JPH04356438A - Method for producing acetophenone compounds and intermediate therefor and method for producing the same - Google Patents
Method for producing acetophenone compounds and intermediate therefor and method for producing the sameInfo
- Publication number
- JPH04356438A JPH04356438A JP3157746A JP15774691A JPH04356438A JP H04356438 A JPH04356438 A JP H04356438A JP 3157746 A JP3157746 A JP 3157746A JP 15774691 A JP15774691 A JP 15774691A JP H04356438 A JPH04356438 A JP H04356438A
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- reaction
- compound
- iii
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 150000008062 acetophenones Chemical class 0.000 title claims description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 33
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 12
- 239000002253 acid Substances 0.000 claims abstract description 10
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 10
- 239000011707 mineral Substances 0.000 claims abstract description 10
- 239000003054 catalyst Substances 0.000 claims abstract description 9
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims abstract description 6
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims abstract description 6
- 230000002140 halogenating effect Effects 0.000 claims abstract description 5
- 229910052736 halogen Inorganic materials 0.000 claims abstract 2
- 150000002367 halogens Chemical class 0.000 claims abstract 2
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 125000005278 alkyl sulfonyloxy group Chemical group 0.000 claims 1
- 125000005279 aryl sulfonyloxy group Chemical group 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 86
- -1 acetophenone compound Chemical class 0.000 abstract description 12
- 239000002994 raw material Substances 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 239000003905 agrochemical Substances 0.000 abstract description 2
- 229940079593 drug Drugs 0.000 abstract description 2
- 239000003814 drug Substances 0.000 abstract description 2
- 125000006239 protecting group Chemical group 0.000 abstract description 2
- RKCGJVGMRPKPNY-UHFFFAOYSA-N 2-chloro-4-fluoro-1-methoxybenzene Chemical compound COC1=CC=C(F)C=C1Cl RKCGJVGMRPKPNY-UHFFFAOYSA-N 0.000 abstract 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 abstract 2
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 239000012442 inert solvent Substances 0.000 description 16
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 14
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 14
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- 239000002585 base Substances 0.000 description 10
- LVEYOSJUKRVCCF-UHFFFAOYSA-N 1,3-bis(diphenylphosphino)propane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCCP(C=1C=CC=CC=1)C1=CC=CC=C1 LVEYOSJUKRVCCF-UHFFFAOYSA-N 0.000 description 8
- 235000010755 mineral Nutrition 0.000 description 8
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 8
- 230000000704 physical effect Effects 0.000 description 7
- 229910000029 sodium carbonate Inorganic materials 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000012299 nitrogen atmosphere Substances 0.000 description 6
- 238000010898 silica gel chromatography Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 150000002941 palladium compounds Chemical class 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 4
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 4
- 229910000027 potassium carbonate Inorganic materials 0.000 description 4
- 235000011181 potassium carbonates Nutrition 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- KHRHCBZTZQFNDK-UHFFFAOYSA-N 1-bromo-4-chloro-2-fluoro-5-methoxybenzene Chemical compound COC1=CC(Br)=C(F)C=C1Cl KHRHCBZTZQFNDK-UHFFFAOYSA-N 0.000 description 3
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002168 alkylating agent Substances 0.000 description 3
- 229940100198 alkylating agent Drugs 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000005457 ice water Substances 0.000 description 3
- 150000007529 inorganic bases Chemical class 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000007530 organic bases Chemical class 0.000 description 3
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- UZBIPTJGVBCMMI-UHFFFAOYSA-N (5-bromo-2-chloro-4-fluorophenyl) methyl carbonate Chemical compound COC(=O)OC1=CC(Br)=C(F)C=C1Cl UZBIPTJGVBCMMI-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 150000004292 cyclic ethers Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- HQOSOMLRMFTQGJ-UHFFFAOYSA-N (5-bromo-2-chloro-4-fluorophenyl) methanesulfonate Chemical compound CS(=O)(=O)OC1=CC(Br)=C(F)C=C1Cl HQOSOMLRMFTQGJ-UHFFFAOYSA-N 0.000 description 1
- ZKWQSBFSGZJNFP-UHFFFAOYSA-N 1,2-bis(dimethylphosphino)ethane Chemical compound CP(C)CCP(C)C ZKWQSBFSGZJNFP-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- MIOCUERTSIJEDP-UHFFFAOYSA-N 2-diethylphosphanylethyl(diethyl)phosphane Chemical compound CCP(CC)CCP(CC)CC MIOCUERTSIJEDP-UHFFFAOYSA-N 0.000 description 1
- HFHFGHLXUCOHLN-UHFFFAOYSA-N 2-fluorophenol Chemical compound OC1=CC=CC=C1F HFHFGHLXUCOHLN-UHFFFAOYSA-N 0.000 description 1
- YRNDGUSDBCARGC-UHFFFAOYSA-N 2-methoxyacetophenone Chemical compound COCC(=O)C1=CC=CC=C1 YRNDGUSDBCARGC-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- UDQOBFJTYHSIPJ-UHFFFAOYSA-N 3-diethylphosphanylpropyl(diethyl)phosphane Chemical compound CCP(CC)CCCP(CC)CC UDQOBFJTYHSIPJ-UHFFFAOYSA-N 0.000 description 1
- IHHLNYBLQYXGAO-UHFFFAOYSA-N 3-dimethylphosphanylbutan-2-yl(dimethyl)phosphane Chemical compound CP(C)C(C(C)P(C)C)C IHHLNYBLQYXGAO-UHFFFAOYSA-N 0.000 description 1
- GZDVNUHKYJNVNT-UHFFFAOYSA-N 3-dimethylphosphanylpropyl(dimethyl)phosphane Chemical compound CP(C)CCCP(C)C GZDVNUHKYJNVNT-UHFFFAOYSA-N 0.000 description 1
- XWNSFEAWWGGSKJ-UHFFFAOYSA-N 4-acetyl-4-methylheptanedinitrile Chemical compound N#CCCC(C)(C(=O)C)CCC#N XWNSFEAWWGGSKJ-UHFFFAOYSA-N 0.000 description 1
- MJQKAQFGSBAFJG-UHFFFAOYSA-N 4-diethylphosphanylbutyl(diethyl)phosphane Chemical compound CCP(CC)CCCCP(CC)CC MJQKAQFGSBAFJG-UHFFFAOYSA-N 0.000 description 1
- BCJVBDBJSMFBRW-UHFFFAOYSA-N 4-diphenylphosphanylbutyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCCCP(C=1C=CC=CC=1)C1=CC=CC=C1 BCJVBDBJSMFBRW-UHFFFAOYSA-N 0.000 description 1
- QZRGKCOWNLSUDK-UHFFFAOYSA-N Iodochlorine Chemical compound ICl QZRGKCOWNLSUDK-UHFFFAOYSA-N 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 239000004153 Potassium bromate Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- HLDOPZZPCKQNHK-UHFFFAOYSA-L S(=O)(=O)([O-])[O-].[Ag+].[Br+] Chemical compound S(=O)(=O)([O-])[O-].[Ag+].[Br+] HLDOPZZPCKQNHK-UHFFFAOYSA-L 0.000 description 1
- RYEOBFCKSTYBIP-UHFFFAOYSA-L S(=O)(=O)([O-])[O-].[Ag+].[Cl+] Chemical compound S(=O)(=O)([O-])[O-].[Ag+].[Cl+] RYEOBFCKSTYBIP-UHFFFAOYSA-L 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- HTMAPYKKWGGDQZ-UHFFFAOYSA-L [I+].S(=O)(=O)([O-])[O-].[Ag+] Chemical compound [I+].S(=O)(=O)([O-])[O-].[Ag+] HTMAPYKKWGGDQZ-UHFFFAOYSA-L 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- XAJYMCCFKWPATK-UHFFFAOYSA-N bis(5-bromo-2-chloro-4-fluorophenyl) carbonate Chemical compound C1=C(Br)C(F)=CC(Cl)=C1OC(=O)OC1=CC(Br)=C(F)C=C1Cl XAJYMCCFKWPATK-UHFFFAOYSA-N 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000008050 dialkyl sulfates Chemical class 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- YPKCXURFKBPRAY-UHFFFAOYSA-N diethylphosphanylmethyl(diethyl)phosphane Chemical compound CCP(CC)CP(CC)CC YPKCXURFKBPRAY-UHFFFAOYSA-N 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- YOTZYFSGUCFUKA-UHFFFAOYSA-N dimethylphosphine Chemical compound CPC YOTZYFSGUCFUKA-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229940093915 gynecological organic acid Drugs 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- INIOZDBICVTGEO-UHFFFAOYSA-L palladium(ii) bromide Chemical compound Br[Pd]Br INIOZDBICVTGEO-UHFFFAOYSA-L 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 229940094037 potassium bromate Drugs 0.000 description 1
- 235000019396 potassium bromate Nutrition 0.000 description 1
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- IGNTWNVBGLNYDV-UHFFFAOYSA-N triisopropylphosphine Chemical compound CC(C)P(C(C)C)C(C)C IGNTWNVBGLNYDV-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は一般式(IV)(式中、
R3は低級アルキル基、低級アルコキシカルボニル基、
低級アルキルスルホニル基又は
(式中、X1及びX2は後記の意味を示す。)を示し、
X1及びX2は同一又は異なっても良いハロゲン原子を
示す。)で表される化合物をハロゲン化剤の存在下にハ
ロゲン化し、一般式(III)
(式中、R2は低級アルキル基、低級アルコキシカルボ
ニル基、低級アルキルスルホニル基又は
(式中、X1及びX2は後記の意味を示す。)を示し、
X1及びX2は前記に同じくし、Zはハロゲン原子を示
す。)で表される化合物とし、該化合物(III) 又
は該化合物(III) を脱保護基して得られる一般式
(III’)(式中、X1、X2及びZは前記に同じ。
)で表される化合物と一般式(II)
CH2=CH−OR1
(II)(式中、R1は低級アルキル基を示す。)で
表されるビニルエ−テル類とを塩基及び触媒の存在下に
反応を行い、次いで鉱酸と反応させることを特徴とする
一般式(I)[Industrial Application Field] The present invention relates to the general formula (IV) (wherein,
R3 is a lower alkyl group, a lower alkoxycarbonyl group,
Represents a lower alkylsulfonyl group or (in the formula, X1 and X2 have the meanings below),
X1 and X2 represent halogen atoms which may be the same or different. ) is halogenated in the presence of a halogenating agent, and the compound represented by the general formula (III) (wherein R2 is a lower alkyl group, a lower alkoxycarbonyl group, a lower alkylsulfonyl group, or (wherein, X1 and X2 are Indicates the meaning of the following.)
X1 and X2 are as defined above, and Z represents a halogen atom. ), and the compound (III) or the compound (III) is obtained by deprotecting the general formula (III') (wherein, X1, X2 and Z are the same as above). Compound and general formula (II) CH2=CH-OR1
(II) A general formula characterized by reacting a vinyl ether represented by (wherein R1 represents a lower alkyl group) in the presence of a base and a catalyst, and then reacting with a mineral acid. (I)
【0002】0002
【発明が解決しようとする課題】本発明者等はアセトフ
ェノン類の新規製造法に関し、鋭意研究を重ねた結果、
本発明の製造法が文献未記載の新規製造法であることを
見出し、本発明を完成させたものである。したがって本
発明は医薬、農薬、各種化学品等の原料として有用なア
セトフェノン類の新規製造法を得ることを課題とする。[Problem to be Solved by the Invention] As a result of extensive research into a new method for producing acetophenones, the present inventors found that
The present invention was completed by discovering that the manufacturing method of the present invention is a new manufacturing method that has not been described in any literature. Therefore, an object of the present invention is to obtain a new method for producing acetophenones useful as raw materials for medicines, agricultural chemicals, various chemical products, and the like.
【課題を解決するための手段】本発明のアセトフェノン
類の製造法を、例えば図式的に示すと以下にとおりであ
る。
製法1.
(式中、R 、R1、R2、R3、X1、X2及びZは
前記に同じ。)[Means for Solving the Problems] The method for producing acetophenones of the present invention is schematically illustrated, for example, as follows. Manufacturing method 1. (In the formula, R, R1, R2, R3, X1, X2 and Z are the same as above.)
【0003】一般式(IV)で表される化合物を不活性
溶媒及びハロゲン化剤の存在下にハロゲン化反応させる
ことにより一般式(III) で表される化合物とし、
該化合物(III)又は該化合物(III) を脱保護
基して得られる一般式(III’)を単離して、次いで
該化合物(III) 又は該化合物(III’)と一般
式(II)で表されるビニルアルコ−ル類とを不活性溶
媒の存在下又は不存在下及び塩基及び触媒の存在下に反
応を行い一般式(I’’) で表される化合物とし、該
化合物(I’’)を単離し又は単離せずして、鉱酸と反
応させることにより一般式(I) で表されるアセトフ
ェノン類を製造することができる。A compound represented by general formula (III) is obtained by subjecting the compound represented by general formula (IV) to a halogenation reaction in the presence of an inert solvent and a halogenating agent,
The compound (III) or the general formula (III') obtained by deprotecting the compound (III) is isolated, and then the compound (III) or the compound (III') is combined with the general formula (II). The represented vinyl alcohols are reacted in the presence or absence of an inert solvent and in the presence of a base and a catalyst to obtain a compound represented by the general formula (I''). Acetophenones represented by the general formula (I) can be produced by isolating or not isolating the acetophenones (I) by reacting them with a mineral acid.
【0004】■ 一般式(IV) → 一般式(
III)本反応で使用できる不活性溶媒としては、例え
ば硫酸等の鉱酸や氷酢酸等の有機酸及びこれらの混合物
を使用することができる。ハロゲン化剤としては塩素、
塩素酸カリウム、塩素−硫酸銀、臭素,臭素酸カリウム
、臭素−硫酸銀、沃素−硫酸銀、一塩化沃素等を使用す
ることができ、その使用量は一般式(IV)で表される
化合物に対して1〜1.5倍モルの範囲で使用すること
ができる。本反応は、例えば臭素化剤として臭素と同時
に塩素を使用することが好ましく、その使用量は等モル
乃至過剰モルの範囲である。反応温度は室温乃至使用す
る不活性溶媒の沸点域の範囲から選択すれば良い。反応
時間は反応試剤の量及び反応温度等により一定しないが
、数分乃至48時間の範囲である。反応終了後、常法に
より単離し、必要に応じて精製し、目的物を製造するこ
とができる。■ General formula (IV) → General formula (
III) As the inert solvent that can be used in this reaction, for example, mineral acids such as sulfuric acid, organic acids such as glacial acetic acid, and mixtures thereof can be used. Chlorine as a halogenating agent,
Potassium chlorate, chlorine-silver sulfate, bromine, potassium bromate, bromine-silver sulfate, iodine-silver sulfate, iodine monochloride, etc. can be used, and the amount used depends on the compound represented by general formula (IV). It can be used in an amount of 1 to 1.5 times by mole. In this reaction, for example, it is preferable to use chlorine as a brominating agent at the same time as bromine, and the amount used is in the range of equimolar to excess molar. The reaction temperature may be selected from room temperature to the boiling point of the inert solvent used. The reaction time varies depending on the amount of reaction reagent, reaction temperature, etc., but is in the range of several minutes to 48 hours. After the reaction is completed, it can be isolated by a conventional method and purified if necessary to produce the desired product.
【0005】■ 一般式(III) → 一般
式(III’)本反応は一般式(III) で表される
化合物を不活性溶媒及び塩基の存在下に保護基を脱保護
することにより目的物を製造することができる.本反応
で使用できる不活性溶媒としては、例えばメタノ−ル、
エタノ−ル, プロパノ−ル、ブタノ−ル等のアルコ−
ル類、ベンゼン、トルエン、キシレン等の芳香族炭化水
素類、メチルセロソルブ、エチレングリコ−ルジメチル
エ−テル等の鎖状エ−テル類、テトラヒドロフラン、ジ
オキサン等の環状エ−テル類、アセトニトリル等のニト
リル類、ジメチルホルムアミド、ジエチルホルムアミド
、ジメチルアセトアミド、ジエチルアセトアミド、ジメ
チルスルホキシド、1、3−ジメチル−2−イミダゾリ
ジノン等の非プロトン性溶媒を例示することができ、こ
れらの不活性溶媒は単独で使用しても良く、混合して使
用しても良い。塩基としては、例えば炭酸カリウム、炭
酸ナトリウム等の無機塩基が使用でき、その使用量は一
般式(III) で表される化合物に対して等モル乃至
過剰モルの範囲から適宜選択して使用すれば良い。反応
温度は室温乃至使用する不活性溶媒の沸点域から選択す
れば良い。反応時間は反応規模、反応温度等により一定
ではないが、数分乃至48時間の範囲である。反応終了
後、常法により単離し、必要に応じて精製することによ
り目的物を製造することができる。■ General formula (III) → General formula (III') This reaction removes the protecting group from the compound represented by the general formula (III) in the presence of an inert solvent and a base to obtain the desired product. It can be manufactured. Examples of inert solvents that can be used in this reaction include methanol,
Alcohols such as ethanol, propanol, butanol
aromatic hydrocarbons such as benzene, toluene, and xylene, chain ethers such as methyl cellosolve and ethylene glycol dimethyl ether, cyclic ethers such as tetrahydrofuran and dioxane, and nitriles such as acetonitrile. , dimethylformamide, diethylformamide, dimethylacetamide, diethylacetamide, dimethylsulfoxide, 1,3-dimethyl-2-imidazolidinone, etc., and these inert solvents cannot be used alone. They may be used in combination, or they may be used in combination. As the base, for example, an inorganic base such as potassium carbonate or sodium carbonate can be used, and the amount used is appropriately selected from the range of equimolar to excess molar relative to the compound represented by the general formula (III). good. The reaction temperature may be selected from room temperature to the boiling point of the inert solvent used. The reaction time is not constant depending on the reaction scale, reaction temperature, etc., but is in the range of several minutes to 48 hours. After the reaction is completed, the desired product can be produced by isolation by a conventional method and purification if necessary.
【0006】本製法による一般式(III) 又は(I
II’)で表される化合物の代表例を表1に例示する。[0006] General formula (III) or (I
Representative examples of compounds represented by II') are illustrated in Table 1.
【0007】■ 一般式(III) 又は(III’
) → 〔一般式(I’’) 〕 → 一般式
(I)一般式(III) 又は(III’)で表される
化合物と一般式(II)で表されるビニルエ−テル類と
を不活性溶媒、塩基及び触媒の存在下に反応を行い、一
般式(I’’) で表される化合物とし、該化合物(I
’’) を単離し、又は単離せずして鉱酸と反応させる
ことにより一般式(I)で表されるアセトフェノン類を
製造することができる。本反応で使用できる不活性溶媒
としては、本反応の進行を著しく阻害しないものであれ
ば良く,■で使用できる不活性溶媒を使用することがで
きる。本反応で使用する触媒としてはパラジウム化合物
及びホスフィン化合物を組み合わせて使用すれば良く、
パラジウム化合物としては、例えば金属パラジウム、パ
ラジウムカ−ボン、パラジウムアルミナ、塩化パラジウ
ム、臭化パラジウム、酢酸パラジウム等のパラジウム化
合物を例示することができる。ホスフィン化合物として
は、例えばトリイソプロピルホスフィン、トリブチルホ
スフィン等のトリアルキルホスフィン類、トリフェニル
ホスフィン、トリパラフルオロフェニルホスフィン、ト
リオルソメチルフェニルホスフィン等のトリアリ−ルホ
スフィン類、1,1−ビス(ジメチルホスフィノ)メタ
ン、1,1−ビス(ジエチルホスフィノ)メタン、1,
2−ビス(ジメチルホスフィノ)エタン、1,2−ビス
(ジエチルホスフィノ)エタン、1,3−ビス(ジメチ
ルホスフィノ)プロパン、1,3−ビス(ジエチルホス
フィノ)プロパン、1,4−ビス(ジメチルホスフィノ
)ブタン、1,4−ビス(ジエチルホスフィノ)ブタン
等のビス(ジアルキルホスフィノ)アルカン類、1,2
−ビス(ジフェニルホスフィノ)エタン、1,3−ビス
(ジフェニルホスフィノ)プロパン、1,4−ビス(ジ
フェニルホスフィノ)ブタン等のビス(ジアリ−ルホス
フィノ)アルカン類を例示することができる。■ General formula (III) or (III'
) → [General formula (I'')] → General formula (I) General formula (III) or (III') A compound represented by general formula (III) or (III') and a vinyl ether represented by general formula (II) are inertized. The reaction is carried out in the presence of a solvent, a base and a catalyst to form a compound represented by the general formula (I''), and the compound (I
Acetophenones represented by the general formula (I) can be produced by isolating or not isolating '') and reacting it with a mineral acid. The inert solvent that can be used in this reaction may be any inert solvent that does not significantly inhibit the progress of this reaction, and inert solvents that can be used in (3) can be used. As the catalyst used in this reaction, a palladium compound and a phosphine compound may be used in combination.
Examples of the palladium compound include palladium metal, palladium carbon, palladium alumina, palladium chloride, palladium bromide, palladium acetate, and the like. Examples of phosphine compounds include trialkylphosphines such as triisopropylphosphine and tributylphosphine, triarylphosphines such as triphenylphosphine, triparafluorophenylphosphine, and triorthomethylphenylphosphine, and 1,1-bis(dimethylphosphine). ) methane, 1,1-bis(diethylphosphino)methane, 1,
2-bis(dimethylphosphino)ethane, 1,2-bis(diethylphosphino)ethane, 1,3-bis(dimethylphosphino)propane, 1,3-bis(diethylphosphino)propane, 1,4- Bis(dialkylphosphino)alkanes such as bis(dimethylphosphino)butane, 1,4-bis(diethylphosphino)butane, 1,2
Examples include bis(diarylphosphino)alkanes such as -bis(diphenylphosphino)ethane, 1,3-bis(diphenylphosphino)propane, and 1,4-bis(diphenylphosphino)butane.
【0008】本反応で使用する触媒の使用量は一般式(
III) 又は(III’)で表される化合物に対して
0.001〜等モルの範囲から適宜選択して使用すれば
良く、触媒としてパラジウム化合物と組み合わせて使用
するホスフィン化合物の使用量はパラジウム化合物に対
して0.01〜100倍モルの範囲から選択して使用す
れば良く、好ましくは0.01〜50倍モルの範囲であ
る。本反応の触媒はホスフィン化合物とパラジウム化合
物を組み合わせて使用すれば良く、反応系に予め錯体の
形に調製して使用しても良く、それぞれを別々に反応系
内に添加しても良い。又、ホスフィン化合物と組み合わ
せて使用するパラジウム化合物にかえて周期律表第VI
II族のコバルト、白金、ロジウム、ルテニウム、イリ
ジウム又はオスミウム等の金属担体又は金属塩をホスフ
ィン化合物と組み合わせて使用することもできる。The amount of catalyst used in this reaction is determined by the general formula (
The amount of the phosphine compound used in combination with the palladium compound as a catalyst may be selected as appropriate from the range of 0.001 to equimole relative to the compound represented by III) or (III'). The amount may be selected from the range of 0.01 to 100 times by mole, preferably 0.01 to 50 times by mole. The catalyst for this reaction may be a combination of a phosphine compound and a palladium compound, which may be prepared in advance in the form of a complex in the reaction system, or each may be added separately to the reaction system. Also, in place of the palladium compound used in combination with the phosphine compound,
Metal supports or metal salts such as group II cobalt, platinum, rhodium, ruthenium, iridium or osmium can also be used in combination with the phosphine compounds.
【0009】本反応で使用する塩基としては無機塩基又
は有機塩基を使用することができ、無機塩基としては、
例えば炭酸ナトリウム、炭酸カリウム、酸化カルシウム
、炭酸水素ナトリウム、炭酸水素カリウム、水酸化ナト
リウム、水酸化カリウム、水酸化カルシウム等のアルカ
リ金属又はアルカリ土類金属の炭酸塩、酸化物、水酸化
物等の無機塩基を例示することができる。有機塩基とし
ては、例えばトリエチルアミン、トリブチルアミン、ピ
リジン、ジメチルアニリン、N−メチルピロリドン等の
有機塩基の他に、酢酸ナトリウム等の有機酸塩も使用す
ることができる。本発明で使用する塩基の使用量は、反
応により生成するハロゲン化水素を中和するのに必要な
量を使用すれば良いが、過剰に使用することもできる。[0009] As the base used in this reaction, an inorganic base or an organic base can be used.
For example, carbonates, oxides, and hydroxides of alkali metals or alkaline earth metals such as sodium carbonate, potassium carbonate, calcium oxide, sodium hydrogen carbonate, potassium hydrogen carbonate, sodium hydroxide, potassium hydroxide, and calcium hydroxide. Examples include inorganic bases. As the organic base, in addition to organic bases such as triethylamine, tributylamine, pyridine, dimethylaniline, and N-methylpyrrolidone, organic acid salts such as sodium acetate can also be used. The amount of base used in the present invention may be the amount necessary to neutralize the hydrogen halide produced by the reaction, but it can also be used in excess.
【0010】本反応では一般式(II)で表されるビニ
ルエ−テル類は一般式(III) 又は(III’)で
表される化合物に対して等モル乃至過剰モルの範囲で使
用でき、反応は常圧乃至加圧下に行われ、好ましくは1
〜50気圧の範囲内で行う。本反応に際して、反応容器
内は窒素雰囲気下で行うのが好ましい。反応温度は20
〜300℃の範囲から適宜選択して行えば良い。本反応
で使用される反応容器としては、例えば通常使用される
ものであれば良く、加圧反応の場合は加圧に耐えられる
ものを使用し、例えばガラス製、金属製等の反応容器を
例示することができる。反応時間は反応規模、反応温度
等により一定ではないが、数分乃至100時間の範囲で
ある。反応終了後、通常目的物を含む反応系から目的物
を単離せずに次の反応に供すれば良く、又一般式(I’
’) で表される化合物を反応系から常法,例えば溶媒
抽出法等により処理し、必要に応じてカラムクロマトグ
ラフィ−等で精製することにより目的物を単離し、次の
反応に供することもできる。In this reaction, the vinyl ether represented by the general formula (II) can be used in an equimolar to an excess molar amount relative to the compound represented by the general formula (III) or (III'). is carried out under normal pressure to increased pressure, preferably 1
It is carried out within the range of ~50 atmospheres. During this reaction, it is preferable to carry out the reaction in a nitrogen atmosphere inside the reaction vessel. The reaction temperature is 20
The temperature may be suitably selected from the range of ~300°C. The reaction vessel used in this reaction may be one that is normally used, for example, and in the case of a pressurized reaction, one that can withstand the pressure is used. For example, reaction vessels made of glass, metal, etc. are exemplified. can do. The reaction time is not constant depending on the reaction scale, reaction temperature, etc., but is in the range of several minutes to 100 hours. After the completion of the reaction, it is sufficient to subject the target product to the next reaction without isolating it from the reaction system containing the target product.
') can be treated from the reaction system by a conventional method such as solvent extraction, and if necessary purified by column chromatography etc. to isolate the target product and use it for the next reaction. .
【0011】■ 一般式(I’’) → 一般
式(I)本反応は先の反応終了後、一般式(I’’)
を含む反応系に鉱酸を処理することにより一般式(I)
で表されるアセトフェノン類を製造することができる
。本反応で使用できる鉱酸としては、例えば塩酸、硫酸
、臭化水素酸、沃化水素酸等を使用することができ、そ
の使用量は反応系が酸性を示すに必要な量であれば良い
。又、先の反応で単離した一般式(I’’) で表され
る化合物を使用する場合、不活性溶媒、例えば一般式(
I’’) のR2部分に相当するアルコ−ル類、テトラ
ヒドロフラン等のエ−テル類、ジメチルホルムアミド類
等の不活性溶媒、の存在下に鉱酸を処理すれば良い。鉱
酸の使用量は反応系のpHが酸性を示すに必要な量を使
用すれば良い。反応温度は0〜50℃の範囲から選択さ
れ、好ましくは室温が良い。反応終了後、常法により処
理し、必要に応じて精製することにより目的物を製造す
ることもできる。■ General formula (I'') → General formula (I) After the completion of the previous reaction, the general formula (I'')
By treating a reaction system containing a mineral acid with general formula (I)
Acetophenones represented by can be produced. Examples of mineral acids that can be used in this reaction include hydrochloric acid, sulfuric acid, hydrobromic acid, and hydriodic acid, and the amount used can be as long as it is necessary for the reaction system to show acidity. . In addition, when using the compound represented by the general formula (I'') isolated in the previous reaction, an inert solvent, for example, a compound represented by the general formula (I'')
The mineral acid may be treated in the presence of an alcohol corresponding to the R2 moiety of I''), an ether such as tetrahydrofuran, or an inert solvent such as dimethylformamide. The amount of mineral acid used may be the amount necessary to make the pH of the reaction system acidic. The reaction temperature is selected from the range of 0 to 50°C, preferably room temperature. After completion of the reaction, the desired product can also be produced by processing in a conventional manner and purifying if necessary.
【0012】製法2.
(式中、R’、X1、X2及びQは前記に同じ。)一般
式(I’)で表されるアセトフェノン類と一般式(V)
又は(V’)で表されるアルキル化剤とを不活性溶媒
及び塩基の存在下に反応させることにより目的物を製造
することができる。Manufacturing method 2. (In the formula, R', X1, X2 and Q are the same as above.) Acetophenones represented by general formula (I') and general formula (V)
Alternatively, the desired product can be produced by reacting the alkylating agent represented by (V') in the presence of an inert solvent and a base.
【0013】本反応で使用する不活性溶媒としては、例
えば塩化メチレン、クロロホルム、四塩化炭素等のハロ
ゲン化炭化水素類、ベンゼン、トルエン、キシレン等の
芳香族炭化水素類、酢酸エチル等のエステル類、アセト
ニトリル、ベンゾニトリル等のニトリル類、メチルセロ
ソルブ、ジエチルエ−テル等の鎖状エ−テル類、ジオキ
サン、テトラヒドロフラン等の環状エ−テル類、スルホ
ラン、ジメチルスルホキシド等を例示することができる
。本反応で使用する一般式(V) で表されるアルキル
化剤としては、例えば低級アルキルハライド類、低級ア
ルキルスルホン酸低級アルキルエステル、芳香族スルホ
ン酸アルキルエステル等を、一般式(V’)で表される
アルキル化剤としては、例えばジメチル硫酸、ジエチル
硫酸等のジアルキル硫酸類を例示することができる。Examples of the inert solvent used in this reaction include halogenated hydrocarbons such as methylene chloride, chloroform, and carbon tetrachloride, aromatic hydrocarbons such as benzene, toluene, and xylene, and esters such as ethyl acetate. Examples include nitriles such as , acetonitrile and benzonitrile, chain ethers such as methyl cellosolve and diethyl ether, cyclic ethers such as dioxane and tetrahydrofuran, sulfolane and dimethyl sulfoxide. Examples of the alkylating agent represented by the general formula (V) used in this reaction include lower alkyl halides, lower alkyl sulfonic acid esters, aromatic sulfonic acid alkyl esters, etc. Examples of the alkylating agent include dialkyl sulfates such as dimethyl sulfate and diethyl sulfate.
【0014】本反応で使用する塩基としては、例えば製
法1で使用の塩基を使用することができる。本反応は等
モル反応であるので、各々の反応剤を等モル使用すれば
良いが、一方を過剰に使用することもできる。反応温度
は0℃〜使用する不活性溶媒の沸点域の範囲から適宜選
択すれば良い。反応時間は反応規模、反応温度等により
一定しないが、数分乃至48時間の範囲である。反応終
了後、常法により単離し、必要に応じて精製することに
より目的物を製造することができる。As the base used in this reaction, for example, the base used in Production Method 1 can be used. Since this reaction is an equimolar reaction, each reactant may be used in equimolar amounts, but one may be used in excess. The reaction temperature may be appropriately selected from the range of 0° C. to the boiling point of the inert solvent used. The reaction time varies depending on the reaction scale, reaction temperature, etc., but is in the range of several minutes to 48 hours. After the reaction is completed, the desired product can be produced by isolation by a conventional method and purification if necessary.
【0015】以下に本発明の代表的な実施例を例示する
が、本発明はこれらに限定されるものではない。
実施例1. 5−ブロモ−2−クロロ−4−フルオロ
アニソ−ルの製造
2−クロロ−4−フルオロアニソ−ル6.79g(42
.4ミリモル)を濃硫酸40mlに溶解させ、臭素3m
l(55.1ミリモル)を加え室温下に1.5時間反応
を行った。反応終了後、反応混合液を氷水中に注ぎ、目
的物をエ−テルで抽出し、有機層を水洗後、チオ硫酸ナ
トリウム水溶液で洗浄し、水洗、乾燥後、抽出液を濃縮
し、残渣をシリカゲルカラムクロマトグラフィ−で精製
することにより目的物を結晶として2.74g得た。
物性 m.p.73.7℃、収率 27%[0015] Typical examples of the present invention will be illustrated below, but the present invention is not limited thereto. Example 1. Production of 5-bromo-2-chloro-4-fluoroanisole 6.79 g (42
.. 4 mmol) in 40 ml of concentrated sulfuric acid, 3 mmol of bromine
1 (55.1 mmol) was added and the reaction was carried out at room temperature for 1.5 hours. After the reaction is complete, the reaction mixture is poured into ice water, the target product is extracted with ether, the organic layer is washed with water, then with an aqueous sodium thiosulfate solution, washed with water, dried, and the extract is concentrated to remove the residue. Purification by silica gel column chromatography yielded 2.74 g of the desired product as crystals. Physical properties m. p. 73.7℃, yield 27%
【001
6】実施例2. 4−クロロ−2−フルオロ−5−ヒ
ドロキシアセトフェノンの製造
2−1
5−ブロモ−2−クロロ−4−フルオロフェニル メ
チルカ−ボナ−ト2.0g(7.05ミリモル)、酢酸
パラジウム8mg(0.036ミリモル)、1,3−ビ
ス(ジフェニルホスフィノ)プロパン58mg(0.1
4ミリモル)、炭酸ナトリウム0.8g(7.55ミリ
モル)、エチルビニルエ−テル1.1g(14.9ミリ
モル)及びメタノ−ル10mlを100mlのステンレ
ス製オ−トクレ−ブに入れ、窒素雰囲気下に反応温度1
30℃で4時間攪拌反応を行った。次いで反応系を放冷
し、濃塩酸で酸性にして30分間室温で反応を行った。
反応終了後、反応系に水を加えて目的物をエ−テルで抽
出し、抽出液を水洗乾燥後、濃縮して得られた残渣をシ
リカゲルカラムクロマトグラフィ−で精製して目的物1
.1gを得た。
物性 m.p. 112.0℃ 収率8
3%001
6] Example 2. Preparation of 4-chloro-2-fluoro-5-hydroxyacetophenone 2-1 2.0 g (7.05 mmol) of 5-bromo-2-chloro-4-fluorophenyl methyl carbonate, 8 mg (0.5 mmol) of palladium acetate. 036 mmol), 1,3-bis(diphenylphosphino)propane 58 mg (0.1
4 mmol), 0.8 g (7.55 mmol) of sodium carbonate, 1.1 g (14.9 mmol) of ethyl vinyl ether, and 10 ml of methanol were placed in a 100 ml stainless steel autoclave and placed under a nitrogen atmosphere. Reaction temperature 1
The reaction was stirred at 30° C. for 4 hours. The reaction system was then allowed to cool, acidified with concentrated hydrochloric acid, and reacted for 30 minutes at room temperature. After the reaction is complete, water is added to the reaction system, the target product is extracted with ether, the extract is washed with water, dried, concentrated, and the resulting residue is purified by silica gel column chromatography to obtain the target product 1.
.. 1g was obtained. Physical properties m. p. 112.0℃ Yield 8
3%
【0017】2−2
ビス(5−ブロモ−2−クロロ−4−フルオロフェニル
)カ−ボネ−ト27.5g(57.6ミリモル)、塩化
パラジウム200mg(1.15ミリモル)、1,3−
ビス(ジフェニルホスフィノ)プロパン700mg(1
.70ミリモル)、炭酸ナトリウム13g(123ミリ
モル)、n−ブチルビニルエ−テル30g(300ミリ
モル)及びn−ブチルアルコ−ル200mlを500m
lの三角フラスコに入れ、窒素雰囲気下に21時間還流
した。次いで反応系を放冷し、濃塩酸を加え酸性とし、
室温下に30分間反応を行った。反応終了後、反応系に
水を加えエ−テルで目的物を抽出し、抽出液を水洗、乾
燥後、濃縮し、残渣をシリカゲルカラムクロマトグラフ
ィ−で精製し、目的物18.0gを得た。
物性 m.p. 112.0℃ 収率 7
7%2-2 27.5 g (57.6 mmol) of bis(5-bromo-2-chloro-4-fluorophenyl) carbonate, 200 mg (1.15 mmol) of palladium chloride, 1,3-
Bis(diphenylphosphino)propane 700mg (1
.. 70 mmol), 13 g (123 mmol) of sodium carbonate, 30 g (300 mmol) of n-butyl vinyl ether, and 200 ml of n-butyl alcohol in 500 m
The mixture was placed in a 1-liter Erlenmeyer flask and refluxed for 21 hours under a nitrogen atmosphere. Next, the reaction system was allowed to cool, and concentrated hydrochloric acid was added to make it acidic.
The reaction was carried out at room temperature for 30 minutes. After the reaction was completed, water was added to the reaction system and the target product was extracted with ether. The extract was washed with water, dried, and concentrated. The residue was purified by silica gel column chromatography to obtain 18.0 g of the target product. Physical properties m. p. 112.0℃ Yield 7
7%
【0018】実施例3. 4−クロロ−2−フル
オロ−5−ヒドロキシアセトフェノン及び4−クロロ2
−フルオロ−5−メトキシアセトフェノンの製造5−ブ
ロモ−2−クロロ−4−フルオロフェニル メタンス
ルホネ−ト2.0g(6.6ミリモル)、酢酸パラジウ
ム20mg(0.09ミリモル)、1,3−ビス(ジフ
ェニルホスフィノ)プロパン120mg(0.29ミリ
モル)、炭酸ナトリウム800mg(7.5ミリモル)
、エチルビニルエ−テル2g(27.8ミリモル)及び
メタノ−ル10mlを100mlのステンレス製オ−ト
クレ−ブに入れ、窒素雰囲気下に3時間130℃で反応
を行った。次いで反応系を放冷し、濃塩酸を加えて酸性
とし、室温下に30分間反応を行った。反応終了後、反
応系に水を加え酢酸エチルで目的物を抽出し、抽出液を
水洗、乾燥後、濃縮し、残渣をシリカゲルカラムクロマ
トグラフィ−で精製し、4−クロロ−2−フルオロ−5
−ヒドロキシアセトフェノン240mg(収率19%)
及び4−クロロ2−フルオロ−5−メトキシアセトフェ
ノン700mg(収率52%)を得た。Example 3. 4-chloro-2-fluoro-5-hydroxyacetophenone and 4-chloro2
-Preparation of fluoro-5-methoxyacetophenone 2.0 g (6.6 mmol) of 5-bromo-2-chloro-4-fluorophenyl methanesulfonate, 20 mg (0.09 mmol) of palladium acetate, 1,3-bis( Diphenylphosphino)propane 120 mg (0.29 mmol), sodium carbonate 800 mg (7.5 mmol)
, 2 g (27.8 mmol) of ethyl vinyl ether and 10 ml of methanol were placed in a 100 ml stainless steel autoclave, and a reaction was carried out at 130° C. for 3 hours under a nitrogen atmosphere. The reaction system was then allowed to cool, made acidic by adding concentrated hydrochloric acid, and reacted at room temperature for 30 minutes. After the reaction was completed, water was added to the reaction system and the target product was extracted with ethyl acetate. The extract was washed with water, dried, and concentrated. The residue was purified by silica gel column chromatography to obtain 4-chloro-2-fluoro-5.
-Hydroxyacetophenone 240 mg (yield 19%)
and 700 mg (yield 52%) of 4-chloro2-fluoro-5-methoxyacetophenone were obtained.
【0019】実施例4. 4−クロロ2−フルオロ−
5−メトキシアセトフェノンの製造
5−ブロモ−4−フルオロ−2−クロロアニソ−ル0.
5g(2.1ミリモル)、塩化パラジウム10mg(0
.06ミリモル)、トリフェニルホスフィン40mg(
0.15ミリモル)及びn−ブチルビニルエ−テル0.
4g(4.0ミリモル)を20mlのジメチルホルムア
ミドに溶解し、炭酸ナトリウム0.2g(1.9ミリモ
ル)を加え、窒素雰囲気下100〜120℃で9時間反
応を行った。次いで反応液を放冷後、濃塩酸で反応液を
酸性とし室温下に30分間反応を行った。反応終了後、
反応液に水を加えて目的物をエ−テルで抽出し、抽出液
を水洗、乾燥後、減圧下に濃縮し残渣をシリカゲルカラ
ムクロマトグラフィ−で精製して目的物0.26gを得
た。
物性 m.p. 92.4℃、収率61%Example 4. 4-chloro2-fluoro-
Preparation of 5-methoxyacetophenone 5-bromo-4-fluoro-2-chloroanisole 0.
5 g (2.1 mmol), palladium chloride 10 mg (0
.. 06 mmol), triphenylphosphine 40 mg (
0.15 mmol) and n-butyl vinyl ether 0.
4 g (4.0 mmol) was dissolved in 20 ml of dimethylformamide, 0.2 g (1.9 mmol) of sodium carbonate was added, and the reaction was carried out at 100 to 120° C. for 9 hours under a nitrogen atmosphere. Next, the reaction solution was allowed to cool, and then the reaction solution was made acidic with concentrated hydrochloric acid, and the reaction was carried out at room temperature for 30 minutes. After the reaction is complete,
Water was added to the reaction solution, and the desired product was extracted with ether. The extract was washed with water, dried, and concentrated under reduced pressure. The residue was purified by silica gel column chromatography to obtain 0.26 g of the desired product. Physical properties m. p. 92.4℃, yield 61%
【002
0】実施例5. 4−クロロ−2−フルオロ−5−メ
トキシアセトフェノンの製造
5−ブロモ−4−フルオロ−2−クロロアニソ−ル0.
5g(2.1ミリモル)、塩化パラジウム10mg(0
.06ミリモル)、トリフェニルホスフィン40mg(
0.15ミリモル)及びn−ブチルビニルエ−テル0.
4g(4.0ミリモル)を20mlのジメチルホルムア
ミドに溶解し、炭酸ナトリウム0.2g(1.9ミリモ
ル)を加え、窒素雰囲気下100〜120℃で9時間反
応を行った。反応終了後、反応液に水を加えて目的物を
エ−テルで抽出し、抽出液を水洗、乾燥後、減圧下に濃
縮し残渣をカラムクロマトグラフィ−で精製して中間体
を油状物として0.52g得た。
物性 NMR(CDCl3 /TMS、ppm)
0.96(t,3H)、1.45(m,2H)
、1.72(m,2H)、 3.85(t,2H
)、3.87(s,3H)、4.46(m,1H)、
4.75(m,1H)、7.09(d,1H)、
7.20(d,1H)。
上記で得られた油状物0.52gをメタノ−ル20ml
に溶解し、濃塩酸で酸性とし室温下に30分間反応を行
った。反応終了後、反応液に水を加えて目的物をエ−テ
ルで抽出し、抽出液を水洗、乾燥後、減圧下に濃縮し残
渣をシリカゲルカラムクロマトグラフィ−で精製して目
的物0.26gを得た。
物性 m.p. 92.4℃、収率 61%002
0] Example 5. Production of 4-chloro-2-fluoro-5-methoxyacetophenone 5-bromo-4-fluoro-2-chloroanisole 0.
5 g (2.1 mmol), palladium chloride 10 mg (0
.. 06 mmol), triphenylphosphine 40 mg (
0.15 mmol) and n-butyl vinyl ether 0.
4 g (4.0 mmol) was dissolved in 20 ml of dimethylformamide, 0.2 g (1.9 mmol) of sodium carbonate was added, and the reaction was carried out at 100 to 120° C. for 9 hours under a nitrogen atmosphere. After the reaction is complete, water is added to the reaction solution, the target product is extracted with ether, the extract is washed with water, dried, concentrated under reduced pressure, and the residue is purified by column chromatography to remove the intermediate as an oil. .52g was obtained. Physical properties NMR (CDCl3 /TMS, ppm)
0.96 (t, 3H), 1.45 (m, 2H)
, 1.72 (m, 2H), 3.85 (t, 2H
), 3.87 (s, 3H), 4.46 (m, 1H),
4.75 (m, 1H), 7.09 (d, 1H),
7.20 (d, 1H). Add 0.52g of the oily substance obtained above to 20ml of methanol.
The mixture was dissolved in water, acidified with concentrated hydrochloric acid, and reacted at room temperature for 30 minutes. After the reaction was completed, water was added to the reaction solution, the target product was extracted with ether, the extract was washed with water, dried, concentrated under reduced pressure, and the residue was purified by silica gel column chromatography to obtain 0.26 g of the target product. Obtained. Physical properties m. p. 92.4℃, yield 61%
【0
021】実施例6. 4−クロロ−2−フルオロ−5
−メトキシアセトフェノンの製造
4−クロロ−2−フルオロ−5−ヒドロキシアセトフェ
ノン7.80g(41.3ミリモル)をアセトン80m
l中に溶解し、沃化メチル8.80g(62.0ミリモ
ル)及び無水炭酸カリウム粉末8.52g(71.7ミ
リモル)を加え、還流下に1.5時間反応を行った。反
応終了後、アセトンを減圧下に留去し、残渣に氷水を加
え、目的物を酢酸エチルで抽出した。抽出液を水洗し、
無水硫酸マグネシウムで乾燥後、溶媒を減圧下に留去し
て目的物を結晶として7.53g得た。
物性 m.p. 92.4℃、収率 90%0
Example 6. 4-chloro-2-fluoro-5
-Production of methoxyacetophenone 7.80g (41.3 mmol) of 4-chloro-2-fluoro-5-hydroxyacetophenone was added to 80ml of acetone.
8.80 g (62.0 mmol) of methyl iodide and 8.52 g (71.7 mmol) of anhydrous potassium carbonate powder were added, and the reaction was carried out under reflux for 1.5 hours. After the reaction was completed, acetone was distilled off under reduced pressure, ice water was added to the residue, and the target product was extracted with ethyl acetate. Wash the extract with water,
After drying over anhydrous magnesium sulfate, the solvent was distilled off under reduced pressure to obtain 7.53 g of the desired product as crystals. Physical properties m. p. 92.4℃, yield 90%
【0
022】実施例7. 5−ブロモ−2−クロロ−4−
フルオロフェノ−ルの製造
5−ブロモ−2−クロロ−4−フルオロフェニル メ
チルカ−ボナ−ト14.18g(50ミリモル)、無水
炭酸カリウム10.35g(75ミリモル)及びメタノ
−ル150mlの混合液を攪拌還流下に1時間反応を行
った。反応終了後、メタノ−ルを減圧下に留去し、残渣
に氷水200mlを加え、濃塩酸でpHを4〜5に調整
した後、目的物を酢酸エチルで抽出した。有機層を中性
になるまで水洗し、乾燥後、溶媒を減圧下に留去して目
的物を結晶として10.15g得た。0
Example 7. 5-bromo-2-chloro-4-
Production of fluorophenol A mixed solution of 14.18 g (50 mmol) of 5-bromo-2-chloro-4-fluorophenyl methyl carbonate, 10.35 g (75 mmol) of anhydrous potassium carbonate, and 150 ml of methanol was prepared. The reaction was carried out for 1 hour under stirring and reflux. After the reaction was completed, methanol was distilled off under reduced pressure, 200 ml of ice water was added to the residue, the pH was adjusted to 4 to 5 with concentrated hydrochloric acid, and the target product was extracted with ethyl acetate. The organic layer was washed with water until it became neutral, dried, and the solvent was distilled off under reduced pressure to obtain 10.15 g of the desired product as crystals.
Claims (3)
ニル基、低級アルキルスルホニル基又は 式中、X1及びX2は後記の意味を示す。)を示し、X
1及びX2は同一又は異なっても良いハロゲン原子を示
す。)で表される化合物をハロゲン化剤の存在下にハロ
ゲン化し、一般式(III) (式中、R2は低級アルキル基、低級アルコキシカルボ
ニル基、低級アルキルスルホニル基又は (式中、X1及びX2は後記の意味を示す。)を示し、
X1及びX2は前記に同じくし、Zはハロゲン原子を示
す。)で表される化合物とし、該化合物(III) 又
は該化合物(III) を脱保護基して得られる一般式
(III’)(式中、X1、X2及びZは前記に同じ。 )で表される化合物と一般式(II) CH2=CH−OR1
(II)(式中、R1は低級アルキル基を示す。)で
表されるビニルエ−テル類とを塩基及び触媒の存在下に
反応を行い、次いで鉱酸と反応させることを特徴とする
一般式(I)(式中、Rは水素原子又は低級アルキル基
を示し、X1及びX2は前記に同じ。)で表されるアセ
トフェノン類の製造方法。Claim 1: General formula (IV) (wherein R3 is a lower alkyl group, a lower alkoxycarbonyl group, a lower alkylsulfonyl group, or in the formula, X1 and X2 have the meanings given below),
1 and X2 represent halogen atoms which may be the same or different. ) is halogenated in the presence of a halogenating agent, and the compound represented by the general formula (III) (wherein R2 is a lower alkyl group, a lower alkoxycarbonyl group, a lower alkylsulfonyl group, or (wherein, X1 and X2 are Indicates the meaning of the following.)
X1 and X2 are as defined above, and Z represents a halogen atom. ), and the compound (III) or the compound (III) is obtained by deprotecting the general formula (III') (wherein, X1, X2 and Z are the same as above). Compound and general formula (II) CH2=CH-OR1
(II) A general formula characterized by reacting a vinyl ether represented by (wherein R1 represents a lower alkyl group) in the presence of a base and a catalyst, and then reacting with a mineral acid. A method for producing acetophenones represented by (I) (wherein R represents a hydrogen atom or a lower alkyl group, and X1 and X2 are the same as above).
I’)(式中、R2は低級アルキル基、低級アルコキシ
カルボニル基、低級アルキルスルホニル基又は (式中、X1及びX2は後記に示す。)を示し、X1及
及びX2同一又は異なっても良いハロゲン原子を示し、
Zはハロゲン原子を示す。)で表される化合物。Claim 2: General formula (III) or general formula (II)
I') (in the formula, R2 represents a lower alkyl group, a lower alkoxycarbonyl group, a lower alkylsulfonyl group, or (in the formula, X1 and X2 are shown below), and X1 and X2 are halogens which may be the same or different. indicates an atom,
Z represents a halogen atom. ).
トフェノン類と一般式(V) R’−Q (V)又は
一般式(V’) (R’)2SO4 (V’)
(式中、R’は低級アルキル基を示し、Qはハロゲン原
子、低級アルキルスルホニルオキシ基又はアリ−ルスル
ホニルオキシ基を示す。)で表されるアルキル化剤とを
反応させることを特徴とする一般式(I’)(式中、R
’、X1及びX2は前記に同じ。)で表されるアセトフ
ェノン類の製造法。3. Acetophenones represented by general formula (I') (wherein X1 and X2 are the same as above) and general formula (V) R'-Q (V) or general formula (V') (R')2SO4 (V')
(In the formula, R' represents a lower alkyl group, and Q represents a halogen atom, a lower alkylsulfonyloxy group, or an arylsulfonyloxy group.) General formula (I') (wherein, R
', X1 and X2 are the same as above. ) A method for producing acetophenones represented by
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15774691A JP3268459B2 (en) | 1991-05-31 | 1991-05-31 | Method for producing acetophenones |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15774691A JP3268459B2 (en) | 1991-05-31 | 1991-05-31 | Method for producing acetophenones |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04356438A true JPH04356438A (en) | 1992-12-10 |
JP3268459B2 JP3268459B2 (en) | 2002-03-25 |
Family
ID=15656446
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15774691A Expired - Fee Related JP3268459B2 (en) | 1991-05-31 | 1991-05-31 | Method for producing acetophenones |
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JP (1) | JP3268459B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996002485A1 (en) * | 1994-07-20 | 1996-02-01 | Monsanto Company | Benzoyl derivatives and synthesis thereof |
FR2791977A1 (en) * | 1999-04-08 | 2000-10-13 | Rhodia Chimie Sa | HALOGENATION IN THE META POSITION OF AN AROMATIC HAVING A PHENOL FUNCTION PROTECTED BY CONDENSATION WITH AN ACID |
US6399835B1 (en) | 1997-10-09 | 2002-06-04 | Bromine Compounds Ltd. | Process for electrophilic aromatic substitution |
-
1991
- 1991-05-31 JP JP15774691A patent/JP3268459B2/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996002485A1 (en) * | 1994-07-20 | 1996-02-01 | Monsanto Company | Benzoyl derivatives and synthesis thereof |
US6399835B1 (en) | 1997-10-09 | 2002-06-04 | Bromine Compounds Ltd. | Process for electrophilic aromatic substitution |
FR2791977A1 (en) * | 1999-04-08 | 2000-10-13 | Rhodia Chimie Sa | HALOGENATION IN THE META POSITION OF AN AROMATIC HAVING A PHENOL FUNCTION PROTECTED BY CONDENSATION WITH AN ACID |
WO2000061523A1 (en) * | 1999-04-08 | 2000-10-19 | Rhodia Chimie | Halogenation of protected phenols in meta position |
US6576782B1 (en) | 1999-04-08 | 2003-06-10 | Rhodia Chimie | Halogenation of protected phenols in meta position |
Also Published As
Publication number | Publication date |
---|---|
JP3268459B2 (en) | 2002-03-25 |
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