JPH04328321A - Magnetic recording medium and manufacture thereof - Google Patents
Magnetic recording medium and manufacture thereofInfo
- Publication number
- JPH04328321A JPH04328321A JP3098911A JP9891191A JPH04328321A JP H04328321 A JPH04328321 A JP H04328321A JP 3098911 A JP3098911 A JP 3098911A JP 9891191 A JP9891191 A JP 9891191A JP H04328321 A JPH04328321 A JP H04328321A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic recording
- recording medium
- carbon atoms
- group
- surfactants
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 82
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000004094 surface-active agent Substances 0.000 claims abstract description 47
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 22
- -1 chlorosilyl group Chemical group 0.000 claims abstract description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 11
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 11
- 239000000243 solution Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- QLOAVXSYZAJECW-UHFFFAOYSA-N methane;molecular fluorine Chemical group C.FF QLOAVXSYZAJECW-UHFFFAOYSA-N 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 239000002152 aqueous-organic solution Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 abstract description 20
- 238000001179 sorption measurement Methods 0.000 abstract description 9
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 abstract description 6
- 239000005046 Chlorosilane Substances 0.000 abstract description 5
- 239000002904 solvent Substances 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 abstract description 3
- 239000002994 raw material Substances 0.000 abstract 2
- 238000005461 lubrication Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 38
- 239000010409 thin film Substances 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000000314 lubricant Substances 0.000 description 8
- 230000005294 ferromagnetic effect Effects 0.000 description 6
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000010687 lubricating oil Substances 0.000 description 5
- 230000001050 lubricating effect Effects 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- MHDVGSVTJDSBDK-UHFFFAOYSA-N dibenzyl ether Chemical compound C=1C=CC=CC=1COCC1=CC=CC=C1 MHDVGSVTJDSBDK-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- FRCHKSNAZZFGCA-UHFFFAOYSA-N 1,1-dichloro-1-fluoroethane Chemical compound CC(F)(Cl)Cl FRCHKSNAZZFGCA-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- OHMHBGPWCHTMQE-UHFFFAOYSA-N 2,2-dichloro-1,1,1-trifluoroethane Chemical compound FC(F)(F)C(Cl)Cl OHMHBGPWCHTMQE-UHFFFAOYSA-N 0.000 description 1
- COAUHYBSXMIJDK-UHFFFAOYSA-N 3,3-dichloro-1,1,1,2,2-pentafluoropropane Chemical compound FC(F)(F)C(F)(F)C(Cl)Cl COAUHYBSXMIJDK-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910003822 SiHCl3 Inorganic materials 0.000 description 1
- PDBOLQCPEKXSBW-UHFFFAOYSA-M [Ti]Cl Chemical compound [Ti]Cl PDBOLQCPEKXSBW-UHFFFAOYSA-M 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000007033 dehydrochlorination reaction Methods 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical class Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920000379 polypropylene carbonate Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical group Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Lubricants (AREA)
- Paints Or Removers (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、情報産業等で利用され
ている高記録密度の磁気記録媒体に関するものであり、
特に自己潤滑性を有する潤滑膜を設けた磁気記録媒体に
関する。[Field of Industrial Application] The present invention relates to a high recording density magnetic recording medium used in the information industry, etc.
In particular, the present invention relates to a magnetic recording medium provided with a lubricating film having self-lubricating properties.
【0002】0002
【従来の技術】近年は、ポリエステルフィルム等にフェ
ライト粉末等の磁気材料を溶剤とともに塗布する磁気テ
−プ等の塗布型磁気記録媒体に代わって、メッキ法、ス
パッタリング法、真空蒸着法、イオンプレーティング法
等の方法によって、強磁性金属薄膜を非磁性支持体上に
設けた磁気記録媒体が、高密度磁気記録媒体として研究
されている。[Prior Art] In recent years, in place of coated magnetic recording media such as magnetic tape, in which a magnetic material such as ferrite powder is applied to a polyester film together with a solvent, plating methods, sputtering methods, vacuum evaporation methods, and ion spraying methods have been used. 2. Description of the Related Art A magnetic recording medium in which a ferromagnetic metal thin film is provided on a nonmagnetic support by a method such as the tinging method is being researched as a high-density magnetic recording medium.
【0003】しかしながら、前記した方法で作られた強
磁性金属薄膜を用いた磁気記録媒体は、その耐摩耗性お
よびその走行性に問題がある。すなわち、磁気記録媒体
は磁気信号の記録、再生の過程において、磁気ヘッドと
の高速相対運動の下におかれる。この時磁気記録媒体の
走行が円滑でかつ安定な状態で行わなければならない。
しかしながら前記方法で作られる強磁性金属薄膜は、磁
気記録、再生の過程の過酷な条件耐えることができず、
磁気ヘッド等の摩擦によって走行が不安定になったり、
長時間走行させた場合には摩耗したり、破損したり、摩
耗粉の発生によって著しく出力が低下することがあった
。そのため、潤滑材を磁気記録媒体表面に形成する必要
があった。参考として株式会社リアライズ社発行、電気
材料のトライポロジ−第185頁に潤滑材に関する記述
がある。However, the magnetic recording medium using the ferromagnetic metal thin film produced by the method described above has problems in its wear resistance and running properties. That is, the magnetic recording medium is subjected to high-speed relative motion with the magnetic head during the process of recording and reproducing magnetic signals. At this time, the magnetic recording medium must run smoothly and stably. However, the ferromagnetic metal thin film produced by the above method cannot withstand the harsh conditions of magnetic recording and reproducing processes.
Running may become unstable due to friction from magnetic heads, etc.
When running for a long time, the output may drop significantly due to wear, breakage, or generation of abrasion powder. Therefore, it was necessary to form a lubricant on the surface of the magnetic recording medium. For reference, there is a description regarding lubricants in Tribology of Electrical Materials, page 185, published by Realize Co., Ltd.
【0004】0004
【発明が解決しようとする課題】従来の潤滑剤としては
、固体潤滑剤と液体潤滑剤がある。固体潤滑剤は均一に
塗布することが困難で、使用されなくなってきている。
液体潤滑剤は、スピンコートやディッピングによって潤
滑膜を形成するが、その膜厚は薄くても50オングスト
ロームあり、高密度化、高容量を行うため、磁気ヘッド
により接近をさせる場合は液体潤滑膜では限界がある。
また、液体潤滑剤であるために磁気記録媒体表面に付与
した微細な凸凹のうち、凹部に潤滑液がたまり易く、ヘ
ッドと磁気記録媒体の接触による摩耗を潤滑膜によって
低減すべき凸部に潤滑膜がほとんどない状態となってい
た。また液体潤滑剤は、供給量の正確な制御が困難で、
供給量が多いと液体が飛散するという問題があった。従
って、潤滑膜としての要求がみたされていなかった。Conventional lubricants include solid lubricants and liquid lubricants. Solid lubricants are difficult to apply uniformly and are no longer used. Liquid lubricants form a lubricant film by spin coating or dipping, but the film thickness is at least 50 angstroms, and in order to achieve high density and high capacity, liquid lubricants are not suitable for bringing the magnetic head closer. There is a limit. In addition, since it is a liquid lubricant, the lubricant tends to accumulate in the concave portions of the fine irregularities imparted to the surface of the magnetic recording medium, and lubricates the convex portions where the lubricant film should reduce wear caused by contact between the head and the magnetic recording medium. There was almost no film. Also, with liquid lubricants, it is difficult to accurately control the supply amount.
There was a problem that if the supply amount was large, the liquid would scatter. Therefore, the requirements for a lubricating film were not met.
【0005】本発明は前記従来技術を解決するために、
磁気記録媒体の凹凸に沿って膜厚がナノメートル程度の
薄い均一な潤滑膜を形成し、滑性耐久性、走行性、耐摩
耗性の優れ、かつ自己潤滑性に有する潤滑膜を設けた磁
気記録媒体、及びその製造方法を提供することを目的と
する。[0005] In order to solve the above-mentioned prior art, the present invention
A magnetic device with a lubricating film that forms a thin, uniform lubricating film with a thickness of about nanometers along the unevenness of a magnetic recording medium, and has excellent lubricity, durability, runnability, and abrasion resistance, as well as self-lubricating properties. The purpose is to provide a recording medium and a method for manufacturing the same.
【0006】[0006]
【課題を解決するための手段】前記目的を達成するため
、本発明の磁気記録媒体は、基体の上に磁気記録材料が
形成されてなる磁気記録媒体において、前記磁気記録媒
体の少なくとも一方の表面に、炭素数の異なる少なくと
も2種以上の直鎖状分子をシロキサン結合を介して結合
させ化学吸着膜を形成したことを特徴とする。Means for Solving the Problems In order to achieve the above object, the magnetic recording medium of the present invention has a magnetic recording material formed on a base, in which at least one surface of the magnetic recording medium is provided. A chemisorption film is formed by bonding at least two types of linear molecules having different carbon numbers via siloxane bonds.
【0007】前記構成においては、炭素数の異なる少な
くとも2種以上の直鎖状分子が、少なくとも末端にフッ
化炭素基を有する分子と末端にメチル基を有する分子で
あることが好ましい。また前記構成においては、炭素数
の異なる少なくとも2種以上の直鎖状分子のうち、炭素
数の多い分子が末端にメチル基を有し、残る分子の少な
くとも1種が末端にフッ化炭素基を有することが好まし
い。[0007] In the above structure, it is preferable that the at least two linear molecules having different numbers of carbon atoms are at least a molecule having a fluorinated carbon group at the end and a molecule having a methyl group at the end. Further, in the above structure, among at least two or more types of linear molecules having different numbers of carbon atoms, the molecule with a larger number of carbon atoms has a methyl group at the end, and at least one of the remaining molecules has a fluorinated carbon group at the end. It is preferable to have.
【0008】さらに前記構成においては、炭素数の異な
る少なくとも2種以上の直鎖状分子の炭素数差が1以上
15以下である請求項1記載の磁気記録媒体。次に本発
明の磁気記録媒体の製造方法は、基体の上に磁気記録材
料が形成されてなる磁気記録媒体に化学吸着膜を設ける
製造方法であって、まず炭素数の異なる少なくとも2種
以上の直鎖状界面活性剤を非水系有機溶液に溶解した溶
液に接触させ、次に前記磁気記録媒体上の余分な前記界
面活性剤を有機溶剤によって除去することを特徴とする
。Further, in the above structure, the magnetic recording medium according to claim 1, wherein the difference in the number of carbon atoms between the at least two linear molecules having different numbers of carbon atoms is 1 or more and 15 or less. Next, the method for manufacturing a magnetic recording medium of the present invention is a manufacturing method in which a chemically adsorbed film is provided on a magnetic recording medium in which a magnetic recording material is formed on a base, and first, at least two types of chemically adsorbed films having different numbers of carbon atoms are formed. The method is characterized in that it is brought into contact with a solution in which a linear surfactant is dissolved in a non-aqueous organic solution, and then excess surfactant on the magnetic recording medium is removed using an organic solvent.
【0009】前記本発明方法においては、炭素数の異な
る少なくとも2種以上の直鎖状界面活性剤が、一端にク
ロロシリル基を有し、残る他方の末端にフッ化炭素基、
またはメチル基を有する界面活性剤であることが好まし
い。In the method of the present invention, at least two linear surfactants having different numbers of carbon atoms have a chlorosilyl group at one end, and a fluorocarbon group at the other end.
Alternatively, a surfactant having a methyl group is preferable.
【0010】0010
【作用】前記本発明の構成によれば、磁気記録媒体の少
なくとも一方の表面に、シロキサン結合を介して化学結
合させた化学吸着膜を形成するため、磁気ヘッドや走行
時に接触する各種部材等との摩擦によって、前記化学吸
着膜が削り落とされることなく、滑性耐久性、走行性、
耐摩耗性の優れた磁気記録媒体が得られる。また膜厚が
ナノメーターレベルのきわめて薄い膜であるから、磁気
記録媒体や磁気記録装置本来の機能を損ねることがない
。[Operation] According to the configuration of the present invention, a chemically adsorbed film chemically bonded via siloxane bonds is formed on at least one surface of the magnetic recording medium, so that the magnetic head and various other members that come into contact with it during running are formed on at least one surface of the magnetic recording medium. The chemical adsorption film is not scraped off by the friction of
A magnetic recording medium with excellent wear resistance can be obtained. Furthermore, since it is an extremely thin film with a thickness on the nanometer level, the original functions of the magnetic recording medium and magnetic recording device are not impaired.
【0011】次に本発明の製造方法によれば、直鎖状界
面活性剤は分子末端にクロロシリル基があるため、水分
に対して極めて活性であるが、水分を極めて低く管理し
た条件で反応を行うので、磁気記録媒体の酸化膜表面の
水酸基と分子末端のクロロシリル基とが脱塩酸反応して
金属酸化物表面に化学結合した1分子長の厚みの薄膜が
一様に形成される。また、分子長を変えることによって
、磁気記録媒体と磁気ヘッドが接触した場合の接触面積
を下げることができ、摩擦や摩耗を抑えることができる
。さらに、分子長の小さい分子にフッ化炭素基を有する
界面活性材を用いることにより、分子同志の摩擦摩耗を
低減できるともに、撥水・撥油効果を膜にもたせること
ができる。Next, according to the production method of the present invention, since the linear surfactant has a chlorosilyl group at the end of the molecule, it is extremely active against moisture, but the reaction can be carried out under conditions where the moisture content is controlled to be extremely low. As a result, the hydroxyl group on the surface of the oxide film of the magnetic recording medium and the chlorosilyl group at the end of the molecule undergo a dehydrochlorination reaction, and a thin film with a thickness of one molecule is uniformly formed, which is chemically bonded to the surface of the metal oxide. Furthermore, by changing the molecular length, it is possible to reduce the contact area when a magnetic recording medium and a magnetic head come into contact, and it is possible to suppress friction and wear. Furthermore, by using a surfactant having a fluorocarbon group in a molecule with a small molecular length, it is possible to reduce frictional wear between the molecules and to impart water- and oil-repellent effects to the film.
【0012】0012
【実施例】本発明の磁気記録媒体としては磁気テ−プ、
光磁気記録ディスク、ハ−ドディスク等があり、磁気記
録媒体に使用しうる基体としては、ポリエチレンテレフ
タレート、ポリエチレン−2,6−ナフタレート、ポリ
フェニレンサルファイド、ポリ塩化ビニル、酢酸セルロ
ース、ポリエチレン、ポリプロピレン、ポリカーボネー
ト、ポリイミド、ポリアミド等の高分子材料、非磁性金
属材料、ガラス、磁器等のセラミック材料等周知の材料
からなるフィルム、板等がある。また、磁気記録材料と
しては、周知の任意の材料が使用でき、例えば鉄、コバ
ルト、ニッケルの1種類以上の合金またはこれらと、他
の金属例えばマンガン、クロム、チタン、リン、イトリ
ウム、サマリウム、ビスマス等とを組み合わせた合金が
あり、また、上記金属の酸化物等がある。基体上に磁気
記録材料を形成させるに当たっては、真空蒸着法、スパ
ッタリング法、メッキ法等任意の周知の方法で形成させ
ることができる。[Example] The magnetic recording medium of the present invention includes magnetic tape,
There are magneto-optical recording disks, hard disks, etc. Substrates that can be used for magnetic recording media include polyethylene terephthalate, polyethylene-2,6-naphthalate, polyphenylene sulfide, polyvinyl chloride, cellulose acetate, polyethylene, polypropylene, and polycarbonate. There are films, plates, etc. made of well-known materials such as polymer materials such as polyimide and polyamide, non-magnetic metal materials, and ceramic materials such as glass and porcelain. Further, as the magnetic recording material, any known material can be used, such as an alloy of one or more of iron, cobalt, and nickel, or an alloy of these and other metals such as manganese, chromium, titanium, phosphorus, yttrium, samarium, and bismuth. There are alloys that combine these metals, and there are also oxides of the above metals. The magnetic recording material can be formed on the substrate by any known method such as vacuum evaporation, sputtering, plating, or the like.
【0013】本発明の化学吸着膜は、炭素数の異なる少
なくとも2種以上の直鎖状界面活性剤からなり、末端に
メチル基、またはフッ化炭素基を有するクロロシラン系
直鎖状界面活性剤である。例えば、下記に示すような(
化1)の化合物群である。The chemisorption film of the present invention is composed of at least two types of linear surfactants having different carbon numbers, and is a chlorosilane linear surfactant having a methyl group or a fluorocarbon group at the end. be. For example, as shown below (
This is a group of compounds represented by chemical formula 1).
【0014】[0014]
【化1】[Chemical formula 1]
【0015】前記(化1)の化合物群においては、(化
1)Aの方が(化1)Bより直鎖の炭素数が多いほうが
好ましく、その炭素数差が1以上15以下であることが
好ましい。さらに、(化1)Bのlの炭素数が0から1
7までの整数であることが好ましい。このような条件を
満たしていれば、3種類以上の界面活性剤を混合するこ
とも可能である。また、低級アルキル基置換のジクロロ
シラン系、あるいは、モノクロロシラン系を用いても同
様な化学吸着膜を形成することができる。さらに、上記
クロロシラン界面活性剤以外のハロゲン化シラン界面活
性剤や、シリコン以外のチタン等の界面活性剤、つまり
、クロロチタン界面活性剤等でも同様の効果が得られる
。In the group of compounds represented by (Chemical Formula 1) above, it is preferable that (Chemical Formula 1) A has a larger number of linear carbon atoms than (Chemical Formula 1) B, and the difference in the number of carbon atoms is 1 or more and 15 or less. is preferred. Furthermore, the number of carbon atoms in l of (Chemical formula 1) B is from 0 to 1.
Preferably it is an integer up to 7. As long as these conditions are met, it is also possible to mix three or more types of surfactants. Further, a similar chemically adsorbed film can be formed using a lower alkyl group-substituted dichlorosilane type or a monochlorosilane type. Furthermore, similar effects can be obtained with halogenated silane surfactants other than the above-mentioned chlorosilane surfactants, and surfactants other than silicon such as titanium, ie, chlorotitanium surfactants.
【0016】本発明の磁気記録媒体の製造方法は、直鎖
状界面活性剤の非水系有機溶液に浸漬する工程と前記磁
気記録媒体上の余分な前記界面活性剤を有機溶剤によっ
て除去する工程とからなる。両工程において、界面活性
剤中のクロロシリル基は水分に対して極めて活性である
ため、乾燥窒素ガス等によってできるだけ乾燥状態に管
理する必要があり、湿度25%以下に管理された雰囲気
で行われることが好ましい。前記工程において、磁気記
録媒体の全表面に水酸基の露出が少なく、全表面を一様
に直鎖状界面活性剤からなる化学吸着膜で覆うことが難
しい場合は、直鎖状界面活性剤からなる溶液に浸漬する
前に、たとえば、SiCl4 、SiHCl3 、Si
H2 Cl2 、Cl−(SiCl2 O)n −Si
Cl3 (但し式中nは自然数)、SiClm (CH
3 )4−m 、SiClm (C2 H5 )4−m
(ただし式中mは1〜3の整数)、HSiCll (
CH3 )3−l 、HSiCll (C2 H5 )
3−l (但し式中lは1又は2)等のようなクロロシ
リル結合を複数個含む物質を磁気記録媒体表面に化学吸
着させた後、水と反応すると表面のクロロシリル結合が
親水性のシラノール結合に変わり、基体表面が親水性と
なる。なお、このクロロシリル基を複数個含む物質の中
でも、テトラクロロシラン(SiCl4 )は反応性が
高く分子量も小さいためより高密度にシラノール結合を
付与できるため好ましい。このようにして親水性化した
後、直鎖状界面活性剤に浸漬し化学吸着膜を形成するこ
とができる。The method for manufacturing a magnetic recording medium of the present invention includes the steps of: immersing the magnetic recording medium in a non-aqueous organic solution of a linear surfactant; and removing excess surfactant on the magnetic recording medium with an organic solvent. Consisting of In both processes, the chlorosilyl group in the surfactant is extremely active against moisture, so it is necessary to keep it as dry as possible using dry nitrogen gas, etc., and the process must be carried out in an atmosphere with a controlled humidity of 25% or less. is preferred. In the above step, if there are few exposed hydroxyl groups on the entire surface of the magnetic recording medium and it is difficult to uniformly cover the entire surface with a chemically adsorbed film made of a linear surfactant, a chemical adsorption film made of a linear surfactant is used. For example, SiCl4, SiHCl3, Si
H2Cl2, Cl-(SiCl2O)n-Si
Cl3 (where n is a natural number in the formula), SiClm (CH
3) 4-m, SiClm (C2 H5) 4-m
(However, in the formula, m is an integer of 1 to 3), HSiCl (
CH3)3-l, HSiCl(C2H5)
After a substance containing multiple chlorosilyl bonds such as 3-l (where l is 1 or 2 in the formula) is chemically adsorbed onto the surface of a magnetic recording medium, when it reacts with water, the chlorosilyl bonds on the surface become hydrophilic silanol bonds. The surface of the substrate becomes hydrophilic. Among these substances containing a plurality of chlorosilyl groups, tetrachlorosilane (SiCl4) is preferable because it has high reactivity and a small molecular weight, so that silanol bonds can be provided at a higher density. After making it hydrophilic in this way, it can be immersed in a linear surfactant to form a chemically adsorbed film.
【0017】本発明に用いる非水系溶媒は、クロロシラ
ン系界面活性剤と反応する活性水素を持たない有機溶媒
であればよい。その例としては1,1−ジクロロ,1−
フルオロエタン、1,1−ジクロロ,2、2、2−トリ
フルオロエタン、1,1−ジクロロ,2,2,3,3,
3−ペンタフルオロプロパン、1,3−ジクロロ,1,
1,2,2,3−ヘプタフルオロプロパン等のフッ素系
溶媒、たとえばヘキサン、オクタン、ヘキサデカン、シ
クロヘキサン等の炭化水素系溶媒、たとえばジブチルエ
ーテル、ジベンジルエーテル等のエーテル系溶媒、例え
ば酢酸メチル、酢酸エチル、酢酸イソプロピル、酢酸ア
ミル等エステル系溶媒の何れかが好ましい。The nonaqueous solvent used in the present invention may be any organic solvent that does not have active hydrogen that reacts with the chlorosilane surfactant. Examples include 1,1-dichloro, 1-
Fluoroethane, 1,1-dichloro,2,2,2-trifluoroethane, 1,1-dichloro,2,2,3,3,
3-pentafluoropropane, 1,3-dichloro,1,
Fluorine solvents such as 1,2,2,3-heptafluoropropane, hydrocarbon solvents such as hexane, octane, hexadecane, and cyclohexane, ether solvents such as dibutyl ether and dibenzyl ether, such as methyl acetate, acetic acid Any of ester solvents such as ethyl, isopropyl acetate, and amyl acetate is preferred.
【0018】以下に、本発明の代表例を示す。
実施例1
界面活性材には信越化学工業株式会社製オクタデシルト
リクロロシランおよび東芝シリコン株式会社製ヘプタフ
ルオロエチルトリクロロシランを用いた。前記界面活性
剤を1:1のモル比でアルドリッチ製ヘキサデカン、関
東化学株式会社製クロロホルムおよび四塩化炭素の非水
系混合溶媒(重量比80:12:8)に1ミリモル/リ
ットルとなるように溶かし、界面活性剤溶液2を作成し
た。前記溶液は密閉したポリテトラフルオロエチレン容
器に保存した。次に、乾燥窒素ガスによって湿度10%
の乾燥状態に保ったグローブバック内に、基体浸漬用の
シャーレ1を入れ、シャーレ1内に前記界面活性剤溶液
2を入れた。基材として加工洗浄の終えた磁気記録媒体
としてハードディスク3を用い、界面活性剤溶液2に1
時間浸漬した(図1)。ハードディスクの最表面には酸
化物からなる膜が形成されており、酸化膜4表面には多
くの水酸基5が露出している(図2)。1時間の浸漬に
より、ハードディスク表面の水酸基5とトリクロロシラ
ン基との脱塩酸反応が十分進み、下記に示すような(化
2)、(化3)のシロキサン結合が形成され、化学吸着
膜6によってよって一様に覆われた。Representative examples of the present invention are shown below. Example 1 Octadecyltrichlorosilane manufactured by Shin-Etsu Chemical Co., Ltd. and heptafluoroethyltrichlorosilane manufactured by Toshiba Silicon Corporation were used as surfactants. The above surfactant was dissolved at a molar ratio of 1:1 in a non-aqueous mixed solvent of hexadecane manufactured by Aldrich, chloroform and carbon tetrachloride manufactured by Kanto Kagaku Co., Ltd. (weight ratio 80:12:8) so that the concentration was 1 mmol/liter. , surfactant solution 2 was prepared. The solution was stored in a closed polytetrafluoroethylene container. Next, the humidity is reduced to 10% using dry nitrogen gas.
A petri dish 1 for immersing the substrate was placed in a glove bag kept in a dry state, and the surfactant solution 2 was placed in the petri dish 1. Using a hard disk 3 as a magnetic recording medium that has been processed and cleaned as a base material, 1
It was soaked for an hour (Figure 1). A film made of oxide is formed on the outermost surface of the hard disk, and many hydroxyl groups 5 are exposed on the surface of the oxide film 4 (FIG. 2). By immersion for 1 hour, the dehydrochloric acid reaction between the hydroxyl group 5 and the trichlorosilane group on the hard disk surface progresses sufficiently, and the siloxane bonds of (Chemical formula 2) and (Chemical formula 3) shown below are formed, and the siloxane bonds are formed by the chemical adsorption film 6. Therefore, it was uniformly covered.
【0019】[0019]
【化2】[Case 2]
【0020】[0020]
【化3】[Chemical formula 3]
【0021】このとき、ハードディスク上に形成された
薄膜を構成している界面活性剤の比率は、浸漬溶液を作
成した界面活性剤の混合比率とほぼ同じであることを確
認した。つぎに、前記グローブバック内を同様に湿度1
0%に管理し、クロロホルムの入った洗浄容器7を入れ
、界面活性剤溶液から取り出したハードディスク3を洗
浄容器7に入れ、スターラーによる撹拌洗浄を15分間
、さらにクロロホルムを替えて2回行った(図4)。
この操作で、ハードディスク上に化学結合せず物理吸着
している界面活性材は取り除かれる。これら一連の処理
によって、ハ−ドディスク上にオクタデシルトリクロロ
シランおよびヘプタフルオロエチルトリクロロシランか
らなる界面活性剤の分子長分の膜厚(この場合は約2.
5ナノメートル)で化学吸着膜6が形成された。この薄
膜形成されたハードディスクの動摩擦係数は、20g荷
重の測定において200回の摺動後で0.1以下となり
、実用に耐え得ることが確認できた。At this time, it was confirmed that the ratio of surfactants constituting the thin film formed on the hard disk was approximately the same as the mixing ratio of surfactants used to prepare the immersion solution. Next, the humidity inside the glove bag is 1
A cleaning container 7 containing chloroform was placed in the cleaning container 7, and the hard disk 3 removed from the surfactant solution was placed in the cleaning container 7, and stirred and cleaned with a stirrer for 15 minutes, and the chloroform was changed twice. Figure 4). This operation removes the surfactant that is not chemically bonded but physically adsorbed onto the hard disk. Through this series of treatments, a film thickness of the surfactant consisting of octadecyltrichlorosilane and heptafluoroethyltrichlorosilane corresponding to the molecular length (in this case, approximately 2.0 mm) is formed on the hard disk.
A chemisorption film 6 was formed with a thickness of 5 nm). The dynamic friction coefficient of the hard disk on which this thin film was formed was 0.1 or less after 200 sliding movements under a load of 20 g, and it was confirmed that it could withstand practical use.
【0022】実施例2
厚さ20μmのポリイミドフィルム基板上に、真空蒸着
法によりコバルト(90wt%)−クロム(10wt%
)からなる膜厚150nmの強磁性金属薄膜を作成した
。この強磁性金属薄膜を形成した基板から100mm×
100mmの大きさの片を切取り、信越化学工業株式会
社製オクタデシルトリクロロシランおよび東芝シリコン
株式会社製ヘプタフルオロエチルトリクロロシランを1
:1のモル比でアルドリッチ製ヘキサデカン、関東化学
株式会社製クロロホルムおよび四塩化炭素の非水系混合
溶媒(重量比80:12:8)に1ミリモル/リットル
となるように溶かした界面活性剤溶液に、乾燥窒素ガス
によって湿度10%の乾燥状態に保ったグローブバック
内で、1時間浸漬し、引き続いて未反応の界面活性剤を
クロロホルムで洗浄した。オクタデシルトリクロロシラ
ンおよびヘプタフルオロエチルトリクロロシランからな
る界面活性剤がシロキサン結合を介して化学吸着膜を前
記強磁性金属薄膜表面に形成した。用いた界面活性剤の
分子長分の膜厚(この場合は約2.5ナノメートル)で
化学吸着膜が形成されており、この薄膜形成されたハー
ドディスクの動摩擦係数は、20g荷重の測定において
200回の摺動後で0.1以下となり、実用に耐え得る
ことが確認できた。Example 2 Cobalt (90 wt%) - chromium (10 wt%) was deposited on a 20 μm thick polyimide film substrate by vacuum evaporation method.
) A ferromagnetic metal thin film with a thickness of 150 nm was prepared. 100mm× from the substrate on which this ferromagnetic metal thin film was formed.
Cut a piece of 100 mm in size, and add 1 portion of octadecyltrichlorosilane manufactured by Shin-Etsu Chemical Co., Ltd. and heptafluoroethyltrichlorosilane manufactured by Toshiba Silicon Co., Ltd.
: In a surfactant solution dissolved in a non-aqueous mixed solvent (weight ratio 80:12:8) of hexadecane manufactured by Aldrich, chloroform manufactured by Kanto Kagaku Co., and carbon tetrachloride (weight ratio 80:12:8) at a molar ratio of 1 mmol/liter. The sample was immersed for 1 hour in a glove bag kept in a dry state with a humidity of 10% using dry nitrogen gas, and subsequently, unreacted surfactant was washed away with chloroform. Surfactants consisting of octadecyltrichlorosilane and heptafluoroethyltrichlorosilane formed a chemically adsorbed film on the surface of the ferromagnetic metal thin film through siloxane bonds. A chemically adsorbed film is formed with a film thickness equal to the molecular length of the surfactant used (approximately 2.5 nanometers in this case), and the dynamic friction coefficient of the hard disk formed with this thin film is 200 when measured under a 20g load. After several times of sliding, it was 0.1 or less, confirming that it could withstand practical use.
【0023】なお、以上の実施例では、ハ−ドディスク
、磁気テ−プについて示したが、本発明の磁気記録媒体
は磁気ディスク、磁気カ−ド、光磁気記録ディスク等に
も適用できることが明らかである。またたとえば磁気テ
ープなどにおいては、本発明の化学吸着膜を記録材料層
側に形成してもよいし、裏面の樹脂基材層側に形成して
もよい。[0023] In the above embodiments, hard disks and magnetic tapes were shown, but the magnetic recording medium of the present invention can also be applied to magnetic disks, magnetic cards, magneto-optical recording disks, etc. it is obvious. Further, for example, in the case of a magnetic tape, the chemical adsorption film of the present invention may be formed on the recording material layer side, or may be formed on the resin base layer side on the back side.
【0024】[0024]
【発明の効果】以上説明した通り本発明によれば、前記
磁気記録媒体の少なくとも一方の表面に、炭素数の異な
る少なくとも2種以上の直鎖状分子をシロキサン結合で
化学結合させた化学吸着膜を形成することにより、磁気
ヘッドや磁気テープなどの磁気記録媒体の走行時に接触
する各種部材等との摩擦によって、前記化学吸着膜が削
り落とされることがなく、滑性耐久性、走行性、耐摩耗
性にすぐれ、それを長期間維持することができる。この
化学吸着膜が、末端にフッ化炭素基、または、メチル基
を有する炭素数の異なる直鎖状クロロシラン系界面活性
剤であり、それぞれの界面活性剤の分子長を変えること
によって、磁気記録媒体と磁気ヘッドが接触した場合の
接触面積を下げることができ、摩擦摩耗を抑えることが
できる。さらに、分子長の小さい分子にフッ化炭素基を
有する界面活性材を用いることにより、分子同士の摩擦
摩耗を低減できるともに、撥油効果を膜にもたせること
ができる。As explained above, according to the present invention, there is provided a chemical adsorption film on at least one surface of the magnetic recording medium, in which at least two linear molecules having different numbers of carbon atoms are chemically bonded through siloxane bonds. By forming the chemically adsorbed film, the chemical adsorption film is not scraped off by friction with various members that come into contact with the magnetic recording medium such as the magnetic head and magnetic tape when it runs, and improves lubricity, durability, runnability, and durability. It has excellent abrasion resistance and can be maintained for a long period of time. This chemically adsorbed film is made of linear chlorosilane surfactants with different numbers of carbon atoms having a fluorocarbon group or a methyl group at the end, and by changing the molecular length of each surfactant, magnetic recording media can be The contact area when the magnetic head comes into contact with the magnetic head can be reduced, and frictional wear can be suppressed. Further, by using a surfactant having a fluorocarbon group in a molecule having a small molecular length, it is possible to reduce frictional wear between the molecules, and it is also possible to impart an oil-repellent effect to the film.
【図1】 本発明の磁気記録媒体表面に化学吸着膜を
形成するための製造方法の工程概念図である。FIG. 1 is a process conceptual diagram of a manufacturing method for forming a chemically adsorbed film on the surface of a magnetic recording medium according to the present invention.
【図2】 本発明の磁気記録媒体の第1の実施例を説
明するために磁気記録媒体表面を分子レベルまで拡大し
た処理前の断面概念図である。FIG. 2 is a conceptual cross-sectional view of the magnetic recording medium surface before processing, enlarged to the molecular level, for explaining the first embodiment of the magnetic recording medium of the present invention.
【図3】 本発明の磁気記録媒体の第1の実施例を説
明するために磁気記録媒体表面を分子レベルまで拡大し
た処理後の断面概念図である。FIG. 3 is a conceptual cross-sectional view of the magnetic recording medium surface after processing, enlarged to the molecular level, in order to explain the first embodiment of the magnetic recording medium of the present invention.
【図4】 本発明の磁気記録媒体表面に化学吸着膜形
成後、余分な界面活性剤を洗浄するための製造方法の工
程概念図である。FIG. 4 is a conceptual diagram of a manufacturing method for cleaning excess surfactant after forming a chemically adsorbed film on the surface of a magnetic recording medium according to the present invention.
1 シャーレ 2 界面活性剤溶液 3 ハードディスク 4 酸化膜 5 水酸基 6 化学吸着膜 7 洗浄容器 1 Petri dish 2 Surfactant solution 3 Hard disk 4 Oxide film 5 Hydroxyl group 6 Chemical adsorption membrane 7. Cleaning container
Claims (6)
なる磁気記録媒体において、前記磁気記録媒体の少なく
とも一方の表面に、炭素数の異なる少なくとも2種以上
の直鎖状分子をシロキサン結合を介して結合させ化学吸
着膜を形成したことを特徴とする磁気記録媒体。1. A magnetic recording medium comprising a magnetic recording material formed on a substrate, wherein at least one surface of the magnetic recording medium is provided with siloxane bonds of at least two or more linear molecules having different numbers of carbon atoms. 1. A magnetic recording medium characterized in that a chemically adsorbed film is formed by bonding via a chemically adsorbed film.
直鎖状分子が、少なくとも末端にフッ化炭素基を有する
分子と末端にメチル基を有する分子である請求項1記載
の磁気記録媒体。2. The magnetic recording medium according to claim 1, wherein the at least two linear molecules having different numbers of carbon atoms are at least a molecule having a fluorinated carbon group at the end and a molecule having a methyl group at the end.
直鎖状分子のうち、炭素数の多い分子が末端にメチル基
を有し、残る分子の少なくとも1種が末端にフッ化炭素
基を有する請求項1記載の磁気記録媒体。3. Among at least two or more types of linear molecules having different numbers of carbon atoms, the molecule with a larger number of carbon atoms has a methyl group at its end, and at least one of the remaining molecules has a fluorinated carbon group at its end. The magnetic recording medium according to claim 1.
直鎖状分子の炭素数差が1以上15以下である請求項1
記載の磁気記録媒体。Claim 4: Claim 1, wherein the difference in the number of carbon atoms between at least two or more linear molecules having different numbers of carbon atoms is 1 or more and 15 or less.
The magnetic recording medium described.
なる磁気記録媒体に化学吸着膜を設ける製造方法であっ
て、まず炭素数の異なる少なくとも2種以上の直鎖状界
面活性剤を非水系有機溶液に溶解した溶液に接触させ、
次に前記磁気記録媒体上の余分な前記界面活性剤を有機
溶剤によって除去することを特徴とする磁気記録媒体の
製造方法。5. A manufacturing method for providing a chemically adsorbed film on a magnetic recording medium having a magnetic recording material formed on a substrate, the method comprising: first adding at least two types of linear surfactants having different numbers of carbon atoms; Contact with a solution dissolved in an aqueous organic solution,
A method for manufacturing a magnetic recording medium, characterized in that the excess surfactant on the magnetic recording medium is then removed using an organic solvent.
直鎖状界面活性剤が、一端にクロロシリル基を有し、残
る他方の末端にフッ化炭素基、またはメチル基を有する
界面活性剤である請求項5記載の磁気記録媒体の製造方
法。6. At least two linear surfactants having different numbers of carbon atoms are surfactants having a chlorosilyl group at one end and a fluorocarbon group or a methyl group at the other end. The method for manufacturing a magnetic recording medium according to claim 5.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9891191A JP2846746B2 (en) | 1991-04-30 | 1991-04-30 | Magnetic recording medium and method of manufacturing the same |
KR1019920001353A KR0138251B1 (en) | 1991-02-05 | 1992-01-30 | Magnetic recording medium and its manufacturing method |
EP19920101718 EP0498338B1 (en) | 1991-02-05 | 1992-02-03 | Magnetic recording medium and method of manufacturing the same |
DE1992607784 DE69207784T2 (en) | 1991-02-05 | 1992-02-03 | Magnetic recording medium and method for its production |
CA 2060629 CA2060629C (en) | 1991-02-05 | 1992-02-04 | Magnetic recording medium and method of manufacturing the same |
US08/155,244 US5443901A (en) | 1991-02-05 | 1993-11-22 | Magnetic recording medium having an adsorbed film of molecules comprising two species of straight carbon chain molecules |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9891191A JP2846746B2 (en) | 1991-04-30 | 1991-04-30 | Magnetic recording medium and method of manufacturing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04328321A true JPH04328321A (en) | 1992-11-17 |
JP2846746B2 JP2846746B2 (en) | 1999-01-13 |
Family
ID=14232316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9891191A Expired - Lifetime JP2846746B2 (en) | 1991-02-05 | 1991-04-30 | Magnetic recording medium and method of manufacturing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2846746B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5985403A (en) * | 1993-03-18 | 1999-11-16 | Hitachi, Ltd. | Magnetic recording medium and magnetic recording reproducer |
JP2011526656A (en) * | 2009-06-10 | 2011-10-13 | 東レ先端素材株式会社 | Substrate surface treatment method that makes the surface of the substrate highly hydrophobic |
JP2012158100A (en) * | 2011-02-01 | 2012-08-23 | Seiko Epson Corp | Method for manufacturing nozzle plate, and liquid ejection head |
-
1991
- 1991-04-30 JP JP9891191A patent/JP2846746B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5985403A (en) * | 1993-03-18 | 1999-11-16 | Hitachi, Ltd. | Magnetic recording medium and magnetic recording reproducer |
JP2011526656A (en) * | 2009-06-10 | 2011-10-13 | 東レ先端素材株式会社 | Substrate surface treatment method that makes the surface of the substrate highly hydrophobic |
JP2012158100A (en) * | 2011-02-01 | 2012-08-23 | Seiko Epson Corp | Method for manufacturing nozzle plate, and liquid ejection head |
Also Published As
Publication number | Publication date |
---|---|
JP2846746B2 (en) | 1999-01-13 |
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