JPH04265979A - Base for electrophotographic sensitive body and production thereof - Google Patents

Base for electrophotographic sensitive body and production thereof

Info

Publication number
JPH04265979A
JPH04265979A JP2657291A JP2657291A JPH04265979A JP H04265979 A JPH04265979 A JP H04265979A JP 2657291 A JP2657291 A JP 2657291A JP 2657291 A JP2657291 A JP 2657291A JP H04265979 A JPH04265979 A JP H04265979A
Authority
JP
Japan
Prior art keywords
light
less
support
weight
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2657291A
Other languages
Japanese (ja)
Inventor
Hideki Komiyama
小宮山 秀樹
Kunio Otsuki
大月 邦夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP2657291A priority Critical patent/JPH04265979A/en
Publication of JPH04265979A publication Critical patent/JPH04265979A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To provide the base from which an electrophotographic sensitive body which does not generate the unequal image densities occurring in interference is obtainable even when used for an electrophotograph applying device using LD light or LED light as exposing light and the process for producing this base. CONSTITUTION:This base 1 is constituted by forming an anodized Al film 12 having the film thickness within a 4 to 20mum range on the surface of a tubular base body 11 consisting of an Al alloy and has 20% ratio of the reflected light to the incident light of the coherent LD light or LED light. Such base 1 is produced by adequately roughening the surface of the base body surface by taking the content of the impurity and more particularly Mg in the Al alloy and the method for working the alloy to the tube into consideration, then forming the anodized Al film 12 having an adequate film thickness under adequate conditions.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】この発明は、レーザーダイオード
(LD)や発光ダイオード(LED)を露光源とする電
子写真方式のプリンタや複写機に使用される電子写真感
光体の支持体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a support for an electrophotographic photoreceptor used in an electrophotographic printer or copying machine using a laser diode (LD) or a light emitting diode (LED) as an exposure source.

【0002】0002

【従来の技術】LDやLEDなどのような単色光で可干
渉性光の露光源を用いた電子写真方式のプリンタや複写
機に使用される電子写真感光体は、一般的に支持体とし
てAl合金管を用い、その上に電荷発生層、電荷輸送層
を蒸着または塗布により積層して感光層を形成して得ら
れる。支持体表面には支持体からの電荷の注入を抑制し
画像品質を向上させるために薄い層が設けられることが
多い。この電荷注入抑制層には有機系材料や無機系材料
など種々のものが用いられるが、支持体の素材としてA
l合金が用いられた場合には、その表面を陽極酸化して
得られる陽極酸化Al層(以下単にアルマイト層とも称
する)を利用することが多い。
[Prior Art] Electrophotographic photoreceptors used in electrophotographic printers and copiers that use monochromatic and coherent light exposure sources such as LDs and LEDs generally use Al as a support. It is obtained by using an alloy tube and laminating a charge generation layer and a charge transport layer thereon by vapor deposition or coating to form a photosensitive layer. A thin layer is often provided on the surface of the support to suppress charge injection from the support and improve image quality. Various materials such as organic materials and inorganic materials are used for this charge injection suppression layer, but the material for the support is A
When an Al alloy is used, an anodized Al layer (hereinafter also simply referred to as an alumite layer) obtained by anodizing its surface is often used.

【0003】0003

【発明が解決しようとする課題】ところが、上述のアル
マイト層はLD光やLED光に対して透明である。この
ために、表面にアルマイト層を設けられたAl合金支持
体を用いた電子写真感光体の場合、露光光として入射し
てくるLD光やLED光の支持体からの反射光はアルマ
イト層表面からのものとAl合金基体表面からのものと
あり、これらの反射光は干渉を起こし、アルマイト層の
膜厚にばらつきがあるとそれに対応して強め合う領域と
弱め合う領域とが生じ、それに伴い、アルマイト層上に
積層された電荷発生層においてキャリア発生にむらが生
じる。このために、画像上にアルマイト層の膜厚ばらつ
きに対応した画像濃度むらが生じることになる。
However, the alumite layer described above is transparent to LD light and LED light. For this reason, in the case of an electrophotographic photoreceptor using an Al alloy support provided with an alumite layer on the surface, the reflected light from the support of the LD light or LED light incident as exposure light is reflected from the surface of the alumite layer. These reflected lights cause interference, and if there are variations in the thickness of the alumite layer, there will be areas where they strengthen and areas where they weaken, and accordingly, Carrier generation occurs unevenly in the charge generation layer stacked on the alumite layer. For this reason, image density unevenness corresponding to variations in the thickness of the alumite layer occurs on the image.

【0004】この発明は、上述の問題点を解消して、可
干渉性光であるLD光またはLED光を露光光とする電
子写真応用装置に用いても干渉に起因する画像濃度むら
を生じない良好な画像を形成できる電子写真感光体の得
られる支持体およびその好適な製造方法を提供すること
を解決しようとする課題とする。
The present invention solves the above-mentioned problems and does not cause image density unevenness due to interference even when used in an electrophotographic application device that uses coherent light such as LD light or LED light as exposure light. The object of the present invention is to provide a support for an electrophotographic photoreceptor that can form good images and a suitable method for producing the same.

【0005】[0005]

【課題を解決するための手段】上記の課題は、この発明
によれば、電子写真感光体用支持体をアルミニウム合金
からなる管状基体の表面に膜厚4μm以上20μm以下
の範囲内の陽極酸化アルミニウム皮膜が形成されており
、可干渉性光であるLD光またはLED光の入射光に対
する反射光の割合が20%以上である支持体とすること
によって解決される。
[Means for Solving the Problems] According to the present invention, the support for an electrophotographic photoreceptor is coated on the surface of a tubular substrate made of an aluminum alloy with anodized aluminum having a film thickness of 4 μm or more and 20 μm or less. This problem can be solved by using a support on which a film is formed and the ratio of reflected light to incident light of coherent light such as LD light or LED light is 20% or more.

【0006】上述のような支持体は、素材としてマグネ
シウム(Mg)を0.8重量%以上2.8重量%以下の
範囲内で含有するアルミニウム(Al)合金引抜管を用
いる場合には、その表面を切削加工により表面粗さがR
maxで0.1μm以上1.5μm以下の範囲内となる
ように仕上げた後、その表面に液温14℃以上16℃以
下,濃度20重量%の硫酸電解液を用いて電流密度1.
3A/dm2 以上1.7A/dm2 以下の範囲内で
直流法で陽極酸化処理を施し、続いて酢酸ニッケル溶液
を用いて封孔処理を施して、膜厚4μm以上20μm以
下の範囲内の陽極酸化Al皮膜を形成することによって
作製できる。
[0006] When the above-mentioned support is an aluminum (Al) alloy drawn tube containing magnesium (Mg) in a range of 0.8% by weight or more and 2.8% by weight or less, The surface roughness is R by cutting the surface.
After finishing the surface so that the maximum diameter is within the range of 0.1 μm or more and 1.5 μm or less, the surface is coated with a sulfuric acid electrolyte with a liquid temperature of 14° C. or more and 16° C. or less and a concentration of 20% by weight at a current density of 1.
Perform anodizing treatment using a direct current method within a range of 3A/dm2 or more and 1.7A/dm2 or less, followed by sealing treatment using a nickel acetate solution, and anodize the film thickness within a range of 4μm or more and 20μm or less. It can be produced by forming an Al film.

【0007】また、素材としてMgを0.45重量%以
上1.2重量%以下の範囲内で含有するAl合金引抜管
を用いる場合には、その表面を切削荒加工とこれに続く
SF加工により表面粗さがRmaxで0.2μm以上1
.0μm以下の範囲内となるように仕上げた後、その表
面に前述と同様にして陽極酸化Al皮膜を形成するとよ
い。
[0007] In addition, when using an Al alloy drawn pipe containing Mg in the range of 0.45% by weight to 1.2% by weight as a material, its surface is roughened by rough cutting followed by SF processing. Surface roughness Rmax is 0.2μm or more1
.. After finishing it so that it is within the range of 0 μm or less, it is preferable to form an anodized Al film on the surface in the same manner as described above.

【0008】さらにまた、素材としてMgを0.45重
量%以上1.2重量%以下の範囲内で含有するAl合金
冷間鍛造管を用いる場合には、その表面を液体ホーニン
グにより表面粗さがRmaxで0.2μm以上1.0μ
m以下の範囲内となるように仕上げた後、その表面に前
述と同様にして陽極酸化皮膜を形成するとよい。
Furthermore, when using an Al alloy cold forged pipe containing Mg in the range of 0.45% by weight or more and 1.2% by weight or less, the surface is roughened by liquid honing. Rmax: 0.2μm or more 1.0μ
After finishing it so that it is within the range of m or less, it is preferable to form an anodic oxide film on the surface in the same manner as described above.

【0009】[0009]

【作用】Al合金基体の表面にアルマイト層を設けてな
る支持体を用いて、LD光またはLED光を露光光とす
る電子写真応用装置に搭載して干渉に起因する画像濃度
むらを生じない感光体を得るためには、LD光またはL
ED光の入射光に対する反射光の割合を低減すればよく
、この割合を20%以下とすることにより画像濃度むら
の発生を防ぐことができる。
[Function] Using a support made of an Al alloy substrate with an alumite layer provided on the surface, it can be mounted on an electrophotographic application device that uses LD light or LED light as exposure light to prevent image density unevenness caused by interference. To get the body, use LD light or L
It is only necessary to reduce the ratio of reflected light to the incident light of the ED light, and by setting this ratio to 20% or less, it is possible to prevent the occurrence of image density unevenness.

【0010】上述のような支持体を得るためには、支持
体のアルマイト層表面での反射光およびAl合金基体表
面での反射光をそれぞれ散乱させ、また、アルマイト層
に入射した光およびAl合金基体表面での反射光をアル
マイト層内で散乱させるとよい。
In order to obtain the above-described support, the light reflected on the surface of the alumite layer of the support and the light reflected on the surface of the Al alloy substrate are respectively scattered, and the light incident on the alumite layer and the light reflected on the Al alloy substrate are scattered. It is preferable to scatter the reflected light on the substrate surface within the alumite layer.

【0011】この発明においては、Al合金基体表面を
適切な表面粗さに仕上げることによりその表面での反射
光を散乱させる。このように粗面化されたAl合金基体
表面に形成されるアルマイト層の表面は基体の表面粗さ
に対応した粗面となり、アルマイト層表面での反射光も
散乱されることになる。また、アルマイト層の形成条件
を適切に選ぶことにより、Al合金に含有されている不
純物,特にMgをアルマイト層内で酸化させ白く発色さ
せることでアルマイト層内で光散乱を生じさせる。Al
合金の不純物含有量によりアルマイト層の発色の度合い
が異なり、さらに、同じAl合金を用いても管への加工
方法によりアルマイト層の発色の度合いが異なり、アル
マイト層内での光散乱の度合いも異なってくる。従って
、Al合金不純物含有量,管への加工方法に対応して、
全体としての支持体の入射光に対する反射光の割合が2
0%以下となるように、Al合金基体表面の粗面化の方
法および表面粗さを選ぶことが必要となる。
[0011] In the present invention, the surface of the Al alloy substrate is finished to have an appropriate surface roughness, thereby scattering reflected light on the surface. The surface of the alumite layer formed on the thus roughened surface of the Al alloy substrate becomes a rough surface corresponding to the surface roughness of the substrate, and the reflected light on the surface of the alumite layer is also scattered. Furthermore, by appropriately selecting the conditions for forming the alumite layer, impurities contained in the Al alloy, particularly Mg, are oxidized within the alumite layer to develop a white color, thereby causing light scattering within the alumite layer. Al
The degree of color development of the alumite layer differs depending on the impurity content of the alloy, and furthermore, even if the same Al alloy is used, the degree of color development of the alumite layer will differ depending on the method of processing it into a tube, and the degree of light scattering within the alumite layer will also differ. It's coming. Therefore, depending on the Al alloy impurity content and the processing method for the pipe,
The ratio of reflected light to incident light on the support as a whole is 2
It is necessary to select the method of roughening the surface of the Al alloy substrate and the surface roughness so that the roughness is 0% or less.

【0012】アルマイト層は、Al合金基体表面を濃度
20重量%の硫酸電解液を用い液温を14℃以上16℃
以下の範囲内にして電流密度1.3A/dm2 以上1
.7A/dm2 以下で直流法で陽極酸化し、酢酸ニッ
ケル溶液を用いて封孔処理を施すことにより形成すると
、不純物が適切に酸化されるので好適である。そうして
、支持体の基体としてMgを0.8重量%以上2.8重
量%以下の範囲内で含有するAl合金引抜管を用いた場
合には、基体表面を切削加工により表面粗さがRmax
で0.1μm以上1.5μm以下の範囲内となるように
仕上げた後、上述のようにしてアルマイト層を形成する
と、支持体の全体としての反射光が20%以下となり好
適である。また、支持体の基体としてMgを0.4重量
%以上1.2重量%以下の範囲内で含有するAl合金引
抜管を用いた場合には、基体表面を切削荒加工し続いて
SF加工を行うことにより表面粗さをRmaxで0.2
μm以上1.0μm以下の範囲内に仕上げておくと好適
である。さらに、支持体の基体としてMgを0.4重量
%以上1.2重量%以下の範囲内で含有するAl合金冷
間鍛造管を用いた場合には、基体表面を液体ホーニング
により表面粗さをRmaxで0.2μm以上1.0μm
以下の範囲内に仕上げておくと好適である。
[0012] The alumite layer is prepared by coating the surface of the Al alloy substrate with a sulfuric acid electrolyte having a concentration of 20% by weight, and controlling the liquid temperature to 14°C or higher to 16°C.
Within the following range, the current density is 1.3A/dm2 or more1
.. It is preferable to perform anodization using a direct current method at 7 A/dm2 or less and perform sealing treatment using a nickel acetate solution, since impurities are appropriately oxidized. When an Al alloy drawn tube containing Mg in the range of 0.8% by weight or more and 2.8% by weight or less is used as the base of the support, the surface roughness of the base is reduced by cutting. Rmax
If the alumite layer is formed in the above-described manner after finishing the support to have a thickness in the range of 0.1 μm or more and 1.5 μm or less, the total reflected light of the support becomes 20% or less, which is suitable. In addition, when an Al alloy drawn tube containing Mg in the range of 0.4% by weight or more and 1.2% by weight or less is used as the base of the support, the surface of the base is rough cut and then SF processing is performed. By doing this, the surface roughness is reduced to 0.2 at Rmax.
It is preferable to finish the thickness within the range of 1.0 μm or more. Furthermore, when an Al alloy cold forged tube containing Mg in the range of 0.4% by weight or more and 1.2% by weight or less is used as the base of the support, the surface of the base is roughened by liquid honing. Rmax: 0.2μm or more 1.0μm
It is preferable to finish within the following range.

【0013】なお、アルマイト層の膜厚は4μm未満で
は層の均一性が悪く、20μmを超えるとアルマイト層
にクラックが発生するようになるため好ましくない。ま
た、電荷注入抑制層としての機能の面からも膜厚は4μ
m以上20μm以下の範囲内とすると好適である。
[0013] If the thickness of the alumite layer is less than 4 μm, the uniformity of the layer will be poor, and if it exceeds 20 μm, cracks will occur in the alumite layer, which is not preferable. In addition, from the viewpoint of the function as a charge injection suppressing layer, the film thickness is 4 μm.
It is preferable that the thickness be within a range of not less than m and not more than 20 μm.

【0014】[0014]

【実施例】図1は、この発明による支持体を用いた電子
写真感光体の一実施例の模式的断面図で、Al合金基体
11とその表面に形成されたアルマイト層12とからな
る支持体1上に電荷発生層21,電荷輸送層22を順次
積層した感光層2が形成されている。
[Example] FIG. 1 is a schematic cross-sectional view of an embodiment of an electrophotographic photoreceptor using a support according to the present invention. A photosensitive layer 2 is formed on which a charge generation layer 21 and a charge transport layer 22 are sequentially laminated.

【0015】実施例1−1 Al合金基体としてMgを0.8重量%含有するAl合
金の引抜管を用い、その表面を切削加工により表面粗さ
がRmaxで0.1μmの鏡面に仕上げた後、その表面
に濃度20重量%の硫酸電解液を用い、液温を15℃と
し、電流密度1.5A/dm2 で直流法で陽極酸化処
理を行い、続いて酢酸ニッケル溶液を用いて封孔処理を
施して、膜厚8μmのアルマイト層を形成して支持体と
した。この支持体のLD光の入射光に対する反射光の割
合は約20%であった。
Example 1-1 A drawn Al alloy tube containing 0.8% by weight of Mg was used as the Al alloy substrate, and its surface was finished by cutting to a mirror surface with a surface roughness of 0.1 μm at Rmax. The surface was anodized using a sulfuric acid electrolyte with a concentration of 20% by weight at a temperature of 15°C and a direct current method at a current density of 1.5A/dm2, followed by sealing using a nickel acetate solution. was applied to form an alumite layer with a thickness of 8 μm, which was used as a support. The ratio of the reflected light to the incident light of the LD light on this support was about 20%.

【0016】比較例1−1 実施例1−1において、陽極酸化処理における液温を2
2℃に変え、電流密度を0.8A/dm2 に変えたこ
と以外は実施例1−1と同様にして支持体を作製した。 この支持体のLD光の入射光に対する反射光の割合は約
60%であった。
Comparative Example 1-1 In Example 1-1, the liquid temperature in the anodizing treatment was changed to 2.
A support was produced in the same manner as in Example 1-1 except that the temperature was changed to 2° C. and the current density was changed to 0.8 A/dm 2 . The ratio of the reflected light to the incident light of the LD light on this support was about 60%.

【0017】実施例1−2 実施例1−1において、Al合金のMg含有量を2.8
重量%に変え、Al合金基体の表面粗さをRmaxで1
.5μmに仕上げたこと以外は実施例1−1と同様にし
て支持体を作製した。この支持体のLD光の入射光に対
する反射光の割合は約10%であった。
Example 1-2 In Example 1-1, the Mg content of the Al alloy was set to 2.8.
% by weight, and the surface roughness of the Al alloy substrate is Rmax = 1
.. A support was produced in the same manner as in Example 1-1 except that the thickness was 5 μm. The ratio of the reflected light to the incident light of the LD light on this support was about 10%.

【0018】比較例1−2 実施例1−2において、陽極酸化処理の条件を比較例1
−1と同様に変えたこと以外は実施例1−2と同様にし
て支持体を作製した。この支持体のLD光の入射光に対
する反射光の割合は約65%であった。
Comparative Example 1-2 In Example 1-2, the conditions for anodizing treatment were changed to Comparative Example 1.
A support was produced in the same manner as in Example 1-2 except for the same changes as in Example 1-1. The ratio of the reflected light to the incident light of the LD light on this support was about 65%.

【0019】実施例2−1 Al合金基体としてMgを0.45重量%含有するAl
合金の引抜管を用い、その表面をコンパックスバイトを
用いて切削荒加工後、♯4000の砥石を用いてSF加
工を行って表面粗さをRmaxで0.2μmに仕上げた
後、その表面に実施例1−1と同様にしてアルマイト層
を形成して支持体を作製した。この支持体のLD光の入
射光に対する反射光の割合は約20%であった。
Example 2-1 Al containing 0.45% by weight of Mg as an Al alloy substrate
Using a drawn alloy tube, the surface was rough cut using a Compax tool, then SF processing was performed using a #4000 grindstone to give a surface roughness of Rmax of 0.2 μm, and then the surface was A support was produced by forming an alumite layer in the same manner as in Example 1-1. The ratio of the reflected light to the incident light of the LD light on this support was about 20%.

【0020】比較例2−1 実施例2−1において、陽極酸化処理の条件を比較例1
−1と同様に変えたこと以外は実施例2−1と同様にし
て支持体を作製した。この支持体のLD光の入射光に対
する反射光の割合は約70%であった。
Comparative Example 2-1 In Example 2-1, the conditions for anodizing treatment were changed to Comparative Example 1.
A support was produced in the same manner as in Example 2-1 except for the same changes as in Example 2-1. The ratio of the reflected light to the incident light of the LD light on this support was about 70%.

【0021】実施例2−2 実施例2−1において、Al合金のMg含有量を1.2
重量%に変え、Al合金基体の表面粗さをRmaxで1
.0μmに仕上げたこと以外は実施例2−1と同様にし
て支持体を作製した。この支持体のLD光の入射光に対
する反射光の割合は約10%であった。
Example 2-2 In Example 2-1, the Mg content of the Al alloy was set to 1.2.
% by weight, and the surface roughness of the Al alloy substrate is Rmax = 1
.. A support was produced in the same manner as in Example 2-1 except that the thickness was finished to 0 μm. The ratio of the reflected light to the incident light of the LD light on this support was about 10%.

【0022】比較例2−2 実施例2−2において、陽極酸化処理の条件を比較例1
−1と同様に変えたこと以外は実施例2−2と同様にし
て支持体を作製した。この支持体のLD光の入射光に対
する反射光の割合は約65%であった。
Comparative Example 2-2 In Example 2-2, the conditions for anodizing treatment were changed to Comparative Example 1.
A support was produced in the same manner as in Example 2-2 except for the same changes as in Example 2-1. The ratio of the reflected light to the incident light of the LD light on this support was about 65%.

【0023】実施例3−1 Al合金基体としてMgを0.45重量%含有するAl
合金の冷間鍛造管を用い、その表面を液体ホーニングに
より表面粗さをRmaxで0.2μmに仕上げた後、そ
の表面に実施例1−1と同様にしてアルマイト層を形成
して支持体を作製した。この支持体のLD光の入射光に
対する反射光の割合は約20%であった。
Example 3-1 Al containing 0.45% by weight of Mg as an Al alloy substrate
Using a cold forged alloy pipe, the surface was finished to a surface roughness of Rmax of 0.2 μm by liquid honing, and then an alumite layer was formed on the surface in the same manner as in Example 1-1 to form a support. Created. The ratio of the reflected light to the incident light of the LD light on this support was about 20%.

【0024】比較例3−1 実施例3−1において、陽極酸化処理の条件を比較例1
−1と同様に変えたこと以外は実施例3−1と同様にし
て支持体を作製した。この支持体のLD光の入射光に対
する反射光の割合は約70%であった。
Comparative Example 3-1 In Example 3-1, the conditions for anodizing treatment were changed to Comparative Example 1.
A support was produced in the same manner as in Example 3-1 except for the same changes as in Example 3-1. The ratio of the reflected light to the incident light of the LD light on this support was about 70%.

【0025】実施例3−2 実施例3−1において、Al合金のMg含有量を1.2
重量%に変え、Al合金基体の表面粗さをRmaxで1
.0μmに仕上げたこと以外は実施例3−1と同様にし
て支持体を作製した。この支持体のLD光の入射光に対
する反射光の割合は約10%であった。
Example 3-2 In Example 3-1, the Mg content of the Al alloy was set to 1.2.
% by weight, and the surface roughness of the Al alloy substrate is Rmax = 1
.. A support was produced in the same manner as in Example 3-1 except that the thickness was finished to 0 μm. The ratio of the reflected light to the incident light of the LD light on this support was about 10%.

【0026】比較例3−2 実施例3−2において、陽極酸化処理条件を比較例1−
1と同様に変えたこと以外は実施例3−2と同様にして
支持体を作製した。この支持体のLD光の入射光に対す
る反射光の割合は約65%であった。
Comparative Example 3-2 In Example 3-2, the anodizing treatment conditions were changed to Comparative Example 1-
A support was produced in the same manner as in Example 3-2 except that the same changes as in Example 1 were made. The ratio of the reflected light to the incident light of the LD light on this support was about 65%.

【0027】このようにして得られた実施例および比較
例の各支持体上に電荷発生層,電荷輸送層を順次積層し
て感光層を形成し、図1に示した構成の実施例1−1〜
実施例3−2,比較例1−1〜比較例3−2の12種類
の電子写真感光体を作製した。
A photosensitive layer was formed by sequentially laminating a charge generation layer and a charge transport layer on each of the supports of Examples and Comparative Examples thus obtained, and Example 1-- having the structure shown in FIG. 1~
Twelve types of electrophotographic photoreceptors were produced, including Example 3-2 and Comparative Examples 1-1 to 3-2.

【0028】これらの感光体を市販の半導体レーザプリ
ンタに搭載し、50%網点パターンの画像をプリントア
ウトし、干渉に起因する画像濃度むらの発生を調べた。 その結果を使用した支持体のLD光の入射光に対する反
射光の割合とともに表1に示す。
These photoreceptors were mounted on a commercially available semiconductor laser printer, an image with a 50% halftone dot pattern was printed out, and the occurrence of image density unevenness due to interference was investigated. The results are shown in Table 1 along with the ratio of the reflected light to the incident light of the LD light of the support used.

【0029】[0029]

【表1】[Table 1]

【0030】表1より、LD光の入射光に対する反射光
の割合が20%以下である実施例の支持体を用いた感光
体は干渉による画像濃度むらが発生しないが、LD光の
入射光に対する反射光の割合が60%以上と大きい比較
例の支持体を用いた感光体は干渉による画像濃度むらが
発生しており、この発明による支持体の優位性は明きら
かである。
From Table 1, it can be seen that the photoreceptor using the support of the example in which the ratio of reflected light to the incident LD light is 20% or less does not cause image density unevenness due to interference, but the ratio of reflected light to the incident LD light does not occur. The photoreceptor using the support of the comparative example in which the proportion of reflected light was as large as 60% or more had uneven image density due to interference, and the superiority of the support according to the present invention is clear.

【0031】なお、Al合金基体の表面の陽極酸化処理
の条件において、液温は14℃以上16℃以下の範囲内
,電流密度は1.3A/dm2 以上1.7A/dm2
 以下の範囲内であれば実施例と同様の良好な支持体が
得られることが判った。
[0031] In addition, under the conditions of anodizing the surface of the Al alloy substrate, the liquid temperature is in the range of 14°C or more and 16°C or less, and the current density is 1.3A/dm2 or more and 1.7A/dm2.
It was found that a good support similar to that of the example can be obtained within the following range.

【0032】また、Al合金中のMgの含有量が少なく
なると、表面の陽極酸化において酸化されるMgの量が
少なくなるため、アルマイト層内での光散乱効果がなく
なり、逆にMgの含有量が多くなるとAl合金基体中の
欠陥の量が多くなり支持体として適さなくなることが判
った。
Furthermore, when the Mg content in the Al alloy decreases, the amount of Mg oxidized during surface anodization decreases, so the light scattering effect within the alumite layer disappears, and conversely, the Mg content decreases. It has been found that as the number increases, the amount of defects in the Al alloy substrate increases, making it unsuitable as a support.

【0033】さらに、アルマイト層の膜厚は4μm以上
20μm以下の範囲内であれば有効であることが判った
。膜厚が4μm未満では均一なアルマイト層が得られず
、逆に20μmを超えるとクラックが発生するようにな
り好ましくない。
Furthermore, it has been found that it is effective if the thickness of the alumite layer is within the range of 4 μm or more and 20 μm or less. If the film thickness is less than 4 μm, a uniform alumite layer cannot be obtained, and if it exceeds 20 μm, cracks will occur, which is not preferable.

【0034】[0034]

【発明の効果】この発明によれば、Al合金からなる基
体の表面に膜厚4μm以上20μm以下の範囲内のアル
マイト層が形成されてなり、LD光またはLED光の入
射光に対する反射光の割合が20%以下である支持体と
する。このような支持体を用いることにより、可干渉性
光であるLD光またはLED光を露光光とする電子写真
応用装置に搭載しても干渉に起因する画像濃度むらを生
じない良好な画像を形成することができる電子写真感光
体を得ることができる。
According to the present invention, an alumite layer having a thickness of 4 μm to 20 μm is formed on the surface of a substrate made of an Al alloy, and the ratio of reflected light to incident light of LD light or LED light is reduced. is 20% or less. By using such a support, it is possible to form a good image that does not cause image density unevenness due to interference even when mounted in an electrophotographic application device that uses coherent light such as LD light or LED light as exposure light. An electrophotographic photoreceptor can be obtained.

【0035】このような支持体は請求項2,3および4
に記載されているようにAl合金中の不純物,特にMg
の含有量、管への加工方法を考慮して基体表面を適切に
粗面化した後、その表面に適切な条件で適切な膜厚のア
ルマイト層を形成することにより作製される。このよう
な方法で作製された支持体においては、基体表面が粗面
化されており、これに対応してアルマイト層表面も粗面
となっているため、基体表面,アルマイト層表面での反
射光は散乱される。また、アルマイト層内のMgが酸化
して白く発色しており、アルマイト層内を通る光は散乱
される。従って、全体として支持体のLD光またはLE
D光の入射光に対する反射光の割合を20%以下とする
ことが可能となる。
Such a support is provided in claims 2, 3 and 4.
Impurities in Al alloys, especially Mg, as described in
It is produced by appropriately roughening the surface of the substrate in consideration of the content of and the method of processing into a tube, and then forming an alumite layer of an appropriate thickness under appropriate conditions on the surface. In the support produced by this method, the surface of the base is roughened and the surface of the alumite layer is also roughened accordingly, so the reflected light on the base surface and the surface of the alumite layer is is scattered. Further, Mg in the alumite layer is oxidized and colored white, and light passing through the alumite layer is scattered. Therefore, the LD light or LE light of the support as a whole
It becomes possible to reduce the ratio of reflected light to incident D light to 20% or less.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】この発明の支持体を用いた感光体の一実施例の
模式的断面図
[Fig. 1] A schematic cross-sectional view of an example of a photoreceptor using the support of the present invention.

【符号の説明】[Explanation of symbols]

1      支持体 2      感光層 11    Al合金基体 12    アルマイト層 21    電荷発生層 22    電荷輸送層 1 Support 2 Photosensitive layer 11 Al alloy base 12 Alumite layer 21 Charge generation layer 22 Charge transport layer

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】アルミニウム合金からなる管状基体の表面
に膜厚4μm以上20μm以下の範囲内の陽極酸化アル
ミニウム皮膜が形成されてなり、可干渉性光である半導
体レーザーダイオード光または発光ダイオード光の入射
光に対する反射光の割合が20%以下であることを特徴
とする電子写真感光体用支持体。
Claim 1: An anodized aluminum film having a thickness of 4 μm or more and 20 μm or less is formed on the surface of a tubular substrate made of an aluminum alloy, upon which coherent light such as semiconductor laser diode light or light emitting diode light is incident. A support for an electrophotographic photoreceptor, characterized in that the ratio of reflected light to light is 20% or less.
【請求項2】マグネシウムを0.8重量%以上2.8重
量%以下の範囲内で含有するアルミニウム合金引抜管の
表面を切削加工により表面粗さが最大高さRmaxで0
.1μm以上1.5μm以下の範囲内となるように仕上
げた後、その表面に液温14℃以上16℃以下,濃度2
0重量%の硫酸電解液を用いて電流密度1.3A/dm
2 以上1.7A/dm2 以下の範囲内で直流法で陽
極酸化処理を施し、続いて酢酸ニッケル溶液を用いて封
孔処理を施して、膜厚4μm以上20μm以下の範囲内
の陽極酸化アルミニウム皮膜を形成することを特徴とす
る電子写真感光体用支持体の製造方法。
[Claim 2] The surface of a drawn aluminum alloy tube containing magnesium in a range of 0.8% by weight or more and 2.8% by weight or less is cut so that the surface roughness is 0 at the maximum height Rmax.
.. After finishing it so that it is within the range of 1μm or more and 1.5μm or less, the surface is coated with a liquid temperature of 14℃ or more and 16℃ or less and a concentration of 2.
Current density 1.3A/dm using 0% by weight sulfuric acid electrolyte
2 Anodized aluminum film with a thickness of 4 μm or more and 20 μm or less by performing anodizing treatment using a direct current method within a range of 2 or more and 1.7 A/dm2 or less, followed by sealing treatment using a nickel acetate solution. 1. A method for producing a support for an electrophotographic photoreceptor, the method comprising: forming a support for an electrophotographic photoreceptor;
【請求項3】マグネシウムを0.45重量%以上1.2
重量%以下の範囲内で含有するアルミニウム合金引抜管
の表面を切削荒加工とこれに続く超仕上げ加工(SF加
工)により表面粗さが最大高さRmaxで0.2μm以
上1.0μm以下の範囲内となるように仕上げた後、そ
の表面に液温14℃以上16℃以下,濃度20重量%の
硫酸電解液を用いて電流密度1.3A/dm2 以上1
.7A/dm2 以下の範囲内で直流法で陽極酸化処理
を施し、続いて酢酸ニッケル溶液を用いて封孔処理を施
して、膜厚4μm以上20μm以下の範囲内の陽極酸化
アルミニウム皮膜を形成することを特徴とする電子写真
感光体用支持体の製造方法。
Claim 3: Magnesium 0.45% by weight or more 1.2% by weight
The surface roughness of the aluminum alloy drawn tube containing the aluminum alloy in the range of 0.2 μm or more and 1.0 μm or less at the maximum height Rmax is roughened by rough cutting and subsequent super finishing (SF processing). After finishing the surface, a current density of 1.3 A/dm2 or more is applied to the surface using a sulfuric acid electrolyte with a liquid temperature of 14°C or more and 16°C or less and a concentration of 20% by weight.
.. Anodizing with a direct current method within a range of 7A/dm2 or less, followed by sealing using a nickel acetate solution to form an anodized aluminum film with a thickness of 4 μm or more and 20 μm or less. A method for producing a support for an electrophotographic photoreceptor, characterized by:
【請求項4】マグネシウムを0.45重量%以上1.2
重量%以下の範囲内で含有するアルミニウム合金冷間鍛
造管の表面を液体ホーニングにより表面粗さが最大高さ
Rmaxで0.2μm以上1.0μm以下の範囲内とな
るように仕上げた後、その表面に液温14℃以上16℃
以下,濃度20重量%の硫酸電解液を用いて電流密度1
.3A/dm2 以上1.7A/dm2 以下の範囲内
で直流法で陽極酸化処理を施し、続いて酢酸ニッケル溶
液を用いて封孔処理を施して、膜厚4μm以上20μm
以下の範囲内の陽極酸化アルミニウム皮膜を形成するこ
とを特徴とする電子写真感光体用支持体の製造方法。
Claim 4: Magnesium 0.45% by weight or more 1.2% by weight
After finishing the surface of the cold-forged aluminum alloy pipe containing the aluminum alloy in the range of 0.2 μm or more and 1.0 μm or less at the maximum height Rmax by liquid honing, Liquid temperature on the surface is 14℃ or higher and 16℃
Below, using a sulfuric acid electrolyte with a concentration of 20% by weight, a current density of 1
.. Anodic oxidation treatment is performed using a direct current method within a range of 3A/dm2 or more and 1.7A/dm2 or less, followed by sealing treatment using a nickel acetate solution to form a film with a thickness of 4μm or more and 20μm.
A method for producing a support for an electrophotographic photoreceptor, which comprises forming an anodized aluminum film within the following range.
JP2657291A 1991-02-21 1991-02-21 Base for electrophotographic sensitive body and production thereof Pending JPH04265979A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2657291A JPH04265979A (en) 1991-02-21 1991-02-21 Base for electrophotographic sensitive body and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2657291A JPH04265979A (en) 1991-02-21 1991-02-21 Base for electrophotographic sensitive body and production thereof

Publications (1)

Publication Number Publication Date
JPH04265979A true JPH04265979A (en) 1992-09-22

Family

ID=12197271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2657291A Pending JPH04265979A (en) 1991-02-21 1991-02-21 Base for electrophotographic sensitive body and production thereof

Country Status (1)

Country Link
JP (1) JPH04265979A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8298733B2 (en) 2003-11-10 2012-10-30 Fuji Electric Co., Ltd. Electrophotographic photosensitive member

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8298733B2 (en) 2003-11-10 2012-10-30 Fuji Electric Co., Ltd. Electrophotographic photosensitive member

Similar Documents

Publication Publication Date Title
CA1224181A (en) Electrolytic graining of aluminium in nitric acid and oxalic acid mixture
JPS60159093A (en) Method of electrochemically surface-roughening aluminum or aluminum alloy
US4427500A (en) Method for producing an aluminum support useful for lithography
JPH04265979A (en) Base for electrophotographic sensitive body and production thereof
US4581996A (en) Aluminum support useful for lithography
US5080993A (en) Method to produce a photoreceptor for electrophotography using diamond bit followed by etching
KR20110021664A (en) Inspection apparatus of metal mold for anti-glare process
JPS6079360A (en) Electrophotographic sensitive body and its manufacture
US2184599A (en) Photographic reproduction
JPS5933674B2 (en) Plating bath and method for white palladium
JPH04311962A (en) Method for suppressing plywood effect in photosensitive picture member
JP2003279824A (en) Structural parts for optical apparatus
JPS6072794A (en) Supporter for lithographic print plate
JPH0572785A (en) Substrate for electrophotographic sensitive body and production thereof
JPS5986053A (en) Photosensitive drum
JPH05197181A (en) Electrophotographic photosensitive body
US3562119A (en) Presensitized aluminum photolithographic etched plate and elements and method used in the preparation of same
US3682636A (en) Presensitized photolithographic plate having diazo stabilized aluminum base
US1957433A (en) Method of making a photographic printing plate
JP2000003059A (en) Conductive base body for electrophotographic photoreceptor and its production
JPH02242264A (en) Production of electrophotographic sensitive body
JP2619171B2 (en) Organic photoreceptor for electrophotography and base treatment method thereof
US2214531A (en) Color photography
JPS60203495A (en) Manufacture of lithographic printing aluminum base material and lithographic printing alminum substrate
DE598429C (en) Process for the production of color-correct printing forms for multi-color printing