JPH04304386A - Metal member - Google Patents
Metal memberInfo
- Publication number
- JPH04304386A JPH04304386A JP9501691A JP9501691A JPH04304386A JP H04304386 A JPH04304386 A JP H04304386A JP 9501691 A JP9501691 A JP 9501691A JP 9501691 A JP9501691 A JP 9501691A JP H04304386 A JPH04304386 A JP H04304386A
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- layer
- metal member
- dry plating
- phosphorus alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 24
- 239000002184 metal Substances 0.000 title claims abstract description 24
- 238000007747 plating Methods 0.000 claims abstract description 31
- 239000000463 material Substances 0.000 claims abstract description 23
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 6
- 239000000956 alloy Substances 0.000 claims abstract description 6
- 238000009713 electroplating Methods 0.000 claims abstract description 5
- 229910001369 Brass Inorganic materials 0.000 claims abstract description 4
- 239000010951 brass Substances 0.000 claims abstract description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000010956 nickel silver Substances 0.000 claims abstract description 3
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 3
- 239000011701 zinc Substances 0.000 claims abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 42
- 229910052759 nickel Inorganic materials 0.000 claims description 21
- 229910001096 P alloy Inorganic materials 0.000 claims description 19
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 15
- 238000002844 melting Methods 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- 230000008018 melting Effects 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 4
- 230000000737 periodic effect Effects 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 150000001247 metal acetylides Chemical class 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 239000010948 rhodium Substances 0.000 claims description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 238000004512 die casting Methods 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 claims description 2
- 238000005260 corrosion Methods 0.000 abstract description 10
- 230000007797 corrosion Effects 0.000 abstract description 10
- 239000000758 substrate Substances 0.000 abstract description 2
- 229910018104 Ni-P Inorganic materials 0.000 abstract 1
- 229910018536 Ni—P Inorganic materials 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910001020 Au alloy Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 239000003353 gold alloy Substances 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- -1 is pretreated Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910001229 Pot metal Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、装身具、装飾品、金属
家具、住宅建材、スポーツ用品等の金属部材に関するも
のである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to metal members for accessories, ornaments, metal furniture, housing materials, sporting goods, and the like.
【０００２】0002
【従来の技術】従来技術による低融点材料上に乾式メッ
キ法による被膜を被覆した金属部材は、特開昭５６−８
４４６９号公報のように、中間層として５０〜１００μ
ｍのニッケル−リン合金メッキを施したものや、特開昭
５９−１６２２７１号公報のように、ニッケルの前処理
後に乾式メッキ法であるイオンプレティングを行ってい
るものがある。[Prior Art] A metal member obtained by coating a low melting point material with a film formed by dry plating according to the prior art was published in Japanese Patent Application Laid-Open No. 56-8
50 to 100μ as the intermediate layer, as in Japanese Patent No. 4469.
There are those that are plated with a nickel-phosphorous alloy (m), and those that are subjected to ion plating, which is a dry plating method, after pretreatment with nickel, as in Japanese Patent Application Laid-Open No. 59-162271.
【０００３】0003
【発明が解決しようとする課題】これらの金属部材にお
いては、近年湿式メッキ法に取って代わり、耐食性、密
着性、耐摩耗性に優れたアーク蒸着法、スパッタリング
法、イオンプレティング法等のＰＶＤ法やＣＶＤ法の乾
式メッキ法が注目され、開発されてきている。[Problem to be solved by the invention] In recent years, wet plating has been replaced by PVD methods such as arc evaporation, sputtering, and ion plating, which have excellent corrosion resistance, adhesion, and abrasion resistance for these metal members. Dry plating methods such as plating method and CVD method have been attracting attention and being developed.
【０００４】この乾式メッキ法で低融点材料へ直接、乾
式メッキ被膜を被覆した場合、真空層内の温度上昇によ
り、高真空雰囲気で低融点材料が蒸発し、耐食性が低下
し、表面が荒れ外観的に満足できるものができなかった
。When a dry plating film is applied directly to a low melting point material using this dry plating method, the low melting point material evaporates in a high vacuum atmosphere due to the temperature rise in the vacuum layer, resulting in a decrease in corrosion resistance and a rough appearance on the surface. I couldn't come up with something that I was completely satisfied with.
【０００５】また、耐食性を向上させるため、単独にニ
ッケル−リン合金メッキを中間層にした場合は５０μｍ
以上被覆しなければ満足できる耐食性を得ることができ
ず、通常のニッケルメッキより硬いために衝撃を与える
と層間剥離が生じる。[0005] In addition, in order to improve corrosion resistance, when a nickel-phosphorus alloy plating is used as an intermediate layer, the thickness is 50 μm.
Satisfactory corrosion resistance cannot be obtained without the above coating, and since it is harder than normal nickel plating, delamination occurs when subjected to impact.
【０００６】さらに、ニッケルメッキ層単独の場合は、
乾式メッキ法での処理条件が２００°Ｃ程度以下であれ
ばよいが、それ以上の高温になると低融点材料がニッケ
ルメッキ層と共に蒸発し、いちじるしく外観を損ねるこ
とがあり、ましてや低温処理であるために密着性が悪い
等の問題があった。Furthermore, in the case of a nickel plating layer alone,
The processing conditions for the dry plating method should be about 200°C or less, but if the temperature is higher than that, the low melting point material will evaporate together with the nickel plating layer, which can significantly impair the appearance, and even more so since it is a low-temperature process. There were problems such as poor adhesion.
【０００７】本発明は上述した従来の欠点を無くし、加
工性のよい低融点材料上に耐熱基材と同等の高温で乾式
メッキ法による被覆が可能であり、密着性、耐食性、耐
摩耗性の優れた金属部材を安価に提供することを目的と
している。[0007] The present invention eliminates the above-mentioned conventional drawbacks, enables coating on a low-melting point material with good processability by dry plating at a high temperature equivalent to that of a heat-resistant base material, and improves adhesion, corrosion resistance, and abrasion resistance. The aim is to provide superior metal parts at low prices.
【０００８】[0008]
【課題を解決するための手段】本発明は、黄銅、洋白、
亜鉛ダイキャスト等の低融点材料の基材の表面に、ニッ
ケル層を下地層として形成すると共に該ニッケル層の直
上に電気メッキ法により、ニッケル−リン合金層を形成
し、該ニッケル−リン合金層上に乾式メッキ法による乾
式メッキ被膜を被覆したものである。[Means for Solving the Problems] The present invention provides brass, nickel silver,
A nickel layer is formed as a base layer on the surface of a base material of a low melting point material such as zinc die casting, and a nickel-phosphorus alloy layer is formed directly on the nickel layer by electroplating, and the nickel-phosphorus alloy layer is formed. The top is coated with a dry plating film using a dry plating method.
【０００９】また、乾式メッキ法による被膜が、周期率
表４ａ、５ａ、６ａ族元素、ケイ素、ゲルマニウムの金
属、窒化物、炭化物、酸化物、炭窒化物、炭酸窒化物お
よび／または金、銀、銅、白金、パラジウム、鉄、コバ
ルト、ニッケル、ロジウム、ルテニウムの金属、合金ま
たはカーボン硬質膜のなかの少なくとも１つよりなるこ
とが好ましい。[0009] Further, the coating formed by the dry plating method may contain metals, nitrides, carbides, oxides, carbonitrides, carbonitrides of elements of Groups 4a, 5a, and 6a of the periodic table, silicon, and germanium, and/or gold and silver. , copper, platinum, palladium, iron, cobalt, nickel, rhodium, ruthenium, an alloy, or a carbon hard film.
【００１０】0010
【実施例】以下本発明の実施例を図面により詳細に説明
する。図１は本発明の実施例を示す金属部材の要部断面
図である。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be explained in detail with reference to the drawings. FIG. 1 is a sectional view of a main part of a metal member showing an embodiment of the present invention.
【００１１】実施例１ 低融点材料である亜鉛ダイキ
ャストのベルトのバックルである基材１を前処理を施し
、湿式メッキ法により通常のワット浴で厚さ約５μｍの
ニッケル層２を形成し、その上に、硫酸ニッケル、塩化
ニッケル、次亜リン酸ナトリウムを主成分としたニッケ
ル−リン合金メッキ浴で電気メッキを行い、約１０％の
リンを含む厚さ約３μｍのニッケル−リン合金層３を形
成させる。Example 1 A base material 1, which is a buckle for a belt made of die-cast zinc, which is a low melting point material, is pretreated, and a nickel layer 2 with a thickness of about 5 μm is formed in a normal Watt bath using a wet plating method. On top of that, electroplating is performed in a nickel-phosphorus alloy plating bath containing nickel sulfate, nickel chloride, and sodium hypophosphite as main components, and a nickel-phosphorus alloy layer 3 with a thickness of about 3 μm containing about 10% phosphorus is applied. to form.
【００１２】次に、乾式メッキ法であるイオンプレーテ
ィングを用いて、ニッケル層２とニッケル−リン合金層
３が形成された基材１をイオンプレーティング装置の真
空槽内にセットし、排気後アルゴンガスを導入して内圧
１×１０−４Ｐａとし、基材１に負電位５０Ｖの加速電
圧をかけてアノード電流４０Ａでアルゴンガスをイオン
化し、ニッケル−リン合金層３の表面にボンバードクリ
ーニングを施した。Next, using ion plating, which is a dry plating method, the base material 1 on which the nickel layer 2 and the nickel-phosphorus alloy layer 3 have been formed is set in a vacuum chamber of an ion plating device, and after being evacuated. Argon gas is introduced to set the internal pressure to 1 x 10-4 Pa, an acceleration voltage of 50 V is applied to the base material 1, and the argon gas is ionized with an anode current of 40 A. Bombard cleaning is performed on the surface of the nickel-phosphorus alloy layer 3. did.
【００１３】次に真空槽内に窒素ガスを導入し、アルゴ
ンガスとの混合ガスを反応ガスとして内圧を７×１０−
１Ｐａに保持し、適当な加速電圧で発生する電子ビーム
を蒸発源の金属チタンに照射し、発生するチタン蒸気と
窒素ガスをプラズマ中でイオン化し、周期率表４ａ族元
素の窒化物である窒化チタン被膜を厚さ約１μｍ形成さ
せる。Next, nitrogen gas is introduced into the vacuum chamber, and the internal pressure is increased to 7×10− by using a mixed gas with argon gas as the reaction gas.
The titanium metal in the evaporation source is irradiated with an electron beam that is maintained at 1 Pa and generated at an appropriate acceleration voltage, and the titanium vapor and nitrogen gas that are generated are ionized in the plasma to form nitrides, which are nitrides of Group 4a elements in the periodic table. A titanium film is formed to a thickness of about 1 μm.
【００１４】さらに、窒素ガス導入を中止し、同装置内
の金合金の蒸発源に電子ビームを照射して金合金を気化
させ、窒化チタン被膜上に厚さ約０．３μｍの金合金被
膜を形成させ窒化チタン被膜と金合金被膜との乾式メッ
キ被膜４をニッケル−リン合金層３上に被覆する。Furthermore, the introduction of nitrogen gas was stopped, and the gold alloy evaporation source in the same apparatus was irradiated with an electron beam to vaporize the gold alloy, thereby forming a gold alloy coating with a thickness of about 0.3 μm on the titanium nitride coating. A dry plating film 4 of a titanium nitride film and a gold alloy film is formed on the nickel-phosphorous alloy layer 3.
【００１５】上記方法によって形成した金属部材は、折
り曲げ試験（ＪＩＳ Ｈ−０４１１）、キャス試験（
ＪＩＳ Ｈ−８６１７）を行った。試験結果は耐食性
、密着性を充分満足するものであった。[0015] The metal member formed by the above method was tested in a bending test (JIS H-0411) and a cast test (
JIS H-8617). The test results were satisfactory in terms of corrosion resistance and adhesion.
【００１６】本発明の金属部材が従来のニッケルまたは
ニッケル−リン合金の単独の中間層のものよりも耐食性
、密着性、耐摩耗性が優れる理由は、比較的柔らかいニ
ッケル層２が衝撃やストレスを和らげる緩衝材の役目を
し、またその上のニッケル−リン合金層３は電気メッキ
により形成する結晶構造をとっており高硬度の層であり
、さらにそれよりも高硬度の乾式メッキ被膜で被覆する
構造となっているからである。The reason why the metal member of the present invention has better corrosion resistance, adhesion, and abrasion resistance than the conventional single intermediate layer of nickel or nickel-phosphorus alloy is that the relatively soft nickel layer 2 resists impact and stress. The nickel-phosphorus alloy layer 3 on top of the nickel-phosphorus alloy layer 3 has a crystalline structure formed by electroplating and has a high hardness, and is further coated with a dry plating film that is even harder. This is because it has a structure.
【００１７】実施例２ 黄銅性のドアのレバーハンド
ルの基材１を実施例１と同様な手段を用いて、ニッケル
層２とニッケル−リン合金層３を形成した後、アーク蒸
着法を用い、ニッケル層２とニッケル−リン合金層３を
形成した基体１をアーク蒸着装置の真空槽内に入れ、排
気後所要のボンバードクリーニングを施した。Example 2 A nickel layer 2 and a nickel-phosphorus alloy layer 3 were formed on a base material 1 of a brass door lever handle using the same method as in Example 1, and then an arc evaporation method was used to form a nickel layer 2 and a nickel-phosphorus alloy layer 3. The substrate 1 on which the nickel layer 2 and the nickel-phosphorus alloy layer 3 were formed was placed in a vacuum chamber of an arc evaporation apparatus, and after exhausting air, required bombardment cleaning was performed.
【００１８】アルゴン、窒素、メタンの混合ガスをイオ
ン化し、同様に金属ジルコニウムターゲットからイオン
化したジルコニウムと反応させて、周期率表４ａ族元素
の炭窒化物であるグレー色で厚さ約３μｍの炭窒化ジル
コニウムの乾式メッキ被膜４を形成させた。この場合も
、耐食性、密着性を満足できるものであった。A mixed gas of argon, nitrogen, and methane is ionized and reacted with zirconium that was similarly ionized from a metal zirconium target to produce a gray-colored carbon nitride of about 3 μm thick, which is a carbonitride of group 4a elements in the periodic table. A dry plating film 4 of zirconium nitride was formed. In this case as well, the corrosion resistance and adhesion were satisfactory.
【００１９】なお、実施例で示した窒化チタン、炭窒化
ジルコニウムの乾式メッキ被膜４の代わりに周期率表４
ａ、５ａ、６ａ族元素、ケイ素、ゲルマニウムの金属、
窒化物、炭化物、酸化物、炭窒化物、炭酸窒化物および
／または金、銀、銅、白金、パラジウム、鉄、コバルト
、ニッケル、ロジウム、ルテニウムの金属、合金または
カーボン硬質膜等でも同様の結果が得られ、バリエーシ
ョンに富む色調の被膜が得られる。Note that periodicity table 4 is used instead of the dry plating film 4 of titanium nitride and zirconium carbonitride shown in the example.
a, 5a, 6a group elements, silicon, germanium metals,
Similar results were obtained with nitrides, carbides, oxides, carbonitrides, carbonitrides, and/or metals, alloys, or carbon hard films of gold, silver, copper, platinum, palladium, iron, cobalt, nickel, rhodium, and ruthenium. A coating with a wide variety of colors can be obtained.
【００２０】また、乾式メッキ被膜４の形成方法として
も実施例以外の方法、例えば、スパッタリング法、プラ
スマＣＶＤ等のＣＶＤ法でも耐熱性基材と同様に被覆す
ることが可能である。Furthermore, the dry plating film 4 can be formed by a method other than those in the embodiments, such as a sputtering method or a CVD method such as plasma CVD, in the same manner as for the heat-resistant base material.
【００２１】[0021]
【発明の効果】以上の説明から明らかなように、本発明
によれば、低融点材料の基材表面に、ニッケル下地層と
その上のニッケル−リン合金層を形成することにより、
従来のニッケルとニッケル−リン合金との組合せ以外の
組成の中間層では得られない耐食性、密着性、耐摩耗性
に優れた金属部材を提供することが可能となった。さら
に、基材が低融点材料であるがゆえに加工性がよく、通
常の高温での乾式メッキ法でできるので製造コストが下
がり、安価で品質のよい金属部品が得られる。As is clear from the above description, according to the present invention, by forming a nickel base layer and a nickel-phosphorus alloy layer thereon on the surface of a base material of a low melting point material,
It has become possible to provide a metal member with excellent corrosion resistance, adhesion, and wear resistance that cannot be obtained with an intermediate layer having a composition other than the conventional combination of nickel and nickel-phosphorus alloy. Furthermore, since the base material is a low-melting point material, it has good workability and can be produced by ordinary dry plating at high temperatures, reducing manufacturing costs and producing inexpensive, high-quality metal parts.
【図１】本発明の実施例を示す金属部材の要部断面図で
ある。FIG. 1 is a sectional view of a main part of a metal member showing an embodiment of the present invention.
【符号の説明】 １ 基材 ２ ニッケル層 ３ ニッケル−リン合金層 ４ 乾式メッキ被膜[Explanation of symbols] 1 Base material 2 Nickel layer 3 Nickel-phosphorus alloy layer 4 Dry plating film
Claims (2)
融点材料の基材の表面に、ニッケル層を下地層として形
成すると共に該ニッケル層の直上に電気メッキ法により
、ニッケル−リン合金層を形成し、該ニッケル−リン合
金層上に乾式メッキ法による乾式メッキ被膜を被覆した
ことを特徴とする金属部材。Claim 1: A nickel layer is formed as a base layer on the surface of a base material of a low melting point material such as brass, nickel silver, or zinc die-casting, and a nickel-phosphorus alloy layer is formed directly on the nickel layer by electroplating. A metal member comprising: a nickel-phosphorus alloy layer formed thereon, and a dry plating film formed by dry plating on the nickel-phosphorus alloy layer.
４ａ、５ａ、６ａ族元素、ケイ素、ゲルマニウムの金属
、窒化物、炭化物、酸化物、炭窒化物、炭酸窒化物およ
び／または金、銀、銅、白金、パラジウム、鉄、コバル
ト、ニッケル、ロジウム、ルテニウムの金属、合金また
はカーボン硬質膜のなかの少なくとも１つよりなること
を特徴とする請求項１記載の金属部材。2. The coating formed by the dry plating method contains metals, nitrides, carbides, oxides, carbonitrides, carbonitrides, and/or gold and silver of Groups 4a, 5a, and 6a of the periodic table, silicon, and germanium. 2. The metal member according to claim 1, wherein the metal member is made of at least one of metals, alloys, or carbon hard films of copper, platinum, palladium, iron, cobalt, nickel, rhodium, and ruthenium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9501691A JPH04304386A (en) | 1991-04-02 | 1991-04-02 | Metal member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9501691A JPH04304386A (en) | 1991-04-02 | 1991-04-02 | Metal member |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04304386A true JPH04304386A (en) | 1992-10-27 |
Family
ID=14126209
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9501691A Pending JPH04304386A (en) | 1991-04-02 | 1991-04-02 | Metal member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04304386A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6413653B1 (en) * | 1998-08-03 | 2002-07-02 | Citizen Watch Co., Ltd. | Personal ornament covered with colored coating and process for producing the same |
| JP2013530352A (en) * | 2010-04-20 | 2013-07-25 | ノード−ロック・アーベー | Method and plant for washer manufacture and washer |
-
1991
- 1991-04-02 JP JP9501691A patent/JPH04304386A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6413653B1 (en) * | 1998-08-03 | 2002-07-02 | Citizen Watch Co., Ltd. | Personal ornament covered with colored coating and process for producing the same |
| JP2013530352A (en) * | 2010-04-20 | 2013-07-25 | ノード−ロック・アーベー | Method and plant for washer manufacture and washer |
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