JPH044690B2 - - Google Patents
Info
- Publication number
- JPH044690B2 JPH044690B2 JP58014309A JP1430983A JPH044690B2 JP H044690 B2 JPH044690 B2 JP H044690B2 JP 58014309 A JP58014309 A JP 58014309A JP 1430983 A JP1430983 A JP 1430983A JP H044690 B2 JPH044690 B2 JP H044690B2
- Authority
- JP
- Japan
- Prior art keywords
- emitter
- thermionic
- filament
- control electrode
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000605 extraction Methods 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 5
- 230000000694 effects Effects 0.000 description 5
- 230000005684 electric field Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
- H01J2237/06316—Schottky emission
Description
【発明の詳細な説明】
本発明は加熱陰極型電界放出電子銃の改良に関
する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in heated cathode field emission electron guns.
高輝度の電子線発生源として用いられる電界放
出電子銃は、冷陰極型のものと加熱陰極型のもの
に大別され、加熱陰極型電界放出電子銃における
電子銃室内部の電極配置を第1図に示す。第1図
において、絶縁碍子1を貫通する2本のステム2
の下端には夫々ヘアピン型タングステンフイラメ
ント3の両端が溶接されており、更にフイラメン
ト尖端部にはエミツタ4が溶接されている。エミ
ツタ4の下方にはエミツタ尖端部に強電界を発生
させるための引出し電極5が設けられ、その下方
には接地電位の陽極6が配置される。エミツタ4
と引出し電極5及び陽極6の間には電源7,8に
よつて夫々エミツタ4に対してVe,Vaの電圧が
印加されており、フイラメント両端間には加熱電
源9の出力電流が供給されるように構成されてい
る。このような構成により、フイラメントに通電
してエミツタ4を1500〜1800〓に加熱しながら電
界放出を行うと、エミツタ尖端へのガス吸着が少
く抑えられ、電子銃室内の真空度が冷陰極形電界
放出電子銃と同程度であれば、より長時間に亘つ
て安定な電界放出電流が得られるという利点があ
る。しかしながら、フイラメント加熱に伴いエミ
ツタ尖端部から電界放出によつて発生する電子A
(その放出電流値をIaとする)以外にエミツタの
側面やフイラメント3から熱電子B(その放出電
流値をIbとする)が放出され、陰極から放出され
る全電流値に占める割合が数10%に達することも
ある。これらの熱電子はその殆んどが引出し電極
5や陽極6を通過することができず、電子銃から
取り出される電子線には寄与しない。従つて、熱
電子Bは引出し電極5のエミツタと対向する表面
を照射して引出し電極から吸着ガスを放出させる
ことのみに寄与することになり、加熱型電界放出
電子銃の動作を不安定にする原因となつていた。 Field emission electron guns used as sources of high-intensity electron beams are broadly classified into cold cathode type and heated cathode type. As shown in the figure. In FIG. 1, two stems 2 passing through an insulator 1 are shown.
Both ends of a hairpin type tungsten filament 3 are welded to the lower end of each, and an emitter 4 is further welded to the tip of the filament. An extraction electrode 5 for generating a strong electric field at the tip of the emitter 4 is provided below the emitter 4, and an anode 6 having a ground potential is arranged below the extraction electrode 5. Emitsuta 4
Between the extraction electrode 5 and the anode 6, voltages Ve and Va are applied to the emitter 4 by power supplies 7 and 8, respectively, and an output current of a heating power supply 9 is supplied between both ends of the filament. It is configured as follows. With this configuration, when electric field is emitted while the filament is energized and the emitter 4 is heated to 1,500 to 1,800 degrees, gas adsorption to the tip of the emitter can be suppressed to a minimum, and the degree of vacuum in the electron gun chamber can be reduced to a cold cathode type electric field. If it is comparable to the emission electron gun, it has the advantage that a stable field emission current can be obtained over a longer period of time. However, electrons A are generated by field emission from the emitter tip as the filament is heated.
In addition to (its emission current value is Ia), thermionic electrons B (its emission current value is Ib) are emitted from the side of the emitter and the filament 3, and their proportion to the total current value emitted from the cathode is several dozen. It can even reach %. Most of these thermoelectrons cannot pass through the extraction electrode 5 or the anode 6, and do not contribute to the electron beam extracted from the electron gun. Therefore, the thermionic electrons B only contribute to emitting adsorbed gas from the extraction electrode by irradiating the surface of the extraction electrode 5 facing the emitter, making the operation of the heated field emission electron gun unstable. It was the cause.
本発明はこのような問題を解決して、熱電子に
よる悪影響を低く抑えた加熱型電界放出電子銃を
提供することを目的とするもので、その構成はヘ
アピン状フイラメントの尖端部に取り付けられた
エミツタと該エミツタを1500〓以上に加熱する電
流を前記フイラメントに供給する加熱電源と、エ
ミツタ下方に設けられ接地電位に保たれた陽極
と、エミツタに負の高電位を与える電源と、前記
陽極とエミツタ間に設けられエミツタに対して正
の電圧Veが印加される引出し電極を備えた装置
において、エミツタに対して0<Vc<Veの条件
を満たす電圧Vcの与えられる熱電子制御電極を
設け、該熱電子制御電極の下端面が前記エミツタ
下端部よりも上方に配置され、熱電子制御電極の
開口部の径が前記フイラメントにおける熱電子放
出領域の長さよりも小さくなるように構成したこ
とを特徴とするものである。 The purpose of the present invention is to solve these problems and provide a heated field emission electron gun that suppresses the adverse effects of thermionic electrons. an emitter; a heating power source that supplies the filament with a current that heats the emitter to a temperature of 1500°C or more; an anode provided below the emitter and kept at ground potential; a power source that applies a negative high potential to the emitter; In a device equipped with an extraction electrode provided between emitters and to which a positive voltage Ve is applied to the emitter, a thermionic control electrode is provided to which a voltage Vc satisfying the condition 0<Vc<Ve is applied to the emitter, The lower end surface of the thermionic control electrode is arranged above the lower end of the emitter, and the diameter of the opening of the thermionic control electrode is smaller than the length of the thermionic emission region in the filament. That is.
第2図は本発明の一実施例装置を示すもので、
第1図と同一符号を附したものは同一構成要素を
表わしている。第2図の装置は第1図の装置と比
較して、エミツタ4の下端より上方に熱電子制御
電極10が新たに設けられ、電源11によつてエ
ミツタとの間に電圧Vcが印加される。この電圧
Vcは引出し電極に印加される電圧よりも低いた
め(例えばVe=5KV,Vc=0.5〜3KV)ため、
エミツタ先端に形成される電界放出のための強電
界には殆んど影響を及ぼさない。従つて電界放出
による電子Aの放出経路も第1図の場合と殆んど
変らない。又、熱電子制御電極10の開口部の径
dはフイラメント3が熱電子を発生する領域の最
大長さDよりも小さく形成されている。そのた
め、フイラメント3から発生する熱電子やエミツ
タ4の側面から発生する熱電子の大部分は熱電子
制御電極10の表面に向かつて偏向されて吸収さ
れてしまい、制御電極10の開口を通過する熱電
子は無視し得る程度となる。熱電子制御電極10
を照射する熱電子も電極表面に吸着されたガスを
放出させるが、電極を照射する熱電子に対する加
速電圧Vcが引出し電極5の引出し電圧Veよりも
低いため、ガス放出作用は弱い。更に、ガスが放
出される領域が電界放出の行われるエミツタ尖端
部よりも上方であるため、放出ガスがエミツタ尖
端に再び吸着される率は極めて低くなる。 FIG. 2 shows a device according to an embodiment of the present invention.
Components with the same reference numerals as in FIG. 1 represent the same components. In the device shown in FIG. 2, compared to the device shown in FIG. 1, a thermionic control electrode 10 is newly provided above the lower end of the emitter 4, and a voltage Vc is applied between it and the emitter by a power source 11. . this voltage
Since Vc is lower than the voltage applied to the extraction electrode (e.g. Ve=5KV, Vc=0.5-3KV),
It has almost no effect on the strong electric field for field emission formed at the tip of the emitter. Therefore, the emission path of electron A due to field emission is also almost the same as in the case of FIG. The diameter d of the opening of the thermionic control electrode 10 is smaller than the maximum length D of the region where the filament 3 generates thermionic electrons. Therefore, most of the thermionic electrons generated from the filament 3 and the thermionic electrons generated from the side surface of the emitter 4 are deflected toward the surface of the thermionic control electrode 10 and absorbed, and the heat passing through the opening of the control electrode 10 is absorbed. The amount of electrons is negligible. Thermionic control electrode 10
Thermionic electrons that irradiate the electrode surface also release the gas adsorbed on the electrode surface, but since the accelerating voltage Vc for thermionic electrons that irradiate the electrode is lower than the extraction voltage Ve of the extraction electrode 5, the gas release effect is weak. Furthermore, since the region from which the gas is emitted is above the emitter tip where field emission occurs, the rate at which the emitted gas is adsorbed again to the emitter tip is extremely low.
このように、第2図の装置によれば、加熱電子
が電界放出電子銃の安定化に及ぼす悪影響を低減
することができるが、第2図の装置が第1図の装
置に比較してどの程度改善されたかは、各電極へ
の電子衝撃のエネルギーがどの程度軽減されるか
を式によつて表わすことによつて、次のようにな
る。即ち、第2図において、各電極の受ける電子
衝撃のエネルギーはVe×Ia+Vc×Ibとなる。こ
れに対して第1図の装置において引出し電極の受
ける電子衝撃のエネルギーはVe・(Ia+Ib)であ
るから引出電極の受ける電子衝撃のエネルギーは
第2図の装置において(Ve−Vc)・Ibだけ減少
することになる。 As described above, the device shown in FIG. 2 can reduce the adverse effect of heating electrons on the stabilization of the field emission electron gun, but the device shown in FIG. The degree of improvement can be determined by expressing the extent to which the energy of electron impact on each electrode is reduced using the following equation. That is, in FIG. 2, the energy of the electron impact received by each electrode is Ve×Ia+Vc×Ib. On the other hand, in the device shown in Figure 1, the energy of the electron impact received by the extraction electrode is Ve・(Ia+Ib), so in the device shown in FIG. 2, the energy of the electron impact received by the extraction electrode is only (Ve−Vc)・Ib. will decrease.
以上のように、本発明の加熱陰極型電界放出電
子銃によれば、電子銃室の圧力が比較的高くても
安定な高輝度電子線が得られるので高分解能を必
要とする走査電子顕微鏡の電子線発生源として用
いて大きな効果が得られる。 As described above, according to the heated cathode field emission electron gun of the present invention, a stable high-brightness electron beam can be obtained even when the pressure in the electron gun chamber is relatively high, so it can be used in scanning electron microscopes that require high resolution. Great effects can be obtained when used as an electron beam source.
第1図は従来の加熱型電界放出電子銃を示す略
図、第2図は本発明の一実施例装置を示す略図で
ある。
1……絶縁碍子、2……ステム、3……フイラ
メント、4……エミツタ、5……引出し電極、6
……陽極、7,8……電源、9……加熱電源、1
0……熱電子制御用電源。
FIG. 1 is a schematic diagram showing a conventional heated field emission electron gun, and FIG. 2 is a schematic diagram showing an apparatus according to an embodiment of the present invention. 1... Insulator, 2... Stem, 3... Filament, 4... Emitter, 5... Extraction electrode, 6
... Anode, 7, 8 ... Power supply, 9 ... Heating power supply, 1
0...Power source for thermionic control.
Claims (1)
られたエミツタと、該エミツタを1500〓以上に加
熱する電流を前記フイラメントに供給する加熱電
源と、エミツタ下方に設けられ接地電位に保たれ
た陽極と、エミツタに負の高電位を与える電源
と、前記陽極とエミツタ間に設けられエミツタに
対して正の電圧Veが印加される引出し電極を備
えた装置において、エミツタに対して0<Vc<
Veの条件を満たす電圧Vcの与えられる熱電子制
御電極を設け、該熱電子制御電極の下端面が前記
エミツタ下端部よりも上方に配置され、熱電子制
御電極の開口部の径が前記フイラメントにおける
熱電子放出領域の長さよりも小さくなるように構
成したことを特徴とする加熱陰極型電界放出電子
銃。1. An emitter attached to the tip of a hairpin-shaped filament, a heating power source that supplies the filament with a current that heats the emitter to a temperature of 1500°C or more, an anode provided below the emitter and kept at ground potential, and a In an apparatus equipped with a power source that provides a negative high potential and an extraction electrode that is provided between the anode and the emitter and applies a positive voltage Ve to the emitter, 0<Vc< with respect to the emitter.
A thermionic control electrode to which a voltage Vc that satisfies the condition of Ve is provided, the lower end surface of the thermionic control electrode is disposed above the lower end of the emitter, and the diameter of the opening of the thermionic control electrode is set in the filament. A heated cathode field emission electron gun characterized in that the length is smaller than the length of the thermionic emission region.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1430983A JPS59139538A (en) | 1983-01-31 | 1983-01-31 | Heated cathode type electric field discharging electron gun |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1430983A JPS59139538A (en) | 1983-01-31 | 1983-01-31 | Heated cathode type electric field discharging electron gun |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59139538A JPS59139538A (en) | 1984-08-10 |
JPH044690B2 true JPH044690B2 (en) | 1992-01-29 |
Family
ID=11857493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1430983A Granted JPS59139538A (en) | 1983-01-31 | 1983-01-31 | Heated cathode type electric field discharging electron gun |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59139538A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4938100A (en) * | 1972-08-22 | 1974-04-09 |
-
1983
- 1983-01-31 JP JP1430983A patent/JPS59139538A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4938100A (en) * | 1972-08-22 | 1974-04-09 |
Also Published As
Publication number | Publication date |
---|---|
JPS59139538A (en) | 1984-08-10 |
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