JPH04243163A - Close contact type image sensor - Google Patents
Close contact type image sensorInfo
- Publication number
- JPH04243163A JPH04243163A JP3003702A JP370291A JPH04243163A JP H04243163 A JPH04243163 A JP H04243163A JP 3003702 A JP3003702 A JP 3003702A JP 370291 A JP370291 A JP 370291A JP H04243163 A JPH04243163 A JP H04243163A
- Authority
- JP
- Japan
- Prior art keywords
- light receiving
- receiving elements
- image sensor
- light
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 239000011159 matrix material Substances 0.000 claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000005286 illumination Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、ファクシミリ装置の画
像読取り部等に用いられる密着型イメージセンサに係わ
り、特に受光素子をブロック分割してマトリクス駆動を
行う形式の密着型イメージセンサに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a contact type image sensor used in an image reading section of a facsimile machine, and more particularly to a contact type image sensor in which a light receiving element is divided into blocks and driven in a matrix.
【0002】0002
【従来の技術】この種の密着型イメージセンサの従来例
を図3により説明する。2. Description of the Related Art A conventional example of this type of contact type image sensor will be explained with reference to FIG.
【0003】図3において、1はガラス基板等の透明な
基板であり、この上に多数の受光素子(光電変換素子)
2が一定間隔で一直線に配列されている。受光素子2は
一定個数ずつ(この例では6個ずつ)ブロックに分けら
れており、各ブロックに対応して共通電極3が設けられ
、また個々の受光素子2に対応して個別電極4が設けら
れている。共通電極3は受光素子2の一方の端と接続し
、個別電極4は受光素子2の他方の端と接続する。In FIG. 3, reference numeral 1 denotes a transparent substrate such as a glass substrate, on which a large number of light receiving elements (photoelectric conversion elements) are mounted.
2 are arranged in a straight line at regular intervals. The light-receiving elements 2 are divided into blocks of a certain number (6 in this example), and a common electrode 3 is provided corresponding to each block, and an individual electrode 4 is provided corresponding to each light-receiving element 2. It is being The common electrode 3 is connected to one end of the light receiving element 2, and the individual electrode 4 is connected to the other end of the light receiving element 2.
【0004】5は全ブロック内の配列順番が同一の受光
素子2に対応した個別電極4を相互に接続するためのマ
トリクス配線部で、これはブロックに対応したパターン
となっており、下層の個別電極4のパターンの上に中間
絶縁層6により絶縁して6本(1ブロックの受光素子数
に等しい)の上層配線パターン7を設け、中間絶縁層6
を貫通するコンタクト部8によって対応した上層配線パ
ターン7と個別電極4のパターンとを接続する構成であ
る。Reference numeral 5 denotes a matrix wiring section for interconnecting the individual electrodes 4 corresponding to the light receiving elements 2 arranged in the same order in all the blocks, and this has a pattern corresponding to the blocks. Six upper layer wiring patterns 7 (equal to the number of light receiving elements in one block) are provided on the pattern of the electrode 4, insulated by an intermediate insulating layer 6, and the intermediate insulating layer 6
In this configuration, the corresponding upper layer wiring pattern 7 and the pattern of the individual electrode 4 are connected by a contact portion 8 penetrating through the contact portion 8 .
【0005】基板1の一辺に沿って、共通電極3の一部
である共通電極パッド3bと、マトリクス配線部5によ
って相互接続された個別電極群に対応した個別電極パッ
ド4bが交互に配設されている。4aは個別電極パッド
4bと対応個別電極群との接続のための個別電極リード
である。Common electrode pads 3b, which are part of the common electrode 3, and individual electrode pads 4b, which correspond to groups of individual electrodes interconnected by the matrix wiring section 5, are alternately arranged along one side of the substrate 1. ing. 4a is an individual electrode lead for connecting the individual electrode pad 4b and the corresponding individual electrode group.
【0006】[0006]
【発明が解決しようとする課題】しかし、かかる構成に
よれば、受講素子列が基板の片側に寄ってしまうので、
基板端面からの迷光が受光素子へ入りやすい等の問題が
あった。[Problem to be Solved by the Invention] However, according to such a configuration, the array of receiving elements is biased toward one side of the substrate.
There were problems such as stray light from the end surface of the substrate easily entering the light receiving element.
【0007】すなわち、実用的には1ブロック内の受光
素子数は32個程度とかなり多数であることから、マト
リクス配線部の占有面積が共通電極パッド及び個別電極
パッドの占有面積に比べ相当に大きくなる。したがって
、基板面を有効利用するためには、受光素子列を基板の
片側に寄せざるをえない。That is, in practice, the number of light receiving elements in one block is quite large, about 32, so the area occupied by the matrix wiring section is considerably larger than the area occupied by the common electrode pads and the individual electrode pads. Become. Therefore, in order to effectively utilize the substrate surface, it is necessary to move the light receiving element array to one side of the substrate.
【0008】通常、この種のイメージセンサは、大サイ
ズの単位基板上に複数個分を同時に製作し、最終的に個
々のイメージセンサ基板を切り出す。しかし、この切り
出したイメージセンサ基板の切断面は、基板上下面に対
し正確な垂直面とすることは難しく、ある程度傾いた面
になりやすい。イメージセンサの使用時には、基板の下
面(受光素子が形成された面と反対の面)側より原稿照
明光を照射するが、受光素子列が基板端面に近いと、傾
いた基板端面で反射された原稿照明光または他の外光が
迷光として受光素子に入りやすい。Normally, a plurality of image sensors of this type are manufactured simultaneously on a large-sized unit substrate, and finally individual image sensor substrates are cut out. However, it is difficult to make the cut surface of the image sensor substrate exactly perpendicular to the upper and lower surfaces of the substrate, and the cut surface tends to be inclined to some extent. When using an image sensor, document illumination light is emitted from the bottom surface of the substrate (the surface opposite to the surface on which the light-receiving elements are formed), but if the light-receiving element row is close to the edge of the substrate, the illumination light may be reflected off the slanted edge of the substrate. Original illumination light or other external light tends to enter the light receiving element as stray light.
【0009】他方、このような基板端面からの迷光を減
らすために、受光素子列を基板中央に配設しようとする
と、イメージセンサ基板の幅が増大してイメージセンサ
が大型化するだけでなく、単位基板より得られるイメー
ジセンサ個数が減少するため、イメージセンサの製造コ
ストの上昇を避けられない。On the other hand, if an attempt is made to arrange the light receiving element array at the center of the substrate in order to reduce such stray light from the end surface of the substrate, not only will the width of the image sensor substrate increase and the size of the image sensor will increase; Since the number of image sensors obtained from a unit substrate decreases, an increase in the manufacturing cost of image sensors is unavoidable.
【0010】本発明は、上述の問題点に鑑みてなされた
もので、基板面積の増大や製造コスト上昇を招くことな
く、基板端面からの迷光を受光素子に入りにくくできる
密着型イメージセンサを提供することを目的とする。The present invention has been made in view of the above-mentioned problems, and provides a close-contact image sensor that prevents stray light from entering a light-receiving element from an end surface of a substrate without increasing the substrate area or manufacturing cost. The purpose is to
【0011】[0011]
【課題を解決するための手段】本発明は上述の課題を解
決するため、受光素子をブロック化してマトリクス駆動
する形式の密着型イメージセンサにおいて、マトリクス
配線部を受光素子列の両側に分割して設けるという構成
を備えるものである。[Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention provides a contact type image sensor in which light-receiving elements are divided into blocks and driven in a matrix, in which a matrix wiring section is divided into both sides of a row of light-receiving elements. It is provided with the structure of providing.
【0012】0012
【作用】受光素子の1ブロック当たりの素子数が大きく
マトリクス配線部の占有面積が大きい場合においても、
上述のようにマトリクス配線部を受光素子列の両側に分
割配置することにより、マトリクス配線部を片側に集中
して設けた場合と同一またはほぼ同一の基板幅のまま、
受光素子列を基板の中央付近に配設することができる。
その結果、受光素子列と基板端面との距離が増加し、基
板端面からの迷光が受光素子に入りにくくなる。[Operation] Even when the number of light receiving elements per block is large and the area occupied by the matrix wiring section is large,
By arranging the matrix wiring section separately on both sides of the light-receiving element array as described above, the substrate width remains the same or almost the same as when the matrix wiring section is concentrated on one side.
The light receiving element array can be arranged near the center of the substrate. As a result, the distance between the light-receiving element array and the end face of the substrate increases, making it difficult for stray light from the end face of the substrate to enter the light-receiving elements.
【0013】[0013]
【実施例】図1は本発明の一実施例による密着型イメー
ジセンサの要部構成を示す概略平面図であり、図3に示
した従来例と対応した部分には同一番号または同様番号
が付けられている。図2は本イメージセンサの電気的接
続を示す回路図である。[Embodiment] FIG. 1 is a schematic plan view showing the main part configuration of a contact type image sensor according to an embodiment of the present invention, and parts corresponding to the conventional example shown in FIG. 3 are designated with the same or similar numbers. It is being FIG. 2 is a circuit diagram showing the electrical connections of this image sensor.
【0014】図1において、本イメージセンサは、従来
例と同様に受光素子2を連続した6個ずつブロック化し
ているが、各ブロックをさらに4個の受光素子2からな
る第1サブブロックと残りの2個の受光素子2からなる
第2サブブロックとに分割している。そして、各ブロッ
クに対応した共通電極3を途中で段違いにして全体とし
て受光素子列の両側に交互に位置するような千鳥形状と
し、各ブロックの第1サブブロックに属する4個の受光
素子2とはその一方の端(図1では上側)で接続し、第
2サブブロックに属する2個の受光素子2とは他方の端
(図1では下側)で接続する。In FIG. 1, in this image sensor, the light receiving elements 2 are divided into blocks of six consecutive light receiving elements 2 as in the conventional example, but each block is further divided into a first sub-block consisting of four light receiving elements 2 and the rest. It is divided into a second sub-block consisting of two light-receiving elements 2. Then, the common electrodes 3 corresponding to each block are arranged in a staggered manner so that the common electrodes 3 corresponding to each block are alternately positioned on both sides of the row of light receiving elements, and the four light receiving elements 2 belonging to the first sub-block of each block are arranged alternately on both sides of the row of light receiving elements. is connected at one end (upper side in FIG. 1), and connected to the two light receiving elements 2 belonging to the second sub-block at the other end (lower side in FIG. 1).
【0015】各受光素子2に対応した個別電極4も、共
通電極3と受光素子2との接続に合わせ、各ブロックの
第1サブブロックに属する受光素子2と第2サブブロッ
クに属する受光素子2とでは逆側端で接続するように千
鳥状配置とされている。The individual electrodes 4 corresponding to each light receiving element 2 are also connected to the light receiving element 2 belonging to the first sub-block and the light receiving element 2 belonging to the second sub-block of each block in accordance with the connection between the common electrode 3 and the light receiving element 2. They are arranged in a staggered manner so that they connect at opposite ends.
【0016】マトリクス配線部は、各ブロックの第1サ
ブブロック受光素子2に対応した個別電極4のマトリク
ス接続のためのマトリクス配線部5aと、第2サブブロ
ック受光素子2に対応した個別電極4のマトリクス接続
のためのマトリクス配線部5bとに分割され、それぞれ
受光素子列の両側に配設されている。The matrix wiring section includes a matrix wiring section 5a for matrix connection of the individual electrodes 4 corresponding to the first sub-block light receiving elements 2 of each block, and a matrix wiring section 5a for connecting the individual electrodes 4 corresponding to the second sub-block light receiving elements 2 of each block. It is divided into matrix wiring portions 5b for matrix connection, and each is disposed on both sides of the light receiving element array.
【0017】共通電極パッド3bと個別電極パッド4b
は従来と同様に基板1の一辺に沿って配設され、個別電
極パッド4bは従来と同様に個別電極リード4aによっ
て対応した個別電極パターンと接続される。共通電極リ
ード3a及び個別電極リード4aは、マトリクス配線部
5bの上層配線パターン7と交差するが、その間は中間
絶縁層6により絶縁される。Common electrode pad 3b and individual electrode pad 4b
are arranged along one side of the substrate 1 as in the prior art, and the individual electrode pads 4b are connected to corresponding individual electrode patterns by individual electrode leads 4a as in the prior art. The common electrode lead 3a and the individual electrode lead 4a intersect with the upper wiring pattern 7 of the matrix wiring section 5b, but are insulated by the intermediate insulating layer 6 between them.
【0018】ここまでの説明及び図1から明らかなよう
に、本イメージセンサにおいては、受光素子列の両側に
分割してマトリクス配線部5a,5bが設けられるため
、受光素子ブロックの素子数が実用的な32素子という
ように増加しても、従来構成(受光素子列を基板片側に
寄せた構成)による場合とほぼ同じ基板幅(基板面積)
のままで、受光素子列を基板中央付近に配置することが
できる。As is clear from the above explanation and FIG. 1, in this image sensor, the matrix wiring portions 5a and 5b are provided on both sides of the light receiving element row, so that the number of elements in the light receiving element block can be reduced to a practical level. Even if the number of elements is increased to 32 elements, the board width (board area) is almost the same as with the conventional configuration (a configuration in which the photodetector array is moved to one side of the board).
The light-receiving element array can be placed near the center of the substrate without changing the structure.
【0019】なお、本イメージセンサにおいて、共通電
極を受光素子列の両側にまたがる千鳥形状とし、これに
対応して個別電極も千鳥配列としたが、それぞれの電極
は従来と同様の直線的形状あるいは配置とすることも可
能である。ただし、千鳥形状もしくは千鳥配置とすると
、配線の交差を減らすことができる等の利点がある。In this image sensor, the common electrode has a staggered shape spanning both sides of the light-receiving element array, and the individual electrodes have also been arranged in a staggered manner, but each electrode may have a linear shape similar to the conventional one or a staggered arrangement. It is also possible to set it as an arrangement. However, using a staggered shape or a staggered arrangement has advantages such as being able to reduce wiring intersections.
【0020】また、本イメージセンサでは各ブロックを
2:1の素子数割合でサブブロックに分割し、それに対
応してマトリクス配線部を分割したが、ブロック内素子
数が32素子というように増加した場合は、その分割割
合を1:1に近付けることができる。この分割割合は、
共通電極パッド及び個別電極パッドによる占有面積を考
慮し、基板端面から受光素子列が十分に離れるように選
ぶとよい。In addition, in this image sensor, each block is divided into subblocks at a ratio of 2:1 in the number of elements, and the matrix wiring section is divided accordingly, but the number of elements in the block increases to 32 elements. In this case, the division ratio can be brought closer to 1:1. This division ratio is
It is preferable to consider the area occupied by the common electrode pad and the individual electrode pads, and to select such that the light-receiving element array is sufficiently separated from the end surface of the substrate.
【0021】[0021]
【発明の効果】以上の説明から明らかなように、本発明
はマトリクス配線部を受光素子列の両側に分割して設け
ることにより、基板面積を増大させずに受光素子列を基
板中央付近に容易に配置することができるので、基板端
面からの迷光が受光素子に入光しにくい密着型イメージ
センサを、従来の同等の製造コストで、かつ従来と同等
のサイズで実現できるという効果を有するものである。[Effects of the Invention] As is clear from the above description, the present invention provides a matrix wiring section divided on both sides of the photodetector array, so that the photodetector array can be easily placed near the center of the board without increasing the board area. This has the effect of making it possible to create a close-contact image sensor in which stray light from the edge of the substrate is less likely to enter the light-receiving element at the same manufacturing cost and size as the conventional one. be.
【図1】本発明の一実施例による密着型イメージセンサ
の要部構成を示す概略平面図FIG. 1 is a schematic plan view showing the configuration of main parts of a contact type image sensor according to an embodiment of the present invention.
【図2】同密着型イメージセンサの電気的接続を示す回
路図[Figure 2] Circuit diagram showing electrical connections of the contact type image sensor
【図3】従来の密着型イメージセンサの要部構成を示す
概略平面図[Fig. 3] A schematic plan view showing the main part configuration of a conventional contact type image sensor.
1 基板 2 受光素子 3 共通電極 3a 共通電極リード 3b 共通電極パッド 4 個別電極 4a 個別電極リード 4b 個別電極パッド 5a,5b マトリクス配線部 6 中間絶縁層 7 上層配線パターン 8 コンタクト部 1 Board 2 Photo receiving element 3 Common electrode 3a Common electrode lead 3b Common electrode pad 4 Individual electrodes 4a Individual electrode lead 4b Individual electrode pad 5a, 5b Matrix wiring part 6 Intermediate insulation layer 7 Upper layer wiring pattern 8 Contact part
Claims (1)
素子と、この受光素子の連続した一定個数よりなるブロ
ックに対応し、対応ブロック内の受光素子に共通に連続
した共通電極と、前記受光素子のそれぞれに対応し、対
応した受光素子に接続した個別電極と、すべての前記ブ
ロック内の配列順番が同一の受光素子に対応した前記個
別電極を相互接続するマトリクス配線部と、前記共通電
極に接続した共通電極パッドと、前記マトリクス配線に
よって相互接続された前記個別電極の群と接続した個別
電極パッドとを有し、前記マトリクス配線部を前記受光
素子の配列の両側に分割して設けてなる密着型イメージ
センサ。1. A plurality of light receiving elements arranged linearly on a substrate, and a common electrode that corresponds to a block consisting of a fixed number of continuous light receiving elements and that is common and continuous to the light receiving elements in the corresponding block. , a matrix wiring section that interconnects individual electrodes corresponding to each of the light receiving elements and connected to the corresponding light receiving elements, and the individual electrodes corresponding to the light receiving elements having the same arrangement order in all the blocks; a common electrode pad connected to a common electrode, and an individual electrode pad connected to a group of individual electrodes interconnected by the matrix wiring, the matrix wiring section being divided into both sides of the array of the light receiving elements; A close-contact image sensor is provided.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3003702A JPH04243163A (en) | 1991-01-17 | 1991-01-17 | Close contact type image sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3003702A JPH04243163A (en) | 1991-01-17 | 1991-01-17 | Close contact type image sensor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04243163A true JPH04243163A (en) | 1992-08-31 |
Family
ID=11564704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3003702A Pending JPH04243163A (en) | 1991-01-17 | 1991-01-17 | Close contact type image sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04243163A (en) |
-
1991
- 1991-01-17 JP JP3003702A patent/JPH04243163A/en active Pending
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