JPH04239012A - New actinic radiation-curable resin composition - Google Patents
New actinic radiation-curable resin compositionInfo
- Publication number
- JPH04239012A JPH04239012A JP202891A JP202891A JPH04239012A JP H04239012 A JPH04239012 A JP H04239012A JP 202891 A JP202891 A JP 202891A JP 202891 A JP202891 A JP 202891A JP H04239012 A JPH04239012 A JP H04239012A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- curable resin
- resin composition
- actinic radiation
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 16
- 229920005989 resin Polymers 0.000 claims abstract description 45
- 239000011347 resin Substances 0.000 claims abstract description 45
- 150000007519 polyprotic acids Polymers 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 7
- 150000008065 acid anhydrides Chemical class 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 24
- 239000011248 coating agent Substances 0.000 abstract description 17
- 238000000576 coating method Methods 0.000 abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 11
- 239000002904 solvent Substances 0.000 abstract description 8
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 abstract description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000976 ink Substances 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 4
- BRTHMFXKGHIZAM-UHFFFAOYSA-N 2-hydroxy-1-phenylheptan-1-one Chemical compound CCCCCC(O)C(=O)C1=CC=CC=C1 BRTHMFXKGHIZAM-UHFFFAOYSA-N 0.000 abstract description 3
- 150000002763 monocarboxylic acids Chemical class 0.000 abstract description 3
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 3
- GZRGHDIUPMPHCB-UHFFFAOYSA-N 1-[4-(4-acetylphenoxy)phenyl]ethanone Chemical compound C1=CC(C(=O)C)=CC=C1OC1=CC=C(C(C)=O)C=C1 GZRGHDIUPMPHCB-UHFFFAOYSA-N 0.000 abstract description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 18
- 239000004593 Epoxy Substances 0.000 description 13
- 239000003973 paint Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- -1 anhydride compound Chemical class 0.000 description 7
- 125000003700 epoxy group Chemical group 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 125000002723 alicyclic group Chemical group 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 150000008064 anhydrides Chemical class 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 5
- 239000003999 initiator Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- RAADBCJYJHQQBI-UHFFFAOYSA-N 2-sulfoterephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(S(O)(=O)=O)=C1 RAADBCJYJHQQBI-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000004480 active ingredient Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- MIHINWMALJZIBX-UHFFFAOYSA-N cyclohexa-2,4-dien-1-ol Chemical class OC1CC=CC=C1 MIHINWMALJZIBX-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 2
- TXXHDPDFNKHHGW-UHFFFAOYSA-N muconic acid Chemical compound OC(=O)C=CC=CC(O)=O TXXHDPDFNKHHGW-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- DJKGDNKYTKCJKD-BPOCMEKLSA-N (1s,4r,5s,6r)-1,2,3,4,7,7-hexachlorobicyclo[2.2.1]hept-2-ene-5,6-dicarboxylic acid Chemical compound ClC1=C(Cl)[C@]2(Cl)[C@H](C(=O)O)[C@H](C(O)=O)[C@@]1(Cl)C2(Cl)Cl DJKGDNKYTKCJKD-BPOCMEKLSA-N 0.000 description 1
- FGOSBCXOMBLILW-UHFFFAOYSA-N (2-oxo-1,2-diphenylethyl) benzoate Chemical compound C=1C=CC=CC=1C(=O)OC(C=1C=CC=CC=1)C(=O)C1=CC=CC=C1 FGOSBCXOMBLILW-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- DWFUTNJGNBYHNN-UHFFFAOYSA-N 2,2,4-trimethylhexanedioic acid Chemical compound OC(=O)CC(C)CC(C)(C)C(O)=O DWFUTNJGNBYHNN-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical class C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- YZTJKOLMWJNVFH-UHFFFAOYSA-N 2-sulfobenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1S(O)(=O)=O YZTJKOLMWJNVFH-UHFFFAOYSA-N 0.000 description 1
- XIRDTMSOGDWMOX-UHFFFAOYSA-N 3,4,5,6-tetrabromophthalic acid Chemical compound OC(=O)C1=C(Br)C(Br)=C(Br)C(Br)=C1C(O)=O XIRDTMSOGDWMOX-UHFFFAOYSA-N 0.000 description 1
- RDFQSFOGKVZWKF-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)C(O)=O RDFQSFOGKVZWKF-UHFFFAOYSA-N 0.000 description 1
- WNKQDGLSQUASME-UHFFFAOYSA-N 4-sulfophthalic acid Chemical compound OC(=O)C1=CC=C(S(O)(=O)=O)C=C1C(O)=O WNKQDGLSQUASME-UHFFFAOYSA-N 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- TXXHDPDFNKHHGW-CCAGOZQPSA-N Muconic acid Natural products OC(=O)\C=C/C=C\C(O)=O TXXHDPDFNKHHGW-CCAGOZQPSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- QHWKHLYUUZGSCW-UHFFFAOYSA-N Tetrabromophthalic anhydride Chemical compound BrC1=C(Br)C(Br)=C2C(=O)OC(=O)C2=C1Br QHWKHLYUUZGSCW-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- JJLKTTCRRLHVGL-UHFFFAOYSA-L [acetyloxy(dibutyl)stannyl] acetate Chemical compound CC([O-])=O.CC([O-])=O.CCCC[Sn+2]CCCC JJLKTTCRRLHVGL-UHFFFAOYSA-L 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- RHZUVFJBSILHOK-UHFFFAOYSA-N anthracen-1-ylmethanolate Chemical compound C1=CC=C2C=C3C(C[O-])=CC=CC3=CC2=C1 RHZUVFJBSILHOK-UHFFFAOYSA-N 0.000 description 1
- 239000003830 anthracite Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
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- 235000013877 carbamide Nutrition 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- YRMXLGJOOSNONR-UHFFFAOYSA-N cyclohex-2-ene-1,1,2-tricarboxylic acid Chemical compound OC(=O)C1=CCCCC1(C(O)=O)C(O)=O YRMXLGJOOSNONR-UHFFFAOYSA-N 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000005028 tinplate Substances 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は新規にして有用なるエネ
ルギー線硬化型樹脂組成物に関する。さらに詳細には、
本発明は有効成分として、特定のエポキシ化合物と、特
定のエポキシ基と反応する官能基と不飽和二重結合を有
する化合物と、芳香族、脂肪族および/または脂環式多
塩基酸の無水物なる化合物との反応によって得られるエ
ネルギー線硬化型樹脂を含んで成る、エネルギー線硬化
型樹脂組成物に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a new and useful energy ray curable resin composition. In more detail,
The present invention uses, as active ingredients, a specific epoxy compound, a compound having a functional group and an unsaturated double bond that reacts with a specific epoxy group, and anhydrides of aromatic, aliphatic, and/or alicyclic polybasic acids. The present invention relates to an energy ray curable resin composition comprising an energy ray curable resin obtained by reaction with a compound.
【0002】そして、かかる本発明のエネルギー線硬化
型樹脂組成物は、コーティング材、印刷インキ、フォト
レジストならびに接着剤などの広範な用途に適した、極
めて有用なる、紫外線や電子線などの、いわゆるエネル
ギー線により硬化可能な樹脂組成物である。The energy ray curable resin composition of the present invention is suitable for a wide range of uses such as coating materials, printing inks, photoresists, adhesives, etc. It is a resin composition that can be cured by energy rays.
【0003】0003
【従来の技術】エネルギー線で硬化可能なる樹脂、就中
、ラジカル重合反応により硬化する樹脂としては、不飽
和ポリエステル樹脂、ビニルエステル樹脂(エポキシー
アクリレート)、各種オリゴアクリレートまたはジアリ
ルフタレートプレポリマーなどの各種のものがあり、こ
うした樹脂類は、それぞれの用途分野で、特徴が生かさ
れ、広範に用いられている。[Prior Art] Resins that can be cured by energy beams, especially resins that can be cured by radical polymerization reactions, include various types of resins such as unsaturated polyester resins, vinyl ester resins (epoxy acrylates), various oligoacrylates, and diallylphthalate prepolymers. These resins are widely used in their respective fields of application, making the most of their characteristics.
【0004】しかし、近年、その用途が広がるに伴い、
益々、その性能に対する要求が高まっているものの、す
べての諸性能を満足させ得るような、エネルギー線によ
り硬化可能な樹脂組成物は、未だに、得られていない。However, in recent years, as its uses have expanded,
Although demands for performance are increasing, a resin composition curable by energy rays that can satisfy all the performance requirements has not yet been obtained.
【0005】[0005]
【発明が解決しようとする問題点】しかるに、本発明者
らは、前述の情勢に鑑み、既存の樹脂では満足できない
ような用途に対しても用いることが出来、耐水性、耐溶
剤性、耐薬品性、耐熱性ならびに硬化性などに優れた、
ラジカル硬化型の樹脂の合成について、鋭意、検討を重
ねて来たが、特定の多官能のエポキシ化合物と、エポキ
シ基と反応しうる特定の官能基と不飽和二重結合とを併
せ有する化合物と、芳香族、脂肪族および脂環式多塩基
酸の無水物よりなる群から選ばれる化合物との反応によ
って得られるエネルギー線硬化型樹脂が上記の様な塗膜
の諸性能を満足させることが出来ることを見い出すに及
んで、本発明を完成するに到った。[Problems to be Solved by the Invention] However, in view of the above-mentioned situation, the present inventors have discovered that it can be used for applications that cannot be satisfied with existing resins, and has excellent water resistance, solvent resistance, and Excellent in chemical properties, heat resistance, and curing properties.
We have been conducting extensive research into the synthesis of radical-curing resins, but we have found that a specific multifunctional epoxy compound, a compound that has both a specific functional group that can react with an epoxy group, and an unsaturated double bond. An energy ray-curable resin obtained by reaction with a compound selected from the group consisting of anhydrides of aromatic, aliphatic, and alicyclic polybasic acids can satisfy the various properties of the coating film described above. By discovering this, we have completed the present invention.
【0006】[0006]
【課題を解決するための手段】すなわち、本発明は基本
的には、特定の多官能エポキシ化合物と、エポキシ基と
反応する官能基および不飽和二重結合を樹脂骨格中に併
せ有する化合物と、芳香族、脂肪族および/または脂環
式多塩基酸の無水物なる化合物との反応によって得られ
る、特定のエネルギー線硬化型樹脂を含有することから
成る、新規なエネルギー線硬化型樹脂組成物を提供する
ものである。[Means for Solving the Problems] That is, the present invention basically consists of a specific polyfunctional epoxy compound, a compound having both a functional group that reacts with an epoxy group and an unsaturated double bond in its resin skeleton, A novel energy ray curable resin composition containing a specific energy ray curable resin obtained by reacting an aromatic, aliphatic and/or alicyclic polybasic acid with an anhydride compound. This is what we provide.
【0007】そして具体的には、一般式[0007] Specifically, the general formula
【0008】[0008]
【化5】[C5]
【0009】[ただし、式中のXは酸素原子またはCH
2 基を表すものとし、Rは水素原子またはメチル基を
表わすものとし、また、Yは一般式[However, X in the formula is an oxygen atom or CH
2 group, R represents a hydrogen atom or a methyl group, and Y represents a general formula
【0010】0010
【化6】[C6]
【0011】(ただし、式中のR1は水素原子またはメ
チル基を表わすものとし、R2は水素原子、メチル基、
シアノ基またはハロゲン原子を表わすものとし、B1は
多塩基酸無水物の残基を表わすものとする。)で示され
る基を表わすものとすし、さらに、Zはそれぞれ、同一
であっても異なっていてもよい、一般式(However, R1 in the formula represents a hydrogen atom or a methyl group, and R2 represents a hydrogen atom, a methyl group,
It represents a cyano group or a halogen atom, and B1 represents a residue of a polybasic acid anhydride. ), and each Z represents a group represented by the general formula, which may be the same or different.
【0012】0012
【化7】[C7]
【0013】(ただし、式中のR1は水素原子またはメ
チル基を表わすものとし、R2は水素原子、メチル基、
シアノ基またはハロゲン原子を表わすものとし、B1は
多塩基酸無水物の残基を表わすものとする。)または式
(However, R1 in the formula represents a hydrogen atom or a methyl group, and R2 represents a hydrogen atom, a methyl group,
It represents a cyano group or a halogen atom, and B1 represents a residue of a polybasic acid anhydride. ) or expression
【0014】[0014]
【化8】[Chemical formula 8]
【0015】で示される基を表わすものとする。)]で
示される化合物の、それぞれ、YおよびZが、エポキシ
基となっている特定の多官能のエポキシ化合物と、不飽
和モノカルボン酸との反応物と、芳香族、脂肪族および
脂環式多塩基酸の無水物よりなる群から選ばれる化合物
との反応によって得られる、エネルギー線硬化型樹脂を
、有効成分として含んで成る、新規にして有用なるエネ
ルギー線硬化型樹脂組成物を提供しようとするものであ
る。It represents a group represented by the following. )], a reaction product of a specific polyfunctional epoxy compound in which Y and Z are epoxy groups, and an unsaturated monocarboxylic acid, and aromatic, aliphatic and alicyclic It is an object of the present invention to provide a new and useful energy beam curable resin composition comprising as an active ingredient an energy beam curable resin obtained by reaction with a compound selected from the group consisting of anhydrides of polybasic acids. It is something to do.
【0016】ここにおいて、上記エネルギー線硬化型樹
脂〔以下、樹脂(A)ともいう。〕とは、特定の多官能
のエポキシ化合物と、不飽和モノカルボン酸との反応物
と、芳香族、脂肪族および脂環式多塩基酸の無水物から
選ばれる化合物との反応生成物を指称するものである。[0016] Here, the energy ray curable resin [hereinafter also referred to as resin (A)] is used. ] refers to the reaction product of a specific polyfunctional epoxy compound, a reaction product with an unsaturated monocarboxylic acid, and a compound selected from anhydrides of aromatic, aliphatic, and alicyclic polybasic acids. It is something to do.
【0017】当該樹脂(A)としては、勿論、上述した
ような各種の化合物を反応したものであれば、いずれも
使用することが出来るが、それらのうちでも特に代表的
なもののみを例示するに留めれば、まず、特定の多官能
エポキシ化合物(以下、これを(a−1)として扱うも
のとする。)と、エポキシ基と反応する不飽和モノカル
ボン酸化合物(以下、これを(a−2)として扱うもの
とする。)とから得られる特定の反応物(以下、これを
(a−3)として扱うものとする。)に、少なくとも1
つの芳香族、脂肪族および脂環式多塩基酸の無水物から
選ばれる化合物(a−4)とを反応させて得られる樹脂
などが好適なものである。As the resin (A), of course, any resin can be used as long as it is a reaction product of the various compounds mentioned above, but only the most representative ones will be exemplified. First, a specific polyfunctional epoxy compound (hereinafter referred to as (a-1)) and an unsaturated monocarboxylic acid compound (hereinafter referred to as (a-1)) that reacts with the epoxy group. -2)) (hereinafter, this will be treated as (a-3)).
Resins obtained by reacting the compound (a-4) with anhydrides of aromatic, aliphatic, and alicyclic polybasic acids are suitable.
【0018】そのうち、まず、上記の(a−3)を調製
するための特定の多官能エポキシ化合物(a−1)とし
て特に代表的なもののみを挙げると、4,4’−ジアセ
チルジフェニルエーテルの2個のアセチル基と1価フェ
ノール類とを、酸性触媒の存在下で、脱水縮合させて4
官能フェノール誘導体なる一種の中間体を得、次いで、
この4官能フェノール誘導体から、常法により得られる
、前掲の一般式〔1〕において、それぞれ、YおよびZ
の双方が、悉く、エポキシ基となっているものなどであ
る。[0018] Among them, first of all, only representative ones are listed as the specific polyfunctional epoxy compound (a-1) for preparing the above (a-3). 4 acetyl groups and monohydric phenols are dehydrated and condensed in the presence of an acidic catalyst.
A kind of intermediate, a functional phenol derivative, is obtained, and then
In the above general formula [1] obtained from this tetrafunctional phenol derivative by a conventional method, Y and Z are respectively
Both of them are all epoxy groups.
【0019】他方、前記エポキシ基と反応する不飽和モ
ノカルボン酸類(a−2)として特に代表的なものとし
ては、アクリル酸、メタクリル酸、クロトン酸または桂
皮酸などが挙げられ、これらは単独使用でも2種以上の
併用であってもよいが、就中、アクリル酸の使用が望ま
しい。On the other hand, particularly representative unsaturated monocarboxylic acids (a-2) that react with the epoxy group include acrylic acid, methacrylic acid, crotonic acid, and cinnamic acid, which may be used alone. However, two or more types may be used in combination, but it is particularly desirable to use acrylic acid.
【0020】また、前記した多塩基酸の無水物(a−4
)の特に代表的なものとしては、マレイン酸、フマル酸
、イタコン酸、シトラコン酸、テトラヒドロフタル酸、
ヘット酸、ハイミック酸、クロレンディック酸、ダイマ
ー酸、アジピン酸、コハク酸、アルケニルコハク酸、セ
バチン酸、アゼライン酸、2、2、4−トリメチルアジ
ピン酸、テレフタル酸、2−カリウムスルホテレフタル
酸、2−ナトリウムスルホテレフタル酸、イソフタル酸
、2−カリウムスルホイソフタル酸、2−ナトリウムス
ルホイソフタル酸、5−ナトリウム−スルホイソフタル
酸ジ低級アルキル(たとえば、ジメチルまたはジエチル
など)、オルソフタル酸、4−スルホフタル酸、1,1
0−デカメチレンジカルボン酸、ムコン酸、シュウ酸、
マロン酸、グルタル酸、トリメリット酸、ヘキサヒドロ
フタル酸、テトラブロムフタル酸、またはシクロヘキセ
ントリカルボン酸もしくはピロメリット酸の無水物など
が挙げられる。[0020] Furthermore, the anhydride of the polybasic acid (a-4
) are particularly representative of maleic acid, fumaric acid, itaconic acid, citraconic acid, tetrahydrophthalic acid,
het acid, hymic acid, chlorendic acid, dimer acid, adipic acid, succinic acid, alkenylsuccinic acid, sebacic acid, azelaic acid, 2,2,4-trimethyladipic acid, terephthalic acid, 2-potassium sulfoterephthalic acid, 2-Sodium sulfoterephthalic acid, isophthalic acid, 2-potassium sulfoisophthalic acid, 2-sodium sulfoisophthalic acid, di-lower alkyl 5-sodium sulfoisophthalate (such as dimethyl or diethyl), orthophthalic acid, 4-sulfophthalic acid ,1,1
0-decamethylene dicarboxylic acid, muconic acid, oxalic acid,
Examples include malonic acid, glutaric acid, trimellitic acid, hexahydrophthalic acid, tetrabromophthalic acid, or anhydride of cyclohexenetricarboxylic acid or pyromellitic acid.
【0021】これらは単独使用でも2種以上の併用でも
良いことは勿論である。かくして得られるエネルギー線
硬化型樹脂は、それ自体が、高感度のものであり、硬化
前にはアルカリ溶液に溶解可能である反面、硬化後にお
いては、耐水性、耐溶剤性、耐薬品性ならびに耐熱性な
どに優れた皮膜を与えるものとなる。Of course, these may be used alone or in combination of two or more. The energy ray-curable resin thus obtained is itself highly sensitive and can be dissolved in an alkaline solution before curing, but after curing it has excellent water resistance, solvent resistance, chemical resistance, and It provides a film with excellent heat resistance.
【0022】かくして得られる本発明のエネルギー線硬
化型樹脂、ならびに該樹脂を必須の成分として含んで成
るエネルギー線硬化型樹脂組成物に対しては、さらに必
要に応じて、本発明の目的を逸脱しない範囲内で、とり
わけ、保存安定性ならびに耐水性、耐溶剤性、耐薬品性
および耐熱性などを保持しうる範囲内で、公知慣用の添
加剤、就中、他のタイプの反応性希釈剤や有機溶剤など
を添加せしめることを妨げるものではない。[0022] The energy ray curable resin of the present invention thus obtained and the energy ray curable resin composition comprising the resin as an essential component may further be treated as necessary if necessary. known and customary additives, in particular other types of reactive diluents, to the extent that storage stability and water, solvent, chemical and heat resistance are maintained. This does not preclude the addition of organic solvents, organic solvents, etc.
【0023】かかる反応性希釈剤としては、単官能性の
ものから多官能性のものまでが幅広く用いられるうるが
、それらのうちでも特に代表的なもののみを例示するに
留めれば、2−ヒドロキシエチル(メタ)アクリレート
、2−ヒドロキシプロピル(メタ)アクリレート、2−
エチルヘキシル(メタ)アクリレート、N−ビニルピロ
リドン、1−ビニルイミダゾール、イソボルニル(メタ
)アクリレート、テトラヒドロフルフィリル(メタ)ア
クリレート、カルビトール(メタ)アクリレート、フェ
ノキシエチル(メタ)アクリレート、ジシクロペンタジ
エン(メタ)アクリレート、1,3−ブタンジ(メタ)
アクリレート、1,6−ヘキサンジオールジ(メタ)ア
クリレート、ポリエチレングリコールジ(メタ)アクリ
レート、ヒドロキシピバリン酸エステルネオペンチルグ
リコールジ(メタ)アクリレート、トリメチロールプロ
パントリ(メタ)アクリレート、ペンタエリスリトール
トリ(メタ)アクリレート、ペンタエリスリトールテト
ラ(メタ)アクリレートまたはジペンタエリスリトール
ヘキサ(メタ)アクリレートなどである。[0023] A wide range of reactive diluents can be used, from monofunctional to polyfunctional ones, but to exemplify only the most representative ones, 2- Hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-
Ethylhexyl (meth)acrylate, N-vinylpyrrolidone, 1-vinylimidazole, isobornyl (meth)acrylate, tetrahydrofurphyryl (meth)acrylate, carbitol (meth)acrylate, phenoxyethyl (meth)acrylate, dicyclopentadiene (meth)acrylate, ) Acrylate, 1,3-butanedi(meth)
Acrylate, 1,6-hexanediol di(meth)acrylate, polyethylene glycol di(meth)acrylate, hydroxypivalic acid ester neopentyl glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate acrylate, pentaerythritol tetra(meth)acrylate or dipentaerythritol hexa(meth)acrylate.
【0024】また、前記した溶剤としては、トルエンも
しくはキシレンの如き芳香族炭化水素類;メチルエチル
ケトン、メチルイソブチルケトンもしくはシクロヘキサ
ノンの如きケトン類;酢酸メチル、酢酸エチルもしくは
酢酸ブチルの如きエステル類;メタノール、エタノール
、プロパノールもしくはブタノールの如きアルコール類
;またはヘキサンもしくはヘプタンの如き脂肪族炭化水
素類などをはじめ、セロソルブアセテート、カルビトー
ルアセテート、ジメチルホルムアミドまたはテトラヒド
ロフランなどが特に代表的なものである。The above-mentioned solvents include aromatic hydrocarbons such as toluene or xylene; ketones such as methyl ethyl ketone, methyl isobutyl ketone or cyclohexanone; esters such as methyl acetate, ethyl acetate or butyl acetate; methanol and ethanol. , alcohols such as propanol or butanol; or aliphatic hydrocarbons such as hexane or heptane, as well as cellosolve acetate, carbitol acetate, dimethylformamide or tetrahydrofuran.
【0025】本発明でいう前記エネルギー線とは、電子
線、α線、β線、γ線、X線、中性子線または紫外線の
如き、電離性放射線や光などを総称するものである。エ
ネルギー線として紫外線を用いて、本発明の樹脂組成物
を硬化させる場合には、波長が1,000〜8,000
オングストロームなる紫外線によって解離してラジカル
を発生するような光(重合)開始剤を使用すべきであり
、かかる光(重合)開始剤としては、公知慣用のものが
、いずれも使用できるが、それらのうちでも特に代表的
なもののみを挙げるにとどめれれば、アセトフェノン類
、ベンゾフェノン、ミヒラーズケトン、ベンジン、ベン
ゾイン、ベンゾイン・ベンゾエート、ベンゾインメチル
エーテル類、ベンジル・ジメチルケタール、α−アシロ
キシムエステル、チオキサントン類、アンスラキノン類
およびそれらの各種の誘導体などである。[0025] The energy ray as used in the present invention is a general term for ionizing radiation and light such as electron beams, α rays, β rays, γ rays, X rays, neutron beams, and ultraviolet rays. When curing the resin composition of the present invention using ultraviolet rays as energy rays, the wavelength is 1,000 to 8,000.
A photo (polymerization) initiator that can be dissociated by angstrom ultraviolet rays to generate radicals should be used. As such photo (polymerization) initiators, any known and commonly used photo (polymerization) initiators can be used. Among them, the most representative ones are acetophenones, benzophenone, Michler's ketone, benzine, benzoin, benzoin benzoate, benzoin methyl ethers, benzyl dimethyl ketal, α-acyloxime ester, thioxanthone, anthracite. These include quinones and their various derivatives.
【0026】また、こうした光(重合)開始剤にたいし
ては、公知慣用の光増感剤を併用することもできるが、
かかる光増感剤として特に代表的なもののみを例示する
に留めれば、アミン類、尿素類、含硫黄化合物、含燐化
合物、含塩素化合物、またはニトリル類もしくはその他
の含窒素化合物などである。[0026] In addition, a known and commonly used photosensitizer can be used in combination with such a photo(polymerization) initiator, but
Typical examples of such photosensitizers include amines, ureas, sulfur-containing compounds, phosphorus-containing compounds, chlorine-containing compounds, nitriles, and other nitrogen-containing compounds. .
【0027】本発明のエネルギー線硬化型樹脂およびそ
れを含んで成る樹脂組成物は、通常は、そのまま、上掲
した如きエネルギー源を用いて、放射線ないしは活性エ
ネルギー線を照射させて硬化せしめればよい。The energy ray-curable resin of the present invention and the resin composition comprising the same are usually cured by irradiation with radiation or active energy rays using the energy sources listed above. good.
【0028】[0028]
【実施例】次に、本発明を実施例、比較例および応用例
により、一層、具体的に説明するが、以下において部お
よび%は特に断りの無い限り、すべて重量基準であるも
のとする。EXAMPLES Next, the present invention will be explained in more detail with reference to Examples, Comparative Examples, and Applied Examples. In the following, all parts and percentages are based on weight unless otherwise specified.
【0029】実施例1
温度計、攪拌機および還流冷却管を備えたフラスコに、
4,4’−ジアセチルジフェニルエーテルの2個のアセ
チル基と1価フェノールとを、酸性触媒下で、脱水縮合
させて4官能フェノール誘導体となし、そこから得られ
た4官能のエポキシ化合物の874gと、ハイドロキノ
ンモノメチルエーテルの1.3gとを加え、アクリル酸
の288gおよびトリフェニルフォスフィンの12.8
gを加えて、110℃の温度で、エポキシ当量が15,
000以上となるまで反応させ、反応物(a−3−1)
を得た。Example 1 In a flask equipped with a thermometer, a stirrer and a reflux condenser,
Two acetyl groups of 4,4'-diacetyldiphenyl ether and monohydric phenol are dehydrated and condensed under an acidic catalyst to obtain a tetrafunctional phenol derivative, and 874 g of a tetrafunctional epoxy compound obtained therefrom. 1.3 g of hydroquinone monomethyl ether, 288 g of acrylic acid and 12.8 g of triphenylphosphine.
g, and at a temperature of 110°C, the epoxy equivalent was 15,
000 or more, reactant (a-3-1)
I got it.
【0030】さらに、ここにテトラヒドロ無水フタル酸
の152gを加えて、酸価が43となるまで110℃で
反応を行って、目的樹脂を得た。以下、これを樹脂(A
−1)と略記する。Further, 152 g of tetrahydrophthalic anhydride was added thereto, and the reaction was carried out at 110° C. until the acid value reached 43 to obtain the desired resin. Hereinafter, this resin (A
-1).
【0031】実施例2
温度計、攪拌機および還流冷却管を備えたフラスコに、
実施例1で得られた(a−3−1)の1,162gおよ
びテトラヒドロ無水フタル酸の304gを加えて、酸価
が39となるまで反応を行って、目的樹脂を得た。Example 2 In a flask equipped with a thermometer, a stirrer and a reflux condenser,
1,162 g of (a-3-1) obtained in Example 1 and 304 g of tetrahydrophthalic anhydride were added, and the reaction was carried out until the acid value reached 39 to obtain the desired resin.
【0032】以下、これを樹脂(A−2)と略記する。
実施例3
(a−3−1)の使用量を1,162gとし、テトラヒ
ドロ無水フタル酸の使用量を608gとし、かつ、酸価
が127となるまで反応を行うように変更した以外は、
実施例1と同様にして、目的とするエネルギー線硬化樹
脂を得た。Hereinafter, this will be abbreviated as resin (A-2). Example 3 Except that the amount of (a-3-1) used was 1,162 g, the amount of tetrahydrophthalic anhydride was 608 g, and the reaction was carried out until the acid value reached 127.
In the same manner as in Example 1, the desired energy ray-cured resin was obtained.
【0033】以下、これを樹脂(A−3)と略記する。
応用例1
実施例1で得られた樹脂(A−1)に対して、下記の如
き各成分を配合せしめて充分に混合し、攪拌せしめて塗
料を調製した。Hereinafter, this will be abbreviated as resin (A-3). Application Example 1 The following components were added to the resin (A-1) obtained in Example 1, thoroughly mixed, and stirred to prepare a paint.
【0034】
樹脂(A−1)
100部1−ヒドロキシヘキシル
フェニルケトン 3部しかるのち、
得られた上記塗料を、水研ぎしたブリキ板に、20μm
の厚さで塗布した。次いで、これを80Wの高圧水銀灯
で、15cmの高さから、60秒間のあいだ紫外線を照
射して硬化せしめた。Resin (A-1)
100 parts 1-hydroxyhexylphenyl ketone 3 parts Then,
The obtained above paint was applied to a water-polished tin plate with a thickness of 20 μm.
It was applied to a thickness of . Next, this was cured by irradiating it with ultraviolet rays for 60 seconds from a height of 15 cm using an 80 W high-pressure mercury lamp.
【0035】被覆板について行った性能評価の試験の結
果を、第1表に示す。
応用例2
樹脂(A−1)の使用に替えて、実施例2で得られた樹
脂(A−2)の同量を用いるように変更した以外は、応
用例1と同様にして、塗料を得、塗布して硬化せしめた
。Table 1 shows the results of the performance evaluation tests conducted on the coated plates. Application Example 2 A paint was applied in the same manner as Application Example 1, except that the same amount of resin (A-2) obtained in Example 2 was used instead of resin (A-1). It was obtained, coated and cured.
【0036】その被覆板についても同様の性能評価を行
った処、第1表に示されるような結果が得られた。
応用例3
樹脂(A−1)の使用に替えて、実施例3で得られた樹
脂(A−3)の同量を用いるように変更した以外は、応
用例1と同様にして、塗料を得、塗布して硬化せしめた
。Similar performance evaluations were conducted for the coated plates, and the results shown in Table 1 were obtained. Application example 3 A paint was applied in the same manner as application example 1, except that the same amount of resin (A-3) obtained in Example 3 was used instead of resin (A-1). It was obtained, coated and cured.
【0037】その被覆板についても同様の性能評価を行
った処、第1表に示されるような結果が得られた。
応用例4
実施例1で得られた樹脂(A−3)に対して、下記の如
き各成分を配合せしめて充分に混合し、攪拌して塗料を
調製した。Similar performance evaluations were conducted for the coated plates, and the results shown in Table 1 were obtained. Application Example 4 The following components were added to the resin (A-3) obtained in Example 1, thoroughly mixed, and stirred to prepare a paint.
【0038】
樹脂(A−1)
100部
1−ヒドロキシヘキシルフェニルケトン
3部 トリメ
チロ−ルプロパントリアクリレート 2
0部応用例1と同様にして、塗料を得、塗布して硬化せ
しめた。Resin (A-1)
100 copies
1-Hydroxyhexyl phenyl ketone 3 parts Trimethylolpropane triacrylate 2
A coating material was obtained, applied and cured in the same manner as in Application Example 1.
【0039】その被覆板についても同様の性能評価を行
った処、第1表に示されるような結果が得られた。
比較例1
温度計、攪拌機および還流冷却管を備えたフラスコに、
エポキシ当量が213なる「エピクロン N−695
」〔大日本インキ化学工業(株)製のクレゾール・ノボ
ラック型エポキシ化合物〕の426gとハイドロキノン
モノメチルエーテルの1.3gとを加え、さらに、アク
リル酸の144gをも加えて、酸価が3以下となるまで
、110℃の温度で反応せしめて、反応物(c−3−1
)を得た。Similar performance evaluations were conducted for the coated plates, and the results shown in Table 1 were obtained. Comparative Example 1 In a flask equipped with a thermometer, a stirrer, and a reflux condenser,
"Epicron N-695" with an epoxy equivalent of 213
426 g of ``cresol novolac type epoxy compound manufactured by Dainippon Ink & Chemicals Co., Ltd.'' and 1.3 g of hydroquinone monomethyl ether were added, and 144 g of acrylic acid was also added to obtain an acid value of 3 or less. The reaction was carried out at a temperature of 110°C until the reaction product (c-3-1
) was obtained.
【0040】次いで、新たに温度計、攪拌機および還流
冷却管を備えたフラスコに、(c−3−1)の570g
およびテトラヒドロ無水フタル酸の152gを加え、ジ
−n−ブチル錫ジアセテートの0.5gをも加えて、酸
価が78になるまで110℃の温度で反応を行い、エネ
ルギー線硬化樹脂を得た。Next, 570 g of (c-3-1) was added to a flask newly equipped with a thermometer, stirrer, and reflux condenser.
Then, 152 g of tetrahydrophthalic anhydride and 0.5 g of di-n-butyltin diacetate were added, and the reaction was carried out at a temperature of 110° C. until the acid value reached 78 to obtain an energy ray-cured resin. .
【0041】以下、これを樹脂(C−1)と略記する。
以後は、樹脂(A−1)の使用に替えて、ここに得られ
た樹脂(C−1)の同量を用いるように変更した以外は
、応用例1と同様にして、塗料を得、塗布して硬化せし
めた。[0041] Hereinafter, this will be abbreviated as resin (C-1). Thereafter, the paint was obtained in the same manner as Application Example 1, except that the same amount of the resin (C-1) obtained here was used instead of the resin (A-1). It was applied and cured.
【0042】その被覆板についても同様の性能評価を行
った処、第1表に示されるような結果が得られた。Similar performance evaluations were conducted for the coated plates, and the results shown in Table 1 were obtained.
【0043】[0043]
【表1】[Table 1]
【0044】なお、各性能の評価は、次のような要領で
行ったものである。
硬化性………塗布した塗膜を80℃の温風中で15分乾
燥させたのち、80W/cm2なる強度の高圧水銀ラン
プの下、15cmなる位置を50m/分なる速度で通過
せしめ硬化するまでの回数を測定した。[0044]Each performance was evaluated in the following manner. Curing property: After drying the applied coating in hot air at 80°C for 15 minutes, it is cured by passing it through a 15cm position at a speed of 50m/min under a high-pressure mercury lamp with an intensity of 80W/cm2. The number of times until
【0045】耐水性………ガーゼにイオン交換水を浸し
て、硬化塗膜を40回擦ったのちの膜厚の減少の程度を
測定する。
◎:5μm未満
○:5μm以上10μm未満
△:10μm以上15μm未満
×:15μm以上
耐溶剤性……ガーゼにアセトンを浸して、硬化塗膜を4
0回擦ったのちの膜厚の減少の程度を測定する。評価基
準は耐水性の場合と同じ。Water resistance: Gauze is soaked in ion-exchanged water and the cured coating is rubbed 40 times, after which the degree of decrease in film thickness is measured. ◎: Less than 5 μm ○: 5 μm or more and less than 10 μm △: 10 μm or more and less than 15 μm
Measure the degree of decrease in film thickness after rubbing 0 times. The evaluation criteria are the same as for water resistance.
【0046】耐アルカリ性……ガーゼに10%水酸化ナ
トリウム水溶液を浸して、硬化塗膜を40回擦ったのち
の膜厚の減少の程度を測定する。評価基準は耐水性の場
合に同じ。Alkali resistance: Gauze is soaked in a 10% aqueous sodium hydroxide solution and the cured coating is rubbed 40 times, after which the degree of reduction in film thickness is measured. The evaluation criteria are the same for water resistance.
【0047】耐熱性………塗布した塗膜を、80℃の温
風中で、15分間に亘って乾燥させたのち、80W/c
m2なる強度の高圧水銀ランプの下、15cmなる位置
を50m/分なる速度で10回通過せしめた硬化塗膜を
、200℃の加熱炉中に、40秒間置いてから直ちに、
塗膜面にガーゼを圧着させ、冷却のちに、ガーゼを剥が
して塗膜の変化の状態を目視により判定した。Heat resistance: After drying the applied coating film for 15 minutes in warm air at 80°C,
The cured coating was passed through a 15 cm position 10 times at a speed of 50 m/min under a high-pressure mercury lamp with an intensity of m2, and then placed in a heating oven at 200°C for 40 seconds, and then immediately
Gauze was pressed onto the paint film surface, and after cooling, the gauze was peeled off and changes in the paint film were visually determined.
【0048】◎:全く変化が認められないもの。
○:表面にガーゼの跡が少々つくもの。
×:塗膜が溶融してしまってガーゼと共に剥がれるもの
。◎: No change observed at all. ○: Some traces of gauze are left on the surface. ×: The coating film melts and peels off together with the gauze.
【0049】アルカリ溶解性……塗布した塗膜を80℃
の温風内で15分間乾燥させたのち未硬化塗膜を1/1
0N水酸化カリウム水溶液を浸したガーゼで30回擦っ
て、塗膜の溶解の具合いを観る。[0049] Alkali solubility...The applied coating film is heated to 80°C.
After drying in hot air for 15 minutes, the uncured coating was 1/1
Rub the area 30 times with gauze soaked in 0N potassium hydroxide aqueous solution to see how well the coating has dissolved.
【0050】◎:塗膜が全く残っていないもの。 ○:塗膜がほとんど残っていないもの。 △:塗膜が若干ながら残るもの。 ×:塗膜が残っているもの。◎: No coating remains at all. ○: Almost no paint film remains. △: Some paint film remains. ×: Paint film remains.
【0051】第1表の結果からも明らかなように、本発
明のエネルギー線硬化型樹脂および樹脂組成物は、常温
下または加熱下で、自由に、エネルギー線硬化させるこ
とが出来るし、しかも、特定のエポキシ化合物それ自体
のの構造に基ずく諸性能により、硬化性にも優れるし、
かつ、硬化塗膜が優れた耐水性、耐溶剤性ならびに耐薬
品性をも有するし、さらには、耐熱性にも優れるし、各
種の応用用途に極めて有用なものである。As is clear from the results in Table 1, the energy ray-curable resins and resin compositions of the present invention can be freely cured with energy rays at room temperature or under heating; Due to various properties based on the structure of the specific epoxy compound itself, it has excellent curing properties,
In addition, the cured coating film has excellent water resistance, solvent resistance, and chemical resistance, and also has excellent heat resistance, making it extremely useful for various applications.
【0052】[0052]
【発明の効果】本発明のエネルギー線硬化型樹脂および
それを含んで成る樹脂組成物は、それ自体が高感度のも
のであり、しかも、硬化塗膜は耐水性、耐溶剤性、耐薬
品性ならびに耐熱性などにすぐれているものである処か
ら、とりわけ、コーティング剤として、フォトレジスト
、印刷インキならびに製版材などとして、広範なる用途
において、極めて有用なものである。Effects of the Invention The energy ray-curable resin of the present invention and the resin composition containing the same are highly sensitive in themselves, and the cured coating film has good water resistance, solvent resistance, and chemical resistance. Since it also has excellent heat resistance, it is extremely useful in a wide range of applications, particularly as a coating agent, photoresist, printing ink, and plate-making material.
Claims (1)
ものとし、Rは水素原子またはメチル基を表わすものと
し、また、Yは一般式 【化2】 (ただし、式中のR1は水素原子またはメチル基を表わ
すものとし、R2は水素原子、メチル基、シアノ基また
はハロゲン原子を表わすものとし、B1は多塩基酸無水
物の残基を表わすものとする。)で示される基を表わす
ものとすし、さらに、Zはそれぞれ、同一であっても異
なっていてもよい、一般式 【化3】 (ただし、式中のR1は水素原子またはメチル基を表わ
すものとし、R2は水素原子、メチル基、シアノ基また
はハロゲン原子を表わすものとし、B1は多塩基酸無水
物の残基を表わすものとする。)または式【化4】 で示される基を表わすものとする。)]で示されるエネ
ルギー線硬化型樹脂を含有することを特徴とする、エネ
ルギー線硬化型樹脂組成物。Claim 1: General formula [Formula 1] [However, in the formula, X represents an oxygen atom or a CH2 group, R represents a hydrogen atom or a methyl group, and Y represents a general formula [Formula 2] ] (However, R1 in the formula represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom, a methyl group, a cyano group, or a halogen atom, and B1 represents a residue of a polybasic acid anhydride. represents a group represented by the general formula [Chemical formula 3] (wherein R1 is a hydrogen atom or a methyl group, , R2 represents a hydrogen atom, a methyl group, a cyano group, or a halogen atom, and B1 represents a residue of a polybasic acid anhydride) or a group represented by the formula [Formula 4] shall represent. )] An energy ray curable resin composition characterized by containing an energy ray curable resin represented by the following.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP202891A JPH04239012A (en) | 1991-01-11 | 1991-01-11 | New actinic radiation-curable resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP202891A JPH04239012A (en) | 1991-01-11 | 1991-01-11 | New actinic radiation-curable resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04239012A true JPH04239012A (en) | 1992-08-26 |
Family
ID=11517881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP202891A Pending JPH04239012A (en) | 1991-01-11 | 1991-01-11 | New actinic radiation-curable resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04239012A (en) |
-
1991
- 1991-01-11 JP JP202891A patent/JPH04239012A/en active Pending
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