JPH0446384A - Arrangement irregularity eliminating method for plotted graphic - Google Patents

Abstract

PURPOSE:To perform plotting with a specified pitch and to eliminate the arrangement irregularity of a plotted graphic without executing a data round-off by generating a data for plotting in which an arranging pitch is the n times (n: integer) of a base dot size by multiplying a data in X or Y direction by Kx or Ky and plotting by performing specified scaling. CONSTITUTION:When many graphics are plotted by a raster plotting system, and when the arranging pitch of the graphic in the X or Y direction is not the positive number times of the base dot size, the datum for plotting in which the arranging pitch is the positive number times of the base dot size is generated by multiplying the data in the X or Y direction by Kx or Ky. The scaling of 1/K or 1/Ky times is performed with respect to the X or the Y direction which is Kx or Ky times by using this data so as to execute plotting. Then, even though the pitch of the graphic is not the n times (n: integer) of the base dot size, a fraction is appropriately processed without executing the round-off and the graphic can be plotted by the specified pitch without having the arrangement irregularity.

Description

[Detailed Description of the Invention] [Objective of the Invention] (Industrial Application Field) The present invention uses a raster drawing method to draw a pattern in which a large number of fine figures such as a liquid crystal pattern are arranged using a beam such as a laser beam or an electron beam. The present invention relates to a method for removing uneven arrangement of minute figures when drawing with.

(Prior art) Generally, among laser beam lithography devices and electron beam lithography devices that use the raster lithography method, a basic door size related to the beam diameter is set, and the value is the same in the X-Y direction. Provide drawing data to which part divided by the basic dot size should the beam be turned on,
The relative position of the material to be drawn and the beam is determined, and drawing is performed based on the drawing data. This type of drawing device generally has a scaling function, and can draw by enlarging or reducing the actual drawing with respect to the drawing data.

(Problem to be solved by the invention) By the way, for example, in a liquid crystal pattern, the same minute figure is
A large number of these are arranged in the Y direction, but the arrangement pitch requires accurate uniformity, and in the middle of the arrangement, there is a pitch that differs by about 0.1 μm from other pitches in the X or Y direction. If it is included, it will appear as a streak and will be perceived by people as an irregularity. If the array pitch is a positive multiple of the basic dot size, no problem will occur; however, in general, the array pitch is rarely a positive multiple of the basic dot size, resulting in a fraction. This fraction is processed by so-called data rounding.

For example, round down the fractions until they reach a certain value;
When a certain value is reached, add %11. In rounding this data, (basic dot size) x
After several pitches of 0 (positive number) continue, a pitch of (basic dot size)×(mouth+I) is inserted, and this becomes 1 irregularity r.

The present invention provides a method for removing irregularities in the arrangement of drawn figures, which uses a scaling function and can draw at a predetermined pitch without rounding the data even when the arrangement pitch is not a positive multiple of the basic dot size. It is intended to.

[Structure of the invention]

(Means for Solving Problem 111) To achieve the above object, the present invention provides an X or Y
When the arrangement pitch of the figures in the direction is not a positive multiple of the basic dot size of the raster drawing method, which is determined in relation to the beam diameter, the drawing is performed by multiplying the scaling by the double.

Drawing can be performed at a desired pitch, and since the data does not include fractions, drawing is performed without unevenness.

(Example) Examples of the present invention will be described below with reference to FIGS. 1 to 3. FIG. 1 shows a raster drawing type electron beam drawing apparatus used for carrying out the present invention. This apparatus uses an electron beam 20 to form a figure Att as shown in FIG.
, At2, etc., and uses the electron gun 21. Electron lenses 22 , 23 , 24 , blanking electrodes 25 . It has a blanking aperture 26 and a deflection electrode 27.

Reference numeral 30 denotes a CPU, which takes in drawing data and other instruction data necessary for drawing from the external storage unit 31, and performs drawing according to these data. Reference numeral 32 denotes an interface. 33 is an electron beam control unit;
34 is a bit conversion unit), 35 is a deflection control unit,
36 is a position measuring unit that measures the position of the XY table 1o using a laser length measuring device 36a and a mirror 36bK, 37 is a table control unit having a motor section 37a, and 38 is a unit that measures the position of the XY table 1o from the pit conversion unit 34 according to the position of the XY table 1o. This is a synchronizing signal generating unit for determining the signal timing and the timing of applying the deflection signal from the deflection control unit 36 to the deflection electrode 27. Each of these units is the same as a known unit, so a detailed description thereof will be avoided. .

FIG. 2 shows an example of a pattern drawn according to the present invention. 11 is a material to be drawn, A11°Al1,
The same figure A shown as A13, A21... (symbol A is used to collectively indicate A11, A12..., etc.) is moved by a predetermined constant bit Px in the X and Y directions, respectively. , Arrange many with Py.

The sections indicated by thin lines on the drawing material 11 are based on the basic dot size S of the raster drawing method, and one of the sections is 'B(
The shaded area)' is the electron beam control unit 3 shown in FIG.
This corresponds to the beam diameter of the electron beam 20 on the drawing target material 11 determined by 3.

As is clear from the figure All, each figure A has dimensions in the X and Y directions that are integral multiples of the basic dot size S.
The pitches Px and Py are not integral multiples but have fractions.

As is well known, in the raster drawing method, the ON/OFF state of drawing is determined by the basic dot size S indicated by a thin line.
Since it is necessary to do this for each square inventory unit,
ll can be drawn as is, but for example, figure A12
As for the upper and lower hatched areas, the basic dot size S does not match, so they cannot be drawn as shown. In such cases, the upper diagonal line is generally O because the figure part occupies most of the squares.
The lower shaded area is set to N and is set to OFF because the area occupied by the figure is small. According to this rounding, the pitch of the figure A12 in the X direction with respect to the figure All is not Py (=4.28) but becomes 4S.

Therefore, in the present invention, the pitches Px and Py are multiplied by Kx and KY so that the pitches Px and Py are integral multiples of the basic dot size S.

In other words, when PY = 4.28 as mentioned above, set a KyO value such that PY Match the multiplication to py. In this case K
y=T7. When the same operation is performed for the pitch Px in the X direction, Px' = Px on the drawing data
xKx, Py' = Py x Ky, and the figure drawn by these pitches Px' and Py' is as shown in FIG. Note that in the drawing data for each figure A in Figure 3, the length of each side is Kx or KY times the dimension in Figure 2, but in actual drawing, fractions are rounded. Therefore, the same %38 X as in Figure 2
The size will be 3S'.

By adding the above data processing, the pitch Px', Py' of each figure A becomes an integral multiple of the basic dot size S, so there is no rounding regarding the pitch, and each figure A
The interval between is constant.

However, since the pitch of each figure A is PX', Py', which is different from Px, Py, at the stage of actually drawing, the scaling function of the drawing device, which will be described later, is used to increase the pitch by 1/Kx in the X direction. , the X direction is multiplied by a scaling factor of 1/Ky.

As a result, Py' X ball y= Py X Ky X ball 7= PY
-=-(2), and each figure A is Px,
Drawn with Py pinch.

At this time, each figure A changes in size due to scaling, but the ratio is 4.2/4 in this example.
That is, 1°05 times. The rate of change of this figure A becomes smaller as the pitches Px and Py become larger with respect to the basic dot size S. For example, when the pitch Px
, Py is 10O8, even if the fraction is 0.58, which is the maximum, the increase is about 1.005 times, that is, only 0.5%, which is an almost negligible amount.

As is well known, the scaling function of the drawing device increases or decreases the beam diameter of the electron beam 20 irradiated onto the material to be drawn according to the scaling rate by the electron beam control unit 33 shown in FIG. In addition, by increasing or decreasing the scanning width and scanning interval of the electron beam 20 according to the scaling rate by the deflection control unit 35 and the synchronization signal generation unit 38, it is possible to enlarge or reduce the drawing pattern without changing the drawing data. Therefore, in implementing the present invention, it is desirable to be able to set different scaling rates in the X direction and in the X direction.

〔Effect of the invention〕

As described above, according to the present invention, when drawing a pattern in which a large number of figures are arranged at a constant pitch, even if the pitch of each figure is not an integral multiple of the basic dot size in the raster drawing method, fractions can be accurately processed. It is possible to draw at a constant pitch without rounding errors, which is particularly effective when uneven arrangement is a concern.

[Brief explanation of the drawing]

FIG. 1 is a schematic configuration diagram of an electron beam lithography system used to implement the present invention, FIG. 2 is a diagram showing an example of a pattern drawn by the present invention, and FIG. 3 is a pitch of each figure shown in FIG. 2. FIG. 7 is a diagram showing a pattern when the pattern is drawn as it is without scaling, using drawing data subjected to rounding according to the present invention. 10... XY table, 11... Drawing material, All, A12, A13, A21---
・・・---Figure, Px, Py---Pitch, Px', Py'---Pitch obtained by rounding the drawing data, S---Basic dot size,
21...Electron gun, 22, 23, 24 ・
...electronic lens, 25 ...blanking electrode, 26 ...blanking aperture
27...Deflection electrode, 36a...Laser length measuring device, 36b...Mirror 37a...
...Motor part.

Claims (1)

[Claims] 1. When drawing a large number of figures using a raster drawing method using a beam, the arrangement pitch of the figures in the X or Y direction is not an integral multiple of the basic dot size in the raster drawing method, which is determined in relation to the beam diameter. Then, among the drawing data of the figure, data in the X or Y direction is multiplied by Kx or Ky to create drawing data whose array pitch is a positive multiple of the basic dot size, and using this drawing data and Kx
Or, a method for removing unevenness in the arrangement of drawing figures, characterized in that drawing is performed by multiplying the X or Y direction multiplied by Ky by 1/Kx or 1/Ky.