JPH04360883A - Production of oxetane derivative - Google Patents
Production of oxetane derivativeInfo
- Publication number
- JPH04360883A JPH04360883A JP13790591A JP13790591A JPH04360883A JP H04360883 A JPH04360883 A JP H04360883A JP 13790591 A JP13790591 A JP 13790591A JP 13790591 A JP13790591 A JP 13790591A JP H04360883 A JPH04360883 A JP H04360883A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- formula
- lower alkyl
- oxetane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title description 5
- 150000002921 oxetanes Chemical class 0.000 title description 2
- 150000001875 compounds Chemical class 0.000 claims abstract description 69
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 31
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 7
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 6
- 150000002367 halogens Chemical class 0.000 claims abstract description 6
- 230000000269 nucleophilic effect Effects 0.000 claims abstract description 6
- 150000003852 triazoles Chemical class 0.000 claims abstract description 4
- 238000006243 chemical reaction Methods 0.000 claims description 27
- 239000000126 substance Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 17
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 12
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 9
- 229910052731 fluorine Chemical group 0.000 claims description 6
- 125000001153 fluoro group Chemical group F* 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000006239 protecting group Chemical group 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- 235000007586 terpenes Nutrition 0.000 claims description 2
- -1 alcohol compound Chemical class 0.000 abstract description 106
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract description 39
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract description 37
- 239000002904 solvent Substances 0.000 abstract description 21
- 125000003566 oxetanyl group Chemical group 0.000 abstract description 13
- 230000000855 fungicidal effect Effects 0.000 abstract description 4
- 230000002070 germicidal effect Effects 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 78
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 42
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 42
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 30
- 239000000203 mixture Substances 0.000 description 28
- 238000001819 mass spectrum Methods 0.000 description 26
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 25
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 24
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 18
- 150000003839 salts Chemical class 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 14
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 13
- 125000003118 aryl group Chemical group 0.000 description 13
- 239000002585 base Substances 0.000 description 13
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 10
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 9
- 125000003158 alcohol group Chemical group 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 9
- 239000011541 reaction mixture Substances 0.000 description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 8
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 8
- 239000013078 crystal Substances 0.000 description 8
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 125000005129 aryl carbonyl group Chemical group 0.000 description 7
- 125000005843 halogen group Chemical group 0.000 description 7
- 229910000027 potassium carbonate Inorganic materials 0.000 description 7
- 238000010898 silica gel chromatography Methods 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000002252 acyl group Chemical group 0.000 description 6
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 6
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 6
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 6
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 5
- 229910002651 NO3 Inorganic materials 0.000 description 5
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 5
- 150000002170 ethers Chemical class 0.000 description 5
- 239000005457 ice water Substances 0.000 description 5
- 239000003208 petroleum Substances 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 229910000029 sodium carbonate Inorganic materials 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 4
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 4
- 150000008041 alkali metal carbonates Chemical class 0.000 description 4
- 125000004849 alkoxymethyl group Chemical group 0.000 description 4
- 125000005103 alkyl silyl group Chemical group 0.000 description 4
- 230000000843 anti-fungal effect Effects 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical compound CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- BIELZWDKOJZMOG-UHFFFAOYSA-N ethyl 2-(4-chlorophenyl)-2-oxoacetate Chemical compound CCOC(=O)C(=O)C1=CC=C(Cl)C=C1 BIELZWDKOJZMOG-UHFFFAOYSA-N 0.000 description 4
- 150000008282 halocarbons Chemical class 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 238000002955 isolation Methods 0.000 description 4
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 4
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 4
- 235000017557 sodium bicarbonate Nutrition 0.000 description 4
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 3
- SNTWKPAKVQFCCF-UHFFFAOYSA-N 2,3-dihydro-1h-triazole Chemical compound N1NC=CN1 SNTWKPAKVQFCCF-UHFFFAOYSA-N 0.000 description 3
- 125000005999 2-bromoethyl group Chemical group 0.000 description 3
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 3
- 125000004777 2-fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- 229940126062 Compound A Drugs 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 230000026030 halogenation Effects 0.000 description 3
- 238000005658 halogenation reaction Methods 0.000 description 3
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Inorganic materials [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 150000007530 organic bases Chemical class 0.000 description 3
- 229960005235 piperonyl butoxide Drugs 0.000 description 3
- 239000012312 sodium hydride Substances 0.000 description 3
- 229910000104 sodium hydride Inorganic materials 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- 125000006281 4-bromobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Br)C([H])([H])* 0.000 description 2
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 2
- 125000004217 4-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1OC([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000006181 4-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])C([H])([H])* 0.000 description 2
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 2
- 229910001863 barium hydroxide Inorganic materials 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001728 carbonyl compounds Chemical class 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 2
- XNMQEEKYCVKGBD-UHFFFAOYSA-N dimethylacetylene Natural products CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- OAYLNYINCPYISS-UHFFFAOYSA-N ethyl acetate;hexane Chemical compound CCCCCC.CCOC(C)=O OAYLNYINCPYISS-UHFFFAOYSA-N 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000001188 haloalkyl group Chemical group 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 229910000103 lithium hydride Inorganic materials 0.000 description 2
- 125000005948 methanesulfonyloxy group Chemical group 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
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- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 1
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- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- NCCBCEHAGCSKEA-UHFFFAOYSA-N pentaiodo-$l^{5}-phosphane Chemical compound IP(I)(I)(I)I NCCBCEHAGCSKEA-UHFFFAOYSA-N 0.000 description 1
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- UXCDUFKZSUBXGM-UHFFFAOYSA-N phosphoric tribromide Chemical compound BrP(Br)(Br)=O UXCDUFKZSUBXGM-UHFFFAOYSA-N 0.000 description 1
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- 230000001766 physiological effect Effects 0.000 description 1
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- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 125000003696 stearoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 101150035983 str1 gene Proteins 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 238000006277 sulfonation reaction Methods 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 150000003461 sulfonyl halides Chemical class 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- NBNBICNWNFQDDD-UHFFFAOYSA-N sulfuryl dibromide Chemical compound BrS(Br)(=O)=O NBNBICNWNFQDDD-UHFFFAOYSA-N 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- HFRXJVQOXRXOPP-UHFFFAOYSA-N thionyl bromide Chemical compound BrS(Br)=O HFRXJVQOXRXOPP-UHFFFAOYSA-N 0.000 description 1
- RKIDPTUGNXTOMU-UHFFFAOYSA-N thionyl iodide Chemical compound IS(I)=O RKIDPTUGNXTOMU-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 description 1
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- JABYJIQOLGWMQW-UHFFFAOYSA-N undec-4-ene Chemical compound CCCCCCC=CCCC JABYJIQOLGWMQW-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Agricultural Chemicals And Associated Chemicals (AREA)
- Epoxy Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
Abstract
Description
【0001】0001
【0002】0002
【産業上の利用分野】本発明は、優れた農業用殺菌活性
及び抗真菌活性を有する一般式(I)[Industrial Application Field] The present invention provides compounds of the general formula (I) having excellent agricultural fungicidal and antifungal activities.
【0003】0003
【化6】[C6]
【0004】[式中、X1 、X2 及びX3 は同一
又は異なって、水素原子、ハロゲン原子、低級アルキル
基、低級アルコキシ基、ハロゲノ低級アルキル基又はハ
ロゲノ低級アルコキシ基を示し、R1 及びR2 は同
一又は異なって、低級アルキル基を示し、AはN又はC
Hを示す。]で表わされる化合物を立体選択的に製造す
る方法に関する。[In the formula, X1, X2 and X3 are the same or different and represent a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxy group, a halogeno-lower alkyl group or a halogeno-lower alkoxy group, and R1 and R2 are the same or differently denotes a lower alkyl group, where A is N or C
Indicates H. This invention relates to a method for stereoselectively producing a compound represented by
【0005】すなわち、一般式(I)で表わされる化合
物は不斉炭素が3個存在し、4個のジアステレオアイソ
マーが存在する。これらのジアステレオアイソマーは、
それぞれ農業用殺菌活性及び抗真菌活性が異なっており
、そのうちより高活性な立体配位を有する一般式(I)
で表わされる異性体を立体選択的に製造する方法を提供
する。That is, the compound represented by the general formula (I) has three asymmetric carbon atoms and four diastereoisomers. These diastereoisomers are
The general formula (I) has different agricultural bactericidal activity and antifungal activity, and has a more active steric configuration.
Provided is a method for stereoselectively producing an isomer represented by
【0006】[0006]
【従来の技術】農業用殺菌活性及び抗真菌活性を有する
トリアゾール系化合物は多種知られているが、オキセタ
ン骨格を有する化合物としては、ヨーロッパ公開特許公
報(EP−318214A)に記載されている(A)が
製造されているのみである。BACKGROUND OF THE INVENTION A variety of triazole compounds having agricultural fungicidal and antifungal activities are known, but a compound having an oxetane skeleton is described in European Patent Publication (EP-318214A) (A ) are only manufactured.
【0007】[0007]
【化7】[C7]
【0008】しかし、化合物(A)の製造方法は、However, the method for producing compound (A) is
【0
009】0
009]
【化8】[Chemical formula 8]
【0010】であり、オキセタン環4位の立体配位を規
制することができず4位がα配位の異性体と4位がβ配
位の異性体の両方が生成する。このため、化合物(c)
の両異性体をクロマトグラフィーで分離し、得られた各
異性体を用いて環化反応を行ない、化合物(A)の4位
がα配位の異性体と4位がβ配位の異性体を得ている。##STR1## The configuration of the 4-position of the oxetane ring cannot be controlled, and both an isomer in which the 4-position is α-coordinated and an isomer in which the 4-position is β-coordinate are produced. For this reason, compound (c)
The isomers of compound (A) are separated by chromatography, and each of the obtained isomers is used to perform a cyclization reaction to obtain an isomer in which the 4-position of compound (A) is α-coordinated and an isomer in which the 4-position is β-coordinated. I am getting .
【0011】又、オキセタン環の製造法としては、佐藤
及び田村、テトラヘドロン・レターズ、第25巻 第
1821頁乃至第1824頁(1984年):T.Sa
to,K.Tamura.,Tetrahedron
Letters, vol 25,1821〜1824
(1984)に、[0011] Further, as a method for producing an oxetane ring, see Sato and Tamura, Tetrahedron Letters, Vol. 25, pp. 1821 to 1824 (1984): T. Sa
to, K. Tamura. , Tetrahedron
Letters, vol 25, 1821-1824
(1984),
【0012】0012
【化9】[Chemical formula 9]
【0013】で表わされる光反応により、化合物(d)
と化合物(e)から化合物(f)を得たとの報告がある
。しかし、その収率、物性及び最適波長についての記載
はない。更に、化合物(f)のオキセタン環4位の立体
についての考察は全くなされていず、しかも化合物(f
)においてはオキセタン環3位についての立体異性体は
存在しない。Compound (d) is formed by the photoreaction represented by
There is a report that compound (f) was obtained from compound (e). However, there is no description regarding its yield, physical properties, and optimum wavelength. Furthermore, no consideration has been given to the steric structure at the 4-position of the oxetane ring of compound (f).
), there are no stereoisomers at the 3-position of the oxetane ring.
【0014】一方、フェニルグリオキシル酸エステル類
(g)とオレフィン(h)との光反応でオキセタン環(
i)を得たとの報告が、T.Oppenlaender
and P.schoenholzer [Helv
etica Chimica Acta,Vol.72
,1792,(1989) ]によってなされている。
しかし、オキセタン環2位の不斉については記載がある
ものの、オキセタン環の3位又は4位は不斉炭素ではな
く、当然のことではあるがそれらの位置の立体について
は何ら記載がない。On the other hand, the oxetane ring (
i) was reported to have been obtained by T. Openlaender
and P. schoenholzer [Helv
etica Chimica Acta, Vol. 72
, 1792, (1989)]. However, although there is a description of the asymmetry of the 2-position of the oxetane ring, the 3- or 4-position of the oxetane ring is not an asymmetric carbon, and as a matter of course there is no description of the stereochemistry at those positions.
【0015】[0015]
【化10】[Chemical formula 10]
【0016】[0016]
【発明が解決しようとする課題】本発明者等は、トリア
ゾール骨格を有する誘導体の合成とその生理活性につい
て永年に亘り鋭意研究を行なった結果、従来のトリアゾ
ール系化合物とは構造を異にする、オキセタン骨格を有
する新規なトリアゾール系化合物が、優れた農業用殺菌
活性及び抗真菌活性を有することを見い出し、更にそれ
ら化合物の異性体のうちでもより高活性な異性体を立体
選択的に製造する方法を見い出し、本発明を完成した。[Problems to be Solved by the Invention] As a result of many years of intensive research into the synthesis of derivatives having a triazole skeleton and their physiological activities, the present inventors have found that they have a structure different from that of conventional triazole compounds. It has been discovered that novel triazole compounds having an oxetane skeleton have excellent agricultural fungicidal activity and antifungal activity, and a method for stereoselectively producing the more highly active isomers of these compounds. They discovered this and completed the present invention.
【0017】[0017]
【0018】[0018]
【課題を解決するための手段】本発明は、新規なオキセ
タン誘導体又はそれらの塩の製造法及びそれらの分離法
よりなる。SUMMARY OF THE INVENTION The present invention comprises a novel method for producing oxetane derivatives or salts thereof, and a method for separating them.
【0019】本発明は、一般式(V)The present invention provides the general formula (V)
【0020】[0020]
【化11】[Chemical formula 11]
【0021】[式中、X1 、X2 、X3 及びRは
前記と同意義を示し、AはN又はCHを示す。]で表さ
れる化合物と、一般式(VI)[In the formula, X1, X2, X3 and R have the same meanings as above, and A represents N or CH. ] and the general formula (VI)
【0022】[0022]
【化12】R1 −CH=CH−R2
(VI)[式中、R1 及びR2 はは前記と同意義
を示す。]で表される化合物とを光照射のもとに反応し
、一般式(IV)[Chemical formula 12] R1 -CH=CH-R2
(VI) [wherein R1 and R2 have the same meanings as above. ] under light irradiation to form a compound represented by the general formula (IV)
【0023】[0023]
【化13】[Chemical formula 13]
【0024】[式中、X1 、X2 、X3 、R1
、R2 及びRは前記と同意義を示す。]で表される化
合物を立体選択的に製造する方法及び、一般式(II)
[In the formula, X1, X2, X3, R1
, R2 and R have the same meanings as above. ] A method for stereoselectively producing a compound represented by formula (II)
【0025】[0025]
【化14】[Chemical formula 14]
【0026】[式中、X1 、X2 、X3 、R1
及びR2 は前記と同意義を示し、Yは求核性脱離基を
示す。]で表わされる化合物と、トリアゾール又はイミ
ダゾールとを反応し、一般式(I)[In the formula, X1, X2, X3, R1
and R2 have the same meanings as above, and Y represents a nucleophilic leaving group. ] is reacted with triazole or imidazole to form a compound represented by the general formula (I)
【0027】[0027]
【化15】[Chemical formula 15]
【0028】[式中、X1 、X2 、X3 、R1
及びR2 は前記と同意義を示し、AはN又はCHを示
す。]で表わされる化合物を立体選択的に製造する方法
に関する。[In the formula, X1, X2, X3, R1
and R2 have the same meanings as above, and A represents N or CH. This invention relates to a method for stereoselectively producing a compound represented by
【0029】本発明は、以下の式で表される。The present invention is expressed by the following formula.
【0030】[0030]
【化16】[Chemical formula 16]
【0031】更に、一般式(I)の化合物を塩に誘導す
ることによって、一般式(I)の化合物を反応混合物か
ら単離する方法に関する。The present invention further relates to a process for isolating a compound of general formula (I) from a reaction mixture by derivatizing the compound into a salt.
【0032】X1 、X2 及びX3 の定義における
「ハロゲン原子」とは、弗素原子、塩素原子、臭素原子
又は沃素原子を示し、好適には、弗素原子又は塩素原子
である。The "halogen atom" in the definitions of X1, X2 and X3 refers to a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, preferably a fluorine atom or a chlorine atom.
【0033】上記において、X1 、X2 、X3 、
R1 、R2 及びRの定義における「低級アルキル基
」とは、例えば、メチル、エチル、n−プロピル、イソ
プロピル、n−ブチル、イソブチル、s−ブチル、t−
ブチル、n−ペンチル、イソペンチル、2−メチルブチ
ル、ネオペンチル、n−ヘキシル、4−メチルペンチル
、3−メチルペンチル、2−メチルペンチル、3,3
−ジメチルブチル、2,2 −ジメチルブチル、1,1
−ジメチルブチル、1,2 −ジメチルブチル、1,
3 −ジメチルブチル、2,3 −ジメチルブチルのよ
うな炭素数1乃至6個の直鎖又は分枝鎖アルキル基であ
り、好適には炭素数1乃至4個のアルキル基であり、更
に好適にはメチル基又はエチル基である。[0033] In the above, X1, X2, X3,
The "lower alkyl group" in the definitions of R1, R2 and R is, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-
Butyl, n-pentyl, isopentyl, 2-methylbutyl, neopentyl, n-hexyl, 4-methylpentyl, 3-methylpentyl, 2-methylpentyl, 3,3
-dimethylbutyl, 2,2-dimethylbutyl, 1,1
-dimethylbutyl, 1,2-dimethylbutyl, 1,
A straight or branched alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, such as 3-dimethylbutyl or 2,3-dimethylbutyl. is a methyl group or an ethyl group.
【0034】上記において、X1 、X2 、X3 、
R1 、R2 及びRの定義における「低級アルコキシ
基」とは、前記「低級アルキル基」が酸素原子に結合し
た基である。[0034] In the above, X1, X2, X3,
The "lower alkoxy group" in the definitions of R1, R2, and R is a group in which the above-mentioned "lower alkyl group" is bonded to an oxygen atom.
【0035】上記において、X1 、X2 及びX3
の定義における「低級ハロゲノアルキル基」とは、例え
ば、トリフルオロメチル、トリクロロメチル、ジフルオ
ロメチル、ジクロロメチル、ジブロモメチル、フルオロ
メチル、2,2,2 −トリクロロエチル、2,2,2
−トリフルオロエチル、2−ブロモエチル、2−クロ
ロエチル、2−フルオロエチル、2,2 −ジブロモエ
チルのような、前記「低級アルキル基」に1乃至3個ハ
ロゲン原子が置換した基であり、好適には、例えばトリ
フルオロメチル、トリクロロメチル、ジフルオロメチル
、2−ブロモエチル、2−クロロエチル又は2−フルオ
ロエチルのような炭素数1乃至2個の低級アルキル基に
フッ素原子、塩素原子又は臭素原子が1乃至3個置換し
た基であり、更に好適には、トリフルオロメチル、トリ
クロロメチル、ジフルオロメチル、2−ブロモエチル、
2−クロロエチル又は2−フルオロエチルである。In the above, X1, X2 and X3
"Lower halogenoalkyl group" in the definition of
- A group in which the above-mentioned "lower alkyl group" is substituted with 1 to 3 halogen atoms, such as trifluoroethyl, 2-bromoethyl, 2-chloroethyl, 2-fluoroethyl, and 2,2-dibromoethyl, and is preferably is a lower alkyl group having 1 to 2 carbon atoms, such as trifluoromethyl, trichloromethyl, difluoromethyl, 2-bromoethyl, 2-chloroethyl or 2-fluoroethyl, in which 1 to 1 fluorine atom, chlorine atom or bromine atom is present. A 3-substituted group, more preferably trifluoromethyl, trichloromethyl, difluoromethyl, 2-bromoethyl,
2-chloroethyl or 2-fluoroethyl.
【0036】上記において、X1 、X2 及びX3
の定義における「低級ハロゲノアルコキシ基」とは、前
記「低級ハロゲノアルキル基」が酸素原子に結合した基
である。In the above, X1, X2 and X3
The "lower halogenoalkoxy group" in the definition is a group in which the "lower halogenoalkyl group" is bonded to an oxygen atom.
【0037】上記において、Rの定義における「アラル
キル基」とは、「アリール基」が前記「低級アルキル基
」に結合した基をいい、例えば、ベンジル、α− ナフ
チルメチル、β− ナフチルメチル、ジフェニルメチル
、トリフェニルメチル、α− ナフチルジフェニルメチ
ルのような1乃至3個のアリ−ル基で置換された低級ア
ルキル基、4−メチルベンジル、2,4,6−トリメチ
ルベンジル、3,4,5−トリメチルベンジル、4−メ
トキシベンジル、4−メトキシフェニルジフェニルメチ
ル、2−ニトロベンジル、4−ニトロベンジル、4−ク
ロロベンジル、4−ブロモベンジル、4−シアノベンジ
ル、4−シアノベンジルジフェニルメチル、ビス(2−
ニトロフェニル) メチル、ピペロニルのような低級
アルキル、低級アルコキシ、ニトロ、ハロゲン、シアノ
基でアリ−ル環が置換された1乃至3個のアリ−ル基で
置換された低級アルキル基のような基であり、好適には
、例えば、ベンジル基又はジフェニルメチル基のような
、炭素数6ないし12個のアリール基が1又は乃至2個
炭素数1又は2個の低級アルキル基に結合した基であり
、更に好適にはベンジル基又はジフェニルメチル基であ
る。In the above, the "aralkyl group" in the definition of R refers to a group in which an "aryl group" is bonded to the "lower alkyl group", such as benzyl, α-naphthylmethyl, β-naphthylmethyl, diphenyl Lower alkyl groups substituted with 1 to 3 aryl groups such as methyl, triphenylmethyl, α-naphthyldiphenylmethyl, 4-methylbenzyl, 2,4,6-trimethylbenzyl, 3,4,5 -trimethylbenzyl, 4-methoxybenzyl, 4-methoxyphenyldiphenylmethyl, 2-nitrobenzyl, 4-nitrobenzyl, 4-chlorobenzyl, 4-bromobenzyl, 4-cyanobenzyl, 4-cyanobenzyldiphenylmethyl, bis( 2-
(Nitrophenyl) Groups such as lower alkyl groups such as methyl and piperonyl, lower alkyl groups substituted with 1 to 3 aryl groups whose aryl rings are substituted with lower alkoxy, nitro, halogen, and cyano groups. and preferably a group in which one or two aryl groups having 6 to 12 carbon atoms are bonded to a lower alkyl group having 1 or 2 carbon atoms, such as a benzyl group or a diphenylmethyl group. , more preferably a benzyl group or a diphenylmethyl group.
【0038】上記において、Rの定義における「二環式
テルペン炭化水素残基」とは、例えば、3−ピナニル、
カンフェニル、ノカラジエニル、ノカラニル、ボルネニ
ル、ノルボラニル基などである。[0038] In the above, the "bicyclic terpene hydrocarbon residue" in the definition of R includes, for example, 3-pinanyl,
Camphenyl, nocaladienyl, nocalanyl, bornenyl, norboranyl groups, etc.
【0039】Rの定義における「保護基」とは、反応に
おける水酸基の保護基であり、例えば、ホルミル、アセ
チル、プロピオニル、ブチリル、イソブチリル、ペンタ
ノイル、ピバロイル、バレリル、イソバレリル、オクタ
ノイル、ラウロイル、ミリストイル、トリデカノイル、
パルミトイル、ステアロイルのようなアルカノイル基、
クロロアセチル、ジクロロアセチル、トリクロロアセチ
ル、トリフルオロアセチルのようなハロゲン化アルカノ
イル基、メトキシアセチルのような低級アルコキシアル
カノイル基、(E)−2−メチル−2−ブテノイルのよ
うな不飽和アルカノイル基等の脂肪族アシル基;ベンゾ
イル、α−ナフトイル、β−ナフトイルのようなアリー
ルカルボニル基、2−ブロモベンゾイル、4−クロロベ
ンゾイルのようなハロゲン化アリールカルボニル基、2
,4,6 −トリメチルベンゾイル、4−トリオイルの
ような低級アルキル化アリールカルボニル基、4−アニ
ソイルのような低級アルコキシ化アリールカルボニル基
、4−ニトロベンゾイル、2−ニトロベンゾイルのよう
なニトロ化アリールカルボニル基、2−(メトキシカル
ボニル)ベンゾイルのような低級アルコキシカルボニル
化アリールカルボニル基、4−フェニルベンゾイルのよ
うなアリール化アリールカルボニル基等の芳香族アシル
基;トリメチルシリル、トリエチルシリル、イソプロピ
ルジメチルシリル、t−ブチルジメチルシリル、メチル
ジイソプロピルシリル、メチルジ−t−ブチルシリル、
トリイソプロピルシリルのようなトリ低級アルキルシリ
ル基、ジフェニルメチルシリル、ジフェニルブチルシリ
ル、ジフェニルイソロピルシリル、フェニルジイソロピ
ルシリルのような1乃至2個のアリール基で置換された
トリ低級アルキルシリル基等のシリル基;メトキシメチ
ル、1,1 −ジメチル−1−メトキシメチル、エトキ
シメチル、プロポキシメチル、イソプロポキシメチル、
ブトキシメチル、t−ブトキシメチルのような低級アル
コキシメチル基、2−メトキシエトキシメチルのような
低級アルコキシ化低級アルコキシメチル基、2,2,2
−トリクロロエトキシメチル、ビス(2−クロロエト
キシ)メチルのようなハロゲン化低級アルコキシメチル
等のアルコキシメチル基;1−エトキシエチル、1−(
イソプロキシ)エチルのような低級アルコキシ化エチル
基、2,2,2 −トリクロロエチルのようなハロゲン
化エチル基、2−(フェニルゼレネニル)エチルのよう
なアリールゼレネニル化エチル基等の置換エチル基;ベ
ンジル、α−ナフチルメチル、β−ナフチルメチル、ジ
フェニルメチル、トリフェニルメチル、α−ナフチルジ
フェニルメチル、9−アンスリルメトルのような1乃至
3個のアリール基で置換された低級アルキル基、4−メ
チルベンジル、2,4,6 −トリメチルベンジル、3
,4,5 −トリメチルベンジル、4−メトキシベンジ
ル、4−メトキシフェニルジフェニルメチル、2−ニト
ロベンジル、4−ニトロベンジル、4−クロロベンジル
、4−ブロモベンジル、4−シアノベンジル、4−シア
ノベンジルジフェニルメチル、ビス(2−ニトロフェニ
ル)メチル、ピペロニルのような低級アルキル、低級ア
ルコキシ、ニトロ、ハロゲン、シアノ基でアリール環が
置換された1乃至3個のアリール基で置換された低級ア
ルキル基等のアラルキル基;メトキシカルボニル、エト
キシカルボニル、t−ブトキシカルボニル、イソブトキ
シカルボニルのような低級アルコキシカルボニル基、2
,2,2 −トリクロロエトキシカルボニル、2−トリ
メチルシリルエトキシカルボニルのようなハロゲン又は
トリ低級アルキルシリル基で置換された低級アルコキシ
カルボニル基等のアルコキシカルボニル基;ビニルオキ
シカルボニル、アリルオキシカルボニルのようなアルケ
ニルオキシカルボニル基;ベンジルオキシカルボニル、
4−メトキシベンジルオキシカルボニル、3,4 −ジ
メトキシベンジルオキシカルボニル、2−ニトロベンジ
ルオキシカルボニル、4−ニトロベンジルオキシカルボ
ニルのような、1乃至2個の低級アルコキシ又はニトロ
基でアリール環が置換されていてもよいアラルキルオキ
シカルボニル基のような反応における保護基であり、好
適には、脂肪族アシル基、トリ低級アルキルシリル基又
はアルコキシメチル基である。The "protecting group" in the definition of R is a protecting group for a hydroxyl group in a reaction, such as formyl, acetyl, propionyl, butyryl, isobutyryl, pentanoyl, pivaloyl, valeryl, isovaleryl, octanoyl, lauroyl, myristoyl, tridecanoyl. ,
Alkanoyl groups such as palmitoyl and stearoyl,
Halogenated alkanoyl groups such as chloroacetyl, dichloroacetyl, trichloroacetyl, trifluoroacetyl, lower alkoxyalkanoyl groups such as methoxyacetyl, unsaturated alkanoyl groups such as (E)-2-methyl-2-butenoyl, etc. Aliphatic acyl group; arylcarbonyl group such as benzoyl, α-naphthoyl, β-naphthoyl, halogenated arylcarbonyl group such as 2-bromobenzoyl, 4-chlorobenzoyl, 2
, 4,6-trimethylbenzoyl, lower alkylated arylcarbonyl groups such as 4-trioyl, lower alkoxylated arylcarbonyl groups such as 4-anisoyl, nitrated arylcarbonyl groups such as 4-nitrobenzoyl, 2-nitrobenzoyl. groups, aromatic acyl groups such as lower alkoxycarbonylated arylcarbonyl groups such as 2-(methoxycarbonyl)benzoyl, arylated arylcarbonyl groups such as 4-phenylbenzoyl; trimethylsilyl, triethylsilyl, isopropyldimethylsilyl, t- Butyldimethylsilyl, methyldiisopropylsilyl, methyldi-t-butylsilyl,
Tri-lower alkylsilyl group such as triisopropylsilyl, tri-lower alkylsilyl group substituted with 1 or 2 aryl groups such as diphenylmethylsilyl, diphenylbutylsilyl, diphenylisolopylsilyl, phenyldiisolopylsilyl Silyl groups such as methoxymethyl, 1,1-dimethyl-1-methoxymethyl, ethoxymethyl, propoxymethyl, isopropoxymethyl,
Lower alkoxymethyl groups such as butoxymethyl, t-butoxymethyl, lower alkoxylated lower alkoxymethyl groups such as 2-methoxyethoxymethyl, 2,2,2
- Alkoxymethyl groups such as halogenated lower alkoxymethyl such as trichloroethoxymethyl, bis(2-chloroethoxy)methyl; 1-ethoxyethyl, 1-(
Lower alkoxylated ethyl groups such as isoproxy)ethyl, halogenated ethyl groups such as 2,2,2-trichloroethyl, arylzelenenylated ethyl groups such as 2-(phenylzelenenyl)ethyl, etc. Substituted ethyl group; lower alkyl substituted with 1 to 3 aryl groups such as benzyl, α-naphthylmethyl, β-naphthylmethyl, diphenylmethyl, triphenylmethyl, α-naphthyldiphenylmethyl, 9-anthrylmethole group, 4-methylbenzyl, 2,4,6-trimethylbenzyl, 3
, 4,5-trimethylbenzyl, 4-methoxybenzyl, 4-methoxyphenyldiphenylmethyl, 2-nitrobenzyl, 4-nitrobenzyl, 4-chlorobenzyl, 4-bromobenzyl, 4-cyanobenzyl, 4-cyanobenzyldiphenyl Lower alkyl groups such as methyl, bis(2-nitrophenyl)methyl, and piperonyl, lower alkyl groups substituted with 1 to 3 aryl groups whose aryl rings are substituted with lower alkoxy, nitro, halogen, and cyano groups, etc. Aralkyl group; lower alkoxycarbonyl group such as methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, isobutoxycarbonyl, 2
, 2,2-trichloroethoxycarbonyl, 2-trimethylsilylethoxycarbonyl; alkoxycarbonyl groups such as lower alkoxycarbonyl groups substituted with halogen or tri-lower alkylsilyl groups; alkenyloxy such as vinyloxycarbonyl, allyloxycarbonyl; Carbonyl group; benzyloxycarbonyl,
The aryl ring is substituted with one or two lower alkoxy or nitro groups, such as 4-methoxybenzyloxycarbonyl, 3,4-dimethoxybenzyloxycarbonyl, 2-nitrobenzyloxycarbonyl, 4-nitrobenzyloxycarbonyl. It is a protecting group in the reaction such as an optional aralkyloxycarbonyl group, and preferably an aliphatic acyl group, a tri-lower alkylsilyl group or an alkoxymethyl group.
【0040】Rの定義における「シクロアルキル基」と
は、例えば、シクロプロピル、シクロブチル、シクロペ
ンチル、シクロヘキシル基のような炭素数3乃至6個の
シクロアルキル基であり、好適にはシクロヘキシル基で
ある。The "cycloalkyl group" in the definition of R is, for example, a cycloalkyl group having 3 to 6 carbon atoms such as cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl, and preferably cyclohexyl.
【0041】Yの定義における「求核性脱離基」とは、
例えば、塩素、臭素、沃素のようなハロゲン原子;メタ
ンスルホニルオキシ、エタンスルホニルオキシのような
低級アルカンスルホニルオキシ基;トリフルオロメタン
スルホニルオキシ、ペンタフルオロエタンスルホニルオ
キシのようなハロゲノ低級アルカンスルホニルオキシ基
;ベンゼンスルホニルオキシ、p−トルエンスルホニル
オキシのようなアリ−ルスルホニルオキシ基等の脱離基
を示し、好適にはハロゲン原子又は低級アルカンスルホ
ニルオキシ基であり、更に好適には塩素原子又はメタン
スルホニルオキシ基である。[0041] The "nucleophilic leaving group" in the definition of Y is
For example, halogen atoms such as chlorine, bromine, and iodine; lower alkanesulfonyloxy groups such as methanesulfonyloxy and ethanesulfonyloxy; halogeno-lower alkanesulfonyloxy groups such as trifluoromethanesulfonyloxy and pentafluoroethanesulfonyloxy; benzene It represents a leaving group such as an arylsulfonyloxy group such as sulfonyloxy or p-toluenesulfonyloxy, preferably a halogen atom or a lower alkanesulfonyloxy group, and more preferably a chlorine atom or a methanesulfonyloxy group. It is.
【0042】本発明の一般式(I)乃至(V)で表わさ
れる化合物として、好適には、一般式(I)、(II)
、(III)及び(IV)においてR1及びR2 がと
もにメチル基であり、X1 がベンゼン環の4位の塩素
原子又は弗素原子でありX2 及びX3 が水素原子で
ある化合物を挙げることができ、一般式(V)において
X1 がベンゼン環の4位の塩素原子又は弗素原子であ
りX2 及びX3 が水素原子である化合物を挙げるこ
とができる。The compounds represented by the general formulas (I) to (V) of the present invention are preferably those represented by the general formulas (I) and (II).
, (III) and (IV), R1 and R2 are both methyl groups, X1 is a chlorine atom or a fluorine atom at the 4-position of the benzene ring, and X2 and X3 are hydrogen atoms. In the formula (V), compounds in which X1 is a chlorine atom or a fluorine atom at the 4-position of the benzene ring and X2 and X3 are hydrogen atoms can be mentioned.
【0043】本方法の第一工程は、カルボニル化合物(
V)とオレフィン化合物(VI)とを光反応に付し、オ
キセタン化合物(IV)を立体選択的に製造する工程で
ある。The first step of this method is to prepare a carbonyl compound (
This is a step of subjecting V) and an olefin compound (VI) to a photoreaction to stereoselectively produce an oxetane compound (IV).
【0044】Rとしては、好適には、例えば、イソプロ
ピル基、s−ブチル基、s−ヘキシル基のような1位で
分枝しているアルキル基、ベンズヒドリル基のような前
記「アリール基」が2又は3個置換したメチル基、又は
(−)−メンチル基、(+)−メンチル基、8−フェニ
ルメンチル基、(−)−2−フェニルシクロヘキシル基
、(+)−2−フェニルシクロヘキシル基、2−ヒドロ
キシシクロヘキシル基、2−アセトキシシクロヘキシル
基、2−メトキシエトキシシクロヘキシル基、2−(t
−ブチルジメチルシリルオキシ)シクロヘキシル基、2
−ベンジルシクロヘキシル基のような前記「シクロヘキ
シル基」の2位にアルキル基、フェニル基、アラルキル
基、水酸基若しくは水酸基の保護基で保護された水酸基
を置換基として持つシクロヘキシル基であり、更に好適
には、2位にアルキル基、フェニル基、アラルキル基、
水酸基又は水酸基の保護基で保護された水酸基を置換基
として持つシクロヘキシル基である。R is preferably an alkyl group branched at the 1-position such as isopropyl group, s-butyl group, or s-hexyl group, or the above-mentioned "aryl group" such as benzhydryl group. 2 or 3 substituted methyl group, or (-)-menthyl group, (+)-menthyl group, 8-phenylmenthyl group, (-)-2-phenylcyclohexyl group, (+)-2-phenylcyclohexyl group, 2-hydroxycyclohexyl group, 2-acetoxycyclohexyl group, 2-methoxyethoxycyclohexyl group, 2-(t
-butyldimethylsilyloxy)cyclohexyl group, 2
- A cyclohexyl group having an alkyl group, phenyl group, aralkyl group, hydroxyl group, or a hydroxyl group protected with a hydroxyl group-protecting group as a substituent at the 2-position of the "cyclohexyl group" such as a benzylcyclohexyl group, and more preferably , an alkyl group, a phenyl group, an aralkyl group at the 2-position,
It is a cyclohexyl group that has a hydroxyl group or a hydroxyl group protected with a hydroxyl protecting group as a substituent.
【0045】照射する最適光の波長は、原料であるカル
ボニル化合物とオレフィン化合物によって異なるが、お
おむね280−600nmの光が含まれるものならば光
源に限定はないが、好適には300〜400nmであり
、更に好適には350nm前後である。280nm以下
の波長が含まれる場合はフィルター等を用いて除くのが
好ましい。The optimum wavelength of the light to be irradiated differs depending on the carbonyl compound and olefin compound used as raw materials, but there is no restriction on the light source as long as it contains light of approximately 280 to 600 nm, but it is preferably 300 to 400 nm. , more preferably around 350 nm. If wavelengths of 280 nm or less are included, it is preferable to remove them using a filter or the like.
【0046】本工程は、溶媒の存在下に行なわれ、使用
される溶媒としては反応を阻害しないものであれば特に
限定はなく、例えば、ベンゼン、トルエン、キシレン、
クロルベンゼン等の芳香族炭化水素類、アセトニトリル
、ベンゾニトリル等のニトリル類、メタノール、エタノ
ール、i−プロパノール等のアルコール類、エーテル、
テトラヒドロフラン等のエーテル類、ヘキサン、ペンタ
ン、シクロヘキサン等の低級脂肪族炭化水素類又はこれ
らの混合溶媒が用いられ、好ましくは285nm以下の
光が透過するのを防ぐため、溶媒でありながらフィルタ
ーの役目を果たす、芳香族炭化水素類(特にベンゼン、
トルエン、クロルベンゼン)又はそれらの混合溶媒が用
いられる。This step is carried out in the presence of a solvent, and the solvent used is not particularly limited as long as it does not inhibit the reaction, such as benzene, toluene, xylene,
Aromatic hydrocarbons such as chlorobenzene, nitriles such as acetonitrile and benzonitrile, alcohols such as methanol, ethanol and i-propanol, ethers,
Ethers such as tetrahydrofuran, lower aliphatic hydrocarbons such as hexane, pentane, cyclohexane, or a mixed solvent thereof are used. Preferably, in order to prevent light of 285 nm or less from being transmitted, the solvent acts as a filter while being a solvent. aromatic hydrocarbons (especially benzene,
Toluene, chlorobenzene) or a mixed solvent thereof is used.
【0047】なお、285nm以下の光が透過するのを
防ぐフィルターとしては特に限定はないが、例えば、パ
イレックス製ガラス、特定波長をカットするガラスフィ
ルター、樹脂フィルター及び蛍光染料等を挙げることが
できる。また、これらのフィルターを用いる場合には、
溶媒は、原料を溶解するものであれば、必ずしも前記の
様にベンゼン、トルエン、クロルベンゼン等を使用する
必要はない。[0047] The filter that prevents light of 285 nm or less from passing through is not particularly limited, but examples include Pyrex glass, glass filters that cut specific wavelengths, resin filters, and fluorescent dyes. Also, when using these filters,
The solvent does not necessarily need to be benzene, toluene, chlorobenzene, etc. as described above, as long as it dissolves the raw materials.
【0048】反応温度は特に限定はなく、好適には−2
0℃乃至80℃で行なわれ、更に好適には、10℃乃至
40℃で行なわれる。[0048] The reaction temperature is not particularly limited, and is preferably -2
It is carried out at 0°C to 80°C, more preferably at 10°C to 40°C.
【0049】反応時間は、主に反応温度、原料化合物、
照射される光及び使用される溶媒の種類によって異なる
が、通常1時間乃至4日間であり、好適には2時間乃至
2日間である。The reaction time mainly depends on the reaction temperature, raw material compounds,
Although it varies depending on the irradiated light and the type of solvent used, the time is usually 1 hour to 4 days, preferably 2 hours to 2 days.
【0050】第二工程はエステル化合物(IV)を還元
し、アルコール化合物(III)を製造する工程である
。The second step is a step of reducing the ester compound (IV) to produce the alcohol compound (III).
【0051】この工程は、一般的なエステル還元法、例
えば新実験化学講座(日本化学会編)第15巻酸化と還
元[II]に記載の方法を用いて、行なうことができる
。還元剤としては、好適には、例えばリチウムアルミニ
ウムハイドライド、ソジウムボロハイドライド−リチウ
ムクロライド、リチウムボロハイドライドのような水素
化ホウ素化合物である。This step can be carried out using a general ester reduction method, for example, the method described in New Experimental Chemistry Course (edited by the Chemical Society of Japan), Vol. 15, Oxidation and Reduction [II]. The reducing agent is preferably a borohydride compound such as lithium aluminum hydride, sodium borohydride-lithium chloride, or lithium borohydride.
【0052】使用される溶媒としては、反応を阻害しな
ければ特に限定はないが、好適にはテトラヒドロフラン
、エチレングリコールジメチルエーテルのようなエーテ
ル類である。The solvent used is not particularly limited as long as it does not inhibit the reaction, but ethers such as tetrahydrofuran and ethylene glycol dimethyl ether are preferred.
【0053】反応時間は、用いられる試薬、温度等によ
り変わるが、通常30分乃至5時間であり、好適には1
時間乃至3時間である。The reaction time varies depending on the reagents used, temperature, etc., but is usually 30 minutes to 5 hours, preferably 1 hour.
3 hours to 3 hours.
【0054】第三工程は、アルコール化合物(III)
の保護されていない水酸基を求核性脱離基Yに変換し、
化合物(II)を製造する工程である。The third step is alcohol compound (III)
converting the unprotected hydroxyl group of into a nucleophilic leaving group Y,
This is a process for producing compound (II).
【0055】例えば、Yがハロゲン原子の場合には、通
常ハロゲン化試薬とされているものを使用して実施され
るが、好適には、チオニルクロリド、チオニルブロミド
、チオニルアイオダイドのようなチオニルハライド類、
スルホニルクロリド、スルホニルブロミドのようなスル
ホニルハライド類、三塩化燐、三臭化燐のような三ハロ
ゲン化燐類、五塩化燐、五臭化燐、五沃化燐のような五
ハロゲン化燐類又はオキシ塩化燐、オキシ臭化燐のよう
なオキシハロゲン化燐類を使用して行なわれ、好適には
、オキシハロゲン化燐類又はチオニルハライド類が使用
される。For example, when Y is a halogen atom, the reaction is carried out using a halogenation reagent that is generally considered to be a halogenation reagent, but preferably a thionyl halide such as thionyl chloride, thionyl bromide, and thionyl iodide. kind,
Sulfonyl halides such as sulfonyl chloride and sulfonyl bromide; phosphorus trihalides such as phosphorus trichloride and phosphorus tribromide; phosphorus pentahalides such as phosphorus pentachloride, phosphorus pentabromide, and phosphorus pentaiodide. Alternatively, phosphorus oxyhalides such as phosphorus oxychloride and phosphorus oxybromide are used, and phosphorus oxyhalides or thionyl halides are preferably used.
【0056】なお、3α:3β≒1:1のアルコール化
合物(III)をチオニルクロライドで塩素化すると、
望ましい配位である3位がα配位の塩化物(II)(Y
=Cl)のみが生成しする。これは、他の立体異性体に
比べ生物活性が高い化合物(I)を製造する上で極めて
好都合である。Note that when alcohol compound (III) with a ratio of 3α:3β≒1:1 is chlorinated with thionyl chloride,
Chloride (II) (Y
=Cl) is produced. This is extremely convenient for producing Compound (I), which has higher biological activity than other stereoisomers.
【0057】又、Yがスルホニル基の場合には、例えば
、不活性用在中、塩基存在下又は日存在下、化合物(I
II)と一般式R3 SO2 −O−SO2 R3 を
有する化合物(式中、R3 はメチル、エチルのような
低級アルキル基;トリフルオロメチル、ペンタフルオロ
エチルのようなハロゲン低級アルキル基;ベンゼン、p
−トルエンのようなアリール基を示す。)又は式R3
SO2 −Zを有する化合物(式中、R3 は、前記と
同意義を示し、Zは塩素原子、臭素原子、ヨウ素原子の
ようなハロゲン原子を示す。)を反応させることにより
達成される。When Y is a sulfonyl group, for example, the compound (I
II) and a compound having the general formula R3 SO2 -O-SO2 R3 (wherein R3 is a lower alkyl group such as methyl or ethyl; a halogen lower alkyl group such as trifluoromethyl or pentafluoroethyl; benzene, p
- indicates an aryl group such as toluene. ) or formula R3
This is achieved by reacting a compound having SO2 -Z (wherein R3 has the same meaning as above, and Z represents a halogen atom such as a chlorine atom, a bromine atom, or an iodine atom).
【0058】使用される溶媒としては、反応を阻害せず
、出発物質をある程度溶解するものであれば、特に限定
はないが、好適には、ベンゼン、トルエン、キシレンの
ような芳香族炭化水素類;メチレンクロリド、クロロホ
ルムのようなハロゲン化炭化水素類;酢酸エチル、酢酸
プロピルのようなエステル類;エーテル、テトラヒドロ
フラン、ジオキサン、ジメトキシタンのようなエーテル
類又はジメチルホルムアミド、ジメチルアセトアミド、
ヘキサメチルホスホロトリアミドのようなアミド類であ
り、更に好適には、トルエンのような芳香族炭化水素類
又はメチレンクロリドのようなハロゲン化炭化水素類で
ある。The solvent used is not particularly limited as long as it does not inhibit the reaction and dissolves the starting materials to some extent, but aromatic hydrocarbons such as benzene, toluene, and xylene are preferably used. ; halogenated hydrocarbons such as methylene chloride and chloroform; esters such as ethyl acetate and propyl acetate; ethers such as ether, tetrahydrofuran, dioxane, dimethoxytane, or dimethylformamide, dimethylacetamide,
Amides such as hexamethylphosphorotriamide, more preferably aromatic hydrocarbons such as toluene or halogenated hydrocarbons such as methylene chloride.
【0059】使用される塩基としては、通常の反応にお
いて塩基として使用されるものであれば特に限定はない
が、好適には、水素化リチウム、水素化ナトリウム、水
素化カリウムのようなアルカリ金属水素化物等の無機塩
基類;トリエチルアミン、ジイソプロピルエチルアミン
、N−メチルモルホリン、ピリジン、4−(N,N −
ジメチルアミノ)ピリジン、 N,N−ジメチルアニリ
ン、1,5 −ジアザビシクロ[4.3.0] ノナ−
5−エン、1,4 −ジアザビシクロ[2.2.2]
オクタン、1,8 −ジアザビシクロ[5.4.0]
ウンデク−7−エン(DBU) のような有機塩基類又
はブチルリチウム、リチウムジイソプロピルアミドのよ
うな有機金属塩基類であり、更に好適にはピリジン、ト
リエチルアミンのような有機塩基である。The base to be used is not particularly limited as long as it is used as a base in ordinary reactions, but preferably alkali metal hydrogen such as lithium hydride, sodium hydride, potassium hydride Inorganic bases such as triethylamine, diisopropylethylamine, N-methylmorpholine, pyridine, 4-(N,N-
dimethylamino)pyridine, N,N-dimethylaniline, 1,5-diazabicyclo[4.3.0] nona-
5-ene, 1,4-diazabicyclo[2.2.2]
Octane, 1,8-diazabicyclo[5.4.0]
Organic bases such as undec-7-ene (DBU) or organometallic bases such as butyllithium and lithium diisopropylamide are preferred, and more preferably organic bases such as pyridine and triethylamine are used.
【0060】反応温度は、ハロゲン化は室温乃至150
℃で行なわれるが、好適には80℃乃至120℃である
。スルホン化は−20℃乃至50℃で行なわれるが、好
適には、−15℃乃至室温である。The reaction temperature for halogenation is room temperature to 150°C.
The temperature is preferably 80°C to 120°C. Sulfonation is carried out at -20°C to 50°C, preferably -15°C to room temperature.
【0061】反応時間は、主に反応温度、原料化合物又
は使用される溶媒の種類によって異なるが、通常5分間
乃至10時間である。[0061] The reaction time varies mainly depending on the reaction temperature, the raw material compound, or the type of solvent used, but is usually from 5 minutes to 10 hours.
【0062】第四工程は、化合物(II)からトリアゾ
ール化合物(I)を製造する工程である。The fourth step is a step of producing triazole compound (I) from compound (II).
【0063】本工程では、化合物(II)のオキセタン
環の3位に関する異性体のうち、3位がα配位の異性体
(IIa)のみが選択的に反応して、立体特異的に化合
物(I)の単一の立体異性体が生成し、β配位の異性体
(IIb)は、未反応のままである。In this step, among the isomers related to the 3-position of the oxetane ring of compound (II), only the isomer (IIa) in which the 3-position is α-coordinated reacts selectively, stereospecifically converting the compound ( A single stereoisomer of I) is formed; the β-coordinated isomer (IIb) remains unreacted.
【0064】[0064]
【化17】[Chemical formula 17]
【0065】反応の選択性は、3位の置換基の配位によ
って支配されるので、3位がα配位の異性体、3位がβ
配位の異性体の共存下に反応を行なっても、望ましい3
位がα配位の異性体のみが反応し、3位がβ配位の異性
体は未反応のまま定量的に回収される。このため、本反
応に先立つ原料化合物(II)の3位がα配位の異性体
と3位がβ配位の異性体の分離が要求されず、化合物(
I)の製造上、きわめて有利である。The selectivity of the reaction is controlled by the coordination of the substituent at the 3-position, so the 3-position is an α-coordinated isomer, and the 3-position is a β-coordinated isomer.
Even if the reaction is carried out in the coexistence of coordination isomers, the desirable 3
Only the isomer with the α-coordinated position reacts, and the isomer with the β-coordinated position at the 3rd position remains unreacted and is quantitatively recovered. Therefore, it is not necessary to separate the isomer in which the 3-position is α-coordinated and the isomer in which the 3-position is β-coordination of starting compound (II) prior to this reaction, and the compound (
This is extremely advantageous in the production of I).
【0066】化合物(I)は不斉炭素を3個有しており
、4個のジアステレオマーが存在しているが、本方法に
よればそのうちの、より活性の高い立体を持つ化合物(
I)のみをわずか4工程で製造でき、きわめて有用であ
る。Compound (I) has 3 asymmetric carbon atoms and exists in 4 diastereomers, but according to this method, the compound (I) with the more active stereoisomer (
Only I) can be produced in just four steps, making it extremely useful.
【0067】本工程は、溶媒中、1当量以上の1H−1
,2,4 −トリアゾール若しくはイミダゾールを1当
量以上の塩基の存在下に反応させるか、又は1H−1,
2,4 −トリアゾール若しくはイミダゾールの塩基塩
を反応させることにより達成される。[0067] In this step, 1 equivalent or more of 1H-1 is added in the solvent.
, 2,4-triazole or imidazole in the presence of 1 equivalent or more of a base, or 1H-1,
This is achieved by reacting a base salt of 2,4-triazole or imidazole.
【0068】使用される溶媒としては、反応を阻害せず
、出発物質をある程度溶解するものであれば特に限定は
ないが、好適には、ヘキサン、ヘプタン、リグロイン、
石油エーテルのような脂肪族炭化水素類;ベンゼン、ト
ルエン、キシレンのような芳香族炭化水素類;メチレン
クロリド、クロロホルム、四塩化炭素、ジクロロエタン
、クロロベンゼン、ジクロロベンゼンのようなハロゲン
化炭化水素類;ドエチルエーテル、ジイソプロピルエー
テル、テトラヒドロフラン、ジオキサン、ジメトキシエ
タン、ジエチレングリコールジメチルエーテルのような
エーテル類;メタノール、エタノール、n−プロパノー
ル、イソプロパノール、n−プタノール、イソブタノー
ル、t−ブタノール、イソアミルアルコール、ジエチレ
ングリコール、グリセリン、オクタノール、シクロヘキ
サノール、メチルセロソルブのようなアルコール類;ニ
トロエタン、ニトロベンゼンのようなニトロ化合物類;
アセトニトリル、イソブチロニトリルのようなニトリル
類;ホルムアミド、ジメチルホルムアミド、ジメチルア
セトアミド、ヘキサメチルホスホロトリアミド、1,3
−ジメチル−2−イミダゾリジノンのようなアミド類
;ジメチルスルホキシド、スルホランのようなスルホキ
シド類であり、更に好適には、ホルムアミド、ジメチル
ホルムアミド、ジメチルアセトアミド、ヘキサメチルホ
スホロトリアミド、1,3 −ジメチル−2−イミダゾ
リジノンのようなアミド類である。The solvent used is not particularly limited as long as it does not inhibit the reaction and dissolves the starting material to some extent, but preferably hexane, heptane, ligroin,
Aliphatic hydrocarbons such as petroleum ether; aromatic hydrocarbons such as benzene, toluene, xylene; halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride, dichloroethane, chlorobenzene, dichlorobenzene; Ethers such as ethyl ether, diisopropyl ether, tetrahydrofuran, dioxane, dimethoxyethane, diethylene glycol dimethyl ether; methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, t-butanol, isoamyl alcohol, diethylene glycol, glycerin, octanol , cyclohexanol, alcohols such as methyl cellosolve; nitro compounds such as nitroethane, nitrobenzene;
Nitriles such as acetonitrile and isobutyronitrile; formamide, dimethylformamide, dimethylacetamide, hexamethylphosphorotriamide, 1,3
Amides such as dimethyl-2-imidazolidinone; sulfoxides such as dimethyl sulfoxide and sulfolane, more preferably formamide, dimethylformamide, dimethylacetamide, hexamethylphosphorotriamide, 1,3-dimethyl Amides such as -2-imidazolidinone.
【0069】使用される塩基としては、通常の反応にお
いて塩基として使用されるものであれば特に限定はない
が、好適には炭酸ナトリウム、炭酸カリウムのようなア
ルカリ金属炭酸塩;炭酸水素ナトリウム、炭酸水素カリ
ウムのようなアルカリ金属炭酸水素塩;水素化リチウム
、水素化ナトリウム、水素化カリウムのようなアルカリ
金属水素化物;水酸化ナトリウム、水酸化カリウム、水
酸化バリウムのようなアルカリ金属水酸化物;ナトリウ
ムメトキシド、ナトリウムエトキシド、カリウム−t−
ブトキシドのようなアルカリ金属アルコキシド類;トリ
エチルアミン、トリブチルアミン、ジイソプロピルエチ
ルアミン、N−メチルモルホリン、ピリジン、4−(N
,N−ジメチルアミノ)ピリジン、N,N−ジメチルア
ニリン、N,N−ジエチルアニリン、1,5−ジアザビ
シクロ[4.3.0]ノナ−5−エン、1,4−ジアザ
ビシクロ[2.2.2]オクタン(DABCO) 、1
,8−ジアザビシクロ[5.4.0]ウンデク−7−エ
ン(DBU)のような有機塩基類又はブチルリチウム、
リチウムジイソプロピルアミドのような有機金属塩基類
であり、更に好適には、炭酸ナトリウム、炭酸カリウム
のようなアルカリ金属炭酸塩である。The base to be used is not particularly limited as long as it is used as a base in ordinary reactions, but preferably alkali metal carbonates such as sodium carbonate and potassium carbonate; sodium hydrogen carbonate and carbonate. Alkali metal bicarbonates such as potassium hydrogen; alkali metal hydrides such as lithium hydride, sodium hydride, potassium hydride; alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, barium hydroxide; Sodium methoxide, sodium ethoxide, potassium-t-
Alkali metal alkoxides such as butoxide; triethylamine, tributylamine, diisopropylethylamine, N-methylmorpholine, pyridine, 4-(N
, N-dimethylamino)pyridine, N,N-dimethylaniline, N,N-diethylaniline, 1,5-diazabicyclo[4.3.0]non-5-ene, 1,4-diazabicyclo[2.2. 2] Octane (DABCO), 1
, 8-diazabicyclo[5.4.0]undec-7-ene (DBU) or butyllithium,
Organometallic bases such as lithium diisopropylamide, and more preferably alkali metal carbonates such as sodium carbonate and potassium carbonate.
【0070】尚、反応を効果的に行なわせるために、ベ
ンジルトリエチルアンモニウムクロリド、テトラブチル
アンモニウムクロリドのような第4級アンモニウム塩類
、ヨウ化ナトリウム、臭化ナトリウム、臭化リチウムの
ようなハロゲン化アルカリ土類金属、ジベンゾ−18−
クラウン−6のようなクラウンエーテル類等を添加する
こともできる。In order to carry out the reaction effectively, quaternary ammonium salts such as benzyltriethylammonium chloride and tetrabutylammonium chloride, alkali halides such as sodium iodide, sodium bromide, and lithium bromide are used. earth metal, dibenzo-18-
Crown ethers such as Crown-6 can also be added.
【0071】反応温度は−78℃乃至200℃で行なわ
れるが、好適には、−20℃乃至150℃である。The reaction temperature is -78°C to 200°C, preferably -20°C to 150°C.
【0072】反応時間は、主に反応温度、原料化合物又
は使用される溶媒の種類によって異なるが、通常1時間
乃至24時間である。[0072] The reaction time varies mainly depending on the reaction temperature, the raw material compound, or the type of solvent used, but is usually from 1 hour to 24 hours.
【0073】上記各工程の反応終了後、目的化合物は常
法に従って、反応混合物から採取される。[0073] After completion of the reactions in each of the above steps, the target compound is collected from the reaction mixture according to a conventional method.
【0074】例えば、反応混合物に水と混和しない有機
溶媒を加え、水洗後、溶剤を留去することによって得ら
れる。得られた目的化合物は必要ならば、常法、例えば
再結晶、再沈殿又はクロマトグラフィー等によって更に
精製できる。For example, it can be obtained by adding a water-immiscible organic solvent to the reaction mixture, washing with water, and then distilling off the solvent. The obtained target compound can be further purified, if necessary, by conventional methods such as recrystallization, reprecipitation, or chromatography.
【0075】化合物(I)の単離については、通常の塩
を得る方法を用いて塩として単離すると操作が容易な場
合がある。そのような塩としては、例えば、弗化水素酸
、臭化水素酸、過塩素酸、硝酸、塩酸、硫酸、燐酸のよ
うな無機酸、メタンスルホン酸、トリフルオロメタンス
ルホン酸、エタンスルホン酸のような低級アルキルスル
ホン酸、ベンゼンスルホン酸、p−トルエンスルホン酸
のようなアリールスルホン酸、蓚酸、コハク酸のような
有機酸の塩である。Regarding the isolation of compound (I), it may be easier to isolate it as a salt using a conventional method for obtaining a salt. Such salts include, for example, inorganic acids such as hydrofluoric acid, hydrobromic acid, perchloric acid, nitric acid, hydrochloric acid, sulfuric acid, phosphoric acid, methanesulfonic acid, trifluoromethanesulfonic acid, ethanesulfonic acid, etc. It is a salt of lower alkylsulfonic acid, benzenesulfonic acid, arylsulfonic acid such as p-toluenesulfonic acid, and organic acid such as oxalic acid and succinic acid.
【0076】これらの塩のうち、例えば硝酸塩、蓚酸塩
、塩酸塩は、反応混合物を処理して得た粗目的物に、有
機溶媒と各々の酸を加え、結晶として目的物を単離、ろ
取するか、又は分液ロートにより分液して目的物の塩の
水溶液として有機溶媒から分離することができる。結晶
としてろ取した場合には、再び塩を水に懸濁させ、塩基
を加え、目的物を溶かす有機溶媒を加え有機溶媒に分液
、転溶させ、目的物を得ることができる。目的物の塩の
水溶液として分液した場合には、得られた水溶液に引き
続き、塩基を加え、目的物を溶かす有機溶媒を加え、有
機溶媒に分液、転溶させ、目的物を得ることができる。
これらの塩のうち、硝酸は爆発の危険性を内在しており
、大量合成の場合は注意が必要である。蓚酸塩は結晶と
しての単離効率があまり良くなく、あまり好ましくない
。更に硝酸塩、蓚酸塩として、結晶で単離し再び、塩基
で遊離させる場合には、大量の溶媒、水を使用する必要
があると同時に、塩の結晶をろ取する操作が必要となる
。Among these salts, for example, nitrate, oxalate, and hydrochloride are prepared by adding an organic solvent and each acid to the crude target product obtained by treating the reaction mixture, isolating the target product as crystals, and filtering. Alternatively, it can be separated from the organic solvent as an aqueous solution of the salt of the target product by separating the solution using a separatory funnel. When the salt is collected by filtration as crystals, the desired product can be obtained by suspending the salt in water again, adding a base, adding an organic solvent that dissolves the target product, and separating and dissolving it in the organic solvent. In the case of separation as an aqueous solution of the salt of the target product, the target product can be obtained by subsequently adding a base to the obtained aqueous solution, adding an organic solvent that dissolves the target product, and performing separation and dissolution in the organic solvent. can. Among these salts, nitric acid has an inherent risk of explosion, so care must be taken when mass-synthesizing it. Oxalate does not have very good isolation efficiency as a crystal, so it is not very preferable. Furthermore, when nitrates and oxalates are isolated as crystals and liberated again with a base, it is necessary to use a large amount of solvent and water, and at the same time, it is necessary to filter the salt crystals.
【0077】一方、塩酸塩として単離する場合には、爆
発の危険性もなく、更に、単離効率も良く、好ましい。
塩酸塩の場合、硝酸塩、蓚酸塩と異なって水に対する溶
解性が非常に大きいので、塩酸と有機溶媒を粗目的物に
加え、分液するだけで効率よく水溶液に転溶でき、有機
溶媒も、水も大量に使用する必要がない。同時に、塩を
結晶としてろ取する操作も不要となり、非常に有利な単
離法となる。On the other hand, when it is isolated as a hydrochloride, there is no danger of explosion and isolation efficiency is also good, which is preferable. In the case of hydrochloride, unlike nitrate and oxalate, it has a very high solubility in water, so it can be efficiently dissolved into an aqueous solution by simply adding hydrochloric acid and an organic solvent to the crude target substance and separating the liquids. There is no need to use large amounts of water. At the same time, the operation of filtering the salt as crystals becomes unnecessary, making this a very advantageous isolation method.
【0078】尚、粗目的物を有機溶媒と塩酸で分液した
場合には、有機層に、第4工程で反応に関与しなかった
、化合物(II)のオキセタン環3位がβ配位の異性体
が定量的に回収される。この様な目的で使用される塩酸
としては、1規定乃至12規定の塩酸が好ましく、更に
好適には4乃至7規定の塩酸である。[0078] When the crude target product is separated between an organic solvent and hydrochloric acid, the organic layer contains the compound (II) whose oxetane ring 3-position is β-coordinated and which did not participate in the reaction in the fourth step. The isomer is quantitatively recovered. The hydrochloric acid used for this purpose is preferably 1N to 12N hydrochloric acid, more preferably 4 to 7N hydrochloric acid.
【0079】粗目的物を水溶性塩として分離する際に、
未反応の化合物(II)のオキセタン環3位がβ配位の
異性体を回収するのに使用される溶媒としては、特に限
定はないが、好適にはヘプタン、ヘキサン、石油エーテ
ル、リグロイン、石油ベンジン、シクロヘキサンなどの
炭化水素類、ベンゼン、トルエン、キシレンなどの芳香
族炭化水素類、メチレンクロリド、ジクロルエタン、ク
ロロホルム等のハロゲン化炭化水素類、酢酸エチル、酢
酸プロピルなどのエステル類、ジエチルエーテル、テト
ラヒドロフランなどのエーテル類であり、更に好適には
、ヘプタン、ヘキサン、石油エーテル、リグロイン、石
油ベンジン、シクロヘキサンなどの炭化水素類である。[0079] When separating the crude target product as a water-soluble salt,
The solvent used to recover the isomer in which the 3-position of the oxetane ring of unreacted compound (II) is β-coordinated is not particularly limited, but preferably heptane, hexane, petroleum ether, ligroin, petroleum Hydrocarbons such as benzine and cyclohexane, aromatic hydrocarbons such as benzene, toluene, and xylene, halogenated hydrocarbons such as methylene chloride, dichloroethane, and chloroform, esters such as ethyl acetate and propyl acetate, diethyl ether, and tetrahydrofuran. and more preferably hydrocarbons such as heptane, hexane, petroleum ether, ligroin, petroleum benzene, and cyclohexane.
【0080】水溶液に溶解した塩に加える塩基としては
、水溶液として使用される塩基ならば特に限定はないが
、好適には炭酸ナトリウム、炭酸カリウムのようなアル
カリ金属炭酸塩、炭酸水素ナトリウム、炭酸水素カリウ
ムのようなアルカリ金属炭酸水素塩、水酸化ナトリウム
、水酸化カリウム、水酸化バリウムのようなアルカリ金
属若しくはアルカリ土類金属水酸化物、トリエチルアミ
ン、ピリジンのような有機塩基類であり、更に好適には
、炭酸ナトリウム、炭酸カリウムのようなアルカリ金属
炭酸塩である。The base added to the salt dissolved in the aqueous solution is not particularly limited as long as it is a base used in the aqueous solution, but preferably alkali metal carbonates such as sodium carbonate and potassium carbonate, sodium hydrogen carbonate, and hydrogen carbonate. Alkali metal bicarbonates such as potassium, alkali metal or alkaline earth metal hydroxides such as sodium hydroxide, potassium hydroxide, barium hydroxide, and organic bases such as triethylamine and pyridine, more preferably are alkali metal carbonates such as sodium carbonate and potassium carbonate.
【0081】以上の方法において、ラセミ体として合成
した化合物は、ラセミ体に周知の分割試薬、例えば、カ
ンファースルホン酸のような光学活性な酸を加えて結晶
性の塩を形成させ、光学分割を行なうことにより、一方
の光学活性体のみを取り出すことができる。In the above method, the compound synthesized as a racemate is optically resolved by adding a well-known resolution reagent, for example, an optically active acid such as camphorsulfonic acid, to the racemate to form a crystalline salt. By doing so, only one optically active substance can be taken out.
【0082】以下に実施例をあげて本発明を更に具体的
に説明する。The present invention will be explained in more detail with reference to Examples below.
【0083】文中『*』印はラセミ体を示す。即ち、(
2R* ,3S* )という表示は、(2R,3S)と
(2S,3R)の異性体の1:1の混合物を意味し、こ
れは(2S* ,3R* )と同意義である。一方、(
2R* ,3R* )という表示は、(2R,3R)と
(2S,3S)の異性体の1:1の混合物を意味し、こ
れは、(2S* ,3S* )と同意義である。[0083] The mark "*" in the text indicates a racemic body. That is, (
The designation 2R*,3S*) means a 1:1 mixture of the (2R,3S) and (2S,3R) isomers, which has the same meaning as (2S*,3R*). on the other hand,(
The designation 2R*, 3R*) means a 1:1 mixture of the (2R, 3R) and (2S, 3S) isomers, which has the same meaning as (2S*, 3S*).
【0084】[0084]
実施例1
(2R* ,4R* )−2−(4−クロロフェニル)
−3,4−ジメチル−2−エトキシカルボニル−オキセ
タン
ベンゼン(200ml)に0℃で2−ブテンを体積が約
1.25倍となるまで吹き込んだ。ここに、4−クロロ
フェニルグリオキシル酸エチル(24.3 g,114
.09mmol)を加え、15℃でハノビア社製450
W中圧水銀灯を3時間照射した。反応混合物を濃縮し、
残渣をシリカゲルカラムクロマトグラフィー(ヘキサン
:酢酸エチル=10:1)に付し、目的物を油状物とし
て(23.4 g) を得た。Example 1 (2R*,4R*)-2-(4-chlorophenyl)
-3,4-Dimethyl-2-ethoxycarbonyl-oxetane 2-butene was bubbled into benzene (200 ml) at 0°C until the volume became about 1.25 times the volume. Here, ethyl 4-chlorophenylglyoxylate (24.3 g, 114
.. 450 manufactured by Hanovia at 15°C.
It was irradiated with a W medium pressure mercury lamp for 3 hours. Concentrate the reaction mixture;
The residue was subjected to silica gel column chromatography (hexane:ethyl acetate=10:1) to obtain the desired product as an oil (23.4 g).
【0085】収率 76% 沸点 141〜14
2℃/2.7torr
NMR スペクトルを用いて異性体の比を決定したとこ
ろ、このものはC3 位の配位に関するα:β≒1:1
の混合物であった。Yield: 76% Boiling point: 141-14
The ratio of isomers was determined using a 2°C/2.7 torr NMR spectrum, and it was found that α:β≒1:1 regarding the coordination at the C3 position.
It was a mixture of
【0086】NMR(CDCl3)δppm:0.76
(d,J=7.66Hz),1.23 〜1.31(m
),1.34(d,J=6.04Hz),2.83(q
uint,J=7.25Hz),3.55(quint
,J=7.25Hz),4.16 〜4.32(m),
4.56(quint,J=6.45Hz),5.06
(quint,J=7.25Hz),7.26〜7.4
7(m)マススペクトル(m/z):268(M+),
224,213,195,178,167実施例2
(2R* ,4R* )−2−(4−クロロフェニル)
−3,4−ジメチル−2−エトキシカルボニル−オキセ
タン
ベンゼン(700ml)に4−クロロフェニルグリオキ
シル酸エチル(53.16g,0.25mol)を加え
、ここに室温で2−ブテン(69.0g,1.23mo
l) を吹き込んだ。室温で東芝製20Wブラック・ラ
イト・ブルー蛍光灯を50時間照射した。反応終了後溶
媒を留去し、67gの目的物を得た。NMR (CDCl3) δppm: 0.76
(d, J=7.66Hz), 1.23 ~ 1.31 (m
), 1.34 (d, J = 6.04Hz), 2.83 (q
uint, J=7.25Hz), 3.55(quint
, J=7.25Hz), 4.16 ~ 4.32 (m),
4.56 (quint, J=6.45Hz), 5.06
(quint, J=7.25Hz), 7.26-7.4
7 (m) mass spectrum (m/z): 268 (M+),
224,213,195,178,167 Example 2 (2R*,4R*)-2-(4-chlorophenyl)
Ethyl 4-chlorophenylglyoxylate (53.16 g, 0.25 mol) was added to -3,4-dimethyl-2-ethoxycarbonyl-oxetane benzene (700 ml), and 2-butene (69.0 g, 1.5 mol) was added thereto at room temperature. 23mo
l) was injected. It was irradiated with a Toshiba 20W black light blue fluorescent lamp for 50 hours at room temperature. After the reaction was completed, the solvent was distilled off to obtain 67 g of the desired product.
【0087】NMR スペクトルよりこのものはC3
位の配位に関するα:β≒1.25:1.00の混合物
であった。According to the NMR spectrum, this product is C3
It was a mixture of α:β≈1.25:1.00 regarding the positional coordination.
【0088】収率 99.7% 油状物実施例1の
方法に準じて以下の化合物が製造された。Yield: 99.7% Oil The following compound was produced according to the method of Example 1.
【0089】[0089]
【化18】[Chemical formula 18]
【0090】[0090]
【化19】[Chemical formula 19]
【0091】[0091]
【化20】[C20]
【0092】各々の実施例で得られたNMR スペクト
ルとMSのデータを以下に示す。[0092] The NMR spectra and MS data obtained in each example are shown below.
【0093】実施例3
NMR スペクトル( CDCl3)δppm:7.4
2(2H,dd,J=2.2,8.8Hz),7.28
(2H,dd,J=3.6,8.8Hz),5.03(
dq,J=7.2,7.7Hz),4.54(dq,J
=7.2,7.4Hz),4.15(2H,t,J=7
.5Hz),3.51(dq,J=7.7,7.8Hz
),2.80(dq,J=7.4,7.5Hz),1.
58(2H,m),1.20〜1.35(m),0.8
0〜1.95(3H,m),0.75(d,J=7.8
Hz )実施例4
NMR スペクトル( CDCl3)δppm:7.4
4(2H,dd,J=2.5,8.8Hz),7.32
(2H,dd,J=3.8,8.8Hz),5.01〜
5.12(m),4.54(bdq,J=6.2Hz)
,3.51(bdq,J=7.6Hz),2.81(b
dq,J=7.1Hz),1.17〜1.34(m),
0.75(d,J=7.6Hz )マススペクトル(m
/z):282(M+),195,139実施例5
アルコール部分の不斉に由来するジアステレオマーの混
合物
NMR スペクトル( CDCl3)δppm:7.2
7〜7.50(4H,m),4.87 〜5.09(m
),4.55(dq,J=6.4,6.8Hz),4.
54(dq,J=6.4,6.8Hz),3.54(d
q,J=7.7,7.9Hz),3.50(dq,J=
7.7,7.9Hz),2.83(dq,J=6.8,
7.1Hz),2.81(dq,J=6.8,7.1H
z),1.44〜1.67(2H,m),1.10 〜
1.40(m),0.67〜0.97(m)マススペク
トル(m/z):296(M+),241,197,1
39実施例6
NMR スペクトル( CDCl3)δppm:7.2
7〜7.45(4H,m),5.03(dq,J=6.
5,7.7Hz),4.53(dq,J=6.3,6.
7Hz),3.51(dq,J=7.6,7.7Hz)
,2.79(dq,J=6.7,7.0Hz),1.4
4(3H,s),1.43(6H,s),1.31(d
,J=6.3Hz),1.31(d,J=7.0Hz)
,1.23(d,J=6.5Hz),0.74(d,J
=7.6Hz)マススペクトル(m/z):296(M
+),239,195,139実施例7
アルコール部分の不斉に由来するジアステレオマーの混
合物
NMR スペクトル( CDCl3)δppm:7.2
5〜7.45(4H,m),5.04(bdq,J=6
.7Hz),5.03(bdq,J=6.7Hz),4
.88(bdq,J=7.0Hz),4.77(q,J
=6.7Hz),4.71(q,J=6.7Hz),4
.56(bdq,J=7.0Hz),3.56(bdq
,J=8.1Hz),3.48(bdq,J=8.1H
z),2.87(bdq,J=7.4Hz),2.84
(bdq,J=7.4Hz),0.67 〜1.35(
14H,m)マススペクトル(m/z):324(M+
),269,195,139実施例8
NMR スペクトル( CDCl3)δppm:7.2
0〜7.45(14H,m),6.94(s),6.8
8(s),5.07(dq,J=6.5,7.9Hz)
,4.56(dq,J=6.5,6.7Hz),3.5
6(dq,J=7.3,7.9Hz),2.89(dq
,J=6.7,6.9Hz),1.34(d,J=6.
5Hz),1.26(d,J=6.5Hz),1.07
(d,J=6.9Hz),0.78(d,J=7.3H
z)
実施例9
NMR スペクトル( CDCl3)δppm:7.4
5(2H,dd,J=4.0,9.9Hz),7.32
(2H,dd,J=4.4,9.9Hz),5.06(
dq,J=6.7,7.9Hz),4.80 〜4.9
5(1H,m),4.56(dq,J=6.5,6.5
Hz),3.52(dq,J=7.9,8.1Hz),
2.83(dq,J=6.5,6.5Hz),0.80
〜1.94(10H,m),1.34(d,J=6.7
Hz),1.30(d,J=6.5Hz),1.26(
d,J=6.5Hz),0.78(d,J=8.1Hz
)
実施例10
アルコール部分の不斉に由来するジアステレオマーの混
合物
NMR スペクトル( CDCl3)δppm:7.2
5〜7.48(4H,m),5.04(dq,J=7.
2,8.0Hz),4.65〜4.82(1H,m),
4.55(dq,J=6.4,7.2Hz),4.53
(dq,J=6.4,7.2Hz),3.55(dq,
J=8.0,8.0Hz),3.48(dq,J=8.
0,8.0Hz),2.84(dq,J=7.2,7.
2Hz),2.82(dq,J=7.2,7.2Hz)
,0.50〜2.05(24H,m)実施例11
アルコール部分の不斉に由来するジアステレオマーの混
合物
NMR スペクトル( CDCl3)δppm:7.2
5〜7.48(m),5.04(dq,J=7.2,8
.0.Hz),4.65〜4.82(m),4.55(
dq,J=6.4,7.2Hz),4.53(dq,J
=6.4,7.2Hz),3.55(dq,J=8.0
,8.0Hz),3.48(dq,J=8.0,8.0
Hz),2.84(dq,J=7.2,7.2Hz),
2.82(dq,J=7.2,7.2Hz),0.50
〜2.05(m)
マススペクトル(m/z):378(M+),323,
195,139実施例12
NMR スペクトル( CDCl3)δppm:7.1
0〜7.51(9H,m),5.00(dq,J=6.
9,7.2Hz),4.85(m),4.57(dq,
J=6.5,6.7Hz)3.36(dq,J=7.2
,7.2Hz),2.77(dq,J=6.7,6.9
Hz),1.85〜2.10(m),0.70〜1.7
5(m)
マススペクトル(m/z):454(M+),215,
195,139実施例13
アルコール部分の不斉に由来するジアステレオマーの混
合物
NMR スペクトル( CDCl3)δppm:7.0
5〜7.38(9H,m),5.00 〜5.20(m
),4.73(dq,J=7.2,7.5Hz),4.
51(dq,J=7.2,7.5Hz),4.36(d
q,J=7.2,7.2Hz),4.12(dq,J=
7.2,7.2Hz),2.52〜3.08(m),1
.19〜2.18(7H,m),1.22(d,J=7
.2Hz),1.11(d,J=7.2Hz),0.8
4(d,J=7.5Hz),0.59(d,J=7.5
Hz)マススペクトル(m/z):398(M+),3
43,195,139実施例14
アルコール部分の不斉に由来するジアステレオマーの混
合物
NMR スペクトル( CDCl3)δppm:7.0
5〜7.38(9H,m),5.00 〜5.20(m
),4.73(dq,J=7.2,7.5Hz),4.
51(dq,J=7.2,7.5Hz),4.36(d
q,J=7.2,7.2Hz),4.12(dq,J=
7.2,7.2Hz),2.52〜3.08(m),1
.19〜2.18(7H,m),1.22(d,J=7
.2Hz),1.11(d,J=7.2Hz),0.8
4(d,J=7.5Hz),0.59(d,J=7.5
Hz)マススペクトル(m/z):398(M+),3
43,195,139実施例15
NMR スペクトル( CDCl3)δppm:7.4
4(2H,d,J=8.8Hz),7.35(2H,d
,J=8.8Hz),5.07(dq,J=6.5,7
.8Hz),4.50 〜4.71(m),3.45〜
3.58(m),2.87(dq,J=7.8,7.8
Hz),2.20〜2.70(1H,m),1.84
〜2.18(2H,m),1.55 〜1.80(2H
,m),1.10 〜1.50(m),0.78(d,
J=7.8Hz)マススペクトル(m/z):338(
M+),197,141,139実施例16
アルコール部分のシス−トランスの混合物NMR スペ
クトル( CDCl3)δppm:7.25〜7.50
(4H,m),4.75 〜5.21(m),4.54
(bdq,J=6.6Hz),4.52(bdq,J=
6.6Hz),3.50(bdq,J=7.1Hz),
3.38(bdq,J=7.1Hz),2.86(bd
q,J=7.3Hz),2.82(bdq,J=7.3
Hz),1.20〜2.20(m),1.24(d,J
=6.6Hz),0.78(d,J=7.3Hz)マス
スペクトル(m/z):380(M+),325,19
5,139
実施例17
アルコール部分の不斉に由来するジアステレオマーの混
合物
NMR スペクトル( CDCl3)δppm:7.4
5(2H,dd,J=3.1,8.7Hz),7.33
(2H,dd,J=3.9,8.7Hz),5.31(
dq,J=6.6,8.1Hz),5.03(dq,J
=7.0,8.1Hz)4.45 〜4.90(m),
4.06〜4.32(1H,m),3.30 〜3.6
5(m),3.54(s),3.26(s),3.23
(s),3.12(s),2.87(bdq,J=7.
4Hz),2.80(bdq,J=7.4Hz),1.
08〜2.15(m),0.75(d,J=7.4Hz
)
油状物
マススペクトル(m/z):382(M+),295,
265,197,141実施例18
アルコール部分の不斉に由来するジアステレオマーの混
合物
NMR スペクトル( CDCl3)δppm:7.4
7(2H,d,J=8.9Hz),7.32(2H,d
d,J=3.8,8.9Hz),5.03(dq,J=
7.2,8.0Hz),4.62〜4.80(1H,m
),4.55(dq,J=6.8,7.0Hz),3.
58〜3.77(1H,m),3.52(bdq,J=
8.0Hz),2.78(dq,J=7.0,7.2H
z),1.03〜2.05(m),0.75〜0.94
(m),0.77(s),0.75(s),0.04(
s),−0.04(s),−0.07(s),−0.1
8 (s)
マススペクトル(m/z):452(M+),395,
351,297,255,195,141
実施例19
(2R* ,3S* ,4R* )−2−(4−クロロ
フェニル)−3,4−ジメチル−2−ヒドロキシメチル
−オキセタン(A)
及び
(2R* ,3R* ,4R* )−2−(4−クロロ
フェニル)−3,4−ジメチル−2−ヒドロキシメチル
−オキセタン(B)
2−(4−クロロフェニル)−3,4−ジメチル−2−
エトキシカルボニル−オキセタン(920mg,3.4
2mmol、これは、(2R* ,3R* ,4R*
)と(2R*,3S* ,4R* )の1:1の混合物
である)のテトラヒドロフラン(7ml)溶液に0℃で
水素化アルミニウムリチウムのテトラヒドロフラン溶液
(1M,3.2ml,3.2mmol )を滴下し、同
温度で30分間撹拌した。反応混合物に飽和塩化アンモ
ニウム水、次いで、1N−塩酸を加え、酢酸エチルで抽
出した。得られた残渣をシリカゲルカラムクロマトグラ
フィー(ヘキサン:酢酸エチル=5:1)に付し、(2
R* ,3S* ,4R* )の目的化合物A(336
.4mg) と(2R* ,3R*,4R* )の目的
化合物B(349.5mg) を得た。Example 3 NMR spectrum (CDCl3) δppm: 7.4
2 (2H, dd, J=2.2, 8.8Hz), 7.28
(2H, dd, J=3.6, 8.8Hz), 5.03(
dq, J = 7.2, 7.7 Hz), 4.54 (dq, J
= 7.2, 7.4Hz), 4.15 (2H, t, J = 7
.. 5Hz), 3.51(dq, J=7.7, 7.8Hz
), 2.80 (dq, J=7.4, 7.5Hz), 1.
58 (2H, m), 1.20-1.35 (m), 0.8
0-1.95 (3H, m), 0.75 (d, J=7.8
Hz) Example 4 NMR spectrum (CDCl3) δppm: 7.4
4 (2H, dd, J=2.5, 8.8Hz), 7.32
(2H, dd, J=3.8, 8.8Hz), 5.01~
5.12 (m), 4.54 (bdq, J=6.2Hz)
, 3.51 (bdq, J=7.6Hz), 2.81 (b
dq, J=7.1Hz), 1.17-1.34(m),
0.75 (d, J=7.6Hz) mass spectrum (m
/z): 282 (M+), 195, 139 Example 5 Mixture of diastereomers derived from chirality of alcohol moiety NMR spectrum (CDCl3) δppm: 7.2
7-7.50 (4H, m), 4.87-5.09 (m
), 4.55 (dq, J=6.4, 6.8Hz), 4.
54 (dq, J=6.4, 6.8Hz), 3.54 (d
q, J=7.7, 7.9Hz), 3.50(dq, J=
7.7, 7.9Hz), 2.83 (dq, J=6.8,
7.1Hz), 2.81(dq, J=6.8, 7.1H
z), 1.44 ~ 1.67 (2H, m), 1.10 ~
1.40(m), 0.67-0.97(m) Mass spectrum (m/z): 296(M+), 241,197,1
39 Example 6 NMR spectrum (CDCl3) δppm: 7.2
7-7.45 (4H, m), 5.03 (dq, J=6.
5,7.7Hz), 4.53 (dq, J=6.3,6.
7Hz), 3.51 (dq, J=7.6, 7.7Hz)
, 2.79 (dq, J=6.7, 7.0Hz), 1.4
4 (3H, s), 1.43 (6H, s), 1.31 (d
, J=6.3Hz), 1.31(d, J=7.0Hz)
, 1.23 (d, J = 6.5Hz), 0.74 (d, J
=7.6Hz) Mass spectrum (m/z): 296 (M
+), 239, 195, 139 Example 7 Mixture of diastereomers derived from chirality of alcohol moiety NMR spectrum (CDCl3) δppm: 7.2
5-7.45 (4H, m), 5.04 (bdq, J=6
.. 7Hz), 5.03 (bdq, J=6.7Hz), 4
.. 88 (bdq, J = 7.0Hz), 4.77 (q, J
= 6.7Hz), 4.71 (q, J = 6.7Hz), 4
.. 56 (bdq, J=7.0Hz), 3.56 (bdq
, J=8.1Hz), 3.48(bdq, J=8.1H
z), 2.87 (bdq, J=7.4Hz), 2.84
(bdq, J=7.4Hz), 0.67 ~ 1.35 (
14H, m) Mass spectrum (m/z): 324 (M+
), 269, 195, 139 Example 8 NMR spectrum (CDCl3) δppm: 7.2
0-7.45 (14H, m), 6.94 (s), 6.8
8(s), 5.07(dq, J=6.5, 7.9Hz)
, 4.56 (dq, J=6.5, 6.7Hz), 3.5
6 (dq, J=7.3, 7.9Hz), 2.89 (dq
, J=6.7, 6.9Hz), 1.34(d, J=6.
5Hz), 1.26 (d, J=6.5Hz), 1.07
(d, J=6.9Hz), 0.78(d, J=7.3H
z) Example 9 NMR spectrum (CDCl3) δppm: 7.4
5 (2H, dd, J=4.0, 9.9Hz), 7.32
(2H, dd, J=4.4, 9.9Hz), 5.06(
dq, J=6.7, 7.9Hz), 4.80 ~ 4.9
5 (1H, m), 4.56 (dq, J = 6.5, 6.5
Hz), 3.52 (dq, J=7.9, 8.1Hz),
2.83 (dq, J=6.5, 6.5Hz), 0.80
~1.94 (10H, m), 1.34 (d, J=6.7
Hz), 1.30 (d, J=6.5Hz), 1.26 (
d, J = 6.5Hz), 0.78 (d, J = 8.1Hz
) Example 10 Mixture of diastereomers derived from chirality of alcohol moiety NMR spectrum (CDCl3) δppm: 7.2
5-7.48 (4H, m), 5.04 (dq, J=7.
2,8.0Hz), 4.65-4.82 (1H, m),
4.55 (dq, J=6.4, 7.2Hz), 4.53
(dq, J=6.4, 7.2Hz), 3.55 (dq,
J=8.0, 8.0Hz), 3.48(dq, J=8.
0,8.0Hz), 2.84(dq, J=7.2,7.
2Hz), 2.82 (dq, J=7.2, 7.2Hz)
, 0.50-2.05 (24H, m) Example 11 Mixture of diastereomers derived from chirality of alcohol moiety NMR spectrum (CDCl3) δppm: 7.2
5-7.48 (m), 5.04 (dq, J = 7.2, 8
.. 0. Hz), 4.65-4.82 (m), 4.55 (
dq, J = 6.4, 7.2 Hz), 4.53 (dq, J
=6.4, 7.2Hz), 3.55(dq, J=8.0
, 8.0Hz), 3.48 (dq, J=8.0, 8.0
Hz), 2.84 (dq, J=7.2, 7.2Hz),
2.82 (dq, J=7.2, 7.2Hz), 0.50
~2.05 (m) Mass spectrum (m/z): 378 (M+), 323,
195,139 Example 12 NMR spectrum (CDCl3) δppm: 7.1
0-7.51 (9H, m), 5.00 (dq, J=6.
9,7.2Hz), 4.85(m), 4.57(dq,
J=6.5, 6.7Hz) 3.36(dq, J=7.2
, 7.2Hz), 2.77 (dq, J=6.7, 6.9
Hz), 1.85-2.10(m), 0.70-1.7
5 (m) Mass spectrum (m/z): 454 (M+), 215,
195,139 Example 13 Mixture of diastereomers derived from chirality of alcohol moiety NMR spectrum (CDCl3) δppm: 7.0
5-7.38 (9H, m), 5.00-5.20 (m
), 4.73 (dq, J=7.2, 7.5Hz), 4.
51 (dq, J=7.2, 7.5Hz), 4.36 (d
q, J=7.2, 7.2Hz), 4.12(dq, J=
7.2, 7.2Hz), 2.52-3.08(m), 1
.. 19-2.18 (7H, m), 1.22 (d, J=7
.. 2Hz), 1.11 (d, J=7.2Hz), 0.8
4 (d, J = 7.5 Hz), 0.59 (d, J = 7.5
Hz) Mass spectrum (m/z): 398 (M+), 3
43,195,139 Example 14 Mixture of diastereomers derived from chirality of alcohol moiety NMR spectrum (CDCl3) δppm: 7.0
5-7.38 (9H, m), 5.00-5.20 (m
), 4.73 (dq, J=7.2, 7.5Hz), 4.
51 (dq, J=7.2, 7.5Hz), 4.36 (d
q, J=7.2, 7.2Hz), 4.12(dq, J=
7.2, 7.2Hz), 2.52-3.08(m), 1
.. 19-2.18 (7H, m), 1.22 (d, J=7
.. 2Hz), 1.11 (d, J=7.2Hz), 0.8
4 (d, J = 7.5 Hz), 0.59 (d, J = 7.5
Hz) Mass spectrum (m/z): 398 (M+), 3
43,195,139 Example 15 NMR spectrum (CDCl3) δppm: 7.4
4 (2H, d, J = 8.8Hz), 7.35 (2H, d
, J=8.8Hz), 5.07(dq, J=6.5,7
.. 8Hz), 4.50 ~ 4.71 (m), 3.45 ~
3.58 (m), 2.87 (dq, J=7.8, 7.8
Hz), 2.20-2.70 (1H, m), 1.84
~2.18 (2H, m), 1.55 ~1.80 (2H
, m), 1.10 to 1.50 (m), 0.78 (d,
J=7.8Hz) Mass spectrum (m/z): 338(
M+), 197, 141, 139 Example 16 Cis-trans mixture NMR spectrum of alcohol moiety (CDCl3) δppm: 7.25-7.50
(4H, m), 4.75 ~ 5.21 (m), 4.54
(bdq, J=6.6Hz), 4.52 (bdq, J=
6.6Hz), 3.50 (bdq, J=7.1Hz),
3.38 (bdq, J=7.1Hz), 2.86 (bd
q, J=7.3Hz), 2.82(bdq, J=7.3
Hz), 1.20-2.20 (m), 1.24 (d, J
= 6.6Hz), 0.78 (d, J = 7.3Hz) Mass spectrum (m/z): 380 (M+), 325, 19
5,139 Example 17 Mixture of diastereomers derived from chirality of alcohol moiety NMR spectrum (CDCl3) δppm: 7.4
5 (2H, dd, J=3.1, 8.7Hz), 7.33
(2H, dd, J=3.9, 8.7Hz), 5.31(
dq, J = 6.6, 8.1 Hz), 5.03 (dq, J
=7.0,8.1Hz)4.45 ~4.90(m),
4.06-4.32 (1H, m), 3.30-3.6
5 (m), 3.54 (s), 3.26 (s), 3.23
(s), 3.12 (s), 2.87 (bdq, J=7.
4Hz), 2.80 (bdq, J=7.4Hz), 1.
08~2.15(m), 0.75(d, J=7.4Hz
) Oil mass spectrum (m/z): 382 (M+), 295,
265,197,141 Example 18 Mixture of diastereomers derived from chirality of alcohol moiety NMR spectrum (CDCl3) δppm: 7.4
7 (2H, d, J = 8.9Hz), 7.32 (2H, d
d, J=3.8, 8.9Hz), 5.03(dq, J=
7.2, 8.0Hz), 4.62-4.80 (1H, m
), 4.55 (dq, J=6.8, 7.0Hz), 3.
58-3.77 (1H, m), 3.52 (bdq, J=
8.0Hz), 2.78(dq, J=7.0, 7.2H
z), 1.03 to 2.05 (m), 0.75 to 0.94
(m), 0.77 (s), 0.75 (s), 0.04 (
s), -0.04 (s), -0.07 (s), -0.1
8 (s) Mass spectrum (m/z): 452 (M+), 395,
351,297,255,195,141 Example 19 (2R*,3S*,4R*)-2-(4-chlorophenyl)-3,4-dimethyl-2-hydroxymethyl-oxetane (A) and (2R* ,3R*,4R*)-2-(4-chlorophenyl)-3,4-dimethyl-2-hydroxymethyl-oxetane (B) 2-(4-chlorophenyl)-3,4-dimethyl-2-
Ethoxycarbonyl-oxetane (920mg, 3.4
2 mmol, which is (2R*, 3R*, 4R*
) and (2R*, 3S*, 4R*), which is a 1:1 mixture of It was added dropwise and stirred at the same temperature for 30 minutes. Saturated ammonium chloride water and then 1N hydrochloric acid were added to the reaction mixture, and the mixture was extracted with ethyl acetate. The obtained residue was subjected to silica gel column chromatography (hexane: ethyl acetate = 5:1) to obtain (2
R*, 3S*, 4R*) of target compound A (336
.. 4 mg) and (2R*, 3R*, 4R*) of target compound B (349.5 mg) were obtained.
【0094】化合物A
NMR スペクトル( CDCl3)δppm:0.7
0(3H,d,J=7.66Hz),1.24(3H,
d,J=6.44Hz),3.33(1H,d,J=7
.66Hz),3.63(1H,d,J=12.08H
z),3.87(1H,d,J=12.08Hz),4
.96(1H,dq,J=6.44,7.66Hz),
7.25(2H,d,J=8.46Hz),7.35(
2H,d,J=8.46Hz)マススペクトル(m/z
):223,195,181,167,153,139
化合物B
NMR スペクトル( CDCl3)δppm:1.3
6(3H,d,J=6.04Hz),1.36(3H,
d,J=7.25Hz),2.18(1H,brdd,
J=5.53,7.25Hz),2.65(1H,qu
int,J=7.25Hz),3.71(1H,dd,
J=5.53,12.09Hz),4.02(1H,d
d,J=7.25,12.09Hz),4.56(1H
,dq,J=6.04,7.25Hz),7.24(2
H,d,J=8.46Hz),7.33(2H,d,J
=8.46Hz)マススペクトル(m/z):195,
167,139,129,125,115実施例20
(2R* ,4R* )−2−(4−クロロフェニル)
−3,4−ジメチル−2−ヒドロキシメチル−オキセタ
ンエチレングリコールジメチルエーテル(400ml)
中の水素化ほう素ナトリウム(11.4 g,0.3
mol) に塩化リチウム(12.7 g,0.3mo
l) を加え、50分間撹拌した。(2R* ,4R*
)−2−(4−クロロフェニル)−3,4−ジメチル
−2−エトキシカルボニルオキセタン(107g,0.
4mol、これは、3R* と3S* の1:1の混合
物である)を20分間にわたって滴下し、60℃にて2
時間撹拌した。反応液を氷水にあけ、3規定塩酸でpH
を2乃至3とした後、酢酸エチルで抽出した。有機層を
水、飽和食塩水で順次洗浄した後、無水硫酸ナトリウム
で乾燥、濃縮し、目的化合物93gを得た。このものは
実施例19で得られた化合物Aと化合物Bの1:1の混
合物であり、各々のピークをNMR スペクトルで観察
する事が出来た。Compound A NMR spectrum (CDCl3) δppm: 0.7
0 (3H, d, J = 7.66Hz), 1.24 (3H,
d, J = 6.44Hz), 3.33 (1H, d, J = 7
.. 66Hz), 3.63 (1H, d, J=12.08H
z), 3.87 (1H, d, J=12.08Hz), 4
.. 96 (1H, dq, J=6.44, 7.66Hz),
7.25 (2H, d, J = 8.46Hz), 7.35 (
2H, d, J = 8.46Hz) Mass spectrum (m/z
):223,195,181,167,153,139
Compound B NMR spectrum (CDCl3) δppm: 1.3
6 (3H, d, J = 6.04Hz), 1.36 (3H,
d, J=7.25Hz), 2.18(1H, brdd,
J=5.53, 7.25Hz), 2.65(1H, qu
int, J=7.25Hz), 3.71(1H, dd,
J=5.53, 12.09Hz), 4.02(1H, d
d, J = 7.25, 12.09Hz), 4.56 (1H
, dq, J=6.04, 7.25Hz), 7.24(2
H, d, J = 8.46Hz), 7.33 (2H, d, J
=8.46Hz) Mass spectrum (m/z): 195,
167,139,129,125,115 Example 20 (2R*,4R*)-2-(4-chlorophenyl)
-3,4-dimethyl-2-hydroxymethyl-oxetane ethylene glycol dimethyl ether (400ml)
Sodium borohydride (11.4 g, 0.3
mol) to lithium chloride (12.7 g, 0.3 mo
l) was added and stirred for 50 minutes. (2R*, 4R*
)-2-(4-chlorophenyl)-3,4-dimethyl-2-ethoxycarbonyloxetane (107 g, 0.
4 mol, which is a 1:1 mixture of 3R* and 3S*) was added dropwise over 20 minutes and incubated at 60°C for 2 hours.
Stir for hours. Pour the reaction solution into ice water and adjust the pH with 3N hydrochloric acid.
After adjusting the concentration to 2 to 3, the mixture was extracted with ethyl acetate. The organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated to obtain 93 g of the target compound. This product was a 1:1 mixture of Compound A and Compound B obtained in Example 19, and each peak could be observed in the NMR spectrum.
【0095】収率 100% 油状物実施例21
2−(4−クロロフェニル)−3,4−ジメチル−2−
メタンスルホニルオキシメチル−オキセタン2−(4−
クロロフェニル)−3,4−ジメチル−2−ヒドロキシ
メチル−オキセタン(123mg,0.543mmol
) のジクロロメタン(10ml)溶液に0℃で、メタ
ンスルホニルクロライド(0.13ml,1.68mm
ol) 、次いでトリエチルアミン(0.24ml,1
.708mmol)を加え、4時間撹拌しながら室温に
まで温度を上げた。反応混合物に飽和重そう水を加え、
ジクロロメタンで抽出した。無水硫酸マグネシウムで乾
燥後、濃縮し、残渣をシリカゲルカラムクロマトグラフ
ィー(ヘキサン:酢酸エチル=10:1)に付し、目的
化合物(107mg)を得た。Yield 100% Oil Example 21 2-(4-chlorophenyl)-3,4-dimethyl-2-
methanesulfonyloxymethyl-oxetane 2-(4-
chlorophenyl)-3,4-dimethyl-2-hydroxymethyl-oxetane (123 mg, 0.543 mmol
) in dichloromethane (10 ml) at 0°C, methanesulfonyl chloride (0.13 ml, 1.68 mm
ol), then triethylamine (0.24 ml, 1
.. 708 mmol) was added thereto, and the temperature was raised to room temperature while stirring for 4 hours. Add saturated deuterated water to the reaction mixture,
Extracted with dichloromethane. After drying over anhydrous magnesium sulfate, it was concentrated, and the residue was subjected to silica gel column chromatography (hexane:ethyl acetate=10:1) to obtain the target compound (107 mg).
【0096】収率 65%
NMR スペクトル( CDCl3)δppm:0.7
2(3H,d,J=7.25Hz),1.21(3H,
d,J=6.44Hz),3.02(3H,s),3.
25(1H,quint,J=7.25Hz),4.3
3(1H,d,J=11.68Hz),4.60(1H
,d,J=11.68Hz),5.04(1H,dq,
J=6.44,7.25Hz),7.28(2H,d,
J=8.86Hz),7.37(2H,d,J=8.8
6Hz)
実施例22
(2R* ,3S* ,4R* )−2−(4−クロロ
フェニル)−2−クロロメチル−3,4−ジメチル−オ
キセタン
実施例20で得た(2R* ,4R* )−2−(4−
クロロフェニル)−3,4−ジメチル−2−ヒドロキシ
メチル−オキセタン(0.5g,2.2mmol 、こ
のものは3S* :3R* ≒1:1の混合物)、ピリ
ジン(0.35 g,4.4mmol)とトルエン(1
5ml)の混合物にチオニルクロライド(0.52 g
,4.4mmol)を加え、110℃に3時間加熱撹拌
した。冷後、氷水に注加し、酢酸エチルで抽出、飽和食
塩水で洗浄し、無水硫酸ナトリウムで乾燥し、溶媒を留
去した後、残渣をシリカゲルカラムクロマトグラフィー
で精製し、目的物を133mg得た。Yield: 65% NMR spectrum (CDCl3) δppm: 0.7
2 (3H, d, J = 7.25Hz), 1.21 (3H,
d, J=6.44Hz), 3.02 (3H, s), 3.
25 (1H, quint, J=7.25Hz), 4.3
3 (1H, d, J = 11.68Hz), 4.60 (1H
, d, J=11.68Hz), 5.04(1H, dq,
J=6.44, 7.25Hz), 7.28(2H, d,
J=8.86Hz), 7.37(2H,d,J=8.8
6Hz) Example 22 (2R*, 3S*, 4R*)-2-(4-chlorophenyl)-2-chloromethyl-3,4-dimethyl-oxetane (2R*, 4R*)- obtained in Example 20 2-(4-
chlorophenyl)-3,4-dimethyl-2-hydroxymethyl-oxetane (0.5 g, 2.2 mmol, a mixture of 3S*:3R* ≒1:1), pyridine (0.35 g, 4.4 mmol) ) and toluene (1
thionyl chloride (0.52 g
, 4.4 mmol) was added thereto, and the mixture was heated and stirred at 110° C. for 3 hours. After cooling, it was poured into ice water, extracted with ethyl acetate, washed with saturated brine, dried over anhydrous sodium sulfate, and the solvent was distilled off. The residue was purified by silica gel column chromatography to obtain 133 mg of the target product. Ta.
【0097】収率 49%
NMR スペクトル( CDCl3)δppm:0.7
3(d,J=7.6Hz),1.24(d,J=6.4
Hz),3.25(dq,J=7.6Hz,7.6Hz
),3.80(d,J=11.9Hz),4.00(d
,J=11.9Hz),),5.05(dq,J=6.
4Hz,6.4Hz),7.2 〜7.4(m)
マススペクトル(m/z):248,246,244,
236,221,208,191,179,166,1
39
実施例23
(2R* ,3S* ,4R* )−2−(4−クロロ
フェニル)−3,4−ジメチル−2−[(1H−1,2
,4−トリアゾール−1−イル)メチル]オキセタン(
2R* ,3S* ,4R* )−2−(4−クロロフ
ェニル)−3,4−ジメチル−2−メタンスルホニルオ
キシメチルオキセタン(107mg,0.351mmo
l)、1H−1,2,4−トリアゾール(51.5mg
,0.746mmol)及びヨウ化ナトリウム(45.
6mg,0.304mmol ) のジメチルイミダゾ
リジノン(10ml)の懸濁液に0℃で水素化ナトリウ
ム(約60%含有オイル、38mg,0.950mmo
l)を加え、室温で30分間撹拌した。更に90℃で1
2時間撹拌後、チオ硫酸ナトリウム水溶液を加えた。酢
酸エチル−ヘキサン(1:1,V/V)で抽出し、水洗
、無水硫酸マグネシウムで乾燥した。濃縮後、残渣をシ
リカゲルカラムクロマトグラフィー(ヘキサン:酢酸エ
チル=1:1)に付し、目的化合物(76.3 mg)
を得た。
収率 78%
NMR スペクトル( CDCl3)δppm:0.7
0(3H,d,J=7.25Hz),1.17(3H,
d,J=6.45Hz),3.16(1H,quint
,J=7.25Hz),4.41(1H,d,J=14
.5Hz),4.4 〜4.53(1H,m),4.7
6(1H,d,J=14.5Hz),7.25 (2H
,d,J=8.46Hz),7.36(2H,d,J=
8.46Hz),7.98(1H,s),8.42(1
H,s)
マススペクトル(m/z):278(M+1),256
,222,197,164,149,141,139,
129,111,104実施例24
(2R* ,3S* ,4R* )−2−(4−クロロ
フェニル)−3,4−ジメチル−2−[(1H−1,2
,4−トリアゾール−1−イル)メチル]オキセタン実
施例22で得た(2R* ,3S* ,4R* )−2
−(4−クロロフェニル)−2−クロロメチル−3,4
−ジメチル−オキセタン(245mg,1mmol)
のDMF 溶液(2ml)に1H−1,2,4−トリア
ゾール(26mg,0.38mmol )と炭酸カリ(
26mg,0.19mmol )を加え、130℃で5
時間、撹拌した。冷後、混合物を氷水に注加し、酢酸エ
チルで抽出し、飽和塩化アンモン水溶液で洗浄、芒硝で
乾燥、溶媒を留去し、260mgの残渣を得た。このも
のをシリカゲルカラムクロマトグラフィーに付し56.
2mg(収率81%)の目的物を得た。Yield: 49% NMR spectrum (CDCl3) δppm: 0.7
3 (d, J = 7.6 Hz), 1.24 (d, J = 6.4
Hz), 3.25 (dq, J=7.6Hz, 7.6Hz
), 3.80 (d, J=11.9Hz), 4.00 (d
, J=11.9Hz), ), 5.05(dq, J=6.
4Hz, 6.4Hz), 7.2 ~ 7.4 (m) Mass spectrum (m/z): 248, 246, 244,
236, 221, 208, 191, 179, 166, 1
39 Example 23 (2R*,3S*,4R*)-2-(4-chlorophenyl)-3,4-dimethyl-2-[(1H-1,2
,4-triazol-1-yl)methyl]oxetane (
2R*,3S*,4R*)-2-(4-chlorophenyl)-3,4-dimethyl-2-methanesulfonyloxymethyloxetane (107 mg, 0.351 mmo
l), 1H-1,2,4-triazole (51.5 mg
, 0.746 mmol) and sodium iodide (45.
6 mg, 0.304 mmol) of dimethylimidazolidinone (10 ml) was added at 0°C to a suspension of sodium hydride (approximately 60% oil containing 38 mg, 0.950 mmol) in dimethylimidazolidinone (10 ml).
1) was added and stirred at room temperature for 30 minutes. Furthermore, 1 at 90℃
After stirring for 2 hours, an aqueous sodium thiosulfate solution was added. It was extracted with ethyl acetate-hexane (1:1, V/V), washed with water, and dried over anhydrous magnesium sulfate. After concentration, the residue was subjected to silica gel column chromatography (hexane: ethyl acetate = 1:1) to obtain the target compound (76.3 mg).
I got it. Yield 78% NMR spectrum (CDCl3) δppm: 0.7
0 (3H, d, J = 7.25Hz), 1.17 (3H,
d, J=6.45Hz), 3.16(1H, quint
, J=7.25Hz), 4.41(1H, d, J=14
.. 5Hz), 4.4 to 4.53 (1H, m), 4.7
6 (1H, d, J = 14.5Hz), 7.25 (2H
, d, J=8.46Hz), 7.36(2H, d, J=
8.46Hz), 7.98(1H,s), 8.42(1
H, s) Mass spectrum (m/z): 278 (M+1), 256
,222,197,164,149,141,139,
129,111,104 Example 24 (2R*,3S*,4R*)-2-(4-chlorophenyl)-3,4-dimethyl-2-[(1H-1,2
,4-triazol-1-yl)methyl]oxetane (2R*,3S*,4R*)-2 obtained in Example 22
-(4-chlorophenyl)-2-chloromethyl-3,4
-dimethyl-oxetane (245mg, 1mmol)
1H-1,2,4-triazole (26 mg, 0.38 mmol) and potassium carbonate (2 ml) were added to a DMF solution (2 ml) of
26mg, 0.19mmol) was added and heated at 130℃ for 5 minutes.
Stir for an hour. After cooling, the mixture was poured into ice water, extracted with ethyl acetate, washed with saturated aqueous ammonium chloride solution, dried over Glauber's salt, and the solvent was distilled off to obtain 260 mg of residue. This material was subjected to silica gel column chromatography.56.
2 mg (yield 81%) of the target product was obtained.
【0098】このものは、全ての点で実施例23で得た
化合物と一致した。This compound corresponded in all respects to the compound obtained in Example 23.
【0099】実施例25
(2R* ,3S* ,4R* )−2−(4−クロロ
フェニル)−3,4−ジメチル−2−[(1H−1,2
,4−トリアゾール−1−イル)メチル]オキセタンN
,N−ジメチルホルムアミド1リットル中の1H−1,
2,4−トリアゾール55.3g(0.8mol)に炭
酸カリウム55.3g(0.4mol)を加え、120
℃にて1時間撹拌した。その後(2R* ,4R* )
−2−(4−クロロフェニル)−3,4−ジメチル−2
−メタンスルホニルオキシオキセタン(121.9g,
0.4mol、このものは3S* :3R* ≒1:1
の混合である)を加え、120℃にて7時間撹拌した。
反応液を氷水にあけ酢酸エチルで抽出したのち、水、飽
和食塩水で順次洗浄、乾燥、濃縮した。残渣をトルエン
に溶解し、6規定塩酸で抽出した。塩酸層に炭酸カリウ
ムを加えて液性を中性とし、塩化メチレンで抽出した。
塩化メチレン層を水、飽和食塩水で順次洗浄後、乾燥、
濃縮し、(2R* ,3S* ,4R* )−2−(4
−クロロフェニル)−3,4−ジメチル−2−(1H−
1,2,4−トリアゾール−1−イル)オキセタン41
.9g(収率76%)を得た。またトルエン層を飽和炭
酸水素ナトリウム水溶液、水、飽和食塩水で順次洗浄後
、乾燥、濃縮し(2R* ,3R* ,4R* )−2
−(4−クロロフェニル)−3,4−ジメチル−2−メ
タンスルホニルオキシオキセタン56.6g(回収率9
4%)を得た。Example 25 (2R*,3S*,4R*)-2-(4-chlorophenyl)-3,4-dimethyl-2-[(1H-1,2
,4-triazol-1-yl)methyl]oxetane N
, 1H-1 in 1 liter of N-dimethylformamide,
55.3 g (0.4 mol) of potassium carbonate was added to 55.3 g (0.8 mol) of 2,4-triazole, and 120
The mixture was stirred at ℃ for 1 hour. After that (2R*, 4R*)
-2-(4-chlorophenyl)-3,4-dimethyl-2
-Methanesulfonyloxyoxetane (121.9g,
0.4 mol, this one is 3S*:3R* ≒1:1
) was added thereto, and the mixture was stirred at 120°C for 7 hours. The reaction solution was poured into ice water, extracted with ethyl acetate, washed successively with water and saturated brine, dried, and concentrated. The residue was dissolved in toluene and extracted with 6N hydrochloric acid. Potassium carbonate was added to the hydrochloric acid layer to make the liquid neutral, and the mixture was extracted with methylene chloride. After sequentially washing the methylene chloride layer with water and saturated saline, drying,
Concentrate to (2R*, 3S*, 4R*)-2-(4
-chlorophenyl)-3,4-dimethyl-2-(1H-
1,2,4-triazol-1-yl)oxetane 41
.. 9 g (yield 76%) was obtained. In addition, the toluene layer was sequentially washed with a saturated aqueous sodium bicarbonate solution, water, and saturated brine, dried, and concentrated (2R*, 3R*, 4R*)-2
-(4-chlorophenyl)-3,4-dimethyl-2-methanesulfonyloxyoxetane 56.6 g (recovery rate 9
4%).
【0100】実施例25と同様の反応で以下の化合物が
製造された。The following compound was produced in the same reaction as in Example 25.
【0101】[0101]
【化21】[C21]
【0102】
─────────────────────────
───────────実施例番号 Ar
物性
─
─────────────────────────
────────── 26 2,4−F
2 −Ph 油状物
27
2−Cl−Ph
油状物
28 2−Cl,4−F−Ph
油状物
29 4−Cl,
2−F−Ph 油状物
30
2,4−Cl2 −Ph 油状物
31 4−OCF3 −Ph
油状物
32 4−Br−Ph
油状物
33
4−CF3 −Ph 油
状物
34 2,6−F2 −Ph
油状物
35 Ph
油状
物
36 2,4−F2 −Ph
融点145〜150℃(修酸塩)
37 2,4−F2 −Ph
融点160〜177℃(硝酸塩) 38
2,4−Cl2 −Ph
融点160〜164℃(硝酸塩) 39
4−Cl−Ph 融点
135〜144℃(硝酸塩) 40
4−Cl−Ph 融点12
9〜142℃(修酸塩) ────────────
────────────────────────実
施例41
(2R* ,3S* ,4R* )−2−(4−クロロ
フェニル)−3,4−ジエチル−2−[(1H−1,2
,4−トリアゾール−1−イル)メチル]オキセタン融
点 94〜102℃
NMR スペクトル( CDCl3)δppm:0.7
2(3H,t,J=7.28Hz),0.96(3H,
t,J=7.28Hz),1.11(2H,dq,J=
7.28Hz,7.28Hz),1.3−1.5(1H
,m),1.5−1.7(1H,m),2.90(1H
,dt,J=7.28Hz,8.26Hz),4.12
(1H,ddd,J=3.80Hz,8.26Hz,1
0.10Hz),4.36(1H,d,J=14.65
Hz),4.73(1H,d,J=14.65Hz),
7.3−7.4(4H,m),7.94(1H,s),
8.27(1H,s)
MS(m/z):308,306(M+1)+ ,29
3,279,265,250,225,141実施例4
2
(2R* 、3S* 、4R* )−2−(4−フルオ
ロフェニル)−3、4−ジエチル−2−[(1H−1、
2、4−トリアゾ−ル−1−イル)メチル]オキセタン
融点 92ー97 ℃
NMR(CDCl3 )δppm:0.72(3H,t
,J=7.5Hz),0.97(3H,t,J=7.3
Hz),1.12(2H,quint,J=7.5Hz
),1.39−1.70(2H,m),2.88(1H
,q,J=7,5Hz)4.16(1H,ddd,J=
3.8,7.5,10.2Hz),4.40(1H,d
,J=4.6Hz),4.77(1H,d,J=4.6
Hz),7.02−7.13(2H,m),7.32−
7.39(2H,m),7.96(1H,s),8.3
7(1H,s).
MS(m/z):290(M+1)+ ,207.0102] ──────────────────────────
────────────Example number Ar
physical properties
─
──────────────────────────
────────── 26 2,4-F
2-Ph oily substance
27
2-Cl-Ph
oily substance
28 2-Cl, 4-F-Ph
oily substance
29 4-Cl,
2-F-Ph oily substance
30
2,4-Cl2 -Ph oil
31 4-OCF3-Ph
oily substance
32 4-Br-Ph
oily substance
33
4-CF3 -Ph oil
34 2,6-F2-Ph
oily substance
35 Ph
oily substance
36 2,4-F2-Ph
Melting point 145-150℃ (oxalate)
37 2,4-F2-Ph
Melting point 160-177℃ (nitrate) 38
2,4-Cl2-Ph
Melting point 160-164℃ (nitrate) 39
4-Cl-Ph Melting point 135-144℃ (nitrate) 40
4-Cl-Ph Melting point 12
9-142℃ (oxalate) ────────────
────────────────────────Example 41 (2R*, 3S*, 4R*)-2-(4-chlorophenyl)-3,4- diethyl-2-[(1H-1,2
,4-triazol-1-yl)methyl]oxetane Melting point 94-102°C NMR spectrum (CDCl3) δppm: 0.7
2 (3H, t, J = 7.28Hz), 0.96 (3H,
t, J = 7.28Hz), 1.11 (2H, dq, J =
7.28Hz, 7.28Hz), 1.3-1.5 (1H
, m), 1.5-1.7 (1H, m), 2.90 (1H
, dt, J=7.28Hz, 8.26Hz), 4.12
(1H, ddd, J=3.80Hz, 8.26Hz, 1
0.10Hz), 4.36 (1H, d, J=14.65
Hz), 4.73 (1H, d, J=14.65Hz),
7.3-7.4 (4H, m), 7.94 (1H, s),
8.27 (1H, s) MS (m/z): 308,306 (M+1)+ ,29
3,279,265,250,225,141 Example 4
2 (2R*, 3S*, 4R*)-2-(4-fluorophenyl)-3,4-diethyl-2-[(1H-1,
2,4-triazol-1-yl)methyl]oxetane Melting point 92-97°C NMR (CDCl3) δppm: 0.72 (3H, t
, J=7.5Hz), 0.97(3H,t,J=7.3
Hz), 1.12 (2H, quint, J=7.5Hz
), 1.39-1.70 (2H, m), 2.88 (1H
, q, J=7,5Hz)4.16(1H,ddd,J=
3.8, 7.5, 10.2Hz), 4.40 (1H, d
, J=4.6Hz), 4.77(1H, d, J=4.6
Hz), 7.02-7.13 (2H, m), 7.32-
7.39 (2H, m), 7.96 (1H, s), 8.3
7 (1H, s). MS (m/z): 290 (M+1)+, 207.
【0
103】0
103]
参考例1
4−クロロフェニルグリオキシル酸エチルクロロベンゼ
ン(22.5 g,0.2mol) 、無水塩化アルミ
ニウム(26.66g,0.2mol) とジクロロメ
タン(50ml)の混合物にクロログリオキシル酸エチ
ル(13.65g,0.1mol) を氷冷下、撹拌し
ながら加えた。添加後、室温で30分間撹拌し、反応混
合物を氷水に注加し、酢酸エチルで抽出、水洗、希炭酸
水素ナトリウム水溶液で洗浄、最後にもう一度水洗し、
無水硫酸ナトリウムで乾燥し、溶媒を留去し、残渣を減
圧蒸留して目的物を15.1g得た。Reference Example 1 Ethyl 4-chlorophenylglyoxylate To a mixture of chlorobenzene (22.5 g, 0.2 mol), anhydrous aluminum chloride (26.66 g, 0.2 mol) and dichloromethane (50 ml) was added ethyl chloroglyoxylate (13.65 g, 0.2 mol). 0.1 mol) was added under ice cooling and stirring. After the addition, the reaction mixture was stirred at room temperature for 30 minutes, poured into ice water, extracted with ethyl acetate, washed with water, washed with dilute aqueous sodium bicarbonate solution, and finally washed once again with water.
It was dried over anhydrous sodium sulfate, the solvent was distilled off, and the residue was distilled under reduced pressure to obtain 15.1 g of the target product.
【0104】収率 71% 沸点 165℃/6
torr(浴温)
NMR スペクトル( CDCl3)δppm:1.3
9(3H,t,J=7,2Hz),4.42(2H,q
,J=7.2Hz),7.45(2H,d,J=8.6
Hz),7.95(2H,d,J=8.6Hz)
参考例2
4−クロロフェニルグリオキシル酸ノルマルブチル4−
クロロフェニルグリオキシル酸エチル(2.12 g,
10mmol) のノルマルブタノール溶液(20ml
)にパラトルエンスルホン酸1水和物(1.05 g,
5.5mmol)を加えた。反応混合物を130℃で1
4時間加熱した後濃縮し残渣を氷にあけ酢酸エチルで抽
出した。抽出液を水洗した後、硫酸ナトリウムで乾燥し
た。濃縮後得られた残渣を減圧蒸留し、bp. 150
〜165/3mmHgの留分から目的物(2.28 g
,9.5mmol)を得た。Yield: 71% Boiling point: 165°C/6
torr (bath temperature) NMR spectrum (CDCl3) δppm: 1.3
9 (3H, t, J = 7, 2Hz), 4.42 (2H, q
, J=7.2Hz), 7.45(2H, d, J=8.6
Hz), 7.95 (2H, d, J = 8.6 Hz) Reference example 2 n-butyl 4-chlorophenylglyoxylate 4-
Ethyl chlorophenylglyoxylate (2.12 g,
10 mmol) in n-butanol solution (20 ml)
) to paratoluenesulfonic acid monohydrate (1.05 g,
5.5 mmol) was added. The reaction mixture was heated at 130°C for 1
After heating for 4 hours, the mixture was concentrated, and the residue was poured into ice and extracted with ethyl acetate. The extract was washed with water and then dried over sodium sulfate. The residue obtained after concentration was distilled under reduced pressure and bp. 150
The target product (2.28 g
, 9.5 mmol) was obtained.
【0105】収率 95%
NMR スペクトル( CDCl3)δppm:7.9
8(2H,d,J=8.6Hz),7.50(2H,d
,J=8.6Hz),4.39(2H,t,J=6.7
Hz),1.35 〜1.84(4H,m),0.97
(3H,t,J=8.2Hz)油状物( 150〜16
5℃/3mmHg)参考例2と同様の方法で以下の化合
物が製造された。Yield 95% NMR spectrum (CDCl3) δppm: 7.9
8 (2H, d, J = 8.6Hz), 7.50 (2H, d
, J=8.6Hz), 4.39(2H,t,J=6.7
Hz), 1.35 to 1.84 (4H, m), 0.97
(3H, t, J=8.2Hz) Oil (150-16
(5°C/3mmHg) The following compound was produced in the same manner as in Reference Example 2.
【0106】以下に各参考例で製造して得た化合物の各
種データを示す。[0106] Various data of the compounds produced in each reference example are shown below.
【0107】参考例3
NMR スペクトル( CDCl3)δppm:7.9
6(2H,d,J=8.8Hz),7.37(2H,d
,J=8.8Hz),5.32(1H,qq,J=6.
3,8.0Hz),1.38(3H,d,J=6.3H
z),1.37(3H,d,J=8.0Hz)油状物
マススペクトル(m/z) :225,167,139
参考例4
NMR スペクトル( CDCl3)δppm:7.9
7(2H,d,J=8.4Hz),7.50(2H,d
,J=8.4Hz),5.16(1H,tq,J=6.
3,7.0Hz),1.10〜1.89(2H,m),
1.39(3H,d,J=6.3Hz),0.97(3
H,t,J=7.5Hz)油状物(165℃/3tor
r)
参考例5
NMR スペクトル( CDCl3)δppm:7.9
5(2H,d,J=9.0Hz),7.50(2H,d
,J=9.0Hz),1.63(9H,s)m.p.
104℃
マススペクトル(m/z) :241(M+1)+,1
41,113参考例6
NMR スペクトル( CDCl3)δppm:7.9
3(2H,d,J=8.6Hz),7.47(2H,d
,J=8.6Hz),4.98(1H,q,J=6.5
Hz),1.30(3H,d,J=6.5Hz),0.
95(9H,s)
油状物
マススペクトル(m/z) :269(M+1)+,1
68,139参考例7
NMR スペクトル( CDCl3)δppm:7.9
7(2H,d,J=8.8Hz),7.50(2H,d
,J=8.8Hz),5.09(1H,tt,J=3.
8,9.0Hz),1.20〜2.08(10H,m)
油状物
(150〜155℃/2mmHg)
マススペクトル(m/z) :266(M+),187
,141,111参考例8
NMR スペクトル( CDCl3)δppm:7.9
4(2H,d,J=8.8Hz),7.48(2H,d
,J=8.8Hz),4.99(1H,dt,J=4.
5,10.9Hz),2.10 〜2.18(1H,m
),1.80 〜2.02(1H,m),1.65 〜
1.77(2H,m),1.45 〜1.60(2H,
m),1.05 〜1.26(2H,m),0.75
〜1.04(10H,m)油状物
参考例9
NMR スペクトル( CDCl3)δppm:7.9
4(2H,d,J=8.8Hz),7.48(2H,d
,J=8.8Hz),4.99(1H,dt,J=4.
5,10.9Hz),2.10 〜2.18(1H,m
),1.80 〜2.02(1H,m),1.65 〜
1.77(2H,m),1.45 〜1.60(2H,
m),1.05 〜1.26(2H,m),0.75
〜1.04(10H,m)油状物
マススペクトル(m/z) :322(M+),278
,182,139参考例10
NMR スペクトル( CDCl3)δppm:7.9
2(2H,d,J=8.7Hz),7.48(2H,d
,J=8.7Hz),6.94〜7.29(5H,m)
,5.02(1H,dt,J=4.3,10.8Hz)
,2.03〜2.15(1H,m),1.40 〜1.
72(3H,m),0.85 〜1.36(4H,m)
,1.36(3H,s),1.30(3H,s),0.
90(3H,d,J=6.3Hz)
油状物
マススペクトル(m/z) :398(M+),214
,119参考例11
NMR スペクトル( CDCl3)δppm:7.2
3〜7.40(5H,m),7.21(2H,d,J=
8.7Hz),7.12(2H,d,J=8.7Hz)
,5.42(1H,dt,J=5.3,11.0Hz)
,2.76(1H,dt,J=3.7,11.0Hz)
,2.20 〜2.31(1H,m),1.25 〜2
.08(H,m)油状物
参考例12
NMR スペクトル( CDCl3)δppm:7.2
3〜7.40(5H,m),7.21(2H,d,J=
8.7Hz),7.12(2H,d,J=8.7Hz)
,5.42(1H,dt,J=5.3,11.0Hz)
,2.76(1H,dt,J=3.7,11.0Hz)
,2.20 〜2.31(1H,m),1.25 〜2
.08(H,m)油状物
参考例13
NMR スペクトル( CDCl3)δppm:8.0
1(2H,d,J=7.9Hz),7.48(2H,d
,J=7.9Hz),4.90(1H,dt,J=5.
4,10.2Hz),3.59(1H,dt,J=5.
0,10.2Hz),2.02〜2.24(2H,m)
,1.65 〜1.86(2H,m),1.25 〜1
.60(4H,m)油状物
マススペクトル(m/z) :283(M+1)+,1
85,139参考例14
油状物
マススペクトル(m/z) :324(M+),139
参考例15
NMR スペクトル( CDCl3)δppm:7.9
8(2H,d,J=8.7Hz),7.47(2H,d
,J=8.7Hz),5.03(1H,dt,J=5.
5,10.0Hz),4.68(1H,d,J=7.3
Hz),4.64(1H,d,J=7.3Hz),3.
61(1H,dt,J=4.4,10.0Hz),3.
29(3H,s),2.05 〜2.10(2H,m)
,1.65 〜1.82(2H,m),1.20 〜1
.63(4H,m)油状物
参考例16
NMR スペクトル( CDCl3)δppm:7.9
9(2H,d,J=8.9Hz),7.48(2H,d
,J=8.9Hz),4.90(1H,dt,J=4.
8,8.6Hz),3.70(1H,dt,J=4.8
,8.6Hz),1.20〜2.40(8H,m),0
.83(9H,s),0.05(3H,s),−0.0
2(3H,s)
油状物
マススペクトル(m/z) :397(M+1)+,3
39,244,213,169,141
参考例17
4−クロロフェニルグリオキシル酸
水酸化カリウム(13g,0.23mol)の水溶液(
150ml)に4−クロロフェニルグリオキシル酸エチ
ル(26.1 g,0.12mol)を加え室温で30
分間撹拌した。濃塩酸を加えpHを3にした後析出する
結晶を濾過した。結晶をエタノールに溶解し共沸させる
ことで水を除いて目的化合物(22g,0.12mol
)を得た。Reference Example 3 NMR spectrum (CDCl3) δppm: 7.9
6 (2H, d, J = 8.8Hz), 7.37 (2H, d
, J=8.8Hz), 5.32 (1H, qq, J=6.
3,8.0Hz), 1.38 (3H, d, J=6.3H
z), 1.37 (3H, d, J = 8.0Hz) Oil mass spectrum (m/z): 225,167,139
Reference example 4 NMR spectrum (CDCl3) δppm: 7.9
7 (2H, d, J = 8.4Hz), 7.50 (2H, d
, J=8.4Hz), 5.16 (1H, tq, J=6.
3,7.0Hz), 1.10-1.89 (2H, m),
1.39 (3H, d, J = 6.3Hz), 0.97 (3
H, t, J=7.5Hz) Oil (165℃/3tor
r) Reference Example 5 NMR spectrum (CDCl3) δppm: 7.9
5 (2H, d, J = 9.0Hz), 7.50 (2H, d
, J=9.0Hz), 1.63 (9H, s) m. p.
104℃ Mass spectrum (m/z): 241(M+1)+,1
41,113 Reference Example 6 NMR spectrum (CDCl3) δppm: 7.9
3 (2H, d, J = 8.6Hz), 7.47 (2H, d
, J=8.6Hz), 4.98(1H, q, J=6.5
Hz), 1.30 (3H, d, J=6.5Hz), 0.
95(9H,s) Oil mass spectrum (m/z): 269(M+1)+,1
68,139 Reference Example 7 NMR spectrum (CDCl3) δppm: 7.9
7 (2H, d, J = 8.8Hz), 7.50 (2H, d
, J=8.8Hz), 5.09 (1H, tt, J=3.
8,9.0Hz), 1.20-2.08 (10H, m) Oil (150-155°C/2mmHg) Mass spectrum (m/z): 266 (M+), 187
, 141, 111 Reference Example 8 NMR spectrum (CDCl3) δppm: 7.9
4 (2H, d, J = 8.8Hz), 7.48 (2H, d
, J=8.8Hz), 4.99 (1H, dt, J=4.
5, 10.9Hz), 2.10 ~ 2.18 (1H, m
), 1.80 ~ 2.02 (1H, m), 1.65 ~
1.77 (2H, m), 1.45 ~ 1.60 (2H,
m), 1.05 to 1.26 (2H, m), 0.75
~1.04 (10H, m) Oil Reference Example 9 NMR spectrum (CDCl3) δppm: 7.9
4 (2H, d, J = 8.8Hz), 7.48 (2H, d
, J=8.8Hz), 4.99 (1H, dt, J=4.
5, 10.9Hz), 2.10 ~ 2.18 (1H, m
), 1.80 ~ 2.02 (1H, m), 1.65 ~
1.77 (2H, m), 1.45 ~ 1.60 (2H,
m), 1.05 to 1.26 (2H, m), 0.75
~1.04 (10H, m) Oil mass spectrum (m/z): 322 (M+), 278
, 182, 139 Reference Example 10 NMR spectrum (CDCl3) δppm: 7.9
2 (2H, d, J = 8.7Hz), 7.48 (2H, d
, J=8.7Hz), 6.94-7.29 (5H, m)
, 5.02 (1H, dt, J=4.3, 10.8Hz)
, 2.03 to 2.15 (1H, m), 1.40 to 1.
72 (3H, m), 0.85 ~ 1.36 (4H, m)
, 1.36 (3H, s), 1.30 (3H, s), 0.
90 (3H, d, J = 6.3Hz) Oil mass spectrum (m/z): 398 (M+), 214
, 119 Reference Example 11 NMR spectrum (CDCl3) δppm: 7.2
3-7.40 (5H, m), 7.21 (2H, d, J=
8.7Hz), 7.12 (2H, d, J=8.7Hz)
, 5.42 (1H, dt, J=5.3, 11.0Hz)
, 2.76 (1H, dt, J=3.7, 11.0Hz)
, 2.20 ~ 2.31 (1H, m), 1.25 ~ 2
.. 08(H,m) Oil Reference Example 12 NMR spectrum (CDCl3) δppm: 7.2
3-7.40 (5H, m), 7.21 (2H, d, J=
8.7Hz), 7.12 (2H, d, J=8.7Hz)
, 5.42 (1H, dt, J=5.3, 11.0Hz)
, 2.76 (1H, dt, J=3.7, 11.0Hz)
, 2.20 ~ 2.31 (1H, m), 1.25 ~ 2
.. 08(H,m) Oil Reference Example 13 NMR spectrum (CDCl3) δppm: 8.0
1 (2H, d, J = 7.9Hz), 7.48 (2H, d
, J=7.9Hz), 4.90 (1H, dt, J=5.
4, 10.2Hz), 3.59 (1H, dt, J=5.
0.10.2Hz), 2.02-2.24 (2H, m)
, 1.65 ~ 1.86 (2H, m), 1.25 ~ 1
.. 60 (4H, m) oil mass spectrum (m/z): 283 (M+1)+,1
85,139 Reference example 14 Oil mass spectrum (m/z): 324 (M+), 139
Reference example 15 NMR spectrum (CDCl3) δppm: 7.9
8 (2H, d, J = 8.7Hz), 7.47 (2H, d
, J=8.7Hz), 5.03 (1H, dt, J=5.
5, 10.0Hz), 4.68 (1H, d, J = 7.3
Hz), 4.64 (1H, d, J=7.3Hz), 3.
61 (1H, dt, J=4.4, 10.0Hz), 3.
29 (3H, s), 2.05 ~ 2.10 (2H, m)
, 1.65 ~ 1.82 (2H, m), 1.20 ~ 1
.. 63 (4H, m) Oil Reference Example 16 NMR spectrum (CDCl3) δppm: 7.9
9 (2H, d, J = 8.9Hz), 7.48 (2H, d
, J=8.9Hz), 4.90 (1H, dt, J=4.
8, 8.6Hz), 3.70 (1H, dt, J=4.8
, 8.6Hz), 1.20-2.40 (8H, m), 0
.. 83 (9H, s), 0.05 (3H, s), -0.0
2(3H,s) Oil mass spectrum (m/z): 397(M+1)+,3
39,244,213,169,141 Reference Example 17 Aqueous solution of potassium 4-chlorophenylglyoxylic acid hydroxide (13 g, 0.23 mol) (
Add ethyl 4-chlorophenylglyoxylate (26.1 g, 0.12 mol) to 150 ml) and stir at room temperature for 30 minutes.
Stir for a minute. After adjusting the pH to 3 by adding concentrated hydrochloric acid, the precipitated crystals were filtered. The crystals were dissolved in ethanol and subjected to azeotropy to remove water and obtain the target compound (22 g, 0.12 mol).
) was obtained.
【0108】収率 100% 融点 >300℃
NMR スペクトル( DMSO−d6)δppm:7
.57(2H,d,J=8.5Hz),7.87(2H
,d,J=8.5Hz)IRスペクトル (cm−1)
:1662,1600,1589参考例18
4−クロロフェニルグリオキシル酸ジフェニルメチル4
−クロロフェニルグリオキシル酸(1.12 g,6.
1mmol)の塩化メチレン溶液(25ml)にオキザ
リルクロライド(3.8g,30mmol) を加え室
温で30分間撹拌した。濃縮乾固させた後アセトニトリ
ル(12ml)を加え懸濁液とする。この懸濁液をベン
ズヒドロール(540mg,2.9mmol) のアセ
トニトリル溶液(10ml)に加え、室温で1時間撹拌
した後トリエチルアミンを加えて中和した。反応液を氷
にあけ酢酸エチルで抽出し水洗した後硫酸マグネシウム
で乾燥した。濃縮後得られた残渣をシリカゲルカラムク
ロマトグラフィーに付しヘキサン−酢酸エチル9対1で
溶出させ目的化合物(620mg,1.77mmol)
を得た。Yield: 100% Melting point: >300°C
NMR spectrum (DMSO-d6) δppm: 7
.. 57 (2H, d, J = 8.5Hz), 7.87 (2H
, d, J=8.5Hz) IR spectrum (cm-1)
:1662,1600,1589 Reference Example 18 Diphenylmethyl 4-chlorophenylglyoxylate 4
-chlorophenylglyoxylic acid (1.12 g, 6.
Oxalyl chloride (3.8 g, 30 mmol) was added to a methylene chloride solution (25 ml) of oxalyl chloride (1 mmol), and the mixture was stirred at room temperature for 30 minutes. After concentrating to dryness, acetonitrile (12 ml) was added to form a suspension. This suspension was added to a solution of benzhydrol (540 mg, 2.9 mmol) in acetonitrile (10 ml), stirred at room temperature for 1 hour, and then neutralized by adding triethylamine. The reaction solution was poured into ice, extracted with ethyl acetate, washed with water, and then dried over magnesium sulfate. The residue obtained after concentration was subjected to silica gel column chromatography and eluted with hexane-ethyl acetate 9:1 to obtain the target compound (620 mg, 1.77 mmol).
I got it.
Claims (3)
、水素原子、ハロゲン原子、低級アルキル基、低級アル
コキシ基、低級ハロゲノアルキル基又は低級ハロゲノア
ルコキシ基を示し、Rは低級アルキル基、アラルキル基
、二環式テルペン炭化水素残基又は環上の任意の位置が
低級アルキル基、ハロゲン、低級アルキル、低級アルコ
キシで置換されていてもよいフェニル基、低級アルコキ
シ基、アラルキル基、水酸基若しくは保護基で保護され
た水酸基で置換されたシクロアルキル基を示す。]で表
される化合物と一般式(VI) 【化2】R1 −CH=CH−R2
(VI)[式中、R1 及びR2 は同一又は異なって
、低級アルキル基を示す。]で表される化合物とを光照
射下反応を行い、一般式(IV) 【化3】 [式中、X1 、X2 、X3 、R1 、R2 及び
Rは前記と同意義を示す。]で表される化合物を立体選
択的に製造する方法。Claim 1: General formula (V) [In the formula, X1, X2 and An alkoxy group, R is a lower alkyl group, an aralkyl group, a bicyclic terpene hydrocarbon residue, or a phenyl group which may be substituted at any position on the ring with a lower alkyl group, halogen, lower alkyl, or lower alkoxy. , a lower alkoxy group, an aralkyl group, a hydroxyl group, or a cycloalkyl group substituted with a hydroxyl group protected with a protective group. ] and general formula (VI) [Chemical formula 2] R1 -CH=CH-R2
(VI) [wherein R1 and R2 are the same or different and represent a lower alkyl group. A reaction is carried out under light irradiation with a compound represented by the general formula (IV) [In the formula, X1, X2, X3, R1, R2 and R have the same meanings as above. ] A method for stereoselectively producing a compound represented by
、水素原子、ハロゲン原子、低級アルキル基、低級アル
コキシ基、ハロゲノ低級アルキル基又はハロゲノ低級ア
ルコキシ基を示し、R1 及びR2 は同一又は異なっ
て、低級アルキル基を示し、Yは求核性脱離基を示す。 ]で表わされる化合物と、トリアゾール又はイミダゾー
ルとを反応し、一般式(I) 【化5】 [式中、X1 、X2 、X3 、R1 及びR2 は
前記と同意義を示し、AはN又はCHを示す。]で表わ
される化合物を立体選択的に製造する方法。[Claim 2] General formula (II) [In the formula, X1, X2 and It represents an alkoxy group, R1 and R2 are the same or different and represent a lower alkyl group, and Y represents a nucleophilic leaving group. ] and triazole or imidazole to form a compound represented by the general formula (I) [wherein, X1, X2, X3, R1 and R2 have the same meanings as above, and A is N or CH shows. ] A method for stereoselectively producing a compound represented by
、X1 がベンゼン環の4位の塩素原子又は弗素原子で
ありX2 及びX3 が水素原子である請求項1乃至2
の方法。[Claim 3] Claims 1 to 2, wherein R1 and R2 are both methyl groups, X1 is a chlorine atom or a fluorine atom at the 4-position of a benzene ring, and X2 and X3 are hydrogen atoms.
the method of.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13790591A JPH04360883A (en) | 1991-06-10 | 1991-06-10 | Production of oxetane derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13790591A JPH04360883A (en) | 1991-06-10 | 1991-06-10 | Production of oxetane derivative |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04360883A true JPH04360883A (en) | 1992-12-14 |
Family
ID=15209423
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13790591A Pending JPH04360883A (en) | 1991-06-10 | 1991-06-10 | Production of oxetane derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04360883A (en) |
-
1991
- 1991-06-10 JP JP13790591A patent/JPH04360883A/en active Pending
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