JPH0439894A - El display device - Google Patents

El display device

Info

Publication number
JPH0439894A
JPH0439894A JP2146636A JP14663690A JPH0439894A JP H0439894 A JPH0439894 A JP H0439894A JP 2146636 A JP2146636 A JP 2146636A JP 14663690 A JP14663690 A JP 14663690A JP H0439894 A JPH0439894 A JP H0439894A
Authority
JP
Japan
Prior art keywords
film
light
pixel
films
emitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2146636A
Other languages
Japanese (ja)
Inventor
Tomoyuki Kawashima
河島 朋之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP2146636A priority Critical patent/JPH0439894A/en
Publication of JPH0439894A publication Critical patent/JPH0439894A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reduce crosstalk between adjoining picture elements by dividing a luminous film into picture element luminous films at every picture element to be formed, and arranging a shade film between the luminous film and a back electrode film so as to cover the spaces between mutual picture element luminous films and the back side. CONSTITUTION:A luminous film is divided into picture element luminous films 4P at every picture element so as to eliminate parts between the mutual picture elements. Moreover direct crosstalk light between adjoining picture element luminous films 4P is shut off by arranging a shade film 10 between the luminous film and a back electrode film 6 to cover the spaces between mutual picture element luminous films 4P, and also indirect crosstalk light via the back side is cut off by covering the back side too of the picture element luminous films 4P. This almost completely prevents crosstalk between mutual picture elements in an EL display device.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はエレクトロルミネッセンス(以下ELという)
ないし電界発光原理によるEL表示装置であって、基板
側の透明電極膜と裏面電極膜の間に発光膜と絶縁膜とを
備えアレイ配列された画素の表示を行なうようにしたも
のに関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to electroluminescence (hereinafter referred to as EL).
The present invention relates to an EL display device based on the electroluminescence principle, which includes a light emitting film and an insulating film between a transparent electrode film on a substrate side and a back electrode film, and displays pixels arranged in an array.

〔従来の技術〕[Conventional technology]

EL表示装置は、薄形の表示パネルに構成でき最近では
高輝度発光が可能なことから、計算機等の小形表示装置
として嘱目されている。
EL display devices can be configured into thin display panels and have recently been attracting attention as small display devices for computers and the like because they can emit high-intensity light.

かかる用途に適するEL表示装置ではその表示面内に多
数個の画素が二次元のアレイ状ないしはマトリックス状
に配列され、パネルの表側に配列された透明電極膜と裏
側に配列された裏面電極膜との間に表示データや表示駆
動電圧を掛けることにより可変画像を表示できる。よく
知られていることであるが、第4図を参照してその従来
構造の概要を簡単に説明する。
In an EL display device suitable for such uses, a large number of pixels are arranged in a two-dimensional array or matrix within the display surface, and a transparent electrode film is arranged on the front side of the panel, and a back electrode film is arranged on the back side of the panel. A variable image can be displayed by applying display data or display drive voltage between the two. Although this is well known, the outline of the conventional structure will be briefly explained with reference to FIG.

第4図において、一般にガラス板である透明な絶縁性の
基板1上にインジューム錫酸化物(以下ITOという)
等のごく薄い透明電極膜2を数百条配列し、その上を窒
化シリコン等の絶縁膜3で覆う、この上に設けられる発
光膜4は普通ZnSからなる母材にMn等の発光活性物
質を発光中心として微量含ませたものである。この発光
膜4を上と同様な絶縁膜5で覆い、さらにその上にアル
ミ等の裏面電極膜6を透明電極膜2と直交する方向に数
百条配列して、透明電極!l!2と裏面電極膜6との各
交点に対応する発光膜4の部分に発光性の表示用画素を
形成させる。
In FIG. 4, indium tin oxide (hereinafter referred to as ITO) is deposited on a transparent insulating substrate 1, which is generally a glass plate.
A few hundred strips of very thin transparent electrode films 2 are arranged, and the top is covered with an insulating film 3 such as silicon nitride.The light emitting film 4 provided on top of this is usually made of a base material of ZnS and a luminescent active material such as Mn. It contains a small amount of as a luminescent center. This light-emitting film 4 is covered with the same insulating film 5 as above, and on top of that, several hundred back electrode films 6 made of aluminum or the like are arranged in a direction perpendicular to the transparent electrode film 2 to form a transparent electrode! l! A luminescent display pixel is formed in a portion of the luminescent film 4 corresponding to each intersection between the luminescent film 2 and the back electrode film 6.

このように構成されたEL表示装置では、表示データを
例えば透明電極膜2上に乗せ、普通は走査周期ごとに正
負に切り換わる交流の表示駆動電圧で裏面電極膜6を順
次に走査することにより表示を行なう、この際、画電極
膜2および60間に掛かる電圧により絶縁膜3および5
に挟まれた発光膜4の各画素部分に電界が掛かり、その
EL光発光透明な基板1側から取り出される。上述のよ
うに発光膜4のZnS中の発光中心がMnの場合、EL
表示装置は波長5800人の黄色のモノクローム表示を
行なう、なお、第4図に示す構造から表側の絶縁膜3が
省略される場合がある。
In an EL display device configured in this manner, display data is placed on, for example, the transparent electrode film 2, and the back electrode film 6 is normally scanned sequentially with an alternating current display drive voltage that switches between positive and negative at each scanning period. At this time, the voltage applied between the picture electrode films 2 and 60 causes the insulating films 3 and 5 to be displayed.
An electric field is applied to each pixel portion of the light emitting film 4 sandwiched between the two, and the EL light is emitted from the transparent substrate 1 side. As mentioned above, when the luminescent center in ZnS of the luminescent film 4 is Mn, the EL
The display device performs a yellow monochrome display with a wavelength of 5800. Note that the insulating film 3 on the front side may be omitted from the structure shown in FIG. 4.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述のEL表示装置は2mm程度の薄形にでき、画素の
サイズを0.2儀−ないしはそれ以下に小形化できるの
で、原理上は微細で鮮明な表示が可能であるが、発光膜
4およびそれを挟む絶縁膜3と5がいずれも透明なので
、画素間にいわゆる表示上のクロストークが発生して表
示の鮮明度が低下しやすい問題がある。
The above-mentioned EL display device can be made as thin as about 2 mm, and the pixel size can be reduced to 0.2 mm or less, so in principle, fine and clear display is possible. Since the insulating films 3 and 5 sandwiching it are both transparent, there is a problem in that so-called display crosstalk occurs between pixels, which tends to reduce the clarity of the display.

第5図はこのクロストークの様子を隣合う2個の画素P
について示す第4図のX−X矢視断面である。透明電極
膜2と裏面電極膜6の間に掛かる表示電圧により発光膜
4の各画素Pに当たる部分が発光し、これが透明な基板
l側に表示光Ldとして取り出されるのが本来であるが
、発光膜4自体が透明なためにその隣接する画素部分の
相互間にクロストーク光Lcが図のように発生する。ま
た、発光膜4内部でのかかる直接的なりロストークのほ
か、絶縁膜5も透明なため金属の裏面電極膜6で図のよ
うに反射される間接的クロストーク光Lcも発生する。
Figure 5 shows this crosstalk between two adjacent pixels P.
4 is a cross section taken along the line X-X in FIG. 4. Normally, the display voltage applied between the transparent electrode film 2 and the back electrode film 6 causes the portion of the light emitting film 4 corresponding to each pixel P to emit light, and this is taken out to the transparent substrate l side as the display light Ld. Since the film 4 itself is transparent, crosstalk light Lc is generated between adjacent pixel portions as shown in the figure. In addition to such direct losstalk inside the light emitting film 4, since the insulating film 5 is also transparent, indirect crosstalk light Lc is also generated which is reflected by the metal back electrode film 6 as shown in the figure.

いずれにせよ、かかるクロストークにより各画素の表示
光に隣接画素の表示光が混入するので、表示上のコント
ラストが落ち表示画像の鮮明度が低下することになる。
In any case, the display light of each pixel mixes with the display light of the adjacent pixel due to such crosstalk, resulting in a decrease in the contrast on the display and a decrease in the sharpness of the displayed image.

なお、クロストークは画素Pの相互間隔つまり透明電極
膜3の相互間隔をその幅の半分ないしそれ以上にまで広
げればかなり軽減できるが、表示の微細化傾向に明らか
に逆行し表示の平均輝度が低下することも免れない。
Note that crosstalk can be considerably reduced by widening the mutual spacing between pixels P, that is, the mutual spacing between transparent electrode films 3, to half or more of the width of the pixels, but this clearly goes against the trend of miniaturization of displays, and the average brightness of displays decreases. A decline is inevitable.

本発明の目的はかかる問題点を解決して、隣接画素間の
クロストークを減少させてEL表示装置による表示画像
を鮮明化することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve these problems and reduce crosstalk between adjacent pixels to sharpen images displayed by an EL display device.

〔課題を解決するための手段〕[Means to solve the problem]

本発明はこの目的を、前述のように表側の透明電極膜と
裏面電極膜の間に発光膜と絶縁膜を備えアレイ状配列の
画素の表示を行なうEL表示装置に対し、発光膜を各画
素ごとに画素発光膜に分割して形成し、発光膜と裏面電
極膜との間に遮光膜を画素発光膜の相互間および裏面側
を覆うように配設することによって達成するものである
The present invention aims to achieve this objective by adding a light-emitting film to each pixel in an EL display device that includes a light-emitting film and an insulating film between a front-side transparent electrode film and a back-side electrode film and displays pixels arranged in an array as described above. This is achieved by forming each pixel light-emitting film separately, and disposing a light-shielding film between the light-emitting film and the back electrode film so as to cover the space between the pixel light-emitting films and the back side.

なお、上記構成中の遮光膜は絶縁性の光吸収膜とするの
が最も有利で、それ用の材料には例えばプラセオジェー
ム・マンガン酸化物を用いることができる。この光吸収
膜の絶縁性が良好な場合は従来の裏側絶縁膜をこれで置
き換えてしまうのが有利である。また、光吸収膜の絶縁
性が良好でも発光膜と直接接触させるのが望ましくない
こともあり、この場合は発光膜との間に例えばごく薄い
裏側絶縁膜を介在させることでよい。
It is most advantageous for the light-shielding film in the above structure to be an insulating light-absorbing film, and praseodyme manganese oxide, for example, can be used as the material therefor. If this light absorption film has good insulation properties, it is advantageous to replace the conventional back side insulation film with it. Furthermore, even if the light-absorbing film has good insulation properties, it may not be desirable to bring it into direct contact with the light-emitting film. In this case, for example, a very thin backside insulating film may be interposed between the light-absorbing film and the light-emitting film.

光吸収膜の絶縁性があまり良好でない場合、これで発光
膜を直接覆い、絶縁性を主に裏側絶縁膜により持たせる
のが有利である。
If the light-absorbing film does not have very good insulation, it is advantageous to directly cover the light-emitting film with it so that the insulation is mainly provided by the backside insulation film.

遮光膜を光反射膜とすることも可能であるが、それ用の
材料が普通は金属等の導電性を有するものになるので、
この場合も発光膜との直接接触を防ぐためにそれとの間
にごく薄い裏側絶縁膜を介在させるのがよい、この光反
射膜をアルミ等の金属とすることにより、裏面電極膜と
してこれを利用することができる。
It is also possible to use a light-reflecting film as a light-shielding film, but the material for that is usually a conductive material such as metal.
In this case as well, it is best to interpose a very thin backside insulating film between the light-emitting film and the light-emitting film to prevent direct contact with it.By making this light-reflecting film a metal such as aluminum, it can be used as a backside electrode film. be able to.

〔作用〕 従来のEL表示装置の発光膜は全画素に共通な連続膜で
、表示パネル構造としては簡単なものの発光膜自体が透
明なため画素間にクロストークが発生しやすく、表示画
像は画素の集合であるから発光膜の画素相互間は本来不
必要な部分でクロストークの経路になる点で有害である
0本発明ではこの点に着目して、まず前項の構成にいう
ように発光膜をこの画素相互間部分をなくすよう各画素
ごとの画素発光膜に分割する。
[Function] The light-emitting film of conventional EL display devices is a continuous film that is common to all pixels, and although the structure of the display panel is simple, the light-emitting film itself is transparent, so crosstalk easily occurs between pixels, and the displayed image is Therefore, the area between the pixels of the light emitting film is originally an unnecessary part and is harmful because it becomes a crosstalk path. is divided into pixel light-emitting films for each pixel so as to eliminate the portion between the pixels.

さらに、本発明では発光膜と裏面電極膜の間に遮光膜を
配設して画素発光膜の相互間を覆うことにより、隣接す
る画素発光膜間の直接的なりロストーク光を遮断し、か
つ画素発光膜の裏面側をも覆うことによって裏側を経由
する前述の間接的なりロストーク光を遮断する。
Furthermore, in the present invention, a light-shielding film is disposed between the light-emitting film and the back electrode film to cover the space between the pixel light-emitting films, thereby blocking direct crosstalk light between adjacent pixel light-emitting films, and By also covering the back side of the light emitting film, the above-mentioned indirect loss talk light passing through the back side is blocked.

かかる本発明の構成によってEL表示装置内の画素相互
間のクロストークがほぼ完全に防止され前述の課題が解
決される。
With this configuration of the present invention, crosstalk between pixels in an EL display device is almost completely prevented, and the above-mentioned problem is solved.

〔実施例〕〔Example〕

以下、図を参照しながら本発明の詳細な説明する。第1
図から第3図までは本発明によるEL表示装置のそれぞ
れ異なる実施例を示し、第4図との対応部分に同符号が
付されており、いずれもそのX−X矢視断面に相当する
Hereinafter, the present invention will be described in detail with reference to the drawings. 1st
The drawings to FIG. 3 show different embodiments of the EL display device according to the present invention, and parts corresponding to those in FIG. 4 are given the same reference numerals, and all correspond to the cross section taken along the line X--X.

いずれの実施例でも基板1に1n程度の厚みの透明ガラ
ス板を用い、その上にITO等の導電性膜を0.1n程
度の厚みにスパツクし、そのフォトエツチングにより透
明電極膜2を例えば200μのストライプ幅、40nの
間隔で形成する。
In either embodiment, a transparent glass plate with a thickness of about 1n is used as the substrate 1, a conductive film such as ITO is spattered onto it to a thickness of about 0.1n, and the transparent electrode film 2 is formed by photoetching to a thickness of, for example, 200μ. The stripes are formed with a width of 40n and an interval of 40n.

次に、表側絶縁膜3用に例えば窒化シリコンをスパッタ
法やCVD法により0.4n程度の厚みに被着ないしは
成長させる。この絶縁113には窒化シリコンのばか酸
化シリコンやアルミナを用いることができ、被着後に必
要に応じ熱処理によってその絶縁性を向上させるのが望
ましい。
Next, for example, silicon nitride is deposited or grown to a thickness of about 0.4 nm for the front side insulating film 3 by sputtering or CVD. This insulator 113 can be made of silicon nitride, silicon oxide, or alumina, and it is desirable to improve its insulating properties by heat treatment if necessary after deposition.

黄色のモノクローム表示の場合、発光膜用には約0.5
wt%のMnを含むZnSを用い、これを通常の電子ビ
ーム蒸着法等により例えば0.5μ〇膜厚に被着した後
に、本発明では4塩化炭素等を用いるドライエツチング
法や化学的エツチング法により透明電極膜2と同じ配列
ピッチで、かつ普通は同じ幅のストライプにパターンニ
ングすることによって、画素Pごとに分離された画素発
光膜4pとする。あるいは、画素発光膜4pをメタルマ
スクを用いる蒸着法により最初からかかるストライプ状
パターンに形成することも可能である。よく知られてい
るように、発光膜は所定のフォーミングにより発光特性
が向上される。ここまでは、本発明のいずれの実施例で
も同じである。
For yellow monochrome display, approximately 0.5 for luminescent film.
Using ZnS containing wt% Mn, this is deposited to a film thickness of, for example, 0.5μ〇 by ordinary electron beam evaporation, and then dry etching or chemical etching using carbon tetrachloride or the like is performed in the present invention. By patterning it into stripes with the same array pitch as the transparent electrode film 2 and usually the same width, the pixel light emitting film 4p is separated for each pixel P. Alternatively, it is also possible to form the pixel light-emitting film 4p into such a striped pattern from the beginning by a vapor deposition method using a metal mask. As is well known, the luminescent properties of a luminescent film are improved by a predetermined forming process. The steps up to this point are the same in all embodiments of the present invention.

第1図に示す本発明の第1実施例では遮光膜10に絶縁
性の光吸収膜を用い、従来の裏側絶縁膜をこれで置き換
える。この光吸収性の遮光膜10には例えばプラセオジ
ューム・マンガン酸化物を用いることができ、PraO
++とMnC0,との混合焼結物をターゲットとするス
パッタ法によりこれを例えば0.4nの厚みに被着して
黒色で絶縁性の遮光膜10とする。このほか、光吸収性
の良好な遮光膜lOとしては、CdTe+ CdSe+
 Sb、S、等の黒色の誘電体や非晶質シリコンを利用
できるが、この第1実施例用に特に高い絶縁性を要する
場合はその1IIr!I−を若干増加させ、あるいは黒
色以外の誘電体も適宜に利用することができる。
In the first embodiment of the present invention shown in FIG. 1, an insulating light absorbing film is used as the light shielding film 10, and the conventional back side insulating film is replaced with this film. For example, praseodium manganese oxide can be used for this light-absorbing light-shielding film 10, and Praseodium manganese oxide can be used.
A black insulating light-shielding film 10 is formed by depositing a sintered mixture of ++ and MnC0 to a thickness of, for example, 0.4 nm by sputtering using a sintered mixture of ++ and MnC0 as a target. In addition, CdTe+ CdSe+
Black dielectrics such as Sb, S, etc. and amorphous silicon can be used, but if particularly high insulation is required for this first embodiment, 1IIr! A slight increase in I- or a dielectric other than black may be used as appropriate.

裏面電極1!I6はスパッタ法等により0.5n程度の
膜厚に被着したアルミ等の金属をフォトエツチングして
第4図のように透明電極膜2と直交方向のストライプ状
配列にパターンニングすることでよい0以上のように構
成された第1実施例のEL表示装置は、絶縁膜3の熱処
理や画素発光膜4pのフォーミングの終了後に使用に供
される。
Back electrode 1! I6 may be formed by photo-etching a metal such as aluminum deposited to a thickness of about 0.5 nm by sputtering or the like and patterning it into a striped arrangement in a direction perpendicular to the transparent electrode film 2 as shown in FIG. The EL display device of the first embodiment configured as described above is put into use after the heat treatment of the insulating film 3 and the forming of the pixel light emitting film 4p are completed.

この表示装置を透明電極膜2と裏面電極膜6の間に表示
駆動電圧を印加してEL発光させた際、各画素電極膜4
pの発光を表示光Ldとして基板l側から表示面とほぼ
垂直方向に取り出すのは従来と同じであるが、表示面と
平行方向や裏側に向かう従来のクロストーク光Lcが画
素発光膜4pの相互間および裏面側を覆う遮光膜lOに
よりすべて遮られるので、本発明のEL表示装置では画
素間のクロストーク問題はほぼ完全に解決される。
When this display device is caused to emit EL by applying a display driving voltage between the transparent electrode film 2 and the back electrode film 6, each pixel electrode film 4
It is the same as the conventional method that the emitted light of p is extracted as display light Ld from the substrate l side in a direction almost perpendicular to the display surface, but the conventional crosstalk light Lc directed in a direction parallel to the display surface or toward the back side is emitted from the pixel light emitting film 4p. Since all of the light is blocked by the light-shielding film 1O that covers the space between them and the back side, the problem of crosstalk between pixels is almost completely solved in the EL display device of the present invention.

第2図の第2実施例では、遮光膜11を光吸収性とする
のは前例と同じであるが、より薄い例えば0.1μの膜
厚に成膜して画素発光膜4pの相互間と裏面側を覆わせ
、かつ裏面電極膜6との間に表側絶縁膜3と同じ窒化シ
リコン等の裏側絶縁膜5を配設する。この実施例は表示
装置の絶縁耐圧を高めたい場合や遮光膜11に光吸収性
は高いが絶縁性があまり高くない非晶質シリコン等を用
いる場合に適する。裏側絶縁膜5の膜厚は必要な絶縁耐
圧に応じて適宜選択される。遮光膜11によるクロスト
ーク防止効果は上と同様である。
In the second embodiment shown in FIG. 2, the light-shielding film 11 is made to be light-absorbing, as in the previous example, but it is formed to a thinner film thickness of, for example, 0.1μ, so that the light-shielding film 11 is made light-absorbing. A back insulating film 5 made of silicon nitride or the like, which is the same as the front insulating film 3, is provided to cover the back side and between the back electrode film 6 and the back electrode film 6. This embodiment is suitable when it is desired to increase the dielectric strength of the display device, or when amorphous silicon or the like, which has high light absorption but does not have very high insulation properties, is used for the light shielding film 11. The thickness of the back side insulating film 5 is appropriately selected depending on the required dielectric strength voltage. The crosstalk prevention effect by the light shielding film 11 is the same as above.

第3図に示す第3実施例では、裏側絶縁膜5aと光吸収
性の遮光1I110が第2実施例とは逆の順序に配列さ
れ、画素発光膜4pに接する裏側絶縁膜5aは極力薄<
  0.1n程度かそれ以下とされ、その裏面電極膜6
偏に配設される遮光膜10は第1実施例と同程度の例え
ば0.4nの膜厚とされる。この第3実施例は遮光膜1
0用の材料を画素発光膜4pと直接接触させると発光に
望ましくない不純物が拡散する場合に適し、両者間を良
好な膜質の絶縁膜5aで隔離することによりELL示装
置の使用期間中に生じやすい画素発光膜4pの発光特性
の劣化を有効に防止することができる。
In the third embodiment shown in FIG. 3, the back side insulating film 5a and the light-absorbing light shielding layer 1I110 are arranged in the reverse order of the second example, and the back side insulating film 5a in contact with the pixel light emitting film 4p is as thin as possible.
The back electrode film 6 is about 0.1n or less.
The light shielding film 10 disposed unevenly has a film thickness of, for example, 0.4 nm, which is the same as that of the first embodiment. In this third embodiment, the light shielding film 1
If the material for 0 is brought into direct contact with the pixel light emitting film 4p, it is suitable for cases where impurities that are undesirable for light emission are diffused, and by isolating the two with an insulating film 5a of good quality, it is possible to prevent impurities that may occur during the use of the ELL display device. It is possible to effectively prevent the light emitting characteristics of the pixel light emitting film 4p from easily deteriorating.

この第3実施例の遮光膜10により第1実施例の場合と
同様に画素間のクロストークをほぼ完全になくすことが
できる。なお、この実施例における絶縁膜5aは窒化シ
リコン等を被着したままとしてもよいが、遮光膜10の
被着前にドライエツチングを施しその画素発光膜4pの
相互間部分を図のように除去する方が画素間のクロスト
ークを極力減少させる上で望ましい。
The light shielding film 10 of the third embodiment can almost completely eliminate crosstalk between pixels, as in the first embodiment. Note that the insulating film 5a in this embodiment may be coated with silicon nitride or the like, but dry etching is performed before the light shielding film 10 is coated to remove the portions between the pixel light emitting films 4p as shown in the figure. It is preferable to do so in order to reduce crosstalk between pixels as much as possible.

以上説明した実施例に限らず、本発明は種々の態様で実
施をすることができる0例えば、前述のように表側絶縁
膜3は適宜省略でき、特に第2実施例ではこれが容易で
ある。実施例ではすべての画素発光膜4pを同じ黄色表
示用としたが、そのzrISに発光中心用に添加すべき
活性物質の種類を順次に変えることにより、ELL示装
置にカラー表示をさせることができる。この場合の活性
物質は例えば赤色用をSs、緑色用をTb、青色用をB
とし、これら3色発光用の画素発光膜4pを各画素に対
応する正方形のパターンにそれぞれ形成する。また、実
施例では遮光膜10や11をすべて光吸収膜としたが、
これを光反射膜とすることもできる。ただし、光反射膜
は金属等の導電性材料になって画素発光膜4pとの直接
接触が望ましくないので、それとの間に第3図のような
薄い裏側絶縁1115aを介在させる。この光反射膜を
アルミで形成すれば裏面電極膜6との兼用も可能で、E
LL示装置の構造を簡易化する上で、また上述のカラー
表示化に際してとくに有利である。
The present invention is not limited to the embodiments described above, but can be implemented in various embodiments. For example, as described above, the front insulating film 3 can be omitted as appropriate, and this is particularly easy in the second embodiment. In the example, all the pixel light-emitting films 4p were used for the same yellow display, but by sequentially changing the type of active substance to be added to the zrIS for the light-emitting center, it is possible to make the ELL display device display color. . In this case, the active substances are, for example, Ss for red, Tb for green, and B for blue.
The pixel light emitting films 4p for emitting these three colors are formed in square patterns corresponding to each pixel. In addition, in the embodiment, the light-shielding films 10 and 11 were all light-absorbing films, but
This can also be used as a light reflecting film. However, since the light reflecting film is made of a conductive material such as metal, direct contact with the pixel light emitting film 4p is not desirable, so a thin back side insulator 1115a as shown in FIG. 3 is interposed between the light reflecting film and the pixel light emitting film 4p. If this light reflecting film is made of aluminum, it can also be used as the back electrode film 6, and the E
This is particularly advantageous in simplifying the structure of the LL display and in producing the above-mentioned color display.

〔発明の効果〕〔Effect of the invention〕

以上のとおり本発明では、基板側の透明電極膜と裏面電
極膜の間に発光膜と絶縁膜を備えアレイ状配列画素の表
示を行なうEL真来示装置対し、発光膜を各画素ごとに
画素発光膜に分割形成して発光膜と裏面電極膜の間に遮
光膜を画素発光膜の相互間と裏面側を覆うよう配設する
ことにより、次の効果を奏することができる。
As described above, in the present invention, for an EL display device that includes a light emitting film and an insulating film between the transparent electrode film on the substrate side and the back electrode film and performs display of arrayed pixels, the light emitting film is attached to each pixel for each pixel. The following effects can be achieved by dividing the light-emitting film and disposing a light-shielding film between the light-emitting film and the back electrode film so as to cover the space between and the back side of the pixel light-emitting film.

(a)i!素素光光膜裏面電極膜の間に配設した遮光膜
により画素発光膜の相互間および裏面側を覆い、隣接す
る画素発光膜間の直接的クロストーク光やその裏側を経
由する間接的クロストーク光を遮断することにより、E
LL示装置の画素間のクロストークをほぼ完全に防止で
きる。
(a)i! A light-shielding film placed between the back electrode films of the pixel light-emitting films covers the space between the pixel light-emitting films and the back side of the pixel light-emitting films, preventing direct crosstalk between adjacent pixel light-emitting films and indirect crosstalk via the back side. By blocking the talk light, E
Crosstalk between pixels of a LL display device can be almost completely prevented.

(ロ)遮光膜を絶縁性の光吸収膜とする態様によればこ
れを絶縁膜に有効利用しながら構造を複雑化させること
なくクロストークを防止でき、遮光膜を光反射膜とする
態様によれば散乱光を有効に利用して表示の明るさを向
上しながらクロストークを防止することができる。
(b) According to an embodiment in which the light-shielding film is an insulating light-absorbing film, crosstalk can be prevented without complicating the structure while effectively using this as an insulating film; According to this method, it is possible to effectively utilize scattered light to improve display brightness while preventing crosstalk.

(C) ii!素発先発光膜素ごとに分割されるので、
ELL示装置をカラー表示化するに際し表示色を画素ご
とに切り換え、かつ画素相互間のクロストークつまり混
色を防止して表示画像を鮮明化する上で特に有利である
(C)ii! Since it is divided into each element of the luminescent film element,
This is particularly advantageous in switching the display color for each pixel when displaying a color display in an ELL display device, preventing crosstalk between pixels, that is, color mixture, and sharpening the displayed image.

本発明を実施したELL示装置は表示のコントラストが
高く、特に表示を微細化した際に画像が鮮明な特長があ
り、フラットな自己発光パネルとしてのその本来の利点
を生かしながら計算機等の表示端としての性能の一層の
向上と普及に貢献することが期待される。
The ELL display device embodying the present invention has high display contrast and clear images especially when the display is miniaturized, and while taking advantage of its inherent advantages as a flat self-luminous panel, it can be used at the display end of computers, etc. It is expected that this technology will contribute to further improvement in performance and widespread use.

【図面の簡単な説明】[Brief explanation of drawings]

第1図から第3図までが本発明に関し、本発明のそれぞ
れ異なる実施例構造を示すELL示装置の一部拡大断面
図である。第4図以降は従来技術に関し、第4図はEL
L示装置の従来構造を示すその一部切り欠き斜視図、第
5図は画素表示上のクロストークを示すその一部拡大断
面図である。 なお、第1図〜第3図と第5図は第4図のX−X矢視断
面に相当する。これらの図において、エ:基板、2:透
明電極膜、3:表側絶縁膜、4:発光膜、4p:ill
光発光膜5:裏側絶縁膜、5a:薄い裏側絶縁膜、6:
裏面電極膜、lo:遮光膜、11 :llい遮光膜、L
c:クロストーク光、Ld+表示光、P:画素、である
。 第2図
1 to 3 are partially enlarged cross-sectional views of an ELL display device showing different embodiment structures of the present invention, respectively. Figure 4 and subsequent figures relate to the prior art, and Figure 4 is EL.
FIG. 5 is a partially cutaway perspective view showing the conventional structure of an L display device, and FIG. 5 is a partially enlarged sectional view showing crosstalk on pixel display. Note that FIGS. 1 to 3 and FIG. 5 correspond to the cross section taken along the line X--X in FIG. 4. In these figures, d: substrate, 2: transparent electrode film, 3: front side insulating film, 4: light emitting film, 4p: ill
Light-emitting film 5: back side insulating film, 5a: thin back side insulating film, 6:
Back electrode film, lo: light shielding film, 11: ll light shielding film, L
c: crosstalk light, Ld+display light, P: pixel. Figure 2

Claims (1)

【特許請求の範囲】[Claims]  基板側の透明電極膜と裏面電極膜の間に発光膜と絶縁
膜を備え,アレイ配列された画素の表示を行なう装置で
あって、発光膜を各画素ごとに画素発光膜に分割して形
成し、発光膜と裏面電極膜との間に遮光膜を画素発光膜
の相互間および裏面側を覆うように配設してなるEL表
示装置。
A device that includes a light-emitting film and an insulating film between a transparent electrode film on the substrate side and a back electrode film, and displays pixels arranged in an array, in which the light-emitting film is divided into pixel light-emitting films for each pixel. An EL display device in which a light-shielding film is disposed between the light-emitting film and the back electrode film so as to cover the space between the pixel light-emitting films and the back side of the pixel light-emitting films.
JP2146636A 1990-06-05 1990-06-05 El display device Pending JPH0439894A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2146636A JPH0439894A (en) 1990-06-05 1990-06-05 El display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2146636A JPH0439894A (en) 1990-06-05 1990-06-05 El display device

Publications (1)

Publication Number Publication Date
JPH0439894A true JPH0439894A (en) 1992-02-10

Family

ID=15412211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2146636A Pending JPH0439894A (en) 1990-06-05 1990-06-05 El display device

Country Status (1)

Country Link
JP (1) JPH0439894A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5989785A (en) * 1994-12-22 1999-11-23 Nippondenso Co., Ltd. Process for fabricating an electroluminescent device
JP2001189192A (en) * 1999-10-12 2001-07-10 Semiconductor Energy Lab Co Ltd Light emission device and manufacturing method of the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5989785A (en) * 1994-12-22 1999-11-23 Nippondenso Co., Ltd. Process for fabricating an electroluminescent device
JP2001189192A (en) * 1999-10-12 2001-07-10 Semiconductor Energy Lab Co Ltd Light emission device and manufacturing method of the same

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