JPH04277738A - Development processing method for silver halide photosensitive material - Google Patents
Development processing method for silver halide photosensitive materialInfo
- Publication number
- JPH04277738A JPH04277738A JP6375691A JP6375691A JPH04277738A JP H04277738 A JPH04277738 A JP H04277738A JP 6375691 A JP6375691 A JP 6375691A JP 6375691 A JP6375691 A JP 6375691A JP H04277738 A JPH04277738 A JP H04277738A
- Authority
- JP
- Japan
- Prior art keywords
- silver
- silver halide
- acid
- developing
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 70
- 239000004332 silver Substances 0.000 title claims abstract description 70
- -1 silver halide Chemical class 0.000 title claims abstract description 59
- 239000000463 material Substances 0.000 title claims abstract description 47
- 238000011161 development Methods 0.000 title claims abstract description 24
- 238000003672 processing method Methods 0.000 title description 2
- 238000000034 method Methods 0.000 claims description 35
- 150000001875 compounds Chemical class 0.000 claims description 18
- 230000008569 process Effects 0.000 claims description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract description 28
- 238000012545 processing Methods 0.000 abstract description 22
- 230000007423 decrease Effects 0.000 abstract description 5
- 230000002411 adverse Effects 0.000 abstract description 3
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 42
- 238000000576 coating method Methods 0.000 description 29
- 239000011248 coating agent Substances 0.000 description 27
- 239000000839 emulsion Substances 0.000 description 27
- 239000007864 aqueous solution Substances 0.000 description 25
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 18
- 239000003795 chemical substances by application Substances 0.000 description 17
- 239000010410 layer Substances 0.000 description 14
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 12
- 108010010803 Gelatin Proteins 0.000 description 11
- 229920000159 gelatin Polymers 0.000 description 11
- 239000008273 gelatin Substances 0.000 description 11
- 235000019322 gelatine Nutrition 0.000 description 11
- 235000011852 gelatine desserts Nutrition 0.000 description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 10
- 238000001035 drying Methods 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 230000035945 sensitivity Effects 0.000 description 10
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 10
- 238000005406 washing Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000012141 concentrate Substances 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- 239000011241 protective layer Substances 0.000 description 9
- 239000012224 working solution Substances 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 239000000975 dye Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- 239000002738 chelating agent Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 6
- 208000002109 Argyria Diseases 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 6
- 239000004848 polyfunctional curative Substances 0.000 description 5
- 229910001961 silver nitrate Inorganic materials 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229960000583 acetic acid Drugs 0.000 description 4
- 239000013522 chelant Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 239000002562 thickening agent Substances 0.000 description 4
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 3
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 3
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 3
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical class C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 229910001447 ferric ion Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical class N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 239000011970 polystyrene sulfonate Substances 0.000 description 3
- 229960002796 polystyrene sulfonate Drugs 0.000 description 3
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 3
- 235000019252 potassium sulphite Nutrition 0.000 description 3
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 3
- 230000001235 sensitizing effect Effects 0.000 description 3
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 235000010265 sodium sulphite Nutrition 0.000 description 3
- BJWBFXNBFFXUCR-UHFFFAOYSA-M sodium;3,3,5,5-tetramethyl-2-(2-phenoxyethoxy)hexane-2-sulfonate Chemical compound [Na+].CC(C)(C)CC(C)(C)C(C)(S([O-])(=O)=O)OCCOC1=CC=CC=C1 BJWBFXNBFFXUCR-UHFFFAOYSA-M 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 2
- CYEJMVLDXAUOPN-UHFFFAOYSA-N 2-dodecylphenol Chemical compound CCCCCCCCCCCCC1=CC=CC=C1O CYEJMVLDXAUOPN-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 2
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 2
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 2
- XPAZGLFMMUODDK-UHFFFAOYSA-N 6-nitro-1h-benzimidazole Chemical compound [O-][N+](=O)C1=CC=C2N=CNC2=C1 XPAZGLFMMUODDK-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- 229910021607 Silver chloride Inorganic materials 0.000 description 2
- 229910021612 Silver iodide Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 239000012362 glacial acetic acid Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000006224 matting agent Substances 0.000 description 2
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 229960003330 pentetic acid Drugs 0.000 description 2
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 2
- 229940116357 potassium thiocyanate Drugs 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 2
- 230000005070 ripening Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229930182490 saponin Natural products 0.000 description 2
- 150000007949 saponins Chemical class 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- 150000003378 silver Chemical class 0.000 description 2
- 229940045105 silver iodide Drugs 0.000 description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 2
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 2
- PODWXQQNRWNDGD-UHFFFAOYSA-L sodium thiosulfate pentahydrate Chemical compound O.O.O.O.O.[Na+].[Na+].[O-]S([S-])(=O)=O PODWXQQNRWNDGD-UHFFFAOYSA-L 0.000 description 2
- 235000019345 sodium thiosulphate Nutrition 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 2
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- IWPGKPWCKGMJMG-UHFFFAOYSA-N 1-(4-aminophenyl)-4,4-dimethylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=C(N)C=C1 IWPGKPWCKGMJMG-UHFFFAOYSA-N 0.000 description 1
- BOXPXLFVWVZCIU-UHFFFAOYSA-N 1-hydroxy-1-phosphonopropane-1,2,3-tricarboxylic acid Chemical compound OC(=O)CC(C(O)=O)C(O)(C(O)=O)P(O)(O)=O BOXPXLFVWVZCIU-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical compound SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- DBCKMJVEAUXWJJ-UHFFFAOYSA-N 2,3-dichlorobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Cl)=C1Cl DBCKMJVEAUXWJJ-UHFFFAOYSA-N 0.000 description 1
- AYNPIRVEWMUJDE-UHFFFAOYSA-N 2,5-dichlorohydroquinone Chemical compound OC1=CC(Cl)=C(O)C=C1Cl AYNPIRVEWMUJDE-UHFFFAOYSA-N 0.000 description 1
- IKQCSJBQLWJEPU-UHFFFAOYSA-N 2,5-dihydroxybenzenesulfonic acid Chemical compound OC1=CC=C(O)C(S(O)(=O)=O)=C1 IKQCSJBQLWJEPU-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 1
- FXKZPKBFTQUJBA-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]acetic acid;sodium;dihydrate Chemical compound O.O.[Na].[Na].OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O FXKZPKBFTQUJBA-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- QWZOJDWOQYTACD-UHFFFAOYSA-N 2-ethenylsulfonyl-n-[2-[(2-ethenylsulfonylacetyl)amino]ethyl]acetamide Chemical compound C=CS(=O)(=O)CC(=O)NCCNC(=O)CS(=O)(=O)C=C QWZOJDWOQYTACD-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- NKJMNAMWEFRAIK-UHFFFAOYSA-N 2-sulfonyl-n-[2-[(2-sulfonylacetyl)amino]ethyl]acetamide Chemical compound O=S(=O)=CC(=O)NCCNC(=O)C=S(=O)=O NKJMNAMWEFRAIK-UHFFFAOYSA-N 0.000 description 1
- GODCLGCOHHTLHX-UHFFFAOYSA-N 3,3-diphosphonopropanoic acid Chemical compound OC(=O)CC(P(O)(O)=O)P(O)(O)=O GODCLGCOHHTLHX-UHFFFAOYSA-N 0.000 description 1
- AJKLCDRWGVLVSH-UHFFFAOYSA-N 4,4-bis(hydroxymethyl)-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(CO)(CO)CN1C1=CC=CC=C1 AJKLCDRWGVLVSH-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- SOVXTYUYJRFSOG-UHFFFAOYSA-N 4-(2-hydroxyethylamino)phenol Chemical compound OCCNC1=CC=C(O)C=C1 SOVXTYUYJRFSOG-UHFFFAOYSA-N 0.000 description 1
- SRYYOKKLTBRLHT-UHFFFAOYSA-N 4-(benzylamino)phenol Chemical compound C1=CC(O)=CC=C1NCC1=CC=CC=C1 SRYYOKKLTBRLHT-UHFFFAOYSA-N 0.000 description 1
- HDGMAACKJSBLMW-UHFFFAOYSA-N 4-amino-2-methylphenol Chemical compound CC1=CC(N)=CC=C1O HDGMAACKJSBLMW-UHFFFAOYSA-N 0.000 description 1
- FIARATPVIIDWJT-UHFFFAOYSA-N 5-methyl-1-phenylpyrazolidin-3-one Chemical compound CC1CC(=O)NN1C1=CC=CC=C1 FIARATPVIIDWJT-UHFFFAOYSA-N 0.000 description 1
- YCPXWRQRBFJBPZ-UHFFFAOYSA-N 5-sulfosalicylic acid Chemical compound OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O YCPXWRQRBFJBPZ-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- XXAXVMUWHZHZMJ-UHFFFAOYSA-N Chymopapain Chemical compound OC1=CC(S(O)(=O)=O)=CC(S(O)(=O)=O)=C1O XXAXVMUWHZHZMJ-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- ZNZYKNKBJPZETN-WELNAUFTSA-N Dialdehyde 11678 Chemical compound N1C2=CC=CC=C2C2=C1[C@H](C[C@H](/C(=C/O)C(=O)OC)[C@@H](C=C)C=O)NCC2 ZNZYKNKBJPZETN-WELNAUFTSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- FSVCELGFZIQNCK-UHFFFAOYSA-N N,N-bis(2-hydroxyethyl)glycine Chemical compound OCCN(CCO)CC(O)=O FSVCELGFZIQNCK-UHFFFAOYSA-N 0.000 description 1
- JYXGIOKAKDAARW-UHFFFAOYSA-N N-(2-hydroxyethyl)iminodiacetic acid Chemical compound OCCN(CC(O)=O)CC(O)=O JYXGIOKAKDAARW-UHFFFAOYSA-N 0.000 description 1
- WRUZLCLJULHLEY-UHFFFAOYSA-N N-(p-hydroxyphenyl)glycine Chemical compound OC(=O)CNC1=CC=C(O)C=C1 WRUZLCLJULHLEY-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- MKBUQYWFFBCMFG-UHFFFAOYSA-N acetic acid propane-1,1-diamine Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CCC(N)N MKBUQYWFFBCMFG-UHFFFAOYSA-N 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 235000011126 aluminium potassium sulphate Nutrition 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- DMSMPAJRVJJAGA-UHFFFAOYSA-N benzo[d]isothiazol-3-one Chemical compound C1=CC=C2C(=O)NSC2=C1 DMSMPAJRVJJAGA-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- OZECDDHOAMNMQI-UHFFFAOYSA-H cerium(3+);trisulfate Chemical compound [Ce+3].[Ce+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O OZECDDHOAMNMQI-UHFFFAOYSA-H 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- BBLSYMNDKUHQAG-UHFFFAOYSA-L dilithium;sulfite Chemical compound [Li+].[Li+].[O-]S([O-])=O BBLSYMNDKUHQAG-UHFFFAOYSA-L 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- KRTSDMXIXPKRQR-UHFFFAOYSA-N dimethyl [4-(methylamino)-4-oxobut-2-en-2-yl] phosphate Chemical compound CNC(=O)C=C(C)OP(=O)(OC)OC KRTSDMXIXPKRQR-UHFFFAOYSA-N 0.000 description 1
- DLKLXLHRWMZWRC-UHFFFAOYSA-L disodium 5-[(2,6-dinaphthalen-2-yloxypyrimidin-4-yl)amino]-2-[2-[4-[(2,6-dinaphthalen-2-yloxypyrimidin-4-yl)amino]-2-sulfonatophenyl]ethenyl]benzenesulfonate Chemical compound [Na+].[Na+].C1=CC=CC2=CC(OC=3N=C(OC=4C=C5C=CC=CC5=CC=4)C=C(N=3)NC3=CC=C(C(=C3)S([O-])(=O)=O)C=CC3=CC=C(NC=4N=C(OC=5C=C6C=CC=CC6=CC=5)N=C(OC=5C=C6C=CC=CC6=CC=5)C=4)C=C3S(=O)(=O)[O-])=CC=C21 DLKLXLHRWMZWRC-UHFFFAOYSA-L 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- ZZGUZQXLSHSYMH-UHFFFAOYSA-N ethane-1,2-diamine;propanoic acid Chemical compound NCCN.CCC(O)=O.CCC(O)=O ZZGUZQXLSHSYMH-UHFFFAOYSA-N 0.000 description 1
- DEFVIWRASFVYLL-UHFFFAOYSA-N ethylene glycol bis(2-aminoethyl)tetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)CCOCCOCCN(CC(O)=O)CC(O)=O DEFVIWRASFVYLL-UHFFFAOYSA-N 0.000 description 1
- IFQUWYZCAGRUJN-UHFFFAOYSA-N ethylenediaminediacetic acid Chemical compound OC(=O)CNCCNCC(O)=O IFQUWYZCAGRUJN-UHFFFAOYSA-N 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000008233 hard water Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
- 150000002473 indoazoles Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 239000006174 pH buffer Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GNHOJBNSNUXZQA-UHFFFAOYSA-J potassium aluminium sulfate dodecahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.O.O.[Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GNHOJBNSNUXZQA-UHFFFAOYSA-J 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- RWPGFSMJFRPDDP-UHFFFAOYSA-L potassium metabisulfite Chemical compound [K+].[K+].[O-]S(=O)S([O-])(=O)=O RWPGFSMJFRPDDP-UHFFFAOYSA-L 0.000 description 1
- 229940043349 potassium metabisulfite Drugs 0.000 description 1
- 235000010263 potassium metabisulphite Nutrition 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- HRZFUMHJMZEROT-UHFFFAOYSA-L sodium disulfite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])(=O)=O HRZFUMHJMZEROT-UHFFFAOYSA-L 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 229940001584 sodium metabisulfite Drugs 0.000 description 1
- 235000010262 sodium metabisulphite Nutrition 0.000 description 1
- 229940006186 sodium polystyrene sulfonate Drugs 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229940062627 tribasic potassium phosphate Drugs 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
Landscapes
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明はハロゲン化銀感光材料の
現像処理方法に関し、さらに詳しくは写真感光材料を現
像処理するときに現像タンクや現像ラック、ローラに付
着する銀汚れ(銀スラッヂともいう)を少なくし、日常
の器具、器械のメンテナンスを容易にする方法に関する
ものである。[Field of Industrial Application] The present invention relates to a method for developing silver halide photosensitive materials, and more specifically, the present invention relates to a method for developing silver halide photosensitive materials, and more specifically, silver stains (also referred to as silver sludge) that adhere to developing tanks, developing racks, and rollers during processing of photographic photosensitive materials. ), and it relates to a method that facilitates the daily maintenance of instruments and equipment.
【0002】0002
【従来の技術】一般にハロゲン化銀写真感光材料(以下
、感材あるいは感光材料と略す場合がある)を現像処理
すると、処理量に応じて次第に現像タンクやバット、自
動現像機の現像タンクの壁、現像タンク、現像ローラに
銀が付着、蓄積することは古くから知られている。これ
は銀汚れまたは銀スラッヂとも言われ、処理される感材
に付着して、画像を汚したりするので、定期的に機械の
洗浄、メンテナンスを必要としている。[Prior Art] Generally, when a silver halide photographic light-sensitive material (hereinafter sometimes abbreviated as "sensitive material" or "light-sensitive material") is developed, the walls of the developing tank, vat, and developing tank of an automatic processor gradually develop depending on the amount of processing. It has been known for a long time that silver adheres and accumulates on developing tanks and developing rollers. This is also called silver stain or silver sludge, and it adheres to the photosensitive material being processed and stains the image, requiring regular cleaning and maintenance of the machine.
【0003】ところで、近年、ハロゲン化銀写真感光材
料の現像処理において、迅速処理の要求が増々強くなっ
ている。迅速処理をするためには、現像液の活性を上げ
ることも必要であるが、ハロゲン化銀写真感光材料の性
質に起因するところも大きい。自動現像機(以下自現機
という)を使用する場合、通常、現像、定着、水洗、乾
燥という工程があり、特に乾燥工程は重要である。迅速
で乾燥を終了させるためには、感光材料の銀量を少なく
することがもっとも効果が大きい。Incidentally, in recent years, there has been an increasing demand for rapid processing in the development processing of silver halide photographic materials. In order to perform rapid processing, it is necessary to increase the activity of the developer, but this is largely due to the properties of the silver halide photographic light-sensitive material. When using an automatic processor (hereinafter referred to as an automatic processor), there are usually steps such as development, fixing, washing, and drying, and the drying step is particularly important. In order to finish drying quickly, it is most effective to reduce the amount of silver in the photosensitive material.
【0004】平板状ハロゲン化銀粒子はカバーリングパ
ワーが高いために、写真性、画質等の性能を損なうこと
なく銀量を下げることが可能である。このことは乾燥工
程ばかりではなく、現像、定着、水洗工程の迅速処理に
とっても有利である。従って、迅速処理には平板状ハロ
ゲン化銀粒子を使用することがもっとも適している。こ
の平板状ハロゲン化銀粒子の性質については、Rese
archDisclosure 225巻Item22
534p20〜p58(1983年1月号)、特開昭5
8−127921号、同58−113926号、米国特
許第4,425,425号に詳細に記載されている。と
ころが、この平板状ハロゲン化銀粒子は、従来のじゃが
芋状粒子に比べてその表面積がはるかに大きいため、現
像中でのハロゲン化銀の溶解量も大きくなり、従って銀
汚れの程度も、じゃが芋状粒子に比べて大きくて、迅速
処理上のメリットを生かしきれない欠点がある。Since tabular silver halide grains have a high covering power, it is possible to reduce the amount of silver without impairing performance such as photographic properties and image quality. This is advantageous not only in the drying process but also in rapid processing of development, fixing, and water washing processes. Therefore, it is most suitable to use tabular silver halide grains for rapid processing. Regarding the properties of these tabular silver halide grains, please refer to Rese
archDisclosure Volume 225 Item 22
534 p20-p58 (January 1983 issue), JP-A-5
No. 8-127921, No. 58-113926, and US Pat. No. 4,425,425. However, since the surface area of these tabular silver halide grains is much larger than that of conventional potato-like grains, the amount of silver halide dissolved during development is also large, and therefore the degree of silver staining is also smaller than that of conventional potato-like grains. They have the disadvantage that they are larger than particles and cannot take advantage of the advantages of rapid processing.
【0005】一方、印刷用感材のように、元来それ程の
高感度を必要としない感材や、レーザープリンター用の
感材のように、システム的にエレクトロニクスに助けら
れてそれ程の高感度を必要としない感材では粒子サイズ
がより小さくなり、かつハロゲン化銀組成も、沃化銀か
ら臭化銀、塩化銀へとより溶け易い粒子構成となって銀
汚れを生じ易い組成となる。反面、こうすることによっ
て、片面感材でありながら迅速な現像処理にも対応でき
るわけである。On the other hand, there are photosensitive materials that do not originally require such high sensitivity, such as printing photosensitive materials, and photosensitive materials for laser printers, which can be systemically supported by electronics to achieve such high sensitivity. In unnecessary sensitive materials, the grain size becomes smaller, and the silver halide composition becomes a grain structure that is more easily soluble from silver iodide to silver bromide and silver chloride, resulting in a composition that is more likely to cause silver staining. On the other hand, by doing so, it is possible to respond to rapid development processing even though it is a single-sided photosensitive material.
【0006】また、工業用X−レイ感材では塗布銀量が
医療用X−レイ感材に比して3倍近くも多く、その上ハ
ロゲン化銀粒子も小さいことから銀汚れの問題は一層深
刻である。さらには、一般撮影用のネガ感材の処理では
、画像の粒状性を重視するが故に現像液中の亜硫酸塩濃
度を高くし、しかも現像時間をむしろできるだけ長くか
けていわゆる溶解物理現像の寄与を大きくしているので
、銀汚れは非常に大きな問題である。In addition, the amount of coated silver in industrial X-ray sensitive materials is nearly three times greater than that in medical X-ray sensitive materials, and the silver halide grains are also smaller, making the problem of silver staining even more serious. It's serious. Furthermore, in the processing of negative photosensitive materials for general photography, the graininess of images is emphasized, so the sulfite concentration in the developer is increased, and the development time is rather extended as much as possible to minimize the contribution of so-called dissolution physical development. Since it is so large, silver contamination is a very big problem.
【0007】上記のように、各種感材処理システムそれ
ぞれにおいて、銀汚れの問題は避けられない大きな理由
があり、解決できない大きな問題となっている。その上
、最近環境問題が大きくクローズアップされてきて現像
処理液の廃液もその例外ではない。補充液を減らし廃液
を減らすことは環境保全上、非常に大切なことで、少し
でも減らすことが望まれている。しかし、補充液を減ら
せば、現像液中に溶出する銀濃度は反比例して増加し、
銀汚れはより増大する。また、廃液を減らしても自現機
のメンテナンスは煩雑であり、できあがりの写真性能の
低下まで引き起こしかねない。この問題もあって補充液
の低減も簡単にはできないのが現状である。As mentioned above, in each of the various sensitive material processing systems, there are major reasons why the problem of silver staining cannot be avoided, and it has become a major problem that cannot be solved. Moreover, environmental problems have recently come into the spotlight, and waste liquid from developing processing solutions is no exception. Reducing the amount of replenisher and waste fluid is extremely important in terms of environmental conservation, and it is desirable to reduce this amount as much as possible. However, if the amount of replenisher is reduced, the concentration of silver eluted into the developer increases inversely.
Silver stains are further increased. Furthermore, even if waste liquid is reduced, maintenance of the processor is complicated and may even cause a decline in the performance of the finished photograph. Due to this problem, it is currently not possible to easily reduce the amount of replenisher.
【0008】この銀汚れを落すための洗浄には、その都
度、現像液を現像タンクから抜き、例えば硫酸セリウム
のような、非常に強い酸化剤溶液をタンクに満たし、短
くても十数分から長くは30分間以上も攪拌しながら放
置しなければならない。さらに、この後この酸化剤の痕
跡が現像タンク中に残っては、現像液を酸化劣化させる
のでよく水洗いせねばならない。この洗浄作業は特に自
現機の、日常のメンテナンスとして最大の負荷の一つと
なっており、作業の安全性という点、さらに洗浄剤の公
害負荷という観点からも改良が切に望まれているもので
ある。Each time cleaning is performed to remove this silver stain, the developer is drained from the developing tank, and the tank is filled with a very strong oxidizing agent solution such as cerium sulfate. must be left stirring for at least 30 minutes. Furthermore, if traces of this oxidizing agent remain in the developing tank after this, the developing solution will be oxidized and deteriorated, so it must be thoroughly washed with water. This cleaning work is one of the biggest daily maintenance burdens, especially for automatic processors, and improvements are desperately needed from the standpoint of work safety and the pollution burden of cleaning agents. It is.
【0009】一方、この銀汚れを少なくする方法として
、特開昭56−24347号のように現像液中に溶出す
る銀イオンを少なくするおよび/または、銀イオンの銀
への還元を抑制するようなメルカプト化合物を銀汚れ防
止剤として添加する方法が知られている。この場合、メ
ルカプト化合物としては、水溶性基としてスルホ基を有
するものが用いられている。しかしこの方法では、現像
そのものを抑制する作用も避けられず、感度の低下を伴
なうという欠点を有する。しかも感光材料の特性により
、この化合物に対する感受性が異なるので、一律に使っ
て効果が期待できるものではない。また、少しでも感度
を高く出して使おうとする感光材料/現像処理システム
では、感度の低下は重大な欠点である。また、階調の変
化も避けなければならない問題である。さらに、特公昭
56−46585号公報には、カルボキシ基を有するジ
スルフィドを銀汚れ防止剤として用いる旨が開示されて
いる。しかし、このものでは、銀汚れ防止効果が充分に
得られる程の添加量となると、感度低下や階調変化が生
じてしまう。On the other hand, as a method for reducing this silver stain, as disclosed in Japanese Patent Application Laid-Open No. 56-24347, methods are proposed to reduce the amount of silver ions eluted into the developer and/or to suppress the reduction of silver ions to silver. A method of adding a mercapto compound as a silver stain preventive agent is known. In this case, the mercapto compound used is one having a sulfo group as a water-soluble group. However, this method has the disadvantage that the effect of suppressing the development itself is unavoidable, which is accompanied by a decrease in sensitivity. Moreover, the sensitivity to this compound varies depending on the characteristics of the photosensitive material, so it cannot be expected to be effective even if used uniformly. Further, in a photosensitive material/development processing system that is intended to be used with as high a sensitivity as possible, a decrease in sensitivity is a serious drawback. In addition, changes in gradation are also a problem that must be avoided. Further, Japanese Patent Publication No. 56-46585 discloses the use of a disulfide having a carboxy group as a silver stain preventive agent. However, in this case, when the amount added is large enough to obtain a sufficient silver stain prevention effect, a decrease in sensitivity and a change in gradation occur.
【0010】0010
【発明が解決しようとする課題】本発明の目的は、ハロ
ゲン化銀写真感光材料を現像処理するとき第一に、現像
タンク中、および/または現像ラック、ローラ中に発生
する銀汚れを軽減すること、第二に自現機や現像機器の
メンテナンスを容易にすること、第三に写真性に全く影
響を与えないで銀汚れを軽減すること、第四に現像液の
安定性を損なうことなく銀汚れを軽減すること、第五に
補充液を低減しても銀汚れを軽減することにある。SUMMARY OF THE INVENTION An object of the present invention is, first, to reduce silver stains that occur in a developing tank and/or a developing rack and roller when developing a silver halide photographic material. Second, it facilitates the maintenance of automatic processing machines and developing equipment; third, it reduces silver stains without affecting photographic properties; and fourth, it does not impair the stability of the developer. The fifth purpose is to reduce silver stains.The fifth purpose is to reduce silver stains even if the amount of replenisher is reduced.
【0011】[0011]
【課題を解決するための手段】本発明の諸目的は、ハロ
ゲン化銀感光材料を露光したのち、現像処理を行うハロ
ゲン化銀感光材料の現像処理方法において、前記現像処
理に用いる現像液に下記一般式(I)で表わされる化合
物を少なくとも1種以上添加することにより達成された
。
一般式(I)[Means for Solving the Problems] It is an object of the present invention to provide a method for developing a silver halide photosensitive material in which a silver halide photosensitive material is exposed and then developed, in which the developer used in the development process is as follows: This was achieved by adding at least one compound represented by general formula (I). General formula (I)
【0012】0012
【化2】[Case 2]
【0013】式中、Zは環を形成するに必要な原子群を
表す。Xは置換基を表す。nは0または1〜5の整数を
表す。In the formula, Z represents an atomic group necessary to form a ring. X represents a substituent. n represents 0 or an integer of 1 to 5.
【0014】次に一般式(I)で表わされる化合物につ
いて詳細に説明する。式中、Zは環を形成するに必要な
原子群を表す。Zは好ましくは5員〜10員の環を形成
するに必要な原子群を表し、具体的には炭素原子、窒素
原子、硫黄原子、酸素原子などが挙げられる。好ましく
は炭素原子である。Zは芳香族環と縮環していてもよい
。Xは置換基を表す。好ましくはヒドロキシ基、カルボ
キシ基、スルホン酸基、アミノ基、ハロゲン原子などが
挙げられる。nは0または1〜5の整数を表す。nが2
以上の場合、Xは同一でも異なっていてもよい。Next, the compound represented by the general formula (I) will be explained in detail. In the formula, Z represents an atomic group necessary to form a ring. Z preferably represents an atomic group necessary to form a 5- to 10-membered ring, and specifically includes a carbon atom, a nitrogen atom, a sulfur atom, an oxygen atom, and the like. Preferably it is a carbon atom. Z may be fused with an aromatic ring. X represents a substituent. Preferred examples include hydroxy group, carboxy group, sulfonic acid group, amino group, and halogen atom. n represents 0 or an integer of 1 to 5. n is 2
In the above cases, X may be the same or different.
【0015】以下に一般式(I)で表される化合物の具
体例を記載するが、本発明はこれらに限定されるもので
はない。Specific examples of the compound represented by the general formula (I) will be described below, but the present invention is not limited thereto.
【0016】[0016]
【化3】[Chemical formula 3]
【0017】[0017]
【化4】[C4]
【0018】本発明の化合物は、テトラヒドロン・レタ
ーズ(Tetrahydoron Letters)
9巻655〜656(1973)、ジャーナル・オブ・
オルガニック・ケミストリー(J. Org. Che
m.)34巻157(1963)、シンセシス(Syn
thesis)607〜608(1963)、ジャーナ
ル・オブ・アメリカン・ケミカル・ソサイアティ(J.
Am. Chem. Soc.)77巻6632(1
955)、ジャーナル・オブ・オルガニック・ケミスト
リー(J. Org. Chem.)33巻1257(
1968)等に記載の方法で合成できる。The compounds of the present invention are Tetrahydron Letters.
9, 655-656 (1973), Journal of
Organic Chemistry (J. Org. Che
m. ) Volume 34, 157 (1963), Synthesis (Syn
Thesis) 607-608 (1963), Journal of the American Chemical Society (J.
Am. Chem. Soc. ) Volume 77 6632 (1
955), Journal of Organic Chemistry (J. Org. Chem.) Volume 33, 1257 (
It can be synthesized by the method described in (1968) et al.
【0019】本発明の化合物の現像液(使用液)におけ
る好ましい濃度は、使用液1リットル当たり0.01ミ
リモル〜50ミリモル、特に0.05ミリモル〜10ミ
リモル、更には0.1ミリモル〜5ミリモルである。The preferred concentration of the compound of the present invention in the developer solution (working solution) is 0.01 mmol to 50 mmol, particularly 0.05 mmol to 10 mmol, more preferably 0.1 mmol to 5 mmol per liter of the working solution. It is.
【0020】本発明の化合物の現像液(使用液)におけ
る好ましい濃度は、現像液(使用液)1リットルあたり
、0.01ミリモル〜50ミリモル、より好ましくは0
.05ミリモル〜10ミリモル、特に好ましくは0.1
ミリモル〜5ミリモルである。The preferred concentration of the compound of the present invention in the developing solution (working solution) is 0.01 mmol to 50 mmol, more preferably 0.01 mmol to 50 mmol per liter of the developing solution (working solution).
.. 05 mmol to 10 mmol, particularly preferably 0.1
mmol to 5 mmol.
【0021】本発明の現像液に用いる現像主薬にはハイ
ドロキノン類を主体とするが、良好な性能を得やすい点
で、ハイドロキノン類と1−フェニル−3−ピラゾリド
ン類の組合せ、またはハイドロキノン類とp−アミノフ
ェノール類との組合せがよい。本発明に用いるハイドロ
キノン系現像主薬としてはハイドロキノン、クロロハイ
ドロキノン、ブロモハイドロキノン、イソプロピルハイ
ドロキノン、メチルハイドロキノン、2,3−ジクロロ
ハイドロキノン、2,5−ジクロロハイドロキノン、2
,3−ジブロモハイドロキノン、2,5−ジメチルハイ
ドロキノン、ハイドロキノンモノスルホン酸塩などがあ
るが特にハイドロキノンが好ましい。The developing agent used in the developer of the present invention is mainly composed of hydroquinones, but a combination of hydroquinones and 1-phenyl-3-pyrazolidones, or a combination of hydroquinones and pyrazolidones is preferred, since it is easy to obtain good performance. - Good combination with aminophenols. Hydroquinone-based developing agents used in the present invention include hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, methylhydroquinone, 2,3-dichlorohydroquinone, 2,5-dichlorohydroquinone,
, 3-dibromohydroquinone, 2,5-dimethylhydroquinone, hydroquinone monosulfonate and the like, with hydroquinone being particularly preferred.
【0022】本発明に用いるp−アミノフェノール系現
像主薬としては、N−メチル−p−アミノフェノール、
p−アミノフェノール、N−(β−ヒドロキシエチル)
−p−アミノフェノール、N−(4−ヒドロキシフェニ
ル)グリシン、2−メチル−p−アミノフェノール、p
−ベンジルアミノフェノール等があるが、なかでもN−
メチル−p−アミノフェノールが好ましい。The p-aminophenol developing agent used in the present invention includes N-methyl-p-aminophenol,
p-aminophenol, N-(β-hydroxyethyl)
-p-aminophenol, N-(4-hydroxyphenyl)glycine, 2-methyl-p-aminophenol, p
-benzylaminophenol, among others, N-
Methyl-p-aminophenol is preferred.
【0023】本発明に用いる3−ピラゾリドン系現像主
薬としては1−フェニル−3−ピラゾリドン、1−フェ
ニル−4,4−ジメチル−3−ピラゾリドン、1−フェ
ニル−4−メチル−4−ヒドロキシメチル−3−ピラゾ
リドン、1−フェニル−4,4−ジヒドロキシメチル−
3−ピラゾリドン、1−フェニル−5−メチル−3−ピ
ラゾリドン、1−p−アミノフェニル−4,4−ジメチ
ル−3−ピラゾリドン、1−p−トリル−4,4−ジメ
チル−3−ピラゾリドン1−p−トリル−4−メチル−
4−ヒドロキシメチル−3−ピラゾリドン、などがある
。The 3-pyrazolidone developing agents used in the present invention include 1-phenyl-3-pyrazolidone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, and 1-phenyl-4-methyl-4-hydroxymethyl- 3-pyrazolidone, 1-phenyl-4,4-dihydroxymethyl-
3-pyrazolidone, 1-phenyl-5-methyl-3-pyrazolidone, 1-p-aminophenyl-4,4-dimethyl-3-pyrazolidone, 1-p-tolyl-4,4-dimethyl-3-pyrazolidone 1- p-tolyl-4-methyl-
4-hydroxymethyl-3-pyrazolidone, etc.
【0024】ハイドロキノン系現像主薬は通常0.01
モル/l〜1.5モル/l 、好ましくは0.05モル
/l 〜1.2モル/l の量で用いられる。これに加
えて、p−アミノフェノール系現像主薬または3−ピラ
ゾリドン系現像主薬は通常0.0005モル/l 〜0
.2モル/l 、好ましくは0.001モル/l 〜0
.01モル/l の量で用いられる。[0024] Hydroquinone type developing agent usually has a concentration of 0.01
It is used in an amount of mol/l to 1.5 mol/l, preferably 0.05 mol/l to 1.2 mol/l. In addition to this, p-aminophenol-based developing agents or 3-pyrazolidone-based developing agents are usually used in amounts ranging from 0.0005 mol/l to 0.
.. 2 mol/l, preferably 0.001 mol/l to 0
.. It is used in an amount of 0.01 mol/l.
【0025】本発明の現像液に用いる亜硫酸塩としては
亜硫酸ナトリウム、亜硫酸カリウム、亜硫酸リチウム、
亜硫酸アンモニウム、重亜硫酸ナトリウム、メタ重亜硫
酸カリウム、などがある。亜硫酸塩は0.1モル/l
以上特に0.3モル/l 以上が好ましい。また、上限
は現像液濃縮液で2.5モル/l までとするのが好ま
しい。Sulfites used in the developer of the present invention include sodium sulfite, potassium sulfite, lithium sulfite,
These include ammonium sulfite, sodium bisulfite, potassium metabisulfite, etc. Sulfite is 0.1 mol/l
Particularly preferably 0.3 mol/l or more. Further, the upper limit is preferably up to 2.5 mol/l in the developer concentrate.
【0026】本発明の現像処理に用いる現像液のpHは
9から18までの範囲のものが好ましい。更に好ましく
はpH10から12までの範囲である。pHの設定のた
めに用いるアルカリ剤には水酸化ナトリウム、水酸化カ
リウム、炭酸ナトリウム、炭酸カリウム、第三リン酸ナ
トリウム、第三リン酸カリウムの如きpH調節剤を含む
。特開昭62−186259号(ホウ酸塩)、特開昭6
0−93433号(例えば、サッカロース、アセトオキ
シム、5−スルホサリチル酸)、リン酸塩、炭酸塩など
の緩衝剤を用いてもよい。The pH of the developer used in the development process of the present invention is preferably in the range of 9 to 18. More preferably, the pH range is from 10 to 12. Alkaline agents used for setting pH include pH adjusting agents such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, tribasic sodium phosphate, and tribasic potassium phosphate. JP-A-62-186259 (Borate), JP-A-62-186259 (Borate)
Buffers such as No. 0-93433 (eg, sucrose, acetoxime, 5-sulfosalicylic acid), phosphates, carbonates, etc. may be used.
【0027】本発明においては現像液は鉄イオンに対す
るキレート安定度定数が8以上であるキレ−ト剤を含有
することが好ましい。ここにキレート安定度定数とは、
L.G.Sillen・ A.E.Martell
著、H ”Stabillity Constant
s of Metal−ionComplexes”,
The Chemical Society,Lon
don(1964)。S.Chaberek・ A.E
.Martell著,”Organic Seques
teringAgents”,Wiley(1959)
。等により一般に知られた定数を意味する。本発明にお
いて鉄イオンに対するキレート安定度定数が8以上であ
るキレート剤としては、有機カルボン酸キレート剤、有
機リン酸キレート剤、無機リン酸キレート剤、ポリヒド
ロキシ化合物等が挙げられる。なお、上記鉄イオンとは
、第2鉄イオン(Fe3+)を意味する。In the present invention, the developer preferably contains a chelating agent having a chelate stability constant of 8 or more with respect to iron ions. Here is the chelate stability constant:
L. G. Sillen A. E. Martell
Author, H “Stability Constant
s of Metal-ion Complexes”,
The Chemical Society,London
Don (1964). S. Chaberek・A. E
.. “Organic Seques” by John Martell.
tering Agents”, Wiley (1959)
. etc. means a commonly known constant. In the present invention, examples of the chelating agent having a chelate stability constant of 8 or more for iron ions include organic carboxylic acid chelating agents, organic phosphoric acid chelating agents, inorganic phosphoric acid chelating agents, and polyhydroxy compounds. Note that the above-mentioned iron ion means ferric ion (Fe3+).
【0028】本発明において第2鉄イオンとのキレート
安定度定数が8以上であるキレート剤の具体的化合物例
としては、下記化合物が挙げられるが、これらに限定さ
れるものではない。即ちエチレンジアミンジオルトヒド
ロキシフェニル酢酸、トリエチレンテトラミン六酢酸、
ジアミノプロパン四酢酸、ニトリロ三酢酸、ヒドロキシ
エチルエチレンジアミン三酢酸、ジヒドロキシエチルグ
リシン、エチレンジアミン二酢酸、エチレンジアミン二
プロピオン酸、イミノ二酢酸、ジエチレントリアミン五
酢酸、ヒドロキシエチルイミノ二酢酸、1,3−ジアミ
ノ−2−プロパノール四酢酸、トランスシクロヘキサン
ジアミン四酢酸、エチレンジアミン四酢酸、グリコール
エーテルジアミン四酢酸、エチレンジアミン−N,N,
N′,N′テトラキスメチレンホスホン酸、ニトリロ−
N,N,N−トリメチレンホスホン酸、1−ヒドロキシ
エチリデン−1,1−ジホスホン酸、1,1−ジホスホ
ノエタン−2−カルボン酸、2−ホスホノブタン−1,
2,4−トリカルボン酸、1−ヒドロキシ−1−ホスホ
ノプロパン−1,2,3−トリカルボン酸、カテコール
−3,5−ジスルホン酸、ピロリン酸ナトリウム、テト
ラポリリン酸ナトリウム、ヘキサメタリン酸ナトリウム
が挙げられる。In the present invention, specific examples of compounds of the chelating agent having a chelate stability constant of 8 or more with ferric ions include the following compounds, but are not limited thereto. Namely, ethylenediamine diorthohydroxyphenylacetic acid, triethylenetetraminehexaacetic acid,
Diaminopropanetetraacetic acid, nitrilotriacetic acid, hydroxyethylethylenediaminetriacetic acid, dihydroxyethylglycine, ethylenediaminediacetic acid, ethylenediaminedipropionic acid, iminodiacetic acid, diethylenetriaminepentaacetic acid, hydroxyethyliminodiacetic acid, 1,3-diamino-2- Propanoltetraacetic acid, transcyclohexanediaminetetraacetic acid, ethylenediaminetetraacetic acid, glycol etherdiaminetetraacetic acid, ethylenediamine-N,N,
N',N'tetrakismethylenephosphonic acid, nitrilo-
N,N,N-trimethylenephosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, 1,1-diphosphonoethane-2-carboxylic acid, 2-phosphonobutane-1,
Examples include 2,4-tricarboxylic acid, 1-hydroxy-1-phosphonopropane-1,2,3-tricarboxylic acid, catechol-3,5-disulfonic acid, sodium pyrophosphate, sodium tetrapolyphosphate, and sodium hexametaphosphate. .
【0029】また上記現像液にはジアルデヒド系硬膜剤
またはその重亜硫酸塩付加物が用いられるが、その具体
例を挙げればグルタールアルデヒド、又はこの重亜硫酸
塩付加物などがある。上記成分以外に用いられる添加剤
としては、臭化ナトリウム、臭化カリウム、沃化カリウ
ムの如き現像抑制剤:エチレングリコール、ジエチレン
グリコール、トリエチレングリコール、ジメチルホルム
アミド、メチルセロソルブ、ヘキシレングリコール、エ
タノール、メタノールの如き有機溶剤:1−フェニル−
5−メルカプトテトラゾール、2−メルカプトベンズイ
ミダゾール−5−スルホン酸ナトリウム塩等のメルカプ
ト系化合物、5−ニトロインダゾール等のインダゾール
系化合物、5−メチルベンズトリアゾール等のベンズト
リアゾール系化合物などのカブリ防止剤を含んでもよく
、ResearchDisclosure 第 176
巻、No. 17643、第XXI 項(12月号、1
978年)に記載された現像促進剤や更に必要に応じて
色調剤、界面活性剤、消泡剤、硬水軟化剤、特開昭56
−106244号記載のアミノ化合物などを含んでもよ
い。Further, a dialdehyde hardener or its bisulfite adduct is used in the developer, and specific examples include glutaraldehyde and its bisulfite adduct. Additives used in addition to the above components include development inhibitors such as sodium bromide, potassium bromide, and potassium iodide; ethylene glycol, diethylene glycol, triethylene glycol, dimethyl formamide, methyl cellosolve, hexylene glycol, ethanol, and methanol. Organic solvents such as: 1-phenyl-
Antifoggants such as mercapto compounds such as 5-mercaptotetrazole and 2-mercaptobenzimidazole-5-sulfonic acid sodium salt, indazole compounds such as 5-nitroindazole, and benztriazole compounds such as 5-methylbenztriazole. Research Disclosure No. 176
Volume, No. 17643, Section XXI (December Issue, 1
Development accelerators described in 1978) and, if necessary, color toning agents, surfactants, antifoaming agents, water softeners, and JP-A-56
It may also contain the amino compound described in No.-106244.
【0030】本発明の現像液には、ヨーロッパ特許公開
136582号、英国特許第958678号、米国特許
第3232761号、特開昭56−106244号に記
載のアルカノールアミンなどのアミノ化合物を現像促進
、コントラスト上昇その他の目的で用いることができる
。この他L.F.Aメイソン著「フオトグラフイック・
プロセシング・ケミストリー」、フォーカル・プレス刊
(1966年)の226〜229頁、米国特許第2,1
93,015号、同2,592,364号、特開昭48
−64933号などに記載のものを用いてもよい。The developing solution of the present invention contains amino compounds such as alkanolamines described in European Patent Publication No. 136582, British Patent No. 958678, US Pat. It can be used for elevating and other purposes. Besides this, L. F. A. Mason, “Photographic
"Processing Chemistry", Focal Press (1966), pp. 226-229, U.S. Patent No. 2,1
No. 93,015, No. 2,592,364, Japanese Unexamined Patent Publication No. 1973
-64933 etc. may be used.
【0031】定着液はチオ硫酸塩を含む水溶液であり、
pH3.8以上、好ましくは4.2〜7.0を有する。
定着剤としてはチオ硫酸ナトリウム、チオ硫酸アンモニ
ウムなどがあるが、定着速度の点からチオ硫酸アンモニ
ウムが特に好ましい。定着剤の使用量は適宜変えること
ができ、一般には約0.1〜約6モル/l である。定
着液には硬膜剤として作用する水溶液アルミニウム塩を
含んでもよく、それらには、例えば塩化アルミニウム、
硫酸アルミニウム、カリ明ばんなどがある。定着液には
、酒石酸、クエン酸、グルコン酸あるいはそれらの誘導
体を単独で、あるいは2種以上、併用することができる
。これらの化合物は定着液1lにつき0.005モル以
上含むものが有効で、特に0.01モル/l 〜0.0
3モル/l が特に有効である。定着液には所望により
保恒剤(例えば、亜硫酸塩、重亜硫酸塩)、pH緩衝剤
(例えば、酢酸、硼酸)、pH調整剤(例えば、硫酸)
、硬水軟化能のあるキレート剤や特開昭62−7855
1号記載の化合物を含むことができる。[0031] The fixing solution is an aqueous solution containing thiosulfate;
It has a pH of 3.8 or higher, preferably 4.2 to 7.0. Examples of the fixing agent include sodium thiosulfate and ammonium thiosulfate, and ammonium thiosulfate is particularly preferred from the viewpoint of fixing speed. The amount of fixing agent used can be varied as appropriate, and is generally about 0.1 to about 6 mol/l. The fixer may also contain aqueous aluminum salts that act as hardeners, including, for example, aluminum chloride,
Examples include aluminum sulfate and potassium alum. In the fixing solution, tartaric acid, citric acid, gluconic acid, or their derivatives can be used alone or in combination of two or more. It is effective to contain these compounds at 0.005 mol or more per liter of fixer, especially from 0.01 mol/l to 0.0 mol/l.
3 mol/l is particularly effective. The fixer may optionally contain preservatives (e.g. sulfites, bisulfites), pH buffers (e.g. acetic acid, boric acid), and pH adjusters (e.g. sulfuric acid).
, chelating agents with hard water softening ability and JP-A-62-7855
The compound described in No. 1 can be included.
【0032】本発明において「現像工程時間」又は「現
像時間」とは、処理する感光材料の先端が自現機の現像
タンク液に浸漬してから次の定着液に浸漬するまでの時
間、「定着時間」とは定着タンク液に浸漬してから次の
水洗タンク液(安定液)に浸漬するまでの時間「水洗時
間」とは、水洗タンク液に浸漬している時間をいう。ま
た「乾燥時間」とは、通常自現機には、35℃〜100
℃好ましくは40℃〜80℃の熱風が吹きつけられる乾
燥ゾーンが設置されており、その乾燥ゾーンに入ってい
る時間をいう。本発明の現像処理では、現像時間が5秒
〜1分、好ましくは10秒〜30秒、その現像温度は2
5℃〜50℃が好ましく、25℃〜40℃がより好まし
い。定着温度及び時間は約20℃〜約50℃で5秒〜1
分が好ましく、25℃〜40℃で10秒〜30秒がより
好ましい。水洗または安定浴温度及び時間は0〜50℃
で5秒〜1分が好ましく、15℃〜40℃で10秒から
30秒がより好ましい。本発明の方法によれば、現像、
定着及び水洗(又は安定化)された写真材料は水洗水を
しぼり切る、すなわちスクイズローラーを経て乾燥され
る。乾燥は約40℃〜約100℃で行なわれ、乾燥時間
は周囲の状態によって適宜変えられるが、通常は約5秒
〜1分でよく、特により好ましくは40℃〜80℃で約
5秒〜30秒である。In the present invention, the term "developing process time" or "developing time" refers to the time from when the leading edge of the photosensitive material to be processed is immersed in the developing tank solution of the automatic processing machine until it is immersed in the next fixing solution. "Fixing time" is the time from immersion in the fixing tank liquid until immersion in the next washing tank liquid (stabilizing liquid). "Washing time" refers to the time during which the film is immersed in the washing tank liquid. In addition, "drying time" is usually 35℃ to 100℃ for automatic processors.
A drying zone is installed in which hot air, preferably 40°C to 80°C, is blown, and the term refers to the time spent in the drying zone. In the development process of the present invention, the development time is 5 seconds to 1 minute, preferably 10 seconds to 30 seconds, and the development temperature is 2
5°C to 50°C is preferable, and 25°C to 40°C is more preferable. Fixing temperature and time are approximately 20℃ to approximately 50℃ for 5 seconds to 1
minutes is preferred, and 10 seconds to 30 seconds at 25°C to 40°C is more preferred. Water washing or stabilization bath temperature and time are 0 to 50℃
The temperature is preferably 5 seconds to 1 minute, and more preferably 10 seconds to 30 seconds at 15°C to 40°C. According to the method of the present invention, development,
The fixed and washed (or stabilized) photographic material is dried by squeezing out the washing water, ie passing through a squeeze roller. Drying is carried out at a temperature of about 40°C to about 100°C, and the drying time can be changed as appropriate depending on the surrounding conditions, but it is usually about 5 seconds to 1 minute, particularly preferably about 5 seconds to 1 minute at 40°C to 80°C. It is 30 seconds.
【0033】本発明の現像液を適用するのに好ましい感
光材料は、特に制限がなく、一般の黒白感光材料が主と
して適用される他に、例えばカラー反転感光材料の第1
現像液としても用いることができる。特に医療画像を記
録するレーザープリンター用感光材料や印刷用スキャナ
ー感光材料、並びに医療用直接X線感光材料、間接X線
感光材料、CRT感光材料、X線シネマ撮影用感光材料
、撮影用黒白ネガフィルム、黒白印画紙、マイクロフィ
ルム、などがある。The preferred photosensitive material to which the developer of the present invention is applied is not particularly limited, and general black and white photosensitive materials are mainly applicable, as well as, for example, the first color reversal photosensitive material.
It can also be used as a developer. In particular, photosensitive materials for laser printers and scanner photosensitive materials for printing that record medical images, direct X-ray photosensitive materials for medical use, indirect X-ray photosensitive materials, CRT photosensitive materials, photosensitive materials for X-ray cinema photography, and black and white negative films for photography. , black and white photographic paper, microfilm, etc.
【0034】本発明の処理方法が適用できるハロゲン化
銀写真感光材料は支持体とその上に塗布された少なくと
も一つのハロゲン化銀乳剤からなる。また、ハロゲン化
銀乳剤層は支持体の片側だけでなく両面に塗布されるこ
ともできる。もちろん、必要によりバック層、アンチハ
レーション層、中間層、最上層(例えば、保護層)など
を有することができる。ハロゲン化銀乳剤は塩化銀、沃
化銀、臭化銀、塩臭化銀、沃臭化銀、塩沃臭化銀の如き
ハロゲン化銀を親水性コロイドに分散したものである。
ハロゲン化銀乳剤は、通常当業界でよく知られた方法(
例えば、シングルジエット法、ダブルジエット法、コン
トロールジエット法など)によって水溶性銀塩(例えば
、硝酸銀)と水溶性ハロゲン塩とを水及び親水性コロイ
ドの存在下で混合し、物理熟成及び金増感及び/又は硫
黄増感などの化学熟成を経て製造される。このようにし
て得られた乳剤には、立方体、8面体、球状の他Res
earch Disclosure 22534(Ja
nuary 1983)に記載された高アスペクト比の
平板状のハロゲン化銀粒子を用いることができる。また
特公昭41−2068号に記載された内部潜像型ハロゲ
ン化銀粒子と表面潜像型ハロゲン化銀粒子と組合せて用
いることもできる。A silver halide photographic material to which the processing method of the present invention can be applied comprises a support and at least one silver halide emulsion coated thereon. Furthermore, the silver halide emulsion layer can be coated not only on one side of the support but also on both sides. Of course, a back layer, an antihalation layer, an intermediate layer, a top layer (for example, a protective layer), etc. can be included if necessary. A silver halide emulsion is one in which silver halides such as silver chloride, silver iodide, silver bromide, silver chlorobromide, silver iodobromide, and silver chloroiodobromide are dispersed in a hydrophilic colloid. Silver halide emulsions are typically prepared by methods well known in the art (
For example, a water-soluble silver salt (for example, silver nitrate) and a water-soluble halide salt are mixed in the presence of water and a hydrophilic colloid by a single jet method, a double jet method, a controlled jet method, etc., and then physically ripened and gold sensitized. and/or produced through chemical ripening such as sulfur sensitization. The emulsion thus obtained has cubic, octahedral, spherical, and Res
arch Disclosure 22534 (Ja
High aspect ratio tabular silver halide grains described in Nuary (1983) can be used. It can also be used in combination with internal latent image type silver halide grains and surface latent image type silver halide grains described in Japanese Patent Publication No. 41-2068.
【0035】ハロゲン化銀乳剤は、その製造工程中又は
塗布直前で、分光増感剤(例えば、シアニン色素、メロ
シアニン色素又はその混合物)、安定剤(例えば、4−
ヒドロキシ−6−メチル−1,3,3a,7−テトラザ
インデン)、増感剤(例えば、米国特許第3,619,
198号明細書に記載の化合物)、カブリ防止剤(例え
ば、ベンゾトリアゾール、5−ニトロベンズイミダゾー
ル、ポリエチレンオキサイド、硬膜剤、塗布助剤(例え
ば、サポニン、ソジウムラウリルアルフェート、ドデシ
ルフェノールポリエチレンオキサイドエーテル、ヘキサ
デシルトリメチルアンモニウムブロマイド)などを添加
することができる。この様にして製造されたハロゲン化
銀乳剤はセルロースアセテートフィルム、ポリエチレン
テレフタレートフィルムなどの支持体にデイップ法、エ
アーナイフ法、ビード法、エクストルージョンドクター
法、両面塗布法などによって塗布乾燥される。Silver halide emulsions are prepared with spectral sensitizers (for example, cyanine dyes, merocyanine dyes or mixtures thereof), stabilizers (for example, 4-
hydroxy-6-methyl-1,3,3a,7-tetrazaindene), sensitizers (e.g., U.S. Pat. No. 3,619,
No. 198), antifoggants (e.g. benzotriazole, 5-nitrobenzimidazole, polyethylene oxide, hardeners, coating aids (e.g. saponin, sodium lauryl alphate, dodecylphenol polyethylene oxide) ether, hexadecyltrimethylammonium bromide), etc.The silver halide emulsion thus produced can be coated on a support such as cellulose acetate film or polyethylene terephthalate film by dipping method, air knife method, bead method, etc. It is applied and dried using extrusion doctor method, double-sided coating method, etc.
【0036】特に、X−レイ処理においては平板状のハ
ロゲン化銀粒子を用いることが好ましい。上記の平板状
粒子である場合の好ましい粒子形態としてはアスペクト
比4以上20未満、より好ましくは5以上10未満であ
る。さらに粒子の厚みは0.3μ以下が好ましく、特に
0.2μ以下が好ましい。ここで、平板状粒子のアスペ
クト比は平板状粒子個々の粒子の投影面積と等しい面積
を有する円の直径の平均値と平板状粒子個々の粒子厚み
の平均値との比で与えられる。平板状粒子は全粒子の好
ましくは80重量%、より好ましくは90重量%以上存
在することが好ましい。平板状ハロゲン化銀乳剤は、そ
の製造工程中又は塗布直前で、分光増感剤(例えば、シ
アニン色素、メロシアニン色素又はその混合物)、安定
剤(例えば、4−ヒドロキシ−6−メチル−1,3,3
a,7−テトラザインデン)、増感剤(例えば、米国特
許第3,619,198号明細書に記載の化合物)、カ
ブリ防止剤(例えば、ベンゾトリアゾール、5−ニトロ
ベンツイミダゾール、ポリエチレンオキサイド、硬膜剤
、塗布助剤(例えば、サポニン、ソジウムラウリルサル
フェート、ドデシルフェノールポリエチレンオキサイド
エーテル、ヘキサデシルトリメチルアンモニウムブロマ
イド)などを添加することができる。この様にして製造
された平板状ハロゲン化銀乳剤はセルロースアセテート
フィルム、ポリエチレンテレフタレートフィルムなどの
支持体にデイップ法、エアーナイフ法、ビード法、エク
ストルージッンドクター法、両面塗布法などによって塗
布乾燥される。次に本発明の方法を実施例で説明するが
、本発明はこれに限定されるものではない。In particular, it is preferable to use tabular silver halide grains in the X-ray treatment. In the case of the above-mentioned tabular grains, the preferred grain form is an aspect ratio of 4 or more and less than 20, more preferably 5 or more and less than 10. Further, the thickness of the particles is preferably 0.3μ or less, particularly preferably 0.2μ or less. Here, the aspect ratio of a tabular grain is given by the ratio of the average value of the diameter of a circle having an area equal to the projected area of each individual tabular grain to the average value of the grain thickness of each tabular grain. It is preferred that the tabular grains are present in an amount of preferably 80% by weight or more, more preferably 90% by weight or more of the total grains. Tabular silver halide emulsions are prepared by adding spectral sensitizers (e.g. cyanine dyes, merocyanine dyes or mixtures thereof), stabilizers (e.g. 4-hydroxy-6-methyl-1,3 ,3
a,7-tetrazaindene), sensitizers (e.g., the compounds described in U.S. Pat. No. 3,619,198), antifoggants (e.g., benzotriazole, 5-nitrobenzimidazole, polyethylene oxide, Hardeners, coating aids (e.g., saponin, sodium lauryl sulfate, dodecylphenol polyethylene oxide ether, hexadecyltrimethylammonium bromide), etc. can be added to the tabular silver halide emulsion produced in this way. is coated and dried on a support such as a cellulose acetate film or a polyethylene terephthalate film by a dipping method, an air knife method, a bead method, an extrusion doctor method, a double-sided coating method, etc. Next, the method of the present invention will be described in Examples. However, the present invention is not limited thereto.
【0037】[0037]
【実施例】次に、本発明について具体的に説明する。
実施例−1
(1)平板状粒子の調製
乳剤の調製
水1リットル中に臭化カリ5g、沃化カリ0.05g、
ゼラチン30g、チオエーテル
HO(CH2)2S(CH2)2S(CH2)2OHの
5%水溶液2.5ccを添加し73℃に保った溶液中へ
、攪拌しながら硝酸銀8.33gの水溶液と臭化カリ5
.94g、沃化カリ0.726gを含む水溶液とをダブ
ルジェット法により45秒間で添加した。続いて臭化カ
リ2.5gを添加したのち、硝酸銀8.33gを含む水
溶液を26分かけて、添加終了時の流量が添加開始時の
2倍になるように添加した。
このあと25%のアンモニア溶液20cc、50%NH
4 NO3 10ccを添加して20分間物理熟成した
のち1Nの硫酸240ccを添加して中和した。引き続
いて硝酸銀153.34gの水溶液と臭化カリの水溶液
を電位をpAg 8.2に保ちながらコントロールダブ
ルジェット法で40分間で添加した。この時の流量は添
加終了後の流量が、添加開始時の流量の9倍となるよう
加速した。添加終了後2Nのチオシアン酸カリウム溶液
15ccを添加し、さらに1%の沃化カリ水溶液25c
cを30秒かけて添加した。このあと温度を35℃に下
げ、沈降法により可溶性塩類を除去したのち、40℃昇
温してゼラチン30gとフェノール2gを添加し、苛性
ソーダを臭化カリによりpH6.40、pAg 8.1
0に調整した。[Example] Next, the present invention will be explained in detail. Example-1 (1) Preparation of tabular grains Preparation of emulsion In 1 liter of water, 5 g of potassium bromide, 0.05 g of potassium iodide,
30 g of gelatin and 2.5 cc of a 5% aqueous solution of thioether HO(CH2)2S(CH2)2S(CH2)2OH were added and kept at 73°C, and with stirring, an aqueous solution of 8.33 g of silver nitrate and 5 ml of potassium bromide were added.
.. 94 g of potassium iodide and an aqueous solution containing 0.726 g of potassium iodide were added in 45 seconds using a double jet method. Subsequently, 2.5 g of potassium bromide was added, and then an aqueous solution containing 8.33 g of silver nitrate was added over 26 minutes so that the flow rate at the end of the addition was twice that at the beginning of the addition. After this, 20cc of 25% ammonia solution, 50% NH
4 After adding 10 cc of NO3 and physically ripening for 20 minutes, 240 cc of 1N sulfuric acid was added to neutralize. Subsequently, an aqueous solution of 153.34 g of silver nitrate and an aqueous solution of potassium bromide were added in 40 minutes by a controlled double jet method while maintaining the potential at pAg 8.2. The flow rate at this time was accelerated so that the flow rate after the addition was completed was nine times the flow rate at the start of the addition. After the addition was completed, 15 cc of 2N potassium thiocyanate solution was added, followed by 25 cc of 1% potassium iodide aqueous solution.
c was added over 30 seconds. After that, the temperature was lowered to 35°C and soluble salts were removed by the sedimentation method, and then the temperature was raised to 40°C, 30g of gelatin and 2g of phenol were added, and the caustic soda was adjusted to pH 6.40 and pAg 8.1 with potassium bromide.
Adjusted to 0.
【0038】温度を56℃に昇温したのち、増感色素を
600mgと安定化剤150mgを添加した。After raising the temperature to 56° C., 600 mg of sensitizing dye and 150 mg of stabilizer were added.
【0039】[0039]
【化5】[C5]
【0040】添加の10分後にチオ硫酸ナトリウム5水
和物2.4mg、チオシアン酸カリ140mg、塩化金
酸2.1mgを各々の乳剤に添加し、80分後に急冷し
て固化させて乳剤とした。得られた乳剤は全粒子の投影
面積の総和の98%がアスペクト比3以上の粒子からな
り、アスペクト比2以上すべての粒子についての平均の
投影面積直径は1.4μm、標準偏差22%、厚みの平
均は0.187μmでアスペクト比は7.5であった。Ten minutes after the addition, 2.4 mg of sodium thiosulfate pentahydrate, 140 mg of potassium thiocyanate, and 2.1 mg of chloroauric acid were added to each emulsion, and after 80 minutes, the emulsions were rapidly cooled and solidified to form an emulsion. . In the obtained emulsion, 98% of the total projected area of all grains consists of grains with an aspect ratio of 3 or more, and the average projected area diameter of all grains with an aspect ratio of 2 or more is 1.4 μm, standard deviation 22%, and thickness. The average was 0.187 μm and the aspect ratio was 7.5.
【0041】乳剤塗布液の調製
乳剤にハロゲン化銀1モルあたり、下記の薬品を添加し
て塗布液とした。
・ゼラチン 銀/バインダー比
(ゼラチン+ポリマー)が0.7にな
るよう添加量を調整・水
溶液ポリエステル 20%(wt%対ゼラチン)
・ポリマーラテックス(ポリ(エチルアクリレート/メ
タクリル酸) =97/3)
25.0g・硬膜剤
1,2−ビス(スルホニルアセトアミド)エタ
ン 8ミリモル/表面保護
層の乳剤層のge
l.
100g当たり・フェノキシエタノール
2gPreparation of Emulsion Coating Solution The following chemicals were added to the emulsion per mole of silver halide to prepare a coating solution.・Gelatin Silver/binder ratio (gelatin + polymer) is 0.7.
Adjust the amount added to ensure that ・Aqueous polyester 20% (wt% to gelatin)
・Polymer latex (poly(ethyl acrylate/methacrylic acid) = 97/3)
25.0g・Hardening agent 1,2-bis(sulfonylacetamido)ethane 8 mmol/Surface protection
layer emulsion layer ge
l.
Per 100g/Phenoxyethanol
2g
【0042
】0042
]
【化6】[C6]
【0043】
・2,6−ビス(ヒドロキシアミノ)−4−ジエチルア
ミノ− 1,3,5−トリアジン
80mg・ポリアクリル酸ナトリウム
(平均分子量4.1万)
4.0g・ポリスチレンスルホン酸カリウム(平均
分子量60万) 1.0g前記
塗布液を表面保護層塗布液と同時に厚み175μmの透
明PET支持体上に塗布した。・2,6-bis(hydroxyamino)-4-diethylamino-1,3,5-triazine
80mg・Sodium polyacrylate (average molecular weight 41,000)
4.0 g of potassium polystyrene sulfonate (average molecular weight: 600,000) 1.0 g The above coating solution was coated on a 175 μm thick transparent PET support simultaneously with the surface protective layer coating solution.
【0044】塗布銀量は両面合計で3.2g/m2とし
た。表面保護層は各成分が、下記の塗布量となるように
調製した。
表面保護層の内容
塗布量・ゼラチン
1.15g/m2・ポリアクリル
アミド(平均分子量4.5万)
0.25・ポリアクリル酸ソー
ダ(平均分子量40万)
0.02・p−t−オクチルフェノキ
シジグリセリルブチルフルホン 化物のナトリウ
ム塩
0.02・ポ
リ(メチルメタクリレート/メタクリレート)(モル比
7:3、平均粒径2.5μm)
0.
020・ポリ(重合度10)オキシエチレンセチルエー
テル 0.035・ポリ(
重合度10)オキシエチレン−ポリ(重合度3)
オキシグリセリル−p−オクチルフェノキシエーテル
0.01・C8 F17SO
3 K
0.0
03[0044] The total amount of coated silver on both sides was 3.2 g/m2. The surface protective layer was prepared so that each component had the following coating amount. Contents of surface protective layer
Application amount/gelatin
1.15g/m2・Polyacrylamide (average molecular weight 45,000)
0.25 Sodium polyacrylate (average molecular weight 400,000)
0.02・pt-octylphenoxydiglyceryl butyl fluoronate sodium salt
0.02・Poly(methyl methacrylate/methacrylate) (molar ratio 7:3, average particle size 2.5 μm)
0.
020・Poly(degree of polymerization 10) oxyethylene cetyl ether 0.035・Poly(
Polymerization degree 10) Oxyethylene-poly(polymerization degree 3)
Oxyglyceryl-p-octylphenoxy ether 0.01・C8 F17SO
3K
0.0
03
【0045】[0045]
【化7】[C7]
【0046】
・プロキセル
0.001・ポリメチルメタクリレート(
平均粒径3.5μm) 0
.025・Proxel
0.001・Polymethyl methacrylate (
Average particle size 3.5μm) 0
.. 025
【0047】(2)現像液の調製
現像濃縮液パートA、パートB、パートCおよびスター
ターの処方を示す。
パートA
10リットル用 水酸化カリウム
291g 亜
硫酸カリウム
442g 炭酸水素ナトリウム
75g ホウ酸
10g ハイドロキノン
300g ジエチ
レングリコール
1
20g 5−メチルベンゾトリアゾール
0.2g 臭化カリウム
15g 水を加
えて
2.
5リットルパートB
10リットル用 トリエチレング
リコール
200g
氷酢酸
40g 5−ニトロインダゾ
ール
2.5g 1−
フェニル−3−ピラゾリドン
15g
水を加えて
250mlパートC
10リットル用
グルタールアルデヒド(50wt%)
1
00g メタ重亜硫酸ナトリウム
126g 水を加えて
250mlス
ターター
氷酢酸
150g 臭化カリウム
30
0g 水を加えて
1.5リットル使用液の調製法は、水を約6
lにパートA2.5l、パートB400ml、パートC
250mlを順次攪拌しながら添加溶解して最後に水で
10リットルとし、pHを10.40に調整した。この
使用液を現像補充液とする。この補充液1リットルに対
して前記スターターを20mlの割合で添加した。この
液が現像液であり、ランニングスタート時に使用するも
のである。上記現像補充液を用いて、表1のような現像
液を調製した。その後pHを10.40に調整した。(2) Preparation of developer The formulations of developer concentrate part A, part B, part C and starter are shown below. Part A
Potassium hydroxide for 10 liters
291g potassium sulfite
442g sodium bicarbonate
75g boric acid
10g hydroquinone
300g diethylene glycol
1
20g 5-methylbenzotriazole
0.2g potassium bromide
Add 15g water
2.
5 liter part B
Triethylene glycol for 10 liters
200g
glacial acetic acid
40g 5-nitroindazole
2.5g 1-
Phenyl-3-pyrazolidone
15g
add water
250ml part C
Glutaraldehyde (50wt%) for 10 liters
1
00g sodium metabisulfite
126g add water
250ml starter glacial acetic acid
150g potassium bromide
30
Add 0g water
To prepare 1.5 liters of liquid, add approximately 6 liters of water.
Part A 2.5l, Part B 400ml, Part C
250 ml of the solution was sequentially added and dissolved while stirring, and finally the volume was made up to 10 liters with water, and the pH was adjusted to 10.40. This used solution is used as a developer replenisher. The starter was added at a ratio of 20 ml to 1 liter of this replenisher. This liquid is the developer and is used at the start of running. A developer as shown in Table 1 was prepared using the above developer replenisher. The pH was then adjusted to 10.40.
【0048】[0048]
【表1】[Table 1]
【0049】次に、各種現像液を使用してローラー搬送
型自現機FPM−9000(富士写真フイルム社製)に
より以下に示すような現像処理を行った。
処理工程 温度 時間
補充量現像 35℃
14秒 30ml/10×12インチ(
4切りサイズ)定着 32℃ 11秒
40ml/10×12インチ(4切りサイ
ズ)水洗 20℃ 10秒(*)
3リットル/1分間乾燥 55℃
10秒 計 45秒
(*水洗とスクイズのトータルの時間)なお、定着
液は富士F(富士写真フイルム社製)を用いた。Next, using various developing solutions, the following development treatments were carried out using a roller conveyance type automatic processing machine FPM-9000 (manufactured by Fuji Photo Film Co., Ltd.). Treatment process Temperature Time
Replenishment amount development 35℃
14 seconds 30ml/10 x 12 inches (
4-cut size) Fixation 32℃ 11 seconds 40ml/10 x 12 inches (4-cut size) Washing with water 20℃ 10 seconds (*)
Dry 3 liters/1 minute at 55℃
10 seconds, total 45 seconds (*total time of washing and squeezing) Fuji F (manufactured by Fuji Photo Film Co., Ltd.) was used as the fixing solution.
【0050】この感光材料の写真性のチエックとしてセ
ンシトメーターを用いて光学ウエッジで階段的な露光を
与えた。また自現機は週に6日間稼働させ、稼働日には
1日当り、ハーフ露光した4切サイズ(10インチ×1
2インチ)を50枚処理した。前記のようなランニング
実験を計3週間続けた。トータル処理枚数は900枚で
あった。表2にランニング実験による写真性、銀汚れの
結果を示す。感度は、カブリ値+1.0の黒化度を得る
のに必要な露光量の逆数の相対値として求めた。カブリ
値は、ベース濃度を補正した正味の濃度増加として測定
した。平均階調Gは、カブリ+0.25の濃度とカブリ
+2.0の濃度点を結ぶ直線の傾きとして表わした。D
m は最大濃度を表わす。To check the photographic properties of this light-sensitive material, stepwise exposure was applied using an optical wedge using a sensitometer. In addition, the automatic developing machine is operated 6 days a week, and on the working days, 4 half-exposed 4-cut sizes (10 inches x 1
2 inch) were processed. The running experiment as described above was continued for a total of 3 weeks. The total number of sheets processed was 900 sheets. Table 2 shows the photographic properties and silver stain results from the running experiment. The sensitivity was determined as a relative value of the reciprocal of the exposure amount required to obtain a degree of blackening of fog value +1.0. Fog values were measured as the net density increase corrected for the base density. The average gradation G was expressed as the slope of a straight line connecting the density point of fog+0.25 and the density point of fog+2.0. D
m represents the maximum concentration.
【0051】[0051]
【表2】[Table 2]
【0052】表2の結果より次のことがいえる。現像液
NO−1(比較例)で処理した場合、銀汚れが発生し、
自現機による迅速処理に耐えられる性能ではない。一方
本発明の化合物を使用した現像液NO−2〜NO−4は
、銀汚れの発生が非常に少なく本発明の目的を達成でき
た。また予想外のことに感度が10〜15%上昇し、ラ
ンニングによっても感度は安定であった。From the results in Table 2, the following can be said. When processed with developer NO-1 (comparative example), silver stains occur,
The performance is not high enough to withstand rapid processing using an automatic processing machine. On the other hand, developing solutions NO-2 to NO-4 using the compounds of the present invention had very little silver staining and were able to achieve the object of the present invention. Moreover, unexpectedly, the sensitivity increased by 10 to 15%, and the sensitivity remained stable even with running.
【0053】実施例−2
(1)ハロゲン化銀乳剤の調製
ゼラチンと臭化カリウムと水が入った55℃に加温され
た容器に適当量のアンモニアを入れた後、反応容器中の
pAg 値を7.60に保ちつつ硝酸銀水溶液と銀に対
するイリジウムのモル比で10−7モルとなるようにヘ
キサクロロイリジウム(III )酸塩を添加した臭化
カリウム水溶液とをダブルジェット法により添加して平
均粒子サイズが0.70μと0.40μの単分散臭化銀
乳剤粒子2種類をアンモニアの量を変えて調製した。こ
れらの乳剤粒子は、平均粒子サイズの±40%以内に全
粒子数の98%が存在していた。また粒子形成の後期に
銀1モル当たり1×10−3モルのヨウ化カリウムを添
加した。これらの乳剤を脱塩処理後、pHを6.2、p
Ag を8.6に合わせてからチオ硫酸ナトリウムと塩
化金酸とにより金・硫黄増感を行い所望の写真性を得た
。これらの乳剤の(100)面/(111)面比率をク
ベルカムンク法で測定したところ93/7であった。Example 2 (1) Preparation of silver halide emulsion After putting an appropriate amount of ammonia into a container heated to 55°C containing gelatin, potassium bromide and water, the pAg value in the reaction container was determined. A silver nitrate aqueous solution and a potassium bromide aqueous solution to which hexachloroiridate (III) salt was added so that the molar ratio of iridium to silver was 10-7 mol were added by a double jet method while maintaining the average particle size at 7.60. Two types of monodisperse silver bromide emulsion grains with sizes of 0.70μ and 0.40μ were prepared with varying amounts of ammonia. These emulsion grains had 98% of the total number of grains within ±40% of the average grain size. Also, 1.times.10@-3 mole of potassium iodide was added per mole of silver at a later stage of grain formation. After desalting these emulsions, the pH was adjusted to 6.2, p
After adjusting the Ag to 8.6, gold/sulfur sensitization was performed using sodium thiosulfate and chloroauric acid to obtain desired photographic properties. The (100) plane/(111) plane ratio of these emulsions was measured by the Kubelkamunk method and was found to be 93/7.
【0054】(2)乳剤塗布液の調製
上記2種の乳剤をそれぞれ0.5kg秤取した容器を4
0℃に加温して乳剤を溶解後、赤外域増感色素のメタノ
ール溶液(9×10−4モル/l )を30cc、下記
の強色増感剤の水溶液(4.4×10−3モル/l )
130cc、感材保存性改良剤のメタノール溶液(2.
8×10−2モル/l )35cc、4−ヒドロキシ−
6−メチル−1,3,3a,7−テトラザインデン水溶
液、塗布助剤ドデシルベンゼンスルフォン酸塩水溶液、
増粘剤ポリポタシウム−p−ビニルベンゼンスルフォネ
ート化合物の水溶液を添加して乳剤塗布液とした。(2) Preparation of emulsion coating solution Weighed 0.5 kg of each of the above two types of emulsions into a container containing 4
After heating to 0°C to dissolve the emulsion, 30 cc of a methanol solution of an infrared sensitizing dye (9 x 10-4 mol/l) and an aqueous solution of the following supersensitizer (4.4 x 10-3 mol/l)
130cc, methanol solution of photosensitive material storage improver (2.
8 x 10-2 mol/l) 35cc, 4-hydroxy-
6-methyl-1,3,3a,7-tetrazaindene aqueous solution, coating aid dodecylbenzenesulfonate aqueous solution,
An aqueous solution of a thickener polypotassium-p-vinylbenzenesulfonate compound was added to prepare an emulsion coating solution.
【0055】[0055]
【化8】[Chemical formula 8]
【0056】(強色増感剤)4,4′−ビス〔2,6−
ジ(2−ナフトキシ)ピリミジン−4−イルアミノ〕ス
チルベン−2,2′−ジスルホン酸ジナトリウム塩(Supersensitizer) 4,4'-bis[2,6-
Di(2-naphthoxy)pyrimidin-4-ylamino]stilbene-2,2'-disulfonic acid disodium salt
【0
057】(3)感材層の表面保護層用塗布液の調製40
℃に加温された10wt%ゼラチン水溶液に、増粘剤ポ
リスチレンスルフォン酸ソーダ水溶液、マット剤ポリメ
チルメタクリレート微粒子(平均粒子サイズ3.0μm
)、硬膜剤N,N′−エチレンビス−(ビニルスルフォ
ニルアセトアミド)、塗布助剤t−オクチルフェノキシ
エトキシエタンスルフォン酸ナトリウム水溶液および帯
電防止剤としてポリエチレン系界面活性剤水溶液および
下記構造の含フッ素化合物の水溶液とを添加して塗布液
とした。
C8F17SO2N(C3H7)CH2COOK およ
びC8F17SO2N(C3H7)(CH2CH2O)
15H0
(3) Preparation of coating solution for surface protective layer of sensitive material layer 40
To a 10 wt % aqueous gelatin solution heated to ℃, a thickener polystyrene sulfonate aqueous solution and a matting agent polymethyl methacrylate fine particles (average particle size 3.0 μm) were added.
), a hardening agent N,N'-ethylenebis-(vinylsulfonylacetamide), a coating aid aqueous solution of sodium t-octylphenoxyethoxyethanesulfonate, an aqueous polyethylene surfactant solution as an antistatic agent, and a fluorine-containing compound having the following structure. A coating solution was prepared by adding an aqueous solution of . C8F17SO2N(C3H7)CH2COOK and C8F17SO2N(C3H7)(CH2CH2O)
15H
【0058】(4)バック塗布液の調製40℃に
加温された10wt%ゼラチン水溶液に、1kgに、増
粘剤ポリスチレンスルフォン酸ソーダ水溶液、下記のバ
ック染料水溶液(5×10−2モル/l )50cc、
硬膜剤N,N′−エチレンビス−(ビニルスルフォニル
アセトミド)水溶液、塗布助剤t−オクチルフェノキシ
エトキシエタンスルフォン酸ナトリウム水溶液とを加え
塗布液とした。(4) Preparation of back coating solution Add 1 kg of a 10 wt % aqueous gelatin solution heated to 40°C, a thickener sodium polystyrene sulfonate aqueous solution, and the following back dye aqueous solution (5 x 10 -2 mol/l). )50cc,
A coating solution was prepared by adding an aqueous solution of N,N'-ethylenebis-(vinylsulfonylacetomide) as a hardener and an aqueous solution of sodium t-octylphenoxyethoxyethanesulfonate as a coating aid.
【0059】[0059]
【化9】[Chemical formula 9]
【0060】(5)バック層の表面保護層用塗布液の調
製
40℃に加温された10wt%ゼラチン水溶液に、増粘
剤ポリスチレンスルフォン酸ソーダ水溶液、マット剤ポ
リメチルメタクリレート微粒子(平均粒子サイズ3.0
μm)、塗布助剤t−オクチルフェノキシエトキシエタ
ンスルフォン酸ナトリウム水溶液および帯電防止剤とし
てポリエチレン系界面活性剤水溶液および下記構造の含
フッ素化合物の水溶液とを添加して塗布液とした。
C8F17SO2N(C3H7)CH2COOKおよび
C8F17SO2N(C3H7)(CH2CH2O)1
5H(5) Preparation of coating solution for surface protective layer of back layer A 10 wt % gelatin aqueous solution heated to 40°C, a thickener polystyrene sulfonate aqueous solution, and a matting agent polymethyl methacrylate fine particles (average particle size 3) .0
μm), an aqueous solution of sodium t-octylphenoxyethoxyethanesulfonate as a coating aid, an aqueous polyethylene surfactant solution as an antistatic agent, and an aqueous solution of a fluorine-containing compound having the following structure were added to prepare a coating solution. C8F17SO2N(C3H7)CH2COOK and C8F17SO2N(C3H7)(CH2CH2O)1
5H
【0061】(6)塗布試料の作成
前述のバック層塗布液をバック層の表面保護層塗布液と
ともにポリエチレンテレフタレート支持体の一方の側に
ゼラチン塗布量が4g/m2となるように塗布した。こ
れに続いて支持体の反対の側に(2)で述べた近赤外増
感色素入りの乳剤塗布液とこれ用の表面保護層塗布液と
を塗布銀量が2.6g/m2となるように、また塗布膜
の膨潤百分率を120%となるように表面保護層塗布膜
中の硬膜剤量を調節して塗布した。(6) Preparation of coating sample The above-mentioned back layer coating solution was coated on one side of a polyethylene terephthalate support together with the back layer surface protective layer coating solution so that the gelatin coating amount was 4 g/m 2 . Subsequently, on the opposite side of the support, coat the emulsion coating solution containing the near-infrared sensitizing dye mentioned in (2) and the surface protective layer coating solution for this so that the amount of silver is 2.6 g/m2. The amount of hardening agent in the surface protective layer coating film was adjusted so that the swelling percentage of the coating film was 120%.
【0062】(7)膨潤率の測定法
a)38℃、50%相対湿度で塗布試料をインキュベー
ション処理し、b)層の厚みを測定し、c)21℃の蒸
留水に3分間浸漬し、そしてd)工程b)で測定した層
の厚みと比較して層の厚みの変化の百分率を測定する。(7) Swelling rate measurement method a) Incubate the coated sample at 38°C and 50% relative humidity, b) Measure the layer thickness, c) Immerse in distilled water at 21°C for 3 minutes, and d) measuring the percentage change in layer thickness compared to the layer thickness measured in step b).
【0063】次に現像濃縮液と定着濃縮液の処方を示す
。
現像濃縮液(2.5倍濃縮)
水酸化カリウム
43g 亜硫酸ナトリウム
100g 亜
硫酸カリウム
126g ジエチレントリアミン五酢酸
5g ホウ酸
20g ハイドロキノン
85g 4−ヒドロ
キシメチル−4−メチル−1−フェニル −3−
ピラゾリドン
4g ジエチレングリコール
75g 5−メチルベンゾトリ
アゾール
0.2g 臭化カリウム
10g 水で1リットルとする (pH10.
65に調整する)上記濃縮液を次のように希釈して使用
液とした。
現像濃縮液400ml+水600ml=使用液(pH1
0.35に調整する)Next, the formulations of the developing concentrate and the fixing concentrate will be shown. Developer concentrate (2.5 times concentrated) Potassium hydroxide
43g sodium sulfite
100g potassium sulfite
126g diethylenetriaminepentaacetic acid
5g boric acid
20g hydroquinone
85g 4-hydroxymethyl-4-methyl-1-phenyl-3-
Pyrazolidone
4g diethylene glycol
75g 5-methylbenzotriazole
0.2g potassium bromide
Make up to 1 liter with 10g water (pH 10.
65) The above concentrated solution was diluted as follows to obtain a working solution. 400 ml of developer concentrate + 600 ml of water = working solution (pH 1
(adjust to 0.35)
【0064】
定着濃縮液(4倍濃縮)
チオ硫酸アンモニウム
500g エチレンジアミン四酢酸二ナトリ
ウム二水塩
0.1g チオ硫酸ナトリウム五水塩
50g 亜硫酸ナトリウム
60g
水酸化ナトリウム
25g 酢酸
100
g 水で1リットルとする (pH5.1に調整す
る)上記濃縮液を次のように希釈して使用液とした。
定着濃縮液250ml+水750ml=使用液(pH5
.0に調整する)Fixing concentrate (4 times concentrated) Ammonium thiosulfate
500g Ethylenediaminetetraacetic acid disodium dihydrate
0.1g Sodium thiosulfate pentahydrate
50g sodium sulfite
60g
Sodium hydroxide
25g acetic acid
100
g The concentrate was made up to 1 liter with water (adjusted to pH 5.1) and used as a working solution by diluting the above concentrated solution as follows. 250 ml of fixing concentrate + 750 ml of water = working solution (pH 5
.. (adjust to 0)
【0065】次に前述した現像液(使用液)を用いて、
実施例1の現像液サンプルNO−1〜4と同様のサンプ
ルを調製し、ローラー搬送型自現機(パス長=1550
mm)により、以下に示すような、現像処理を行った。
処理工程 温度 時間
補充量現像 3
5℃ 6.5秒 25ml/10
×12インチ定着 35℃
7秒 25ml/10×12インチ
水洗 20℃ 6秒
3l/1分間スクイズ
乾燥 55℃ 10.5秒計
30秒
ランニングテストの結果、ほぼ実施例2と同じ傾向を示
す結果が得られた。[0065] Next, using the above-mentioned developing solution (working solution),
Samples similar to developer samples No. 1 to 4 of Example 1 were prepared, and a roller conveyance type automatic processor (path length = 1550
mm), the following development treatment was performed. Treatment process Temperature Time
Replenishment amount development 3
5℃ 6.5 seconds 25ml/10
x12 inch fixing 35℃
7 seconds 25ml/10 x 12 inches Washing with water 20℃ 6 seconds 3L/1 minute squeeze drying 55℃ 10.5 seconds Total
As a result of the 30 second running test, results showing almost the same tendency as in Example 2 were obtained.
【0066】[0066]
【0067】本発明の化合物を現像液に用いることによ
り、ハロゲン化銀感光材料の写真性に悪い影響を与える
ことなく、銀汚れを格段に向上させることができる。従
って自現機のメンテナンスが非常に楽になり、感光材料
の汚染もなくすことができる。さらに迅速処理において
も常に安定した品質の良い画像を提供することができる
。By using the compound of the present invention in a developer, silver staining can be significantly improved without adversely affecting the photographic properties of silver halide photosensitive materials. Therefore, maintenance of the automatic processing machine becomes very easy and contamination of the photosensitive material can be eliminated. Furthermore, even during rapid processing, stable and high-quality images can always be provided.
Claims (1)
、現像処理を行うハロゲン化銀感光材料の現像処理方法
において、前記現像処理に用いる現像液に下記一般式(
I)で表される化合物を少なくとも一種以上添加したこ
とを特徴とするハロゲン化銀感光材料の現像処理方法。 一般式(I) 【化1】 式中、Zは環を形成するに必要な原子群を表し、Xは置
換基を表す。nは0または1〜5の整数を表す。1. In a method for developing a silver halide photosensitive material in which a silver halide photosensitive material is exposed and then developed, the developer used in the development process contains the following general formula (
A method for developing a silver halide photosensitive material, characterized in that at least one compound represented by I) is added. General formula (I) [Image Omitted] In the formula, Z represents an atomic group necessary to form a ring, and X represents a substituent. n represents 0 or an integer of 1 to 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6375691A JPH04277738A (en) | 1991-03-06 | 1991-03-06 | Development processing method for silver halide photosensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6375691A JPH04277738A (en) | 1991-03-06 | 1991-03-06 | Development processing method for silver halide photosensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04277738A true JPH04277738A (en) | 1992-10-02 |
Family
ID=13238559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6375691A Pending JPH04277738A (en) | 1991-03-06 | 1991-03-06 | Development processing method for silver halide photosensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04277738A (en) |
-
1991
- 1991-03-06 JP JP6375691A patent/JPH04277738A/en active Pending
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