JPH043320B2 - - Google Patents
Info
- Publication number
- JPH043320B2 JPH043320B2 JP57503005A JP50300582A JPH043320B2 JP H043320 B2 JPH043320 B2 JP H043320B2 JP 57503005 A JP57503005 A JP 57503005A JP 50300582 A JP50300582 A JP 50300582A JP H043320 B2 JPH043320 B2 JP H043320B2
- Authority
- JP
- Japan
- Prior art keywords
- aluminum
- phosphate
- coating
- particles
- alumina
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052782 aluminium Inorganic materials 0.000 description 99
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 94
- 238000000576 coating method Methods 0.000 description 67
- 239000000203 mixture Substances 0.000 description 67
- 239000002245 particle Substances 0.000 description 67
- 239000000758 substrate Substances 0.000 description 58
- 229910019142 PO4 Inorganic materials 0.000 description 54
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 54
- 235000021317 phosphate Nutrition 0.000 description 54
- 239000011248 coating agent Substances 0.000 description 52
- 238000000034 method Methods 0.000 description 49
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 49
- 239000010452 phosphate Substances 0.000 description 42
- 239000000243 solution Substances 0.000 description 41
- 239000002002 slurry Substances 0.000 description 38
- 239000000463 material Substances 0.000 description 34
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 29
- 239000010410 layer Substances 0.000 description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 26
- 239000000126 substance Substances 0.000 description 25
- 238000005530 etching Methods 0.000 description 23
- 229910044991 metal oxide Inorganic materials 0.000 description 22
- 150000004706 metal oxides Chemical class 0.000 description 21
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 20
- 238000010304 firing Methods 0.000 description 18
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 17
- 238000001354 calcination Methods 0.000 description 15
- 239000011777 magnesium Chemical class 0.000 description 14
- 230000008569 process Effects 0.000 description 14
- 238000005524 ceramic coating Methods 0.000 description 13
- 239000007864 aqueous solution Substances 0.000 description 12
- 239000011888 foil Substances 0.000 description 12
- 239000000395 magnesium oxide Substances 0.000 description 12
- -1 metal oxide orthophosphate Chemical class 0.000 description 12
- 239000012071 phase Substances 0.000 description 12
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 12
- 238000005299 abrasion Methods 0.000 description 11
- 239000000919 ceramic Substances 0.000 description 11
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 10
- 238000007792 addition Methods 0.000 description 10
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 238000011282 treatment Methods 0.000 description 10
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical class [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 9
- 238000007743 anodising Methods 0.000 description 9
- 239000011575 calcium Substances 0.000 description 9
- 229910052749 magnesium Chemical class 0.000 description 9
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 229910052791 calcium Inorganic materials 0.000 description 8
- 238000011065 in-situ storage Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 7
- 239000008199 coating composition Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 238000011161 development Methods 0.000 description 7
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 7
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- 239000000174 gluconic acid Substances 0.000 description 6
- 235000012208 gluconic acid Nutrition 0.000 description 6
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 239000003513 alkali Substances 0.000 description 5
- 238000002048 anodisation reaction Methods 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 239000012954 diazonium Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 4
- 239000000920 calcium hydroxide Substances 0.000 description 4
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 4
- 239000008119 colloidal silica Substances 0.000 description 4
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 230000002209 hydrophobic effect Effects 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 150000002681 magnesium compounds Chemical group 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- 239000003504 photosensitizing agent Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 3
- 239000004135 Bone phosphate Substances 0.000 description 3
- 241000640882 Condea Species 0.000 description 3
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000010954 inorganic particle Substances 0.000 description 3
- 229910001425 magnesium ion Inorganic materials 0.000 description 3
- 239000004137 magnesium phosphate Substances 0.000 description 3
- 229910000157 magnesium phosphate Inorganic materials 0.000 description 3
- 229960002261 magnesium phosphate Drugs 0.000 description 3
- 235000010994 magnesium phosphates Nutrition 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000011236 particulate material Substances 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 239000005365 phosphate glass Substances 0.000 description 3
- 230000008092 positive effect Effects 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- RLQWHDODQVOVKU-UHFFFAOYSA-N tetrapotassium;silicate Chemical compound [K+].[K+].[K+].[K+].[O-][Si]([O-])([O-])[O-] RLQWHDODQVOVKU-UHFFFAOYSA-N 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- MXRIRQGCELJRSN-UHFFFAOYSA-N O.O.O.[Al] Chemical compound O.O.O.[Al] MXRIRQGCELJRSN-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000004111 Potassium silicate Substances 0.000 description 2
- 230000002730 additional effect Effects 0.000 description 2
- 150000004645 aluminates Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000007900 aqueous suspension Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910001424 calcium ion Inorganic materials 0.000 description 2
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- 239000000292 calcium oxide Substances 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 239000001506 calcium phosphate Substances 0.000 description 2
- 229910000389 calcium phosphate Inorganic materials 0.000 description 2
- 235000011010 calcium phosphates Nutrition 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 230000005660 hydrophilic surface Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 239000002198 insoluble material Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 2
- 235000019353 potassium silicate Nutrition 0.000 description 2
- 229910052913 potassium silicate Inorganic materials 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical compound [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 2
- 229910000391 tricalcium phosphate Inorganic materials 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 239000003039 volatile agent Substances 0.000 description 2
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910018626 Al(OH) Inorganic materials 0.000 description 1
- 229910017119 AlPO Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- TWDJIKFUVRYBJF-UHFFFAOYSA-N Cyanthoate Chemical compound CCOP(=O)(OCC)SCC(=O)NC(C)(C)C#N TWDJIKFUVRYBJF-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 102000006335 Phosphate-Binding Proteins Human genes 0.000 description 1
- 108010058514 Phosphate-Binding Proteins Proteins 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 159000000004 beryllium salts Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- RNFNDJAIBTYOQL-UHFFFAOYSA-N chloral hydrate Chemical compound OC(O)C(Cl)(Cl)Cl RNFNDJAIBTYOQL-UHFFFAOYSA-N 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- WMWXXXSCZVGQAR-UHFFFAOYSA-N dialuminum;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3] WMWXXXSCZVGQAR-UHFFFAOYSA-N 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- ILLRQJVNDWDWBA-UHFFFAOYSA-K dimagnesium;phosphate Chemical compound [Mg+2].[Mg+2].[O-]P([O-])([O-])=O ILLRQJVNDWDWBA-UHFFFAOYSA-K 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 239000012949 free radical photoinitiator Substances 0.000 description 1
- 238000004952 furnace firing Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 239000002694 phosphate binding agent Substances 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- IJAAJNPGRSCJKT-UHFFFAOYSA-N tetraaluminum;trisilicate Chemical compound [Al+3].[Al+3].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] IJAAJNPGRSCJKT-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 150000004684 trihydrates Chemical class 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Description
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ïŒ (A) å°ãªããšãã¢ã«ãããŠã åã¯ã¢ã«ãããŠ
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æ§ç©åãClaim 1 (A) At least one surface of aluminum or an aluminum-coated hydrophilic material comprising: 1 non-metallic inorganic particles; and 2 one or more phases of a dehydrated product of at least one monobasic phosphate. 1. A photosensitive article comprising: an aluminum or aluminum-coated substrate in the form of a film or sheet having a ceramic layer having a thickness of 0.3 to 10 microns; and (B) a photosensitive lithographic coating on the ceramic layer.
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æ§ç©åã2. The photosensitive article of paragraph 1 above, wherein the article consists of metal oxide particles having an average particle size of from 1 x 10 -3 ÎŒm to 45 ÎŒm.
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æ§ç©åã3. The photosensitive article of item 2 above, wherein the metal oxide particles are made of alumina.
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æ§ç©åã4. The ceramic layer is between 0.2 ÎŒm and 15 ÎŒm thick, the substrate is aluminum in the form of a film or sheet, and the lithographic coating is in a polymerizable composition or binder. The photosensitive article of item 2 above, comprising either o-quinone diazide having a positive effect.
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åã5. The ceramic layer contains a reaction product between aluminum and a monobasic phosphate, and a reaction product between at least one metal oxide other than alumina and a monobasic phosphate, and contains at least one reaction product of the monobasic phosphate. 2. The photosensitive article of item 2 above, wherein the metal oxide orthophosphate is insoluble in an aqueous solution having a pH of 6 to 12.
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æ§åºäœã補é ããæ¹æ³ã6 (A) A slurry of at least one monobasic phosphate and non-metallic inorganic particles is applied to at least one surface of an aluminum or aluminum-coated substrate in the form of a film or sheet, and at a temperature of at least 230°C. (B) producing a ceramic layer on the aluminum substrate or on the aluminum-coated surface of the substrate by firing the slurry to create a hydrophilic 0.3-10 micron thick ceramic coating on the aluminum or aluminum-coated surface; A method for producing a photosensitive substrate, comprising the steps of: coating the ceramic layer with a photosensitive lithographic organic layer.
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æ³ã7. The method of claim 6, wherein the particles consist of metal oxide particles having an average particle size of 1 x 10 -3 ÎŒm to 45 ÎŒm, and the metal oxides consist of reactive alumina particles.
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ã®æ¹æ³ã8. The method of item 7 above, wherein the metal oxide particles further additionally comprise alpha-alumina particles.
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ã®æ¹æ³ã9 The metal oxide particles consist of reactive alumina and metal oxide, and the orthophosphate of the oxide is PH
The method of item 7 above, wherein 6 to 12 are insoluble in an aqueous solution.
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ã®æ¹æ³ã10 The slurry is comprised of from about 5% by volume to about 15% by volume of nonvolatile materials on calcination, with at least 35% by volume of the nonvolatile materials being from phosphate and reactive metal oxides and/or reactive metal oxides. 9. The method of item 9 above, wherein the matrix is a matrix consisting of:
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ã®æ¹æ³ã11 Ceramic coating is 0.2ÎŒm
Items 6 and 7 above, having a thickness of between 15 ÎŒm;
The method of paragraph 8 or paragraph 9.
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ã®æ¹æ³ã12. The method of item 10 above, wherein the monobasic phosphate is generated in situ during calcination by reaction of phosphoric acid and tribasic phosphate.
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æ³ã13. The method of item 7 above, wherein monobasic phosphate is generated in situ during calcination by reaction of phosphoric acid with alumina and/or aluminum hydroxide.
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ã®æ¹æ³ã14. The method of paragraph 7 above, wherein the monobasic phosphate is formed in situ during calcination by reaction of a monobasic phosphate which does not consist essentially of aluminum phosphate with aluminum. .
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ã®æ¹æ³ã15. The method of item 6 above, wherein the calcium-containing compound is included in the slurry.
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èŠåºäœããæãç©åã16 On at least one surface of an aluminum or aluminum-coated substrate in the form of a film or sheet, a hydrophilic material having a thickness of 0.3 and comprising a polymorph of aluminum phosphate or a mixture of aluminum phosphates.
An article comprising an aluminum or aluminum-coated substrate with a ceramic coating of ~10 microns and a photosensitive lithographic organic layer on the ceramic coating.
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äœãã³ãŒãã€ã³ã°ããæ¹æ³ã17 Applying a layer of monobasic phosphate to at least one aluminum surface of an aluminum or aluminum-coated substrate in the form of a film or sheet, and then applying at least one layer of monobasic phosphate to at least one aluminum surface of the aluminum or aluminum-coated substrate
Aluminum or aluminum coating, fired at a temperature of 230°C to produce a hydrophilic ceramic coating with a thickness of 0.3 to 10 microns on the aluminum, and coating an organic photosensitive lithographic layer on the ceramic coating. How to coat a substrate.
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ã®æ¹æ³ã18 No. 1 above, wherein at least one surface of the aluminum or aluminum-coated surface has microscopic, lithographically effective structures in the aluminum, and the coating has a thickness between 0.2 ÎŒm and 15 ÎŒm. Method of Section 17.
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ã®æ¹æ³ã19. The method of paragraph 17 or paragraph 18 above, wherein the monobasic phosphate comprises aluminum phosphate and the calcination is carried out at a temperature of at least 260°C to produce a dehydrated coating.
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ãçãããBACKGROUND OF THE INVENTION Lithographic printing plates have been widely used for many years. One of the basic principles used in this technique is to create a wettability gap between the areas of the surface where the image is printed flat. To do this, the surface must be hydrophilic,
i.e., providing a substrate that can be wetted with water and that can be imaged (usually sensitive to visible light or radiation) and that can be developed;
Most commonly, the surface is coated with a grease-compatible (oleophilic), hydrophobic layer. After creating an image in this layer and developing it, the printing master exposes a hydrophilic surface and a hydrophobic surface for the image. If the plate is first moistened with water and then coated with a grease or oil-based printing ink, only the hydrophobic areas of the image will hold the ink and will not print against a receiving surface such as paper. This results in a dark transferred image.
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èŠã¯ãªãã With this lithographic printing method, it was possible to prepare a lithographic printing original plate that could be used to produce a small quantity of just a few hundred copies or a large quantity of several hundred thousand copies of the same printed matter. It is quite obvious that it would be desirable to be able to make a large number of identical prints from a single master plate. Although the operation of creating and developing the image must be performed only once, there is no need to stop the printing press during the operation to change the master.
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æ¹åã®è«çã¯æçœã§ããã The study of ways to extend the operating time of lithographic printing plates has been the focus of much research. Maintaining other desirable or essential properties of printing plates, such as speed of imaging, ease of development, non-staining chemicals, and shelf life, in order to provide a durable printing plate. It is also necessary to improve or improve it. Most research into providing long-running, durable lithographic printing masters has focused on the development of imageable, hydrophobic substrates on hydrophilic surfaces of substrates. This is a coating layer. The logic of the research direction is clear, since it is usually this layer that is the cause of failure in printing masters.
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žååŠçãè¡ãã The substrates typically prepared as imageable layers are aluminum sheets that have undergone various cleaning, mechanical and chemical treatments to prepare them for coating. For example, aluminum surfaces are commonly cleaned to remove oil and other contaminants. This cleaning is followed by a mechanical or electrochemical granulation treatment, and finally an anodization treatment.
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ä»åœç¹èš±ç¬¬2322015å·æ现æžã«é瀺ããŠããã British Patent No. 1,439,127 discloses an anodizing process on aluminum substrates in which anodizing is carried out in an aqueous sulfuric acid bath at a temperature above 50° C. and an anodizing current density of at least 70 Amp./sq.ft. . This treatment shortens the length of time for anodizing. Other etching solution compositions and electrical parameters are described in U.S. Pat.
4,072,589 and 4,052,275, as well as French Patent No. 2,322,015.
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žåé床ãå¢ãããã«ããã After electrochemically or mechanically etching the aluminum surface, an anodizing treatment is usually performed to make the aluminum surface corrosion and abrasion resistant. This is described in UK Patent No. 1,439,127 and US Pat. No. 4,131,518 mentioned above. The latter patent describes anodizing aluminum foil in continuous web form to reduce energy requirements and increase anodization rates, especially when the aluminum has a polymer coating on one side. Make it.
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ã€ã³ããã¯ããè¡šé¢å±€ãçæããã US Pat. No. 3,181,461 discloses an anodizing process in which a sulfuric acid anodizing step is followed by treatment with an aqueous sodium silicate solution. This treatment seals the pores in the oxide surface of the anode and creates a hydrophilic, ink-repellent surface layer.
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ã¯ã³ãŒãã€ã³ã°ã¯æœãããªãã DE 24 34 098 discusses the firing of a composition of aluminum phosphate and silicon carbide particles on metal surfaces to increase the wear resistance. However, the invention of German Patent No. 2434098 is not suitable for use in lithographic printing plates, and no coating is applied to the surface of aluminum.
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æãããŠããã Methods of treating lithographic aluminum substrates to increase surface area and enable anodic coatings are disclosed in U.S. Pat. It is well explained in the industry as in the book.
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é¥ãã«å€æ°ã®å°å·ãã§ããããšã瀺ããã A novel method for producing structured surfaces on aluminum master substrates for lithographic printing was disclosed in US Pat. No. 3,210,184. A layer of basestone (aluminum oxide-hydrate) is produced on an aluminum substrate by immersing the aluminum in hot water or steam in the presence of a weak organic base.
It has been shown that a printing original plate using a structured substrate can produce a much larger number of prints under similar conditions than a printing original plate using a mechanically roughened aluminum substrate.
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ããŠããã U.S. Pat. No. 4,319,924 discloses an aqueous coating composition consisting of dissolved phosphate, dissolved dichromate, dissolved aluminum, and dispersed particulate solid materials, preferably aluminum-containing materials, in coating-forming proportions. are doing. The composition can be heat cured at elevated temperatures to make it a water-insoluble material. The composition further contains diethanolamine in an amount sufficient to reduce the temperature at which it can be cured into a water-insoluble material.
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çµåãããããšãã§ããã The present description discloses that a novel method of processing lithographic quality aluminum foil can produce durable, continuously operable substrates for lithographic printing plate constructions. This method provides a new substrate capable of resisting the chemical effects of printing plate developers and press solvents. This new substrate also allows multiple image-forming photoreactive layers to be bonded to a treated aluminum substrate without the need for primers or other adhesion promoters.
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ã瀺ããSUMMARY OF THE INVENTION A method is disclosed for firing a solution of a monobasic phosphate, preferably aluminum phosphate, on an aluminum substrate or aluminum coated substrate surface. This method produces an aluminum sheet having on at least one surface a layer of a glass or polymorph of aluminum phosphate or a mixture of aluminum phosphate. This coating layer was found to be an excellent surface for adhesion of organic substances. In particular, the aluminum phosphate layer exhibits excellent adhesion to diasonium resins and photopolymerizable compositions used in the printing industry, especially in the lithographic printing industry.
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匷ããããã Also disclosed is a method of firing a slurry of particles and phosphate binder. The particles are preferably weakly basic or amphoteric nonmetallic particles, and the composition is fired on an aluminum or aluminum-coated substrate. In this method, on at least one surface of the sheet, dehydration products of monobasic phosphates, such as salts of aluminum and/or magnesium, alone or in combination with the reaction products with some or all of the particles. An aluminum substrate or a surface-coated sheet with a structured layer of rigid particles bonded to each other in one or several water-resistant layers is produced. It has been found that this structured layer provides an excellent surface for adhesion of organic materials. In particular, phosphates strongly bind and adhere particles in certain layers in diazonium resins used in the printing industry, especially in the lithographic printing industry, and in particular have excellent adhesion to photopolymerizable compositions. Put it in. This adhesion is enhanced by the surface structure and improved chemical stability imparted by the particles.
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The method according to the invention for making phosphate coatings on substrates provides certain improvements over prior art methods, particularly for producing substrates for photographic image-making elements in the continuous manufacture of substrates. It's on.
The coated substrates of the present invention not only have comparable or improved properties compared to prior art materials, but also exhibit significant economic advantages in manufacturing. The equipment used in the manufacturing process consists of fewer separate items of equipment, and therefore the required capital investment is less than in conventional methods of continuous substrate production. Important equipment that has been omitted includes anodizing equipment, which is inherently expensive due to its high energy requirements, and where the effluent must be safely disposed of.
Such equipment is preferably omitted from the substrate manufacturing chain because it is associated with electrochemical corrosion problems with other equipment in the same manufacturing chain. Coating layers produced according to the invention do not require etching or other structuring. Optionally, such further structuring can be used to impart additional properties to the surface. If such a structuring step is omitted, the cost will be further reduced. It has been found that the process can be easily carried out in a continuous process and gives substantially the same results as in a batch process.
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ãªã€ãŠããã A coating of a monobasic phosphate solution, or a monobasic phosphate solution slurried with metal oxide particles, is applied to the cleaned aluminum or aluminum-coated surface. This coating should be applied at least 450°C (230°C), preferably at least 500°C.
or fired at 550°C (260°C or 290°C) to produce a ceramic coating of phosphate glass. The presence of metal oxide particles and/or etching results in a structured coating. This coating, alone or in combination with reaction products with some or all particles,
consisting of nonmetal and especially metal oxide particles embedded in a glassy, water-resistant phase or phases of a dehydration product of a monobasic phosphate, such as a salt of aluminum and/or magnesium You can leave it there. Other acceptable monobasic phosphates include zinc, calcium, iron and beryllium salts. If the metal oxide is alumina, the bonding phase between the phosphate glass and alumina will likely be aluminum orthophosphate. Firing is at a temperature that ensures substantially complete dehydration of the coating;
It should be done for a long enough time. This can be done in as little as 3 seconds at the above temperatures, depending on the thickness and temperature of the coating and other parameters of the firing process. Ceramic surfaces can be further treated with etching to impart specific desired structure and properties to the surface, but the surface obtained by firing is already structured. This optional treatment is neither critical nor essential to the invention, and is a method of producing images that is optimized by silicate treatment of a substrate or other similar phase. (for example, a lithographic printing original plate) is most commonly used. For example, etching is
This can be done using known alkaline silicate solutions which simultaneously deposit silicate coatings. If silication is not required, or if the subsequently applied photosensitive composition is not compatible with the silicate surface, etching can be carried out, for example, in an alkaline phosphate or aluminate solution. . The surface of the aluminum or aluminum-coated substrate may first be structured such that etching of the ceramic coating exposes the structure through the ceramic coating. However, when implementing the invention,
This is unnecessary, as the structure will be generated naturally during the process. This natural structure is a microscopic structure that can be seen by light scattering or magnification, and is a physical structure to which a subsequently applied photosensitive coating composition can adhere.
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Even very large amounts of ceramic coating can be removed. The length of etching time is controlled by the temperature and pH of the etching environment.
The higher the temperature and the higher the pH level, the faster the etching. PH can be controlled with the addition of alkaline oxides such as sodium hydroxide. Replenishment solutions can be added during continuous processing operations to replenish any materials lost during etching, such as alkaline components. Because silicate etching has a broader range of action than phosphate or aluminate etching solutions, combined etching and silicate solutions are generally best suited for enhancing silicate treatments. The silicate used in the combined etching bath and silicate bath is preferably a commercially available material with a high silica content. Philadelphia Quartz Co.'s "Casile #1"
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ããã®ã奜ãŸããã The substrate, which has become a ceramic-coated aluminum or a structure produced in a firing process on an aluminum-coated substrate, can then be coated with a photosensitive composition, either directly or with an intermediate sublayer. Preferably, an oligomeric diazonium resin and/or a negatively or positively acting photosensitive organic composition is applied to the surface of the structure.
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å«ããã A wide variety of photosensitive compositions with different fields of use are known to those of ordinary skill in the art. The types of photosensitive coatings useful in the practice of this invention are those commonly considered for use in the printing plate industry, particularly lithographic and letterpress compositions.
These compositions include both negative and positive acting lithographic compositions and negative acting letterpress compositions.
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çºçå€ãããã Negative effect compositions are typically made using photopolymerizable compositions that become less soluble and/or polymerize to a higher degree when exposed to actinic radiation in an image pattern. This typically includes binders, polymerizable substances (monomers, oligomers and polymerizables), photoinitiator catalysts for the polymerizable substances, sensitizers for the photocatalysts, and lipophilicity enhancers, pigments, surfactants, coating aids. and various other ingredients such as agents known in the art, and other ingredients known in the art. After exposing the image to actinic radiation, the unreacted, highly soluble regions of the coating composition are removed by washing with various solvents including water, aqueous alkaline solutions, and organic developers. Among the most common materials used to make negative effect lithographic compositions are ethylenically unsaturated monomers and photoinitiated free radical generators.
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Specification No. 4316949, Specification No. 4228232, No.
Specification No. 3895949, Specification No. 3887450, and No.
See specification No. 3827956.
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§ããããã Positive-acting lithographic compositions usually consist of a thermoplastic or partially cross-linked composition binder containing a positive-acting photosensitizer, which, when irradiated with light, , the sensitizer becomes more soluble in the selected solvent than a sensitizer that has not been exposed to light. The most common photosensitizers used in the industry are o-quinone diazide compounds and polymers. Acrylic resin, phenol formaldehyde resin (especially novolac), polyvinyl
Various binders such as acetal resins and cellulosic esters are also commonly known in the art for use with this type of photosensitizer.
For example, US Patent No. 4193797, No. 4189320
No. 4,169,732, and No. 4,247,616.
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ããŠãè¯å¥œãªæµææ§ã瀺ããã Ceramic surfaces made on aluminum substrates have been shown to be highly water receptive and at least as hydrophilic as anodized aluminum. The surface has excellent adhesion to polymeric and oligomeric compositions. It has been found that the surface exhibits particularly good adhesion to positively acting photosensitive compositions such as compositions containing diazo oxides and diazo sulfides. The surface also showed good resistance to the generally highly alkaline developing solutions used.
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Must be higher than 450ã or 500ã (230â or 260â). Preferably it is at least 550°C (285°C). Temperatures higher than 700° C. (370° C.) increase the energy requirements of the process without exhibiting any significant advantage, and may distort or weaken the substrate. These temperatures relating to the surface temperature of the coating were measured by contacting the surface of the coating with the bare contacts of a thermocouple. Naturally, a large number of different types of furnaces with different control characteristics can be used to achieve the required surface temperature. The controlled temperature may in fact be substantially different from the surface temperature measured in the manner described above.
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This means that there should be no free metal.
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ã®ããåéäœã䜿çšããããšãã§ããã It goes without saying that the term "particulate" used in the practice of the present invention includes particles within a wide range of particle sizes. Particles small enough to create colloidal dispersions, such as particles as small as 5Ã10 â3 ÎŒm in average particle size, and preferably from no smaller than 1Ã10 â3 ÎŒm up to 45 ÎŒm, are quite effective. The preferred particle size range is 10 -2 ÎŒm.
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hydrophilic and hydrophilic properties that maximize resistance to alkaline attack, maximize slurry solids fraction and slurry viscosity for a particular coating method, and are most compatible with the intended image coating method. A mixture of finely divided reactive materials can be added to the slurry, resulting in a microstructure.
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ããŠæç®ã§ç€ºåããŠããã The amount of magnesia, i.e. the amount of magnesium oxide or magnesium hydroxide that is generally added, is not sufficient to yield a completely tribasic (dehydrated) phosphate composition upon calcination, thus providing polyvalent cations. Addition of other substances that cause alkali resistance generally results in further alkali resistance. Hydrated or transitioned alumina, sols of many metal oxides, or mixtures of these materials can be added, generally together with magnesia, and generally in proportions to maximize coating as described above. . Supplier: Micro Abrasives Corp., Westfield, Mass., USA; GB2500
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(Aluminum Oxide C) and alumina, chromia, ittria, zirconia and ceria sols supplied by Nyacol Inc., Ashland, Mass., USA, were combined with the proposed magnesium compound. Examples of reactive substances that are effective as This catalog is intended to be indicative rather than exhaustive. Many other compounds are expected to be useful as reactive agents in sol or fine powder form. Titanium dioxide, calcium hydroxide, calcium oxide, calcium fluoride or calcium phosphate, beryllium oxide, ammonium fluorotitanate, and tungsten oxide have been suggested in the literature as effective components of phosphate glasses.
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žåç©ã䜿çšããã®ã奜ãŸããã In addition to reactive inorganic particulate materials, or some admixtures thereof, particles of hard, wear-resistant materials can be added with good results. Generally, these are expected to react with the phosphate binding substance only superficially, but are not expected to contribute substantially to insolubilization. "381200 Alundum" type α supplied by Norton Co., Troy, New York, USA
- grade alumina or "WSK 1200" white alumina supplied by Treibacher GMBH, Treibach, Austria, and various grades of "WCA" alumina supplied by Micro Abrasive. Useful. Some of these materials require furnace firing to burn off organic contaminants. Tin oxide of a grade supplied by Transelco, Inc., Penn Yan, New York, USA, was substituted or mixed with alumina in various proportions without sacrificing properties. fine-grade sands of other hard materials such as quartz, amorphous silica, cerium oxide, zirconia, zircon, spinel, aluminum silicate (mullite), and even hydrophobic particles such as silicon carbide ( Although less attractive in terms of cost and effectiveness as a tightly sized powder (compared to alumina), it is expected to perform well. The practice of the invention includes hydrophilic particles,
Particular preference is given to using metal oxides.
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ã§ããããããã®å Žã§è¡ãããã It should be pointed out that the invention can be practiced by making aluminum phosphate or other acidic phosphates in situ during the calcination process.
This can be done, for example, by coating the aluminum or aluminum coated surface to be fired with a slurry of phosphoric acid and a stoichiometric excess of reactive alumina. Aluminum phosphate is formed during the initial firing period and, in the presence of a stoichiometric excess of alumina, particulate reactive alumina material remains in the reactive composition during the continuation of firing. This is sufficient to make a coating according to the present invention, and the production of aluminum phosphate or other aluminum phosphates or mixed phosphates of aluminum and other metals is within the scope of the practice of this invention. Because there is, it is done on the spot.
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åç©ãšäº€æã§ããããšãäžèšã®ç䟡é¢ä¿ã§ç€ºãã In addition to the above in situ production by reaction of excess metal oxide or hydroxide with phosphoric acid, stoichiometric equivalent amounts of reactive alumina, i.e. aluminum oxide or hydroxide, can be reacted with phosphoric acid or Formation of aluminum phosphate in situ, either by reaction with acidic phosphates of alkaline earths, such as phosphate-magnesium solutions, or mixing aluminum with other metals in situ. Phosphates can also be produced. The following equivalence shows that aluminum phosphate can be replaced with a reaction mixture containing alumina and phosphoric acid or an alkaline earth acid phosphate.
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For example, Ca 3 (PO 4 ) 2 +4H 3 PO 4 =3Ca(H 2 PO 4 ) 2 Mg 3 (PO 4 ) 2 +4H 3 PO 4 =3Mg(H 2 PO 4 ) 2 Mg 3 (PO 4 ) 2 +4H 3 PO 4 =3MgHPO 4 The following reaction illustrates the process by which orthophosphate is produced during calcination with phosphoric acid and/or a suitable acidic phosphate starting material.
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ã§æ·»å ããã®ããã¯ã奜ãŸããã 3H 3 PO 4 ïŒAl 2 O 3 â â³2AlPo 4 ïŒ3H 2 O Al(H 2 PO 4 ) 3 ïŒAl 2 O 3 â â³ 3AlPO 4 ïŒ3H 2 O Al(H 2 PO 4 ) 3 ïŒ3MgO â â³ AlPO 4 ïŒMg 3 ( PO 4 ) 2 +3H 2 O 3Mg(H 2 PO 4 ) 2 +2Al 2 O 3 â â³ 4AlPO 4 +Mg 3 (PO 4 ) 2 +6H 2 O 6Ca(OH) 2 +3Mg(H 2 PO 4 ) 2 â â³ 2Ca 3 (PO 4 ) 2 +Mg 3 (PO 4 ) 2 +12H 2 O The addition of calcium-containing inorganic compounds to the slurry can lower the calcination temperature to produce a mixture that dehydrates effectively at slightly lower temperatures or in shorter times. We have found that there is less need for intensive monitoring. Addition of calcium is calcium hydroxide,
Preference is given to working in the form of calcium carbonate, calcium oxide, calcium phosphate or mixtures thereof. In order to obtain this effective result, it is still preferable to add the magnesium-containing compound as a soluble phosphate and the aluminum-containing compound in ultrafine and/or dissolved form.
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ãããšãææããŠããã The addition of calcium-containing inorganic compounds to the slurry contributes to the ability of the coating composition to be fired at lower temperatures or shorter times, while maintaining lithographic quality, which is not conventionally possible. It was also found that the thickness of the coating increased more than expected. The aluminum-containing compound may be, for example, fumed alumina produced by flame hydrolysis of anhydrous aluminum chloride and having a final average particle diameter of less than 20 nm. If all the components necessary to react to form a tightly dispersed, homogeneous phosphate phase are in the most rapidly reactive form commonly available as feed chemicals;
Better functional properties are obtained with shorter firing times and/or lower temperatures. Too much stoichiometric excess of reactive cation-donating materials over anion-donating materials, i.e., phosphates and silicates, tends to mechanically weaken the coating and
It should be pointed out that - ASTM tests C501-66 and D1044-76, or tests that combine some of the characteristics of each of the two standard tests, result in inferior abrasion resistance than the types described.
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The volatile substance is generally water, although substantial amounts of volatile substances that are miscible with water, such as alcohols, can be added. The volumes of volatiles mentioned above include both volatiles added as solvents or diluents and those generated in reactions such as thermal decomposition of organics or acid-base metathesis.
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The second largest component of the slurry or solution is in the form of hard particles, such as the alpha-alumina mentioned above. These may consist of between 0% and 65% of the volume of the non-volatile part. The size, shape, volume and type of the hard particles will vary as necessary to suit the intended unique use of the ceramic coated material. Coatings containing more than 65% by volume of hard particles will shrink too much in the binder material so that the hard particles will not be tightly bound, and will leave no ink behind if the coating is used as a lithographic substrate. Ink tends to accumulate in the gaps between them in areas that need to be freed. The relatively predominant appearance of fired films containing 45% to 60% by volume of hard particles is rough. This type of surface is preferred for use in some image coatings. For fired films containing less than 50% by volume of hard particles,
The relative volume of the hard particles decreases, while the relative volume of the microfine particles increases, so that the surface has a pronounced microfine appearance. The ultra-fine appearance makes it more desirable for use in some image coatings. Sedimentation and agglomeration of hard particles may cause coating problems. When characterized by easy coating with simple equipment, the formulation preferably has a low volume or is completely free of coarse particles. It is believed that the hard particles contemplated for use in the present invention react so slowly with the phosphate solution that they undergo negligible reaction during calcination.
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ããããã The remaining components of the slurry formulation are matrix or binding components. In its simplest form, it can be coated with just phosphoric acid and fired.
However, by using acidic phosphates such as aluminum phosphate and/or reactive particles such as alumina, effective properties are enhanced.
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ãã If the reactive particles are calcium ion producing species, approximately 0% of the amount that combines with available phosphate ions to produce calcium orthophosphate.
Amounts ranging from about 20% to about 20% are used. 20
If too much calcium is added, the slurry tends to agglomerate and reduce the acid resistance of the final article. Amounts ranging from about 4% to about 7% provide maximum reduction in firing temperature without significantly reducing acid resistance or slurry viscosity. Calcium content can be provided using a phosphate-calcium solution rather than particles that generate calcium ions.
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ããã When the reactive particles are magnesium ion producing species, amounts ranging from about 0% to about 35% of the amount that combines with available phosphate to produce magnesium orthophosphate are used. Amounts ranging from about 10% to about 20% are preferred. If magnesium-containing particles are added to the aluminum phosphate at levels greater than 35%, the resulting coating flakes off the aluminum substrate upon cooling down from the firing temperature. It can be seen that with amounts of magnesium lower than the 10% level, the contribution to alkali resistance is less than in the optimal case. MgO5.3% by weight
The amounts of magnesium and phosphate supplied in a commercially available magnesium phosphate-magnesium solution containing 32.6% by weight of P 2 O 5 and amount of
Since 19.1% of magnesium ions are added,
Can be used to supply magnesium ions.
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Amounts ranging from about 0% to about 200% of the amount that combine with all other metal ions and phosphate ions present or liberated during calcination to yield the stoichiometric amount of orthophosphate. Can be added. The preferred range is 100% to 150%. For example, if the amount of calcium-containing material in the phosphate solution slurry is 5% of the amount that yields calcium orthophosphate, and the amount of magnesium-containing material in the phosphate solution slurry is 15% of the amount that yields magnesium orthophosphate. In the case that
The preferred amount of aluminum ion-containing material to be added ranges from 80% to 130% of the amount yielding aluminum orthophosphate. If another reactive cation is present, provide sufficient additional aluminum ions in excess of 100% to 150% of the orthophosphate level to give the desired composition. (e.g., if the other cation is silica, sufficient additional aluminum ion-containing material must be provided to make aluminum orthosilicate). Aluminum contents lower than 100% result in coatings with poor chemical resistance, and aluminum contents higher than 150%, in combination with typical additions of hard particles, lead to a reduction in the abrasion resistance of the coating. The unreacted excess fine particles have utility as fillers or leveling agents, creating useful microstructures or chemical properties on the surface of the fired film. Increasing the overall fine aluminum reactive particle content to a range of 150% to 200% is believed to provide improved anchorage for the protective material to compensate for the loss of basic wear resistance. .
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äžæ®µãšå®å®ãªã¹ã©ãªãŒãåŸãããã Dispersants such as gluconic acid can also be added to the slurry. Although alkaline dispersants such as sodium tripolyphosphate do not destroy the functionality of the present invention, they are not preferred. Pretreatment of the coarsest particles with colloidal silica provides a slurry that is more stable against settling.
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ãæã€ãŠããã Compositions useful in lithography can of course be coated onto ceramic surfaces. Such compositions include 1) an oligomeric diazonium resin;
2) Diazo oxides or esters with positive effects;
3) photopolymerizable organic compositions (such as ethylenically unsaturated materials, especially in the presence of free radical photoinitiators);
4) an oligomeric diazonium resin basecoat with a photopolymerizable organic composition overcoat, and 5) any of a variety of other well-known photosensitive compositions useful in lithographic printing.
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ã€é²åºåŸã«ãããã«çŸåããããExample 1 Pre-cleaned aluminum foil was coated with a 50% by weight aqueous solution of phosphate-aluminum and dried below 100°C to a coating thickness of approximately 3 ÎŒm. The surface temperature of the coating was raised to 550ã (260°C) in 90 seconds in the oven and removed after 30 seconds at that temperature. US Patent No. 4247616
The positive acting photosensitive composition described in Example 3 of the above specification was coated onto the treated surface after it had been cleaned and dried. The composition adhered to the substrate and developed well after exposure.
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(particle size less than 200 mesh) and 72.25% water. The coating dried to a thickness of approximately 3 ÎŒm.
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ããå·»ãäžããã The coated foil was placed in a furnace and the surface temperature of the coating was raised to 550ã (260â) in 30 seconds. The residence time in the furnace was one and a half minutes. The coated foil was cooled, washed, dried, and then rolled up.
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The photosensitive layer adhered well to the substrate, and the development was clean without any undesirable undercuts in the halftone image. The extent to which the back area is easily corroded by alkaline developer is shown in Example 1.
It was less than the base of. The adhesion of the print was even better because there were fewer undercuts and the generated surface structure further increased the adhesion.
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ããšãåãã§ãã€ããExample 6 The calcined substrate of Example 2 was immersed for 21/2 minutes at 95° C. in a solution containing 5% by weight sodium silicate solution under the trademark "Star" of Quartz Corporation, Philadelphia, USA, and then Washed with deionized water spray and dried. This was coated with a negative oligomeric diazonium resin and a dry 8 ÎŒm coating of the negative photopolymerizable composition of Example 2 of US Patent Application No. 103,712, filed Dec. 14, 1979. The image was clearly developed with normal exposure and development. This produced thousands of well-inked impressions during a reduced abrasion test and was at least as good as the abrasion performance of the same imaging material on textured, anodized regular aluminum.
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- 19.1% (by weight) alumina (cleaned by calcining overnight at 600°C in air before addition), 2.4% Alcoa's "Hydraul 710" alumina trihydrate;
Condea Hemy's "Despral 10/2" alumina hydrate 0.75%, Martin Marietta's "Mag Chem"
Chem) 10'' consisted of 0.36% magnesia and 14.4% 50% aluminum phosphate solution, and some surface-active substances were added thereto to prepare a slurry as described below. The dry powders were ground together as a 30% solids slurry. First, only α-alumina
A 30% slurry was milled for 1 hour in a solution containing all of the water and 2% by weight alumina as Nalco "Nalcoag 1115" colloidal silica.
Then add enough 50% gluconic acid to separate the aqueous phase.
Acidify to 0.5% and add the remainder of the dry solids;
And the grinding was continued for 12 hours. Add a weighed sample of the 30% slurry to a container containing enough additional distilled water and a 50% solution of aluminum phosphate to the proportions above, stir the formulation with a propeller stirrer, and mix the trisodium phosphate ( 3% solution at 160ã)
Roll coating, etching, cleaning, and cleaning of the aluminum alloy sheet
It was then decontaminated in 50% nitric acid, washed and dried. The coated sheet was air-dried in the air and fired for 2 minutes in a furnace with a circulating air temperature of 650° on a furnace control thermometer. (We had previously found that the surface temperature would be 550° during the last 30 seconds of this thermal exposure.) Cooling and positively acting images of the diazooxide-phenolic resin type known in the art. Upon coating with the composition, the resulting lithographic printing master was able to exhibit acceptable performance in terms of image contrast, developer resistance, and abrasion life as measured by a time-reduced abrasion test.
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ã«å¯ŸããŠå®ããæšæºã«äžèŽãããExample 8 The proportions were 17.8% of α-alumina with a grade of 1200, 3.2% of Alcoa's "Hydral 710", 0.7% of Condea's "Dispral 10/2", and 0.38% of MgO, and the grinding time was set to α-alumina in silica sol. against 30
minutes, 4 hours on total solids at 40% solids, phosphate addition is a 50% solution of phosphate-aluminum
A slurry was prepared, coated, and fired as in Example 7, except that it was 15.4%. The obtained slurry is etched,
It can be easily roll coated onto clean aluminum and is also a motor driven cylindrical âScotch-briteâ Type A
Oakite (150ã) was polished at the same time on pre-cleaned lithographic aluminum alloy.
Sprayed with a 3% solution of "#166" metal cleaner, then washed and air dried. The obtained lithographic original plate is Example 7
conformed to the standards set for
å®æœäŸ ïŒ
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ã¬ãã ã»ã¹ããŒã«ç€ŸïŒBethlehem Steel Co.ïŒã®
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解ååãåã¯ããã®æ©èç¹æ§ã«é¡èãªå·®ç°ã¯èªã
ãããªãã€ããExample 9 Example 8 was applied to Bethlehem Steel Co.'s "Duraskin" sheet, which is a steel sheet plated with an aluminum-zinc-silicon alloy, with the second portion being aluminum.
The slurry was roll coated and rerolled to a thickness of 0.010 inch. The Duraskin sheet was pre-cleaned using the same Scotchi-Brite polishing technique as described in Example 8. The fired material works very well as a substrate for lithographic printing plates with either negative or positive action, long wear life, and Example 8.
No significant differences were observed in the contrast or resolution of the images or their abrasion characteristics between the lithographic masters.
å®æœäŸ 10
ç±³åœãã€ãªãã€å·ãã±ã¢ãïŒCairoïŒIll.ïŒã®ã€
ãªãã€ã»ããã©ã«ãºç€ŸïŒIllinois Minerals Co.ïŒ
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ããããšãèªãããããExample 10 Illinois Minerals Co., Cairo, Ill., USA.
It is called "Imsil A-10".
Amorphous silica 19.05 with an average particle diameter of 2.2 ÎŒm
% (wt/wt), 0.65% "Aluminum, Oxide C", called by Degutsa Pigments Division, Frankfurt, Germany, with particles having an average diameter of 0.02 ÎŒm, 32.9% deionized water,
and Mobil Chemical
Co.) 50% solution of phosphoric acid-aluminum 47.4%
A slurry consisting of First the silica and colloidal alumina were mixed in water and then the phosphate solution was added. This slurry was coated on the substrate of Example 7, and fired in the same manner as in Example 7. This was then immersed for 25 seconds in a solution at 80° C. containing 4.8% by weight of potassium silicate solution "Kasil No. 1" available from Philadelphia Quartz, washed with deionized water, and air-dried. The resulting sheet was primed with a negatively acting diazo compound and protected with a negatively acting photopolymer of the type well known in the art. The resulting printing master was exposed to a test negative and exposed to a 3M Subtractive Developer.
Developer). Its photographic speed, contrast, resolution and print life were found to be commercially acceptable.
å®æœäŸ 11
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ã¯æ®éã®æ§èœã瀺ãããšãã§ãããExample 11 Alpha of Norton's "#381200 Alundum" brand
- Alumina 15.08% (by weight) (cleaned by calcining overnight at 600°C in air before addition), 15% aqueous suspension of "Nalcoag 1115" colloidal silica 0.45
% (by weight), 50% aqueous solution of gluconic acid 0.45% (by weight), deionized water 62.12% (by weight) "Aluminum Oxide C" manufactured by Degutsa Pigments Division, Frankfurt, Germany 2.72
% (weight), Condair Hemy's "Despral 1"
0/2" Alumina Hydrate 0.96% (by weight), 50% Aluminum Phosphate, sold by Mobile Chemical Company
% aqueous solution 4.13% (by weight), commercially available magnesium phosphate solution 13.48% (by weight) containing 3.3% magnesium and 14.2% phosphorus sold by Mobile Chemical Company, and reagent calcium hydroxide 0.61% (by weight).
A slurry consisting of 325 this prescription product
The lithographic aluminum was coated with a coating weight ranging from 400 mg/sq. ft. to 400 mg/sq. ft. and baked at a temperature of about 550° C. for 1 minute. When cooled and coated with positive-acting compositions of the diazo oxide-phenolic resin type well known in the art, the resulting lithographic printing master has improved resolution, ink/water balance, and time reduction. It was able to show normal performance regarding the wear life measured in the wear test.
å®æœäŸ 12
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ã®ç¹æ§ã瀺ãããšãã§ãããExample 12 Tribatsher âWSKâ F1200 alumina (cleaned by calcining at 600°C before addition) 18.64%
(Weight), "Nalcoag 1115" Colloidal Silica 15
% aqueous suspension 0.56% (by weight), 50% of gluconic acid
Aqueous solution 0.44% (by weight), deionized water 58.64% (by weight), "Aluminum Oxide C" 4.21% (by weight) manufactured by Degutusa Pigments Division, Frankfurt, Germany, Mobile.
Magnesium 3.3% and phosphorus sold by Chemical Company
Commercial magnesium phosphate solution containing 14.2%
17.00%, and reagent calcium hydroxide 0.51%
A slurry consisting of (by weight) was produced. This formulation was coated onto lithographic aluminum at coating weights ranging from 325 mg/sq. ft. to 400 mg/sq. ft. and baked for 1 minute at a temperature of about 550°. Upon cooling and coating with a positive acting composition of the diazo oxide-phenolic resin type well known in the art, the resulting lithographic printing plate exhibits excellent resolution, ink/water balance, and time-reduced abrasion testing. Regarding the wear life measured in , normal characteristics could be shown.
å®æœäŸ 13
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çããé²åºåŸã«ã¯ãã€ããããçŸåãã§ãããExample 13 Pre-cleaned, grain-free aluminum foil was coated with a 25% by weight aqueous solution of phosphate-aluminum and dried at above 100°C to a coating thickness of approximately 3 ÎŒm. Raise the surface temperature of the coating to 550ã (260â) for 90 seconds in the oven.
It was left at that temperature for 30 seconds before being removed. The positive acting photosensitive composition described in Example 3 of US Pat. No. 4,247,616 was coated onto the treated surface after cleaning and drying. The composition adhered well to the substrate and gave clear development after exposure.
å®æœäŸ 14
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ããExample 14 Alumina (nominal diameter
0.5 ÎŒm) 12%, aluminum phosphate 15%, magnesium oxide (particle size 200 mesh or less) 0.75%,
and 72.25% water. The coating dried to a thickness of approximately 3 ÎŒm.
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ããŠããå·»ãäžããã The coated film was placed in a furnace and the surface temperature of the coating was raised to 550ã (260â) in 30 seconds. The residence time in the furnace was 1.5 minutes. The coated film was cooled, washed, dried and rolled up.
次ã«ã¯ããå·»ãæ»ããŠãå
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ãŠããã The foil was then rewound and coated with the positive acting photosensitive composition of the previous example. The photosensitive layer adhered well to the substrate, and there were no undesirable halftone cuts in the image, and the development was smooth.
å®æœäŸ 15
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ãªå¹³çåçè¡šé¢ãåããŠãããExample 15 The process of Example 14 was repeated, except that 1% zinc oxide was used in place of magnesium oxide and a correspondingly lower amount of water was used. Although the coated aluminum was somewhat less resistant to developing chemicals than the sheet of Example 14, it still showed excellent adhesion to the photosensitive layer and provided an effective lithographic original surface.
å®æœäŸ 16
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ãšå°ãªããšãåãçšå€éã®è¯å¥œãªå°å·ãã§ãããExample 16 Same as the previous three examples, except that it was roughened with a rotating brush loaded with an abrasive slurry such as pumice to provide a surface structure useful for mechanically abraded lithography, which is well known in the art. A similar aluminum foil was coated with a 25% aqueous solution of phosphate-aluminum, dried at 300 °C for 1 minute in still air, then 1 minute at 300 °C in flowing air, and baked for 1 minute. The surface temperature was raised to 550ã. The coated film was then immersed for 90 seconds at 95° C. in a solution containing 4.8% by weight of Kasil #1 potassium silicate solution (Philadelphia Quartz), 0.03% potassium hydroxide, and the balance water. Silicate treated foil in deionized water spray
It was washed for 30 seconds, dried and coated with a negative acting photopolymerizable composition containing acrylate monomer and photosensitizer to a thickness of 12 ÎŒm. The master was split in half and the other half was a factory-made master with the same photopolymerized composition on aluminum with standard anodization, fixed side by side and processed through thousands of printing operations to create an aluminum phosphate coating. The original plates produced at least as much good printing as the factory-made anodized plates before they wore out.
å®æœäŸ 17
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žååçãšãã¯ãåçã§ãã€ããExample 17 A sample prepared as in Example 16, phosphate coated, fired, and etched similarly except that a 5.25% by weight aqueous solution of Philadelphia Quartz S-35 sodium silicate was used. However, when coated with a layer capable of producing similar images and subjected to similar tests, the performance was still comparable to commercially available anodized master plates.
å®æœäŸ 18
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ïŒTartanïŒ25åçã®æ°åå€éã®å°å·ãã§ãããExample 18 A phosphate-coated, calcined and etched rough-surfaced aluminum was prepared as in Example 16, except that the same etching was carried out with a solution of sodium prophosphate at pH 10.4 at 70°C. The plates were coated with a positively acting photopolymerizable composition and tested in the same manner as on the factory master plates. Before it showed wear, it was able to print several times more than the Tartan 25 master, which had a roughened surface like the experimental master, but had no hard coating or anodization.
å®æœäŸ 19
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ã§ãããExample 19 "Nalco 680" manufactured by Nalco Chemical Company, prepared as in Example 16 except etching with a solution of sodium aluminate at pH 10.4, phosphate coated and calcined. A similar test was conducted using aluminum foil with a rough surface etched as described above. This allowed several times as many prints as the factory original before showing signs of wear.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29972081A | 1981-09-08 | 1981-09-08 | |
US299720 | 1994-09-01 | ||
US299721 | 1994-09-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58501425A JPS58501425A (en) | 1983-08-25 |
JPH043320B2 true JPH043320B2 (en) | 1992-01-22 |
Family
ID=23155998
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50300582A Granted JPS58501425A (en) | 1981-09-08 | 1982-09-08 | Substrate for lithographic printing and its manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58501425A (en) |
-
1982
- 1982-09-08 JP JP50300582A patent/JPS58501425A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58501425A (en) | 1983-08-25 |
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