するジメチルポリシロキサン
(分子j152,000) 100部(2)
下記反応性シラン化合物
(3)ジブチル錫ジラウレート 0.8部(4
)アイソパーE(エッソ化学製)900部次に、上記シ
リコーンゴム層上に厚さ6μの片面マット化ポリプロピ
レンフィルムをラミネートし、湿し水不要感光性平版印
刷版試料を得た。(Silicone rubber layer composition) (1) 100 parts (2) of dimethylpolysiloxane having hydroxyl groups at both ends (molecule j152,000)
The following reactive silane compound (3) dibutyltin dilaurate 0.8 part (4
) Isopar E (manufactured by Esso Chemical) 900 parts Next, a single-sided matted polypropylene film having a thickness of 6 μm was laminated on the silicone rubber layer to obtain a photosensitive lithographic printing plate sample that did not require dampening water.
上記の版材料の上面にポジフィルムを真空密着させた後
、光源としてメタルハライドランプを用いて400mJ
/Cm露光した。次いで、表1に示す現像液I〜■の各
々に1分間浸漬した後、版材料の表面を現像液を染み込
ませたパッドで擦ることにより、未露光部分のシリコー
ンゴム層と感光層を除去した。After vacuum-adhering a positive film to the top surface of the above plate material, a metal halide lamp was used as a light source to produce 400 mJ.
/Cm exposure. Next, after being immersed for 1 minute in each of the developers I to ■ shown in Table 1, the surface of the plate material was rubbed with a pad impregnated with the developer to remove the silicone rubber layer and photosensitive layer in the unexposed areas. .
得られた印刷版試料の各々について下記の方法にて耐傷
性及び染色性を調べた。Each of the obtained printing plate samples was examined for scratch resistance and dyeability using the following method.
耐傷性:現像直後の試料の非画線部の版面上に新東科学
■製、連続加重式引掻強度試験機へイドン18により、
直径0.2mmのサファイア針を用いて、傷がつき始め
る荷重を評価した。Scratch resistance: Immediately after development, the non-image area of the sample was tested using a continuously weighted scratch strength tester Heidon 18 manufactured by Shinto Kagaku ■.
Using a sapphire needle with a diameter of 0.2 mm, the load at which scratches began was evaluated.
染色性:印刷版の画線部を下記組成の染色液を含んだ布
で軽くこすった後、水洗して染色具合を目視で評価した
。Dyeability: After lightly rubbing the image area of the printing plate with a cloth containing a dyeing liquid having the composition shown below, the cloth was washed with water and the degree of dyeing was visually evaluated.
(染色液)
ツルフィツト
(クラレイソプレン化学■製 溶剤)20部レしドール
T W −0120
(花王■製 界面活性剤)0.5部
ベンジルアルコール 5.0部ビクト
リアピュアブルーB OH1,0部水
100部また、各感光
性平版印刷版試料について、下記の方法にて感度及び画
像再現性を評価した。(Staining liquid) Tsurfit (manufactured by Kuraray Soprene Chemical ■, solvent) 20 parts Residor T W-0120 (manufactured by Kao ■, surfactant) 0.5 parts Benzyl alcohol 5.0 parts Victoria Pure Blue B OH 1.0 parts water
100 copies Each photosensitive lithographic printing plate sample was also evaluated for sensitivity and image reproducibility using the following method.
感 度二版材料の上面にステップタブレ・ソドを真空密
着させた後、光源としてメタルハライドランプを用いて
400mJ/cm露光した。上記のように現像、染色し
、染色された最大ステップ段数を感度とした。After a step table lamp was vacuum-adhered to the upper surface of the sensitive second plate material, it was exposed to light at 400 mJ/cm using a metal halide lamp as a light source. The sample was developed and dyed as described above, and the maximum number of dyed steps was defined as the sensitivity.
画像再現性二版材料の上面にウグラチャートを真空密着
させた後、光源としてメタルノーライドランプを用いて
400m J / cm露光した。上記のように現像、
染色し、網点が再現する領域を画像再現性とした。Image reproducibility After the Ugra chart was vacuum-adhered to the upper surface of the second plate material, it was exposed to light at 400 mJ/cm using a metal noride lamp as a light source. Develop as above,
The area where the halftone dots are reproduced after dyeing was defined as the image reproducibility.
以上結果を表1に示す。The above results are shown in Table 1.
更に、現像液■〜■の各々について臭気及び下記方法に
て発泡性とヘドロ発生を評価した。その結果をあわせ表
1に示す。Furthermore, each of the developing solutions (1) to (2) was evaluated for odor, foaming property, and sludge generation using the following methods. The results are shown in Table 1.
発泡性:各現像液を激しく攪拌し、発泡の程度を評価し
た。Foaming property: Each developer was vigorously stirred and the degree of foaming was evaluated.
ヘドロ発生:現像液12当たり湿し水感光性平版印刷版
試料の50耐に相当する感光層を現像液に溶解し、ヘド
ロの発生程度を評価した。Sludge generation: A photosensitive layer corresponding to 50 durability of a dampening water-sensitive lithographic printing plate sample was dissolved in the developer per 12 developer solutions, and the degree of sludge generation was evaluated.
*1;組成において(
*2 ; New Cool B4SN:)内は現像液
中のmm%
*3;染色性 ○;非常に良好な染色程度@;若干
染色性が劣る程度
×;染色されない
実施例−2
実施例−1で得た版の非画線部の版面上に新菜科学■社
製連続加重式引掻強度試験機へイドン18により、直径
0.2mmのサファイア針を用いて荷重50gで傷をつ
けた後、湿し水供給装置をはずした。*1; In the composition, (*2; New Cool B4SN:) indicates mm% in the developer *3; Stainability ○; Very good degree of staining @; Slightly poor degree of stainability ×; Example not stained. 2 The non-printing area of the plate obtained in Example-1 was tested using a continuous load type scratch strength tester Heidon 18 manufactured by Niina Kagaku ■ at a load of 50 g using a sapphire needle with a diameter of 0.2 mm. After making the wound, the dampening water supply device was removed.
ハイデルGTO(ハイデル社製)にて、東洋インキ製造
■製アクアレスファイブTPMインキを使用して10,
000枚印刷したところ、地汚れや傷のない良好な印刷
物を得る事ができた。At Heidel GTO (manufactured by Heidel), using Aquares Five TPM ink manufactured by Toyo Ink Manufacturing ■, 10,
After printing 1,000 sheets, it was possible to obtain good printed matter without background smudges or scratches.
実施例−3
実施例−1の現像液Iにコニカ■製ポジ型PS版SMP
−Nを1分間浸漬し、軽くこすったところ、地汚れのな
い良好な画像を得ることができた。Example-3 Positive-type PS plate SMP manufactured by Konica ■ was added to the developer I of Example-1.
-N was immersed for 1 minute and rubbed lightly, and a good image without background stains could be obtained.
[発明の効果]
以上詳細に説明したように、本発明により、臭気がほと
んどなく、ヘドロの発生か少なく、かつ発泡を抑制しう
る湿し水不要感光性平版印刷版用現像液を提供すること
ができる。また、本発明により、優れた耐傷性、画質及
び染色性を得ることのできる湿し水不要感光性平版印刷
版用現像液を提供することができる。更に、本発明によ
り、ポジ型感光性平版印刷版の現像も併用して行なうこ
とのできる湿し水不要感光性平版印刷版用現像液を提供
することができる。[Effects of the Invention] As described above in detail, the present invention provides a developer for photosensitive lithographic printing plates that does not require dampening water and has almost no odor, generates little sludge, and can suppress foaming. I can do it. Further, according to the present invention, it is possible to provide a developer for photosensitive lithographic printing plates that does not require dampening water and can provide excellent scratch resistance, image quality, and dyeing properties. Furthermore, the present invention can provide a developer for photosensitive lithographic printing plates that does not require dampening water and can also be used to develop positive-working photosensitive lithographic printing plates.
特許出願人 三菱化成株式会社(他1名)代 理 人
弁理士 市之瀬 宮夫Patent applicant Mitsubishi Kasei Corporation (1 other person) Agent
Patent Attorney Miyao Ichinose
Claims (1)
層、感光層およびシリコーンゴム層をこの順に有し、か
つ該感光層が少なくとも水酸基含有ポリマーとジアゾ樹
脂を含有する湿し水不要感光性平版印刷版に用いられる
現像液であって、少なくとも、水、アルカリ及び水に対
する溶解度が20重量%以上の有機溶剤、を含有するこ
とを特徴とする湿し水不要感光性平版印刷版用現像液。A dampening water-free photosensitive lithographic printing plate having on a substrate at least a photopolymerizable primer layer, a photosensitive layer and a silicone rubber layer in this order from the substrate side, and the photosensitive layer containing at least a hydroxyl group-containing polymer and a diazo resin. 1. A developer for a photosensitive lithographic printing plate that does not require a dampening solution and is characterized by containing at least water, an alkali, and an organic solvent having a solubility in water of 20% by weight or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16487390A JPH0456858A (en) | 1990-06-22 | 1990-06-22 | Developer for dampening waterless photosensitive planographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16487390A JPH0456858A (en) | 1990-06-22 | 1990-06-22 | Developer for dampening waterless photosensitive planographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0456858A true JPH0456858A (en) | 1992-02-24 |
Family
ID=15801548
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16487390A Pending JPH0456858A (en) | 1990-06-22 | 1990-06-22 | Developer for dampening waterless photosensitive planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0456858A (en) |
-
1990
- 1990-06-22 JP JP16487390A patent/JPH0456858A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH04247458A (en) | Photosensitive material for damping waterless planographic plate | |
JPH0456858A (en) | Developer for dampening waterless photosensitive planographic printing plate | |
JP2894631B2 (en) | No fountain solution photosensitive lithographic printing plate | |
EP0394924B1 (en) | Photosensitive lithographic printing plate requiring no wetting water | |
JPH04190359A (en) | Photosensitive planographic printing plate needing no damping water | |
JPH03174538A (en) | Photosensitive planographic printing plate requiring no dampening water and production thereof | |
JPS6154223B2 (en) | ||
JPH04190358A (en) | Photosensitive planographic printing plate needing no damping water | |
JPH03291655A (en) | Production of damping waterless photosensitive planographic printing plate | |
JPH0456859A (en) | Dampening waterless photosensitive planographic printing plate | |
JPH04243260A (en) | Damping waterless photosensitive planographic printing plate | |
JPH04125645A (en) | Dampening waterless photosensitive planographic printing plate | |
JPH03274556A (en) | Dampening waterless photosensitive planographic printing plate | |
JPH04113895A (en) | Photosensitive lithographic printing plate without requirement for wetting water | |
JPH04139451A (en) | Dampening waterless photosensitive planographic printing plate | |
JPH03291657A (en) | Production of damping waterless photosensitive planographic printing plate | |
JPH04235555A (en) | Dampening water-free plate for planography | |
JPH03276155A (en) | Photosensitive planographic printing plate requiring no dampening water | |
JPH04190360A (en) | Photosensitive planographic printing plate needing no damping water | |
JPH02282257A (en) | Damping-waterless photosensitive planographic printing plate | |
JPH03182754A (en) | Photosensitive planographic printing plate requiring no dampening water | |
JPH03280052A (en) | Dampening-waterless photosensitive planographic printing plate and production thereof | |
JPH03293669A (en) | Dampening-waterless photosensitive planographic printing plate | |
JPH03280051A (en) | Dampening-waterless photosensitive planographic printing plate | |
JPH04107557A (en) | Erasing liquid for dampening waterless photosensitive planographic printing plate and erasing method formed by using this erasing liquid |