JPH0425869U - - Google Patents

Info

Publication number
JPH0425869U
JPH0425869U JP6498490U JP6498490U JPH0425869U JP H0425869 U JPH0425869 U JP H0425869U JP 6498490 U JP6498490 U JP 6498490U JP 6498490 U JP6498490 U JP 6498490U JP H0425869 U JPH0425869 U JP H0425869U
Authority
JP
Japan
Prior art keywords
cold trap
growth chamber
cryopump
exhausts
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6498490U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6498490U priority Critical patent/JPH0425869U/ja
Publication of JPH0425869U publication Critical patent/JPH0425869U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP6498490U 1990-06-21 1990-06-21 Pending JPH0425869U (cs)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6498490U JPH0425869U (cs) 1990-06-21 1990-06-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6498490U JPH0425869U (cs) 1990-06-21 1990-06-21

Publications (1)

Publication Number Publication Date
JPH0425869U true JPH0425869U (cs) 1992-03-02

Family

ID=31596406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6498490U Pending JPH0425869U (cs) 1990-06-21 1990-06-21

Country Status (1)

Country Link
JP (1) JPH0425869U (cs)

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