JPH04243936A - Optical element and production thereof - Google Patents
Optical element and production thereofInfo
- Publication number
- JPH04243936A JPH04243936A JP3027794A JP2779491A JPH04243936A JP H04243936 A JPH04243936 A JP H04243936A JP 3027794 A JP3027794 A JP 3027794A JP 2779491 A JP2779491 A JP 2779491A JP H04243936 A JPH04243936 A JP H04243936A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- base material
- silicon oxide
- glass
- silane coupling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 80
- 239000011521 glass Substances 0.000 claims abstract description 51
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 25
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 20
- 239000011159 matrix material Substances 0.000 claims abstract description 11
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229920000620 organic polymer Polymers 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims description 56
- 229910044991 metal oxide Inorganic materials 0.000 claims description 14
- 150000004706 metal oxides Chemical class 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 4
- 229910052810 boron oxide Inorganic materials 0.000 claims description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052681 coesite Inorganic materials 0.000 abstract description 28
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 28
- 239000011347 resin Substances 0.000 abstract description 28
- 229920005989 resin Polymers 0.000 abstract description 28
- 239000000377 silicon dioxide Substances 0.000 abstract description 28
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 28
- 229910052682 stishovite Inorganic materials 0.000 abstract description 28
- 229910052905 tridymite Inorganic materials 0.000 abstract description 28
- 239000000203 mixture Substances 0.000 abstract description 12
- 238000005859 coupling reaction Methods 0.000 abstract description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 2
- 230000008878 coupling Effects 0.000 abstract 2
- 238000010168 coupling process Methods 0.000 abstract 2
- 229910000077 silane Inorganic materials 0.000 abstract 2
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 30
- 230000000694 effects Effects 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 239000006121 base glass Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical group [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- MQWCQFCZUNBTCM-UHFFFAOYSA-N 2-tert-butyl-6-(3-tert-butyl-2-hydroxy-5-methylphenyl)sulfanyl-4-methylphenol Chemical compound CC(C)(C)C1=CC(C)=CC(SC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O MQWCQFCZUNBTCM-UHFFFAOYSA-N 0.000 description 1
- 229910018404 Al2 O3 Inorganic materials 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明はガラス母材上に紫外線硬
化型樹脂よりなる樹脂層を有する光学素子及びその製造
方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical element having a resin layer made of an ultraviolet curable resin on a glass base material, and a method for manufacturing the same.
【0002】0002
【従来の技術】従来より、ガラス母材上に樹脂を積層し
た構成の非球面レンズが知られているが、ガラスと樹脂
との接合面は元々密着性が悪いため使用環境下でハガレ
が生じ易いという欠点があった。この欠点を解消するた
め、例えばガラス表面にシランカップリング剤を塗布す
ることにより密着性を高めるという工夫がなされている
。しかしながら、すべてのガラス母材に対してシランカ
ップリング剤の表面処理効果が得られるわけではなく、
200種類以上ある光学ガラスの中にはSiO2 含有
量が少ない硝材が多々あり、これらに対してはシランカ
ップリング剤の表面処理効果が小さい場合も少なくない
。[Prior Art] Conventionally, aspherical lenses have been known that have a structure in which resin is laminated on a glass base material, but since the bonding surface between glass and resin has poor adhesion, peeling occurs under the usage environment. It had the disadvantage of being easy. In order to overcome this drawback, efforts have been made to improve adhesion, for example, by applying a silane coupling agent to the glass surface. However, the surface treatment effect of silane coupling agents cannot be obtained for all glass base materials.
Among the more than 200 types of optical glasses, there are many glass materials with low SiO2 content, and the surface treatment effect of silane coupling agents is often small for these materials.
【0003】そこで、このような硝種に対してはガラス
表面を予めシリコン酸化物、金属酸化物もしくはそれら
の混合物からなる層を形成した後、シランカップリング
剤処理することにより、密着力を高める方法が提案され
ている(特開昭63−89343号公報)。[0003] Therefore, for such types of glass, there is a method of increasing adhesion by forming a layer made of silicon oxide, metal oxide, or a mixture thereof on the glass surface in advance, and then treating it with a silane coupling agent. has been proposed (Japanese Unexamined Patent Publication No. 89343/1983).
【0004】0004
【発明が解決しようとする課題】しかしながら、上記従
来例はシリコン酸化物、金属酸化物もしくはそれらの混
合物の薄膜がガラス母材上に完全に密着することを前提
にしており、SiO2 含有量の少ないガラス母材では
主成分は多くの場合La2 O3 やB2 O3 など
であり、単にシリコン酸化物、金属酸化物もしくはそれ
らの混合物からなる薄膜では母材成分と薄膜成分とが異
なる場合があるため母材と薄膜との親和性が低いことに
より密着性が不充分であり、使用環境下においてガラス
母材と薄膜との間でハガレが生じることに起因してガラ
スと樹脂層が剥れるという欠点があった。[Problems to be Solved by the Invention] However, the above conventional example is based on the premise that a thin film of silicon oxide, metal oxide, or a mixture thereof is completely adhered to the glass base material, and the thin film of silicon oxide, metal oxide, or a mixture thereof is completely adhered to the glass base material. In glass base materials, the main components are often La2 O3 and B2 O3, and in thin films simply made of silicon oxides, metal oxides, or mixtures thereof, the base material components and thin film components may be different. There is a drawback that adhesion is insufficient due to the low affinity between the glass base material and the thin film, and the glass and resin layer peel off due to peeling between the glass base material and the thin film in the usage environment. Ta.
【0005】従って、本発明の目的は、SiO2 含有
量が少ないガラス母材に対しても密着性が優れた樹脂層
が形成された光学素子及びその製造方法を提供すること
にある。[0005] Accordingly, an object of the present invention is to provide an optical element in which a resin layer is formed that has excellent adhesion even to a glass base material with a low SiO2 content, and a method for manufacturing the same.
【0006】[0006]
【課題を解決するための手段及び作用】本発明に従って
、ガラス母材と、その上に順に形成された、シリコン酸
化物とガラス母材含有成分のうちからシリコン酸化物と
金属酸化物を除いた少なくとも1種類の成分を含有する
第1層と、シランカップリング剤硬化膜よりなる第2層
と、有機高分子化合物よりなる第3層とからなる光学素
子、並びに、ガラス母材上に、シリコン酸化物とガラス
母材含有成分のうちからシリコン酸化物と金属酸化物を
除いた少なくとも1種類の成分を含有する第1層を形成
し、次いでシランカップリング剤硬化膜よりなる第2層
を形成し、次いで有機高分子化合物よりなる第3層を形
成することによる光学素子の製造方法が提供される。[Means and effects for solving the problem] According to the present invention, silicon oxide and metal oxide are excluded from the glass base material and the silicon oxide and glass base material-containing components sequentially formed thereon. An optical element consisting of a first layer containing at least one type of component, a second layer consisting of a silane coupling agent cured film, and a third layer consisting of an organic polymer compound, and silicon on a glass base material. Forming a first layer containing at least one type of component excluding silicon oxide and metal oxide from the oxide and glass matrix-containing components, and then forming a second layer consisting of a silane coupling agent cured film. Then, a method for manufacturing an optical element is provided by forming a third layer made of an organic polymer compound.
【0007】また本発明は、ガラス母材が、シリコン酸
化物を25重量%以下含有するものである上記光学素子
である。また本発明は、シリコン酸化物とガラス母材含
有成分のうちからシリコン酸化物と金属酸化物を除いた
成分の1種類が、ホウ素酸化物である上記光学素子であ
る。The present invention also provides the above optical element, wherein the glass base material contains silicon oxide in an amount of 25% by weight or less. Further, the present invention provides the above-mentioned optical element, wherein one of the components excluding silicon oxide and metal oxide from among the components containing silicon oxide and glass matrix material is boron oxide.
【0008】第1層中にSiO2 を含有させるのは、
シランカップリング剤をコーティングして樹脂を密着さ
せる際、カップリング反応処理中に生じたシラノール基
(−Si−OH)と第1層中のSiO2 の表面部に現
われた−Si−OH基とが脱水縮合して−Si−O−S
iの化学結合を作り、樹脂と膜を強固に密着させるため
である。第1層中のSiO2 含有量は好ましくは95
〜20重量%、より好ましくは85〜50重量%である
。95重量%を越えるとその他の母材含有成分の割合が
5重量%未満となり、母材との親和性による密着性が低
下し易く、20重量%未満であるとシランカップリング
剤による効果が薄れて樹脂との密着性が悪くなり易い。[0008] The reason why SiO2 is contained in the first layer is as follows.
When coating with a silane coupling agent and adhering the resin, the silanol groups (-Si-OH) generated during the coupling reaction treatment and the -Si-OH groups appearing on the surface of SiO2 in the first layer are -Si-O-S by dehydration condensation
This is to create a chemical bond of i and firmly adhere the resin and the film. The SiO2 content in the first layer is preferably 95
-20% by weight, more preferably 85-50% by weight. If it exceeds 95% by weight, the proportion of other components contained in the base material will be less than 5% by weight, which tends to reduce the adhesion due to affinity with the base material, and if it is less than 20% by weight, the effect of the silane coupling agent will weaken. Therefore, the adhesion with the resin tends to deteriorate.
【0009】第1層中にB2 O3 を含有させるのは
、第1に母材含有成分と同種の成分を含有させることに
より親和性を高め、密着性を向上させるためであり、第
2にSiO2 とB2 O3 の混合物とすることで、
第1層の熱膨張率を母材の熱膨張率に近ずけて、熱膨張
率の差に起因する第1層膜のハガレを防止するためであ
る。第1層中にB2 O3 の含有量は好ましくは80
〜5重量%、より好ましくは50〜15重量%である。
80重量%を越えるとガラス化し難く透明性が失われ易
く、また膜が脆くなり膜割れによる密着不良が発生し易
い。5重量%未満であると母材との親和性による密着性
が悪くなり易く、また線膨張率が石英(SiO2 )の
ものに近くなり母材との差が大きくなり易い。The reason for including B2 O3 in the first layer is, firstly, to increase affinity and improve adhesion by including components of the same type as those contained in the base material, and secondly, to improve adhesion. By making a mixture of and B2 O3,
This is to make the coefficient of thermal expansion of the first layer close to that of the base material to prevent peeling of the first layer film due to the difference in coefficient of thermal expansion. The content of B2 O3 in the first layer is preferably 80
-5% by weight, more preferably 50-15% by weight. If it exceeds 80% by weight, it is difficult to vitrify and transparency is easily lost, and the film becomes brittle and adhesion failure due to film cracking is likely to occur. If it is less than 5% by weight, the adhesion due to affinity with the base material tends to deteriorate, and the coefficient of linear expansion approaches that of quartz (SiO2), which tends to increase the difference from the base material.
【0010】0010
【実施例】以下、実施例を示して具体的に本発明を説明
する。密着力を評価するため以下の試験を行なった。図
1(A)に示すように、母材ガラス板1上にSiO2
又はAl2 O3 よりなる蒸着膜5を真空蒸着した。
次いでその表面に図1(B)に示すように、シランカッ
プリング剤処理を施しシランカップリング剤硬化膜層2
を形成した。次いで図1(C)に示すように、平板型4
上に光硬化型樹脂(ウレタンアクリレート系組成物)を
適量滴下し、その上に上記シランカップリング剤処理済
母材ガラス板を重ね合せた後、紫外光を照射して樹脂層
3を完全に硬化させた。次いで離型を行ない図1(D)
に示す母材ガラス板1と樹脂層3を接合させた試験片を
作成した(No.5〜8)。[Examples] The present invention will be specifically explained below with reference to Examples. The following tests were conducted to evaluate adhesion. As shown in FIG. 1(A), SiO2 is placed on the base glass plate 1.
Alternatively, a deposited film 5 made of Al2O3 was vacuum deposited. Then, as shown in FIG. 1(B), the surface is treated with a silane coupling agent to form a silane coupling agent cured film layer 2.
was formed. Next, as shown in FIG. 1(C), a flat plate mold 4
An appropriate amount of photocurable resin (urethane acrylate composition) is dropped onto the top, and the silane coupling agent treated base glass plate is superimposed on top of the photocurable resin (urethane acrylate composition), and then ultraviolet light is irradiated to completely cover the resin layer 3. hardened. Then, the mold was released and Figure 1 (D)
Test pieces were prepared by bonding the base glass plate 1 and the resin layer 3 shown in (Nos. 5 to 8).
【0011】図1(A)において蒸着膜5をSiO2
70%,B2 O3 30%又はSiO2 60%,B
2 O3 40%のものに代えた他は上記と全く同様に
して、図1(D)に示す母材ガラス板1と樹脂層3を接
合させた試験片を作成した(No.9〜12)。なお、
図1(A)において蒸着膜5を形成しなかった他は上記
と全く同様にして試験片を作成した(No.1〜4)。In FIG. 1(A), the deposited film 5 is SiO2
70%, B2 O3 30% or SiO2 60%, B
2 Test pieces in which the base material glass plate 1 and the resin layer 3 shown in FIG. 1(D) were bonded were created in the same manner as above except that 40% O3 was used (Nos. 9 to 12). . In addition,
Test pieces were created in exactly the same manner as above except that the vapor deposited film 5 in FIG. 1(A) was not formed (Nos. 1 to 4).
【0012】試験片作成条件
母材ガラス板…寸法:35×35×2.5mm面精度:
両面研磨ニュートン10本以内シランカップリング剤処
理…カップリング剤:γ−メタクリロキシプロピルトリ
メトキシシラン(商品名:A−174,日本ユニカー製
)
溶液:エタノール/水/A−174=9/1/1スピン
コート条件:500rpm×5秒→3000rpm×3
0秒
ベーク条件:100℃,20分
光硬化性樹脂…ウレタンアクリレート系組成物厚さ:1
00μm
照射条件:30mW/cm2 (365nm)×10分
平板型…アルミ母材/KNメッキ
表面研磨仕上げ
蒸着膜5…膜材料:(1)SiO2 100%(2)A
l2 O3 100%
(3)SiO2 70%,B2 O3 30%;SiO
2 60%,B2 O3 40%次に作成した試験片を
、■作成直後(初期)、■80℃,60%RH、500
時間放置後(高温湿)、■−30℃(1時間)←→70
℃、85%RH(1時間)を30回繰り返す(温度サイ
クル)環境下に放置後、各々図2に示すようにカッター
ナイフにより10×10の碁盤目状に切り込みを入れて
樹脂片を100個に分け、セロテープ(ニチバン製)を
その表面に密着させた後セロテープを一気に引き剥して
、テープによって剥離された部分を除いた残りのガラス
母材上に密着残存した樹脂片の数を数え、90個以上を
「良好」とした。その結果を表1に示す。Test piece preparation conditions Base material glass plate...Dimensions: 35 x 35 x 2.5 mm Surface accuracy:
Double-sided polishing within 10 Newtons Silane coupling agent treatment...Coupling agent: γ-methacryloxypropyltrimethoxysilane (product name: A-174, manufactured by Nippon Unicar) Solution: Ethanol/Water/A-174=9/1/ 1 spin coating conditions: 500 rpm x 5 seconds → 3000 rpm x 3
0 second bake conditions: 100°C, 20 minutes Photocurable resin...Urethane acrylate composition Thickness: 1
00μm Irradiation conditions: 30mW/cm2 (365nm) x 10 minutes Flat plate type... Aluminum base material/KN plating surface polished finish Deposited film 5... Film material: (1) SiO2 100% (2) A
l2 O3 100% (3) SiO2 70%, B2 O3 30%; SiO
2 60%, B2 O3 40% Next, the test specimens prepared were: ■ Immediately after preparation (initial stage), ■ 80°C, 60% RH, 500
After leaving for a time (high temperature and humidity), -30℃ (1 hour) ←→70
℃ and 85% RH (1 hour) 30 times (temperature cycle), and then cut each piece into a 10 x 10 grid pattern with a cutter knife as shown in Figure 2 to obtain 100 pieces of resin. After adhering Sellotape (manufactured by Nichiban) to the surface, the Sellotape was peeled off at once, and the number of resin pieces remaining in close contact on the remaining glass base material excluding the part peeled off by the tape was counted. A score of 1 or more was considered "good." The results are shown in Table 1.
【0013】使用した硝材A,B,C,Dの組成は次の
通りである。
硝材A:B2 O3 38%,La2 O3 38%,
SiO2 7%、その他17%
硝材B:La2 O3 46%,B2 O3 30%,
La2 O3 11%,SiO2 3%、その他10%
硝材C:La2 O3 41%,B2 O3 40%,
CaO 6%,SiO2 2%、その他11%
硝材D:TiO2 28%,SiO2 25%,B2
O3 15%,BaO 7%、その他25%
表1 No. 硝材 蒸
着膜 密
着性試験 判定
初期 高温湿 温度サイクル
1 A なし
23 1 0
× 2 B
なし 11
0 2 ×
3 C なし
1 0
0 × 4 D
なし 5
4 15 23 ×
5 A SiO2 100%
86 63 2
3 × 6 B
SiO2 100%
92 55 10 ×
7 C Al2O3 100%
76 48
15 × 8 D
SiO2 100%
99 78 51 ×
9 A SiO2 70%,
B2O3 30% 100 98 10
0 ○ 10 B
SiO2 70%, B2O3 30% 100
98 98 ○
11 C SiO2 70%, B2O3
30% 100 95 92
○ 12 D SiO
2 60%, B2O3 40% 100 1
00 99 ○ 表1より明ら
かなように、蒸着膜なしの試験片No.1〜4では密着
性が劣っていた。また、蒸着膜ありの試験片No.5〜
8では、蒸着膜材をSiO2100%としたNo.5,
6,8は密着性が不充分であり、蒸着膜材をAl2 O
3 100%としたNo.7も密着性が不充分であった
。The compositions of the glass materials A, B, C, and D used are as follows. Glass material A: B2 O3 38%, La2 O3 38%,
SiO2 7%, other 17% Glass material B: La2 O3 46%, B2 O3 30%,
La2 O3 11%, SiO2 3%, others 10%
Glass material C: La2 O3 41%, B2 O3 40%,
CaO 6%, SiO2 2%, other 11% Glass material D: TiO2 28%, SiO2 25%, B2
O3 15%, BaO 7%, other 25%
Table 1 No. Glass material Vapor deposited film Adhesion test Judgment
Initial high temperature/humidity temperature cycle
1 A None
23 1 0
× 2 B
None 11
0 2 ×
3 C None
1 0
0 × 4D
None 5
4 15 23 ×
5 A SiO2 100%
86 63 2
3 × 6B
SiO2 100%
92 55 10 ×
7C Al2O3 100%
76 48
15 x 8D
SiO2 100%
99 78 51 ×
9 A SiO2 70%,
B2O3 30% 100 98 10
0 ○ 10B
SiO2 70%, B2O3 30% 100
98 98 ○
11C SiO2 70%, B2O3
30% 100 95 92
○ 12D SiO
2 60%, B2O3 40% 100 1
00 99 ○ As is clear from Table 1, test piece No. without vapor deposited film. In samples 1 to 4, the adhesion was poor. In addition, test piece No. with a vapor deposited film. 5~
In No. 8, the vapor deposition film material was 100% SiO2. 5,
Nos. 6 and 8 had insufficient adhesion, and the deposited film material was replaced with Al2O.
3 No. 100%. No. 7 also had insufficient adhesion.
【0014】これに対し、本発明の実施例(No9〜1
2)では、蒸着膜材をSiO2 70%,B2 O3
30%又はSiO2 60%,B2 O3 40%の混
合物とし、いずれの母材にも含まれるB2 O3 成分
を蒸着膜側にも含有させることにより、高い密着力が得
られ、比較例に対し著しい改善効果がみられた。In contrast, the embodiments of the present invention (Nos. 9 to 1)
In 2), the vapor deposition film material is SiO2 70%, B2 O3
30% or a mixture of 60% SiO2 and 40% B2 O3, and by incorporating the B2 O3 component contained in both base materials into the deposited film side, high adhesion strength can be obtained, which is a significant improvement over the comparative example. The effect was seen.
【0015】比較例1
図3(A)に示すように、硝材Cよりなる球面研磨母材
ガラスレンズ(φ25mm,両面R=55mm,中心厚
7mm)7上にSiO2 蒸着膜5を1000Å蒸着し
た。次いでその表面に図3(B)に示すように、シラン
カップリング剤硬化膜層2を設けた。次いで図3(C)
に示すように、非球面型(母材SUS/KNメッキ切削
,参照Rよりの最大偏肉量60μm)8上に紫外線硬化
樹脂を滴下し、その上に上記シランカップリング剤処理
済レンズを紫外線硬化樹脂層3の中心厚さが約70μm
になるように重ね合せた後、紫外光を照射して硬化させ
た。次いで離型して図3(D)に示す非球面レンズを作
成した。Comparative Example 1 As shown in FIG. 3A, a SiO2 vapor deposition film 5 of 1000 Å was deposited on a spherical polished base glass lens (φ25 mm, both sides R=55 mm, center thickness 7 mm) made of glass material C. Next, as shown in FIG. 3(B), a silane coupling agent cured film layer 2 was provided on the surface. Next, Figure 3(C)
As shown in the figure, an ultraviolet curable resin is dropped onto the aspherical mold (base material SUS/KN plated cutting, maximum thickness deviation 60 μm from reference R) 8, and the lens treated with the silane coupling agent is placed on top of the aspherical mold 8. The center thickness of the cured resin layer 3 is approximately 70 μm
After superimposing them so that The mold was then released to produce an aspherical lens shown in FIG. 3(D).
【0016】得られた非球面レンズを−30℃(1時間
)←→70℃、85%RH(1時間)を30回繰り返す
温度サイクル環境下に放置したところ、母材レンズより
の樹脂の部分的ハガレが生じ不良であった。When the obtained aspherical lens was left in a temperature cycle environment in which -30°C (1 hour)←→70°C, 85%RH (1 hour) was repeated 30 times, the resin part from the base material lens It was defective due to peeling.
【0017】実施例1
図3(A)において蒸着膜5をSiO2 70%,B2
O3 30%のものに代えた他は比較例1と全く同様
にして、図3(D)に示す非球面レンズを2個作成した
。この一方を比較例1と同じ温度サイクル環境下に放置
し、他方を80℃,60%RH(500時間)の高温湿
環境下に放置した。両方のレンズとも全く樹脂の剥離は
観察されず、ガラスと樹脂が強力に密着され良好であっ
た。Example 1 In FIG. 3(A), the deposited film 5 was made of 70% SiO2, B2
Two aspherical lenses shown in FIG. 3(D) were prepared in the same manner as Comparative Example 1 except that the lens was replaced with one containing 30% O3. One of these was left under the same temperature cycle environment as in Comparative Example 1, and the other was left under a high temperature and humidity environment of 80° C. and 60% RH (500 hours). In both lenses, no peeling of the resin was observed, and the glass and resin were strongly adhered to each other.
【0018】なお、本実施例では本発明の第1層の蒸着
膜の組成をSiO2 70%,B2 O3 30%とし
たが、この比率は膜と母材の密着が良好でかつ透明性が
保たれる範囲であればいかなるものでもよい。In this example, the composition of the first layer of the vapor deposited film of the present invention was 70% SiO2 and 30% B2O3, but this ratio was determined to ensure good adhesion between the film and the base material and maintain transparency. Any material may be used as long as it falls within the range.
【0019】また、B2 O3 以外の非金属の酸化物
であっても、母材成分と同じ成分であればいかなるもの
を用いてもよい。Furthermore, any non-metallic oxide other than B2O3 may be used as long as it has the same components as the base material.
【0020】更に、第1層はシリコン酸化物及びガラス
母材含有成分が主成分であればよく、SiO2 70%
,B2 O3 25%,Al2 O3 5%のような3
成分系の膜を用いてもよく、主成分以外であれば金属酸
化物を少量含有してもよい。更にまた、実施例では第1
層を蒸着膜としたが、第1層を溶液からの焼成コーティ
ング膜としてもよく、例えばアルコキシシリケート及び
B2 O3 の混合アルコール溶液を塗布後、ベークし
て得られるような膜にしてもよい。Furthermore, the first layer may be mainly composed of silicon oxide and glass matrix containing components, and may be made of 70% SiO2.
, B2 O3 25%, Al2 O3 5%.
A component-based film may be used, and a metal oxide may be contained in a small amount as long as it is not the main component. Furthermore, in the embodiment, the first
Although the first layer is a vapor-deposited film, the first layer may be a fired coating film from a solution, for example, a film obtained by coating a mixed alcoholic solution of alkoxysilicate and B2 O3 and then baking it.
【0021】また、本実施例は平板及び非球面レンズと
したが、樹脂表面に山形の繰り返し構造をもつフレネル
光学素子や凹凸等の繰り返し構造をもつ位相型回折格子
等にも適用可能である。Further, although the present embodiment uses a flat plate and an aspherical lens, it can also be applied to a Fresnel optical element having a repeating chevron structure on the resin surface, a phase type diffraction grating having a repeating structure such as concavities and convexities, and the like.
【0022】[0022]
【発明の効果】以上、本発明によれば、母材上にシリコ
ン酸化物、及びガラス母材含有成分のうちからシリコン
酸化物と金属酸化物を除いた少なくとも1種の成分を含
有する層を導入した構成により、母材の硝種がシリコン
酸化物25重量%以下であって、シランカップリング剤
を用いても密着力向上効果の少なく、しかもシリコン酸
化物や金属酸化物を蒸着しても充分な密着力が得られな
かったものに適用しても、母材と樹脂層とが充分強力に
密着された光学素子を可能にした。As described above, according to the present invention, a layer containing silicon oxide and at least one component other than silicon oxide and metal oxide from among the components contained in the glass base material is formed on the base material. Due to the introduced configuration, the glass type of the base material is 25% by weight or less of silicon oxide, so even if a silane coupling agent is used, there is little effect on improving adhesion, and even if silicon oxide or metal oxide is vapor-deposited, it is sufficient. Even when the present invention is applied to an optical element in which a strong adhesion force cannot be obtained, an optical element in which the base material and the resin layer are firmly adhered to each other has been made possible.
【図1】(A)〜(C)は本発明の光学素子の製造方法
を示す模式図であり、(D)は本発明の光学素子の模式
断面図である。FIGS. 1A to 1C are schematic diagrams showing a method for manufacturing an optical element of the present invention, and FIG. 1D is a schematic cross-sectional view of the optical element of the present invention.
【図2】(A)〜(C)は本発明の光学素子の製造方法
を示す模式図であり、(D)は本発明の光学素子の模式
断面図である。FIGS. 2A to 2C are schematic diagrams showing a method for manufacturing an optical element of the invention, and FIG. 2D is a schematic cross-sectional view of the optical element of the invention.
【図3】テープ剥離試験片の模式図である。FIG. 3 is a schematic diagram of a tape peel test piece.
1 母材ガラス板 2 シランカップリング剤硬化膜層 3 樹脂層 4 平板型 5 蒸着膜 6 カッターナイフによる切り込み 7 母材ガラスレンズ 8 非球面型 1 Base material glass plate 2 Silane coupling agent cured film layer 3 Resin layer 4 Flat type 5 Vapor deposited film 6 Cutting with a cutter knife 7 Base material glass lens 8 Aspherical type
Claims (4)
た、シリコン酸化物とガラス母材含有成分のうちからシ
リコン酸化物と金属酸化物を除いた少なくとも1種類の
成分を含有する第1層と、シランカップリング剤硬化膜
よりなる第2層と、有機高分子化合物よりなる第3層と
からなる光学素子。[Claim 1] A first glass base material containing a glass base material and at least one type of component formed in order on the glass base material, excluding silicon oxide and metal oxide from among silicon oxide and glass base material-containing components. an optical element comprising a layer, a second layer made of a silane coupling agent cured film, and a third layer made of an organic polymer compound.
ラス母材含有成分のうちからシリコン酸化物と金属酸化
物を除いた少なくとも1種類の成分を成分を含有する第
1層を形成し、次いでシランカップリング剤硬化膜より
なる第2層を形成し、次いで有機高分子化合物よりなる
第3層を形成することによる光学素子の製造方法。2. Forming on a glass base material a first layer containing at least one type of component excluding silicon oxide and metal oxide from silicon oxide and components contained in the glass base material, A method for manufacturing an optical element, which comprises then forming a second layer made of a silane coupling agent cured film, and then forming a third layer made of an organic polymer compound.
重量%以下含有するものである請求項1記載の光学素子
。[Claim 3] The glass base material contains 25 silicon oxides.
The optical element according to claim 1, wherein the optical element contains not more than % by weight.
のうちからシリコン酸化物と金属酸化物を除いた成分の
1種類が、ホウ素酸化物である請求項1記載の光学素子
。4. The optical element according to claim 1, wherein one of the silicon oxide and glass matrix-containing components excluding the silicon oxide and the metal oxide is a boron oxide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3027794A JPH04243936A (en) | 1991-01-30 | 1991-01-30 | Optical element and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3027794A JPH04243936A (en) | 1991-01-30 | 1991-01-30 | Optical element and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04243936A true JPH04243936A (en) | 1992-09-01 |
Family
ID=12230885
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3027794A Pending JPH04243936A (en) | 1991-01-30 | 1991-01-30 | Optical element and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04243936A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019116400A (en) * | 2017-12-27 | 2019-07-18 | 富士通株式会社 | Housing, electric apparatus, and method for manufacturing housing |
-
1991
- 1991-01-30 JP JP3027794A patent/JPH04243936A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019116400A (en) * | 2017-12-27 | 2019-07-18 | 富士通株式会社 | Housing, electric apparatus, and method for manufacturing housing |
US11306022B2 (en) | 2017-12-27 | 2022-04-19 | Fujitsu Limited | Casing, electronic device, and casing production method |
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