JPH0436722A - Liquid crystal display device and its production - Google Patents

Liquid crystal display device and its production

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Publication number
JPH0436722A
JPH0436722A JP2141521A JP14152190A JPH0436722A JP H0436722 A JPH0436722 A JP H0436722A JP 2141521 A JP2141521 A JP 2141521A JP 14152190 A JP14152190 A JP 14152190A JP H0436722 A JPH0436722 A JP H0436722A
Authority
JP
Japan
Prior art keywords
light
liquid crystal
shielding film
crystal display
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2141521A
Other languages
Japanese (ja)
Inventor
Yuichi Hatano
波多野 祐一
Hayaji Kasai
笠井 隼次
Eiji Ito
栄二 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeco Corp
Original Assignee
Jeco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeco Corp filed Critical Jeco Corp
Priority to JP2141521A priority Critical patent/JPH0436722A/en
Publication of JPH0436722A publication Critical patent/JPH0436722A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To obtain a clear display pattern by forming a light shielding film consisting of an electroless plating layer on a part of a translucent electrode formed on a translucent base and forming an organic orientation film on the translucent electrode and the light shielding film. CONSTITUTION:A translucent electrode 3A is formed on a translucent base 1 to be a pattern display face. On the other hand, a translucent electrode 4 is formed on a translucent base 2 arranged on the rear face side by photolithography method. A light shielding film 5A consisting of an electroless plating layer is formed on the electrode 3A. Then polyimide resin orientation films 6A are respectively formed on the surfaces of the bases 1, 2 by spinner method. In said constitution, a difference in the film thickness of the film 6A formed on the edge part of the display pattern part is reduced, the 'sharpness' of a pattern formed on the edge part of the film 5A can be improved and a clear display pattern can be obtained.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、液晶表示素子内に遮光膜を有する液晶表示装
置およびその製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a liquid crystal display device having a light-shielding film within a liquid crystal display element, and a method for manufacturing the same.

[従来の技術] 従来、この種の液晶表示装置は、第4図に断面図で示す
ように対向配置される透光性基板1,2の対向面上には
一対の透光性電極3,4かパターニングされ、一方の透
光性基板1上には遮光膜5が所望のパターン形状を有し
て形成され、さらにこれらの透光性電極3,4および遮
光膜5上には有機配向膜6が形成されている。また、透
光性基板1.2対向間には例えばTN(ツイストネマテ
ィック)型液晶もしくはGH(ゲストホスト)型液晶7
が90度ねじれ配向して封入され、その周辺部がシール
剤8により封着されて液晶表示素子9か構成され、さら
にこの液晶表示素子9の外面には一対の偏光板10.1
1が平行ニコルもしくは直交ニコルで配置されて構成さ
れている。
[Prior Art] Conventionally, this type of liquid crystal display device has a pair of light-transmitting electrodes 3, 3 and 4 on opposing surfaces of light-transmitting substrates 1 and 2, which are disposed facing each other, as shown in a cross-sectional view in FIG. A light-shielding film 5 is formed on one of the light-transmitting substrates 1 to have a desired pattern shape, and an organic alignment film is formed on the light-transmitting electrodes 3, 4 and the light-shielding film 5. 6 is formed. In addition, between the transparent substrates 1 and 2, for example, a TN (twisted nematic) type liquid crystal or a GH (guest host) type liquid crystal 7 is provided.
is twisted and oriented by 90 degrees and enclosed, and its peripheral portion is sealed with a sealant 8 to form a liquid crystal display element 9. Further, on the outer surface of this liquid crystal display element 9, a pair of polarizing plates 10.1 are arranged.
1 are arranged in parallel Nicols or orthogonal Nicols.

「発明が解決しようとする課題] しかしながら、このように構成される液晶表示装置は、
透光性電極3が形成された一方の透光性基板1上に有機
物質による遮光膜5が形成され、さらにこの遮光膜5上
に有機配向膜6が形成されている。このため、有機物質
による遮光膜5の膜厚が約2μm程度であり、有機配向
膜6の膜厚800〜1000人に比較して極めて大きな
差を有しているので、第5図に拡大断面で示すように表
示パターン部分のエツジ部での有機配向膜6の膜厚tが
厚くなってしまい、視認性が低下するという問題があっ
た。
“Problem to be solved by the invention” However, the liquid crystal display device configured in this way,
A light-shielding film 5 made of an organic material is formed on one of the light-transmitting substrates 1 on which the light-transmitting electrode 3 is formed, and an organic alignment film 6 is further formed on this light-shielding film 5. Therefore, the thickness of the light shielding film 5 made of organic material is about 2 μm, which is a very large difference compared to the thickness of the organic alignment film 6 of 800 to 1000. As shown in , the thickness t of the organic alignment film 6 at the edge portion of the display pattern portion becomes thicker, resulting in a problem that visibility is reduced.

このような問題を解決するものとしては、第6図に示す
ように透光性型$i3が形成された透光性基板1上に有
機配向膜6を形成し、この有機配向M6上に有機物質に
よる遮光膜5を形成した液晶表示装置が提案されている
が、このような構成においては、有機物質による遮光膜
5が厚いためにそこに面内スペーサが潜り込み、液晶表
示素子9内のギャップか面内スペーサの粒径もしくは管
径と一致せず、大きくなってしまい、所望のセルギャッ
プを得るためには、制御しなくてはならない因子が多く
なり、液晶表示素子9が製作し難くなるという問題があ
った。
To solve this problem, as shown in FIG. 6, an organic alignment film 6 is formed on a transparent substrate 1 on which a transparent type $i3 is formed, and an organic alignment film 6 is formed on this organic alignment film M6. A liquid crystal display device in which a light-shielding film 5 made of a substance is formed has been proposed, but in such a configuration, since the light-shielding film 5 made of an organic substance is thick, an in-plane spacer sneaks into it, and the gap in the liquid crystal display element 9 is However, the particle size or tube diameter of the in-plane spacer does not match and becomes large, and in order to obtain the desired cell gap, there are many factors that must be controlled, making it difficult to manufacture the liquid crystal display element 9. There was a problem.

[課題を解決するための手段] このようなな課題を解決するなめに本発明に係る液晶表
示装置は、一方の透光性基板に形成されな透光性電極上
の一部に無電解めっき層からなる遮光膜を設け、これら
の透光性電極、遮光股上に有機配向膜を設けたものであ
る。
[Means for Solving the Problems] In order to solve these problems, the liquid crystal display device according to the present invention includes electroless plating on a part of the transparent electrode formed on one of the transparent substrates. A light-shielding film consisting of layers is provided, and an organic alignment film is provided on these light-transmitting electrodes and the light-shielding crotch.

また、本発明による液晶表示装置の製造方法は、遮光膜
を、透光性基板に形成された透光性電極上にフォトレジ
ストパターンを形成する工程と、このフォトレジストパ
ターン開口部を脱脂および活性化する工程と、このフォ
トレジストパターン開口部内に無電解めっき層を形成す
る工程と、このフォトレジストパターンを除去する工程
とによって形成したものである。
The method for manufacturing a liquid crystal display device according to the present invention also includes a step of forming a light-shielding film on a light-transmitting electrode formed on a light-transmitting substrate, forming a photoresist pattern, and degreasing and activating the opening of the photoresist pattern. The photoresist pattern is formed by a step of forming an electroless plating layer in the opening of the photoresist pattern, and a step of removing the photoresist pattern.

[作用] 本発明においては、透光性電極上に無電解めっきによる
遮光膜を設けたので、表示パターン部分のエツジ部に形
成される有機配向膜の膜厚t(第5図参照)が薄くなる
[Function] In the present invention, since a light-shielding film is provided by electroless plating on the light-transmitting electrode, the film thickness t (see FIG. 5) of the organic alignment film formed at the edge portion of the display pattern is thin. Become.

[実施例] 以下、図面を用いて本発明の実施例を詳細に説明する。[Example] Embodiments of the present invention will be described in detail below with reference to the drawings.

第1図は、本発明による液晶表示装置の一実施例を示す
要部断面図であり、前述の図と同一部分には同一符号を
付しである。同図において、パターン表示面となる透光
性基板1上には、ITOにPdをドーピングしたコモン
電極としての透光性電極3Aが全面にわたって形成され
ている。
FIG. 1 is a sectional view of a main part of an embodiment of a liquid crystal display device according to the present invention, and the same parts as those in the previous figures are given the same reference numerals. In the figure, a light-transmitting electrode 3A as a common electrode made of ITO doped with Pd is formed over the entire surface of a light-transmitting substrate 1 serving as a pattern display surface.

方、この透光性基板1−と対向する背面側の透光性基板
2上には、表示セグメントとしての透光性電極4がフォ
トリソグラフィ法によりパターニングされて形成されて
いる。また、透光性基板1上に形成されたコモン電極と
しての透光性電極3A上には、無電解めっき層からなる
厚さ約5000人の遮光膜5Aが所望のパターン形状を
有して形成されている。さらにこれらの透光性電極3A
、遮光膜5Aが形−成された透光性基板1上および対向
する透光性電極4が形成された透光性基板2上には、高
温度焼成タイプ(325℃)のポリイミド樹脂配向膜6
Aが膜厚850人〜1000人の範囲でスピンナー法も
しくはロールコータ法などにより形成されている。
On the other hand, on the back side of the transparent substrate 2 facing the transparent substrate 1-, a transparent electrode 4 as a display segment is formed by patterning by photolithography. Further, on the light-transmitting electrode 3A as a common electrode formed on the light-transmitting substrate 1, a light-shielding film 5A made of an electroless plating layer and having a thickness of approximately 5000 mm is formed in a desired pattern shape. has been done. Furthermore, these transparent electrodes 3A
On the transparent substrate 1 on which the light shielding film 5A is formed and on the transparent substrate 2 on which the opposing transparent electrode 4 is formed, a polyimide resin alignment film of a high temperature baking type (325° C.) is formed. 6
A is formed with a thickness in the range of 850 to 1000 by a spinner method or a roll coater method.

第2図(a)〜(d)は、前述した遮光膜5Aの形成方
法の一実施例を説明する工程の断面図である。同図にお
いて、まず、同図(a)に示すように透光性基板1の全
面に形成された透光性電極3A上にフォトレジスト膜2
0を形成した後、同図(b)に示すように所望の寸法の
レジストパターン21を形成して開口22を設ける。次
にこれらの開口22内をIT○クリーナ(奥野製薬製)
により約50℃、3分の脱脂を行った後、水洗処理し、
引き続き例えば1%硫酸溶液で活性化処理を行ない、水
洗処理後、同図(C)に示すようこれらの開口22内に
N1−P系の無電解めっき(奥野製薬製: ITO−7
0,83℃もしくは日本カゼニン製: 5I3−55−
1.63℃)を行って同図(d)に示すように厚さ約5
000人の遮光膜5Aを形成し、引き続きレジストパタ
ーン21を除去することによって容易に形成することが
できる。
FIGS. 2(a) to 2(d) are cross-sectional views illustrating an embodiment of the method for forming the above-mentioned light shielding film 5A. In the figure, first, a photoresist film 2 is placed on a transparent electrode 3A formed on the entire surface of a transparent substrate 1, as shown in FIG.
0, a resist pattern 21 of desired dimensions is formed to provide an opening 22, as shown in FIG. 2B. Next, clean the inside of these openings 22 with IT○ cleaner (manufactured by Okuno Pharmaceutical).
After degreasing for 3 minutes at about 50℃, washing with water,
Subsequently, activation treatment is performed with, for example, a 1% sulfuric acid solution, and after washing with water, the insides of these openings 22 are coated with N1-P electroless plating (manufactured by Okuno Pharmaceutical Co., Ltd.: ITO-7).
0.83℃ or manufactured by Nippon Kazenin: 5I3-55-
1.63°C) to a thickness of approximately 5°C as shown in Figure (d).
This can be easily formed by forming a light shielding film 5A of 1,000 yen and subsequently removing the resist pattern 21.

このように構成された液晶表示装置は、透光性電極3A
上の遮光膜5Aで覆われた部分は液晶7の液晶分子の配
向の有無に関係なく、光が遮断され、遮光膜5Aの存在
しない部分、すなわち所望の表示パターンとなる部分で
は透光性電極3A。
The liquid crystal display device configured in this way has a transparent electrode 3A.
The part covered with the upper light-shielding film 5A is blocked from light regardless of whether or not the liquid crystal molecules of the liquid crystal 7 are oriented, and the part where the light-shielding film 5A is not present, that is, the part where the desired display pattern is formed, is a transparent electrode. 3A.

4間に電圧が印加されると、液晶分子は電圧印加方向に
その長袖が平行に配列する。このため、対の偏光板10
.11が平行ニコルであれば、光が透過し、直交ニコル
であれば、光を遮断することなる。なお、電圧の無印加
もしくは透光性電極3A、4の存在しない場合には逆と
なる。これによって所望の表示パターンが鮮明に表示さ
れる。
When a voltage is applied between 4, the long sleeves of the liquid crystal molecules are aligned parallel to the voltage application direction. Therefore, the pair of polarizing plates 10
.. If 11 is a parallel Nicol, light will pass through it, and if it is a crossed Nicol, it will block light. Note that the opposite is true when no voltage is applied or when the transparent electrodes 3A and 4 are not present. This allows the desired display pattern to be clearly displayed.

このような構成によれば、表示パターン部分のエツジ部
に形成される有機配向膜6Aの膜厚の差が少なくなり、
透光性電極3Aの面上でほぼ均一となって遮光膜5Aで
のエツジ部のパターンの「きれ」が良好となり、鮮明な
表示パターンが得られる。
According to such a configuration, the difference in film thickness of the organic alignment film 6A formed at the edge portion of the display pattern portion is reduced;
The pattern is almost uniform on the surface of the light-transmitting electrode 3A, and the pattern at the edge portion of the light-shielding film 5A has good "sharpness", resulting in a clear display pattern.

第4図は本考案による液晶表示装置の他の実施例を示す
断面図であり、前述の図と同一部分には同一符号を付し
である。同図において、第1図と異なる点は、表示面側
透光性電極3Aと対向する背面側のセグメント電極とな
る透光性電極4上にカラーフィルタ12を形成したもの
であり、このような構成によれば、鮮明なカラー表示パ
ターンを得ることができる。
FIG. 4 is a sectional view showing another embodiment of the liquid crystal display device according to the present invention, and the same parts as in the previous figures are given the same reference numerals. In this figure, the difference from FIG. 1 is that a color filter 12 is formed on the transparent electrode 4, which becomes the segment electrode on the back side facing the transparent electrode 3A on the display surface side. According to the configuration, a clear color display pattern can be obtained.

なお、前述した実施例において、液晶セルの構成として
は、90度ねじれ配向を用いたが、液晶の種類によって
例えばホモジニアス配向もしくはホメオトロピック配向
を用いても適用できることは言うまでもない。
In the above-described embodiments, a 90 degree twisted orientation was used as the structure of the liquid crystal cell, but it goes without saying that, depending on the type of liquid crystal, for example, a homogeneous orientation or a homeotropic orientation may be used.

[発明の効果] 以上、説明したように本発明によれば、透光性基板の一
方に形成された透光性電極上の一部に無電解めっき層か
らなる遮光膜を設け、これら透光性電極、遮光股上に有
機配向膜を設けることにより、本発明の遮光膜が有機性
の遮光膜に比較して薄く形成されるので、遮光膜エツジ
部の有機配向膜の変化がほとんど見られず、鮮明な表示
パターンが得られ、視認性を大幅に向上させることがで
きる。また、遮光膜を、透光性基板に形成された透光性
電極上にフォトレジストパターンを形成する工程と、フ
ォトレジストパターン開口部を脱脂および活性化する工
程と、フォトレジストパターン開口部内に無電解めっき
層を形成する工程と、フォトレジストパターンを除去す
る工程とによって形成したことにより、透光性電極パタ
ーンとの位置合わせが極めて容易となるとともに遮光膜
が極めて簡単に形成でき、製造工程を大幅に短縮するこ
とができた。また、セルギャップの設定に対しても無電
解めっき層による遮光膜は面内スペーサによって漬れる
こともなく、粒径(管径)を選択することによりある程
度のばらつきで制御できる。さらに有機配向膜の高温度
焼成を行う際に同時に無電解めっき層と透光性電極との
間の密着強度を上げる熱処理も可能となり、効率良く、
密着性の良好な遮光膜が得られるなどの極めて優れた効
果が得られる。
[Effects of the Invention] As described above, according to the present invention, a light-shielding film made of an electroless plating layer is provided on a part of the light-transmitting electrode formed on one side of the light-transmitting substrate, and these light-transmitting By providing an organic alignment film on the polar electrode and the light-shielding crotch, the light-shielding film of the present invention is formed thinner than an organic light-shielding film, so almost no change in the organic alignment film at the edge of the light-shielding film is observed. , a clear display pattern can be obtained, and visibility can be greatly improved. In addition, the light-shielding film is applied to a light-shielding film through a step of forming a photoresist pattern on a light-transmitting electrode formed on a light-transmitting substrate, a step of degreasing and activating the opening of the photoresist pattern, and a step of degreasing and activating the opening of the photoresist pattern. By forming the electrolytic plating layer and removing the photoresist pattern, alignment with the light-transmitting electrode pattern is extremely easy, and the light-shielding film can be formed extremely easily, simplifying the manufacturing process. It was possible to shorten the time considerably. Further, regarding the setting of the cell gap, the light-shielding film formed by the electroless plating layer is not submerged by the in-plane spacer, and can be controlled to a certain degree of variation by selecting the particle size (tube diameter). Furthermore, when performing high-temperature baking of the organic alignment film, it is also possible to simultaneously perform heat treatment to increase the adhesion strength between the electroless plating layer and the transparent electrode.
Extremely excellent effects such as a light-shielding film with good adhesion can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による液晶表示装置の一実施例による構
成を示す断面図、第2図(a)〜(d)は本発明による
液晶表示装置の製造方法の一実施例を説明する工程の断
面図、第3図は本発明による液晶表示装置の他の実施例
による構成を示す断面図、第4図は従来の液晶表示装置
の構成を示す断面図、第5図は従来の液晶表示装置の問
題点を説明する要部拡大断面図、第6図は近年提案され
ている液晶表示装置の構成を示す断面図である。 1.2・・・・透光性基板、3A、4・・・・透光性電
極、5A・・・・遮光膜、6A・・・・有機配向膜、7
・・・一液晶、8・・・・シール剤、9゛ ・・・・液
晶表示素子、1.0.11・・・・偏光板、]2・・・
・カラーフィルタ。 特許出願人  ジエコー株式会社
FIG. 1 is a sectional view showing the structure of an embodiment of a liquid crystal display device according to the present invention, and FIGS. 3 is a sectional view showing the structure of another embodiment of the liquid crystal display device according to the present invention, FIG. 4 is a sectional view showing the structure of a conventional liquid crystal display device, and FIG. 5 is a sectional view showing the structure of a conventional liquid crystal display device. FIG. 6 is an enlarged cross-sectional view of a main part explaining the problem of the above, and FIG. 6 is a cross-sectional view showing the structure of a liquid crystal display device that has been proposed in recent years. 1.2...Transparent substrate, 3A, 4...Transparent electrode, 5A...Light shielding film, 6A...Organic alignment film, 7
...1 Liquid crystal, 8...Sealing agent, 9゛...Liquid crystal display element, 1.0.11...Polarizing plate, ]2...
・Color filter. Patent applicant G-Eco Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] (1)互いに対向して一対の透光性電極を有する2枚の
透光性基板間にネマティック液晶を封入して形成された
液晶表示素子の外面に偏光板を配置してなる液晶表示装
置において、前記透光性基板の一方に形成された透光性
電極上の一部に無電解めっき層からなる遮光膜を設け、
該透光性電極、遮光膜上に有機配向膜を設けたことを特
徴とする液晶表示装置。
(1) In a liquid crystal display device in which a polarizing plate is arranged on the outer surface of a liquid crystal display element formed by sealing nematic liquid crystal between two transparent substrates having a pair of transparent electrodes facing each other. , a light-shielding film made of an electroless plating layer is provided on a part of the light-transmitting electrode formed on one of the light-transmitting substrates,
A liquid crystal display device characterized in that an organic alignment film is provided on the light-transmitting electrode and the light-shielding film.
(2)請求項1において、前記遮光膜は、透光性基板に
形成された透光性電極上にフォトレジストパターンを形
成する工程と、前記フォトレジストパターン開口部を脱
脂および活性化する工程と、前記フォトレジストパター
ン開口部内に無電解めっき層を形成する工程と、前記フ
ォトレジストパターンを除去する工程とによって形成す
ることを特徴とした液晶表示装置の製造方法。
(2) In claim 1, the light shielding film includes a step of forming a photoresist pattern on a light-transmitting electrode formed on a light-transmitting substrate, and a step of degreasing and activating the opening of the photoresist pattern. . A method for manufacturing a liquid crystal display device, comprising the steps of: forming an electroless plating layer within the opening of the photoresist pattern; and removing the photoresist pattern.
JP2141521A 1990-06-01 1990-06-01 Liquid crystal display device and its production Pending JPH0436722A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2141521A JPH0436722A (en) 1990-06-01 1990-06-01 Liquid crystal display device and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2141521A JPH0436722A (en) 1990-06-01 1990-06-01 Liquid crystal display device and its production

Publications (1)

Publication Number Publication Date
JPH0436722A true JPH0436722A (en) 1992-02-06

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2141521A Pending JPH0436722A (en) 1990-06-01 1990-06-01 Liquid crystal display device and its production

Country Status (1)

Country Link
JP (1) JPH0436722A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997028483A1 (en) * 1996-01-30 1997-08-07 Seiko Epson Corporation Substrate for liquid crystal display, method of producing substrate for liquid crystal display, liquid crystal display and electronic device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997028483A1 (en) * 1996-01-30 1997-08-07 Seiko Epson Corporation Substrate for liquid crystal display, method of producing substrate for liquid crystal display, liquid crystal display and electronic device

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