JPH04328161A - Fluororesin-containing polyamic acid composition, fluororesin-containing polyimide composition and film obtained from the same - Google Patents

Fluororesin-containing polyamic acid composition, fluororesin-containing polyimide composition and film obtained from the same

Info

Publication number
JPH04328161A
JPH04328161A JP12285091A JP12285091A JPH04328161A JP H04328161 A JPH04328161 A JP H04328161A JP 12285091 A JP12285091 A JP 12285091A JP 12285091 A JP12285091 A JP 12285091A JP H04328161 A JPH04328161 A JP H04328161A
Authority
JP
Japan
Prior art keywords
polyimide
formula
fluororesin
polyamic acid
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12285091A
Other languages
Japanese (ja)
Inventor
Shigekuni Sasaki
重邦 佐々木
Toru Matsuura
徹 松浦
Shinji Ando
慎治 安藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP12285091A priority Critical patent/JPH04328161A/en
Publication of JPH04328161A publication Critical patent/JPH04328161A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0373Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers

Landscapes

  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain a polyamic acid composition or a polyimide composition, capable of producing a polyimide film having a low dielectric constant by dispersing fluororesin powder in a specific fluorinated polyamic acid or fluorinated polyimide. CONSTITUTION:A composition is obtained by adding and homogeneously dispersing (B) fluororesin powder (e.g. tetrafluoroethylene resin) and, as necessary, a surfactant in (A) (A1) a polyamic acid solution, prepared by using a tetracarboxylic acid (derivative) and a diamine in which all monovalent elements such as alkyl groups or phenyl rings linked to carbon in the molecule are converted into fluorine or perfluoroalkyl groups as raw materials and consisting essentially of a polyamic acid having recurring units expressed by formula I [R1 is formulas II, III, etc., (Rf. is fluorine or perfluoroalkyl; X is O, CO, CO2, etc.); R2 is formulas TV, V, etc.] or (A2) a polyimide solution consisting essentially of a polyimide having recurring units expressed by formula VI. The resultant composition is hot cured to afford the polyimide film.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、フッ素樹脂粉末が特定
のフッ素化ポリアミド酸又はフッ素化ポリイミドに分散
している組成物及びその組成物から得られるフィルムに
関するものであり、特に誘電率の低いポリイミドフィル
ムに関する。
[Industrial Application Field] The present invention relates to a composition in which fluororesin powder is dispersed in a specific fluorinated polyamic acid or fluorinated polyimide, and a film obtained from the composition, and particularly relates to a film having a low dielectric constant. Regarding polyimide film.

【0002】0002

【従来の技術】現在通信用部品に要求される性能として
最も重要なものの一つに高速化がある。半導体素子の高
速化の研究が盛んに行われ、多くの高速な素子が開発さ
れている。半導体素子は配線板に搭載されてはじめて実
用になるものであり、素子自体の高速化が達成されても
配線側の信号伝播遅延時間が大きいと全体として高速化
が達成できない。一般に配線板材料の誘電率と信号伝播
遅延時間との間には、下記の式(数1)に示す関係があ
る。
2. Description of the Related Art One of the most important performances currently required of communication components is high speed. Research into increasing the speed of semiconductor devices has been actively conducted, and many high-speed devices have been developed. Semiconductor elements are put into practical use only after being mounted on a wiring board, and even if the speed of the element itself is increased, if the signal propagation delay time on the wiring side is large, the overall speed cannot be increased. Generally, there is a relationship between the dielectric constant of the wiring board material and the signal propagation delay time as shown in the following equation (Equation 1).

【数1】T=ε1/2 /C ここで、Tは信号伝播遅延時間、εは誘電率、Cは光速
。したがって配線板材料や配線の被覆材料の誘電率を低
くすることにより、信号伝播遅延時間を大幅に短縮でき
高速化を達成することができる。例えばこれまで用いら
れていたセラミック配線板の替りにポリイミド配線板を
用いることにより、配線遅延時間を大幅に短縮している
。またポリテトラフルオロエチレンは誘電率が2.0と
小さく、これを種々の材料と複合化することにより低誘
電率の材料が得られている。例えばガラステフロン基板
は、誘電率が低く、耐熱性も比較的高いのでプリント配
線基板として使用される材料であるとされているが、機
械加工性、寸法安定性、接着性に問題がある。また特開
平2−286743号公報では、芳香族ポリイミド自体
が有機極性溶媒中に溶解しているポリイミド溶液に、フ
ッ素樹脂粉末が均一に分散している芳香族ポリイミド溶
液組成物を明らかにしている。この溶液組成物を使用す
ることにより、プリント配線板上に低誘電率の耐熱性の
ポリイミド層又はポリイミドフィルムを形成することが
できるとしている。
[Equation 1] T=ε1/2 /C Here, T is the signal propagation delay time, ε is the dielectric constant, and C is the speed of light. Therefore, by lowering the dielectric constant of the wiring board material and wiring coating material, signal propagation delay time can be significantly shortened and high speeds can be achieved. For example, by using a polyimide wiring board instead of the ceramic wiring board that has been used up to now, wiring delay time can be significantly reduced. Furthermore, polytetrafluoroethylene has a low dielectric constant of 2.0, and by compounding it with various materials, materials with a low dielectric constant can be obtained. For example, a glass Teflon substrate has a low dielectric constant and relatively high heat resistance, so it is said to be a material used as a printed wiring board, but it has problems with machinability, dimensional stability, and adhesiveness. Further, JP-A-2-286743 discloses an aromatic polyimide solution composition in which fluororesin powder is uniformly dispersed in a polyimide solution in which the aromatic polyimide itself is dissolved in an organic polar solvent. It is said that by using this solution composition, a heat-resistant polyimide layer or polyimide film with a low dielectric constant can be formed on a printed wiring board.

【0003】0003

【発明が解決しようとする課題】しかしながら、このも
のの誘電率の値は2.6とまだ大きかった。更なる低誘
電率化が必要である。本発明はこのような現状にかんが
みてなされたものであり、その目的はプリント配線板に
適用できる低誘電率なポリイミドフィルム、またそのフ
ィルムを製造するのに必要なポリアミド酸組成物又はポ
リイミド組成物を提供することにある。
[Problems to be Solved by the Invention] However, the dielectric constant value of this material was still large at 2.6. It is necessary to further lower the dielectric constant. The present invention was made in view of the current situation, and its purpose is to provide a polyimide film with a low dielectric constant that can be applied to printed wiring boards, and a polyamic acid composition or polyimide composition necessary for producing the film. Our goal is to provide the following.

【0004】0004

【課題を解決するための手段】本発明を概説すれば、本
発明の第1の発明は、特定のポリアミド酸とフッ素樹脂
粉末を必須構成要素とするフッ素樹脂含有ポリアミド酸
組成物に関する発明であって、下記一般式(化1):
[Means for Solving the Problems] To summarize the present invention, the first invention relates to a fluororesin-containing polyamic acid composition containing a specific polyamic acid and fluororesin powder as essential components. Then, the following general formula (Chemical formula 1):


化1】 〔式中R1 は下記式(化2):
[
Chemical Formula 1] [In the formula, R1 is the following formula (Chemical Formula 2):

【化2】 で表される基のうちのいずれかの基、R2 は下記式(
化3):
Any group among the groups represented by [Chemical formula 2], R2 is represented by the following formula (
3):

【化3】 で表される基のうちのいずれかの基であり、ここで式中
Rfはフッ素、又はパーフルオロアルキル基、Xは下記
式(化4):
[Chemical Formula 3] Wherein Rf is fluorine or a perfluoroalkyl group, and X is the following formula (Chemical Formula 4):

【化4】 (ここで式中Rf′はパーフルオロアルキレン基、nは
1〜10の数を示す)で表される基のうちのいずれかの
基である〕で表される繰返し単位を含有するポリアミド
酸を主成分とするポリアミド酸成分と、フッ素樹脂粉末
とを必須構成要素とすることを特徴とする。本発明の第
2の発明は、特定のポリイミドとフッ素樹脂粉末を必須
構成要素するフッ素樹脂含有ポリイミド組成物に関する
発明であって、下記一般式(化5):
Contains a repeating unit represented by [Chemical formula 4] (wherein Rf' is a perfluoroalkylene group and n is a number from 1 to 10) It is characterized by having a polyamic acid component containing polyamic acid as a main component and fluororesin powder as essential components. The second invention of the present invention relates to a fluororesin-containing polyimide composition containing a specific polyimide and fluororesin powder as essential components, which has the following general formula (Chemical formula 5):

【化5】 〔式中R1 及びR2 は一般式(化1)中のR1 及
びR2 と同義である〕で表される繰返し単位を含有す
るポリイミドを主成分とするポリイミド成分と、フッ素
樹脂粉末とを必須構成要素とすることを特徴とする。本
発明の第3の発明は、ポリイミドフィルムに関する発明
であって、該フィルムが、上記第1の発明のフッ素樹脂
含有ポリアミド酸組成物、又は第2の発明のフッ素樹脂
含有ポリイミド組成物を加熱キュアして得られるもので
あることを特徴とする。
[Chemical formula 5] [In the formula, R1 and R2 have the same meanings as R1 and R2 in the general formula (Chemical formula 1)] A polyimide component mainly composed of polyimide containing a repeating unit represented by the formula, and a fluororesin powder. is characterized in that it is an essential component. A third invention of the present invention relates to a polyimide film, wherein the film is formed by heat curing the fluororesin-containing polyamic acid composition of the first invention or the fluororesin-containing polyimide composition of the second invention. It is characterized by being obtained by

【0005】本発明者らは、誘電率の低いポリイミドに
関する検討を進めた結果、これまでに知られていない特
定のポリイミドを開発した。このポリイミドはアルキル
基、フェニル環等の炭素に結合するすべての1価元素を
フッ素、又はパーフルオロアルキル基に置き換えた全く
新しいポリイミドであり、すべて炭素−フッ素結合とな
っているため低誘電率化が達成できたと共にフッ素樹脂
との相溶性も向上することができた。
[0005] As a result of our research into polyimides with low dielectric constants, the present inventors have developed a specific polyimide that has not been previously known. This polyimide is a completely new polyimide in which all monovalent elements bonded to carbon such as alkyl groups and phenyl rings are replaced with fluorine or perfluoroalkyl groups, and all carbon-fluorine bonds result in a low dielectric constant. was achieved, and the compatibility with the fluororesin was also improved.

【0006】本発明の全フッ素化ポリイミドを製造する
時に使用するテトラカルボン酸又はその誘導体としては
、分子内のアルキル基、フェニル環等の炭素に結合する
すべての1価元素をフッ素、又はパーフルオロアルキル
基としたものであればどのようなものでもよい。テトラ
カルボン酸並びにその誘導体としての酸無水物、酸塩化
物、エステル化物等としては次のようなものが挙げられ
る。ここではテトラカルボン酸としての例を挙げると1
,4−ジフルオロピロメリット酸、1−トリフルオロメ
チル−4−フルオロピロメリット酸、1,4−ジ(トリ
フルオロメチル)ピロメリット酸、1,4−ジ(ペンタ
フルオロエチル)ピロメリット酸、ヘキサフルオロ−3
,3′,4,4′−ビフェニルテトラカルボン酸、ヘキ
サフルオロ−3,3′,4,4′−ベンゾフェノンテト
ラカルボン酸、2,2−ビス(3,4−ジカルボキシト
リフルオロフェニル)ヘキサフルオロプロパン、1,3
−ビス(3,4−ジカルボキシトリフルオロフェニル)
ヘキサフルオロプロパン、1,4−ビス(3,4−ジカ
ルボキシトリフルオロフェノキシ)テトラフルオロベン
ゼン、ヘキサフルオロ−3,3′(又は4,4′)−オ
キシビスフタル酸等が挙げられる。この中でピロメリッ
ト酸二無水物のベンゼン環にフルオロアルキル基を導入
した含フッ素酸二無水物である1,4−ジ(トリフルオ
ロメチル)ピロメリット酸二無水物、1,4−ジ(ペン
タフルオロエチル)ピロメリット酸二無水物等の製造方
法は特願昭63−165056号明細書に記載されてい
る。
[0006] In the tetracarboxylic acid or its derivative used in producing the perfluorinated polyimide of the present invention, all monovalent elements bonded to carbon atoms such as alkyl groups and phenyl rings in the molecule are replaced with fluorine or perfluorinated Any alkyl group may be used. Examples of tetracarboxylic acids and their derivatives such as acid anhydrides, acid chlorides, and esters include the following. Here, an example of a tetracarboxylic acid is 1
, 4-difluoropyromellitic acid, 1-trifluoromethyl-4-fluoropyromellitic acid, 1,4-di(trifluoromethyl)pyromellitic acid, 1,4-di(pentafluoroethyl)pyromellitic acid, hexa Fluoro-3
, 3',4,4'-biphenyltetracarboxylic acid, hexafluoro-3,3',4,4'-benzophenonetetracarboxylic acid, 2,2-bis(3,4-dicarboxytrifluorophenyl)hexafluoro Propane, 1,3
-bis(3,4-dicarboxytrifluorophenyl)
Examples include hexafluoropropane, 1,4-bis(3,4-dicarboxytrifluorophenoxy)tetrafluorobenzene, and hexafluoro-3,3' (or 4,4')-oxybisphthalic acid. Among them, 1,4-di(trifluoromethyl)pyromellitic dianhydride, 1,4-di(trifluoromethyl)pyromellitic dianhydride, which is a fluorine-containing dianhydride with a fluoroalkyl group introduced into the benzene ring of pyromellitic dianhydride, and 1,4-di( A method for producing pyromellitic dianhydride (pentafluoroethyl) is described in Japanese Patent Application No. 165056/1983.

【0007】また本発明に用いることのできるジアミン
の例としては、アルキル基、フェニル環等の炭素に結合
するすべての1価元素をフッ素、又はパーフルオロアル
キル基としたものであればどのようなものでもよく、3
,4,5,6−テトラフルオロ−1,2−フェニレンジ
アミン、2,4,5,6−テトラフルオロ−1,3−フ
ェニレンジアミン、2,3,5,6−テトラフルオロ−
1,4−フェニレンジアミン、4,4′−ジアミノオク
タフルオロビフェニル、ビス(2,3,5,6−テトラ
フルオロ−4−アミノフェニル)エーテル、ビス(2,
3,5,6−テトラフルオロ−4−アミノフェニル)ス
ルホン、ヘキサフルオロ−2,2′−ビス(トリフルオ
ロメチル)−4,4′−ジアミノビフェニル等が挙げら
れる。
Examples of diamines that can be used in the present invention include any diamine in which all monovalent elements bonded to carbon such as alkyl groups and phenyl rings are fluorine or perfluoroalkyl groups. It can be anything, 3
, 4,5,6-tetrafluoro-1,2-phenylenediamine, 2,4,5,6-tetrafluoro-1,3-phenylenediamine, 2,3,5,6-tetrafluoro-
1,4-phenylenediamine, 4,4'-diaminooctafluorobiphenyl, bis(2,3,5,6-tetrafluoro-4-aminophenyl)ether, bis(2,
Examples include 3,5,6-tetrafluoro-4-aminophenyl)sulfone, hexafluoro-2,2'-bis(trifluoromethyl)-4,4'-diaminobiphenyl, and the like.

【0008】全フッ素化ポリアミド酸の製造方法である
が、これは通常のポリアミド酸の製造条件と同じでよく
、一般的にはN−メチル−2−ピロリドン、N,N−ジ
メチルアセトアミド、N,N−ジメチルホルムアミドな
どの極性有機溶媒中で反応させる。本発明においてはジ
アミンまたテトラカルボン酸成分とも単一化合物で用い
るばかりではなく、複数のジアミン、テトラカルボン酸
成分を混合して用いる場合がある。その場合は、複数又
は単一のジアミンのモル数の合計と複数又は単一のテト
ラカルボン酸成分のモル数の合計が等しいかほぼ等しく
なるようにする。また全フッ素化ポリアミド酸を製造す
るときに、全フッ素化ではない酸成分、ジアミン成分を
用いることにより、一部フッ素化されていないポリアミ
ド酸が製造されるが、その比率が大きくなければ特に問
題はない。このようにして全フッ素化ポリアミド酸溶液
を得る。また溶剤を変更する場合は、製造したポリアミ
ド酸溶液を貧溶媒に滴下し、析出したポリアミド酸固形
物を好ましい溶媒に溶解して得る。また通常のポリイミ
ドは、溶媒に対して不溶であるが全フッ素化ポリイミド
は、溶媒に可溶なものが多く、ポリアミド酸から化学的
又は熱によりポリイミドにした後溶媒に溶かしてポリイ
ミド溶液を得ることができる。ポリアミド酸溶液又はポ
リイミド溶液の濃度は、加熱キュアして得られるフィル
ムの厚さ等によって規定されるが、好ましくは5〜40
wt%程度である。
[0008] The method for producing perfluorinated polyamic acid may be the same as the production conditions for ordinary polyamic acid, and generally N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N, The reaction is carried out in a polar organic solvent such as N-dimethylformamide. In the present invention, not only the diamine and the tetracarboxylic acid component are used as a single compound, but also a plurality of diamine and tetracarboxylic acid components may be used as a mixture. In that case, the total number of moles of multiple or single diamines and the total number of moles of multiple or single tetracarboxylic acid components are made to be equal or approximately equal. In addition, when producing perfluorinated polyamic acid, by using acid components and diamine components that are not fully fluorinated, polyamic acid that is not partially fluorinated is produced, but if the proportion is not large, there is a particular problem. There isn't. In this way, a perfluorinated polyamic acid solution is obtained. When changing the solvent, the produced polyamic acid solution is dropped into a poor solvent, and the precipitated polyamic acid solid is dissolved in a preferred solvent. In addition, normal polyimide is insoluble in solvents, but many perfluorinated polyimides are soluble in solvents, so polyimide can be made from polyamic acid chemically or thermally and then dissolved in a solvent to obtain a polyimide solution. Can be done. The concentration of the polyamic acid solution or polyimide solution is determined by the thickness of the film obtained by heating and curing, but is preferably 5 to 40.
It is about wt%.

【0009】本発明で使用するフッ素樹脂としては、例
えば、四フッ化エチレン樹脂、四フッ化エチレン−エチ
レン共重合体樹脂、四フッ化エチレン−六フッ化プロピ
レン共重合体樹脂、パーフルオロアルコキシ樹脂、フッ
化ビニリデン樹脂などを挙げることができる。本発明の
組成物において上記のフッ素樹脂は、ポリアミド酸又は
ポリイミド100重量部に対して1〜100重量部、特
に2〜50重量部の割合で配合されることが好ましい。
Examples of the fluororesin used in the present invention include tetrafluoroethylene resin, tetrafluoroethylene-ethylene copolymer resin, tetrafluoroethylene-hexafluoropropylene copolymer resin, and perfluoroalkoxy resin. , vinylidene fluoride resin, etc. In the composition of the present invention, the above-mentioned fluororesin is preferably blended in an amount of 1 to 100 parts by weight, particularly 2 to 50 parts by weight, per 100 parts by weight of the polyamic acid or polyimide.

【0010】また溶剤であるが、アミド系溶媒、シクロ
ヘキサノン、ラクトン、フェノール系化合物など、ある
いはそれらの混合溶媒を挙げることができる。
Examples of solvents include amide solvents, cyclohexanone, lactones, phenol compounds, and mixed solvents thereof.

【0011】本発明の組成物を製造する時には、界面活
性剤を使用することができる。例えばN−エチル−N−
2−アセトキシエチルパーフルオロオクタンスルホンア
ミド、N−エチル−N−2−ヒドロキシエチルパーフル
オロオクタンスルホンアミドなどのパーフルオロオクタ
ンスルホンアミド類、トリフルオロメタンスルホン酸エ
チルエステル、N−フェニルトリフルオロメタンスルホ
ンアミドなどのトリフルオロメタン誘導体などを挙げる
ことができる。その配合量は、ポリアミド酸又はポリイ
ミド100重量部に対して0.1〜10重量部の配合割
合とすることが好ましい。
[0011] Surfactants may be used when preparing the compositions of the present invention. For example, N-ethyl-N-
Perfluorooctane sulfonamides such as 2-acetoxyethyl perfluorooctane sulfonamide, N-ethyl-N-2-hydroxyethyl perfluorooctane sulfonamide, trifluoromethanesulfonic acid ethyl ester, N-phenyltrifluoromethanesulfonamide, etc. Examples include trifluoromethane derivatives. The blending amount thereof is preferably 0.1 to 10 parts by weight per 100 parts by weight of polyamic acid or polyimide.

【0012】この発明の組成物には必要であれば種々の
添加剤を配合することができる。例えば接着性を向上さ
せるためには、γ−メタクリルオキシプロピルトリメト
キシシラン、γ−アミノプロピルトリエトキシシラン、
γ−グリシドキシプロピルトリメトキシシラン、γ−(
2−アミノエチル)アミノプロピルメチルジメトキシシ
ランなどのシラン系化合物からなる接着助剤を配合する
ことができる。
[0012] If necessary, various additives may be added to the composition of the present invention. For example, to improve adhesion, γ-methacryloxypropyltrimethoxysilane, γ-aminopropyltriethoxysilane,
γ-glycidoxypropyltrimethoxysilane, γ-(
An adhesion aid consisting of a silane compound such as 2-aminoethyl)aminopropylmethyldimethoxysilane can be blended.

【0013】本発明の組成物の調製法は、ポリアミド酸
溶液又はポリイミド溶液にフッ素樹脂粉末と、必要であ
れば界面活性剤を添加し、均一に分散させることにより
得られる。均一に分散させるためには三本ロール、ボー
ルミル、シェイカを使用する機械的分散と超音波を使用
する分散などが挙げられる。
The composition of the present invention can be prepared by adding fluororesin powder and, if necessary, a surfactant to a polyamic acid solution or polyimide solution and uniformly dispersing the mixture. In order to achieve uniform dispersion, mechanical dispersion using three rolls, a ball mill, a shaker, and dispersion using ultrasonic waves can be used.

【0014】得られた組成物からフィルムを製造するに
は、通常のポリアミド酸溶液又はポリイミド溶液からポ
リイミドフィルムを製造する方法が使用できる。すなわ
ち、バーコーターやスピンコータを用いて薄膜を作製し
、これを加熱キュアすることにより得ることができる。
[0014] In order to produce a film from the obtained composition, a conventional method for producing a polyimide film from a polyamic acid solution or a polyimide solution can be used. That is, it can be obtained by forming a thin film using a bar coater or a spin coater and curing it by heating.

【0015】[0015]

【実施例】以下、実施例により本発明のフッ素樹脂含有
ポリアミド酸組成物、フッ素樹脂含有ポリイミド組成物
及びこれらから得られるフィルムについて詳細に説明す
るが、本発明はこれらの実施例に限定されるものではな
い。
[Examples] The fluororesin-containing polyamic acid composition, the fluororesin-containing polyimide composition, and the film obtained from these of the present invention will be explained in detail below using Examples, but the present invention is limited to these Examples. It's not a thing.

【0016】実施例1 三角フラスコに以下の構造式(化6)を持つ1,4−ビ
ス(3,4−ジカルボキシトリフルオロフェノキシ)テ
トラフルオロベンゼン二無水物:
Example 1 1,4-bis(3,4-dicarboxytrifluorophenoxy)tetrafluorobenzene dianhydride having the following structural formula (Chemical formula 6) was placed in an Erlenmeyer flask:

【化6】 11.64g(20.0mmol)と2,4,5,6−
テトラフルオロ−1,3−フェニレンジアミン3.60
2g(20.0mmol)、及びN,N−ジメチルアセ
トアミド(DMAc)86gを加えた。この溶液を窒素
雰囲気中、室温で3日間、かくはんし、ポリアミド酸の
DMAc溶液を得た。この溶液を純水の中に滴下し、析
出した全フッ素化ポリアミド酸を分離し、乾燥した。こ
の固形全フッ素化ポリアミド酸4gをシクロヘキサノン
12gに溶解してポリアミド酸溶液を調製した。この溶
液に四フッ化エチレン樹脂(ダイキン株式会社製、ルブ
ロン)0.4gと界面活性剤(住友スリーエム社製、フ
ロラード431)0.1gを添加した後、超音波処理を
してフッ素樹脂が均一に分散したフッ素樹脂含有ポリア
ミド酸溶液を得た。この組成物をアルミ板上にスピンコ
ーティングし、窒素雰囲気下で70℃で2時間、160
で1時間、250℃で1時間加熱イミド化を行い、ポリ
イミド被覆アルミ板を作製した。このうちポリイミド被
覆アルミ板を10%塩酸水溶液に浸し、アルミ板を溶解
してフッ素樹脂含有ポリイミドフィルムを得た。このポ
リイミドフィルムを10枚作製して誘電率を測定したと
ころ、1kHz ですべて2.5以下であった。
[Chemical formula 6] 11.64g (20.0mmol) and 2,4,5,6-
Tetrafluoro-1,3-phenylenediamine 3.60
2 g (20.0 mmol) and 86 g of N,N-dimethylacetamide (DMAc) were added. This solution was stirred at room temperature in a nitrogen atmosphere for 3 days to obtain a DMAc solution of polyamic acid. This solution was dropped into pure water, and the precipitated perfluorinated polyamic acid was separated and dried. A polyamic acid solution was prepared by dissolving 4 g of this solid perfluorinated polyamic acid in 12 g of cyclohexanone. After adding 0.4 g of tetrafluoroethylene resin (Daikin Corporation, Lublon) and 0.1 g of a surfactant (Sumitomo 3M, Florado 431) to this solution, the fluororesin was uniformly treated by ultrasonication. A fluororesin-containing polyamic acid solution was obtained. This composition was spin-coated onto an aluminum plate and heated to 160°C for 2 hours at 70°C under a nitrogen atmosphere.
Heat imidization was performed at 250°C for 1 hour and at 250°C for 1 hour to produce a polyimide-coated aluminum plate. Among these, the polyimide-coated aluminum plate was immersed in a 10% aqueous hydrochloric acid solution, and the aluminum plate was dissolved to obtain a fluororesin-containing polyimide film. When ten sheets of this polyimide film were prepared and their dielectric constants were measured, all of them were 2.5 or less at 1 kHz.

【0017】実施例2 実施例1で調製した全フッ素化ポリアミド酸をアルミ板
上にキャストし、実施例1と同様の条件で加熱キュア後
アルミ板を溶解し、全フッ素化ポリイミドフィルムを得
た。このフィルム2.0gをシクロヘキサノン6gに溶
解して全フッ素化ポリイミド溶液を得た。この溶液に四
フッ化エチレン樹脂(ダイキン社製、ルブロン)0.2
gと界面活性剤(住友スリーエム社製、フロラード43
1)0.05gを添加し、その添加溶液を超音波処理し
てフッ素樹脂が均一に分散したフッ素樹脂含有ポリイミ
ド溶液を得た。この溶液から実施例1と同様にしてフッ
素樹脂含有ポリイミドフィルムを得た。このポリイミド
フィルムを10枚作製して誘電率を測定したところ、1
kHz ですべて2.5以下であった。
Example 2 The perfluorinated polyamic acid prepared in Example 1 was cast onto an aluminum plate, heated and cured under the same conditions as in Example 1, and then the aluminum plate was melted to obtain a perfluorinated polyimide film. . 2.0 g of this film was dissolved in 6 g of cyclohexanone to obtain a perfluorinated polyimide solution. To this solution, add 0.2
g and surfactant (manufactured by Sumitomo 3M, Florado 43)
1) 0.05 g was added and the added solution was subjected to ultrasonication to obtain a fluororesin-containing polyimide solution in which the fluororesin was uniformly dispersed. A fluororesin-containing polyimide film was obtained from this solution in the same manner as in Example 1. When ten sheets of this polyimide film were made and the dielectric constant was measured, it was found that 1
All were below 2.5 kHz.

【0018】実施例3 三角フラスコに1,4−ビス(3,4−ジカルボキシト
リフルオロフェノキシ)テトラフルオロベンゼン二無水
物11.644g(20.0mmol)と以下の構造式
(化7)で示されるビス(2,3,5,6−テトラフル
オロ−4−アミノフェニル)エーテル:
Example 3 11.644 g (20.0 mmol) of 1,4-bis(3,4-dicarboxytrifluorophenoxy)tetrafluorobenzene dianhydride and the following structural formula (Chemical formula 7) were placed in an Erlenmeyer flask. Bis(2,3,5,6-tetrafluoro-4-aminophenyl)ether:

【化7】 6.883g(20.0mmol)、及びDMAc10
5gを加え、以下実施例1と同様の方法でフッ素樹脂含
有ポリアミド酸組成物とフッ素樹脂含有ポリイミドフィ
ルムを得た。このポリイミドフィルムを10枚作製して
誘電率を測定したところ、1kHz ですべて2.5以
下であった。
[Chemical formula 7] 6.883g (20.0mmol), and DMAc10
5 g was added, and a fluororesin-containing polyamic acid composition and a fluororesin-containing polyimide film were obtained in the same manner as in Example 1. When ten sheets of this polyimide film were prepared and their dielectric constants were measured, all of them were 2.5 or less at 1 kHz.

【0019】実施例4 三角フラスコに1,4−ビス(3,4−ジカルボキシト
リフルオロフェノキシ)テトラフルオロベンゼン二無水
物11.644g(20.0mmol)とビス(2,3
,5,6−テトラフルオロ−4−アミノフェニル)エー
テル6.883g(20.0mmol)、及びDMAc
105gを加え、以下実施例2と同様の方法でフッ素樹
脂含有ポリイミド組成物とフッ素樹脂含有ポリイミドフ
ィルムを得た。このポリイミドフィルムを10枚作製し
て誘電率を測定したところ、1kHz ですべて2.5
以下であった。
Example 4 11.644 g (20.0 mmol) of 1,4-bis(3,4-dicarboxytrifluorophenoxy)tetrafluorobenzene dianhydride and bis(2,3
, 6.883 g (20.0 mmol) of 5,6-tetrafluoro-4-aminophenyl)ether, and DMAc
After adding 105 g, a fluororesin-containing polyimide composition and a fluororesin-containing polyimide film were obtained in the same manner as in Example 2. When ten sheets of this polyimide film were made and the dielectric constant was measured, all of them were 2.5 at 1kHz.
It was below.

【0020】比較例1 特開平2−286743号公報に開示されているポリイ
ミドフィルムの1kHzの誘電率は、2.6と記載され
ている。ここで用いられているポリイミドにはフッ素原
子は含まれていない。
Comparative Example 1 The dielectric constant of the polyimide film disclosed in JP-A-2-286743 at 1 kHz is stated to be 2.6. The polyimide used here does not contain fluorine atoms.

【0021】[0021]

【発明の効果】以上説明したように、本発明のフッ素樹
脂含有ポリアミド酸又はフッ素樹脂含有ポリイミドから
得られた本発明のポリイミドフィルムは誘電率が従来の
ものに比較して小さく、プリント配線板などに使用すれ
ば信号配線遅延時間の短縮化が図られ、電子部品の高速
化に寄与できる。
Effects of the Invention As explained above, the polyimide film of the present invention obtained from the fluororesin-containing polyamic acid or fluororesin-containing polyimide of the present invention has a lower dielectric constant than conventional ones, and is suitable for use in printed wiring boards, etc. If used for this purpose, signal wiring delay time can be shortened, contributing to higher speed electronic components.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】  下記一般式(化1):【化1】 〔式中R1 は下記式(化2): 【化2】 で表される基のうちのいずれかの基、R2 は下記式(
化3): 【化3】 で表される基のうちのいずれかの基であり、ここで式中
Rfはフッ素、又はパーフルオロアルキル基、Xは下記
式(化4): 【化4】 (ここで式中Rf′はパーフルオロアルキレン基、nは
1〜10の数を示す)で表される基のうちのいずれかの
基である〕で表される繰返し単位を含有するポリアミド
酸を主成分とするポリアミド酸成分と、フッ素樹脂粉末
とを必須構成要素とすることを特徴とするフッ素樹脂含
有ポリアミド酸組成物。
[Claim 1] The following general formula (Formula 1): [Formula 1] [In the formula, R1 is any group represented by the following formula (Formula 2): [Formula 2], R2 is the following formula (
Chemical formula 3): Any of the groups represented by the following formula (Chemical formula 3), where Rf is fluorine or a perfluoroalkyl group, and X is the following formula (Chemical formula 4): [Chemical 4] (wherein, Rf' is a perfluoroalkylene group, and n is a number from 1 to 10). A fluororesin-containing polyamic acid composition characterized by having a polyamic acid component as a main component and a fluororesin powder as essential components.
【請求項2】  下記一般式(化5):【化5】 〔式中R1 及びR2 は一般式(化1)中のR1 及
びR2 と同義である〕で表される繰返し単位を含有す
るポリイミドを主成分とするポリイミド成分と、フッ素
樹脂粉末とを必須構成要素とすることを特徴とするフッ
素樹脂含有ポリイミド組成物。
[Claim 2] A polyimide containing a repeating unit represented by the following general formula (Chemical formula 5): [Chemical formula 5] [In the formula, R1 and R2 have the same meanings as R1 and R2 in the general formula (Chemical formula 1)] 1. A fluororesin-containing polyimide composition comprising, as essential constituents, a polyimide component having as its main component and fluororesin powder.
【請求項3】  ポリイミドフィルムにおいて、該フィ
ルムが、請求項1に記載のフッ素樹脂含有ポリアミド酸
組成物、又は請求項2に記載のフッ素樹脂含有ポリイミ
ド組成物を加熱キュアして得られるものであることを特
徴とするフィルム。
3. A polyimide film, which is obtained by heating and curing the fluororesin-containing polyamic acid composition according to claim 1 or the fluororesin-containing polyimide composition according to claim 2. A film characterized by
JP12285091A 1991-04-26 1991-04-26 Fluororesin-containing polyamic acid composition, fluororesin-containing polyimide composition and film obtained from the same Pending JPH04328161A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12285091A JPH04328161A (en) 1991-04-26 1991-04-26 Fluororesin-containing polyamic acid composition, fluororesin-containing polyimide composition and film obtained from the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12285091A JPH04328161A (en) 1991-04-26 1991-04-26 Fluororesin-containing polyamic acid composition, fluororesin-containing polyimide composition and film obtained from the same

Publications (1)

Publication Number Publication Date
JPH04328161A true JPH04328161A (en) 1992-11-17

Family

ID=14846187

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH04328161A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001139881A (en) * 1999-11-12 2001-05-22 Sankyo Seiki Mfg Co Ltd Electrodeposition coating material, sliding member, and bearing device
US7026032B2 (en) * 2003-11-05 2006-04-11 E. I. Du Pont De Nemours And Company Polyimide based compositions useful as electronic substrates, derived in part from (micro-powder) fluoropolymer, and methods and compositions relating thereto
WO2016159061A1 (en) * 2015-03-31 2016-10-06 株式会社カネカ Method for manufacturing polyimide film and use thereof
JP2017078102A (en) * 2015-10-19 2017-04-27 三菱鉛筆株式会社 Fluorine-based resin containing polyimide precursor solution composition, polyimide and polyimide film using the same, and method for producing them

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001139881A (en) * 1999-11-12 2001-05-22 Sankyo Seiki Mfg Co Ltd Electrodeposition coating material, sliding member, and bearing device
US7026032B2 (en) * 2003-11-05 2006-04-11 E. I. Du Pont De Nemours And Company Polyimide based compositions useful as electronic substrates, derived in part from (micro-powder) fluoropolymer, and methods and compositions relating thereto
WO2016159061A1 (en) * 2015-03-31 2016-10-06 株式会社カネカ Method for manufacturing polyimide film and use thereof
JPWO2016159061A1 (en) * 2015-03-31 2017-11-16 株式会社カネカ Method for producing polyimide film and use thereof
TWI677520B (en) * 2015-03-31 2019-11-21 日商鐘化股份有限公司 Method for producing polyimide film and use thereof
JP2017078102A (en) * 2015-10-19 2017-04-27 三菱鉛筆株式会社 Fluorine-based resin containing polyimide precursor solution composition, polyimide and polyimide film using the same, and method for producing them

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