JPH0453061U - - Google Patents

Info

Publication number
JPH0453061U
JPH0453061U JP9692490U JP9692490U JPH0453061U JP H0453061 U JPH0453061 U JP H0453061U JP 9692490 U JP9692490 U JP 9692490U JP 9692490 U JP9692490 U JP 9692490U JP H0453061 U JPH0453061 U JP H0453061U
Authority
JP
Japan
Prior art keywords
cathode
target
workpiece
conveyance
conveyance means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9692490U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9692490U priority Critical patent/JPH0453061U/ja
Publication of JPH0453061U publication Critical patent/JPH0453061U/ja
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図はこの考案の第1実施例に係
るスパツタリング装置を示し、第1図は全体の概
略平面図、第2図は第1図における−線断面
図である。第3図は支持手段を変更した第2実施
例を示す縦断側面図である。 1……真空槽、2……搬送手段、4……ワーク
、7……カソード、8……ターゲツト、9……支
持手段。
1 and 2 show a sputtering apparatus according to a first embodiment of the invention, with FIG. 1 being a schematic plan view of the entire device, and FIG. 2 being a sectional view taken along the line -- in FIG. FIG. 3 is a longitudinal sectional side view showing a second embodiment in which the supporting means is changed. DESCRIPTION OF SYMBOLS 1...Vacuum chamber, 2...Transporting means, 4...Work, 7...Cathode, 8...Target, 9...Supporting means.

Claims (1)

【実用新案登録請求の範囲】 真空槽の内部にワークを一方向へ向かつて移送
する搬送手段が設けられ、 成膜物質を面状に放射するターゲツトが前記搬
送手段に沿つて複数個設けられており、 ターゲツトが装着されるカソードを支持手段で
変向可能に支持し、 ターゲツトの放射方向がワークの搬送面に対し
て交差方向へ変向設定できるよう構成されている
スパツタリング装置。
[Scope of Claim for Utility Model Registration] A conveyance means is provided inside a vacuum chamber to transport the workpiece in one direction, and a plurality of targets are provided along the conveyance means for emitting a film-forming substance in a planar manner. A sputtering device comprising: a cathode on which a target is mounted; and a support means that supports the cathode so that the direction thereof can be changed, so that the radial direction of the target can be set to be perpendicular to the conveyance surface of the workpiece.
JP9692490U 1990-09-13 1990-09-13 Pending JPH0453061U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9692490U JPH0453061U (en) 1990-09-13 1990-09-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9692490U JPH0453061U (en) 1990-09-13 1990-09-13

Publications (1)

Publication Number Publication Date
JPH0453061U true JPH0453061U (en) 1992-05-06

Family

ID=31836858

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9692490U Pending JPH0453061U (en) 1990-09-13 1990-09-13

Country Status (1)

Country Link
JP (1) JPH0453061U (en)

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