JPH04318451A - Component analyzing device - Google Patents

Abstract

PURPOSE:To prevent a component analyzing device from being affected by disturbance noise, temperature changes, etc., so as to reduce the amount of a solution to be analyzed by providing solution component sensors on two solution transfusing lines and a common comparison electrode to the solution component sensors and independently sucking the solution from each liquid transfusing line. CONSTITUTION:The output of each solution component sensor 3a and 3b to 6a and 6b is calibrated in a state where all solution transfusing lines 2a and 2b are filled up with a calibration solution and the offset and sensitivity differences among the outputs of the sensors for the same kind of objects to be detected, namely, between the sensors 3a and 3b to 6a and 6b are adjusted. When the suction port of a suction nozzle 1 is dipped in a solution to be analyzed and the solution is sucked from arbitrary one line 2a or 2b, the solution to be analyzed can be selectively led to the line 2a or 2b only. A differential output is obtained by performing measurement under such condition and comparing the output of the component sensor which is in contact with the solution to be analyzed with the output of the same kind of component sensor of the line 2a or 2b which is in contact with the calibration solution. Therefore, disturbance noise and temperature changes generated along the lines 2a and 2b can be canceled and a stable output can be obtained.

Description

[Detailed description of the invention]

[Object of the invention]

0002

[Industrial Application Field] The present invention relates to a component analyzer in an aqueous solution, and in particular to an apparatus for automatically analyzing and analyzing electrolyte concentrations in blood, etc.
This invention relates to a measurable component analyzer.

0003

BACKGROUND OF THE INVENTION Measuring and analyzing the concentration of electrolytes such as Na, K, and Cl in blood is widely used to determine various diseases, and many automatic measuring devices have been proposed, manufactured, and commercially available. There is. The method used to measure the concentration of components in aqueous solutions used in this way involves arranging cells containing the necessary sensors in multiple stages in the middle of a single liquid absorption line (inside the infusion line), and This is carried out as follows using an apparatus in which a comparison electrode for operation of the component sensor is arranged as a common electrode on the downstream side. That is, after flowing a calibration solution into the liquid absorption line and cleaning and calibrating the cell containing the component sensor, for example, serum is introduced directly or diluted with a buffer solution, and the connection between each component sensor and the reference electrode is performed. Electrolyte concentration in serum is measured by potential difference. Note that the reference electrode used here is, for example, a type in which an Ag/AgCl-based body is immersed in KCl (internal liquid),
The internal liquid comes into contact with the test liquid passing through the liquid suction line through capillary action to maintain electrical continuity.

This method of arranging the component sensor in a predetermined area of a single liquid suction line has the advantage of being easy to automate; Since it is easy to conduct with the sensor, there is a problem that external noise is easily picked up and the output is difficult to stabilize. In order to avoid this problem, it was necessary to take noise countermeasures that required cost and effort, such as a high input impedance amplifier and grounding for the calibration solution or test solution.

[0005] Also, in conventional flow-type measurement systems, although it is possible to place the sensor cell itself near the suction liquid nozzle, it is necessary to provide a constant temperature jacket etc. to suppress the temperature characteristics of the sensor output. In order to avoid large size or surrounding obstacles, the nozzle part could not be made too short, and there was a limit to the reduction of the internal volume. Moreover, since it is difficult to control the temperature of the component sensor portion to a constant temperature, there is a problem that output fluctuations are likely to occur due to temperature changes. Furthermore, the output is affected by the potential difference between the internal liquid of the reference electrode and the test liquid, which are essential for the operation of the component sensor, so it is necessary to reduce the potential difference between these liquids. However, it was necessary to provide a reference electrode with a complicated structure in which the liquid junction between the internal liquid and the test liquid was devised.

[0006]

[Problems to be Solved by the Invention] In order to improve these problems, a sensor insensitive to changes in component concentration is separately incorporated as a reference sensor in the cell containing the sensor,
A proposal has been made to operate a common pseudo comparison electrode together with the original component sensor and take the difference in the outputs to cancel the interfacial potential difference of the pseudo comparison electrode.

However, a reference sensor that is insensitive to compositional changes (concentration changes) of the test liquid and does not cause potential changes has not yet been materialized. In other words, a practical analytical device that solves (improves) the above problem has not yet been realized. In other words, infusion line systems suitable for automatically measuring components in solutions such as blood, and component analyzers equipped with component sensor systems for these infusion lines, have the problem of being susceptible to disturbance noise and temperature changes.
It can be said that there are still problems in that the reference electrode is complicated and difficult to integrate, and furthermore, it is difficult to miniaturize the sample liquid.

In view of the above points, the present invention provides a solution component analyzer that is equipped with a component sensor in the infusion line and is easily automated, which is less susceptible to disturbance noise and temperature changes.
The purpose of the present invention is to provide a component analyzer that can be easily miniaturized and in trace amounts without causing any problems due to the liquid junction potential difference with a reference electrode.

[Configuration of the invention]

0010

[Means for Solving the Problems] A component analyzer according to the present invention includes a nozzle for aspirating a test liquid, at least two infusion lines branched from the nozzle, and parallel lines within each of the infusion lines. a solution component sensor that is sensitive to the same type of component, a reference electrode that is common to each of the solution component sensors, and suction means that can independently suck the liquid in each of the infusion lines. It is characterized by

In the above structure, it is also possible to use a pseudo comparison electrode consisting of a simple electrode without a liquid junction as the comparison electrode. In addition, as a component sensor, for example, FE
A T-type element may also be used; in this case, stability against disturbance noise can be improved, component sensors etc. can be miniaturized and multiplied, and the test liquid introduction, branching, and sensing parts can be easily integrated. Effective for reducing the amount of sample liquid. Furthermore, if the FET type element has a structure in which the front and back sides are separated, it becomes possible to easily construct a flow-through type cell structure, and it becomes possible to further reduce the amount of the test liquid.

0012

[Operation] According to the component analyzer according to the present invention, it is easy to output the potential difference between the component sensors arranged under the same conditions in each branched infusion line, and in-phase noise due to disturbance is significantly reduced. . In addition, output fluctuations due to the temperature of each component sensor and reference electrode are reduced, and the liquid junction potential difference at the reference electrode can be canceled. In addition to eliminating contamination due to liquid effluent from the analyzer, the structure can be simplified and downsized, and the entire analysis system can be miniaturized.

[0013]

Embodiment An embodiment of the present invention will be described below with reference to FIG.

FIG. 1 is a perspective view showing the main parts of a configuration example of a component analyzer according to the present invention, in which 1 is a nozzle for sucking a sample liquid such as diluted serum, and 2a and 2b are the suction nozzles. This is an infusion line branched from 1. These infusion lines 2a and 2b are equipped with solution component sensors such as Na, K, and C in the test solution.
When the concentration of 1 is to be detected, temperature sensors 3a, 3b, Na+ sensors 4a, 4b, K+ sensors 5a, 5b, Cl+ sensors 6a, are inscribed in the respective branched infusion lines 2a, 2b. 6b are provided (arranged) in parallel. In addition, in order to enable each of the infusion lines 2a and 2b to suck liquid independently, a liquid suction pipe 7a connected to each of the infusion lines 2a and 2b is also provided.
, 7b include valves 8a, 8b that can be opened and closed, for example.
is provided, and has a configuration in which liquid is independently sucked by a pump (not shown). In FIG. 1, 9 is a cell body, 10 is a branch portion, and 11 is a common comparison electrode (a simple electrode without a liquid junction). Next, the means for using the component analyzer having the above configuration will be explained. First, each component sensor 3a, 3b, 4a, 4b, 5a, 5b, 6a
, 6b are calibrated with all the infusion lines 2a and 2b filled with calibration solution, and the outputs of sensors 3a and 3b, 4a and 4b, 5a and 5b, which are the same type of detection target are calibrated.
Adjust the offset and sensitivity difference between the outputs of 6a and 6b.

Next, the suction port of the suction nozzle 1 is immersed in the test liquid, and the liquid is sucked from any one of the infusion lines 2a or 2b, thereby selectively transferring the test liquid to the side of the infusion line 2a or 2b. In this state, the output of the component sensor in contact with the test liquid is compared with the output of the same component sensor in the infusion line in contact with the calibration solution to obtain a differential output. By doing so, in-phase disturbance noise and temperature changes that often occur along the infusion line can be easily canceled, and stable output can be obtained.

[0016] Also, as a component sensor, a field effect type (FE) is used.
By using a T-type element, the component sensor part and the infusion line can be easily integrated with a small internal volume.
Furthermore, by integrating the common comparison electrode 11 of the confluence (branch) 10 to the nozzle 1, and in some cases the nozzle 1 itself, it is possible to significantly reduce the required amount of sample liquid. As the FET type element, an element disclosed in Japanese Unexamined Patent Application Publication No. 123348/1982 may be used, in which input/output electrodes and sensitive gate portions are formed separately on the front and back sides of the element.

The above-mentioned front and back separated FET type sensor element has a structure as shown, for example, in plan view in FIG. 2 and in cross section in FIG. 3, and can be manufactured by the following procedure. 4 to 7 are cross-sectional views schematically showing embodiments of this manufacturing process. First, silicon wafers 12 and 13 of p- type (100) orientation are prepared, and thermal oxidation treatment is performed on them. A 500 nm thick silicon oxide film is formed on the surface. These silicon wafers 12 and 13 are acid-washed using a conventional method to introduce hydrophilic groups onto their surfaces, and then their mirror surfaces are brought into contact with each other.
, 13 were heat-treated at 1100° C. for 2 hours in a nitrogen atmosphere to form a strong direct bond. Next, the bonded silicon wafers 12 and 13 are mechanically polished to have a thickness of about 20 μm on the first side 13 where the FET will be formed, and the second side 12 where the gate well will be formed, as shown in FIG. was adjusted to a thickness of 200 μm. In this way, silicon 12 - insulating film 14 - silicon 13... (SIS
)...I got the wafer.

After that, the silicon 12-insulating film 14
- The silicon 13-based wafer was thermally oxidized again to form a surface oxide film, and using this surface oxide film as a mask, silicon islands 13a forming FETs were patterned as shown in FIG. At this time, in order to achieve accurate patterning, etching is first performed using an anisotropic etching solution such as a hydrazine-water system or an ethylenediamine-pyrocatechol-water system, and then an isotropic etching solution such as a hydrofluoric acid-nitric acid system. Then, the corners of the silicon islands 13a are rounded and care is taken to prevent the resist from breaking during the subsequent PEP (plasma etching process).

Next, as shown in FIG. 6, phosphorus was selectively diffused from the surface of the silicon island 13a where the FET was to be formed to the adhesive interface insulating film 14 to form a source region 15 and a drain region 16. On this occasion,
By making the pattern of the source region 15 and drain region 16 concentric circles or concentric squares, the maximum gate channel width can be obtained within the limited area of the bottom of the gate well that will be opened and formed later. . At the same time, the entire outer periphery of the silicon island 13a forming the FET can be made into a single source or drain region. There is an advantage that even if there is a defect, the FET characteristics are hardly affected.

After forming the source region 15 and drain region 16 up to the adhesive interface insulating film 14 as described above, the FET
Boron is diffused across the source region 15 and drain region 16 to form a channel stopper region 17 on the surface side of the silicon island 13a where the silicon island 13a is formed. Next, as shown in FIG.
Selective anisotropic etching is performed from the surface of the second silicon wafer 12 to the adhesive interface insulating film 14 so as not to expose the channel regions 15 and 16 of the silicon island 13a forming the inverted trapezoidal gate well 18. Form. The gate well 18 thus formed can be etched with good reproducibility because the silicon oxide film 14 at the interface acts as a stopper. Also, during this etching, the silicon island 13a forming the FET is
That is, the entire surface on which the source region 15 and drain region 16 are formed is covered with a silicon nitride film 19, for example, or
Alternatively, it may be coated with silicone resin or the like. However, when applying or covering silicone resin, etc.
The anisotropic etching solution is limited to hydrazine. In addition, in FIG. 7, 20 is an etching mask.

As described above, the predetermined gate well 1
8, the silicon oxide film 1 on the exposed adhesive interface is removed.
4 is once removed, and gate oxidation 21 and passivation film 22 are subjected to CVD again to form a gate insulating film. In this example, a silicon nitride film was formed as the passivation film 22 by low pressure high temperature CVD. Of course, the passivation film 22 may be made of any material other than the silicon nitride film as long as it has good water resistance. For example, aluminum oxide, tantalum oxide, etc. can be used instead of silicon nitride, and it is also possible to use a material other than the silicon nitride film. Aluminum oxide or the like may be used in a stacked manner. On the other hand, preferably a passivation film 23 is also formed on the silicon island surface where the FET is formed, contact holes for source/drain electrodes are opened, and a source electrode 24 and a drain electrode 25 are formed. An FET type element main body having a front and back separated structure shown in FIG. 3 is obtained. In other words, the required ion-sensitive film 26 is provided in the area of the gate well 18.
By forming this, a main body portion that becomes an FET type sensor having a front and back separation structure shown in FIGS. 2 and 3 can be obtained. Here, by forming the drain electrode 25 so as to cover the pn junction on the surface of the FET, output fluctuations due to light caused by the pn junction can be minimized. The device fabricated in this example had a mutual conductance of 1.5 mS
, the gate leakage current was 10-10 A or less, and the output fluctuation due to normal indoor light was 1 mV or less.

As an example of a structure similar to the element of the above structure,
As shown in cross section in FIG. 8, a stopper structure may be provided at the edge of the gate well 18 to prevent the formed or arranged ion sensitive film 26 from peeling off. In this configuration example, a high concentration boron diffusion layer is formed in the shape of the eaves of the stopper 27 on the surface of the body silicon 12 of the FET type sensor with front and back separation structure, and then the anisotropic etching rate of the gate well 18 is adjusted to the boron concentration. Utilizing the dependence property, the high concentration layer was left in the shape of an eave as a stopper 27. Note that hydrazine is not suitable as the etching solution in this case, and ethylenediamine + pyrocatechol + water system is suitable. Further, the concentration of the high boron concentration layer was required to be 1×10 20 cm −3 or more. Further, it is preferable that the surface of the eaves serving as the stopper 27 is covered with an insulating film at the same time during the gate oxidation and gate passivation film CVD to improve long-term durability.

[0023] The FET type element main body having the front and back separated structure produced in this way is diced into one chip with a plurality of elements depending on the number of items to be detected. In this example, in addition to the three ions of sodium, potassium, and chlorine, one element is applied to detect temperature, and one system has 4 FETs x 2
As shown in perspective in FIG. 9, 4×2 pieces were diced into one chip 28. Further, in the gate well 18 of each FET element formed in this diced one-chip 28, an ion-sensitive membrane 26 for the same detection target was potted at a corresponding position. in this case,
Since each FET element is separated by a gate well 18 made of silicon, it is possible to easily form a film with good reproducibility by simply potting different types of ion-sensitive substances and controlling their amounts. In this embodiment, from the left side of the one-chip 28, from the suction nozzle 1 side, temperature detection 3a, 3b
4a and 4b for sodium are PVC and plasticizer-based membranes in which biscrown ether is dissolved, and 5a and 5b for potassium are valinomycin. PVC + plasticizer-based membrane in which chlorine is dissolved, the rightmost one is 6a for chlorine,
6b, a film in which a quaternary ammonium salt was similarly dissolved was formed.

On the other hand, as shown in perspective in FIG. 10, the main structure is developed and grooves are formed to form infusion lines 2a and 2b that branch the sample liquid supplied through the nozzle 1 and lead it to the sensor. - A cell part 30 made of Pyrex glass in which an electrode metal such as platinum forming the common comparison electrode 11 is embedded in the Pyrex glass 29 and the electrode metal such as platinum that forms the common comparison electrode 11 in front of the position corresponding to the branch part 10 where the test liquid branches. prepared and glued together to form a cell. An electrostatic adhesion method may be used for this adhesion. However, in the normal method, 400℃
Since it is necessary to raise the temperature to a certain level, after forming a transparent electrode of ITO on the surface to be adhered, a high-lead, low-melting glass is formed by sputtering, etc., so that the organic ion-sensitive film is not affected. To ensure smooth bonding, it is preferable to perform the bonding by applying a voltage at a temperature of about room temperature to about 50°C. At this time, the electrostatic connection electrode 31 in the structural example shown in FIG. 3 is used as the electrode on the one-chip 28 side.

While attaching and connecting the suction nozzle 1 and the liquid suction pipes 7a and 7b to the cell thus prepared,
Each sensor 3a, 3b, 4a, 4b, 5a, 5 of the cell
The terminal electrodes b, 6a, 6b and the comparison electrode 11 were connected to the corresponding lead terminals of the flexible printed wiring board 32 to be led to the outside, and then the whole was molded with a resin (not shown). This sensor cell can be made extremely small as a whole, and the nozzle external shape can be made small.

FIG. 11 is a cross-sectional view showing another example of the structure of a cell according to the present invention.
3 with adhesive tape, and bonding wire 34
to connect the one-chip 28 and the bonding part 35 of the lead pattern arranged on the circuit board frame 33,
The inside of the circuit board frame 33 is molded with resin 36. Thereafter, the adhesive tape temporarily fixed is peeled off, and the required ion-sensitive films 26 are formed inside the gate wells 18, respectively. The one-chip 28 mounted on the circuit board frame 33 is inserted into the cell body 38a through a sheet 37 made of silicone rubber or the like in which a pattern of the required infusion lines 2a, 2b is cut out.
, 38b from above and below, and the whole is fixed with bolts (not shown). With such a structure, only the substrate portion of the sensor cell can be separated from the sensor cell body 38a, 38b.
can be removed and replaced. To form the channel pattern, a film resist may be applied on the cell body 38a instead of the rubber sheet, and concave channel grooves may be formed using a photographic process. Moreover, this cell body 38a, 38b
In order to enable temperature control inside the chamber, another flow path 39 may be embedded to allow a constant temperature fluid to circulate inside.

Using the sensor cell 40 produced in this way, a component analyzer was constructed, the outline of the main structure of which is shown in FIG. 12, and components in a solution were measured using this system. First, prior to measurement, the sensitivity of all sensors is calibrated using a calibration solution L having the lowest concentration and a calibration solution H having the highest concentration in the concentration range of the diluted serum to be measured. Next, all the lines 2a and 2b in the sensor cell are filled with a calibration liquid M/cleaning liquid 41 of a known concentration near the midpoint of the measurement concentration range,
Perform offset adjustment. Specifically, each infusion line 2a
The valves 8a and 8b attached to the suction pipes 7a and 7b arranged in connection with the lines 2a-7a and 2b-2b are both opened and a pump (not shown) is used to drain both the lines 2a-7a system and 2b-
7b Introduce the above-mentioned calibration solution M into the system and connect the common comparison electrode 1
Each component sensor 4a, 4b, 5a, 5b for 1
Adjust the output circuit so that the output difference between 6a and 6b becomes zero. At this time, the difference in pn junction voltage between the ISFETs operated as temperature sensors 3a and 3b is also calibrated.

Next, any one side of the infusion line, for example,
In order to guide the test liquid 42 only to the 2a side, after moving the suction nozzle 1 to the test liquid 42 side, the pump is operated with only the valve 8b closed to suck the liquid. In this way, the infusion line 2a is filled with the test liquid and the infusion line 2b is filled with the calibration liquid M. After comparing the outputs of the temperature sensors 3a and 3b and confirming that both have reached the same temperature, each component sensor 4a,
The output difference between 4b, 5a, 5b, 6a, and 6b was measured to determine the component concentration. After this measurement is completed, the nozzle 1 is turned to the calibration liquid M41 side again, the valves 8a and 8b are opened, and all the lines 2a-7a system and 2b-7b system are again filled with the calibration liquid M41 to perform calibration. And next,
The test liquid 42 is selectively introduced into the infusion line 2b opposite to the previous one, and the measurement is then carried out by alternately exchanging the infusion lines 2a and 2b in the same manner.

The above-mentioned alternate measurement makes it possible to greatly extend the life of the sensitive membrane, which conventionally determined the life of this type of sensor, and to reduce the frequency of sensor replacement, which is troublesome in terms of equipment maintenance. This means that compared to a normal measurement cell, the frequency at which individual sensors directly come into contact with test liquids containing serum etc. is halved, which extends the overall lifespan. Whereas the test solution and the calibration/cleaning solution were exposed to each other for about the same amount of time, in the case of the present invention, the calibration/cleaning solution can be exposed to the test solution for a sufficiently longer period of time, so there is no possibility of contamination of the membrane. This is thought to be because it can be washed and recovered. The sensor cell of the present invention is more than twice as effective as the conventional one due to the combination of the effect that the surface of the sensor is sufficiently cleaned so that the trends of mutual changes match, and the effect that changes in the electrode potential of the reference electrode do not become a problem. It showed the lifespan. This effect was similar when applied to the direct method in which undiluted serum was aspirated and measured.

[0030] In the above example, the infusion line is arranged in two lines, but the infusion line may be arranged in three or more lines, and more sensors for each component may be installed depending on the purpose of inspection. Also, these sensors are not limited to the front and back separation type FET elements. Furthermore, the common comparison electrode is not limited to the metal electrode as exemplified above, and may be placed on the liquid suction tube side, or the reference and measurement sensors may be placed equally and alternately play their roles. By using them while replacing them, deterioration of the sensitive membrane, which becomes a problem with long-term use, and output changes due to dirt occur in almost the same way, and the drift when using differential output is lower than when operating independently. It can be kept extremely low. Furthermore, the cell sensor may have a structure in which the suction nozzle 1 is integrated, as shown in a top view in FIG. 12, for example.

[0031] Further, a valve may be provided in the middle of the infusion line from the nozzle branch to the sensor. In this case, mixing of the sample liquid at the branch is reduced, but with a normal valve, the sample liquid leading to an increase in quantity. In order to avoid this, the valve may be integrally formed with the sensor using micromachining technology.

[0032]

[Effects of the Invention] As explained above, by using the component analyzer of the present invention, the following effects can be obtained. First, the stability of the sensor output against disturbance noise is greatly improved. Reliability against this noise is particularly strongly required when the normal concentration range is narrow and high resolution is required, such as in medical component analyzers. For this reason,
Conventional equipment requires a considerable amount of effort and expense, such as using an amplifier with high input impedance and searching for delicate grounding points through trial and error. However, in the case of the present invention, not only when using an FET type element as shown in the above embodiment, but also when using a conventional electrode type sensor, differential operation is possible without difficulty, and most of the noise is eliminated. It is possible to effectively cancel in-phase noise due to disturbances that occupy the area. In other words, conventionally, in order to perform differential operation, a reference sensor that is insensitive to the sample liquid and whose output does not change is required, and it is extremely possible to create a reference sensor that is insensitive to the sample liquid and whose output does not change. However, in the case of the present invention, the original sensor itself can be used as a reference, and the difficulty in manufacturing is completely eliminated.

Furthermore, in the present invention, if the cell is configured to be integrated using FET type elements, the required amount of sample liquid can be reduced. In particular, by using a front-back separation type multi-FET sensor chip, it is possible to reduce the required amount of sample liquid to 10 μl or less. Along with this, the output response can be extremely fast, taking less than 5 seconds. The reason for this is thought to be that since the amount of liquid to be tested was reduced, liquid exchange in both infusion lines became faster, and the temperatures of both lines quickly matched. Furthermore, in the present invention, the temperature characteristics of the sensor element can be reduced by differential operation, reducing the accuracy of constant temperature control,
In some cases it is possible to use it without adjustment. Of course, even in this case, it is not possible to correct for changes in electrochemical Nernst electromotive force due to temperature, so it is necessary to correct this from the temperature sensor output as necessary. Further, since the sensors can be sufficiently cleaned by the alternate measurement sequence, the changes over time of each sensor can be equalized, and the total life span can be significantly extended.

[Brief explanation of the drawing]

FIG. 1 is a perspective view showing an example of the configuration of main parts of a component analyzer according to the present invention.

FIG. 2 is a top view of a front-back separation FET type element that the component analyzer according to the present invention includes as a component sensor.

[Fig. 3] A-A of the FET type device with front and back separation shown in Fig. 2
Cross-sectional view along ´.

FIG. 4 shows that Si
A cross-sectional view showing a state in which wafers are pasted together.

FIG. 5 is a cross-sectional view showing a patterned state of the bonded Si wafer shown in FIG. 4;

6 is a cross-sectional view showing a state in which source/drain regions and channel stopper diffusion regions are formed in the patterned Si wafer shown in FIG. 5;

7 is a cross-sectional view showing a state in which a gate well portion is formed on the Si wafer shown in FIG. 6. FIG.

FIG. 8 is a cross-sectional view showing another example of the structure of a FET-type element with front and back separation, which is included as a component sensor in the component analyzer according to the present invention.

FIG. 9 is a perspective view showing an example of the structure of a multi-sensor chip for a component analyzer according to the present invention.

FIG. 10 is a developed view showing an example of the structure of a sensor cell included in the component analyzer according to the present invention.

FIG. 11 is a sectional view showing another structural example of a sensor cell included in the component analysis device according to the present invention.

FIG. 12 is a side view conceptually showing a measurement system in the component analyzer according to the present invention.

FIG. 13 is a top view showing still another structural example of a sensor cell included in the component analyzer according to the present invention.

[Explanation of symbols]

1... Suction nozzle 2a... Infusion line 1 2
b...Infusion line 3a, 3b...Temperature sensor
4a, 4b...Na ion sensor 5a, 5b
... K ion sensor 6a, 6b ... Cl ion sensor 7a, 7b ... Liquid suction pipe 8a, 8
b...Bulb 9, 29...Cell body 10...Branch portion 11...Common comparison electrode 12
...Si wafer forming gate well

Claims (1)

[Claims] 1. A nozzle for aspirating a test liquid, at least two infusion lines branching from the nozzle, and a solution component sensitive to the same type of component provided in parallel in each of the infusion lines. A component analysis device comprising a sensor, a reference electrode common to each of the solution component sensors, and suction means capable of independently suctioning the liquid in each of the infusion lines.