JPH0435840Y2 - - Google Patents

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Publication number
JPH0435840Y2
JPH0435840Y2 JP1983163103U JP16310383U JPH0435840Y2 JP H0435840 Y2 JPH0435840 Y2 JP H0435840Y2 JP 1983163103 U JP1983163103 U JP 1983163103U JP 16310383 U JP16310383 U JP 16310383U JP H0435840 Y2 JPH0435840 Y2 JP H0435840Y2
Authority
JP
Japan
Prior art keywords
chamber
processing liquid
filter
main body
waste liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1983163103U
Other languages
Japanese (ja)
Other versions
JPS6070100U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16310383U priority Critical patent/JPS6070100U/en
Publication of JPS6070100U publication Critical patent/JPS6070100U/en
Application granted granted Critical
Publication of JPH0435840Y2 publication Critical patent/JPH0435840Y2/ja
Granted legal-status Critical Current

Links

Description

【考案の詳細な説明】 〔考案の技術分野〕 本考案は主として放射性物質を含む廃液を処理
する廃液処理装置に関し、より詳しくは該装置使
用の後に、該装置内の水抜きを行うときその水抜
きにより流出する液体中に廃液が含まれないよう
に構成した装置に関する。
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to a waste liquid treatment device that mainly treats waste liquid containing radioactive substances, and more specifically, when draining water from the device after using the device, the water is removed. The present invention relates to a device configured so that waste liquid is not contained in the liquid that flows out due to draining.

〔考案の技術的背景及びその問題点〕[Technical background of the invention and its problems]

例えば、原子力発電所における洗浄液の如く、
その廃液中に放射性物質を含む場合がある。従
来、このような廃液を処理する装置は、第1図の
如く構成されていた。即ち、装置本体1を密閉タ
ンク構造とし、該タンク内にその上部と下部とを
区切る隔壁5を設け、上部室2と下部室14とに
分離する。そして、該下部室14内に筒状のフイ
ルタ7を設け、そのフイルタ7の内側と上部室2
とを誘導路8により連通する。そして、下部室1
4内に廃液導入管11により外部から廃液を導入
する。すると、この廃液はフイルタの外周から内
側に浸入し、その間に濾過されて処理液となつ
て、上部室2に達し、そこから処理液排出管12
により排出される。そして、下部室14の下方に
は順次放射性物質を含む沈澱物が堆積する。而し
て、フイルタ7の処理能力に達するまで使用され
た装置は、そこで、廃液処理が停止される。そし
て、廃液導入管11より圧縮空気を供給し、装置
内にたまつた液体を水抜管13より抜き取つた後
に、フイルタ7を含んだまま装置本体1ごと放射
性廃棄物として保管される。ところが、装置の使
用の後に水抜きを第2図の矢印の如く行うと、そ
の抜き取られた液体は未処理液であり、放射性物
質を含む。そのため、該未処理液自体を別途処理
する必要があり、面倒であつた。
For example, cleaning fluid at nuclear power plants,
The waste liquid may contain radioactive substances. Conventionally, an apparatus for treating such waste liquid has been constructed as shown in FIG. That is, the main body 1 of the apparatus has a closed tank structure, and a partition wall 5 is provided inside the tank to separate an upper part and a lower part, thereby separating the tank into an upper chamber 2 and a lower chamber 14. A cylindrical filter 7 is provided in the lower chamber 14, and the inside of the filter 7 and the upper chamber 2 are
and are communicated by a guideway 8. And lower chamber 1
A waste liquid is introduced from the outside into the inside of the tank 4 through a waste liquid introduction pipe 11. Then, this waste liquid enters the inside of the filter from the outer periphery, is filtered during that time, becomes a processing liquid, reaches the upper chamber 2, and from there is passed through the processing liquid discharge pipe 12.
is discharged by Then, precipitates containing radioactive substances are sequentially deposited below the lower chamber 14. Thus, if the device is used until the processing capacity of the filter 7 is reached, then the waste liquid treatment is stopped. Then, compressed air is supplied through the waste liquid introduction pipe 11, and after the liquid accumulated in the apparatus is extracted from the drain pipe 13, the apparatus main body 1, including the filter 7, is stored as radioactive waste. However, when the water is drained as shown by the arrow in FIG. 2 after using the device, the drained liquid is untreated and contains radioactive materials. Therefore, it was necessary to separately process the untreated liquid itself, which was troublesome.

なお、従来技術として特公昭55−48280号公報
記載の高線両物質の処理装置は、処理装置の下部
に仕切りを設け、内部を上部室と下部室とに区切
ると共に、上部室に複数のフイルタを設け、その
下端を下部室に連通する。そして、フイルタによ
つて濾過された処理水を下部室に全て導き、その
下部室から処理液を外部に排出するように構成し
たものである。
In addition, as a prior art, a processing device for high wire materials described in Japanese Patent Publication No. 55-48280 has a partition at the bottom of the processing device to divide the interior into an upper chamber and a lower chamber, and a plurality of filters in the upper chamber. is provided, and its lower end communicates with the lower chamber. All of the treated water filtered by the filter is guided to the lower chamber, and the treated liquid is discharged to the outside from the lower chamber.

ところがこのように処理装置を上部室と管とに
分け、全ての処理液を下部室に導く場合には、次
の問題点を生じる。即ち、上部室内に次第に放射
物質を含む沈殿物が堆積すると、この堆積した部
分からもフイルタに多くの廃液が浸入し、フイル
タの下方程目詰まりが大きくなり全体として処理
能力が大きく低下する欠点がある。
However, when the processing apparatus is divided into an upper chamber and a pipe, and all the processing liquid is led to the lower chamber, the following problem arises. In other words, if precipitates containing radioactive materials gradually accumulate in the upper chamber, a large amount of waste liquid will enter the filter from the accumulated part, and the lower the filter, the more clogged it will become, and the overall processing capacity will be greatly reduced. be.

又、このような従来型処理装置は、下部室に近
いフイルタの下部程より多く廃液が流通する傾向
にあるため、仕切り上に堆積する放射性物質を攪
拌し、それらが下方に静かに堆積することを妨げ
る虞があり、より早くフイルタの寿命を招来させ
る欠点がある。
In addition, in such conventional processing equipment, since waste liquid tends to flow more toward the bottom of the filter near the lower chamber, radioactive materials that accumulate on the partitions are agitated and they are not deposited quietly below. This has the disadvantage of causing the filter to end its life more quickly.

〔問題点を解決するための手段〕[Means for solving problems]

そこで本考案は、装置の下部に放射性物質を含
む沈殿物が堆積してもフイルタに目詰まりが生じ
難く、単位時間当たりの処理能力が永続的に大き
な廃液処理装置を提供することを目的とし、その
目的達成のために次の構成をとる。
Therefore, the purpose of the present invention is to provide a waste liquid treatment device in which the filter is unlikely to be clogged even if precipitates containing radioactive substances accumulate at the bottom of the device, and the processing capacity per unit time is permanently large. In order to achieve this purpose, we will adopt the following structure.

本考案の廃液処理装置は、液密タンクを形成す
る装置本体1と、該本体1内に上下に夫々離間し
て設けられ、該本体を上部室2と中間部室3と下
部室4とに水密に区切る上部隔壁5及び下部隔壁
6と、前記中間部室3に内装され、上端の内面側
が第1処理液誘導路8を介して前記上部室2に連
通すると共に、下端が前記下部室4に第2処理液
誘導路9を介して連通された一つのみのフイルタ
7と、下端が前記下部隔壁6から離間した上方に
位置して前記中間部室2に内装され、上端の内面
側が第1処理液誘導路8を介して前記上部室2に
連通する複数のフイルタ7aと、前記下部室4に
下端が開口し且つ上端が前記上部室2に連通する
処理液連通管10と、前記下部室4と外部とを連
通する水抜管13と、前記中間部室3と前記本体
1の外部とを連通する廃液誘導管11と、前記上
部室2と外部とを連通する処理液排出管12と、
を具備し、前記一つのみのフイルタの前記第2処
理液誘導路9の流体抵抗が前記第1処理液誘導路
8の流体抵抗より大きく形成され、それによりそ
のフイルタにより処理液の大部分が前記第一処理
液誘導路8を通過するように構成されたことを特
徴とする。
The waste liquid treatment device of the present invention includes a device main body 1 forming a liquid-tight tank, and a device body 1 that is provided vertically spaced apart from each other in the main body 1, and that the main body is separated into an upper chamber 2, an intermediate chamber 3, and a lower chamber 4 in a watertight manner. An upper partition wall 5 and a lower partition wall 6 are installed inside the intermediate chamber 3, and the inner surface side of the upper end communicates with the upper chamber 2 via the first processing liquid guide path 8, and the lower end is connected to the lower chamber 4. Only one filter 7 communicates with the second processing liquid guiding path 9, and the lower end thereof is located above the lower partition wall 6 and is installed in the intermediate chamber 2, and the inner surface side of the upper end is connected to the first processing liquid. A plurality of filters 7a communicate with the upper chamber 2 via a guide path 8, a processing liquid communication pipe 10 whose lower end opens into the lower chamber 4 and whose upper end communicates with the upper chamber 2, and the lower chamber 4. A drain pipe 13 communicating with the outside, a waste liquid guide pipe 11 communicating between the intermediate chamber 3 and the outside of the main body 1, and a processing liquid discharge pipe 12 communicating between the upper chamber 2 and the outside,
The fluid resistance of the second processing liquid guide path 9 of the only filter is formed to be larger than the fluid resistance of the first processing liquid guide path 8, so that most of the processing liquid is transferred by the filter. It is characterized in that it is configured to pass through the first treatment liquid guiding path 8.

〔考案の実施例〕[Example of idea]

次に、図面に基づいて本考案の一実施例につき
説明する。
Next, one embodiment of the present invention will be described based on the drawings.

第3図は本装置の原理図を示す縦断面説明図で
あつて、廃液処理中の状態示す。又、第4図は本
装置使用の後に水抜きを行う状態を示す。第3図
から明らかなように、本装置では上下に離間した
上部隔壁5と下部隔壁6とにより装置本体1内を
3つの部屋に分ける。即ち、上部室2と中間部室
3と下部室4とに区画し、外部と上部室2は処理
液排出管12を設け、中間部室には廃液導入管1
1を設け下部室には水抜管13を設ける。そし
て、上部室2と下部室4との間を処理液連通管1
0で連通する。さらに、中間部室の中心には筒状
の中心フイルタ7を設けると共に、その周縁に筒
状の周縁フイルタ7aを設ける。そして、夫々の
フイルタ7,7aの内側と上部室2とを第1処理
液誘導路8で連通する。それと共に、中心フイル
タ7の下端内側と下部室4とを第2処理液誘導路
9で連通する。なお、この第2処理液連通路9の
流路抵抗は前記第1処理液誘導路8の誘導路抵抗
に比し、より大きく形成されている。それ故、処
理液の大部分は第1処理液誘導路8を通過する。
FIG. 3 is an explanatory longitudinal cross-sectional view showing the principle of the present apparatus, and shows the state during waste liquid treatment. Moreover, FIG. 4 shows a state in which water is drained after using the apparatus. As is clear from FIG. 3, in this apparatus, the interior of the apparatus main body 1 is divided into three rooms by an upper partition wall 5 and a lower partition wall 6 which are vertically spaced apart. That is, it is divided into an upper chamber 2, an intermediate chamber 3, and a lower chamber 4, and the outside and upper chamber 2 are provided with a processing liquid discharge pipe 12, and the intermediate chamber is provided with a waste liquid introduction pipe 1.
1 and a drain pipe 13 is provided in the lower chamber. A processing liquid communication pipe 1 is connected between the upper chamber 2 and the lower chamber 4.
Connect with 0. Further, a cylindrical center filter 7 is provided at the center of the intermediate chamber, and a cylindrical peripheral edge filter 7a is provided at the periphery thereof. The insides of the respective filters 7 and 7a are communicated with the upper chamber 2 through a first processing liquid guiding path 8. At the same time, the inner side of the lower end of the central filter 7 and the lower chamber 4 are communicated through a second processing liquid guiding path 9. Note that the flow path resistance of the second processing liquid communication path 9 is formed to be larger than the guide path resistance of the first processing liquid guide path 8. Therefore, most of the processing liquid passes through the first processing liquid guiding path 8.

次に、この第3図の原理を具体化した実施例が
第5図〜第7図である。即ち、第5図はこの実施
例の縦断面図、第6図は水抜管13の下端部分を
示す縦断面図、第7図は同実施例の平面図であ
る。この実施例では第7図の如く中心部フイルタ
7の回りに六個の周縁フイルタ7aが配設されて
いる。そして、装置本体1は二重容器に形成さ
れ、その中に放射線遮蔽材として鉛18が充填さ
れると共に、同じく鉛入りの上蓋19が着脱自在
に被嵌される。そして、この装置本体1は各種の
支持体25によりドラム罐17の中央に保持され
るものである。
Next, FIGS. 5 to 7 show embodiments embodying the principle shown in FIG. 3. That is, FIG. 5 is a longitudinal sectional view of this embodiment, FIG. 6 is a longitudinal sectional view showing the lower end portion of the drain pipe 13, and FIG. 7 is a plan view of the same embodiment. In this embodiment, six peripheral filters 7a are arranged around a central filter 7 as shown in FIG. The device main body 1 is formed into a double container, into which lead 18 is filled as a radiation shielding material, and an upper lid 19 also containing lead is removably fitted. The apparatus main body 1 is held at the center of the drum can 17 by various supports 25.

〔考案の作用〕[Effect of invention]

次に、第3図及び第4図の原理図に基づいて本
考案の作用につき説明する。
Next, the operation of the present invention will be explained based on the principle diagrams shown in FIGS. 3 and 4.

まず、廃液を処理するには水抜管13の上端の
栓16等により、該水抜管13を閉塞する。そし
て、廃液導入管11より矢印の如く放射性物質を
含む廃液を中間部室3内に導入する。すると、そ
の廃液は中心フイルタ7及び周縁フイルタ7aの
外周から該フイルタ内に浸入し濾過されて、処理
液となり、第1処理液誘導路8を介し、直接上部
室2に達する。そして、該上部室2から処理液排
出管12を通り外部へ排出される。又、中心フイ
ルタ7の下端からは処理液が第2処理液誘導路9
を通り、下部室4に達する。なお、この第2処理
液誘導路9は比較的流路抵抗が大であるから、こ
こからの流量は比較的わずかである。そして、下
部室4に達した処理液は処理液連通管10を通り
上部室2に達し、処理液排出管12より外部へ排
出される。
First, in order to treat the waste liquid, the drain pipe 13 is closed off using the stopper 16 or the like at the upper end of the drain pipe 13. Then, a waste liquid containing a radioactive substance is introduced into the intermediate chamber 3 from the waste liquid introduction pipe 11 as shown by the arrow. Then, the waste liquid enters the center filter 7 and the peripheral filter 7a from their outer peripheries, is filtered, becomes a processing liquid, and directly reaches the upper chamber 2 via the first processing liquid guide path 8. Then, the processing liquid is discharged from the upper chamber 2 to the outside through the processing liquid discharge pipe 12. Further, the processing liquid flows from the lower end of the central filter 7 to the second processing liquid guide path 9.
It passes through and reaches the lower chamber 4. Note that this second processing liquid guide path 9 has a relatively large flow path resistance, so the flow rate from this path is relatively small. The processing liquid that has reached the lower chamber 4 passes through the processing liquid communication pipe 10 and reaches the upper chamber 2, and is discharged to the outside through the processing liquid discharge pipe 12.

次に、本装置使用の後には、処理液排出管12
の開口に栓16が被嵌される。なお、実際には、
第5図の如く処理液を排出するため、上端にカプ
ラー24が設けられている。そして、該排出管1
2と図示しないホースとの接続を断ち切るのみで
該排出管12が自動的に閉塞される。次に、廃液
導入管11より圧縮空気を供給する。すると、該
圧縮空気により中間部室3内の未処理水は中心フ
イルタ7を通過し、濾過されて下部室4に達す
る。そして、その処理液は水抜管13から順次排
出される、又、上部室2の処理水は処理液連通管
10を通り、下部室4に流下する。而して、水抜
管13から流出する液体は、すべて、処理水とな
つて、排出される。
Next, after using this device, the processing liquid discharge pipe 12
A plug 16 is fitted into the opening. In addition, in reality,
As shown in FIG. 5, a coupler 24 is provided at the upper end for discharging the processing liquid. And the discharge pipe 1
2 and a hose (not shown), the discharge pipe 12 is automatically closed. Next, compressed air is supplied from the waste liquid introduction pipe 11. Then, the compressed air causes the untreated water in the middle chamber 3 to pass through the central filter 7 and reach the lower chamber 4 after being filtered. Then, the treated liquid is sequentially discharged from the drain pipe 13, and the treated water in the upper chamber 2 passes through the treated liquid communication pipe 10 and flows down to the lower chamber 4. Thus, all the liquid flowing out from the drain pipe 13 becomes treated water and is discharged.

〔考案の効果〕 本考案の廃液処理装置は、下部隔壁6から離間
した上方に位置して中間部室3内に複数のフイル
タ7が配置されているため、下部隔壁6上に放射
性物質を含む沈澱物が次第に堆積しても、それよ
り上方から廃液をフイルタ7内に導くため目詰ま
りが生じ難い。又、一つのみのフイルタ7におい
ては第2処理液誘導路9の流体抵抗が第1処理液
誘導路8よりも大きく形成されているため、第1
処理液誘導路8に近い上部程より多く廃液処理が
行われ、一つのみのフイルタ7においても目詰ま
りが生じ難い。それ故、永続的に単位時間当たり
の処理能力を大きくすることができる。そして比
較的少ない量のみの処理液が下部室に導かれる。
そのため、中間部室3内の下方の沈澱した塵埃が
下部室に浸入することを極力抑えることができ
る。それにより、処理水中の未処理物質を極めて
少なくできる効果がある。そして、廃液内の比較
的比重の大きな塵埃を比較的広い中間部室の下方
に静かに沈澱させ得るから、濾過効果の高い装置
を提供し得る。
[Effects of the invention] The waste liquid treatment device of the present invention has a plurality of filters 7 located above the lower partition wall 6 and arranged in the intermediate chamber 3, so that the precipitate containing radioactive substances is not deposited on the lower partition wall 6. Even if substances gradually accumulate, clogging is unlikely to occur because the waste liquid is introduced into the filter 7 from above. In addition, in the case of only one filter 7, since the fluid resistance of the second processing liquid guide path 9 is formed to be larger than that of the first processing liquid guide path 8,
Waste liquid treatment is performed more in the upper part near the treatment liquid guiding path 8, and clogging is less likely to occur even in only one filter 7. Therefore, the processing capacity per unit time can be permanently increased. Only a relatively small amount of processing liquid is then led to the lower chamber.
Therefore, it is possible to suppress as much as possible the dust settled in the lower part of the intermediate chamber 3 from entering the lower chamber. This has the effect of significantly reducing the amount of untreated substances in treated water. Further, since the dust with relatively high specific gravity in the waste liquid can be quietly settled below the relatively wide intermediate chamber, it is possible to provide an apparatus with high filtration effect.

しかも本処理装置を使用済の後には、水抜管1
3より排出される液体は処理済のものであるた
め、適宜な場所に排出することができる効果を有
する。
Moreover, after using this treatment equipment, the water drain pipe 1
Since the liquid discharged from 3 has already been treated, it has the effect of being able to be discharged to an appropriate location.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来型廃液処理装置の縦断面図であつ
て、廃液処理状態を示し、第2図はその水抜き時
の状態を示す、第3図は本考案の廃液処理装置の
原理図を示す縦断面説明図であつて、廃液処理状
態を示し、第4図は同装置の水抜き時の状態を示
す。第5図は本考案の実施例を示す縦断面図、第
6図は同装置の水抜管13の下部を示す縦断面
図、第7図は同実施例の平面図。 1……装置本体、2……上部室、3……中間部
室、4,14……下部室、5……上部隔壁、6…
…下部隔壁、7……フイルタ、8……第1処理液
誘導路、9……第2処理液誘導路、10……処理
液連通管、11……廃液導入管、12……処理液
排出管、13……水抜管、15……液面、16…
…栓、17……ドラム罐、18……鉛、19……
上蓋、20……係止具、22,23,24……カ
プラー、25……支持体。
Fig. 1 is a longitudinal sectional view of a conventional waste liquid treatment device, showing the waste liquid treatment state, Fig. 2 shows the state when water is drained, and Fig. 3 is a diagram showing the principle of the waste liquid treatment device of the present invention. FIG. 4 is a vertical cross-sectional explanatory view showing a state of waste liquid treatment, and FIG. 4 shows a state of the same apparatus when water is drained. FIG. 5 is a longitudinal sectional view showing an embodiment of the present invention, FIG. 6 is a longitudinal sectional view showing the lower part of the drain pipe 13 of the same device, and FIG. 7 is a plan view of the embodiment. DESCRIPTION OF SYMBOLS 1...Device main body, 2...Upper chamber, 3...Middle chamber, 4, 14...Lower chamber, 5...Upper partition, 6...
...Lower partition wall, 7...Filter, 8...First processing liquid guide path, 9...Second processing liquid guide path, 10...Processing liquid communication pipe, 11...Waste liquid introduction pipe, 12...Processing liquid discharge Pipe, 13... Water drain pipe, 15... Liquid level, 16...
...Bung, 17...Drum can, 18...Lead, 19...
Upper lid, 20...locking tool, 22, 23, 24...coupler, 25...support body.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 液密タンクを形成する装置本体1と、該本体1
内に上下に夫々離間して設けられ、該本体を上部
室2と中間部室3と下部室4とに水密に区切る上
部隔壁5及び下部隔壁6と、前記中間部室3に内
装され、上端の内面側が第1処理液誘導路8を介
して前記上部室2に連通すると共に、下端が前記
下部室4に第2処理液誘導路9を介して連通され
た一つのみのフイルタ7と、下端が前記下部隔壁
6から離間した上方に位置して前記中間部室2に
内装され、上端の内面側が第1処理液誘導路8を
介して前記上部室2に連通する複数のフイルタ7
aと、前記下部室4に下端が開口し且つ上端が前
記上部室2に連通する処理液連通管10と、前記
下部室4と外部とを連通する水抜管13と、前記
中間部室3と前記本体1の外部とを連通する廃液
導入管11と、前記上部室2と外部とを連通する
処理液排出管12と、を具備し、前記一つのみの
フイルタの前記第2処理液誘導路9の流体抵抗が
前記第1処理液誘導路8の流体抵抗より大きく形
成され、それによりそのフイルタによる処理液の
大部分が前記第1処理液誘導路8を通過するよう
に構成されたことを特徴とする廃液処理装置。
A device main body 1 forming a liquid-tight tank, and the main body 1
An upper partition wall 5 and a lower partition wall 6 are provided vertically apart from each other in the interior and watertightly partition the main body into an upper chamber 2, an intermediate chamber 3, and a lower chamber 4; Only one filter 7 whose lower end communicates with the upper chamber 2 via a first processing liquid guide path 8 and whose lower end communicates with the lower chamber 4 via a second processing liquid guide path 9; A plurality of filters 7 are located above the lower partition wall 6 and are installed in the intermediate chamber 2, and the inner surface side of the upper end communicates with the upper chamber 2 via the first processing liquid guiding path 8.
a, a processing liquid communication pipe 10 whose lower end opens to the lower chamber 4 and whose upper end communicates with the upper chamber 2; a drain pipe 13 which communicates the lower chamber 4 with the outside; and the intermediate chamber 3 and the The second processing liquid guide path 9 of the only filter includes a waste liquid introduction pipe 11 communicating with the outside of the main body 1 and a processing liquid discharge pipe 12 communicating the upper chamber 2 with the outside. The fluid resistance of the filter is larger than the fluid resistance of the first processing liquid guiding path 8, so that most of the processing liquid from the filter passes through the first processing liquid guiding path 8. waste liquid treatment equipment.
JP16310383U 1983-10-20 1983-10-20 Waste liquid treatment equipment Granted JPS6070100U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16310383U JPS6070100U (en) 1983-10-20 1983-10-20 Waste liquid treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16310383U JPS6070100U (en) 1983-10-20 1983-10-20 Waste liquid treatment equipment

Publications (2)

Publication Number Publication Date
JPS6070100U JPS6070100U (en) 1985-05-17
JPH0435840Y2 true JPH0435840Y2 (en) 1992-08-25

Family

ID=30357975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16310383U Granted JPS6070100U (en) 1983-10-20 1983-10-20 Waste liquid treatment equipment

Country Status (1)

Country Link
JP (1) JPS6070100U (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5885958B2 (en) * 2011-08-03 2016-03-16 三菱重工業株式会社 Radiation contaminant removal unit and decontamination method
JP2013061251A (en) * 2011-09-13 2013-04-04 Mitsubishi Heavy Ind Ltd Contaminated water treatment container, contaminated water treatment system and contaminated water treatment method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5573306A (en) * 1978-11-28 1980-06-03 Babcock Hitachi Kk Waste liquid filterring apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55177818U (en) * 1979-06-11 1980-12-20

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5573306A (en) * 1978-11-28 1980-06-03 Babcock Hitachi Kk Waste liquid filterring apparatus

Also Published As

Publication number Publication date
JPS6070100U (en) 1985-05-17

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