JPH04365867A - Thin film forming device - Google Patents

Thin film forming device

Info

Publication number
JPH04365867A
JPH04365867A JP16775191A JP16775191A JPH04365867A JP H04365867 A JPH04365867 A JP H04365867A JP 16775191 A JP16775191 A JP 16775191A JP 16775191 A JP16775191 A JP 16775191A JP H04365867 A JPH04365867 A JP H04365867A
Authority
JP
Japan
Prior art keywords
shaft
film forming
chamber
substrate
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16775191A
Other languages
Japanese (ja)
Other versions
JP3008562B2 (en
Inventor
Hajime Hashimoto
橋本 一
Noboru Yamahara
山原 登
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP3167751A priority Critical patent/JP3008562B2/en
Publication of JPH04365867A publication Critical patent/JPH04365867A/en
Application granted granted Critical
Publication of JP3008562B2 publication Critical patent/JP3008562B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To improve the efficiency of substrate transportation and to provide the inexpensive device. CONSTITUTION:This device has an aperture 5 which is formed between a film forming chamber 1 and chamber 3 for attaching and detaching a substrate 4 which are adjacent to each other, a transporting shaft 14 which runs through this chamber 3 and the front end of which exists in the film forming chamber 1, a 1st valve disk 18 which is fixed to the front end of the transporting shaft 14 and closes the aperture 5 on retreating of the transporting shaft 14, a 2nd valve disk 20 which is fixed to the middle of the transporting shaft 14 and closes the aperture 5 on advancing of the transporting shaft 14, and a substrate holder 22 which is provided at the transporting shaft 14 between these two valve disks 18 and 20.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、基板の成膜室への搬送
を効率よく行うようにした薄膜形成装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film forming apparatus that efficiently transports a substrate to a film forming chamber.

【0002】0002

【従来の技術】従来の薄膜形成装置は図3及び図4に示
す構成になっている。それらの図において、1は排気手
段を備えた成膜室、2は成膜室1に上下動自在に設けら
れた基板ホルダ、3は成膜室1に隣接して設けられ排気
手段を備えた基板4の着脱室、5は成膜室1と着脱室3
との間に形成された開口、6は開口5を開閉するゲート
弁、7は着脱室3の後壁に形成された挿通口である。
2. Description of the Related Art A conventional thin film forming apparatus has a structure shown in FIGS. 3 and 4. In these figures, 1 is a film forming chamber equipped with an exhaust means, 2 is a substrate holder provided in the film forming chamber 1 so as to be movable up and down, and 3 is a substrate holder provided adjacent to the film forming chamber 1 and equipped with an exhaust means. The attachment/detachment chamber for the substrate 4; 5 is the deposition chamber 1 and the attachment/detachment chamber 3;
6 is a gate valve for opening and closing the opening 5, and 7 is an insertion port formed in the rear wall of the attachment/detachment chamber 3.

【0003】8は一端部が成膜室1に固着された支持杆
、9は成膜室1と支持杆8の他端部との間に設けられた
ガイド軸、10はガイド軸9に沿い移動自在に設けられ
た基板、11は基板10と着脱室3の後壁との間に設け
られたベローズ、12は支持杆8の他端部に設けられた
エアシリンダであり、シリンダ軸13の先端が基板10
に固着され、基板10を前進,後退させる。14は基部
が基板10に固着された搬送軸であり、挿通口7を挿通
し、先端部に基板4が載置される。
8 is a support rod whose one end is fixed to the film forming chamber 1; 9 is a guide shaft provided between the film forming chamber 1 and the other end of the support rod 8; and 10 is a support rod along the guide shaft 9. 11 is a bellows provided between the substrate 10 and the rear wall of the attachment/detachment chamber 3; 12 is an air cylinder provided at the other end of the support rod 8; The tip is the substrate 10
The substrate 10 is moved forward and backward. Reference numeral 14 denotes a conveying shaft whose base is fixed to the substrate 10, which is inserted through the insertion opening 7, and the substrate 4 is placed on the tip thereof.

【0004】そして、ゲート弁6を閉じた状態で着脱室
3を開き、搬送軸14に基板4を載置し、着脱室3を閉
じ、着脱室3を荒引きし、ゲート弁6を開き、エアシリ
ンダ12により搬送軸14を前進し、排気状態にある成
膜室1に基板4を開口5を通して挿入する。このとき、
基板4の両側部が搬送軸14から突き出しており、基板
ホルダ2の両側の爪15が基板14の両側部の下部に位
置し、基板ホルダ2の上動により基板4が基板ホルダ2
に把持される。つぎに搬送軸14をエアシリンダ12に
より後退し、ゲート弁6を閉じる。
[0004] Then, with the gate valve 6 closed, the attachment/detachment chamber 3 is opened, the substrate 4 is placed on the transfer shaft 14, the attachment/detachment chamber 3 is closed, the attachment/detachment chamber 3 is roughly pulled out, and the gate valve 6 is opened. The transport shaft 14 is advanced by the air cylinder 12, and the substrate 4 is inserted through the opening 5 into the film forming chamber 1 which is in an evacuated state. At this time,
Both sides of the substrate 4 protrude from the transport shaft 14, and claws 15 on both sides of the substrate holder 2 are located at the bottom of both sides of the substrate 14, and as the substrate holder 2 moves upward, the substrate 4 is moved to the substrate holder 2.
is grasped by. Next, the conveying shaft 14 is moved back by the air cylinder 12, and the gate valve 6 is closed.

【0005】成膜完了後、ゲート弁6を開き、搬送軸1
4を前進し、基板ホルダ2を下動して基板4を搬送軸1
4の先端部に載置し、搬送軸14を後退し、ゲート弁6
を閉じ、着脱室3を開いて基板4を交換し、前記作業を
繰り返す。
After the film formation is completed, the gate valve 6 is opened and the transport shaft 1 is opened.
4, move the substrate holder 2 down, and transfer the substrate 4 to the transport shaft 1.
4, move back the conveying shaft 14, and close the gate valve 6.
, open the attachment/detachment chamber 3, replace the board 4, and repeat the above operations.

【0006】[0006]

【発明が解決しようとする課題】従来の前記装置の場合
、搬送軸14と基板ホルダ2との間における基板4の受
け渡し機構を要して構成が複雑であり、かつ、両者の位
置合せがきわめて困難であり、その上、搬送軸14の長
寸にともない搬送軸14がたわみ、一層位置合せが問題
である。さらに、搬送軸14が前進したのち後退し、ゲ
ート弁6が閉じるまで成膜を行えなく、搬送工程に長時
間を要し、しかもゲート弁6が高価であるという問題点
がある。
[Problems to be Solved by the Invention] In the case of the above-mentioned conventional device, the structure is complicated as it requires a mechanism for transferring the substrate 4 between the transport shaft 14 and the substrate holder 2, and the alignment of the two is extremely difficult. Moreover, as the conveying shaft 14 becomes longer, the conveying shaft 14 bends, making alignment even more problematic. Further, there are problems in that the transport shaft 14 moves forward and then retreats, and film formation cannot be performed until the gate valve 6 is closed, requiring a long time for the transport process, and furthermore, the gate valve 6 is expensive.

【0007】本発明は、前記の点に留意し、構成を簡単
にし、基板の搬送の効率化をはかり、安価な薄膜形成装
置を提供することを目的とする。
[0007] The present invention has been made with the above points in mind, and an object of the present invention is to provide an inexpensive thin film forming apparatus that has a simple structure, improves the efficiency of substrate conveyance.

【0008】[0008]

【課題を解決するための手段】前記課題を解決するため
に、本発明の薄膜形成装置は、隣接した成膜室と基板の
着脱室との間に形成された開口と、着脱室を貫通し先端
が成膜室に位置した搬送軸と、搬送軸の先端に固着され
搬送軸の後退時に前記開口を閉塞する第1弁体と、搬送
軸の中間に固着され搬送軸の前進時に前記開口を閉塞す
る第2弁体と、両弁体の中間の搬送軸に設けられた基板
ホルダとを備えたものである。
[Means for Solving the Problems] In order to solve the above-mentioned problems, the thin film forming apparatus of the present invention has an opening formed between an adjacent film forming chamber and a substrate attachment/detachment chamber, and an opening that penetrates the attachment/detachment chamber. A conveyance shaft whose tip is located in the film forming chamber, a first valve body fixed to the tip of the conveyance shaft to close the opening when the conveyance shaft retreats, and a first valve body fixed to the middle of the conveyance shaft to close the opening when the conveyance shaft moves forward. It is equipped with a second valve body that closes, and a substrate holder provided on a conveyance shaft between the two valve bodies.

【0009】[0009]

【作用】前記のように構成された本発明の薄膜形成装置
は、搬送軸の先端に搬送軸の後退時、成膜室と着脱室と
の間の開口を閉塞する第1弁体が固着され、搬送軸の中
間に搬送軸の前進時前記開口を閉塞する第2弁体が固着
され、両弁体の中間の搬送軸に基板ホルダが設けられて
いるため、搬送軸の後退により開口が閉塞され、着脱室
で基板の交換をしたのち、搬送軸を前進することにより
開口が閉塞され、その状態で成膜が行え、従来のような
基板の受け渡し機構,位置合せ,高価なゲート弁を要し
ない。
[Operation] In the thin film forming apparatus of the present invention configured as described above, a first valve body is fixed to the tip of the transport shaft to close the opening between the film forming chamber and the attachment/detachment chamber when the transport shaft is retreated. , a second valve body that closes the opening when the conveyance shaft advances is fixed in the middle of the conveyance shaft, and a substrate holder is provided on the conveyance shaft between both valve bodies, so that the opening is closed when the conveyance shaft retreats. After replacing the substrate in the loading/unloading chamber, the opening is closed by moving the transport shaft forward, and film formation can be performed in this state, eliminating the need for a conventional substrate transfer mechanism, positioning, and expensive gate valve. do not.

【0010】0010

【実施例】1実施例について図1及び図2を参照して説
明する。それらの図において図3と同一符号は同一もし
くは相当するものを示す。16は成膜室1の上部に設け
られたガイド軸、17はガイド軸16に移動自在に設け
られたガイド体、18は搬送軸14の先端に固着された
第1弁体であり、ガイド体17に固着し、搬送軸14の
後退時、開口5の周縁のOリング19に当接し、開口5
を閉塞する。20は搬送軸14の中間に固着された第2
弁体であり、搬送軸14の前進時、開口5の周縁のOリ
ング21に当接し、開口5を閉塞する。22は両弁体1
8,20のほぼ中間の搬送軸14に固着された基板ホル
ダである。
Embodiment One embodiment will be described with reference to FIGS. 1 and 2. In those figures, the same reference numerals as in FIG. 3 indicate the same or equivalent parts. 16 is a guide shaft provided at the upper part of the film forming chamber 1; 17 is a guide body movably provided on the guide shaft 16; 18 is a first valve body fixed to the tip of the transport shaft 14; 17, and when the conveyance shaft 14 retreats, it comes into contact with the O-ring 19 on the periphery of the opening 5, and the opening 5
occlude. 20 is a second
It is a valve body that comes into contact with the O-ring 21 at the periphery of the opening 5 when the conveyance shaft 14 moves forward, thereby closing the opening 5. 22 is both valve body 1
This is a substrate holder fixed to a transport shaft 14 approximately in the middle of the substrates 8 and 20.

【0011】図1の状態,すなわち搬送軸14が後退し
、第1弁体18が開口5を閉塞した状態において、着脱
室3の基板ホルダ22に基板4を取り付け、着脱室3を
閉じて荒引きし、エアシリンダ12により基板10を介
して搬送軸14を前進し、図2に示すように、第2弁体
20をOリング21に当接して開口5を閉塞するととも
に、基板ホルダ22の基板4を成膜室1に位置させ、成
膜を行う。
In the state shown in FIG. 1, that is, in a state in which the conveyance shaft 14 is retracted and the first valve body 18 closes the opening 5, the substrate 4 is attached to the substrate holder 22 of the attachment/detachment chamber 3, and the attachment/detachment chamber 3 is closed and roughened. The transport shaft 14 is advanced through the substrate 10 by the air cylinder 12, and as shown in FIG. The substrate 4 is placed in the film formation chamber 1, and film formation is performed.

【0012】成膜完了後、エアシリンダ12により搬送
軸14を後退し、図1に示すように、第1弁体18が開
口5を閉塞し、基板4を交換し、前記作業を繰り返す。
After the film formation is completed, the transport shaft 14 is moved back by the air cylinder 12, the first valve body 18 closes the opening 5 as shown in FIG. 1, the substrate 4 is replaced, and the above operation is repeated.

【0013】なお、着脱室3の後壁の挿通口7を狭小に
し、搬送軸14をOリング等の気密機構を介して挿通す
るようにすれば、ベローズ11を要しない。
Note that the bellows 11 is not required if the insertion opening 7 in the rear wall of the attachment/detachment chamber 3 is narrowed and the conveyance shaft 14 is inserted through an airtight mechanism such as an O-ring.

【0014】[0014]

【発明の効果】本発明は、以上説明したように構成され
ているので、以下に記載する効果を奏する。搬送軸14
の先端に搬送軸14の後退時、成膜室1と着脱室3との
間の開口5を閉塞する第1弁体18が固着され、搬送軸
14の中間に搬送軸14の前進時前記開口5を閉塞する
第2弁体20が固着され、両弁体18,20の中間の搬
送軸14に基板ホルダ22が設けられているため、搬送
軸14の後退時、第1弁体18により開口5を閉塞でき
、着脱室3で基板4の交換をしたのち、搬送軸14の前
進時、第2弁体20により開口5を閉塞でき、その状態
で成膜が行え、従来のように複雑な基板4の受け渡し機
構,位置合せ,高価なゲート弁を要しなく、構成が簡単
で安価であり、かつ、搬送工程が半減して搬送効率を向
上することができる。
[Effects of the Invention] Since the present invention is constructed as described above, it produces the effects described below. Conveyance shaft 14
A first valve body 18 that closes the opening 5 between the film forming chamber 1 and the attachment/detachment chamber 3 when the transport shaft 14 retreats is fixed to the tip of the transport shaft 14 , and a first valve body 18 that closes the opening 5 between the film forming chamber 1 and the attachment/detachment chamber 3 when the transport shaft 14 moves back is fixed to the middle of the transport shaft 14 . Since the second valve body 20 that closes the valve 5 is fixed, and the substrate holder 22 is provided on the conveying shaft 14 between the two valve bodies 18 and 20, when the conveying shaft 14 is retreated, the opening is closed by the first valve body 18. After exchanging the substrate 4 in the loading/unloading chamber 3, when the transport shaft 14 moves forward, the opening 5 can be closed by the second valve body 20, and film formation can be performed in this state, which eliminates the complicated process of conventional methods. There is no need for a transfer mechanism for the substrate 4, no positioning, no expensive gate valves, the structure is simple and inexpensive, and the number of transport steps can be halved to improve transport efficiency.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の薄膜形成装置の1実施例の切断正面図
である。
FIG. 1 is a cutaway front view of one embodiment of the thin film forming apparatus of the present invention.

【図2】図1の他の状態を示す図である。FIG. 2 is a diagram showing another state of FIG. 1;

【図3】従来例の切断正面図である。FIG. 3 is a cutaway front view of a conventional example.

【図4】図3の一部の側面図である。FIG. 4 is a side view of a portion of FIG. 3;

【符号の説明】[Explanation of symbols]

1  成膜室 3  着脱室 4  基板 5  開口 14  搬送軸 18  第1弁体 20  第2弁体 22  基板ホルダ 1 Film forming chamber 3. Detachable room 4 Board 5 Opening 14 Conveyance axis 18 First valve body 20 Second valve body 22 Substrate holder

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  隣接した成膜室と基板の着脱室との間
に形成された開口と、前記着脱室を貫通し先端が前記成
膜室に位置した搬送軸と、該搬送軸の先端に固着され前
記搬送軸の後退時に前記開口を閉塞する第1弁体と、前
記搬送軸の中間に固着され前記搬送軸の前進時に前記開
口を閉塞する第2弁体と、前記両弁体の中間の前記搬送
軸に設けられた基板ホルダとを備えた薄膜形成装置。
1. An opening formed between an adjacent film forming chamber and a substrate attachment/detachment chamber, a transport shaft that passes through the attachment/detachment chamber and whose tip is located in the film formation chamber, and an opening formed at the tip of the transport shaft. a first valve body that is fixed and closes the opening when the conveyance shaft moves backward; a second valve body that is fixed to the middle of the conveyance shaft and closes the opening when the conveyance shaft advances; and an intermediate between the two valve bodies. A thin film forming apparatus, comprising: a substrate holder provided on the transport shaft.
JP3167751A 1991-06-12 1991-06-12 Thin film forming equipment Expired - Fee Related JP3008562B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3167751A JP3008562B2 (en) 1991-06-12 1991-06-12 Thin film forming equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3167751A JP3008562B2 (en) 1991-06-12 1991-06-12 Thin film forming equipment

Publications (2)

Publication Number Publication Date
JPH04365867A true JPH04365867A (en) 1992-12-17
JP3008562B2 JP3008562B2 (en) 2000-02-14

Family

ID=15855427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3167751A Expired - Fee Related JP3008562B2 (en) 1991-06-12 1991-06-12 Thin film forming equipment

Country Status (1)

Country Link
JP (1) JP3008562B2 (en)

Also Published As

Publication number Publication date
JP3008562B2 (en) 2000-02-14

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