JPH043400B2 - - Google Patents
Info
- Publication number
- JPH043400B2 JPH043400B2 JP15515185A JP15515185A JPH043400B2 JP H043400 B2 JPH043400 B2 JP H043400B2 JP 15515185 A JP15515185 A JP 15515185A JP 15515185 A JP15515185 A JP 15515185A JP H043400 B2 JPH043400 B2 JP H043400B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- acid
- examples
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001875 compounds Chemical class 0.000 claims description 25
- 150000003839 salts Chemical class 0.000 claims description 14
- 229910015900 BF3 Inorganic materials 0.000 claims description 11
- 125000003277 amino group Chemical group 0.000 claims description 11
- 125000004423 acyloxy group Chemical group 0.000 claims description 7
- 150000002148 esters Chemical class 0.000 claims description 7
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 7
- 229940071870 hydroiodic acid Drugs 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 125000004442 acylamino group Chemical group 0.000 claims description 5
- -1 cephalosporin compounds Chemical class 0.000 description 49
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 36
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 21
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 15
- 125000006239 protecting group Chemical group 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- 125000000217 alkyl group Chemical group 0.000 description 10
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 125000000623 heterocyclic group Chemical group 0.000 description 8
- 125000002252 acyl group Chemical group 0.000 description 7
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 235000009518 sodium iodide Nutrition 0.000 description 7
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical group CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 229930186147 Cephalosporin Natural products 0.000 description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 6
- 229940124587 cephalosporin Drugs 0.000 description 6
- 150000001780 cephalosporins Chemical class 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- TYNQWNIJFGNOGQ-HWZXHQHMSA-N (6r)-7-amino-3-(iodomethyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid Chemical compound S1CC(CI)=C(C(O)=O)N2C(=O)C(N)[C@H]21 TYNQWNIJFGNOGQ-HWZXHQHMSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- HSHGZXNAXBPPDL-HZGVNTEJSA-N 7beta-aminocephalosporanic acid Chemical compound S1CC(COC(=O)C)=C(C([O-])=O)N2C(=O)[C@@H]([NH3+])[C@@H]12 HSHGZXNAXBPPDL-HZGVNTEJSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 125000004450 alkenylene group Chemical group 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 125000000539 amino acid group Chemical group 0.000 description 3
- 239000003242 anti bacterial agent Substances 0.000 description 3
- 229940088710 antibiotic agent Drugs 0.000 description 3
- 125000004663 dialkyl amino group Chemical group 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- LSBDFXRDZJMBSC-UHFFFAOYSA-N 2-phenylacetamide Chemical group NC(=O)CC1=CC=CC=C1 LSBDFXRDZJMBSC-UHFFFAOYSA-N 0.000 description 2
- 125000003349 3-pyridyl group Chemical group N1=C([H])C([*])=C([H])C([H])=C1[H] 0.000 description 2
- 125000000339 4-pyridyl group Chemical group N1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 2
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical group NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical group NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- PUJDIJCNWFYVJX-UHFFFAOYSA-N benzyl carbamate Chemical compound NC(=O)OCC1=CC=CC=C1 PUJDIJCNWFYVJX-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical group 0.000 description 2
- HOKIDJSKDBPKTQ-GLXFQSAKSA-N cephalosporin C Chemical compound S1CC(COC(=O)C)=C(C(O)=O)N2C(=O)[C@@H](NC(=O)CCC[C@@H](N)C(O)=O)[C@@H]12 HOKIDJSKDBPKTQ-GLXFQSAKSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- GTCAXTIRRLKXRU-UHFFFAOYSA-N methyl carbamate Chemical compound COC(N)=O GTCAXTIRRLKXRU-UHFFFAOYSA-N 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 125000004940 pyridazin-4-yl group Chemical group N1=NC=C(C=C1)* 0.000 description 2
- 125000004527 pyrimidin-4-yl group Chemical group N1=CN=C(C=C1)* 0.000 description 2
- 125000004528 pyrimidin-5-yl group Chemical group N1=CN=CC(=C1)* 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 239000012453 solvate Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 125000001376 1,2,4-triazolyl group Chemical group N1N=C(N=C1)* 0.000 description 1
- 125000004506 1,2,5-oxadiazolyl group Chemical group 0.000 description 1
- 125000004517 1,2,5-thiadiazolyl group Chemical group 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- 125000001781 1,3,4-oxadiazolyl group Chemical group 0.000 description 1
- 125000004520 1,3,4-thiadiazolyl group Chemical group 0.000 description 1
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical compound NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 description 1
- LKFXYYLRIUSARI-UHFFFAOYSA-N 1,3-thiazol-5-amine Chemical compound NC1=CN=CS1 LKFXYYLRIUSARI-UHFFFAOYSA-N 0.000 description 1
- UPQQXPKAYZYUKO-UHFFFAOYSA-N 2,2,2-trichloroacetamide Chemical group OC(=N)C(Cl)(Cl)Cl UPQQXPKAYZYUKO-UHFFFAOYSA-N 0.000 description 1
- QPLJYAKLSCXZSF-UHFFFAOYSA-N 2,2,2-trichloroethyl carbamate Chemical compound NC(=O)OCC(Cl)(Cl)Cl QPLJYAKLSCXZSF-UHFFFAOYSA-N 0.000 description 1
- NDVMCQUOSYOQMZ-UHFFFAOYSA-N 2,2-bis(trimethylsilyl)acetamide Chemical compound C[Si](C)(C)C(C(N)=O)[Si](C)(C)C NDVMCQUOSYOQMZ-UHFFFAOYSA-N 0.000 description 1
- GGIJWBBVZOLQRS-UHFFFAOYSA-N 2-[2-(tritylamino)-1,3-thiazol-4-yl]acetyl chloride Chemical compound ClC(=O)CC1=CSC(NC(C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=N1 GGIJWBBVZOLQRS-UHFFFAOYSA-N 0.000 description 1
- AOPRXJXHLWYPQR-UHFFFAOYSA-N 2-phenoxyacetamide Chemical group NC(=O)COC1=CC=CC=C1 AOPRXJXHLWYPQR-UHFFFAOYSA-N 0.000 description 1
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000004485 2-pyrrolidinyl group Chemical group [H]N1C([H])([H])C([H])([H])C([H])([H])C1([H])* 0.000 description 1
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- FMWHPEKDAPOYOE-UHFFFAOYSA-N 3-oxopentanamide Chemical group CCC(=O)CC(N)=O FMWHPEKDAPOYOE-UHFFFAOYSA-N 0.000 description 1
- 125000004575 3-pyrrolidinyl group Chemical group [H]N1C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001541 3-thienyl group Chemical group S1C([H])=C([*])C([H])=C1[H] 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- KDDQRKBRJSGMQE-UHFFFAOYSA-N 4-thiazolyl Chemical compound [C]1=CSC=N1 KDDQRKBRJSGMQE-UHFFFAOYSA-N 0.000 description 1
- CWDWFSXUQODZGW-UHFFFAOYSA-N 5-thiazolyl Chemical group [C]1=CN=CS1 CWDWFSXUQODZGW-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical group NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 150000001204 N-oxides Chemical class 0.000 description 1
- 229930182555 Penicillin Natural products 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- MEMUCXUKCBNISQ-UHFFFAOYSA-N acetonitrile;trifluoroborane Chemical compound CC#N.FB(F)F MEMUCXUKCBNISQ-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004659 aryl alkyl thio group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000003704 aspartic acid Nutrition 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000004619 benzopyranyl group Chemical group O1C(C=CC2=C1C=CC=C2)* 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000649 benzylidene group Chemical group [H]C(=[*])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 150000001638 boron Chemical class 0.000 description 1
- YMEKEHSRPZAOGO-UHFFFAOYSA-N boron triiodide Chemical compound IB(I)I YMEKEHSRPZAOGO-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- UOCJDOLVGGIYIQ-PBFPGSCMSA-N cefatrizine Chemical group S([C@@H]1[C@@H](C(N1C=1C(O)=O)=O)NC(=O)[C@H](N)C=2C=CC(O)=CC=2)CC=1CSC=1C=NNN=1 UOCJDOLVGGIYIQ-PBFPGSCMSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- VXIVSQZSERGHQP-UHFFFAOYSA-N chloroacetamide Chemical group NC(=O)CCl VXIVSQZSERGHQP-UHFFFAOYSA-N 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 125000004129 indan-1-yl group Chemical group [H]C1=C([H])C([H])=C2C(=C1[H])C([H])([H])C([H])([H])C2([H])* 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- FHRGIAKOFZNSTI-UHFFFAOYSA-N n-carbamoylpiperidine-1-carboxamide Chemical group NC(=O)NC(=O)N1CCCCC1 FHRGIAKOFZNSTI-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Chemical group 0.000 description 1
- 125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 description 1
- 125000000636 p-nitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)[N+]([O-])=O 0.000 description 1
- 150000002960 penicillins Chemical group 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- BSCCSDNZEIHXOK-UHFFFAOYSA-N phenyl carbamate Chemical compound NC(=O)OC1=CC=CC=C1 BSCCSDNZEIHXOK-UHFFFAOYSA-N 0.000 description 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical group C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000004483 piperidin-3-yl group Chemical group N1CC(CCC1)* 0.000 description 1
- 125000004482 piperidin-4-yl group Chemical group N1CCC(CC1)* 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- OVARTBFNCCXQKS-UHFFFAOYSA-N propan-2-one;hydrate Chemical compound O.CC(C)=O OVARTBFNCCXQKS-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000002206 pyridazin-3-yl group Chemical group [H]C1=C([H])C([H])=C(*)N=N1 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000246 pyrimidin-2-yl group Chemical group [H]C1=NC(*)=NC([H])=C1[H] 0.000 description 1
- ADRDEXBBJTUCND-UHFFFAOYSA-N pyrrolizidine Chemical compound C1CCN2CCCC21 ADRDEXBBJTUCND-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Chemical group 0.000 description 1
- 239000011593 sulfur Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- XBXCNNQPRYLIDE-UHFFFAOYSA-N tert-butylcarbamic acid Chemical compound CC(C)(C)NC(O)=O XBXCNNQPRYLIDE-UHFFFAOYSA-N 0.000 description 1
- DPKBAXPHAYBPRL-UHFFFAOYSA-M tetrabutylazanium;iodide Chemical compound [I-].CCCC[N+](CCCC)(CCCC)CCCC DPKBAXPHAYBPRL-UHFFFAOYSA-M 0.000 description 1
- UQFSVBXCNGCBBW-UHFFFAOYSA-M tetraethylammonium iodide Chemical compound [I-].CC[N+](CC)(CC)CC UQFSVBXCNGCBBW-UHFFFAOYSA-M 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- RXMRGBVLCSYIBO-UHFFFAOYSA-M tetramethylazanium;iodide Chemical compound [I-].C[N+](C)(C)C RXMRGBVLCSYIBO-UHFFFAOYSA-M 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 150000007970 thio esters Chemical group 0.000 description 1
- 125000003396 thiol group Chemical class [H]S* 0.000 description 1
- VYGSFTVYZHNGBU-UHFFFAOYSA-N trichloromethanesulfonic acid Chemical compound OS(=O)(=O)C(Cl)(Cl)Cl VYGSFTVYZHNGBU-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Cephalosporin Compounds (AREA)
Description
【発明の詳細な説明】
<産業上の利用分野>
本発明はセフアロスポリン誘導体の製造法に関
する。さらに詳しくは本発明はセフアロスポリン
系抗生物質の中間体として有用は化合物の製造法
に関する。すなわちセフアロスポリン化合物の3
位メチル基に種々の求核性残基を導入するための
中間体として有用な3−ヨードメチルセフアロス
ポリン化合物の製造法に関するものである。DETAILED DESCRIPTION OF THE INVENTION <Industrial Field of Application> The present invention relates to a method for producing cephalosporin derivatives. More specifically, the present invention relates to a method for producing compounds useful as intermediates for cephalosporin antibiotics. i.e. 3 of the cephalosporin compounds.
The present invention relates to a method for producing a 3-iodomethylcephalosporin compound useful as an intermediate for introducing various nucleophilic residues into the methyl group.
<従来技術とその問題点>
従来、3−アシルオキシメチルセフアロスポリ
ン化合物から3−ヨードメチルセフアロスポリン
化合物を得る方法としては、例えば特開昭57−
126492号公報に記載されている如く、硫酸,スル
ホン酸等の強酸とNaI等のヨウ化水素酸の塩を用
いる方法が知られている。しかしながらかかる方
法で、収率よく目的の3−ヨードメチル体を得る
ためには、例えば高価なトリクロロメタンスルホ
ン酸をかなり過剰に用いる必要があるなど必ずし
も経済的な方法ではなく、さらに出発物質の3−
アシルオキシメチルセフアロスポリン化合物の7
位は実質的に遊離のアミンであることが必要であ
り、使用する原料化合物に制限がある。一方特公
昭57−13553号公報には3−アシルオキシメチル
セフアロスポリン化合物に3−ハロゲン化ホウ素
を作用させて3−ハロメチルセフアロスポリン化
合物を製造する方法が記載されているが、3−ヨ
ードメチルセフアロスポリンを得るためには、3
−ヨウ化ホウ素の調製が必要であり〔文献アンゲ
バンテ・ケミー〔Augew.Chem.),69,P478
(1957)〕工業的に有利な方法とは言い難い。<Prior art and its problems> Conventionally, as a method for obtaining a 3-iodomethylcephalosporin compound from a 3-acyloxymethylcephalosporin compound, for example, JP-A-57-
As described in Japanese Patent No. 126492, a method using a strong acid such as sulfuric acid or sulfonic acid and a salt of hydroiodic acid such as NaI is known. However, in order to obtain the desired 3-iodomethyl compound in good yield, this method is not necessarily economical, as it is necessary to use expensive trichloromethanesulfonic acid in considerable excess, and furthermore, the starting material 3-iodomethyl compound must be used in considerable excess.
7 of Acyloxymethylcephalosporin Compounds
The amine must be substantially free, and there are restrictions on the raw material compounds to be used. On the other hand, Japanese Patent Publication No. 57-13553 describes a method for producing 3-halomethylcephalosporin compounds by reacting 3-acyloxymethylcephalosporin compounds with 3-halogenated boron. To obtain methylcephalosporin, 3
- It is necessary to prepare boron iodide [Ref. Augew. Chem., 69 , p. 478]
(1957)] cannot be called an industrially advantageous method.
<発明の目的>
本発明者等は3−アシルオキシセフアロスポリ
ン化合物から3−ヨードメチルセフアロスポリン
化合物をさらに工業的に有利な方法で製造する方
法を種々検討した結果、3−アシルオキシセフア
ロスポリン化合物に、3−フツ化ホウ素の存在下
に、ヨウ化水素酸またはその塩を反応せしめるこ
とにより、3−ヨードメチルセフアロスポリン化
合物が工業的に有利に得ることを見出し本発明の
到達したものである。<Object of the Invention> The present inventors have investigated various methods for producing 3-iodomethylcephalosporin compounds from 3-acyloxycephalosporin compounds in an industrially advantageous manner, and as a result, the inventors have developed 3-acyloxycephalosporin compounds. The present invention has been achieved by discovering that a 3-iodomethylcephalosporin compound can be industrially advantageously obtained by reacting the compound with hydroiodic acid or a salt thereof in the presence of 3-boron fluoride. It is.
<発明の開示>
本発明は下記式〔〕
〔式中、R1はアミノ基,保護されたアミノ基、
またはアシルアミノ基を表わし、R2はアシルオ
キシ基を表わす。〕
で表わされる3−アシルオキシメチルセフアロス
ポリン化合物またはその塩またはそのエステル
に、3−フツ化ホウ素の存在下に、ヨウ化水素酸
またはその塩を反応せしめることを特徴とする下
記式〔〕
〔式中、R1は上記定義に同じ。〕
で表わされる3−ヨードメチルセフアロスポリン
化合物またはその塩またはそのエステルの製造法
である。<Disclosure of the invention> The present invention is based on the following formula [] [In the formula, R 1 is an amino group, a protected amino group,
or represents an acylamino group, and R 2 represents an acyloxy group. ] The following formula [], which is characterized by reacting a 3-acyloxymethylcephalosporin compound represented by the formula, a salt thereof, or an ester thereof with hydroiodic acid or a salt thereof in the presence of 3-boron fluoride. [In the formula, R 1 is the same as the above definition. ] This is a method for producing a 3-iodomethylcephalosporin compound, a salt thereof, or an ester thereof.
本発明の出発物質である式〔〕の化合物にお
けるR1はアミノ基,保護されたアミノ基または
アシルアミノ基を示すが、通常は最も簡便な遊離
のアミノ基のまま反応に供せられる。しかし、該
アミノ基は適当な保護基で保護されていても良い
し、アシル基でアシル化されていても良い。かか
る保護基としては有機合成反応で一般にアミノ基
に用いられる保護基があげられる。具体的な例と
しては、メチルカルバメート,p−フルオレニル
メチルカルバメート,2,2,2−トリクロルエ
チルカルバメート,t−ブチルカルバメート,フ
エニルカルバメート,ベンジルカルバメート,各
種置換ベンジルカルバメート,s−ベンジルカル
バメート等のカルバメート保護基;N′−ピペリ
ジニルカルボニルウレア,N′−p−トルエンス
ルホニルアミノカルボニルウレア等の尿素タイプ
保護基;ホルムアミド,アセトアミド,クロルア
セトアミド,トリクロロアセトアミド,フエニル
アセトアミド,フエノキシアセトアミド,置換N
−プロピオニルアセトアミド,ベンツアミド,フ
タルイミド等のアシルアミド保護基;N−アリー
ル,N−フエナシル,N−ベンジル,N−トリチ
ル,N−ベンジルオキシメチル等のN−置換アル
キル保護基;N−(N′,N′−ジメチルアミノメチ
レン),N,N′−イソプロピリデンジアミノ,N
−ベンジリデン等のイミノ基保護基;N−ニトロ
ン,N−オキシドやジフエニルホスフイン等の異
項原子保護基;トリメチルシリル等のシリル保護
基;トリフロロ酢酸,ギ酸,p−トルエンスルホ
ン酸等との塩などがあげられる。またアシルアミ
ノ基のアシル基としては上述の保護基として用い
られるものの他、セフアロスポリンの7位に抗菌
力増強等抗生物質本来の目的に用いられるアシル
基であつて良い。かかるアシル基としては例えば
これまで公知のペニシリンおよびセフアロスポリ
ンのそれぞれ6位および7位に用いられているも
のから選んでよい。この様なアシル基の例として
は、以下のものが挙げられる。 R 1 in the compound of formula [], which is the starting material of the present invention, represents an amino group, a protected amino group or an acylamino group, and is usually used as a free amino group, which is the simplest, for the reaction. However, the amino group may be protected with an appropriate protecting group or may be acylated with an acyl group. Examples of such protecting groups include those commonly used for amino groups in organic synthesis reactions. Specific examples include methyl carbamate, p-fluorenylmethyl carbamate, 2,2,2-trichloroethyl carbamate, t-butyl carbamate, phenyl carbamate, benzyl carbamate, various substituted benzyl carbamates, s-benzyl carbamate, etc. carbamate protecting groups; urea type protecting groups such as N'-piperidinylcarbonyl urea, N'-p-toluenesulfonylaminocarbonyl urea; formamide, acetamide, chloracetamide, trichloroacetamide, phenylacetamide, phenoxyacetamide, Substitution N
- Acylamide protecting groups such as propionylacetamide, benzamide, phthalimide; N-substituted alkyl protecting groups such as N-aryl, N-phenacil, N-benzyl, N-trityl, N-benzyloxymethyl; N-(N', N'-dimethylaminomethylene), N,N'-isopropylidenediamino, N
- Imino group protecting groups such as benzylidene; foreign atom protecting groups such as N-nitrone, N-oxide and diphenylphosphine; silyl protecting groups such as trimethylsilyl; salts with trifluoroacetic acid, formic acid, p-toluenesulfonic acid, etc. etc. In addition to the acyl group used as the above-mentioned protecting group, the acyl group of the acylamino group may be an acyl group used at the 7-position of cephalosporin for the original purpose of antibiotics, such as enhancing antibacterial activity. Such acyl groups may be selected from, for example, those used at the 6- and 7-positions of penicillins and cephalosporins, respectively, which are known so far. Examples of such acyl groups include the following.
(A) 式〔A〕
R3−CO− ………〔A〕
〔式中、R3は水素原子,アルキル,アリル
または複素環基を表わす。〕
で表わされる基。(A) Formula [A] R 3 -CO- ...... [A] [In the formula, R 3 represents a hydrogen atom, alkyl, allyl or a heterocyclic group. ] A group represented by .
(B) 式〔〕
〔式中、R4は水素原子,アミノ酸残基また
はアミノ基の保護基を表わす。R5はアルキル,
アリルまたは複素環基を表わす。〕
で表わされる塩。(B) Formula〔〕 [In the formula, R 4 represents a hydrogen atom, an amino acid residue, or a protecting group for an amino group. R 5 is alkyl,
Represents an allyl or heterocyclic group. ] Salt expressed as .
(C) 式〔〕
〔式中、R6はアリル又は複素還基,nは0
〜2の整数を表わす。R5は上記定義に同じ。〕
で表わされる基。(C) Formula〔〕 [In the formula, R 6 is allyl or a heterocyclic group, n is 0
Represents an integer between ~2. R 5 is the same as defined above. ] A group represented by .
(D) 式〔D〕
〔式中、R7はアルキル,アリルまたは複素
環基を表わす。R8は水素原子またはアルキル
を表わす。〕
で表わされる基。(D) Formula [D] [In the formula, R 7 represents an alkyl, allyl or heterocyclic group. R 8 represents a hydrogen atom or alkyl. ] A group represented by .
(E) 式〔E〕
〔式中、R7は上記定義に同じ。R9はアルキ
レンまたはアルケニレンを表わす。R10はアリ
ル,複素環基,カルボキシルもしくはそのエス
テル、またはモノもしくはジアルキルアミノ基
を表わす。(E) Formula [E] [In the formula, R 7 is the same as the above definition. R 9 represents alkylene or alkenylene. R 10 represents allyl, a heterocyclic group, carboxyl or an ester thereof, or a mono- or dialkylamino group.
で表わされる基。A group represented by
(F) 式〔F〕
〔式中、R11は水素原子またはカルボキシル
基の保護基を表わす。R7は上記定義に同じ。〕
(G) 式〔G〕
〔式中、R7は上記定義に同じ。〕
で表わされる基。(F) Formula [F] [In the formula, R 11 represents a hydrogen atom or a protecting group for a carboxyl group. R 7 is the same as the above definition. ] (G) Formula [G] [In the formula, R 7 is the same as the above definition. ] A group represented by .
(H) 式〔H〕
R12−R13−CH2−CO− ………〔H〕
〔式中、R12はシアノ,アリル,フエノキ
シ,アルキル,アシルオキシ,アルケニルまた
は複素環基を表わす。R13は単なる結合手また
は−S−を表わす。〕
で表わされる基。(H) Formula [H] R 12 -R 13 -CH 2 -CO- ...... [H] [In the formula, R 12 represents cyano, allyl, phenoxy, alkyl, acyloxy, alkenyl or a heterocyclic group. R 13 represents a simple bond or -S-. ] A group represented by .
式〔A〕〜〔H〕のR3,R5,R7,R8,R12に
おけるアルキルとしては、直鎖状または分枝状の
炭素数1〜6のアルキルがよく、例えばメチル,
エチル,n−プロピル,iso−プロピル,n−ブ
チル,iso−ブチル,sec−ブチル,tert−ブチル,
n−ペンチル,iso−ペンチル,n−ヘキシル,
イソヘキシルなどが挙げられる。R12のアルケニ
ルとしては、例えばビニール,アリール,イソプ
ロペニルなどが挙げられる。R3,R5,R6,R7,
R10の複素環基としては、窒素,酸素,硫黄など
のヘテロ原子を1〜数個含む5〜8員数またはそ
の縮合環などで炭素原子に結合手を有するものが
用いられ、たとえば2−または3−フリル,2−
アミノチアゾール,2−アミノ−3,5−チアゾ
ール,2−または3−チエニル,2−または3−
ピロリジニル,2−,3−または4−ピリジル,
N−オキシド−2−,3−または4−ピリジル,
2−,3−または4−ピペリジニル,2−,3−
または4−ピラニル,2−,3−または4−チオ
ピラニル,ピラジニル,2−,4−または5−チ
アゾリル,2−,4−または5−オキサゾリル,
3−,4−または5−イソチアゾリル,3−,4
−または5−イソオキサゾリル,2−,4−また
は5−イミダゾリル,3−,4−または5−ピラ
ゾリル,3−または4−ピリダジニル,N−オキ
シド−3−または4−ピリダジニル,2−,4−
または5−ピリミジニル,N−オキシド−3−,
4−または5−ピリミジニル,ピペラジニル,4
−または5−(1,2,3−チアジアゾリル),3
−または5−(1,2,4−チアジアゾリル),
1,3,4−チアジアゾリル,1,2,5−チア
ジアゾリル,4−または5−(1,2,3−オキ
サジアゾリル),3−または5−(1,2,4−オ
キサジアゾリル),1,3,4−オキサジアゾリ
ル,1,2,5−オキサジアゾリル,1,2,3
−または1,2,4−トリアゾリル,1Hまたは
2H−テトラゾリル,ピリド〔2,3−d〕ピリ
ミジル,ベンゾピラニル,1,3−,1,5−,
1,6−,1,7−,2,7−または2,6−ナ
フチリジル,キノリル,チエノ(2,3−b〕ピ
リジルなどがあげられる。 The alkyl in R 3 , R 5 , R 7 , R 8 , R 12 in formulas [A] to [H] is preferably a straight-chain or branched alkyl having 1 to 6 carbon atoms, such as methyl,
Ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, sec-butyl, tert-butyl,
n-pentyl, iso-pentyl, n-hexyl,
Examples include isohexyl. Examples of alkenyl for R 12 include vinyl, aryl, isopropenyl, and the like. R 3 , R 5 , R 6 , R 7 ,
As the heterocyclic group for R10 , a 5- to 8-membered ring containing one to several heteroatoms such as nitrogen, oxygen, and sulfur, or a condensed ring thereof having a bond on a carbon atom is used, such as a 2- or 3- frill, 2-
aminothiazole, 2-amino-3,5-thiazole, 2- or 3-thienyl, 2- or 3-
pyrrolidinyl, 2-, 3- or 4-pyridyl,
N-oxide-2-, 3- or 4-pyridyl,
2-, 3- or 4-piperidinyl, 2-, 3-
or 4-pyranyl, 2-, 3- or 4-thiopyranyl, pyrazinyl, 2-, 4- or 5-thiazolyl, 2-, 4- or 5-oxazolyl,
3-,4- or 5-isothiazolyl, 3-,4
- or 5-isoxazolyl, 2-, 4- or 5-imidazolyl, 3-, 4- or 5-pyrazolyl, 3- or 4-pyridazinyl, N-oxide-3- or 4-pyridazinyl, 2-, 4-
or 5-pyrimidinyl, N-oxide-3-,
4- or 5-pyrimidinyl, piperazinyl, 4
- or 5-(1,2,3-thiadiazolyl),3
- or 5-(1,2,4-thiadiazolyl),
1,3,4-thiadiazolyl, 1,2,5-thiadiazolyl, 4- or 5-(1,2,3-oxadiazolyl), 3- or 5-(1,2,4-oxadiazolyl), 1,3, 4-oxadiazolyl, 1,2,5-oxadiazolyl, 1,2,3
- or 1,2,4-triazolyl, 1H or
2H-tetrazolyl, pyrido[2,3-d]pyrimidyl, benzopyranyl, 1,3-,1,5-,
Examples include 1,6-, 1,7-, 2,7- or 2,6-naphthyridyl, quinolyl, thieno(2,3-b]pyridyl and the like.
R3,R5,R6,R7,R10,R12のアリルとしては
フエニル,α−ナフチル,β−ナフチル,ビフエ
ニル,アントリルなどがあげられる。 Examples of allyl of R 3 , R 5 , R 6 , R 7 , R 10 and R 12 include phenyl, α-naphthyl, β-naphthyl, biphenyl, anthryl and the like.
R9のアルキレンとしては、例えばメチレン,
エチレン,トリメチレン,テトラメチレンなどが
あげられる。 Examples of alkylene for R 9 include methylene,
Examples include ethylene, trimethylene, and tetramethylene.
R9のアルケニレンとしては、例えばビニレン,
イソプロペニレンなどが挙げられる。 Examples of alkenylene for R 9 include vinylene,
Examples include isopropenylene.
これらアルキル,アルケニル,アリル,複素環
基,アルキレン,アルケニレンには1個または複
数個の同一もしくは異なる種類の置換基を有して
いても良いが、かかる置換基としては、例えばア
ルキル,アルコキシ,アルケニル,アリル,アラ
ルキル,メルカプト,アルキルチオ,アリルチ
オ,アラルキルチオ,アルキルスルホニル,アリ
ルスルホニル,ヒドロキシ,オキソ,チオキソ,
ハロゲン,ニトロ,アミノ,モノアルキルアミ
ノ,ジアルキルアミノ,アシルアミノ,シアノ,
カルバモイル,カルバモイルオキシ,カルボキ
シ,アシル,アシルオキシ,置換アルキルなどが
用いられる。 These alkyls, alkenyls, allyls, heterocyclic groups, alkylenes, and alkenylenes may have one or more substituents of the same or different types, such as alkyls, alkoxys, alkenyls, etc. , allyl, aralkyl, mercapto, alkylthio, allylthio, aralkylthio, alkylsulfonyl, allylsulfonyl, hydroxy, oxo, thioxo,
Halogen, nitro, amino, monoalkylamino, dialkylamino, acylamino, cyano,
Carbamoyl, carbamoyloxy, carboxy, acyl, acyloxy, substituted alkyl, etc. are used.
R4のアミノ酸残基としては、例えばグリシン,
アラニン,アスパラギン酸などのアミノ酸の残基
が挙げられる。 Examples of the amino acid residue of R4 include glycine,
Examples include amino acid residues such as alanine and aspartic acid.
R4のアミノ基の保護基としては、例えばトリ
クロロエトキシカルボニル,ベンジルオキシカル
ボニル,p−トルエンスルホニル,トリチル,ホ
ルミルなどが挙げられる。 Examples of the protecting group for the amino group of R 4 include trichloroethoxycarbonyl, benzyloxycarbonyl, p-toluenesulfonyl, trityl, and formyl.
R10のカルボキシルのエステルとしては、例え
ばメトキシカルボニル,エトキシカルボニル,n
−ブトキシカルボニルなどのエステルが挙げられ
る。 Examples of carboxyl esters of R10 include methoxycarbonyl, ethoxycarbonyl, n
-butoxycarbonyl and other esters.
R10のモノアルキルアミノ基としては、例えば
メチルアミノ,エチルアミノ,n−プロピルアミ
ノ基などが挙げられ、ジアルキルアミノ基として
は、例えばジメチルアミノ,ジエチルアミノ,ジ
−n−プロピルアミノ基などが挙げられる。 Examples of the monoalkylamino group of R10 include methylamino, ethylamino, n-propylamino groups, etc., and examples of the dialkylamino group include dimethylamino, diethylamino, di-n-propylamino groups, etc. .
R11のカルボキシル基の保護基としては、例え
ばメチル,エチル,プロピルなどのアルキル基な
どが挙げられる。 Examples of the protecting group for the carboxyl group of R 11 include alkyl groups such as methyl, ethyl, and propyl.
R12のアシルオキシ基としては、例えばアセチ
ルオキシ,プロピオニルオキシ,ブチリルオキ
シ,バレリルオキシ基などが挙げられる。 Examples of the acyloxy group for R 12 include acetyloxy, propionyloxy, butyryloxy, and valeryloxy groups.
式〔〕の化合物におけるR2はアシルオキシ
基であり通常はセフアロスポリン系抗生物質の基
礎原料であるセフアロスポリンC由来のアセトキ
シ基が最も普通に用いられる。他のアシルオキシ
基としては、例えばトリフルオロアセチルオキ
シ,トリクロロアセチルオキシ,プロピオニルオ
キシ,3−カルボキシプロピオニルオキシ,3−
エトキシカルバモイルオキシ基などが挙げられ
る。 R 2 in the compound of formula [] is an acyloxy group, and the acetoxy group derived from cephalosporin C, which is the basic raw material for cephalosporin antibiotics, is most commonly used. Other acyloxy groups include, for example, trifluoroacetyloxy, trichloroacetyloxy, propionyloxy, 3-carboxypropionyloxy, 3-
Examples include ethoxycarbamoyloxy group.
本発明の出発物質である式〔〕の化合物の4
位は通常遊離のカルボン酸のまま反応に供せられ
るが、該カルボキシル基は塩またはエステル化さ
れていてもさしつかえない。塩としてはナトリウ
ム,カリウム,リチウム等のアルカリ金属塩;ア
ンモニウムトリアルキルアンモニウム等有機アミ
ン塩があげられる。エステルとしては反応に不活
性で通常有機化学の分野でカルボキシル基の保護
基として用いられるもので利用できる。例えばメ
チル,エチル,n−プロピル,イソプロピル,t
−ブチル,t−アミル,ベンジル,p−ニトロベ
ンジル,p−メトキシベンジル,ベンツヒドリ
ル,1−インダニル,フエナンシ,フエニル,p
−ニトロフエニル,メトキシメチル,ベンジルオ
キシメチル,テトラヒドロピラニル,ジアシルメ
チル,222−トリクロルエチル,2−トリメチル
シリルエチル,2−メチルチオエチル,2−(p
−トルエンスルホニル)エチル,トリメチルシリ
ル,t−ブチルジメチルシリル,s−t−ブチ
ル,s−フエニル,s−2−ピリジル等のエステ
ル残基;トリメチルシリル,t−ブチルジメチル
シリルなどのシリル基;チオエステル基などが用
いられる。 4 of the compound of formula [] which is the starting material of the present invention
The carboxylic acid position is usually used in the reaction as a free carboxylic acid, but the carboxyl group may be salted or esterified. Examples of the salt include alkali metal salts such as sodium, potassium, and lithium; and organic amine salts such as ammonium trialkylammonium. As the ester, it is inert to the reaction and is commonly used as a protecting group for carboxyl groups in the field of organic chemistry. For example, methyl, ethyl, n-propyl, isopropyl, t
-butyl, t-amyl, benzyl, p-nitrobenzyl, p-methoxybenzyl, benzhydryl, 1-indanyl, phenancy, phenyl, p
-nitrophenyl, methoxymethyl, benzyloxymethyl, tetrahydropyranyl, diacylmethyl, 222-trichloroethyl, 2-trimethylsilylethyl, 2-methylthioethyl, 2-(p
-Ester residues such as -toluenesulfonyl)ethyl, trimethylsilyl, t-butyldimethylsilyl, s-t-butyl, s-phenyl, s-2-pyridyl; silyl groups such as trimethylsilyl, t-butyldimethylsilyl; thioester groups, etc. is used.
本発明によれば上記原料物質〔〕を3−フツ
化ホウ素の存在下に、ヨウ化水素酸またはその塩
と反応せしめることにより目的とする式〔〕の
化合物を得ることができる。ヨウ化水素酸の塩と
しては、ヨウ化リチウム,ヨウ化ナトリウム,ヨ
ウ化カリウム等アルカリ金属塩;ヨウ化テトラメ
チルアンモニウム,ヨウ化テトラエチルアンモニ
ウム,ヨウ化テトラn−ブチルアンモニウム等の
有機アンモニウム塩が挙げられる。これらヨウ化
水素酸またはその塩の用いる量は通常、原料物質
()に対し等モルもしくはやや過剰に用いられ
る。 According to the present invention, the target compound of formula [] can be obtained by reacting the above-mentioned raw material [] with hydroiodic acid or a salt thereof in the presence of 3-boron fluoride. Examples of salts of hydroiodic acid include alkali metal salts such as lithium iodide, sodium iodide, and potassium iodide; organic ammonium salts such as tetramethylammonium iodide, tetraethylammonium iodide, and tetra-n-butylammonium iodide. It will be done. The amount of hydroiodic acid or its salt used is usually equimolar or slightly excessive based on the raw material ().
もう一方の反応試薬である3−フツ化ホウ素は
無水遊離系のままでも、エチルエーテルなどのエ
ーテル,メタノール,エタノールなどのアルコー
ル,酢酸,トリフルオロ酢酸,プロピオン酸など
の有機酸、アセトニトリルなどのニトリルアミド
等の溶媒和物の形でも用いることができる。3−
フツ化ホウ素の原料物質(1)に対し用いる量は通常
0.5〜5倍モル、好ましくは1〜4倍モル用いら
れる。 The other reaction reagent, 3-boron fluoride, can be used as an anhydrous free system or as an ether such as ethyl ether, an alcohol such as methanol or ethanol, an organic acid such as acetic acid, trifluoroacetic acid, or propionic acid, or a nitrile such as acetonitrile. It can also be used in the form of solvates such as amides. 3-
The amount used for boron fluoride raw material (1) is usually
It is used in an amount of 0.5 to 5 times the mole, preferably 1 to 4 times the mole.
反応は通常溶媒中で加熱または冷却下に行なわ
れる。用いられる溶媒としてはアセトン,メチル
エチルケトン,アセトニトリル,テトラヒドロフ
ラン,ジオキサン,スルホラン,無水亜硫酸,ニ
トロベンゼン等があげられる。反応温度および時
間は用いる溶媒および3−フツ化ホウ素の用いる
溶媒和物の形に応じて適宜選択される。 The reaction is usually carried out in a solvent under heating or cooling. Examples of solvents used include acetone, methyl ethyl ketone, acetonitrile, tetrahydrofuran, dioxane, sulfolane, sulfite anhydride, and nitrobenzene. The reaction temperature and time are appropriately selected depending on the solvent used and the form of the solvate of 3-boron fluoride used.
通常、反応温度は−10℃〜60℃であり、反応時
間は数分間〜数時間である。 Usually, the reaction temperature is -10°C to 60°C, and the reaction time is several minutes to several hours.
反応後の後処理は、次のようにして行なわれ
る。反応混合物に対して溶解度の低い非溶媒例え
ばエーテル,テトラヒドロフラン,ジオキサン等
に反応混合物を投入し、得られる固型物を分離
し、次いで固型物を再結晶,クロマトグラフイー
等の通常の精製手段に付すことにより目的とする
3−ヨードメチルセフアロスポリン化合物を単離
精製することができる。 Post-treatment after the reaction is carried out as follows. The reaction mixture is poured into a non-solvent with low solubility for the reaction mixture, such as ether, tetrahydrofuran, dioxane, etc., the resulting solid substance is separated, and then the solid substance is purified by ordinary purification methods such as recrystallization and chromatography. The desired 3-iodomethylcephalosporin compound can be isolated and purified.
以下、この発明を実施例により説明する。 This invention will be explained below with reference to Examples.
実施例 1
7−アミノセフアロスポラン酸2.72g
(10mmol)、ヨウ化ナトリウム1.5g(10mmol)
のアセトニトリル15mlの混合物に3−フツ化ホウ
素のアセトニトリル溶液5ml(30mmol)を氷冷
下で加え、30℃で15分間撹拌する。この溶液をエ
ーテル100ml中へ分散させ、析出した沈殿を取
減圧乾燥し、黄土色の7−アミノ−3−ヨードメ
チル−セフエム−4−カルボン酸を65%の収率で
得た。Example 1 2.72 g of 7-aminocephalosporanic acid
(10mmol), sodium iodide 1.5g (10mmol)
Add 5 ml (30 mmol) of a solution of 3-boron fluoride in acetonitrile to a mixture of 15 ml of acetonitrile under ice cooling, and stir at 30°C for 15 minutes. This solution was dispersed in 100 ml of ether, and the precipitate precipitated was dried under reduced pressure to obtain ocher-colored 7-amino-3-iodomethyl-cephem-4-carboxylic acid in a yield of 65%.
N.M.R.(DCl)δ:
5.39(d,1H,J=5Hz),5.18(d,1H,J=
5Hz),4.54(s,2H),3.80(brm,2H)
I.R.(ヌジヨール):
1775cm-1
実施例 2
7−アミノセフアロスポラン酸2.72g
(10mmol)、ヨウ化ナトリウム1.5g(10mmol)
のアセトニトリル15mlの混合物に、3−フツ化ホ
ウ素エーテラート4.26g(30mmol)を氷冷下で
加え、40℃で4時間撹拌する。この溶液を同様に
処理し黄土色の7−アミノ−3−ヨードメチル−
セフエム−4−カルボン酸を32%の収率で得た。 NMR (DCl) δ: 5.39 (d, 1H, J = 5Hz), 5.18 (d, 1H, J =
5Hz), 4.54 (s, 2H), 3.80 (brm, 2H) IR (Nudiyol): 1775cm -1 Example 2 7-Aminocephalosporanic acid 2.72g
(10mmol), sodium iodide 1.5g (10mmol)
To a mixture of 15 ml of acetonitrile was added 4.26 g (30 mmol) of 3-fluoroboron etherate under ice cooling, and the mixture was stirred at 40°C for 4 hours. This solution was treated in the same manner to give an ocher-colored 7-amino-3-iodomethyl-
Cefem-4-carboxylic acid was obtained with a yield of 32%.
実施例 3
7−アミノセフアロスポラン酸2.72g
(10mmol)のアセトニトリル15mlの混合物に3
−フツ化ホウ素のアセトニトリル溶液5ml
(30mmol)を氷冷下で加え30℃で15分間撹拌す
る。この溶液を同様に処理し、黄土色の7−アミ
ノ−3−ヨードメチル−セフエム−4−カルボン
酸を62%の収率で得た。Example 3 7-aminocephalosporanic acid 2.72g
(10 mmol) in a mixture of 15 ml of acetonitrile
-5 ml of boron fluoride acetonitrile solution
(30 mmol) was added under ice-cooling and stirred at 30°C for 15 minutes. This solution was treated in the same manner to obtain ocher-colored 7-amino-3-iodomethyl-cephem-4-carboxylic acid in a yield of 62%.
実施例 4
7−アミノセフアロスポラン2.72g、ヨウ化ナ
トリウム1.5gのアセトン15mlの混合物に三フツ
化ホウ素のアセトン溶液5ml(30mmol)を氷冷
下で加え、30℃で15分間撹拌する。この溶液を同
様に処理し、黄土色の7−アミノ−3−ヨードメ
チル−セフエム−4−カルボン酸を53%の収率で
得た。Example 4 5 ml (30 mmol) of an acetone solution of boron trifluoride is added to a mixture of 2.72 g of 7-aminocephalosporan, 1.5 g of sodium iodide and 15 ml of acetone under ice cooling, and the mixture is stirred at 30°C for 15 minutes. This solution was treated in the same manner to obtain ocher-colored 7-amino-3-iodomethyl-cephem-4-carboxylic acid in a yield of 53%.
実施例 5
(6R,7R)−7−〔(Z)−2−(2−ビストリ
メチルシリルアミノチアゾール−4−イル)−2
−メトキシイミノアセトアミド〕−3−アセトキ
シメチル−3−セフエム−4−カルボン酸3.0g、
ヨウ化ナトリウム0.75gのアセトニトリル15mlの
混合物に三フツ化ホウ素のアセトニトリル溶液5
mlも氷冷下で加え、40℃,15分間撹拌した。反応
後実施例1と同様の処理をして、(6R,7R)−7
−〔(Z)−2−(2−ビストリメチルシリルアミノ
チアゾール−4−イル)−2−メトキシイミノア
セトアミド〕−3−ヨードメチル−3−セフエム
−4−カルボキシレート1.40g(収率41%)を得
た。Example 5 (6R,7R)-7-[(Z)-2-(2-bistrimethylsilylaminothiazol-4-yl)-2
-Methoxyiminoacetamide]-3-acetoxymethyl-3-cephem-4-carboxylic acid 3.0 g,
A solution of boron trifluoride in acetonitrile in a mixture of 0.75 g of sodium iodide and 15 ml of acetonitrile
ml was added under ice-cooling, and the mixture was stirred at 40°C for 15 minutes. After the reaction, the same treatment as in Example 1 was carried out to obtain (6R,7R)-7.
-[(Z)-2-(2-bistrimethylsilylaminothiazol-4-yl)-2-methoxyiminoacetamide]-3-iodomethyl-3-cephem-4-carboxylate 1.40 g (yield 41%) was obtained. Ta.
実施例 6
(6R,7R)−7−〔(Z)−2−(2−ビストリ
チルアミノチアゾール−4−イル)−2−(2−メ
トキシカルボニルプロピル−2−イルオキシイミ
ノ)アセトアミド〕−3−アセトキシメチル−3
−セフエム−4−カルボン酸3.36g、ヨウ化ナト
リウム0.75gのアセトニトリル15mlの混合物に三
フツ化ホウ素のアセトニトリル溶液5mlを氷冷下
で加え、40℃,15分間撹拌した。反応後実施例1
と同様の処理をして、(6R,7R)−7−〔(Z)−
2−(2−ビストリメチルシリルアミノチアゾー
ル−4−イル)−2−メトキシカルボニルプロピ
ル−2−イルオキシイミノ)アセトアミド〕−3
−ヨードメチル−3−セフエム−4−カルボン酸
1.44g(収率38%)を得た。Example 6 (6R,7R)-7-[(Z)-2-(2-bistritylaminothiazol-4-yl)-2-(2-methoxycarbonylpropyl-2-yloxyimino)acetamide]-3 -acetoxymethyl-3
To a mixture of 3.36 g of -cephem-4-carboxylic acid and 0.75 g of sodium iodide in 15 ml of acetonitrile, 5 ml of a solution of boron trifluoride in acetonitrile was added under ice cooling, and the mixture was stirred at 40°C for 15 minutes. Post-reaction Example 1
Perform the same process as (6R, 7R)-7-[(Z)-
2-(2-bistrimethylsilylaminothiazol-4-yl)-2-methoxycarbonylpropyl-2-yloxyimino)acetamide]-3
-iodomethyl-3-cephem-4-carboxylic acid
1.44 g (yield 38%) was obtained.
参考例
実施例により得られた7−アミノ−3−ヨード
メチル−セフエム−4−カルボン酸3.4gをアセ
トニトリル50mlに懸濁し、ビストリメチルシリル
アセトアミド7.5gを室温で加え、さらに1時間
撹拌した後、−20℃に冷却して、1−アザビシク
ロ〔3,3,0〕オクタン1.0gをゆつくり加え
て同温度で1時間撹拌し、7−ビストリメチルシ
リルアミノ−3−(1−アザビシクロ〔3,3,
0〕オクタン−1−イオ)メチル−3−セフエム
−4−カルボン酸のトリメチルシリルエステルの
アセトニトリル溶液を調製した。別途(Z)−2
−ヒドロキシイミノ−2−(2−トリチルアミノ
チアゾール−4−イル)酢酸4.2gを50mlのジク
ロルメタン中、2.1gのPCl5と室温で反応せしめ
て(Z)−2−ヒドロキシイミノ−2−(2−トリ
チルアミノチアゾール−4−イル)酢酸クロライ
ドの溶液を調製し、これを上記溶酸に室温で加え
て反応せしめた。室温で1時間撹拌した後、減圧
下に溶媒を留去し残渣として泡状固体13.5gを得
た。Reference Example 3.4 g of 7-amino-3-iodomethyl-cephem-4-carboxylic acid obtained in Example was suspended in 50 ml of acetonitrile, 7.5 g of bistrimethylsilylacetamide was added at room temperature, and after further stirring for 1 hour, -20 ℃, slowly added 1.0 g of 1-azabicyclo[3,3,0]octane and stirred at the same temperature for 1 hour to obtain 7-bistrimethylsilylamino-3-(1-azabicyclo[3,3,
0] An acetonitrile solution of trimethylsilyl ester of octane-1-io)methyl-3-cephem-4-carboxylic acid was prepared. Separately (Z)-2
4.2 g of -hydroxyimino-2-(2-tritylaminothiazol-4-yl)acetic acid was reacted with 2.1 g of PCl 5 in 50 ml of dichloromethane at room temperature to give (Z)-2-hydroxyimino-2-(2 A solution of (tritylaminothiazol-4-yl) acetic acid chloride was prepared, and this solution was added to the above solution acid at room temperature to react. After stirring at room temperature for 1 hour, the solvent was distilled off under reduced pressure to obtain 13.5 g of foamy solid as a residue.
泡状固形を200mlのジメチルスルホキシドに溶
解し、ヨードメチル2.0mlおよび炭酸カリ5.5gの
混合物を室温にて2日間撹拌した。反応後、水
750mlに注いで、生成した沈澱物を過しさい
を10%の水を含むトリフルオロ酢酸50mlに入れ
て、室温で3時間激しく撹拌した。反応液を500
mlのジエチルエーテル中に注いで、生成する沈澱
を過によつて集めアセトンで洗浄した後、乾燥
した。 The foamy solid was dissolved in 200 ml of dimethyl sulfoxide, and a mixture of 2.0 ml of iodomethyl and 5.5 g of potassium carbonate was stirred at room temperature for 2 days. After reaction, water
The resulting precipitate was poured into 50 ml of trifluoroacetic acid containing 10% water and stirred vigorously for 3 hours at room temperature. 500ml of reaction solution
The resulting precipitate was collected by filtration, washed with acetone, and dried.
沈澱物を40℃の水100mlでよくリスラリーして
後過する方法で抽出し、抽出液を濃縮しHP−
20イオン交換樹脂カラムで水−アセトン混合溶媒
を用いてアセトンの量比を0〜40%まで順次増し
つつ精製した。標記化合物を主として含む留分か
ら430mgの固形物が得られ、高速液体クロマトグ
ラフイーにより確認し、推定純度は41%であつ
た。 Extract the precipitate by thoroughly reslurrying the precipitate with 100 ml of water at 40°C and then filtering. Concentrate the extract and transfer to HP-
Purification was carried out in a 20 ion exchange resin column using a water-acetone mixed solvent while increasing the acetone ratio sequentially from 0 to 40%. 430 mg of solid material was obtained from the fraction mainly containing the title compound, and the estimated purity was 41% as confirmed by high performance liquid chromatography.
Claims (1)
またはアシルアミノ基を表わし、R2はアシルオ
キシ基を表わす。〕 で表わされる3−アシルオキシメチルセフアロス
ポリン化合物またはその塩またはそのエステル
に、3−フツ化ホウ素の存在下に、ヨウ化水素酸
またはその塩を反応せしめることを特徴とする下
記式〔〕 〔式中、R1は上記定義に同じ。〕 で表わされる3−ヨードメチルセフアロスポリン
化合物またはその塩またはそのエステルの製造
法。[Claims] 1. The following formula [] [In the formula, R 1 is an amino group, a protected amino group,
or represents an acylamino group, and R 2 represents an acyloxy group. ] The following formula [], which is characterized by reacting a 3-acyloxymethylcephalosporin compound represented by the formula, a salt thereof, or an ester thereof with hydroiodic acid or a salt thereof in the presence of 3-boron fluoride. [In the formula, R 1 is the same as the above definition. ] A method for producing a 3-iodomethylcephalosporin compound, a salt thereof, or an ester thereof.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15515185A JPS6216486A (en) | 1985-07-16 | 1985-07-16 | Production of 3-iodomethylcephalosporin compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15515185A JPS6216486A (en) | 1985-07-16 | 1985-07-16 | Production of 3-iodomethylcephalosporin compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6216486A JPS6216486A (en) | 1987-01-24 |
JPH043400B2 true JPH043400B2 (en) | 1992-01-23 |
Family
ID=15599647
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15515185A Granted JPS6216486A (en) | 1985-07-16 | 1985-07-16 | Production of 3-iodomethylcephalosporin compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6216486A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06345775A (en) * | 1993-06-04 | 1994-12-20 | Kyoto Yakuhin Kogyo Kk | Cephalosporin compound, its production and intermediate compound |
EP1681584B1 (en) | 2005-01-13 | 2009-09-09 | Aloka Co., Ltd. | Scintillator member and manufacturing method thereof, and radiation measuring device |
US8525120B2 (en) | 2007-08-14 | 2013-09-03 | Hitachi Aloka Medical, Ltd. | Radiation measuring device |
-
1985
- 1985-07-16 JP JP15515185A patent/JPS6216486A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6216486A (en) | 1987-01-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69531203T2 (en) | CEPHALOSPORINSYNTHESE | |
EP0019345A1 (en) | Process for the preparation of a (D-alpha-amino-(p-hydroxyphenyl)-acetamido) group containing cephalosporanic acid derivatives | |
EP0154417A2 (en) | 7-Amino-3-substituted-methyl-3-cephem-4-carboxylic acid and lower alkylsilyl derivatives thereof, and their production | |
JPH043400B2 (en) | ||
JP3434840B2 (en) | Manufacturing method of cephalosporin antibiotic | |
WO1991009037A1 (en) | Process for producing 3-substituted thio-3-cephem compound | |
EP0117872B1 (en) | Process for preparing cephalosporin compounds | |
KR890002107B1 (en) | Process for preparing cephalosporin derivatives | |
KR910005230B1 (en) | Process for producing azetidinones | |
JP2881746B2 (en) | New cephalosporin derivatives | |
US4959495A (en) | Process for the preparation of intermediates used to produce aminothiazoloximino cephalosporins | |
KR0129567B1 (en) | The process for preparation of cephalosporins | |
JP4616844B2 (en) | Production process of intermediates for use in the synthesis of cephalosporin | |
EP0081824B1 (en) | Processes for the production of antibiotic 1-oxadethiacephalosporins | |
JP3141041B2 (en) | Novel cephalosporin derivatives and their salts | |
CS203983B2 (en) | Method of preparing ester of 7-acylamido-3-methyl-3-cephem-4-carboxylic acid | |
JPS6043073B2 (en) | Method for producing cephalosporin compounds using new silylating agents | |
JPS643190B2 (en) | ||
JP2661810B2 (en) | Method for producing 7-amino-3-chloromethyl-3-cephem derivative | |
JP2920212B1 (en) | Method for producing 1,3-dioxolan-4-one compound | |
KR890004561B1 (en) | Process for preparing cepem derivatives | |
KR970005893B1 (en) | Process for preparing cephalosporin compounds | |
KR790001071B1 (en) | Process for preparing deacetoxy cephalosporins via penicillin sulfoxide rearrangement | |
US5066799A (en) | Intermediates for the preparation of aminothiazoloximino cephalosporins | |
US5026842A (en) | Process for preparing cephalosporin compounds |