JPH04283555A - 4-substituted sulfonaniliode compound - Google Patents
4-substituted sulfonaniliode compoundInfo
- Publication number
- JPH04283555A JPH04283555A JP3126999A JP12699991A JPH04283555A JP H04283555 A JPH04283555 A JP H04283555A JP 3126999 A JP3126999 A JP 3126999A JP 12699991 A JP12699991 A JP 12699991A JP H04283555 A JPH04283555 A JP H04283555A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- compound
- cyclohexyloxy
- methanesulfonamide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 67
- -1 phenoxy, formyloxy Chemical group 0.000 claims abstract description 91
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 16
- 125000004423 acyloxy group Chemical group 0.000 claims abstract description 11
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 9
- 125000004414 alkyl thio group Chemical group 0.000 claims abstract description 9
- 150000003839 salts Chemical class 0.000 claims abstract description 8
- 125000004644 alkyl sulfinyl group Chemical group 0.000 claims abstract description 7
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims abstract description 7
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 6
- 125000005079 alkoxycarbonylmethyl group Chemical group 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 4
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 claims description 2
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 claims description 2
- 239000002221 antipyretic Substances 0.000 abstract description 7
- 230000001754 anti-pyretic effect Effects 0.000 abstract description 6
- 230000000202 analgesic effect Effects 0.000 abstract description 5
- 230000003110 anti-inflammatory effect Effects 0.000 abstract description 5
- 230000003266 anti-allergic effect Effects 0.000 abstract description 4
- WBRMPWHSACBWTF-UHFFFAOYSA-N n-(2-cyclohexyloxy-5-methyl-4-nitrophenyl)methanesulfonamide Chemical compound C1=C([N+]([O-])=O)C(C)=CC(NS(C)(=O)=O)=C1OC1CCCCC1 WBRMPWHSACBWTF-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical group 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 75
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 39
- 239000002904 solvent Substances 0.000 description 39
- 239000000243 solution Substances 0.000 description 37
- 238000006243 chemical reaction Methods 0.000 description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 31
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 28
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 27
- 238000000034 method Methods 0.000 description 25
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 25
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 21
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 18
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 18
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 17
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 16
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 16
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 16
- 239000012044 organic layer Substances 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 15
- 239000000126 substance Substances 0.000 description 15
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 14
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 14
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 12
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 239000002585 base Substances 0.000 description 11
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 10
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 9
- GCFHZZWXZLABBL-UHFFFAOYSA-N ethanol;hexane Chemical compound CCO.CCCCCC GCFHZZWXZLABBL-UHFFFAOYSA-N 0.000 description 9
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 9
- 235000011121 sodium hydroxide Nutrition 0.000 description 9
- 238000005160 1H NMR spectroscopy Methods 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 8
- 238000010898 silica gel chromatography Methods 0.000 description 8
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- HNQIVZYLYMDVSB-UHFFFAOYSA-N methanesulfonimidic acid Chemical compound CS(N)(=O)=O HNQIVZYLYMDVSB-UHFFFAOYSA-N 0.000 description 7
- 238000006722 reduction reaction Methods 0.000 description 7
- 229910000029 sodium carbonate Inorganic materials 0.000 description 7
- 235000017550 sodium carbonate Nutrition 0.000 description 7
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 6
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 6
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 6
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 6
- 235000011118 potassium hydroxide Nutrition 0.000 description 6
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 6
- 235000017557 sodium bicarbonate Nutrition 0.000 description 6
- 239000007858 starting material Substances 0.000 description 6
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 description 5
- 235000011181 potassium carbonates Nutrition 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 4
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 4
- 235000015497 potassium bicarbonate Nutrition 0.000 description 4
- 239000011736 potassium bicarbonate Substances 0.000 description 4
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 4
- 229910000104 sodium hydride Inorganic materials 0.000 description 4
- 239000012312 sodium hydride Substances 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- XEZNGIUYQVAUSS-UHFFFAOYSA-N 18-crown-6 Chemical compound C1COCCOCCOCCOCCOCCO1 XEZNGIUYQVAUSS-UHFFFAOYSA-N 0.000 description 3
- NHQDETIJWKXCTC-UHFFFAOYSA-N 3-chloroperbenzoic acid Chemical compound OOC(=O)C1=CC=CC(Cl)=C1 NHQDETIJWKXCTC-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 3
- 150000008041 alkali metal carbonates Chemical class 0.000 description 3
- 229910000102 alkali metal hydride Inorganic materials 0.000 description 3
- 150000008046 alkali metal hydrides Chemical class 0.000 description 3
- 239000002260 anti-inflammatory agent Substances 0.000 description 3
- 229940121363 anti-inflammatory agent Drugs 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 150000003983 crown ethers Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 3
- 150000007530 organic bases Chemical class 0.000 description 3
- 239000003208 petroleum Substances 0.000 description 3
- 229910000105 potassium hydride Inorganic materials 0.000 description 3
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 229910052702 rhenium Inorganic materials 0.000 description 3
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- XNJAYQHWXYJBBD-UHFFFAOYSA-N 1,4-difluoro-2-nitrobenzene Chemical compound [O-][N+](=O)C1=CC(F)=CC=C1F XNJAYQHWXYJBBD-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- XKZNMYFNEPBXDA-UHFFFAOYSA-N 2-cyclohexyloxy-5-methylaniline Chemical compound NC1=CC(C)=CC=C1OC1CCCCC1 XKZNMYFNEPBXDA-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- 208000018522 Gastrointestinal disease Diseases 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000730 antalgic agent Substances 0.000 description 2
- 239000000043 antiallergic agent Substances 0.000 description 2
- 229940125716 antipyretic agent Drugs 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000010531 catalytic reduction reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- FHHZOYXKOICLGH-UHFFFAOYSA-N dichloromethane;ethanol Chemical compound CCO.ClCCl FHHZOYXKOICLGH-UHFFFAOYSA-N 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 230000002140 halogenating effect Effects 0.000 description 2
- 238000005658 halogenation reaction Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 2
- 229910052808 lithium carbonate Inorganic materials 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 229960003975 potassium Drugs 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229910052701 rubidium Inorganic materials 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- JQWHASGSAFIOCM-UHFFFAOYSA-M sodium periodate Chemical compound [Na+].[O-]I(=O)(=O)=O JQWHASGSAFIOCM-UHFFFAOYSA-M 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- OORBDHOQLZRIQR-UHFFFAOYSA-N 1-fluoro-4-methyl-2-nitrobenzene Chemical compound CC1=CC=C(F)C([N+]([O-])=O)=C1 OORBDHOQLZRIQR-UHFFFAOYSA-N 0.000 description 1
- LTMRRSWNXVJMBA-UHFFFAOYSA-L 2,2-diethylpropanedioate Chemical compound CCC(CC)(C([O-])=O)C([O-])=O LTMRRSWNXVJMBA-UHFFFAOYSA-L 0.000 description 1
- YWSZGMNCVYAZHJ-UHFFFAOYSA-N 2-ethoxycarbonyl-2-methylbutanoic acid Chemical compound CCOC(=O)C(C)(CC)C(O)=O YWSZGMNCVYAZHJ-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 239000012359 Methanesulfonyl chloride Substances 0.000 description 1
- JYENLFHVUQDQQB-UHFFFAOYSA-M N.[Na+].[SH-].Cl Chemical compound N.[Na+].[SH-].Cl JYENLFHVUQDQQB-UHFFFAOYSA-M 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- KTDZCOWXCWUPEO-UHFFFAOYSA-N NS-398 Chemical compound CS(=O)(=O)NC1=CC=C([N+]([O-])=O)C=C1OC1CCCCC1 KTDZCOWXCWUPEO-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229940035676 analgesics Drugs 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000037396 body weight Effects 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 238000005933 dealkoxycarbonylation reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- SPWVRYZQLGQKGK-UHFFFAOYSA-N dichloromethane;hexane Chemical compound ClCCl.CCCCCC SPWVRYZQLGQKGK-UHFFFAOYSA-N 0.000 description 1
- 239000002552 dosage form Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- LJQKCYFTNDAAPC-UHFFFAOYSA-N ethanol;ethyl acetate Chemical compound CCO.CCOC(C)=O LJQKCYFTNDAAPC-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000006125 ethylsulfonyl group Chemical group 0.000 description 1
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 210000001035 gastrointestinal tract Anatomy 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005928 isopropyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- HQRPHMAXFVUBJX-UHFFFAOYSA-M lithium;hydrogen carbonate Chemical compound [Li+].OC([O-])=O HQRPHMAXFVUBJX-UHFFFAOYSA-M 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 1
- 229910001623 magnesium bromide Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 1
- XHXXWWGGXFUMAJ-UHFFFAOYSA-N methanethiol;sodium Chemical compound [Na].SC XHXXWWGGXFUMAJ-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- QHDUJTCUPWHNPK-UHFFFAOYSA-N methyl 7-methoxy-2h-indazole-3-carboxylate Chemical compound COC1=CC=CC2=C(C(=O)OC)NN=C21 QHDUJTCUPWHNPK-UHFFFAOYSA-N 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 125000006216 methylsulfinyl group Chemical group [H]C([H])([H])S(*)=O 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- HYWYRSMBCFDLJT-UHFFFAOYSA-N nimesulide Chemical compound CS(=O)(=O)NC1=CC=C([N+]([O-])=O)C=C1OC1=CC=CC=C1 HYWYRSMBCFDLJT-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 230000000802 nitrating effect Effects 0.000 description 1
- 238000006396 nitration reaction Methods 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 208000024891 symptom Diseases 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、4置換スルホンアニリ
ド化合物及びその製薬学的に許容される塩に関する。更
に詳細には、本発明は抗炎症作用、解熱作用、鎮痛作用
、抗アレルギー作用を有する新規な4置換スルホンアニ
リド化合物及びその製薬学的に許容される塩に関する。FIELD OF THE INVENTION This invention relates to 4-substituted sulfonanilide compounds and pharmaceutically acceptable salts thereof. More specifically, the present invention relates to novel 4-substituted sulfonanilide compounds and pharmaceutically acceptable salts thereof having anti-inflammatory, antipyretic, analgesic and anti-allergic effects.
【0002】0002
【従来の技術】抗炎症作用を有するスルホンアニリド化
合物に関しては、米国特許第3,840,597号明細
書、同第3,806,024号明細書、特開昭61−1
0548号公報、特開昭63−190869号公報、特
開平2−268号公報に記載の化合物[たとえば、N−
(4−ニトロ−2−フェノキシフェニル)メタンスルホ
ンアミド、N−(2−シクロヘキシルオキシ−4−ニト
ロフェニル)メタンスルホンアミドなど]などが知られ
ているが、4置換スルホンアニリド化合物に関しては全
く開示されていない。[Prior Art] Sulfonanilide compounds having anti-inflammatory effects are described in U.S. Pat. No. 3,840,597, U.S. Pat.
Compounds described in JP-A No. 0548, JP-A-63-190869, and JP-A-2-268 [for example, N-
(4-nitro-2-phenoxyphenyl)methanesulfonamide, N-(2-cyclohexyloxy-4-nitrophenyl)methanesulfonamide, etc.], but nothing has been disclosed regarding 4-substituted sulfonanilide compounds. Not yet.
【0003】0003
【発明が解決しようとする課題】本発明は長期投与に耐
えうる安全性の高い薬剤を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a highly safe drug that can withstand long-term administration.
【0004】0004
【課題を解決するための手段】本発明者らは、上記を目
的に鋭意検討した結果、抗炎症、解熱、鎮痛及び抗アレ
ルギー作用を有するため、抗炎症剤、解熱剤、鎮痛剤及
び抗アレルギー剤として有用であり、しかも消化管障害
などの副作用の少ない安全性の高い化合物を見い出し、
本発明を完成した。[Means for Solving the Problems] As a result of intensive studies aimed at the above-mentioned purpose, the present inventors have found that the present inventors have developed an anti-inflammatory agent, an antipyretic agent, an analgesic agent, and an antiallergic agent, which have anti-inflammatory, antipyretic, analgesic, and antiallergic effects. We have discovered a highly safe compound that is useful as a gastrointestinal tract and has fewer side effects such as gastrointestinal disorders.
The invention has been completed.
【0005】本発明は、式[0005] The present invention is based on the formula
【化2】
[化2中、Raは低級アルキル基であり、Rbはシクロ
アルキル基であり、Rcは低級アルキル基、ハロゲン原
子、水酸基、低級アルコキシ基、フェノキシ基、ホルミ
ルオキシ基、低級アルカノイルオキシ基、低級アルキル
チオ基、低級アルキルスルフィニル基、低級アルキルス
ルホニル基、フェニルチオ基、フェニルスルフィニル基
、フェニルスルホニル基、低級アルコキシカルボニルメ
チルチオ基、低級アルコキシカルボニルメチルスルフィ
ニル基、低級アルコキシカルボニルメチルスルホニル基
または式−CH2Rd(式中、Rdは水酸基、低級アル
コキシ基、フェノキシ基、低級アルカノイルオキシ基、
低級アルキルチオ基、低級アルキルスルフィニル基、低
級アルキルスルホニル基、低級アルコキシカルボニルメ
チル基、カルボキシメチル基または1個もしくは2個の
低級アルキル基が置換したアミノ基である。)で表され
る基である。]で表わされる4置換スルホンアニリド化
合物及びその製薬学的に許容される塩である。[In formula 2, Ra is a lower alkyl group, Rb is a cycloalkyl group, and Rc is a lower alkyl group, a halogen atom, a hydroxyl group, a lower alkoxy group, a phenoxy group, a formyloxy group, a lower alkanoyloxy group. group, lower alkylthio group, lower alkylsulfinyl group, lower alkylsulfonyl group, phenylthio group, phenylsulfinyl group, phenylsulfonyl group, lower alkoxycarbonylmethylthio group, lower alkoxycarbonylmethylsulfinyl group, lower alkoxycarbonylmethylsulfonyl group or formula -CH2Rd (In the formula, Rd is a hydroxyl group, a lower alkoxy group, a phenoxy group, a lower alkanoyloxy group,
It is a lower alkylthio group, a lower alkylsulfinyl group, a lower alkylsulfonyl group, a lower alkoxycarbonylmethyl group, a carboxymethyl group, or an amino group substituted with one or two lower alkyl groups. ). ] These are 4-substituted sulfonanilide compounds and pharmaceutically acceptable salts thereof.
【0006】本発明において、ハロゲン原子とはフッ素
原子、塩素原子、臭素原子またはヨウ素原子である。低
級アルキル基とは炭素原子1〜5個の直鎖状または分枝
鎖状のアルキル基であり、たとえばメチル基、エチル基
、プロピル基、イソプロピル基、ブチル基、3−ペンチ
ル基などである。シクロアルキル基とは炭素原子数3〜
8個のシクロアルキル基であり、たとえばシクロプロピ
ル基、シクロペンチル基、シクロヘキシル基、シクロヘ
プチル基などである。低級アルコキシ基とは炭素原子数
1〜5個の直鎖状または分枝鎖状のアルコキシ基であり
、たとえばメトキシ基、エトキシ基、プロピルオキシ基
、ブチルオキシ基、3−ペンチルオキシ基などである。
低級アルカノイルオキシ基とは炭素原子数2〜6個の直
鎖状または分枝鎖状のアルカノイルオキシ基であリ、た
とえばアセトキシ基、プロピオニルオキシ基、イソプロ
ピオニルオキシ基、ブチリルオキシ基などである。低級
アルキルチオ基とは炭素原子数1〜5個の直鎖状または
分枝鎖状のアルキルチオ基であり、たとえばメチルチオ
基、エチルチオ基、プロピルチオ基、ブチルチオ基、3
−ペンチルチオ基などである。低級アルキルスルフィニ
ル基とは炭素原子数1〜5個の直鎖状または分枝鎖状の
アルキルスルフィニル基であり、たとえばメチルスルフ
ィニル基、エチルスルフィニル基、プロピルスルフィニ
ル基、ブチルスルフィニル基、3−ペンチルスルフィニ
ル基などである。低級アルキルスルホニル基とは炭素原
子数1〜5個の直鎖状または分枝鎖状のアルキルスルホ
ニル基であり、たとえばメチルスルホニル基、エチルス
ルホニル基、プロピルスルホニル基、ブチルスルホニル
基、3−ペンチルスルホニル基などである。低級アルコ
キシカルボニルメチルチオ基とは炭素原子数3〜7個の
直鎖状または分枝鎖状のアルコキシカルボニルメチルチ
オ基であり、たとえばメトキシカルボニルメチルチオ基
、エトキシカルボニルメチルチオ基、プロピルオキシカ
ルボニルメチルチオ基、ブチルオキシカルボニルメチル
チオ基などである。低級アルコキシカルボニルメチルス
ルフィニル基とは炭素原子数3〜7個の直鎖状または分
枝鎖状のアルコキシカルボニルメチルスルフィニル基で
あり、たとえばメトキシカルボニルメチルスルフィニル
基、エトキシカルボニルメチルスルフィニル基、プロピ
ルオキシカルボニルメチルスルフィニル基、ブチルオキ
シカルボニルメチルスルフィニル基などである。低級ア
ルコキシカルボニルメチルスルホニル基とは炭素原子数
3〜7個の直鎖状または分枝鎖状のアルコキシカルボニ
ルメチルスルホニル基であり、たとえばメトキシカルボ
ニルメチルスルホニル基、エトキシカルボニルメチルス
ルホニル基、プロピルオキシカルボニルメチルスルホニ
ル基、ブチルオキシカルボニルメチルスルホニル基など
である。低級アルコキシカルボニルメチル基とは炭素原
子数3〜7個の直鎖状まだは分枝鎖状のアルコキシカル
ボニル基であり、たとえばメトキシカルボニル基、エト
キシカルボニル基、プロピルオキシカルボニル基、イソ
プロピルオキシカルボニル基、ブチルオキシカルボニル
基などである。In the present invention, the halogen atom is a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. The lower alkyl group is a linear or branched alkyl group having 1 to 5 carbon atoms, such as methyl, ethyl, propyl, isopropyl, butyl, 3-pentyl, and the like. Cycloalkyl group has 3 or more carbon atoms
Eight cycloalkyl groups, such as cyclopropyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, etc. The lower alkoxy group is a linear or branched alkoxy group having 1 to 5 carbon atoms, such as a methoxy group, an ethoxy group, a propyloxy group, a butyloxy group, a 3-pentyloxy group, and the like. The lower alkanoyloxy group is a linear or branched alkanoyloxy group having 2 to 6 carbon atoms, such as an acetoxy group, a propionyloxy group, an isopropionyloxy group, a butyryloxy group, and the like. A lower alkylthio group is a linear or branched alkylthio group having 1 to 5 carbon atoms, such as methylthio group, ethylthio group, propylthio group, butylthio group,
-pentylthio group, etc. A lower alkylsulfinyl group is a linear or branched alkylsulfinyl group having 1 to 5 carbon atoms, such as methylsulfinyl group, ethylsulfinyl group, propylsulfinyl group, butylsulfinyl group, 3-pentylsulfinyl group. etc. A lower alkylsulfonyl group is a linear or branched alkylsulfonyl group having 1 to 5 carbon atoms, such as methylsulfonyl group, ethylsulfonyl group, propylsulfonyl group, butylsulfonyl group, 3-pentylsulfonyl group. etc. A lower alkoxycarbonylmethylthio group is a linear or branched alkoxycarbonylmethylthio group having 3 to 7 carbon atoms, such as methoxycarbonylmethylthio group, ethoxycarbonylmethylthio group, propyloxycarbonylmethylthio group, butyloxy Carbonylmethylthio group, etc. A lower alkoxycarbonylmethylsulfinyl group is a linear or branched alkoxycarbonylmethylsulfinyl group having 3 to 7 carbon atoms, such as methoxycarbonylmethylsulfinyl group, ethoxycarbonylmethylsulfinyl group, propyloxycarbonylmethyl group. These include sulfinyl group, butyloxycarbonylmethylsulfinyl group, etc. A lower alkoxycarbonylmethylsulfonyl group is a linear or branched alkoxycarbonylmethylsulfonyl group having 3 to 7 carbon atoms, such as methoxycarbonylmethylsulfonyl group, ethoxycarbonylmethylsulfonyl group, propyloxycarbonylmethyl group. Sulfonyl group, butyloxycarbonylmethylsulfonyl group, etc. A lower alkoxycarbonylmethyl group is a linear or branched alkoxycarbonyl group having 3 to 7 carbon atoms, such as a methoxycarbonyl group, an ethoxycarbonyl group, a propyloxycarbonyl group, an isopropyloxycarbonyl group, Butyloxycarbonyl group, etc.
【0007】本発明の化2の化合物は、公知の化合物か
ら下記に示す方法によって製造することができる。
(1)Rcが低級アルキル基である化2の化合物は、式
The compound of formula 2 of the present invention can be produced from known compounds by the method shown below. (1) The compound of formula 2 in which Rc is a lower alkyl group has the formula
【化3】[Chemical formula 3]
【0008】(化3中、Reは低級アルキル基である。
)で示される化合物を出発原料として得ることができる
。すなわち、化3の化合物に塩基存在下、式Rb−OH
(式中、Rbは前記と同意義である。)で示される化合
物を反応させることにより、式A compound represented by the formula (in formula 3, Re is a lower alkyl group) can be obtained as a starting material. That is, in the presence of a base, the compound of formula Rb-OH
(In the formula, Rb has the same meaning as above.) By reacting the compound represented by the formula
【化4】[C4]
【0009】(化4中、Rb及びReは前記と同意義で
ある。)で示される化合物を得ることができる。A compound represented by the formula (in formula 4, Rb and Re have the same meanings as above) can be obtained.
【0010】本反応における塩基とは、水酸化ナトリウ
ム、水酸化カリウムなどのアルカリ金属水酸化物、水素
化ナトリウム、水素化カリウムなどのアルカリ金属水素
化物、炭酸ナトリウム、炭酸カリウムなどのアルカリ金
属炭酸塩、炭酸水素ナトリウム、炭酸水素カリウムなど
のアルカリ金属炭酸水素塩、金属ナトリウム、ナトリウ
ムアミドなどである。本反応は、無溶媒またはジオキサ
ン、テトラヒドロフラン、エチルエーテル、石油エーテ
ル、ヘキサン、シクロヘキサン、ベンゼン、トルエン、
、キシレン、ピリジン、N,N−ジメチルホルムアミド
、ジメチルスルホキシド、ジクロロメタン、クロロホル
ムなどの溶媒中で行なうことができる。また、本反応に
おいては、ヨウ化カリウム、ベンジルトリエチルアンモ
ニウムクロリドなどの4級アンモニウム塩、18−クラ
ウン−6エーテルなどのクラウンエーテルなどを加える
ことにより反応を加速することもできる。次いで、化4
の化合物を遠元してアミノ体とする。還元はニトロ基を
還元してアミノ基とする通常の還元方法でよく、たとえ
ばパラジウム−炭素、ラネ−ニッケル、白金などを触媒
として用いる接触還元、鉄や錫を用いる還元、硫化ナト
リウム−塩化アンモニウムを用いる還元、水素化ホウ素
ナトリウム、水素化リチウムアルミニウムなどを用いる
還元などである。本反応に用いる溶媒は、還元法により
任意に選択すればよいが、一般的にはメタノール、エタ
ノール、プロパノールなどのアルコール、水、酢酸、酢
酸エチル、ジオキサン、テトラヒドロフラン、アセトニ
トリルなどである。Bases used in this reaction include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, alkali metal hydrides such as sodium hydride and potassium hydride, and alkali metal carbonates such as sodium carbonate and potassium carbonate. , alkali metal hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate, metal sodium, and sodium amide. This reaction can be carried out without solvent or with dioxane, tetrahydrofuran, ethyl ether, petroleum ether, hexane, cyclohexane, benzene, toluene,
The reaction can be carried out in a solvent such as , xylene, pyridine, N,N-dimethylformamide, dimethyl sulfoxide, dichloromethane, or chloroform. Further, in this reaction, the reaction can be accelerated by adding potassium iodide, a quaternary ammonium salt such as benzyltriethylammonium chloride, a crown ether such as 18-crown-6 ether, and the like. Then chemical formula 4
The compound is converted into an amino form. The reduction may be carried out by a conventional reduction method in which a nitro group is reduced to an amino group, such as catalytic reduction using palladium-carbon, Raney-nickel, or platinum as a catalyst, reduction using iron or tin, or reduction using sodium sulfide-ammonium chloride. reduction using sodium borohydride, lithium aluminum hydride, etc. The solvent used in this reaction may be arbitrarily selected depending on the reduction method, but generally includes alcohols such as methanol, ethanol, and propanol, water, acetic acid, ethyl acetate, dioxane, tetrahydrofuran, and acetonitrile.
【0011】引続き、上記で得たアミノ体を式RaSO
3H(式中、Raは前記と同意義である。)で示される
スルホン酸化合物またはその反応性誘導体(たとえば、
酸ハロゲン化物、酸無水物などである。)と反応させる
ことにより、式[0011] Subsequently, the amino compound obtained above was given the formula RaSO
A sulfonic acid compound represented by 3H (wherein Ra has the same meaning as above) or a reactive derivative thereof (for example,
These include acid halides and acid anhydrides. ) by reacting with the formula
【化5】[C5]
【0012】(化5中、Ra、Rb及びReは前記と同
意義である。)で示される化合物を得ことができる。A compound represented by the formula (in formula 5, Ra, Rb and Re have the same meanings as above) can be obtained.
【0013】本反応において、スルホン酸化合物を使用
する場合にはN,N−ジシクロヘキシルカルボジイミド
などの縮合剤の存在下に行うのが好ましい。反応性誘導
体を使用する場合には塩基存在下で行なうのが好ましい
。ここで用いられる塩基とは水酸化ナトリウム、水酸化
カリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナ
トリウム、炭酸水素カリウムなどの無機塩基またはトリ
エチルアミン、1−メチルモルホリン、1−メチルピペ
リジン、ピリジン、N,N−ジメチルアミノピリジンな
どの有機塩基である。また、この反応は、通常ジクロロ
メタン、クロロホルム、酢酸エチル、ジオキサン、テト
ラヒドロフラン、エチルエーテル、ベンゼン、トルエン
、キシレン、アセトン、アセトニトリル、水、ピリジン
、N,N−ジメチルホルムアミド、ジメチルスルホキシ
ドなどの溶媒中で行われる。In this reaction, when a sulfonic acid compound is used, it is preferably carried out in the presence of a condensing agent such as N,N-dicyclohexylcarbodiimide. When using a reactive derivative, it is preferable to carry out the reaction in the presence of a base. The bases used here are inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, triethylamine, 1-methylmorpholine, 1-methylpiperidine, pyridine, N,N - An organic base such as dimethylaminopyridine. Additionally, this reaction is usually performed in a solvent such as dichloromethane, chloroform, ethyl acetate, dioxane, tetrahydrofuran, ethyl ether, benzene, toluene, xylene, acetone, acetonitrile, water, pyridine, N,N-dimethylformamide, dimethyl sulfoxide, etc. be exposed.
【0014】次いで、化5の化合物を硝酸または硝酸塩
を用いてニトロ化することにより、式Next, by nitrating the compound of formula 5 using nitric acid or a nitrate, the compound of formula
【化6】 (化6中、Ra、Rb及びReは前記と同意義である。 )で示される本発明の化合物を得ることができる。[C6] (In Chemical Formula 6, Ra, Rb and Re have the same meanings as above. ) can be obtained.
【0015】本反応における硝酸塩とは、硝酸ナトリウ
ム、硝酸カリウム、硝酸鉄、硝酸ウレアなどである。反
応は無溶媒であるか、または酢酸、無水酢酸、トリフル
オロ酢酸、硫酸、ジクロロメタン、クロロホルム、ベン
ゼン、ジオキサン、メタノール、エタノール、プロパノ
ールなどを溶媒として用いて行われる。The nitrates used in this reaction include sodium nitrate, potassium nitrate, iron nitrate, and urea nitrate. The reaction is carried out without a solvent or using acetic acid, acetic anhydride, trifluoroacetic acid, sulfuric acid, dichloromethane, chloroform, benzene, dioxane, methanol, ethanol, propanol, etc. as a solvent.
【0016】(2) Rcがフッ素原子である化2の
化合物は、2,5−ジフルオロニトロベンゼンを出発原
料として用い、前記(1)と同様にして、式(2) The compound of formula 2 in which Rc is a fluorine atom can be prepared by using 2,5-difluoronitrobenzene as a starting material in the same manner as in (1) above.
【化7】[C7]
【0017】(化7中、Ra及びPbは前記と同意義で
ある。)で示される本発明の化合物を得ることができる
。The compound of the present invention represented by the formula (in formula 7, Ra and Pb have the same meanings as above) can be obtained.
【0018】(3) RcがRf(Rfは塩素原子、
臭素原子、ヨウ素原子、水酸基、低級アルコキシ基、フ
ェノキシ基、低級アルカノイルオキシ基、低級アルキル
チオ基、フェニルチオ基または低級アルコキシカルボニ
ルメチルチオ基である。)で示される基である化2の化
合物は、前記(2)で得た化7の化合物を出発原料とし
て得ることができる。すなわち、化7の化合物を式Rf
−H(式中、Rfは前記と同意義である。)と置換反応
を行なうことにより、式(3) Rc is Rf (Rf is a chlorine atom,
A bromine atom, an iodine atom, a hydroxyl group, a lower alkoxy group, a phenoxy group, a lower alkanoyloxy group, a lower alkylthio group, a phenylthio group or a lower alkoxycarbonylmethylthio group. ) The compound represented by formula 2 can be obtained using the compound represented by formula 7 obtained in (2) above as a starting material. That is, the compound of formula 7 is expressed as formula Rf
-H (wherein, Rf has the same meaning as above), the formula
【化8】[Chemical formula 8]
【0019】(化8中、Ra、Rb及びRfは前記と同
意義である。)で示される本発明の化合物を得ることが
できる。The compound of the present invention represented by the formula (in formula 8, Ra, Rb and Rf have the same meanings as above) can be obtained.
【0020】本反応は塩基存在下で行なうのが好ましく
、ここで用いられる塩基とは水酸化リチウム、水酸化ナ
トリウム、水酸化カリウムなどのアルカリ金属水酸化物
、水素化ナトリウム、水素化カリウムなどのアルカリ金
属水素化物、炭酸リチウム、炭酸ナトリウム、炭酸カリ
ウムなどのアルカリ金属炭酸塩、炭酸水素リチウム、炭
酸水素ナトリウム、炭酸水素カリウムなどのアルカリ金
属炭酸水素塩、金属リチウム、金属ナトリウム、金属カ
リウム、ナトリウムアミド、などの無機塩基またはトリ
エチルアミン、1−メチルモルホリン、1−メチルピペ
リジン、ピリジン、N,N−ジメチルアミノピリジンな
どの有機塩基である。本反応は、無溶媒または水、ジオ
キサン、テトラヒドロフラン、エチルエーテル、石油エ
ーテル、ヘキサン、シクロヘキサン、ベンゼン、トルエ
ン、キシレン、ピリジン、N,N−ジメチルホルムアミ
ド、ジメチルスルホキシド、アセトニトリル、ジクロロ
メタン、クロロホルムなどの溶媒中で行なうことができ
る。また、本反応においては、ヨウ化カリウム、ベンジ
ルトリエチルアンモニウムクロリドなどの4級アンモニ
ウム塩、18−クラウン−6 エーテルなどのクラウ
ンエーテルなどを加えることにより反応を加速すること
もできる。This reaction is preferably carried out in the presence of a base, and the base used here is an alkali metal hydroxide such as lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium hydride, potassium hydride, etc. Alkali metal hydrides, alkali metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate, alkali metal bicarbonates such as lithium bicarbonate, sodium bicarbonate, potassium bicarbonate, lithium metal, sodium metal, potassium metal, sodium amide , or organic bases such as triethylamine, 1-methylmorpholine, 1-methylpiperidine, pyridine, N,N-dimethylaminopyridine. This reaction can be carried out without a solvent or in a solvent such as water, dioxane, tetrahydrofuran, ethyl ether, petroleum ether, hexane, cyclohexane, benzene, toluene, xylene, pyridine, N,N-dimethylformamide, dimethyl sulfoxide, acetonitrile, dichloromethane, chloroform, etc. It can be done with Further, in this reaction, the reaction can be accelerated by adding potassium iodide, a quaternary ammonium salt such as benzyltriethylammonium chloride, a crown ether such as 18-crown-6 ether, or the like.
【0021】(4)Rcが式−CH2Rg(式中、Rg
は水酸基、低級アルコキシ基、フェノキシ基、低級アル
カノイルオキシ基、低級アルキルチオ基、フェニルチオ
基または1個または2個の低級アルキル基が置換したア
ミノ基である。)で示される基である化2の化合物は、
前記(1)のReがメチル基である化6の化合物の合成
中間体を出発原料として得ることができる。すなわち、
Reがメチル基である化4の化合物をハロゲン化して得
られる、式(4) Rc is of the formula -CH2Rg (in the formula, Rg
is a hydroxyl group, a lower alkoxy group, a phenoxy group, a lower alkanoyloxy group, a lower alkylthio group, a phenylthio group, or an amino group substituted with one or two lower alkyl groups. ) The compound of chemical formula 2 is a group represented by
A synthetic intermediate of the compound of formula 6 in which Re in (1) above is a methyl group can be obtained as a starting material. That is,
The formula obtained by halogenating the compound of formula 4 in which Re is a methyl group
【化9】[Chemical formula 9]
【0022】(化9中、Rbは前記と同意義であり、R
hはハロゲン原子である。)で示される化合物と式Rg
−H(式中、Rgは前記と同意義である。)で表わされ
る化合物またはその塩を反応させることにより、式(In formula 9, Rb has the same meaning as above, and R
h is a halogen atom. ) and the formula Rg
By reacting a compound represented by -H (wherein Rg has the same meaning as above) or a salt thereof, a compound represented by the formula
【化
10】[Chemical formula 10]
【0023】(化10中、Rb及びRgは前記と同意義
である。)で示される化合物を得ることができる。A compound represented by the formula (in formula 10, Rb and Rg have the same meanings as above) can be obtained.
【0024】本反応におけるハロゲン化とは、N−ブロ
ムコハク酸イミドなどのハロゲン化剤を用いた通常のベ
ンジル位のハロゲン化反応である。また、化9の化合物
と式Rg−H(式中、Rgは前記と同意義である。)で
表わされる化合物との反応では塩基存在下で行なうのが
好ましく、ここで用いられる塩基とは、水酸化リチウム
、水酸化ナトリウム、水酸化カリウムなどのアルカリ金
属水酸化物、水素化ナトリウム、水素化カリウムなどの
アルカリ金属水素化物、炭酸リチウム、炭酸ナトリウム
、炭酸カリウムなどのアルカリ金属炭酸塩、炭酸水素リ
チウム、炭酸水素ナトリウム、炭酸水素カリウムなどの
アルカリ金属炭酸水素塩、金属リチウム、金属ナトリウ
ム、金属カリウム、ナトリウムアミドなどの無機塩基ま
たはトリエチルアミン、1−メチルモルホリン、1−メ
チルピペリジン、ピリジン、N,N−ジメチルアミノピ
リジンなどの有機塩基である。本反応は、無溶媒または
水、ジオキサン、テトラヒドロフラン、エチルエーテル
、石油エーテル、ヘキサン、シクロヘキサン、ベンゼン
、トルエン、キシレン、ピリジン、N,N−ジメチルホ
ルムアミド、ジメチルスルホキシド、アセトニトリル、
ジクロロメタン、クロロホルムなどの溶媒中で行なうこ
とができる。また、本反応においては、ヨウ化カリウム
、ベンジルトリエチルアンモニウムクロリドなどの4級
アンモニウム塩、18−クラウン−6エーテルなどのク
ラウンエーテルなどを加えることにより反応を加速する
こともできる。The halogenation in this reaction is a conventional halogenation reaction at the benzyl position using a halogenating agent such as N-bromosuccinimide. In addition, the reaction between the compound of Chemical Formula 9 and the compound represented by the formula Rg-H (wherein Rg has the same meaning as above) is preferably carried out in the presence of a base, and the base used here is: Alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; alkali metal hydrides such as sodium hydride and potassium hydride; alkali metal carbonates such as lithium carbonate, sodium carbonate, and potassium carbonate; and hydrogen carbonate. Alkali metal bicarbonates such as lithium, sodium bicarbonate, potassium bicarbonate, inorganic bases such as lithium metal, sodium metal, potassium metal, sodium amide, or triethylamine, 1-methylmorpholine, 1-methylpiperidine, pyridine, N,N - An organic base such as dimethylaminopyridine. This reaction can be carried out without solvent or with water, dioxane, tetrahydrofuran, ethyl ether, petroleum ether, hexane, cyclohexane, benzene, toluene, xylene, pyridine, N,N-dimethylformamide, dimethyl sulfoxide, acetonitrile,
This can be carried out in a solvent such as dichloromethane or chloroform. Further, in this reaction, the reaction can be accelerated by adding potassium iodide, a quaternary ammonium salt such as benzyltriethylammonium chloride, a crown ether such as 18-crown-6 ether, and the like.
【0025】次いで、化10の化合物を前記(1)の方
法で還元、スルホンアミド化及びニトロ化を順に行ない
、式Next, the compound of formula 10 was reduced, sulfonamidated, and nitrated in order by the method (1) above to obtain the compound of formula
【化11】[Chemical formula 11]
【0026】(化11中、Ra、Rb及びRgは前記と
同意義である。)で示される本発明の化合物を得ること
ができる。The compound of the present invention represented by the formula (in formula 11, Ra, Rb and Rg have the same meanings as above) can be obtained.
【0027】(5)Rcが式−CH2CH2CO2Ri
(式中、Ri低級アルキル基である。)で示される基で
ある化2の化合物は、前記(4)の化10の化合物を出
発原料として得ることができる。すなわち、化10の化
合物と式CH2(CO2Ri)2(式中、Riは前記と
同意義である。)で示される化合物と反応させることに
より、式(5) Rc is the formula -CH2CH2CO2Ri
(In the formula, Ri is a lower alkyl group.) The compound represented by Chemical Formula 2 can be obtained using the compound represented by Chemical Formula 10 in (4) above as a starting material. That is, by reacting the compound of formula 10 with a compound of the formula CH2(CO2Ri)2 (wherein Ri has the same meaning as above), the compound of the formula
【化12】[Chemical formula 12]
【0028】(化12中、Rb及びRiは前記と同意義
である。)で示される化合物を得ることができる。A compound represented by the formula (in formula 12, Rb and Ri have the same meanings as above) can be obtained.
【0029】次いで、化12の化合物を脱アルコキシカ
ルボニル化した後、前記(1)の方法で還元、スルホン
アミド化及びニトロ化を順に行ない、式Next, after dealkoxycarbonylating the compound of formula 12, reduction, sulfonamidation, and nitration are sequentially performed by the method (1) above to obtain the compound of formula
【化13】[Chemical formula 13]
【0030】(化13中、Ra、Rb及びRiは前記と
同意義である。)で示される本発明の化合物を得ること
ができる。The compound of the present invention represented by the formula (in formula 13, Ra, Rb and Ri have the same meanings as above) can be obtained.
【0031】本脱アルコキシカルボニル化反応はジメチ
ルスルホキシド或はN,N−ジメチルホルムアミドなど
の非プロトン性極牲溶媒と水を用い、一般的には無機塩
、たとえば、塩化ナトリウム、塩化リチウム、塩化マグ
ネシウム、臭化ナトリウム、臭化リチウム、臭化マグネ
シウムなどを加えて反応させる。This dealkoxycarbonylation reaction uses an aprotic polar solvent such as dimethyl sulfoxide or N,N-dimethylformamide and water, and generally uses an inorganic salt such as sodium chloride, lithium chloride, magnesium chloride. , sodium bromide, lithium bromide, magnesium bromide, etc. are added and reacted.
【0032】(6)Rcが式−CH2CH2CO2Hで
ある化2の化合物は、前記の化13の化合物を加水分解
することにより得ることができる。(6) The compound of formula 2 in which Rc is the formula -CH2CH2CO2H can be obtained by hydrolyzing the compound of formula 13 above.
【0033】本反応における加水分解とは、酸性条件ま
たは塩基性条件における通常の加水分解方法、たとえば
、塩基性条件としては水酸化ナトリウム、水酸化カリウ
ム、炭酸ナトリウム、炭酸カリウムなどの塩基を用いる
方法、酸性条件としては塩酸、臭化水素酸、硫酸などの
酸を用いる方法である。ここで用いられる溶媒は任意に
選択されるが、一般的には水、メタノール、エタノール
、テトラヒドロフラン、ジオキサン、ベンゼン、トルエ
ン、蟻酸、酢酸などである。Hydrolysis in this reaction refers to a conventional hydrolysis method under acidic conditions or basic conditions, for example, a method using a base such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, etc. as basic conditions. This method uses an acid such as hydrochloric acid, hydrobromic acid, or sulfuric acid as the acidic condition. The solvent used here is arbitrarily selected, but generally includes water, methanol, ethanol, tetrahydrofuran, dioxane, benzene, toluene, formic acid, acetic acid, and the like.
【0034】(7)Rcが式−(CH2)mOH(式中
、mは0または1の整数である。)で示される基である
化2の化合物は、前記(3)で得られるRfが低級アル
カノイルオキシ基の化合物、または(4)で得られるR
gが低級アルカノイルオキシ基の化合物を前記(6)の
方法で加水分解することにより得ることができる。(7) In the compound of formula 2, in which Rc is a group represented by the formula -(CH2)mOH (wherein m is an integer of 0 or 1), Rf obtained in the above (3) is A compound with a lower alkanoyloxy group, or R obtained in (4)
It can be obtained by hydrolyzing a compound in which g is a lower alkanoyloxy group by the method (6) above.
【0035】(8)Rcが式−(CH2)mS(O)n
Rj(式中、mは前記と同意義であり、nは1または2
の整数であり、Rjは低級アルキル基、低級アルコキシ
カルボニルメチル基またはフェニル基である。)で示さ
れる基である化2の化合物は、前記(3)或は(4)で
得られる、式(8) Rc has the formula -(CH2)mS(O)n
Rj (where m has the same meaning as above, and n is 1 or 2
Rj is an integer of , and Rj is a lower alkyl group, a lower alkoxycarbonylmethyl group, or a phenyl group. ) is a group represented by formula 2, which is obtained by the above (3) or (4).
【化14】[Chemical formula 14]
【0036】(化14中、Ra、Rb、Rj及びmは前
記と同意義である。)で示される化合物を出発原料とし
て得ることができる。すなわち、化14の化合物をスル
フィドをスルホキシドまたはスルホンに変換する通常の
酸化方法(たとえば、過酸化水素、過酢酸、m−クロロ
過安息香酸、過マンガン酸カリウム、過ヨウ素酸ナトリ
ウムなどを用いる方法)で酸化することにより得ること
ができる。A compound represented by the formula (in formula 14, Ra, Rb, Rj and m have the same meanings as above) can be obtained as a starting material. That is, the usual oxidation method of converting the sulfide into a sulfoxide or sulfone in the compound of Chemical Formula 14 (for example, a method using hydrogen peroxide, peracetic acid, m-chloroperbenzoic acid, potassium permanganate, sodium periodate, etc.) It can be obtained by oxidizing with
【0037】(9)化2の化合物の製薬学的に許容され
る塩は、化2の化合物を水または有機溶媒中、塩基で処
理することにより得ることができる。ここで塩基とは、
水酸化リチウム、水酸化ナトリウム、水酸化カリウムな
どのアルカリ金属水酸化物、ナトリウムメトキシド、ナ
トリウムエトキシド、t−ブトキシカリウムなどのアル
コラート、トリエチルアミン、エタノールアミンなどの
有機アミンである。(9) A pharmaceutically acceptable salt of the compound of formula 2 can be obtained by treating the compound of formula 2 with a base in water or an organic solvent. Here, the base is
These include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; alcoholates such as sodium methoxide, sodium ethoxide, and potassium t-butoxy; and organic amines such as triethylamine and ethanolamine.
【0038】[0038]
【発明の効果】本発明の化合物は、抗炎症、解熱、鎮痛
及び抗アレルギー作用などを示し、消化管障害などの副
作用が少ないため抗炎症剤、解熱剤、鎮痛剤及び抗アレ
ルギー剤として有用である。[Effects of the Invention] The compounds of the present invention exhibit anti-inflammatory, antipyretic, analgesic, and antiallergic effects, and have few side effects such as gastrointestinal disorders, so they are useful as antiinflammatory agents, antipyretics, analgesics, and antiallergic agents. .
【0039】この目的のために、この化合物は経口また
は非経口的に慣用の投与剤型で投与することができる。
これらは、例えば錠剤、粉剤、顆粒剤、散剤、カプセル
剤、液剤、乳剤、懸濁剤、注射剤などであり、いずれも
通常の製剤技術で製造することができる。人に対して抗
炎症剤、解熱剤、鎮痛剤として用いる場合、その投与量
は、年齢、体重、症状、投与経路、投与回数などによっ
て異なるが、通常1日当り20〜1000mgである。For this purpose, the compounds can be administered orally or parenterally in the customary dosage forms. These include, for example, tablets, powders, granules, powders, capsules, liquids, emulsions, suspensions, injections, etc., and any of them can be manufactured using conventional formulation techniques. When used as an anti-inflammatory agent, antipyretic, or analgesic for humans, the dosage varies depending on age, body weight, symptoms, route of administration, frequency of administration, etc., but is usually 20 to 1000 mg per day.
【0040】[0040]
【実施例】次に、実施例を挙げ本発明化合物の製造方法
を詳細に説明する。
実施例1
(1)粉末化した水酸化ナトリウム32.2g及びシク
ロヘキサノール24.2gを含むシクロヘキサン375
ml懸濁液に、氷冷下、4−フルオロ−3−ニトロトル
エン25.0gを加え、室温で20時間攪拌した。反応
液に水を加え、シクロヘキサンで抽出し、有機層を水で
洗浄後、無水硫酸マグネシウムで乾燥した。溶媒を留去
して得られた粗結晶をn−ヘキサンで再結晶して4−シ
クロヘキシルオキシ−3−ニトロトルエン28.3gを
得た。
m.p.61〜62℃[Example] Next, the method for producing the compound of the present invention will be explained in detail with reference to Examples. Example 1 (1) 375 cyclohexane containing 32.2 g of powdered sodium hydroxide and 24.2 g of cyclohexanol
25.0 g of 4-fluoro-3-nitrotoluene was added to the ml suspension under ice cooling, and the mixture was stirred at room temperature for 20 hours. Water was added to the reaction solution, extracted with cyclohexane, and the organic layer was washed with water and dried over anhydrous magnesium sulfate. The crude crystals obtained by distilling off the solvent were recrystallized from n-hexane to obtain 28.3 g of 4-cyclohexyloxy-3-nitrotoluene. m. p. 61-62℃
【0041】(2)4−シクロヘキシルオキシ−3−ニ
トロトルエン5.0g及び5%パラジウム−炭素0.2
5gを含むエタノール22ml溶液を水素雰囲気下、室
温で攪拌し、接触還元した。パラジウム−炭素を濾去後
、濾液を留去して無色針状晶の2−シクロヘキシルオキ
シ−5−メチルアニリン4.2gを得た。
m.p.30〜31℃(2) 5.0 g of 4-cyclohexyloxy-3-nitrotoluene and 0.2 g of 5% palladium-carbon
A 22 ml ethanol solution containing 5 g was stirred at room temperature under a hydrogen atmosphere for catalytic reduction. After removing the palladium-carbon by filtration, the filtrate was distilled off to obtain 4.2 g of 2-cyclohexyloxy-5-methylaniline in the form of colorless needles. m. p. 30-31℃
【0042】(3)2−シクロヘキシルオキシ−5−メ
チルアニリン4.0gを含むピリジン20ml溶液に、
氷冷下、メタンスルホニルクロリド2.7gを3分間か
けて加え、更に室温で16時間攪拌した。反応液に水を
加え、酢酸エチルで抽出し、有機層を水、3規定塩酸、
水、飽和食塩水の順で洗浄後、無水硫酸マグネシウムで
乾燥した。溶媒を留去後、残渣をエタノール−n−ヘキ
サンで再結晶して無色結晶のN−(2−シクロヘキシル
オキシ−5−メチルフェニル)メタンスルホンアミド4
.8gを得た。
m.p.116〜118℃(3) Into 20 ml of pyridine solution containing 4.0 g of 2-cyclohexyloxy-5-methylaniline,
Under ice cooling, 2.7 g of methanesulfonyl chloride was added over 3 minutes, and the mixture was further stirred at room temperature for 16 hours. Water was added to the reaction solution, extracted with ethyl acetate, and the organic layer was mixed with water, 3N hydrochloric acid,
After washing with water and saturated saline in that order, it was dried over anhydrous magnesium sulfate. After distilling off the solvent, the residue was recrystallized from ethanol-n-hexane to give colorless crystals of N-(2-cyclohexyloxy-5-methylphenyl)methanesulfonamide 4.
.. 8g was obtained. m. p. 116-118℃
【0043】(4)N−(2−シクロヘキシルオキシ−
5−メチルフェニル)メタンスルホンアミド1.0gを
含む酢酸3.5ml溶液に、80℃で加熱攪拌下、60
%硝酸0.40gを加え、更に20分間攪拌した。反応
液を室温に戻し、飽和炭酸水素ナトリウム水溶液を加え
中和し、酢酸エチルで抽出した。有機層を水、飽和食塩
水の順で洗浄後、無水硫酸マグネシウムで乾燥し、溶媒
を留去後、残渣をエタノール−n−ヘキサンで再結晶し
て黄色結晶のN−(2−シクロヘキシルオキシ−5−メ
チル−4−ニトロフェニル)メタンスルホンアミド0.
77gを得た。
m.p.119〜121℃(4) N-(2-cyclohexyloxy-
To 3.5 ml of acetic acid solution containing 1.0 g of 5-methylphenyl)methanesulfonamide was heated at 80°C with stirring for 60 min.
% nitric acid was added and further stirred for 20 minutes. The reaction solution was returned to room temperature, neutralized by adding a saturated aqueous sodium bicarbonate solution, and extracted with ethyl acetate. The organic layer was washed with water and saturated brine in that order, dried over anhydrous magnesium sulfate, the solvent was distilled off, and the residue was recrystallized from ethanol-n-hexane to give yellow crystals of N-(2-cyclohexyloxy- 5-Methyl-4-nitrophenyl)methanesulfonamide 0.
77g was obtained. m. p. 119-121℃
【0044】実施例2
2,5−ジフルオロ−ニトロベンゼンを用い、実施例1
と同様にして下記の化合物を得た。
N−(2−シクロヘキシルオキシ−5−フルオロ−4−
ニトロフェニル)メタンスルホンアミドm.p.147
〜148℃(エタノールから再結晶、以下、融点の数値
の次の括弧内の溶媒名は、その溶媒から再結晶したこと
を示す。)Example 2 Using 2,5-difluoro-nitrobenzene, Example 1
The following compound was obtained in the same manner as above. N-(2-cyclohexyloxy-5-fluoro-4-
nitrophenyl) methanesulfonamide m. p. 147
~148°C (Recrystallized from ethanol; hereinafter, the solvent name in parentheses next to the melting point value indicates that it was recrystallized from that solvent.)
【0045】実施例3
実施例2で得たN−(2−シクロヘキシルオキシ−5−
フルオロ−4−ニトロフェニル)メタンスルホンアミド
0.75gを含むテトラヒドロフラン1.2ml溶液に
、室温下、20%水酸化ナトリウム3.0ml水溶液を
加え、2時間還流した。反応液を室温に戻し、水を加え
、ジクロロメタンで水層を洗浄後、3規定塩酸を加えて
酸性とし、酢酸エチルで抽出した。有機層を水、飽和食
塩水の順で洗浄し、無水硫酸マグネシウムで乾燥した。
溶媒を留去後、残渣をエタノール−n−ヘキサンで再結
晶して淡黄色針状晶のN−(2−シクロヘキシルオキシ
ー5−ヒドロキシ−4−ニトロフェニル)メタンスルホ
ンアミド0.64gを得た。
m.p.133〜134℃Example 3 N-(2-cyclohexyloxy-5-
To a 1.2 ml solution of tetrahydrofuran containing 0.75 g of fluoro-4-nitrophenyl)methanesulfonamide, 3.0 ml of a 20% aqueous sodium hydroxide solution was added at room temperature, and the mixture was refluxed for 2 hours. The reaction solution was returned to room temperature, water was added, and the aqueous layer was washed with dichloromethane, made acidic by adding 3N hydrochloric acid, and extracted with ethyl acetate. The organic layer was washed with water and saturated brine in that order, and dried over anhydrous magnesium sulfate. After evaporating the solvent, the residue was recrystallized from ethanol-n-hexane to obtain 0.64 g of N-(2-cyclohexyloxy-5-hydroxy-4-nitrophenyl)methanesulfonamide in the form of pale yellow needles. m. p. 133-134℃
【0046】実施例4
実施例2で得たN−(2−シクロヘキシルオキシ−5−
フルオロ−4−ニトロフェニル)メタンスルホンアミド
0.75gを含むテトラヒドロフラン4.5ml溶液に
ナトリウムメトキシド0.74gを加え、1.5時間還
流した。反応液を室温に戻し、3規定塩酸を加え酸性と
し、酢酸エチルで抽出後、有機層を水、飽和食塩水の順
で洗浄し、無水硫酸マグネシウムで乾燥した。溶媒を留
去後、残渣をエタノール−n−ヘキサンで再結晶して淡
黄色針状晶のN−(2−シクロヘキシルオキシ−5−メ
トキシ−4−ニトロフェニル)メタンスルホンアミド0
.70gを得た。
m.p.121.5〜123℃
実施例4と同様にして下記の化合物を得た。
N−[2−シクロヘキシルオキシ−5−(t−ブトキシ
)−4−ニトロフェニル]メタンスルホンアミドm.p
.112〜113℃(エタノール−n−ヘキサン)Example 4 N-(2-cyclohexyloxy-5-
0.74 g of sodium methoxide was added to 4.5 ml of tetrahydrofuran solution containing 0.75 g of fluoro-4-nitrophenyl)methanesulfonamide, and the mixture was refluxed for 1.5 hours. The reaction solution was returned to room temperature, acidified with 3N hydrochloric acid, extracted with ethyl acetate, and the organic layer was washed with water and saturated brine in that order, and dried over anhydrous magnesium sulfate. After evaporating the solvent, the residue was recrystallized from ethanol-n-hexane to give N-(2-cyclohexyloxy-5-methoxy-4-nitrophenyl)methanesulfonamide in the form of pale yellow needles.
.. 70g was obtained. m. p. 121.5-123°C The following compound was obtained in the same manner as in Example 4. N-[2-cyclohexyloxy-5-(t-butoxy)-4-nitrophenyl]methanesulfonamide m. p
.. 112-113°C (ethanol-n-hexane)
【0047】実施例5
実施例2で得たN−(2−シクロヘキシルオキシ−5−
フルオロ−4−ニトロフェニル)メタンスルホンアミド
0.53gを含むテトラヒドロフラン5.0ml溶液に
15%メチルメルカプタンナトリウム水溶液1.5ml
を加え、3時間還流した。反応液を室温に戻し、酢酸エ
チルで抽出後、有機層を水、飽和食塩水の順で洗浄し、
無水硫酸マグネシウムで乾燥した。溶媒を留去後、残渣
をエタノール−酢酸エチルで再結晶して淡黄色針状晶の
N−(2−シクロヘキシルオキシ−5−メチルチオ−4
−ニトロフェニル)メタンスルホンアミド0.40gを
得た。
m.p.178〜179℃Example 5 N-(2-cyclohexyloxy-5-
Add 1.5 ml of a 15% aqueous sodium methyl mercaptan solution to 5.0 ml of tetrahydrofuran solution containing 0.53 g of fluoro-4-nitrophenyl)methanesulfonamide.
was added and refluxed for 3 hours. The reaction solution was returned to room temperature, extracted with ethyl acetate, and the organic layer was washed with water and saturated brine in that order.
It was dried with anhydrous magnesium sulfate. After evaporating the solvent, the residue was recrystallized from ethanol-ethyl acetate to give pale yellow needle-like crystals of N-(2-cyclohexyloxy-5-methylthio-4
-nitrophenyl)methanesulfonamide 0.40 g was obtained. m. p. 178-179℃
【0048】実施例6
実施例2で得たN−(2−シクロヘキシルオキシ−5−
フルオロ−4−ニトロフェニル)メタンスルホンアミド
0.58g、チオフェノール0.19g、炭酸ナトリウ
ム0.37gを含むテトラヒドロフラン3.0ml溶液
を3時間還流した。反応液を室温に戻し、酢酸エチルで
抽出後、有機層を水、飽和食塩水の順で洗浄し、無水硫
酸マグネシウムで乾燥した。溶媒を留去後、残渣をエタ
ノールで再結晶して淡黄色針状晶のN−(2−シクロヘ
キシルオキシ−4−ニトロ−5−フェニルチオフェニル
)メタンスルホンアミド0.53gを得た。
m.p.182〜183℃Example 6 N-(2-cyclohexyloxy-5-
A 3.0 ml solution of tetrahydrofuran containing 0.58 g of fluoro-4-nitrophenyl)methanesulfonamide, 0.19 g of thiophenol, and 0.37 g of sodium carbonate was refluxed for 3 hours. The reaction solution was returned to room temperature, extracted with ethyl acetate, and the organic layer was sequentially washed with water and saturated brine, and dried over anhydrous magnesium sulfate. After distilling off the solvent, the residue was recrystallized from ethanol to obtain 0.53 g of N-(2-cyclohexyloxy-4-nitro-5-phenylthiophenyl)methanesulfonamide in the form of pale yellow needles. m. p. 182-183℃
【0049】実施例6と同様にして下記の化合物を得た
。
N−(2−シクロヘキシルオキシ−5−エトキシカルボ
ニルメチルチオ−4−ニトロフェニル)メタンスルホン
アミド
m.p.130〜131℃(エタノール)The following compound was obtained in the same manner as in Example 6. N-(2-cyclohexyloxy-5-ethoxycarbonylmethylthio-4-nitrophenyl)methanesulfonamide m. p. 130-131℃ (ethanol)
【0050】
実施例7
(1)実施例1(2)の方法で得た4−シクロヘキシル
オキシ−3−ニトロトルエン25.0g、N−ブロモコ
ハク酸イミド28.4g、過酸化ベンゾイル0.5gを
含む四塩化炭素106ml溶液を16.5時間還流後、
反応液を室温に戻し、析出物を濾去した。濾液を水、飽
和炭酸水素ナトリウム水溶液、飽和食塩水の順で洗浄後
、無水硫酸マグネシウムで乾燥した。溶媒を留去後、残
渣をシリカゲルカラムクロマトグラフィー(展開溶媒;
n−ヘキサン:酢酸エチル=40:1)で精製し、黄色
油状の4−シクロヘキシルオキシ−3−ニトロベンジル
ブロミド22.6gを得た。
1H−NMR(CDCl3)δ(ppm);1.20〜
2.15(10H,m)
4.46(3H,m)
7.05(1H,d,J=7Hz)
7.51(1H,dd,J=2,7Hz)7.83(1
H,d,J=2Hz)[0050]
Example 7 (1) 106 ml of carbon tetrachloride containing 25.0 g of 4-cyclohexyloxy-3-nitrotoluene obtained by the method of Example 1 (2), 28.4 g of N-bromosuccinimide, and 0.5 g of benzoyl peroxide. After refluxing the solution for 16.5 hours,
The reaction solution was returned to room temperature, and the precipitate was filtered off. The filtrate was washed with water, saturated aqueous sodium bicarbonate solution, and saturated brine in this order, and then dried over anhydrous magnesium sulfate. After distilling off the solvent, the residue was subjected to silica gel column chromatography (developing solvent;
n-hexane:ethyl acetate=40:1) to obtain 22.6 g of 4-cyclohexyloxy-3-nitrobenzyl bromide as a yellow oil. 1H-NMR (CDCl3) δ (ppm); 1.20~
2.15 (10H, m) 4.46 (3H, m) 7.05 (1H, d, J = 7Hz) 7.51 (1H, dd, J = 2,7Hz) 7.83 (1
H, d, J=2Hz)
【0051】(2)4−シクロヘキシルオキシ−3−ニ
トロベンジルブロミド2.1g、ナトリウムメトキシド
0.72gを含むメタノール6.6ml溶液を1時間還
流後、室温に戻し、酢酸エチルで抽出した。有機層を水
、飽和食塩水の順で洗浄後、無水硫酸マグネシウムで乾
燥した。溶媒を留去後、残渣をシリカゲルカラムクロマ
トグラフィー(展開溶媒;n−ヘキサン:酢酸エチル=
10:1)で精製して黄色油状の2−シクロヘキシルオ
キシ−5−メトキシメチルニトロベンゼン1.6gを得
た。
1H−NMR(CDCl3)δ(ppm);1.27〜
2.04(10H,m)
3.39(3H,s)
4.40(2H,s)
4.44(1H,m)
7.07(1H,d,J=7Hz)
7.45(1H,dd,J=2,7Hz)7.76(1
H,d,J=2Hz)(2) A 6.6 ml methanol solution containing 2.1 g of 4-cyclohexyloxy-3-nitrobenzyl bromide and 0.72 g of sodium methoxide was refluxed for 1 hour, then returned to room temperature and extracted with ethyl acetate. The organic layer was washed with water and saturated brine in that order, and then dried over anhydrous magnesium sulfate. After distilling off the solvent, the residue was subjected to silica gel column chromatography (developing solvent: n-hexane: ethyl acetate =
10:1) to obtain 1.6 g of 2-cyclohexyloxy-5-methoxymethylnitrobenzene as a yellow oil. 1H-NMR (CDCl3) δ (ppm); 1.27~
2.04 (10H, m) 3.39 (3H, s) 4.40 (2H, s) 4.44 (1H, m) 7.07 (1H, d, J=7Hz) 7.45 (1H, dd, J=2,7Hz)7.76(1
H, d, J=2Hz)
【0052】(3)2−シクロヘキシルオキシ−5−メ
トキシメチルニトロベンゼンを実施例1(2)〜(4)
と同様にしてN−(2−シクロヘキシルオキシ−5−メ
トキシメチル−4−ニトロフェニル)メタンスルホンア
ミドを得た。
m.p.109.5〜110.5℃(エタノール−n−
ヘキサン)(3) 2-Cyclohexyloxy-5-methoxymethylnitrobenzene in Example 1 (2) to (4)
In the same manner as above, N-(2-cyclohexyloxy-5-methoxymethyl-4-nitrophenyl)methanesulfonamide was obtained. m. p. 109.5-110.5°C (ethanol-n-
hexane)
【0053】実施例8
(1)60%水素化ナトリウム0.32gを含むテトラ
ヒドロフラン8ml懸濁液にフェノール0.75gを含
むテトラヒドロフラン8ml溶液を加え、室温で10分
間攪拌後、実施例7(1)の方法で得た4−シクロヘキ
シルオキシ−3−ニトロベンジルブロミド2.1gを含
むテトラヒドロフラン7ml溶液を加え、2.5時間還
流した。反応液を室温に戻し、酢酸エチルで抽出後、有
機層を水、飽和食塩水の順で洗浄し、無水硫酸マグネシ
ウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラ
ムクロマトグラフィー(展開溶媒;n−8キサン:ジク
ロロメタン:酢酸エチル=10:5:1)で精製して黄
色油状の2−シクロヘキシルオキシ−5−フェノキシメ
チルニトロベンゼン2.2gを得た。
1H−NMR(CDCl3)δ(ppm);1.19〜
2.09(10H,m)
4.45(1H,m)
5.00(2H,s)
6.90〜7.04(3H,m)
7.08(1H,d,J=7Hz)
7.30(2H,m)
7.55(1H,dd,J=1,7Hz)7.87(1
H,d,J=1Hz)Example 8 (1) 8 ml of tetrahydrofuran suspension containing 0.32 g of 60% sodium hydride was added with 8 ml of tetrahydrofuran solution containing 0.75 g of phenol, and after stirring at room temperature for 10 minutes, Example 7 (1) A 7 ml solution of tetrahydrofuran containing 2.1 g of 4-cyclohexyloxy-3-nitrobenzyl bromide obtained by the above method was added, and the mixture was refluxed for 2.5 hours. The reaction solution was returned to room temperature, extracted with ethyl acetate, and the organic layer was sequentially washed with water and saturated brine, and dried over anhydrous magnesium sulfate. After distilling off the solvent, the residue was purified by silica gel column chromatography (developing solvent: n-8 xane: dichloromethane: ethyl acetate = 10:5:1) to obtain 2-cyclohexyloxy-5-phenoxymethylnitrobenzene 2 as a yellow oil. .2g was obtained. 1H-NMR (CDCl3) δ (ppm); 1.19~
2.09 (10H, m) 4.45 (1H, m) 5.00 (2H, s) 6.90-7.04 (3H, m) 7.08 (1H, d, J=7Hz) 7. 30 (2H, m) 7.55 (1H, dd, J = 1,7Hz) 7.87 (1
H, d, J=1Hz)
【0054】(2)2−シクロヘキシルオキシ−5−フ
ェノキシメチルニトロベンゼンを実施例1(2)〜(4
)と同様にしてN−(2−シクロヘキシルオキシ−4−
ニトロ−5−フェノキシメチルフェニル)メタンスルホ
ンアミドを得た。
m.p.140〜142℃(エタノール−n−ヘキサン
)(2) 2-Cyclohexyloxy-5-phenoxymethylnitrobenzene in Example 1 (2) to (4)
) in the same manner as N-(2-cyclohexyloxy-4-
Nitro-5-phenoxymethylphenyl)methanesulfonamide was obtained. m. p. 140-142°C (ethanol-n-hexane)
【0055】実施例9
(1)実施例7(1)の方法で得た4−シクロヘキシル
オキシ−3−ニトロベンジルブロミドを用い実施例5の
方法と同様にして2−シクロヘキシルオキシ−5−メチ
ルチオメチルニトロベンゼンを得た。
1H−NMR(CDCl3)δ(ppm);1.30〜
2.10(10H,m)
2.01(3H,s)
3.64(2H,s)
4.42(1H,m)
7.03(1H,d,J=8Hz)
7.44(1H,dd,J=2,8Hz)7.81(1
H,d,J=2Hz)Example 9 (1) Using 4-cyclohexyloxy-3-nitrobenzyl bromide obtained by the method of Example 7 (1), 2-cyclohexyloxy-5-methylthiomethyl was prepared in the same manner as in Example 5. Nitrobenzene was obtained. 1H-NMR (CDCl3) δ (ppm); 1.30~
2.10 (10H, m) 2.01 (3H, s) 3.64 (2H, s) 4.42 (1H, m) 7.03 (1H, d, J=8Hz) 7.44 (1H, dd, J=2,8Hz)7.81(1
H, d, J=2Hz)
【0056】(2)2−シクロヘキシルオキシ−5−メ
チルチオメチルニトロベンゼンを実施例1(2)〜(4
)と同様にしてN−(2−シクロヘキシルオキシ−5−
メチルチオメチル−4−ニトロフェニル)メタンスルホ
ンアミドを得た。
m.p.102〜103℃(エタノール)(2) 2-Cyclohexyloxy-5-methylthiomethylnitrobenzene in Example 1 (2) to (4)
) in the same manner as N-(2-cyclohexyloxy-5-
Methylthiomethyl-4-nitrophenyl)methanesulfonamide was obtained. m. p. 102-103℃ (ethanol)
【0057】
実施例10
(1)実施例7(1)の方法で得た4−シクロヘキシル
オキシ−3−ニトロベンジルブロミド3.09、50%
ジメチルアミン1.8ml水溶液及び炭酸カリウム2.
8gを含むテトラヒドロフラン10ml懸濁液を3.5
時間還流した。反応液を室温に戻し、酢酸エチルで抽出
後、有機層を水、飽和食塩水の順で洗浄し、無水硫酸マ
グネシウムで乾燥した。溶媒を留去後、残渣をシリカゲ
ルカラムクロマトグラフィー(展開溶媒;n−ヘキサン
:酢酸エチル=1:2)で精製して黄色油状の2−シク
ロヘキシルオキシ−5−ジメチルアミノメチルニトロベ
ンゼン2.1gを得た。
1H−NMR(CDCl3)δ(ppm);1.30〜
2.00(10H,m)
2.27(6H,s)
3.41(2H,s)
4.41(1H,m)
7.03(1H,d,J=8Hz)
7.47(1H,dd,J=2,8Hz)7.71(1
H,d,J=2Hz)[0057]
Example 10 (1) 4-cyclohexyloxy-3-nitrobenzyl bromide obtained by the method of Example 7 (1) 3.09, 50%
1.8 ml of dimethylamine aqueous solution and potassium carbonate2.
3.5 ml of tetrahydrofuran suspension containing 8 g
Refluxed for an hour. The reaction solution was returned to room temperature, extracted with ethyl acetate, and the organic layer was sequentially washed with water and saturated brine, and dried over anhydrous magnesium sulfate. After evaporating the solvent, the residue was purified by silica gel column chromatography (developing solvent: n-hexane: ethyl acetate = 1:2) to obtain 2.1 g of 2-cyclohexyloxy-5-dimethylaminomethylnitrobenzene as a yellow oil. Ta. 1H-NMR (CDCl3) δ (ppm); 1.30~
2.00 (10H, m) 2.27 (6H, s) 3.41 (2H, s) 4.41 (1H, m) 7.03 (1H, d, J=8Hz) 7.47 (1H, dd, J=2,8Hz)7.71(1
H, d, J=2Hz)
【0058】(2)2−シクロヘキシルオキシ−5−ジ
メチルアミノメチルニトロベンゼンを実施例1(2)〜
(4)と同様にしてN−(2−シクロヘキシルオキシ−
5−ジメチルアミノメチル−4−ニトロフェニル)メタ
ンスルホンアミドを得た。
m.p.109〜110℃(エタノール)(2) 2-Cyclohexyloxy-5-dimethylaminomethylnitrobenzene from Example 1 (2) to
Similarly to (4), N-(2-cyclohexyloxy-
5-dimethylaminomethyl-4-nitrophenyl)methanesulfonamide was obtained. m. p. 109-110℃ (ethanol)
【0059】
実施例11
(1)実施例7(1)の方法で得た4−シクロヘキシル
オキシ−3−ニトロベンジルブロミド5.1g、酢酸ナ
トリウム1.6gを含む酢酸4.0ml溶液を1時間還
流後、溶媒を減圧下濃縮し、飽和炭酸水素ナトリウム水
溶液で中和し、酢酸エチルで抽出した。有機層を水、飽
和食塩水の順で洗浄後、残渣をシリカゲルカラムクロマ
トグラフィー(展開溶媒;n−ヘキサン:酢酸エチル=
5:1)で精製し、ジクロロメタン−n−ヘキサンで再
結晶して黄色結晶の5−アセトキシメチル−2−シクロ
ヘキシルオキシニトロベンゼン4.6gを得た。
m.p.54.5〜55.5℃[0059]
Example 11 (1) A 4.0 ml solution of acetic acid containing 5.1 g of 4-cyclohexyloxy-3-nitrobenzyl bromide obtained by the method of Example 7 (1) and 1.6 g of sodium acetate was refluxed for 1 hour, and then the solvent was concentrated under reduced pressure, neutralized with saturated aqueous sodium bicarbonate solution, and extracted with ethyl acetate. After washing the organic layer in the order of water and saturated brine, the residue was subjected to silica gel column chromatography (developing solvent: n-hexane: ethyl acetate =
5:1) and recrystallized from dichloromethane-n-hexane to obtain 4.6 g of 5-acetoxymethyl-2-cyclohexyloxynitrobenzene as yellow crystals. m. p. 54.5-55.5℃
【0060】(2)5−アセトキシメチル−2−シクロ
ヘキシルオキシニトロベンゼンを実施例1(2)〜(4
)と同様にしてN−(5−アセトキシメチル−2−シク
ロヘキシルオキシ−4−ニトロフェニル)メタンスルホ
ンアミドを得た。
m.p.120〜122℃(エタノール−n−ヘキサン
)(2) 5-acetoxymethyl-2-cyclohexyloxynitrobenzene in Example 1 (2) to (4)
) to obtain N-(5-acetoxymethyl-2-cyclohexyloxy-4-nitrophenyl)methanesulfonamide. m. p. 120-122°C (ethanol-n-hexane)
【0061】実施例12
(1)実施例7(1)の方法で得た4−シクロヘキシル
オキシ−3−ニトロベンジルブロミド9.0g、マロン
酸ジエチル4.6g、炭酸ナトリウム6.1g、テトラ
−n−ブチルアンモニウムブロミド0.18gの混合物
を110℃で6時間撹拌後、反応物を室温に戻し、水を
加え、酢酸エチルで抽出した。有機層を水、3規定塩酸
、水、飽和食塩水の順で洗浄し、無水硫酸マグネシウム
で乾燥した。溶媒を留去後、残渣をシリカゲルカラムク
ロマトグラフィー(展開溶媒;n−ヘキサン:酢酸エチ
ル=20:1)で精製し、淡黄色油状の3−(4−シク
ロヘキシルオキシ−3−ニトロフェニル)−2−エトキ
シカルボニルプロピオン酸エチル4.5gを得た。
1H−NMR(CDCl3)δ(ppm);1.23〜
2.00(10H,m)
1.23(6H,t,J=6Hz)
3.17(2H,d,J=6Hz)
3.60(1H,t,J=6Hz)
4.18(4H,q,J=6Hz)
4.40(1H,m)
6.99(1H,d,J=7Hz)
7.34(1H,dd,J=2,7Hz)7.65(1
H,d,J=2Hz)Example 12 (1) 9.0 g of 4-cyclohexyloxy-3-nitrobenzyl bromide obtained by the method of Example 7 (1), 4.6 g of diethyl malonate, 6.1 g of sodium carbonate, tetra-n After stirring a mixture of 0.18 g of -butylammonium bromide at 110°C for 6 hours, the reaction mixture was returned to room temperature, water was added, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with water, 3N hydrochloric acid, water, and saturated brine, and dried over anhydrous magnesium sulfate. After evaporating the solvent, the residue was purified by silica gel column chromatography (developing solvent: n-hexane:ethyl acetate = 20:1) to obtain 3-(4-cyclohexyloxy-3-nitrophenyl)-2 as a pale yellow oil. 4.5 g of ethyl -ethoxycarbonylpropionate was obtained. 1H-NMR (CDCl3) δ (ppm); 1.23~
2.00 (10H, m) 1.23 (6H, t, J = 6Hz) 3.17 (2H, d, J = 6Hz) 3.60 (1H, t, J = 6Hz) 4.18 (4H, q, J=6Hz) 4.40 (1H, m) 6.99 (1H, d, J=7Hz) 7.34 (1H, dd, J=2,7Hz) 7.65 (1
H, d, J=2Hz)
【0062】(2)3−(4−シクロヘキシルオキシ−
3−ニトロフェニル)−2−エトキシカルボニルプロピ
オン酸エチル4.5g、塩化ナトリウム0.67g、水
0.41gを含むジメチルスルホキシド11.4ml溶
液を170〜180℃で3時間攪拌後、反応液を室温に
戻し、酢酸エチルで抽出した。有機層を飽和食塩水で洗
浄後、無水硫酸マグネシウムで乾燥した。溶媒を留去後
、残渣をシリカゲルカラムクロマトグラフィー(展開溶
媒;n−ヘキサン:酢酸エチル=10:1)で精製し、
黄色油状の3−(4−シクロヘキシルオキシ−3−ニト
ロフェニル)プロピオン酸エチル2.9gを得た。
1H−NMR(CDCl3)δ(ppm);1.17〜
2.00(10H,m)
1.23(3H,t,J=7Hz)
2.61(2H,m)
2.93(2H,m)
4.13(2H,q,J=7Hz)
4.39(1H,m)
7.00(1H,d,J=8Hz)
7.32(1H,dd,J=2,8Hz)7.62(1
H,d,J=2Hz)(2) 3-(4-cyclohexyloxy-
After stirring 11.4 ml of dimethyl sulfoxide solution containing 4.5 g of ethyl 3-nitrophenyl)-2-ethoxycarbonylpropionate, 0.67 g of sodium chloride, and 0.41 g of water at 170 to 180°C for 3 hours, the reaction solution was cooled to room temperature. and extracted with ethyl acetate. The organic layer was washed with saturated brine and then dried over anhydrous magnesium sulfate. After distilling off the solvent, the residue was purified by silica gel column chromatography (developing solvent: n-hexane: ethyl acetate = 10:1),
2.9 g of ethyl 3-(4-cyclohexyloxy-3-nitrophenyl)propionate was obtained as a yellow oil. 1H-NMR (CDCl3) δ (ppm); 1.17~
2.00 (10H, m) 1.23 (3H, t, J=7Hz) 2.61 (2H, m) 2.93 (2H, m) 4.13 (2H, q, J=7Hz) 4. 39 (1H, m) 7.00 (1H, d, J = 8Hz) 7.32 (1H, dd, J = 2,8Hz) 7.62 (1
H, d, J=2Hz)
【0063】(3)3−(4−シクロヘキシルオキシ−
3−ニトロフェニル)プロピオン酸エチルを実施例1(
2)〜(4)と同様にしてN−[2−シクロヘキシルオ
キシ−5−(2−エトキシカルボニルエチル)−4−ニ
トロフェニル]メタンスルホンアミドを得た。
1H−NMR(CDCl3)δ(ppm);1.25(
3H,t,7Hz)
1.30〜2.12(10H,m)
2.70(3H,t,J=7Hz)
3.10(2H,s)
3.22(2H,t,J=7Hz)
4.14(4H,q,J=7Hz)
4.88(1H,m)
7.13(1H,br)
7.53(1H,s)
7.58(1H,s)(3) 3-(4-cyclohexyloxy-
Ethyl 3-nitrophenyl)propionate was prepared from Example 1 (
N-[2-cyclohexyloxy-5-(2-ethoxycarbonylethyl)-4-nitrophenyl]methanesulfonamide was obtained in the same manner as in 2) to (4). 1H-NMR (CDCl3) δ (ppm); 1.25 (
3H, t, 7Hz) 1.30-2.12 (10H, m) 2.70 (3H, t, J=7Hz) 3.10 (2H, s) 3.22 (2H, t, J=7Hz) 4.14 (4H, q, J=7Hz) 4.88 (1H, m) 7.13 (1H, br) 7.53 (1H, s) 7.58 (1H, s)
【0064】実施例13
実施例12の方法で得たN−[2−シクロヘキシルオキ
シ−5−(2−エトキシカルボニルエチル)−4−ニト
ロフェニル]メタンスルホンアミド0.84gを含むエ
タノール4ml溶液に室温で20%水酸化ナトリウム2
.0ml水溶液を加え、1時間攪拌した。反応液に3規
定塩酸を加え酸性とし、酢酸エチルで抽出した。有機層
を水、飽和食塩水の順で洗浄後、無水硫酸マグネシウム
で乾燥した。溶媒を留去後、残渣をエタノール−n−ヘ
キサンで再結晶し、黄色針状晶のN−[5−(2−カル
ボキシエチル)−2−シクロヘキシルオキシ−4−ニト
ロフェニル]メタンスルホンアミド0.58gを得た。
m.p.168.5〜170℃Example 13 A solution of 4 ml of ethanol containing 0.84 g of N-[2-cyclohexyloxy-5-(2-ethoxycarbonylethyl)-4-nitrophenyl]methanesulfonamide obtained by the method of Example 12 was added to a solution of 4 ml of ethanol at room temperature. 20% sodium hydroxide in 2
.. 0ml aqueous solution was added and stirred for 1 hour. The reaction solution was made acidic by adding 3N hydrochloric acid, and extracted with ethyl acetate. The organic layer was washed with water and saturated brine in that order, and then dried over anhydrous magnesium sulfate. After evaporating the solvent, the residue was recrystallized from ethanol-n-hexane to give yellow needle-like crystals of N-[5-(2-carboxyethyl)-2-cyclohexyloxy-4-nitrophenyl]methanesulfonamide. 58g was obtained. m. p. 168.5-170℃
【0065】実施例11の方法で得たN−(5−アセト
キシメチル−2−シクロヘキシルオキシ−4−ニトロフ
ェニル)メタンスルホンアミドを実施例13の方法で加
水分解してN−(2−シクロヘキシルオキシ−5−ヒド
ロキシメチル−4−ニトロフェニル)メタンスルホンア
ミドを得た。
m.p.115.5〜116.5℃(エタノール)N-(5-acetoxymethyl-2-cyclohexyloxy-4-nitrophenyl)methanesulfonamide obtained by the method of Example 11 was hydrolyzed by the method of Example 13 to obtain N-(2-cyclohexyloxy). -5-hydroxymethyl-4-nitrophenyl)methanesulfonamide was obtained. m. p. 115.5-116.5℃ (ethanol)
【0
066】実施例14
実施例5の方法で得たN−(2−シクロヘキシルオキシ
−5−メチルチオ−4−ニトロフェニル)メタンスルホ
ンアミド0.80gを含むN,N−ジメチルホルムアミ
ド3.0ml溶液に氷冷下、m−クロロ過安息香酸0.
46gを加え、1時間攪拌した。反応液に飽和炭酸水素
ナトリウム水溶液を加え塩基性とし、酢酸エチルで抽出
した。有機層を飽和食塩水で洗浄後、無水硫酸マグネシ
ウムで乾燥した。溶媒を留去後、エタノール−ジクロロ
メタンで再結晶して淡黄色結晶のN−(2−シクロヘキ
シルオキシ−5−メチルスルフィニル−4−ニトロフェ
ニル)メタンスルホンアミド0.51gを得た。
m.p.192〜193℃0
Example 14 A solution of 3.0 ml of N,N-dimethylformamide containing 0.80 g of N-(2-cyclohexyloxy-5-methylthio-4-nitrophenyl)methanesulfonamide obtained by the method of Example 5 was poured with ice. Under cooling, m-chloroperbenzoic acid 0.
46 g was added and stirred for 1 hour. A saturated aqueous sodium hydrogen carbonate solution was added to the reaction mixture to make it basic, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine and then dried over anhydrous magnesium sulfate. After distilling off the solvent, the residue was recrystallized from ethanol-dichloromethane to obtain 0.51 g of N-(2-cyclohexyloxy-5-methylsulfinyl-4-nitrophenyl)methanesulfonamide as pale yellow crystals. m. p. 192-193℃
【0067】実施例15
実施例5の方法で得たN−(2−シクロヘキシルオキシ
−5−メチルチオ−4−ニトロフェニル)メタンスルホ
ンアミド0.64gを含むN,N−ジメチルホルムアミ
ド3.0ml溶液に室温下、m−クロロ過安息香酸0.
92gを加え、3時間攪拌した。反応液に飽和炭酸水素
ナトリウム水溶液を加え塩基性とし、酢酸エチルで抽出
した。有機層を飽和食塩水で洗浄後、無水硫酸マグネシ
ウムで乾燥した。溶媒を留去後、残渣をシリカゲルカラ
ムクロマトグラフィー(展開溶媒;n−ヘキサン:酢酸
エチル=3:1)で精製し、粗結晶をエタノール−ジク
ロロメタンで再結晶して淡黄色結晶のN−(2−シクロ
ヘキシルオキシ−5−メチルスルホニル−4−ニトロフ
ェニル)メタンスルホンアミド0.13gを得た。
m.p.173.5〜174℃Example 15 A solution of 0.64 g of N-(2-cyclohexyloxy-5-methylthio-4-nitrophenyl)methanesulfonamide obtained by the method of Example 5 in 3.0 ml of N,N-dimethylformamide was added. At room temperature, m-chloroperbenzoic acid 0.
92 g was added and stirred for 3 hours. A saturated aqueous sodium hydrogen carbonate solution was added to the reaction mixture to make it basic, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine and then dried over anhydrous magnesium sulfate. After evaporating the solvent, the residue was purified by silica gel column chromatography (developing solvent: n-hexane: ethyl acetate = 3:1), and the crude crystals were recrystallized from ethanol-dichloromethane to give pale yellow crystals of N-(2 0.13 g of -cyclohexyloxy-5-methylsulfonyl-4-nitrophenyl)methanesulfonamide was obtained. m. p. 173.5-174℃
【0068】実施例15と同様にして、実施例9の方法
で得たN−(2−シクロヘキシルオキシ−5−メチルチ
オメチル−4−ニトロフェニル)メタンスルホンアミド
を酸化してN−(2−シクロヘキシルオキシ−5−メチ
ルスルホニルメチル−4−ニトロフェニル)メタンスル
ホンアミドを得た。
m.p.154〜155℃(エタノール)In the same manner as in Example 15, N-(2-cyclohexyloxy-5-methylthiomethyl-4-nitrophenyl)methanesulfonamide obtained by the method of Example 9 was oxidized to give N-(2-cyclohexyl Oxy-5-methylsulfonylmethyl-4-nitrophenyl)methanesulfonamide was obtained. m. p. 154-155℃ (ethanol)
【0069】
実施例16
金属ナトリウム0.02gを溶解したメタノール1.7
ml溶液に実施例4の方法で得たN−(2−シクロヘキ
シルオキシ−5−メトキシ−4−ニトロフェニル)メタ
ンスルホンアミド0.3gを加え、10分間攪拌後、溶
媒を留去した。残渣をジエチルエーテルで洗浄し、黄色
結晶のN−(2−シクロヘキシルオキシ−5−メトキシ
−4−ニトロフェニル)メタンスルホンアミドナトリウ
ム・1/2水和物0.3gを得た。
m.p.245℃(分解)[0069]
Example 16 1.7 methanol in which 0.02 g of metallic sodium was dissolved
ml solution was added with 0.3 g of N-(2-cyclohexyloxy-5-methoxy-4-nitrophenyl)methanesulfonamide obtained by the method of Example 4, and after stirring for 10 minutes, the solvent was distilled off. The residue was washed with diethyl ether to obtain 0.3 g of sodium N-(2-cyclohexyloxy-5-methoxy-4-nitrophenyl)methanesulfonamide 1/2 hydrate as yellow crystals. m. p. 245℃ (decomposition)
Claims (1)
アルキル基であり、Rcは低級アルキル基、ハロゲン原
子、水酸基、低級アルコキシ基、フェノキシ基、ホルミ
ルオキシ基、低級アルカノイルオキシ基、低級アルキル
チオ基、低級アルキルスルフィニル基、低級アルキルス
ルホニル基、フェニルチオ基、フェニルスルフィニル基
、フェニルスルホニル基、低級アルコキシカルボニルメ
チルチオ基、低級アルコキシカルボニルメチルスルフィ
ニル基、低級アルコキシカルボニルメチルスルホニル基
または式−CH2Rd(式中、Rdは水酸基、低級アル
コキシ基、フェノキシ基、低級アルカノイルオキシ基、
低級アルキルチオ基、低級アルキルスルフィニル基、低
級アルキルスルホニル基、低級アルコキシカルボニルメ
チル基、カルボキシメチル基または1個もしくは2個の
低級アルキル基が置換したアミノ基である。)で表され
る基である。]で表わされる4置換スルホンアニリド化
合物及びその製薬学的に許容される塩。[Claim 1] [Formula 1] [In formula 1, Ra is a lower alkyl group, Rb is a cycloalkyl group, and Rc is a lower alkyl group, a halogen atom, a hydroxyl group, a lower alkoxy group, a phenoxy group, a formyloxy group. group, lower alkanoyloxy group, lower alkylthio group, lower alkylsulfinyl group, lower alkylsulfonyl group, phenylthio group, phenylsulfinyl group, phenylsulfonyl group, lower alkoxycarbonylmethylthio group, lower alkoxycarbonylmethylsulfinyl group, lower alkoxycarbonylmethylsulfonyl group group or formula -CH2Rd (wherein Rd is a hydroxyl group, a lower alkoxy group, a phenoxy group, a lower alkanoyloxy group,
It is a lower alkylthio group, a lower alkylsulfinyl group, a lower alkylsulfonyl group, a lower alkoxycarbonylmethyl group, a carboxymethyl group, or an amino group substituted with one or two lower alkyl groups. ). ] A 4-substituted sulfonanilide compound and a pharmaceutically acceptable salt thereof.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3126999A JPH04283555A (en) | 1991-03-12 | 1991-03-12 | 4-substituted sulfonaniliode compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3126999A JPH04283555A (en) | 1991-03-12 | 1991-03-12 | 4-substituted sulfonaniliode compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04283555A true JPH04283555A (en) | 1992-10-08 |
Family
ID=14949169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3126999A Pending JPH04283555A (en) | 1991-03-12 | 1991-03-12 | 4-substituted sulfonaniliode compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04283555A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994019318A1 (en) * | 1993-02-19 | 1994-09-01 | Taisho Pharmaceutical Co., Ltd. | 5-aminoacetylaminosulfonanilide compound |
-
1991
- 1991-03-12 JP JP3126999A patent/JPH04283555A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994019318A1 (en) * | 1993-02-19 | 1994-09-01 | Taisho Pharmaceutical Co., Ltd. | 5-aminoacetylaminosulfonanilide compound |
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