JPH0448542U - - Google Patents

Info

Publication number
JPH0448542U
JPH0448542U JP9079890U JP9079890U JPH0448542U JP H0448542 U JPH0448542 U JP H0448542U JP 9079890 U JP9079890 U JP 9079890U JP 9079890 U JP9079890 U JP 9079890U JP H0448542 U JPH0448542 U JP H0448542U
Authority
JP
Japan
Prior art keywords
substrate
substrate holder
light source
light
parallel rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9079890U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9079890U priority Critical patent/JPH0448542U/ja
Publication of JPH0448542U publication Critical patent/JPH0448542U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図は本実施例の露光装置の説明模式図、第
２図は従来の露光装置の説明模式図、第３図は第
２図の露光装置で曲面基板を露光した場合の説明
模式図である。 １……光源、２……集光ミラー、３……レンズ
、４……スリツト、６……ガラス基板、１０……
基板ホルダー、１１……歯車、１３……歯車、１
４……モーター。

Claims (1)

  1. 【実用新案登録請求の範囲】 曲面形状の基板を載置固定する基板ホルダーと
    、該基板ホルダーに固定された該基板の曲率中心
    を中心として該基板ホルダーを一定速度で回転さ
    せる回転手段と、 光源と該光源からの光を平行光線とする平行化
    部と該基板ホルダーの回転方向に対して横切る方
    向に延び該平行化部からの平行光線を所定の幅で
    該基板に照射するスリツトとからなる光照射機構
    と、から構成されていることを特徴とする曲面基
    板用露光装置。
JP9079890U 1990-08-29 1990-08-29 Pending JPH0448542U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9079890U JPH0448542U (ja) 1990-08-29 1990-08-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9079890U JPH0448542U (ja) 1990-08-29 1990-08-29

Publications (1)

Publication Number Publication Date
JPH0448542U true JPH0448542U (ja) 1992-04-24

Family

ID=31825835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9079890U Pending JPH0448542U (ja) 1990-08-29 1990-08-29

Country Status (1)

Country Link
JP (1) JPH0448542U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07147218A (ja) * 1992-11-12 1995-06-06 Internatl Business Mach Corp <Ibm> ３次元結像システムおよび方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4885140A (ja) * 1972-02-14 1973-11-12
JPS52111432A (en) * 1976-03-16 1977-09-19 Pilot Precision Exposing method in photooetching

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4885140A (ja) * 1972-02-14 1973-11-12
JPS52111432A (en) * 1976-03-16 1977-09-19 Pilot Precision Exposing method in photooetching

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07147218A (ja) * 1992-11-12 1995-06-06 Internatl Business Mach Corp <Ibm> ３次元結像システムおよび方法

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