JPH04240259A - Production of fluffed cloth - Google Patents

Abstract

PURPOSE:To produce a fluffed cloth having stripes of fluffed area by an extremely simple process. CONSTITUTION:A fluffed cloth having striped fluff pattern is produced by masking a part of a carding cloth roll of a carding cloth raising machine in lateral direction with a tacky adhesive tape, etc., and carrying out the raising treatment of a cloth to cause the difference of raising extent between the masked part and the non-masked part.

Description

[Detailed description of the invention]

0001

[Industrial Application Field] The present invention is directed to a raised fabric having a novel appearance, and more specifically, by changing the nap density and length of the nap on the fabric surface in the width direction, a new striped appearance is expressed on the nap surface. The present invention relates to a method for producing a raised fabric.

0002

[Prior art] In recent years, the importance of brushing to increase the added value of textile products has increased.
It has become more common than ever to fluff fabrics made of blended fibers. Methods for manufacturing such napped fabrics include a napped machine in which a plurality of rotating cloth rolls for napped cloth are arranged on a rotating drum, and a roller sander in which sandpaper is wound around a large diameter roll. Commonly used.

However, when it comes to raising using conventional raising machines, most of the focus is on producing a raised fabric with a uniform raised density and length on the surface of the raised fabric. There have not been many attempts to change the width or length of the fabric.

[0004] Conventionally, in order to produce a fabric with a difference in nap length on the fabric surface, a napping process was first performed using a napping machine or the like to produce a napped fabric with uniform nap density and nap length on the fabric surface. After that, there are methods of applying different nap lengths using other processing machines, such as calendar processing, embossing, partial shearing, covering a drum with a punched floral pattern with napping fabric, and partially brushing it from the inside with a hard brush. , Before raising, a glue that suppresses raising or a drug that promotes raising is partially applied to the raising fabric by printing, etc., and then a raising treatment is performed to change the raised raising on the surface of the fabric, Methods such as creating patterns and the like have been used.

[0005]

[Problem to be solved by the invention] However, these methods require pre-treatment or post-processing in addition to the napping treatment, which increases the number of steps and costs.
Additionally, there is a problem in that machining defects occur due to the increased number of machining steps.

[0006] Furthermore, when raising the fluff with a roller sander having sandpaper or sandcloth, the grain size of the sandpaper or sandcloth is changed in the width direction to form a warp striped pattern, and this is passed through the woven or knitted fabric. A method for producing uneven raised woven and knitted fabrics has been proposed, but roller sanders can only produce raised fabrics with a short nap length, and the unevenness of the raised naps is also small. No material having a striped appearance with full-fledged differences in the length of the raised hairs has been obtained.

The present invention solves the above-mentioned problems by changing the nap density and nap length on the fabric surface in the width direction of the fabric without performing nap pre-treatment or post-treatment.
The object of the present invention is to provide a manufacturing method for easily obtaining a napped fabric having a new striped appearance on the napped surface.

[0008]

[Means for Solving the Problems] The present invention achieves the above-mentioned object, and provides a napping machine in which a plurality of rotating clothing rolls for napping are arranged on a rotating drum. The present invention provides a method for manufacturing a raised fabric having a novel appearance, which is characterized in that a part of the fabric is masked and raised.

[0009] Hereinafter, one example of the present invention will be explained in detail with reference to the drawings.

FIG. 1 shows a masked clothing roll,
2 and 3 are schematic diagrams of raised fabrics produced by the method of the present invention.

FIG. 1 is a diagram developed on a plane to clearly explain the masking applied to the cloth roll of the napping machine. (A) to (F) are clothing rolls, 1
is a masking part where a part of the clothing roll is masked. As this masking material, adhesive tape with adhesive applied on one side, cloth tape, vinyl tape, etc. can be used, but these masking tapes have strong adhesive strength even when the clothing roll is rotated at high speed. It is desirable to have The masking part 1 and the non-masking part 2, which is a normal raised part, may be configured in any proportion, and may be changed depending on the desired form of raised raising.
If all clothing rolls are masked at the same location, wrinkles may occur in the fabric, so it is preferable to leave at least one or two unmasked areas.

FIG. 2 is a schematic cross-sectional view in the width direction of a raised fabric obtained when the clothing roll is masked and raised as shown in FIG. Raised hair corresponding to masking part 1, 4a, 4b, 4c
represents the raised hair in the normal raised area corresponding to the non-masking area. In this example, the raised naps 3a, 3b, 3c corresponding to the masked areas are less raised due to half of the clothing roll being masked, compared to the raised naps 4a, 4b, 4c corresponding to the non-masked areas. Therefore, the piloerection density and piloerection length are about 1/2. Here, the raised hair 3a,
The boundaries between 3b, 3c and the raised naps 4a, 4b, 4c are the widths of the fabric 5 (A), (B), (C) due to repeated napping.
, becomes narrower in the order of , resulting in a tapered state.

FIG. 3 is a schematic plan view of the raised fabric of FIG. 2(C) viewed from the raised surface. Due to the masking section 1, the nap density of the naps 3c is approximately 1/2 of the nap density of the naps 4c in the non-masking section 2, so that the nap surface has a striped shape.

[0014] Normally, a napping machine has around 20 cloth rolls for napping that rotate on a rotating drum.
Moreover, there are rolls with raking needles called counter pile rolls and rolls with raking needles called pile rolls. In the method of the present invention, it is particularly desirable to mask the counter pile rolls, and the number of rolls to be masked is A preliminary test may be conducted to determine the number, masking width, and position appropriately.

[0015]

[Function] When a part of the clothing roll is masked when raising the fiber fabric as in the method of the present invention, the raised action is not applied to the masked part, so the density of the raised is lower than that of the non-masked part, and the raised Therefore, according to the method of the present invention, it is possible to obtain a napped fabric having a novel appearance in which the napped surface has a striped shape and the napped density and napped length are changed in the width direction of the fabric.

[0016]

[Example] A 5-ply satin fabric with double weft on both sides (warp density 110 yarns/
Weft yarn density: 164 threads/inch).

Using this woven fabric, it was relaxed, refined, and dyed gray in the usual manner, and then heat set at 170° C. for 50 seconds using a pin tenter. The total width of the set was 150 cm.

Next, when raising the cloth using a hydraulic needle cloth raising machine (OR24 type hydraulic raising machine, manufactured by Nankai Tekko Co., Ltd.),
As shown in FIG. 1, adhesive cloth tape (manufactured by Sekisui Chemical Co., Ltd., No. 60
0) was wrapped around the cloth to raise the front side of the fabric three times. The width of each masking part 1 was 12 cm.

[0019] After the first napping, a napped fabric as shown in the cross-sectional schematic diagram (A) having different striped naps over the entire length of the fabric was obtained. The total width of this raised fabric is 14
The width of the nap 3a in the masked part was about 11 cm and the nap length was about 0.5 mm, and the nap length of the nap 4a in the non-masked part was about 1.0 mm.

[0020] Subsequently, by raising the fabric a second time, a raised fabric as shown in the cross-sectional schematic diagram (B) with further differences in the striped naps was obtained. The width of this raised fabric is 132cm,
The width of the raised hair 3b in the masked area is approximately 10 cm.
, the nap length was about 1.0 mm, and the nap length of the non-masking part 4b was about 2.2 mm.

[0021]Furthermore, by raising the fabric for the third time, a raised fabric as shown in the cross-sectional schematic diagram (C), which has a considerable difference in the striped naps, was obtained. The width of this raised fabric is 125cm.
The width of the raised hair 3c in the masked area is approximately 8 cm,
The length of the raised hair was about 1.3 mm, and the raised length of the raised hair 4c in the non-masking area was about 3 mm.

Next, the cloth tape from the masking area was removed, the back side of the cloth was lightly raised once, and heat set was performed at 180° C. for 30 seconds. The napped fabric obtained in this way has long naps with an average nap length of about 3 mm and an average nap length of about 1 mm.
．． Short naps of 3 mm appeared in a striped pattern along the length of the napped fabric, resulting in a napped fabric with a new appearance that had not been found in previous napping fabrics.

[0023] After this, an antistatic agent, a hardening agent,
The ones that had been slightly coated with water repellent, dried, and finished were of even higher quality.

[0024]

Effects of the Invention According to the present invention, by simply masking directly with tape or the like over the clothing roll of a commonly used napping machine, the napping density and napping length on the surface of the fabric change in the width direction. It is possible to obtain a raised fabric having a novel appearance with a striped surface, and it is also very easy to handle since it is only necessary to remove the masking tape when returning to normal use.

[Brief explanation of the drawing]

FIG. 1 is a schematic example of implementing the method of the invention on a clothing roll.

FIG. 2 is an example of a schematic diagram of a case where napping is performed by the method shown in FIG. 1;

FIG. 3 is an example of a schematic plan view of the napped fabric viewed from the napped surface.

[Explanation of symbols]

(A) ~ (F) Clothing roll 1 Masking part 2 Non-masking part

Claims (1)

[Claims] Claim 1. A napping fabric characterized in that a napping machine of a type in which a plurality of rotating napping cloth rolls are arranged on a rotating drum is characterized in that the napping process is performed by masking a part of the clothing roll. manufacturing method.