JPH04342736A - Production of glass-containing aramid film - Google Patents
Production of glass-containing aramid filmInfo
- Publication number
- JPH04342736A JPH04342736A JP14264591A JP14264591A JPH04342736A JP H04342736 A JPH04342736 A JP H04342736A JP 14264591 A JP14264591 A JP 14264591A JP 14264591 A JP14264591 A JP 14264591A JP H04342736 A JPH04342736 A JP H04342736A
- Authority
- JP
- Japan
- Prior art keywords
- film
- glass
- aramid
- alkoxysilane
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229920003235 aromatic polyamide Polymers 0.000 title claims abstract description 34
- 239000004760 aramid Substances 0.000 title claims abstract description 33
- 239000011521 glass Substances 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 description 15
- 238000001035 drying Methods 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- 238000005470 impregnation Methods 0.000 description 10
- 229920003366 poly(p-phenylene terephthalamide) Polymers 0.000 description 8
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 5
- 238000004070 electrodeposition Methods 0.000 description 5
- -1 polyethylene terephthalate Polymers 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000002411 thermogravimetry Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000005606 hygroscopic expansion Effects 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 125000004958 1,4-naphthylene group Chemical group 0.000 description 1
- 125000004959 2,6-naphthylene group Chemical group [H]C1=C([H])C2=C([H])C([*:1])=C([H])C([H])=C2C([H])=C1[*:2] 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- YENOLDYITNSPMQ-UHFFFAOYSA-N carboxysilicon Chemical compound OC([Si])=O YENOLDYITNSPMQ-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- RRGUWAGNWZBVSZ-UHFFFAOYSA-N nitromethyl hydrogen sulfate Chemical compound [N+](=O)([O-])COS(O)(=O)=O RRGUWAGNWZBVSZ-UHFFFAOYSA-N 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、寸法安定性にすぐれ、
強度・弾性率の改善されたアラミドフィルムの製造法に
関するものであり、フレキシブルプリント配線基板用や
磁気記録媒体用に適したアラミドフィルムの製造法に関
するものである。[Industrial Application Field] The present invention has excellent dimensional stability,
The present invention relates to a method for manufacturing an aramid film with improved strength and modulus of elasticity, and is suitable for use in flexible printed wiring boards and magnetic recording media.
【0002】0002
【従来の技術】フレキシブル配線基板用ベースフィルム
や磁気記録媒体用ベースフィルムとしては、主としてポ
リイミドフィルムやポリエチレンテレフタレート(PE
T)フィルムが使われてきている。しかし、これらのフ
ィルムには、次のような欠点がある。ポリイミドフィル
ムは高価であり、また弾性率が小さいため、外力に対す
る寸法安定性に欠ける。一方、PETフィルムは、耐熱
性が不足し、ハンダプロセスや屋外使用に不十分であり
、また弾性率が小さいという欠点も持っている。[Prior Art] Base films for flexible wiring boards and base films for magnetic recording media are mainly made of polyimide films and polyethylene terephthalate (PE).
T) Film is being used. However, these films have the following drawbacks. Polyimide films are expensive and have a low elastic modulus, so they lack dimensional stability against external forces. On the other hand, PET film lacks heat resistance, making it unsatisfactory for soldering processes and outdoor use, and also has the disadvantage of having a low elastic modulus.
【0003】このような状況から、高い弾性率を有する
パラ配向型アラミドフィルムが注目されており、前記用
途への応用も試みられている。しかし、アラミドフィル
ムは、一般に吸湿率が大きく、またこれを改善するため
に芳香環にハロゲン基を導入したアラミドにおいても、
耐熱安定性が劣り、熱収縮が大きいという欠点があった
。また、寸法安定性の一層の向上のためには、弾性率を
更に大きくすることが望ましいが、弾性率を大きくする
と従来の技術では熱収縮が大きくなったり、フィルムの
厚み方向(いわゆるZ方向)の特性が低下したりする欠
点があった。Under these circumstances, para-oriented aramid films having a high elastic modulus have attracted attention, and attempts have been made to apply them to the above-mentioned uses. However, aramid films generally have a high moisture absorption rate, and even aramid, which has halogen groups introduced into the aromatic ring to improve this,
It had the drawbacks of poor heat stability and large heat shrinkage. In addition, in order to further improve dimensional stability, it is desirable to further increase the elastic modulus, but when the elastic modulus is increased, conventional techniques tend to suffer from increased heat shrinkage and shrinkage in the thickness direction of the film (so-called Z direction). There was a drawback that the characteristics of
【0004】0004
【発明が解決しようとする課題】本発明の目的は、先行
技術のもつこれらの欠点を解消した、寸法安定性にすぐ
れ、強度・弾性率の改善された、フレキシブルプリント
配線基板や磁気記録媒体用のベースフィルムに適したフ
ィルムの製造法を提供することにある。[Problems to be Solved by the Invention] An object of the present invention is to provide a flexible printed wiring board and a magnetic recording medium, which have excellent dimensional stability and improved strength and modulus of elasticity, and which overcome these drawbacks of the prior art. The purpose of the present invention is to provide a method for manufacturing a film suitable for base films.
【0005】[0005]
【課題を解決するための手段】本発明者は、このような
目的に適うフィルムの製造法を種々な視点から研究する
うちに、特定の水分率の状態のアラミドフィルムにいわ
ゆるゾル・ゲル法でフィルム中にガラスを分散させるこ
とにより、寸法安定性に優れた、しかも強度・弾性率の
改善された、つまり目的に適ったフィルムが得られるこ
とを見出し、更に研究を重ねて本発明に到達したもので
ある。[Means for Solving the Problems] While researching methods for producing films suitable for such purposes from various viewpoints, the present inventor discovered that aramid films with a specific moisture content were produced using the so-called sol-gel method. They discovered that by dispersing glass in a film, it was possible to obtain a film with excellent dimensional stability and improved strength and modulus of elasticity, which suited the purpose, and after further research, they arrived at the present invention. It is something.
【0006】即ち、本発明は、水分率1重量%以上のア
ラミドフィルムを、アルコキシシランと接触させて、該
アルコキシシランを含浸させ、次いで200℃以上で乾
燥させて、ガラスとして乾燥フィルムに対して1〜30
重量%含有させることを特徴とするガラス含有アラミド
フィルムの製造法である。That is, in the present invention, an aramid film having a water content of 1% by weight or more is brought into contact with an alkoxysilane to be impregnated with the alkoxysilane, and then dried at a temperature of 200° C. or more to form a glass into the dry film. 1-30
This is a method for producing a glass-containing aramid film characterized by containing the glass in an amount of % by weight.
【0007】本発明に用いられるアラミドは、次の構成
単位からなる群より選択された単位から実質的に構成さ
れる。The aramid used in the present invention is substantially composed of units selected from the group consisting of the following structural units.
【化1】
−NH−Ar1 −NH− ………… (I)
−CO−Ar2 −CO− ………… (II
)−NH−Ar3 −CO− ………… (I
II)ここで、Ar1 、Ar2 およびAr3 は、
各々2価の芳香族基であり、(I)と(II)はポリマ
ー中に存在する場合は実質的に当モルである。[Chemical formula 1] -NH-Ar1 -NH- ...... (I)
-CO-Ar2 -CO- ………… (II
)-NH-Ar3 -CO- ………… (I
II) Here, Ar1, Ar2 and Ar3 are:
Each is a divalent aromatic group, and (I) and (II) are substantially equimolar when present in the polymer.
【0008】本発明のフィルムにおいて、Ar1 、A
r2 およびAr3 はパラ配向性又はメタ配向性の基
であるが、良好な機械的性能を確保するためには、Ar
1 、Ar2 およびAr3 は各々、いわゆる、パラ
配向性の基であることが好ましい。In the film of the present invention, Ar1, A
r2 and Ar3 are para-orientated or meta-oriented groups, but to ensure good mechanical performance, Ar
1 , Ar2 and Ar3 are each preferably a so-called para-oriented group.
【0009】ここで、パラ配向性とは、その分子鎖を成
長させている結合が芳香核の反対方向に同軸または平行
的に位置していることを意味する。このような2価の芳
香族基の具体例としては、パラフェニレン、4,4′−
ビフェニレン、1,4−ナフチレン、1,5−ナフチレ
ン、2,6−ナフチレン、2,5−ピリジレンなどが挙
げられる。それらは、ハロゲン、低級アルキル、ニトロ
、メトキシ、スルホン酸、シアノ基などの非活性基で1
または2以上置換されていてもよい。また、メタ配向性
の基としては、メタフェニレン、4,4′−ビフェニレ
ンエーテル、3,4′−ビフェニレンエーテル、4,4
′−ビフェニレンスルホン、1,7−ナフチレンなどが
あり、前記の非活性基で置換されていてもよい。Here, para-orientation means that the bonds that grow the molecular chain are located coaxially or parallel to the opposite direction of the aromatic nucleus. Specific examples of such divalent aromatic groups include paraphenylene, 4,4'-
Biphenylene, 1,4-naphthylene, 1,5-naphthylene, 2,6-naphthylene, 2,5-pyridylene and the like can be mentioned. They are 1 with non-active groups such as halogen, lower alkyl, nitro, methoxy, sulfonic acid, cyano groups, etc.
Alternatively, two or more may be substituted. In addition, as the meta-oriented group, metaphenylene, 4,4'-biphenylene ether, 3,4'-biphenylene ether, 4,4
'-biphenylene sulfone, 1,7-naphthylene, etc., and may be substituted with the above-mentioned inert group.
【0010】Ar1 、Ar2 およびAr3 はいず
れも2種以上であってもよく、また相互に同じであって
も異なっていてもよい。本発明に用いられるアラミドフ
ィルムの重合度は、あまり低いと機械的性質の良好なフ
ィルムが得られなくなるため、好ましくは1以上、より
好ましくは2以上の固有粘度ηinh(硫酸100ml
にポリマー0.5gを溶解して30℃で測定した値)を
与える重合度のものが選ばれる。[0010] Ar1, Ar2 and Ar3 may each be two or more types, and may be the same or different. If the degree of polymerization of the aramid film used in the present invention is too low, it will not be possible to obtain a film with good mechanical properties.
A polymer having a degree of polymerization that gives a value measured at 30° C. by dissolving 0.5 g of polymer is selected.
【0011】本発明に用いられるアラミドフィルムは、
水分率1重量%以上を有していることが必要である。水
分率が1重量%未満では、アルコキシシランを含浸させ
た後、ゲル化させる反応が不十分になることが多く、好
ましくは水分率3重量%以上である。水分率の上限は必
ずしも限定されないが、アラミドフィルムは、一般に製
膜後結晶化されていない状態では最高約300重量%程
度の水分率になることが知られており、この状態のフィ
ルムも使うことができる。ただし、水分率があまり多い
と、アルコキシシランと水に相溶性がないため、含浸操
作を行う上で共通溶媒たるアルコールを多量に使用する
必要が生じ、このため工業的には100重量%以下の水
分率が好ましい。[0011] The aramid film used in the present invention is
It is necessary to have a moisture content of 1% by weight or more. If the moisture content is less than 1% by weight, the gelling reaction after impregnating the alkoxysilane is often insufficient, and the moisture content is preferably 3% by weight or more. Although the upper limit of the moisture content is not necessarily limited, it is known that aramid films generally have a maximum moisture content of about 300% by weight in an uncrystallized state after film formation, and films in this state may also be used. Can be done. However, if the water content is too high, alkoxysilane and water are not compatible, so it becomes necessary to use a large amount of alcohol, which is a common solvent during the impregnation operation. Moisture content is preferred.
【0012】本発明に用いるアラミドフィルムは種々の
方法で製造できる。例えば、該当するジアミン及びジ酸
クロライドから特公昭35−14399号公報等で知ら
れる低温溶液重合法により重合して得たアラミドを、そ
のまま、又は副生塩化水素を中和したのちの溶液(ドー
プ)から、或いは、一旦単離したのち、アミド系溶剤、
濃硫酸等に溶解したドープから、湿式又は乾式製膜する
ことで得られる。また、本発明者らが先に発表した(高
柳ほか「ポリマージャーナル第20巻No.8第639
頁(1988)」)、アラミドのジメチルスルホキシド
−水素化ナトリウム溶液からの電析法フィルムも用いる
ことができる。[0012] The aramid film used in the present invention can be produced by various methods. For example, an aramid obtained by polymerizing the corresponding diamine and diacid chloride by the low-temperature solution polymerization method known in Japanese Patent Publication No. 35-14399 etc. can be used as it is or in a solution (doped) after neutralizing the by-product hydrogen chloride. ) or once isolated, an amide solvent,
It can be obtained by wet or dry film formation from a dope dissolved in concentrated sulfuric acid or the like. In addition, the present inventors previously announced (Takayanagi et al. “Polymer Journal Vol. 20 No. 8 No. 639
Electrodeposited films of aramids from dimethyl sulfoxide-sodium hydride solutions can also be used.
【0013】本発明に用いるアルコキシシランとしては
、テトラエトキシシラン、テトラメトキシシラン、テト
ライソプロポキシシラン、テトラブトキシシラン等、あ
るいはこれらの混合物がある。アルコキシシランは通常
対応するアルコールを溶剤とした溶液の形で用いられる
ことが多く、それに少量の水等他の溶剤が混入していて
もよい。アルコール中のアルコキシシランは普通0.1
〜60重量%で用いられる。The alkoxysilane used in the present invention includes tetraethoxysilane, tetramethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, etc., or mixtures thereof. Alkoxysilane is usually used in the form of a solution using the corresponding alcohol as a solvent, and a small amount of other solvent such as water may be mixed therein. Alkoxysilane in alcohol is usually 0.1
It is used at ~60% by weight.
【0014】アラミドフィルム中へのアルコキシシラン
の含浸は、アラミドフィルムとアルコキシシランを接触
させつつ種々の形で実施できる。アラミドフィルムをア
ルコキシシラン又はそのアルコール溶液中に単に浸漬す
る方法、加熱や加圧、減圧等を併用する方法、アラミド
フィルムにアルコキシシランをシャワーリングしたり、
噴霧する方法などを挙げることができる。Impregnation of alkoxysilane into the aramid film can be carried out in various ways while bringing the aramid film into contact with the alkoxysilane. A method of simply immersing the aramid film in alkoxysilane or its alcohol solution, a method of using heating, pressurization, depressurization, etc., a method of showering the aramid film with alkoxysilane,
Examples include a method of spraying.
【0015】含浸時に、後のゲル化反応(アルコキシシ
ランからガラスへの転化反応)を加速するために、少量
のHClやHNO3 を添加しておくのも好ましい実施
態様である。含浸時間、アルコキシシラン濃度等はアラ
ミドの種類、アラミドフィルムの厚み、水分率等を勘案
しつつ、最終的なガラス含有量が1〜30重量%(乾燥
フィルム基準)になるように選ぶべきである。It is also a preferred embodiment to add a small amount of HCl or HNO3 during impregnation in order to accelerate the subsequent gelation reaction (conversion reaction from alkoxysilane to glass). The impregnation time, alkoxysilane concentration, etc. should be selected so that the final glass content will be 1 to 30% by weight (based on dry film), taking into consideration the type of aramid, the thickness of the aramid film, the moisture content, etc. .
【0016】アルコキシシランを含浸させたアラミドフ
ィルムを次いで200℃以上で乾燥させる。ここで、「
200℃以上で」の意味は最終的な乾燥又は熱処理温度
が200℃以上であることを意味し、その温度に達する
までに、例えば室温から段階的に昇温してもよい。20
0℃以上の乾燥温度にする理由は、高温においてアルコ
キシシランがガラス(SiO2 のネットワーク構造体
)に化学変化させる必要があるからである。乾燥温度の
上限は、専らアラミドの熱安定性から制限されるのみで
あり、瞬間的には約500℃まで使用できる。乾燥温度
は好ましくは250〜450℃である。[0016] The aramid film impregnated with alkoxysilane is then dried at a temperature of 200°C or higher. here,"
"At 200° C. or higher" means that the final drying or heat treatment temperature is 200° C. or higher, and the temperature may be raised stepwise from room temperature, for example, until that temperature is reached. 20
The reason for setting the drying temperature to 0° C. or higher is that it is necessary for the alkoxysilane to chemically change into glass (SiO2 network structure) at high temperatures. The upper limit of the drying temperature is limited solely by the thermal stability of aramid, and it can be used up to about 500°C instantaneously. The drying temperature is preferably 250 to 450°C.
【0017】乾燥工程において、アルコールの蒸発、共
存する水によるカルボキシシランの加水分解反応の進行
によるゲル状ガラスの生成が起こるが、このときアラミ
ドフィルム自体の収縮が起こることが多い。このため、
フィルムを定長下に、或いは収縮を一定程度に制限して
、又は延伸しつつ、乾燥させるのが好ましい。特に、高
い弾性率のフィルムをつくる場合には、乾燥前或いは乾
燥中に延伸(約1.05〜2倍)操作を加えるのが望ま
しい。また、乾燥を200℃以上で2段以上に分けて異
なった温度で行ってもよい。例えば、熱収縮率を小さく
するために、定長又は延伸下に乾燥したのち、更に弛緩
下又は低張力下に熱処理することが有効である。In the drying process, a gel-like glass is formed due to the evaporation of alcohol and the progress of the hydrolysis reaction of carboxysilane by the coexisting water, but at this time, the aramid film itself often shrinks. For this reason,
It is preferable to dry the film while maintaining a constant length, limiting shrinkage to a certain degree, or while stretching the film. Particularly when producing a film with a high modulus of elasticity, it is desirable to perform a stretching operation (approximately 1.05 to 2 times) before or during drying. Further, drying may be performed at 200° C. or higher in two or more stages at different temperatures. For example, in order to reduce the thermal shrinkage rate, it is effective to dry the material under constant length or stretching, and then further heat treat it under relaxation or low tension.
【0018】このようにして、ガラスを乾燥フィルム基
準で1〜30重量%含有するアラミドフィルムを得るこ
とができる。1重量%未満のガラス含有率では、本発明
の特徴とする寸法安定性の改良されたフィルムにはなら
ないし、一方、30重量%を超えるガラス含有率になる
とフィルムが脆くなり実用的ではなくなる。ガラスの含
有率は、例えば熱重量分析(TGA)により600℃以
上でも残存する物質量で定量できる。[0018] In this way, an aramid film containing 1 to 30% by weight of glass, based on the dry film, can be obtained. A glass content of less than 1% by weight does not result in a film with improved dimensional stability, which is a feature of the present invention, while a glass content of more than 30% by weight makes the film brittle and impractical. The glass content can be quantified by the amount of substance remaining even at 600° C. or higher, for example, by thermogravimetric analysis (TGA).
【0019】生成したガラス含有アラミドフィルムの断
面を走査型電子顕微鏡で観察すると、ガラスがフィルム
内部で層状に発達し、ひしめきあっている形態が見られ
、特にアラミドを例えばジメチルスルホキシド(DMS
O)/水素化ナトリウム溶液でエッチング後観察した場
合に、この様子が明確に見える。得られたガラス含浸フ
ィルムは、200MPa以上の強度を有し、5GPa以
上の弾性率を有している。これらは、フィルム内のアラ
ミドの面配向度が高いことを示しており、それ故にフィ
ルムの寸法安定性が優れている。When the cross section of the produced glass-containing aramid film was observed using a scanning electron microscope, it was found that the glass had developed into layers inside the film and was packed tightly together.
This behavior is clearly visible when observed after etching with O)/sodium hydride solution. The obtained glass-impregnated film has a strength of 200 MPa or more and an elastic modulus of 5 GPa or more. These indicate that the degree of planar orientation of the aramid in the film is high, and therefore the film has excellent dimensional stability.
【0020】[0020]
【実施例】以下に実施例を示すが、これらの参考例およ
び実施例は本発明を説明するものであって、本発明を限
定するものではない。なお、実施例中特に規定しない場
合は重量部または重量%を示す。[Examples] Examples are shown below, but these reference examples and examples are for illustrating the present invention, and are not intended to limit the present invention. In the examples, parts by weight or weight % are shown unless otherwise specified.
【0021】実施例中の各特性の評価は下記の方法によ
った。■ 強伸度および弾性率は、定速伸長型強伸度
測定機により、フィルム試料を0.5cm×3cmの長
方形に切り、両端に一辺0.5cmの正方形に切った紙
やすりを接着剤で取り付けた。この紙やすりの部分を測
定機のチャックで把持して、1cm/分で引張って測定
した。■ ガラス含浸量は、熱重量分析機(TGA)
に空気を送り込みながら、ガラス含有アラミドフィルム
を600℃まで加熱してHOLDにして有機成分を焼き
飛ばし、残った量をガラスと見なして定量した。[0021]Evaluation of each characteristic in the examples was carried out by the following method. ■ Strength and elongation and elastic modulus are determined by cutting a film sample into a rectangle of 0.5 cm x 3 cm using a constant speed extension type strength and elongation measuring machine, and attaching sandpaper cut into a square of 0.5 cm on each side with adhesive. Installed it. This sandpaper portion was gripped by the chuck of the measuring machine and measured by pulling it at 1 cm/min. ■ The amount of glass impregnation is measured using a thermogravimetric analyzer (TGA).
While blowing air into the film, the glass-containing aramid film was heated to 600° C. and held to burn off the organic components, and the remaining amount was determined as glass.
【0022】■ 250℃における熱収縮率は、フィ
ルムに0.05kg/mm2 の張力を付与して250
℃のオーブン中に30分間放置し、このオーブン処理前
後の室温(25℃)における寸法変化から計算したもの
である。■ 吸湿膨張係数は、熱機械分析装置にフィ
ルムを0.05kg/mm2の張力を付与してセットし
、23℃、20%相対湿度と60%相対湿度の各々の空
気を送り込んでこの間の寸法変化から求めた。■ The heat shrinkage rate at 250°C is 250°C when a tension of 0.05kg/mm2 is applied to the film.
It was calculated from the dimensional change at room temperature (25°C) before and after the oven treatment after being left in an oven at 30°C for 30 minutes. ■ The coefficient of hygroscopic expansion is determined by setting the film in a thermomechanical analyzer with a tension of 0.05 kg/mm2, feeding air at 23°C, 20% relative humidity, and 60% relative humidity, and measuring the dimensional change during this time. I asked for it from
【0023】[0023]
【実施例1】電析法により、ポリ(p−フェニレンテレ
フタルアミド)(PPTA)のフィルムをつくった。ポ
リエチレン製の容器を沈めたステンレス製の二重円筒間
に、PPTA2.5g、ジメチルスルホキシド1L、カ
セイソーダ0.84gからなる電析溶液を入れた。回転
する円筒(よく磨いた電析棒)を陽極、外筒を陰極にし
て一定速度で回転し、電析密度0.35mA/cm2
で40分間行った。電析後1Nの塩酸で10分間処理し
て水で洗った。室温でしばらく乾燥したのち、50℃で
2時間減圧乾燥し、更に100℃で1時間乾燥して、5
重量%の水分率を有するフィルムを得た。Example 1 A poly(p-phenylene terephthalamide) (PPTA) film was produced by electrodeposition. An electrodeposition solution consisting of 2.5 g of PPTA, 1 L of dimethyl sulfoxide, and 0.84 g of caustic soda was placed between a stainless steel double cylinder in which a polyethylene container was submerged. The rotating cylinder (a well-polished electrodeposition rod) is used as an anode and the outer cylinder is used as a cathode, rotating at a constant speed, and the electrodeposition density is 0.35 mA/cm2.
It lasted 40 minutes. After electrodeposition, it was treated with 1N hydrochloric acid for 10 minutes and washed with water. After drying at room temperature for a while, drying under reduced pressure at 50°C for 2 hours, and further drying at 100°C for 1 hour.
A film with a moisture content of % by weight was obtained.
【0024】次に、フィルムをテトラエトキシシランの
エタノール溶液(約1重量%)に浸漬して、60℃で1
昼夜静置した。フィルムを取出し、エタノールで表面を
洗い流したのち、室温で乾燥、60℃で減圧乾燥、10
0℃で常圧乾燥、更に370℃で1分間乾燥(熱処理)
を定長下に順次行った。こうして、PPTAフィルム中
の水でテトラエトキシシランを重合して、ガラス含有P
PTAフィルムをつくった。Next, the film was immersed in an ethanol solution of tetraethoxysilane (approximately 1% by weight) and heated to 1% by weight at 60°C.
It was left undisturbed day and night. After removing the film and rinsing the surface with ethanol, dry it at room temperature, then dry it under reduced pressure at 60°C for 10 minutes.
Dry at normal pressure at 0℃, then dry at 370℃ for 1 minute (heat treatment)
were carried out sequentially over a fixed length. Thus, by polymerizing tetraethoxysilane with water in the PPTA film, glass-containing P
I made PTA film.
【0025】このフィルムを赤外吸収スペクトルで分析
して、波数1100cm−1付近に SiO2 に特有
のスペクトルを確認した。また、ガラスの含有量は、熱
重量分析の結果13重量%であった。ガラスを含浸前の
PPTAフィルムは、強度170MPa、伸度4.7%
、弾性率5.56GPaであり、ガラス含有PPTAフ
ィルムは、強度205MPa、伸度5.3%、弾性率6
.00GPaであった。[0025] This film was analyzed by infrared absorption spectrum, and a spectrum peculiar to SiO2 was confirmed at a wave number of around 1100 cm-1. Further, the glass content was 13% by weight as a result of thermogravimetric analysis. The PPTA film before impregnating glass has a strength of 170 MPa and an elongation of 4.7%.
, the elastic modulus is 5.56 GPa, and the glass-containing PPTA film has a strength of 205 MPa, an elongation of 5.3%, and an elastic modulus of 6.
.. It was 00 GPa.
【0026】[0026]
【実施例2】PPTAの硫酸溶液から、特公昭57−1
7886号公報の方法によりフィルムをつくった。11
0℃で乾燥して得たフィルムは、約25μmの厚さで、
4.8重量%の水分率であった。実施例1と同様にテト
ラエトキシシランの含浸及び乾燥を行った。ただし、本
実施例では、フィルムを一旦減圧にし、そこにテトラエ
トキシシランのエタノール溶液を注入・浸漬して1気圧
の圧力をかけて含浸の促進を行った。[Example 2] From a sulfuric acid solution of PPTA,
A film was made by the method disclosed in Japanese Patent No. 7886. 11
The film obtained by drying at 0°C has a thickness of about 25 μm,
The moisture content was 4.8% by weight. Impregnation with tetraethoxysilane and drying were performed in the same manner as in Example 1. However, in this example, the pressure of the film was once reduced, an ethanol solution of tetraethoxysilane was injected and immersed therein, and a pressure of 1 atmosphere was applied to promote impregnation.
【0027】こうして得られたフィルムは、約29μm
の厚みで8.3重量%のガラス含有率を示した。ガラス
含浸を行う前のPPTAフィルムは、160MPaの強
度、53%の伸度、3.45GPaの弾性率、2.03
%の熱収縮率、11.6×10−5mm/mm/%RH
の吸湿膨張係数をもっていた。一方、ガラス含有PPT
Aフィルムは、220MPaの強度、35%の伸度、5
.26GPaの弾性率、0.17%の熱収縮率、8.1
×10−5mm/mm/%RHの吸湿膨張係数をもって
いた。なお、含浸時に圧力をかけない時も、同様のガラ
ス含有フィルムが得られた。The film thus obtained has a thickness of about 29 μm.
The glass content was 8.3% by weight at a thickness of . The PPTA film before glass impregnation has a strength of 160 MPa, an elongation of 53%, a modulus of 3.45 GPa, and a modulus of 2.03
% heat shrinkage rate, 11.6 x 10-5mm/mm/%RH
It had a hygroscopic expansion coefficient of On the other hand, glass-containing PPT
A film has a strength of 220 MPa, an elongation of 35%, and a
.. Elastic modulus of 26GPa, heat shrinkage rate of 0.17%, 8.1
It had a hygroscopic expansion coefficient of x10-5 mm/mm/%RH. Note that a similar glass-containing film was obtained even when no pressure was applied during impregnation.
【0028】[0028]
【発明の効果】本発明の方法により、引張強度・弾性率
の向上したアラミドフィルムが得られ、これは外力に対
する寸法安定性の良いフィルムであることを意味する。
また、本発明の方法により得られるフィルムにおいて、
ガラスがフィルム内部に層状に充填されていることから
、フィルムの圧縮強度、圧縮弾性率、更には厚み方向の
強度・弾性率も向上していることが期待できる。[Effects of the Invention] By the method of the present invention, an aramid film with improved tensile strength and elastic modulus can be obtained, which means that the film has good dimensional stability against external forces. Furthermore, in the film obtained by the method of the present invention,
Since glass is filled inside the film in a layered manner, it can be expected that the compressive strength and compressive modulus of the film, as well as the strength and modulus of elasticity in the thickness direction, are improved.
【0029】更に、ガラス含浸により、熱収縮率が小さ
くなり、吸湿による寸法変化も小さくなる。つまり、熱
寸法安定性や吸湿寸法安定性が向上する。このような特
徴から、本発明の方法によって得られたフィルムは、フ
レキシブル配線基板用ベースフィルム、磁気記録媒体用
ベースフィルムなどとして有用である。Furthermore, glass impregnation reduces thermal shrinkage and dimensional changes due to moisture absorption. In other words, thermal dimensional stability and moisture absorption dimensional stability are improved. Due to these characteristics, the film obtained by the method of the present invention is useful as a base film for flexible wiring boards, a base film for magnetic recording media, and the like.
Claims (1)
ムを、アルコキシシランと接触させて、該アルコキシシ
ランを含浸させ、次いで200℃以上で乾燥させて、ガ
ラスとして乾燥フィルムに対して1〜30重量%含有さ
せることを特徴とするガラス含有アラミドフィルムの製
造法。Claim 1: An aramid film with a water content of 1% by weight or more is brought into contact with an alkoxysilane to impregnate it with the alkoxysilane, and then dried at 200°C or higher to form a glass with a moisture content of 1 to 30% by weight based on the dry film. % of glass-containing aramid film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14264591A JPH04342736A (en) | 1991-05-20 | 1991-05-20 | Production of glass-containing aramid film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14264591A JPH04342736A (en) | 1991-05-20 | 1991-05-20 | Production of glass-containing aramid film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04342736A true JPH04342736A (en) | 1992-11-30 |
Family
ID=15320174
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14264591A Withdrawn JPH04342736A (en) | 1991-05-20 | 1991-05-20 | Production of glass-containing aramid film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04342736A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105062047A (en) * | 2015-07-29 | 2015-11-18 | 苏州荣昌复合材料有限公司 | Preparation method of magnetic adsorption nylon material |
-
1991
- 1991-05-20 JP JP14264591A patent/JPH04342736A/en not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105062047A (en) * | 2015-07-29 | 2015-11-18 | 苏州荣昌复合材料有限公司 | Preparation method of magnetic adsorption nylon material |
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