JPH04235788A - Treatment of waste solution containing lower sulfur compound and soluble iron salt - Google Patents
Treatment of waste solution containing lower sulfur compound and soluble iron saltInfo
- Publication number
- JPH04235788A JPH04235788A JP3016013A JP1601391A JPH04235788A JP H04235788 A JPH04235788 A JP H04235788A JP 3016013 A JP3016013 A JP 3016013A JP 1601391 A JP1601391 A JP 1601391A JP H04235788 A JPH04235788 A JP H04235788A
- Authority
- JP
- Japan
- Prior art keywords
- treatment
- waste liquid
- salt
- lower sulfur
- iron salt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000011282 treatment Methods 0.000 title claims abstract description 57
- 239000002699 waste material Substances 0.000 title claims abstract description 45
- 150000003464 sulfur compounds Chemical class 0.000 title claims abstract description 20
- 150000002505 iron Chemical class 0.000 title claims abstract description 16
- 238000012545 processing Methods 0.000 claims abstract description 27
- 150000003839 salts Chemical class 0.000 claims abstract description 16
- 239000002738 chelating agent Substances 0.000 claims abstract description 14
- 239000002253 acid Substances 0.000 claims abstract description 12
- 229910019142 PO4 Inorganic materials 0.000 claims abstract description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims abstract description 5
- 239000010452 phosphate Substances 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 59
- 239000007788 liquid Substances 0.000 claims description 49
- 230000000813 microbial effect Effects 0.000 claims description 12
- 239000010802 sludge Substances 0.000 claims description 12
- 238000011161 development Methods 0.000 claims description 6
- 150000007513 acids Chemical class 0.000 claims description 4
- 230000001376 precipitating effect Effects 0.000 claims description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims 1
- 229910001448 ferrous ion Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 10
- 238000005868 electrolysis reaction Methods 0.000 abstract description 5
- 238000011109 contamination Methods 0.000 abstract description 2
- 239000003344 environmental pollutant Substances 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 26
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 24
- -1 iron ions Chemical class 0.000 description 20
- 239000000126 substance Substances 0.000 description 17
- 239000000463 material Substances 0.000 description 16
- 229910052742 iron Inorganic materials 0.000 description 14
- 229910052709 silver Inorganic materials 0.000 description 12
- 239000004332 silver Substances 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 10
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 150000002443 hydroxylamines Chemical class 0.000 description 8
- 238000005273 aeration Methods 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 159000000014 iron salts Chemical class 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 238000004061 bleaching Methods 0.000 description 5
- 235000021317 phosphate Nutrition 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- 230000033228 biological regulation Effects 0.000 description 4
- 239000000872 buffer Substances 0.000 description 4
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 4
- 244000005700 microbiome Species 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 230000006641 stabilisation Effects 0.000 description 4
- 238000011105 stabilization Methods 0.000 description 4
- 230000000087 stabilizing effect Effects 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- DMQQXDPCRUGSQB-UHFFFAOYSA-N 2-[3-[bis(carboxymethyl)amino]propyl-(carboxymethyl)amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CCCN(CC(O)=O)CC(O)=O DMQQXDPCRUGSQB-UHFFFAOYSA-N 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical group [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 150000004989 p-phenylenediamines Chemical class 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 239000003755 preservative agent Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000011437 continuous method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 2
- IFQUWYZCAGRUJN-UHFFFAOYSA-N ethylenediaminediacetic acid Chemical compound OC(=O)CNCCNCC(O)=O IFQUWYZCAGRUJN-UHFFFAOYSA-N 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229960003330 pentetic acid Drugs 0.000 description 2
- 230000002085 persistent effect Effects 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 238000001223 reverse osmosis Methods 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- 210000002268 wool Anatomy 0.000 description 2
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Substances C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 1
- UXFQFBNBSPQBJW-UHFFFAOYSA-N 2-amino-2-methylpropane-1,3-diol Chemical class OCC(N)(C)CO UXFQFBNBSPQBJW-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- DSBZMUUPEHHYCY-UHFFFAOYSA-N 2-oxo-1,3,2-dioxathietan-4-one Chemical class O=C1OS(=O)O1 DSBZMUUPEHHYCY-UHFFFAOYSA-N 0.000 description 1
- GDTSJMKGXGJFGQ-UHFFFAOYSA-N 3,7-dioxido-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane Chemical compound O1B([O-])OB2OB([O-])OB1O2 GDTSJMKGXGJFGQ-UHFFFAOYSA-N 0.000 description 1
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 1
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 1
- XBTWVJKPQPQTDW-UHFFFAOYSA-N 4-n,4-n-diethyl-2-methylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C(C)=C1 XBTWVJKPQPQTDW-UHFFFAOYSA-N 0.000 description 1
- QNGVNLMMEQUVQK-UHFFFAOYSA-N 4-n,4-n-diethylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1 QNGVNLMMEQUVQK-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 241000190909 Beggiatoa Species 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 101100283604 Caenorhabditis elegans pigk-1 gene Proteins 0.000 description 1
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 102100036442 Glutathione reductase, mitochondrial Human genes 0.000 description 1
- 101100283943 Homo sapiens GSR gene Proteins 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910004861 K2 HPO4 Inorganic materials 0.000 description 1
- WTDRDQBEARUVNC-LURJTMIESA-N L-DOPA Chemical class OC(=O)[C@@H](N)CC1=CC=C(O)C(O)=C1 WTDRDQBEARUVNC-LURJTMIESA-N 0.000 description 1
- KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical class NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 description 1
- LRQKBLKVPFOOQJ-YFKPBYRVSA-N L-norleucine Chemical class CCCC[C@H]([NH3+])C([O-])=O LRQKBLKVPFOOQJ-YFKPBYRVSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- FFDGPVCHZBVARC-UHFFFAOYSA-N N,N-dimethylglycine Chemical class CN(C)CC(O)=O FFDGPVCHZBVARC-UHFFFAOYSA-N 0.000 description 1
- 229910021204 NaH2 PO4 Inorganic materials 0.000 description 1
- 206010067482 No adverse event Diseases 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 101150000971 SUS3 gene Proteins 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 241000605118 Thiobacillus Species 0.000 description 1
- 241001061127 Thione Species 0.000 description 1
- 241000190807 Thiothrix Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- MJOQJPYNENPSSS-XQHKEYJVSA-N [(3r,4s,5r,6s)-4,5,6-triacetyloxyoxan-3-yl] acetate Chemical compound CC(=O)O[C@@H]1CO[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O MJOQJPYNENPSSS-XQHKEYJVSA-N 0.000 description 1
- 229910052946 acanthite Inorganic materials 0.000 description 1
- GFFGJBXGBJISGV-UHFFFAOYSA-N adenyl group Chemical group N1=CN=C2N=CNC2=C1N GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 1
- 125000003295 alanine group Chemical class N[C@@H](C)C(=O)* 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000011124 aluminium ammonium sulphate Nutrition 0.000 description 1
- 235000011126 aluminium potassium sulphate Nutrition 0.000 description 1
- 229940067621 aminobutyrate Drugs 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000003429 antifungal agent Substances 0.000 description 1
- 229940121375 antifungal agent Drugs 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical class C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 150000003938 benzyl alcohols Chemical class 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
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- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 241000902900 cellular organisms Species 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
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- 239000000460 chlorine Substances 0.000 description 1
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- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
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- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 229910000396 dipotassium phosphate Inorganic materials 0.000 description 1
- 235000019797 dipotassium phosphate Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
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- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
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- 230000005484 gravity Effects 0.000 description 1
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical class O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 235000014413 iron hydroxide Nutrition 0.000 description 1
- 229910000398 iron phosphate Inorganic materials 0.000 description 1
- WBJZTOZJJYAKHQ-UHFFFAOYSA-K iron(3+) phosphate Chemical compound [Fe+3].[O-]P([O-])([O-])=O WBJZTOZJJYAKHQ-UHFFFAOYSA-K 0.000 description 1
- FXDLIMJMHVKXAR-UHFFFAOYSA-K iron(III) nitrilotriacetate Chemical compound [Fe+3].[O-]C(=O)CN(CC([O-])=O)CC([O-])=O FXDLIMJMHVKXAR-UHFFFAOYSA-K 0.000 description 1
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 1
- 125000001909 leucine group Chemical class [H]N(*)C(C(*)=O)C([H])([H])C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- NPKFETRYYSUTEC-UHFFFAOYSA-N n-[2-(4-amino-n-ethyl-3-methylanilino)ethyl]methanesulfonamide Chemical compound CS(=O)(=O)NCCN(CC)C1=CC=C(N)C(C)=C1 NPKFETRYYSUTEC-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 239000012476 oxidizable substance Substances 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical class N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- ZJAOAACCNHFJAH-UHFFFAOYSA-N phosphonoformic acid Chemical compound OC(=O)P(O)(O)=O ZJAOAACCNHFJAH-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- DJEHXEMURTVAOE-UHFFFAOYSA-M potassium bisulfite Chemical compound [K+].OS([O-])=O DJEHXEMURTVAOE-UHFFFAOYSA-M 0.000 description 1
- 229940099427 potassium bisulfite Drugs 0.000 description 1
- 235000010259 potassium hydrogen sulphite Nutrition 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 125000001500 prolyl group Chemical class [H]N1C([H])(C(=O)[*])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000012487 rinsing solution Substances 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical class OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 229940056910 silver sulfide Drugs 0.000 description 1
- XUARKZBEFFVFRG-UHFFFAOYSA-N silver sulfide Chemical compound [S-2].[Ag+].[Ag+] XUARKZBEFFVFRG-UHFFFAOYSA-N 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- HRZFUMHJMZEROT-UHFFFAOYSA-L sodium disulfite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])(=O)=O HRZFUMHJMZEROT-UHFFFAOYSA-L 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229940006280 thiosulfate ion Drugs 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 125000002987 valine group Chemical class [H]N([H])C([H])(C(*)=O)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/10—Biological treatment of water, waste water, or sewage
Landscapes
- Water Treatment By Electricity Or Magnetism (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Biological Treatment Of Waste Water (AREA)
- Separation Of Suspended Particles By Flocculating Agents (AREA)
- Activated Sludge Processes (AREA)
- Removal Of Specific Substances (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、低級イオウ化合物と可
溶性鉄塩とを含むような廃液を無公害化する処理方法に
関する。具体的には鉄を含む鉱石の処理廃液、ボイラー
洗浄廃液、写真現像廃液などの処理に適した処理方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of treating wastewater containing lower sulfur compounds and soluble iron salts to make them pollution-free. Specifically, the present invention relates to a treatment method suitable for processing waste liquid from processing iron-containing ores, waste liquid from boiler cleaning, waste liquid from photographic development, and the like.
【0002】0002
【従来の技術】現在、種々の製造工場等より排水される
莫大な量の廃液は、有害物質や、自然の微生物などで分
解されにくい物質(難分解性物質)が含まれており、一
部で公害という大きな社会問題となっている。[Prior Art] Currently, a huge amount of waste liquid discharged from various manufacturing plants, etc. contains harmful substances and substances that are difficult to decompose by natural microorganisms (persistent substances). Pollution has become a major social problem.
【0003】とくに近年の水質汚濁防止法や公害規制の
強化により、これらの廃液の廃棄は実質的に不可能とな
ってきており、廃液処理業者に依託し、貯めておくか、
燃焼、海洋投棄するかの方法によっている。これらの方
法ではいずれにしても公害的な負荷を下げているといえ
る方法ではない。[0003] Particularly in recent years, due to the Water Pollution Control Act and stricter pollution regulations, it has become virtually impossible to dispose of these waste liquids.
Burning or dumping into the ocean are methods. In any case, none of these methods can be said to reduce the pollution burden.
【0004】公害負荷を下げる方法としては、例えば写
真処理液の処理法として活性汚泥法(例えば特公昭55
−49559号及び特公昭51−12943号等)、電
解酸化法(特開昭48−84462号、同49−119
458号、特公昭53−43478号、特開昭49−1
19457号等)、イオン交換法(特公昭51−377
04号、特公昭53−383号、特公昭53−4327
1号等)、逆浸透法(特開昭50−22463号)、化
学的処理法(特開昭53−12152号、特公昭57−
37396号、特開昭61−241746号等)等が知
られているがそれぞれの処理だけでは未だ十分でなかっ
た。[0004] As a method of reducing the pollution load, for example, activated sludge method (for example, Japanese Patent Publication No. 55
-49559 and Japanese Patent Publication No. 51-12943, etc.), electrolytic oxidation method (Japanese Patent Publication No. 48-84462, Japanese Patent Publication No. 49-119, etc.)
No. 458, Japanese Patent Publication No. 53-43478, Japanese Patent Publication No. 49-1
19457, etc.), ion exchange method (Special Publication No. 51-377)
No. 04, Special Publication No. 53-383, Special Publication No. 53-4327
1, etc.), reverse osmosis method (JP-A-50-22463), chemical treatment method (JP-A-53-12152, JP-B-Sho 57-
No. 37396, Japanese Unexamined Patent Publication No. 61-241746, etc.), but each treatment alone has not been sufficient.
【0005】例えば活性汚泥法では運転経費は安くすむ
もののEDTAなどのキレート剤のような難分解性物質
は処理されずにそのまま放出される問題点を有する。一
方、電解酸化法では被酸化性物質を多量に含む場合には
、大量の電力を必要とし、従って運転経費は高くなり、
また低級イオウ化合物を含む廃液などで高分子化しやす
い物質を含む廃液が電極を汚染するなどの問題点を有し
ていた。また、イオン交換法や逆浸透法のように樹脂や
膜を使う場合には高分子化しやすい物質などの吸着やよ
ごれで頻繁に交換が必要となり運転経費が高くなりやす
い。処理するための薬品を化学量論的に使用する化学的
処理方法においては効率よく分解処理するためには高価
な触媒を使用したり、薬品を多量に使用しなければなら
ず運転経費は特に高いものとなってしまうという問題点
を有していた。For example, in the activated sludge method, although operating costs are low, there is a problem in that persistent substances such as chelating agents such as EDTA are released as they are without being treated. On the other hand, the electrolytic oxidation method requires a large amount of electricity when a large amount of oxidizable substances are contained, resulting in high operating costs.
In addition, there have been problems in that the electrodes are contaminated by waste liquids containing substances that are easily polymerized, such as waste liquids containing lower sulfur compounds. Furthermore, when resins or membranes are used, such as in the ion exchange method or reverse osmosis method, frequent replacement is required due to adsorption of substances that easily become polymeric or dirt, which tends to increase operating costs. Chemical treatment methods that use chemicals for treatment in a stoichiometric manner require the use of expensive catalysts and large amounts of chemicals in order to achieve efficient decomposition treatment, resulting in particularly high operating costs. The problem was that it became a thing.
【0006】[0006]
【発明が解決しようとする課題】本発明は以上の問題点
を効果的に解決する新たな処理方法を提供することを目
的としている。SUMMARY OF THE INVENTION An object of the present invention is to provide a new processing method that effectively solves the above problems.
【0007】すなわち本発明の第1の目的は、廃液の水
質および大気の両面にわたって環境汚染のない有効な無
害化手段を確立することにある。That is, the first object of the present invention is to establish an effective detoxification method that does not cause environmental pollution of both the water quality and the atmosphere of waste liquid.
【0008】本発明の第2の目的はEDTAなどのキレ
ート剤のような難分解性物質などを含有する廃液を安価
にかつ効率良く処理する手段を提供することにある。[0008] A second object of the present invention is to provide a means for inexpensively and efficiently treating waste liquid containing difficult-to-decompose substances such as chelating agents such as EDTA.
【0009】本発明の第3の目的は、低級イオウ化合物
などを含む廃液の電解処理において電極が汚染されるこ
となく、効率良く処理する手段を提供することにある。A third object of the present invention is to provide a means for efficiently electrolytically treating waste liquid containing lower sulfur compounds without contaminating the electrodes.
【0010】0010
【課題を解決するための手段】本発明者らは種々の検討
を行った結果、以下の組み合せ手段を用いることにより
、本発明の目的が効果的に達成できることを見出した。[Means for Solving the Problems] As a result of various studies, the present inventors have found that the object of the present invention can be effectively achieved by using the following combination means.
【0011】すなわち、本発明は低級イオウ化合物とキ
レート剤により可溶化された鉄塩とを含む廃液に次の(
A) 〜(C) の処理工程を順次行うことを特徴とす
る廃液を処理する方法である。
(A) 低級イオウ化合物を処理する微生物処理工程(
B) 電解処理工程
(C) pH4〜7.5で鉄塩をリン酸塩および/また
は他の無機塩・酸との複塩として沈殿除去する工程。次
に、本発明について詳述する。That is, the present invention applies the following (
This is a method for treating waste liquid, characterized by sequentially performing the treatment steps of A) to (C). (A) Microbial treatment process for treating lower sulfur compounds (
B) Electrolytic treatment step (C) A step of precipitating and removing iron salts as phosphates and/or double salts with other inorganic salts and acids at a pH of 4 to 7.5. Next, the present invention will be explained in detail.
【0012】低級イオウ化合物は単なる空気の曝気だけ
では非常に酸化されにくいものもあるが微生物で処理す
ると容易に酸化できる。しかしながらこの方法では完全
には処理しきれないで可溶性鉄塩としてキレートしてい
るEDTAなどの難分解性物質は分解されないで残って
しまう。[0012] Some lower sulfur compounds are very difficult to oxidize simply by aeration, but they can be easily oxidized by treatment with microorganisms. However, this method does not completely treat refractory substances such as EDTA, which are chelated as soluble iron salts and remain undecomposed.
【0013】環境的に有害である鉄イオンは環境基準で
排出濃度が10ppm以下(河川、下水道共に)と厳し
く規制されており、鉄イオンの除去を厳密に行わねばな
らない。前述のようなキレート剤により可溶化された鉄
イオンを除くには一般に大過剰のカルシウムイオンを用
い、キレート剤の配位金属をカルシウムでおきかえて、
アルカリ性として不溶性の水酸化鉄として沈澱させるの
が常法とされている。ところが本発明の目的としている
廃液には多量の低級イオウ化合物が含まれるため、亜硫
酸や空気で酸化されて生成する硫酸などがカルシウム塩
として多量に沈澱を生成させることになる。この沈澱に
は環境的に有害な鉄イオンを含むため、特別な廃棄方法
が必要となってしまう。[0013] The environmental standards for iron ions, which are harmful to the environment, are strictly regulated to a discharge concentration of 10 ppm or less (both in rivers and sewers), and iron ions must be removed strictly. To remove the iron ions solubilized by the chelating agent as mentioned above, a large excess of calcium ions is generally used, and the coordination metal of the chelating agent is replaced with calcium.
The conventional method is to precipitate it as alkaline and insoluble iron hydroxide. However, since the waste liquid targeted by the present invention contains a large amount of lower sulfur compounds, sulfurous acid and sulfuric acid produced by oxidation with air cause a large amount of precipitate as calcium salts. This precipitate contains iron ions, which are environmentally harmful, and requires special disposal methods.
【0014】我々はこの問題点に誠意検討を行ない。次
のような処理工程を組み合せることにより効率良く低級
イオウ化合物とキレート剤により可溶化された鉄塩とを
含む廃液を無害化処理できることを見出した。[0014] We have sincerely considered this issue. It has been found that by combining the following treatment steps, it is possible to efficiently detoxify wastewater containing lower sulfur compounds and iron salts solubilized by a chelating agent.
【0015】本発明でいう低級イオウ化合物とは、酸化
された安定なイオウ酸である硫酸より還元形の無機イオ
ウ化合物、具体的には亜硫酸、次亜硫酸、チオ硫酸、チ
オン酸、亜チオン酸などおよびその塩(ナトリウム、カ
リウム、カルシウム、アンモニウムなど)や硫化水素と
その塩、イオウ単体などの無機イオウ化合物を言う。[0015] The lower sulfur compounds as used in the present invention refer to inorganic sulfur compounds that are reduced from sulfuric acid, which is a stable oxidized sulfuric acid, and specifically include sulfurous acid, hyposulfite, thiosulfuric acid, thionic acid, thionous acid, etc. and its salts (sodium, potassium, calcium, ammonium, etc.), hydrogen sulfide and its salts, and inorganic sulfur compounds such as sulfur alone.
【0016】本発明でいうキレート剤により可溶化され
た鉄塩とは、水に対して不溶化して沈澱しないようにい
わゆるキレート化剤を加えて可溶化してある鉄の塩(例
えばEDTA(エチレンジアミン−四酢酸)鉄塩、PD
TA(1,3−プロパンジアミン−四酢酸)鉄塩、NT
A(ニトリロ−三酢酸)鉄塩、DTPA(ビスエチレン
ジアミン−五酢酸)鉄塩、2−ヒドロキシ−1,3−プ
ロパンジアミン−四酢酸鉄塩、EDDA(エチレンジア
ミン−二酢酸)鉄塩、1−ヒドロキシエチリデン−ビス
(ホスホン酸)鉄塩、フェナンスロリン鉄塩などがあげ
られる)である。The iron salt solubilized with a chelating agent as used in the present invention refers to an iron salt that has been solubilized by adding a so-called chelating agent to prevent it from being insolubilized and precipitated in water (for example, EDTA (ethylene diamine)). -tetraacetic acid) iron salt, PD
TA (1,3-propanediamine-tetraacetic acid) iron salt, NT
A (nitrilo-triacetic acid) iron salt, DTPA (bisethylenediamine-pentaacetic acid) iron salt, 2-hydroxy-1,3-propanediamine-tetraacetic acid iron salt, EDDA (ethylenediamine-diacetic acid) iron salt, 1-hydroxy (e.g., ethylidene bis(phosphonic acid) iron salt, phenanthroline iron salt, etc.).
【0017】すなわち
(A)低級イオウ化合物を生物が容易に分解し得る化合
物(易分解性化合物)を分解するための先に述べたよう
な生物処理により、低級イオウ化合物を硫酸などの安定
な物質へと変換する。
(B)前記(A)で処理して残ったキレート剤などの難
分解性化合物を電解処理することにより完全に分解する
か、あるいは易分解性化合物まで半分解する。
(C)次で、前記(B)で処理したものをpH4〜7.
5に調整し、鉄塩をリン酸塩および/または他の無機塩
・酸との複塩を形成させて沈殿除去をする。That is, (A) lower sulfur compounds can be converted into stable substances such as sulfuric acid by the above-mentioned biological treatment for degrading compounds that can be easily decomposed by living organisms (easily degradable compounds). Convert to . (B) Hard-to-decompose compounds such as chelating agents remaining after the treatment in (A) are electrolytically treated to completely decompose them, or to partially decompose them to easily decomposable compounds. (C) Next, the product treated with the above (B) has a pH of 4 to 7.
5, and the iron salt is precipitated and removed by forming a double salt with a phosphate and/or other inorganic salt/acid.
【0018】多くの場合以上の工程により下水道や河川
に放流できるレベルとすることができるが、特に高濃度
の廃液を用いた場合には、更に生物処理および/または
活性炭吸着処理を組み合せて廃出レベルを下げることが
できる。特に工程(B)の電解処理では易分解性化合物
が多く残るので工程(C)の後に通常よく用いられる活
性汚泥法による生物処理(D)を組み合せることが好ま
しい。また更に高度な処理とするために活性炭吸着、オ
ゾン処理などと組み合せることもできる。[0018] In many cases, the above process can bring the waste liquid to a level that allows it to be discharged into sewers or rivers, but especially when using highly concentrated waste liquid, further biological treatment and/or activated carbon adsorption treatment may be combined with the waste liquid. You can lower the level. In particular, since many easily decomposable compounds remain in the electrolytic treatment of step (B), it is preferable to combine the step (C) with biological treatment (D) using the commonly used activated sludge method. Furthermore, for more advanced treatment, activated carbon adsorption, ozone treatment, etc. can be combined.
【0019】この工程(A)の微生物処理法には曝気ラ
グーン法、安定化池法、散水濾床法、接触濾床法、接触
曝気法、回転式接触法、活性汚泥法、生物膜法などがあ
る(詳細は「廃水処理プロセス、設計理論と実験法」W
.W.エッケンフェルダー、D.L.フォード著、松井
三郎訳 技報堂出版および「生物学的水処理技術と装
置」、化学工学協会編、培風館に記載されている。)が
好気的に曝気あるいは空気や酸素に接触させる方法なら
ば何でも使える。特に微生物としてイオウ酸化菌(例え
ば、Thiobacillus属、Thiothrix
属、Beggiatoa属など)を含む場合に処理効率
は著しく高くなり好ましい。また、この微生物処理法と
しては、散水濾床法、接触濾床法、接触曝気法、活性汚
泥法が好ましく、特に活性汚泥法が好ましい(このとき
通常の分散フロック型であっても担体に固着させた型で
あってもよい)。The microbial treatment method in step (A) includes the aeration lagoon method, stabilization pond method, trickling filter method, contact filter method, contact aeration method, rotary contact method, activated sludge method, biofilm method, etc. (For details, see "Wastewater treatment process, design theory and experimental methods" W
.. W. Eckenfelder, D. L. Written by Ford, translated by Saburo Matsui, published by Gihodo Publishing, and published in ``Biological Water Treatment Technology and Devices'', edited by Japan Society of Chemical Engineers, Baifukan. ) can be used in any aerobic manner, such as aeration or contact with air or oxygen. In particular, microorganisms such as sulfur-oxidizing bacteria (e.g., Thiobacillus spp., Thiothrix
genus Beggiatoa, etc.), the treatment efficiency is significantly increased, which is preferable. In addition, as this microbial treatment method, the trickling filter method, the contact filter method, the contact aeration method, and the activated sludge method are preferred, and the activated sludge method is particularly preferred (in this case, even if the normal dispersed floc type is used, it will not stick to the carrier). ).
【0020】工程(A)の微生物処理については前述し
たが、低級イオウ化合物を酸化することにより生成する
硫酸等を中和する目的でアルカリ(水酸化ナトリウム、
水酸化カリウム、水酸化カルシウム、炭酸ナトリウム)
などを添加してpHを下がりすぎないように調整するこ
とが好ましく、好ましいpHの範囲は5.5〜8.5で
あり、5.8〜7.5が特に好ましい。また工程(A)
の微生物処理においては、通常の活性汚泥処理と同様に
COD:N:Pの比は100:5:1、もしくは、N.
Pはそれ以上に保つのが好ましい。特にリンは後の鉄塩
の除去に使うに十分な過剰量入れることが好ましく、含
有している鉄塩に対して等量以上入れることが好ましい
。処理する液中の無機塩類の濃度が高すぎる場合には、
希釈により、無機塩類の濃度を5%以下にすることが好
ましく、更には3%以下にすることが生物相を安定にす
ることから好ましい。処理する液のCODは3000p
pm以上であることが好ましい。また、処理する液にリ
ン分が不足する場合には、リンとしてCOD値の0.1
から3%含むようにリン酸塩(例えばKH2 PO4
・K2 HPO4 、NaH2 PO4 ・2H2 O
、Na2 HPO4 )を添加することが好ましい。Regarding the microbial treatment in step (A), as described above, alkali (sodium hydroxide, sodium hydroxide,
potassium hydroxide, calcium hydroxide, sodium carbonate)
It is preferable to adjust the pH so as not to lower it too much by adding the like, and the preferred pH range is 5.5 to 8.5, particularly preferably 5.8 to 7.5. Also, process (A)
In microbial treatment, the COD:N:P ratio is 100:5:1, or N.
It is preferable to keep P higher than that. In particular, it is preferable to add phosphorus in an amount sufficient to remove the iron salt later, and it is preferable to add phosphorus in an amount equal to or more than the iron salt contained. If the concentration of inorganic salts in the liquid to be treated is too high,
It is preferable to reduce the concentration of inorganic salts to 5% or less by dilution, and more preferably to 3% or less because this stabilizes the biota. The COD of the liquid to be treated is 3000p
It is preferable that it is pm or more. In addition, if the liquid to be treated lacks phosphorus, 0.1 of the COD value is added as phosphorus.
Phosphate (e.g. KH2 PO4
・K2 HPO4 , NaH2 PO4 ・2H2 O
, Na2 HPO4) is preferably added.
【0021】工程(A)の微生物処理は連続式活性汚泥
法であっても回分式活性汚泥法であってもよく、その処
理時間や曝気方式等は用いられる処理液に応じて、最適
な条件に合わせて行なわれる。詳細は「活性汚泥法の維
持管理技術」桜井敏郎、須藤隆一監著(科学技術開発セ
ンター)などに記載されている。[0021] The microbial treatment in step (A) may be a continuous activated sludge method or a batch activated sludge method, and the treatment time, aeration method, etc. are determined by the optimum conditions depending on the treatment liquid used. It will be held in accordance with the Details are described in ``Activated Sludge Method Maintenance and Management Technology,'' edited by Toshiro Sakurai and Ryuichi Sudo (Science and Technology Development Center).
【0022】工程(B)の電解処理において電極として
は陽極酸化を連続的に行っても消耗しない貴な電極なら
特に制限なく使用できる。廃液中には、現像主薬やアル
コール類のような還元性の強い有機化合物が含まれてい
る場合、酸化されにくい十分に貴な電極が好ましい。具
体的には二酸化鉛、白金、白金イリジウム、二酸化イリ
ジウムなどでチタン基材の表面を掩ったもの(例えば、
商品名エクセロード、日本カーリット社製)が好ましい
。これらの陽極は高電圧をかけることができ、アルコー
ル、アルデヒド、カルボン酸などを効率よく電解酸化で
きる。1電極対あたり2〜10V、好ましくは2〜8V
の電圧を使用する。一方陰極としては電解停止中に腐蝕
を起さないよう耐蝕性と通電性を持つものなら何でも良
いが、ステンレス板(又は棒)が最も好適である。もち
ろん各種の炭素電極や種々の金属電極も使用できる。
陽・陰極対はそれぞれの電極板を1枚ずつ適当間隔で相
対させたり、あるいは陽極を中に両側から陰極板を挟む
あるいは陰極を中に両側から陽極で挟むようなサンドイ
ッチ型の対など適宜な構造がとられる。ここで電極の形
状は線状、板状、網状、布状、球状などいずれの形状で
も良いが、電極の表面積が大きいものほど好ましい。流
れる電流と、時間の積で表される通電量は、COD値に
対する当量に対して0.1倍から1000倍が好ましく
、更に好ましくは0.5倍から100倍である。ここで
、COD値に対する当量とは、COD値を酸素の原子量
で除したものとファラデー定数との積で表わされる。
電解槽は連続式、回分式のいずれでも反応に必要な充分
な時間、濾過分離液が滞在すれば良い。また、電解槽内
の攪拌は電極を回転させるもの、電解による発生気体で
行うもの、気体を吹き込むもの、回転板あるいは棒で液
を動かすもの、ポンプあるいは重力を用いて液を動かす
ものなど充分液が電極表面で動くものであればいずれの
ものでも良い。[0022] In the electrolytic treatment of step (B), any noble electrode that does not wear out even if the anodic oxidation is performed continuously can be used without any particular restrictions. When the waste liquid contains highly reducing organic compounds such as developing agents and alcohols, a sufficiently noble electrode that is resistant to oxidation is preferred. Specifically, the surface of the titanium base material is covered with lead dioxide, platinum, platinum iridium, iridium dioxide, etc. (for example,
(trade name: Exerode, manufactured by Nippon Carlit Co., Ltd.) is preferred. These anodes can apply high voltage and can efficiently electrolytically oxidize alcohols, aldehydes, carboxylic acids, etc. 2-10V per electrode pair, preferably 2-8V
voltage. On the other hand, as the cathode, any material may be used as long as it has corrosion resistance and conductivity so as not to cause corrosion while electrolysis is stopped, but a stainless steel plate (or rod) is most suitable. Of course, various carbon electrodes and various metal electrodes can also be used. Anode/cathode pairs can be made by placing the respective electrode plates facing each other at appropriate intervals, or by sandwich-type pairs in which an anode is sandwiched between cathode plates from both sides, or a cathode is sandwiched between anodes from both sides. structure is taken. Here, the shape of the electrode may be any shape such as linear, plate-like, net-like, cloth-like, or spherical, but it is preferable that the electrode has a larger surface area. The amount of energization expressed as the product of flowing current and time is preferably 0.1 to 1000 times the equivalent to the COD value, and more preferably 0.5 to 100 times. Here, the equivalent to the COD value is expressed as the product of the COD value divided by the atomic weight of oxygen and the Faraday constant. The electrolytic cell may be either a continuous type or a batch type, as long as the filtered separation liquid remains there for a sufficient period of time required for the reaction. In addition, stirring in the electrolytic cell can be done by rotating electrodes, using gas generated by electrolysis, blowing gas, moving the liquid with a rotating plate or rod, moving the liquid using a pump or gravity, etc. Any material that moves on the electrode surface may be used.
【0023】工程(C)において鉄塩を不溶化するには
、鉄とリン酸とが難溶性の塩を形成することを利用する
。すなわち、リン酸鉄はpH4〜7.5の範囲が特に溶
解度積が低く公害規制をクリアーするには、この範囲に
して鉄を沈殿除去することによって達成できる。またア
ルミニウムなどリン酸と同様に難溶性の塩を形成するも
のを含んでいる場合も上記pHで同様な鉄の除去効率が
得られ、アルミニウム塩などの添加調整により鉄塩とリ
ン酸を同時に沈殿除去することも可能となり閉鎖水域系
での規制に対しても好ましい処理とすることができる。
溶解度の点でpH5〜7が特に好ましい。本発明の方法
によれば鉄塩は濾過性の良い粉体状の沈殿として得られ
、濾過時に用いられる凝集沈降剤の使用量を低く抑える
ことも可能となる。工程(A)で添加したリン酸の量で
は不足の場合には、この工程でさらにリン酸を添加する
。[0023] In order to insolubilize the iron salt in step (C), the fact that iron and phosphoric acid form a sparingly soluble salt is utilized. That is, iron phosphate has a particularly low solubility product in the pH range of 4 to 7.5, and in order to clear pollution regulations, iron can be precipitated and removed within this range. In addition, when containing substances such as aluminum that form poorly soluble salts like phosphoric acid, the same iron removal efficiency can be obtained at the above pH, and iron salts and phosphoric acid can be simultaneously precipitated by adjusting the addition of aluminum salt etc. It can also be removed, making it a preferable treatment for regulations in closed water systems. A pH of 5 to 7 is particularly preferred from the viewpoint of solubility. According to the method of the present invention, the iron salt is obtained as a powdery precipitate with good filterability, and it is also possible to suppress the amount of coagulation and sedimentation agent used during filtration. If the amount of phosphoric acid added in step (A) is insufficient, phosphoric acid is further added in this step.
【0024】本発明の処理方法は低級イオウ化合物、難
分解性化合物、電解分解においてタール化する物質、公
害的に規則の厳しい鉄塩などを含む高濃度な廃液をいか
に効率良く処理し、無害化するものである。The treatment method of the present invention efficiently treats high-concentration waste liquid containing lower sulfur compounds, difficult-to-decompose compounds, substances that turn into tar during electrolytic decomposition, iron salts that have strict regulations regarding pollution, and detoxifies them. It is something to do.
【0025】本発明の内容は個々の処理方法で中味がど
う変わるか何が変らず残るかを緻密に調べ考察した上で
最も適した処理を組み合せて行なうことにより始めて達
成されたものであり、従来の技術の単なる組み合せでは
ない。[0025] The content of the present invention was achieved only by carefully examining and considering how the contents change and what remains unchanged with each treatment method, and then combining the most suitable treatments. It is not just a combination of conventional techniques.
【0026】すなわち、後の電解処理でタール化や有害
ガスの発生のもとになるものを微生物処理で除去し、し
かるのちに微生物では処理しきれない鉄を可溶化してい
るキレート剤を電解処理で酸化分解することにより好め
て効率良く鉄の除去も可能になったものである。[0026] That is, in the subsequent electrolytic treatment, substances that cause tar and generation of harmful gases are removed by microbial treatment, and then the chelating agent that has solubilized iron that cannot be processed by microorganisms is electrolyzed. By oxidative decomposition during treatment, iron can be removed efficiently.
【0027】本発明の処理には好ましくは写真の現像処
理廃液が用いられる。ここで本発明の処理方法に用いら
れる写真廃液としては、ハロゲン化銀感光材料を現像処
理したときに生じる処理廃液である。ここで感光材料と
してはカラー感光材料の他黒白感光材料がある。例えば
カラーペーパー、カラー反転ペーパー、撮影用カラーネ
ガフィルム、カラー反転フィルム、映画用ネガもしくは
ポジフィルム、直接ポジカラー感光材料などの他に、X
レイフィルム、印刷用感光材料、マイクロフィルム、撮
影用黒白フィルムなどを挙げることができる。[0027] Preferably, photographic processing waste liquid is used in the processing of the present invention. The photographic waste liquid used in the processing method of the present invention is a processing waste liquid generated when a silver halide photosensitive material is developed. Here, the photosensitive materials include color photosensitive materials as well as black and white photosensitive materials. For example, in addition to color paper, color reversal paper, color negative film for photography, color reversal film, negative or positive film for movies, direct positive color photosensitive materials,
Examples include ray film, photosensitive materials for printing, microfilm, and black and white film for photography.
【0028】以下に写真処理廃液について説明する。写
真処理廃液は写真処理液成分を主成分としている。また
写真処理廃液には、そのほか写真処理過程で生成した現
像主薬の酸化体、硫酸塩、ハライドなどの反応生成物や
、感光材料から溶け出した微量のゼラチン、界面活性剤
などの成分が含まれている。The photographic processing waste liquid will be explained below. The photographic processing waste liquid is mainly composed of photographic processing liquid components. In addition, photographic processing waste liquid also contains reaction products such as oxidized products of developing agents, sulfates, and halides produced during photographic processing, as well as components such as trace amounts of gelatin and surfactants dissolved from photosensitive materials. ing.
【0029】写真処理液とは、カラー処理におけるカラ
ー現像液、漂白液、定着液、漂白定着液、リンス液、水
洗水や画像安定化液、黒白処理における黒白現像液、定
着液や水洗水、製版作業に伴う減力液、及び現像処理タ
ンク洗浄液などからなる。Photographic processing solutions include color developing solution, bleaching solution, fixing solution, bleach-fixing solution, rinsing solution, washing water and image stabilizing solution in color processing, black and white developing solution, fixing solution and washing water in black and white processing, Consists of reducing fluid used in plate-making work, cleaning fluid for development processing tanks, etc.
【0030】多くのカラーペーパー用現像液はカラー現
像主薬、亜硫酸塩、ヒドロキシルアミン塩、炭酸塩、硬
水軟化剤などと共にアルキレングリコール類やベンジル
アルコール類を含んでいる。一方カラーネガ用現像液、
カラーポジ用現像液、一部のカラーペーパー用現像液は
、これらのアルコール類を含んでいない。Many color paper developers contain alkylene glycols and benzyl alcohols along with color developing agents, sulfites, hydroxylamine salts, carbonates, water softeners, and the like. On the other hand, color negative developer,
Developer solutions for color positives and some developer solutions for color paper do not contain these alcohols.
【0031】カラー現像液は、通常、芳香族第一級アミ
ンカラー現像主薬を含有する。それは主にp−フェニレ
ンジアミン誘導体であり、代表例はN,N−ジエチル−
p−フェニレンジアミン、2−アミノ−5−ジエチルア
ミノトルエン、2−メチル−4−〔N−エチル−N−(
β−ヒドロキシエチル)アミノ〕アニリン、N−エチル
−N−(β−メタンスルホンアミドエチル)−3−メチ
ル−4−アミノアニリンである。また、これらのp−フ
ェニレンジアミン誘導体は硫酸塩、塩酸塩、亜硫酸塩、
p−トルエンスルホン酸塩などの塩である。該芳香族第
一級アミン現像主薬の含有量はカラー現像液1リットル
当り約0.5g〜約10gの範囲である。Color developers usually contain aromatic primary amine color developing agents. It is mainly a p-phenylenediamine derivative, a typical example being N,N-diethyl-
p-phenylenediamine, 2-amino-5-diethylaminotoluene, 2-methyl-4-[N-ethyl-N-(
β-hydroxyethyl)amino]aniline, N-ethyl-N-(β-methanesulfonamidoethyl)-3-methyl-4-aminoaniline. In addition, these p-phenylenediamine derivatives are sulfates, hydrochlorides, sulfites,
It is a salt such as p-toluenesulfonate. The content of the aromatic primary amine developing agent ranges from about 0.5 g to about 10 g per liter of color developer.
【0032】カラー現像液中には、保恒剤として種々の
ヒドロキシルアミン類を含んでいる。ヒドロキシルアミ
ン類は置換又は無置換いずれも用いられる。置換体の場
合はヒドロキシルアミン類の窒素原子が低級アルキル基
によって置換されているもの、とくに2個のアルキル基
(例えば炭素数1〜3)によって置換されたヒドロキシ
ルアミン類があげられる。ヒドロキシルアミン類の含有
量はカラー現像液1リットル当り0〜5gである。Color developing solutions contain various hydroxylamines as preservatives. Both substituted and unsubstituted hydroxylamines can be used. Examples of substituted hydroxylamines include those in which the nitrogen atom of hydroxylamines is substituted with a lower alkyl group, particularly hydroxylamines substituted with two alkyl groups (for example, carbon atoms 1 to 3). The content of hydroxylamines is 0 to 5 g per liter of color developer.
【0033】また黒白現像液中には、1−フェニル−3
−ピラゾリドン、1−フェニル−4−ヒドロキシメチル
−4−メチル−3−ピラゾリドン、N−メチル−p−ア
ミノフェノール及びその硫酸塩、ヒドロキノン及びその
スルホン酸塩などが含まれている。In addition, 1-phenyl-3 is contained in the black and white developer.
-pyrazolidone, 1-phenyl-4-hydroxymethyl-4-methyl-3-pyrazolidone, N-methyl-p-aminophenol and its sulfate, hydroquinone and its sulfonate, and the like.
【0034】カラー及び黒白現像液(以下、両者を総称
して単に現像液ということがある)には保恒剤として、
亜硫酸ナトリウム、亜硫酸カリウム、重亜硫酸ナトリウ
ム、重亜硫酸カリウム、メタ亜硫酸ナトリウム、メタ亜
硫酸カリウム等の亜硫酸塩や、カルボニル亜硫酸付加物
を含有するのが普通で、これらの含有量は0g〜5g/
リットルである。その他保恒剤として、カラー及び黒白
現像液にはN,N−ジアルキル置換ヒドロキシルアミン
とトリエタノールアミンなどのアルカノールアミンの組
合せも用いられる。カラー及び黒白現像液は、pH9〜
12である。上記pHを保持するためには、各種緩衝剤
が用いられる。緩衝剤としては、炭酸塩、リン酸塩、ホ
ウ酸塩、四ホウ酸塩、ヒドロキシ安息香酸塩、グリシン
塩、N,N−ジメチルグリシン塩、ロイシン塩、ノルロ
イシン塩、グアニン塩、3,4−ジヒドロキシフェニル
アラニン塩、アラニン塩、アミノ酪酸塩、2−アミノ−
2−メチル−1,3−プロパンジオール塩、バリン塩、
プロリン塩、トリスヒドロシアミノメタン塩、リシン塩
などを用いることができる。特に炭酸塩、リン酸塩、四
ホウ酸塩、ヒドロキシ安息香酸塩は、溶解性やpH9.
0以上の高pH領域での緩衝能に優れ、現像液に添加し
ても写真性能面への悪影響(カブリなど)がなく、安価
であるといった利点を有し、これらの緩衝剤が多く用い
られる。該緩衝剤の現像液への添加量は通常0.1モル
/リットル〜1モル/リットルである。[0034] Color and black and white developers (hereinafter both may be collectively referred to simply as developer) contain preservatives such as
It usually contains sulfites such as sodium sulfite, potassium sulfite, sodium bisulfite, potassium bisulfite, sodium metasulfite, potassium metasulfite, and carbonyl sulfite adducts, and the content of these is 0g to 5g/
It is a liter. Other preservatives used in color and black-and-white developers are combinations of N,N-dialkyl-substituted hydroxylamines and alkanolamines such as triethanolamine. Color and black and white developers have a pH of 9~
It is 12. Various buffers are used to maintain the above pH. Buffers include carbonate, phosphate, borate, tetraborate, hydroxybenzoate, glycine salt, N,N-dimethylglycine salt, leucine salt, norleucine salt, guanine salt, 3,4- Dihydroxyphenylalanine salt, alanine salt, aminobutyrate, 2-amino-
2-methyl-1,3-propanediol salt, valine salt,
Proline salts, trishydrocyaminomethane salts, lysine salts, etc. can be used. In particular, carbonates, phosphates, tetraborates, and hydroxybenzoates have low solubility and pH of 9.
These buffers are often used because they have excellent buffering ability in the high pH range of 0 or higher, have no adverse effects on photographic performance (fogging, etc.) when added to developing solutions, and are inexpensive. . The amount of the buffer added to the developer is usually 0.1 mol/liter to 1 mol/liter.
【0035】その他、現像液中にはカルシウムやマグネ
シウムの沈澱防止剤として、あるいは現像液の安定性向
上のために添加される、各種キレート剤が含まれる。そ
の代表例はニトリロ三酢酸、ジエチレントリアミン五酢
酸、ニトリロ−N,N,N−トリメリメチレンホスホン
酸、エチレンジアミン−N,N,N′,N′−テトラメ
チレンホスホン酸、1,3−ジアミノ−2−プロパノー
ル四酢酸、トランスシクロヘキサンジアミン四酢酸、1
,3−ジアミノプロパン四酢酸、2−ホスホノブタン−
1,2,4−トリカルボン酸、1−ヒドロキシエチリデ
ン−1,1ジホスホン酸などである。これらのキレート
剤は必要に応じて2種以上併用されることもある。[0035] In addition, the developer solution contains various chelating agents which are added as calcium and magnesium precipitation inhibitors or to improve the stability of the developer solution. Typical examples are nitrilotriacetic acid, diethylenetriaminepentaacetic acid, nitrilo-N,N,N-trimethylenephosphonic acid, ethylenediamine-N,N,N',N'-tetramethylenephosphonic acid, 1,3-diamino-2 -propanoltetraacetic acid, transcyclohexanediaminetetraacetic acid, 1
, 3-diaminopropanetetraacetic acid, 2-phosphonobutane-
These include 1,2,4-tricarboxylic acid and 1-hydroxyethylidene-1,1 diphosphonic acid. Two or more of these chelating agents may be used in combination, if necessary.
【0036】現像液は、各種の現像促進剤を含有する。
現像促進剤としては、チオエーテル系化合物、p−フェ
ニレンジアミン系化合物、4級アンモニウム塩類、p−
アミノフェノール類、アミン系化合物、ポリアルキレン
オキサイド、1−フェニル−3−ピラゾリドン類、ヒド
ラジン類、メソイオン型化合物、チオン型化合物、イミ
ダゾール類等である。The developer contains various development accelerators. As the development accelerator, thioether compounds, p-phenylenediamine compounds, quaternary ammonium salts, p-
These include aminophenols, amine compounds, polyalkylene oxides, 1-phenyl-3-pyrazolidones, hydrazines, mesoion type compounds, thione type compounds, imidazoles, and the like.
【0037】また、現像液中には、カブリ防止の目的で
、臭素イオンを含有することが多いが,塩化銀を主体と
する感光材料に対しては臭素イオンを含まない現像液を
用いることもある。その他、無機カブリ防止剤としてN
aClやKClなどの塩素イオンを与える化合物を含有
していてもよい。また必要に応じて各種有機カブリ防止
剤を含有していてもよい。有機カブリ防止剤としては、
例えば、アデニン類、ベンズイミダゾール類、ベンズト
リアゾール類及びテトラゾール類を含有していてもよい
。これらのカブリ防止剤の含有量は現像液1リットル当
り0.010g〜2gである。これらのカブリ防止剤は
処理中に感光材料中から溶出し、現像液中に蓄積するも
のも含まれる。[0037]Although the developer often contains bromide ions for the purpose of preventing fogging, it is also possible to use a developer that does not contain bromide ions for photosensitive materials containing silver chloride as the main ingredient. be. In addition, N is used as an inorganic antifoggant.
It may contain a compound that provides chlorine ions, such as aCl or KCl. Additionally, various organic antifoggants may be contained as required. As an organic antifoggant,
For example, it may contain adenines, benzimidazoles, benztriazoles, and tetrazoles. The content of these antifoggants is 0.010 g to 2 g per liter of developer. These antifoggants include those that are eluted from the photosensitive material during processing and accumulate in the developer.
【0038】また、必要に応じて、アルキルホスホン酸
、アリールホスホン酸、脂肪酸カルボン酸、芳香酸カル
ボン酸等の各種界面活性剤を含有していてもよい。[0038] If necessary, various surfactants such as alkylphosphonic acids, arylphosphonic acids, fatty acid carboxylic acids, aromatic carboxylic acids, etc. may be contained.
【0039】黒白写真処理においては、現像処理の後に
定着処理が行なわれる。さらにカラー写真処理において
は、現像処理と定着処理の間に通常漂白処理が行なわれ
、漂白処理は定着処理と同時に一浴漂白定着(ブリック
ス)で行なわれることもある。漂白液には、酸化剤とし
て鉄(III) 又はCo(III) のEDTA、ジ
エチレントリアミン五酢酸、ニトリロトリ酢酸、1,3
−ジアミノ−プロパン四酢酸塩、ホスホノカルボン酸塩
そのほか過硫酸塩、キノン類などが含まれている。その
ほか,臭化アルカリ、臭化アンモニウムなどの再ハロゲ
ン化剤、硼酸塩類、炭酸塩類、硝酸塩類を適宜含有する
場合もある。定着液や漂白定着液には定着剤としてのチ
オ硫酸塩(ナトリウム塩、アンモニウム塩)、酢酸塩、
ホウ酸塩、アンモニウム又はカリ明ばん亜硫酸塩などを
含有していてもよい。In black-and-white photographic processing, a fixing process is performed after the developing process. Furthermore, in color photographic processing, bleaching is usually carried out between development and fixing, and sometimes bleaching is carried out simultaneously with fixing in one-bath bleach-fixing (Brix). The bleaching solution contains iron (III) or Co (III) EDTA, diethylenetriaminepentaacetic acid, nitrilotriacetic acid, 1,3
Contains -diamino-propane tetraacetate, phosphonocarboxylate, persulfates, quinones, etc. In addition, it may contain appropriate rehalogenating agents such as alkali bromide and ammonium bromide, borates, carbonates, and nitrates. The fixing solution and bleach-fixing solution contain thiosulfate (sodium salt, ammonium salt), acetate,
It may also contain borate, ammonium or potassium alum sulfite.
【0040】ハロゲン化銀写真感光材料の処理において
は、定着処理あるいは一浴漂白定着処理を行なった後、
水洗及び/又は安定化処理を行なうことが一般的である
。In the processing of silver halide photographic light-sensitive materials, after the fixing treatment or the one-bath bleach-fixing treatment,
It is common to perform washing with water and/or stabilization treatment.
【0041】感光材料の処理における水洗水のpHは、
4−9であり、好ましくは5−8である。更に、感光材
料は、上記水洗に代り、直接安定液によって処理するこ
ともできる。このような安定化処理においては、特開昭
57−8,543号、58−14,834号、60−2
20,345号に記載の公知の方法はすべて用いること
ができる。The pH of the washing water in the processing of photosensitive materials is
4-9, preferably 5-8. Furthermore, instead of washing with water, the photosensitive material can be directly processed with a stabilizing solution. In such stabilization treatment, Japanese Patent Application Laid-Open Nos. 57-8,543, 58-14,834, and 60-2
All known methods described in US Pat. No. 20,345 can be used.
【0042】又、前記水洗処理に続いて、更に安定化処
理する場合もあり、その例として、撮影用カラー感光材
料の最終浴として使用される、ホルマリンと界面活性剤
を含有する安定浴を挙げることができる。この安定浴に
も各種キレート剤や防黴剤を加えることもできる。[0042]Furthermore, following the water washing process, a further stabilization process may be carried out, and an example thereof is a stabilizing bath containing formalin and a surfactant, which is used as a final bath for color photosensitive materials for photography. be able to. Various chelating agents and antifungal agents can also be added to this stabilizing bath.
【0043】銀を含む廃液については銀回収処理を施し
てから微生物処理に供する。銀回収の方法としては、電
解を用いて銀を析出させる方法、スチールウールを投入
して、鉄と銀とのイオン化傾向の差を利用して溶液中の
銀をスチールウール上に析出させる方法、硫化ナトリウ
ム溶液を添加して銀を硫化銀として沈澱させる方法等を
用いることができる。[0043] The waste liquid containing silver is subjected to silver recovery treatment and then subjected to microbial treatment. Methods for recovering silver include a method in which silver is precipitated using electrolysis, a method in which steel wool is introduced and silver in the solution is precipitated on the steel wool by utilizing the difference in ionization tendency between iron and silver; A method of adding a sodium sulfide solution to precipitate silver as silver sulfide can be used.
【0044】[0044]
【実施例】実施例で用いた廃液の説明銀回収系廃液(カ
ラー写真処理「CN−16」の定着液、「CN−16Q
」の漂白液、定着液、「CP−20」の漂白定着液、「
CP−23」の漂白定着液、および黒白写真処理定着液
「富士F」、「GRFI」の廃液および水を各々4:1
:3:2:7:3:2の比で混合した後銀回収処理を施
したもの)と現像液系廃液(カラー写真処理「CN−1
6」、「CN−16Q」、「CP−20」、「CP−2
3」各々の現像液および黒白写真処理現像液「RD3」
、「GRD1」の廃液および水を各々4:1:3:2:
7:3:2の比で混合したもの)とを体積比で1対1で
混合した。[Example] Description of the waste liquid used in the example Silver recovery system waste liquid (fixer for color photographic processing "CN-16", "CN-16Q
” bleaching solution, fixing solution, “CP-20” bleach-fixing solution, “
CP-23'' bleach-fix solution, and black and white photographic processing fixing solution ``Fuji F'' and ``GRFI'' waste solution and water at a ratio of 4:1, respectively.
:3:2:7:3:2 mixture and then subjected to silver recovery treatment) and developer system waste liquid (color photographic processing "CN-1")
6", "CN-16Q", "CP-20", "CP-2
3” each developer and black and white photographic processing developer “RD3”
, the waste liquid and water of “GRD1” were mixed in a ratio of 4:1:3:2:
(mixed at a ratio of 7:3:2) and were mixed at a volume ratio of 1:1.
【0045】ここで「 」内はいずれも富士写真フィ
ルム(株)の処理液の商品名である。この混合液中に低
級イオウ化合物として下記のものが含まれていた。
亜硫酸イオン
8600ppmチオ硫酸イオン
34300ppmまた鉄イオンは鉄EDT
Aとして3200ppm含まれていた。この溶液は無機
塩の濃度が12%と高いため生物処理に適するよう水道
水で10倍に希釈して用いた(未処理の状態でのCOD
(マンガン法による、以下同様)は4700ppmであ
った)。[0045] Here, all characters in parentheses are trade names of processing liquids manufactured by Fuji Photo Film Co., Ltd. This mixed solution contained the following lower sulfur compounds. sulfite ion
8600ppm thiosulfate ion
34,300ppm and iron ion is iron EDT
It contained 3200 ppm of A. This solution has a high concentration of inorganic salts of 12%, so it was diluted 10 times with tap water to make it suitable for biological treatment (COD in untreated state).
(According to the manganese method, hereinafter the same) was 4700 ppm).
【0046】実施例1工程(A)微生物処理としては銀
回収系廃液を10倍に希釈した液を用いて連続法で滞留
時間2日の条件で1ケ月間馴養した活性汚泥を用いた。
希釈廃液(COD4700ppm、Fe47ppm)に
リン酸−水素カリウムを150ppm添加し、滞留時間
2日で連続処理した。曝気槽のpHが6.6以上に保つ
ように、pHコントローラ(東京理化製FC−10型)
を用いて10%水酸化ナトリウム水溶液を添加した。添
加開始1ケ月後の定常状態になった所での処理水のデー
タを表1に示す。Example 1 Step (A) For the microbial treatment, activated sludge was used which had been acclimatized for one month using a continuous method using a 10-fold dilution of silver recovery system waste liquid with a residence time of 2 days. 150 ppm of potassium hydrogen phosphate was added to the diluted waste liquid (COD 4700 ppm, Fe 47 ppm), and the treatment was continued for a residence time of 2 days. Use a pH controller (Tokyo Rika FC-10 model) to keep the pH of the aeration tank at 6.6 or higher.
A 10% aqueous sodium hydroxide solution was added using a . Table 1 shows the data of the treated water when it reached a steady state one month after the start of addition.
【0047】[0047]
【表1】[Table 1]
【0048】工程(B)
工程(A)からの処理水の浮遊物を濾過して除いた濾液
(200ml)を、陽極に二酸化鉛電極(LD400型
、日本カーリット社製)、陰極にステンレス(SUS3
16)板を陽極をはさむ両側にとりつけた電解槽で酸化
処理を行なった。電解槽の液を攪拌しながら電極間電圧
3.8Vで2.5Aの電流を流した。表1に示す時間後
の処理水のデータを表1に示す。Step (B) The filtrate (200 ml) obtained by filtering and removing suspended matter from the treated water from step (A) was heated using a lead dioxide electrode (LD400 type, manufactured by Nippon Carlit Co., Ltd.) as the anode and a stainless steel (SUS3) as the cathode.
16) Oxidation treatment was carried out in an electrolytic bath in which plates were attached on both sides of the anode. While stirring the liquid in the electrolytic cell, a current of 2.5 A was applied with an interelectrode voltage of 3.8 V. Table 1 shows data on the treated water after the times shown in Table 1.
【0049】工程(C)
工程(B)から得られた処理水を表1に示すpHに調整
した。15分攪拌したのち凝集剤(DIC−A500大
日本インキ社製)を加え30分攪拌してから濾紙を使っ
て濾過した処理水のデータを表1に示す。Step (C) The treated water obtained from step (B) was adjusted to the pH shown in Table 1. After stirring for 15 minutes, a flocculant (DIC-A500 manufactured by Dainippon Ink Co., Ltd.) was added, stirring for 30 minutes, and filtering the treated water using filter paper. Table 1 shows the data of the treated water.
【0050】実施例2工程(C)まで処理した処理水(
水準No.2)を富士写真フィルム(株)足柄工場の活
性汚泥を用い、連続法で滞留時間1日の条件で活性汚泥
処理を行なった。2週間たって定常状態になった時点で
の処理水のCODは96ppm、BOD5 は5ppm
以下、鉄は1ppm以下と非常に良好な処理水が得られ
た(工程(D))。Example 2 Treated water treated up to step (C) (
Standard No. 2) was treated using activated sludge from the Ashigara factory of Fuji Photo Film Co., Ltd. in a continuous method with a residence time of 1 day. After two weeks, the COD of the treated water was 96 ppm and the BOD5 was 5 ppm.
Hereinafter, very good treated water with iron content of 1 ppm or less was obtained (step (D)).
【0051】実施例3工程(C)まで処理した処理水(
水準No.2)と工程(D)まで処理した処理水を、粒
状活性炭TYPESGL(東洋カルゴン社製)をカラム
につめたものを流したところ得られた処理水のCODは
それぞれ48ppm、15ppmと良好な処理水が得ら
れた。Example 3 Treated water treated up to step (C) (
Standard No. When the treated water treated through steps 2) and (D) was passed through a column packed with granular activated carbon TYPESGL (manufactured by Toyo Calgon Co., Ltd.), the COD of the treated water obtained was 48 ppm and 15 ppm, respectively, indicating good treated water. was gotten.
【0052】[0052]
【発明の効果】本発明によるときは写真処理廃液の如き
低級イオウ化合物と可溶性鉄塩を公害物質として含む廃
液を、運転経費の増加や電解時の電極汚染等の問題を生
ずることなく、効率よく無害化処理することができる。[Effects of the Invention] According to the present invention, waste liquids containing lower sulfur compounds and soluble iron salts as pollutants, such as photographic processing waste liquids, can be efficiently collected without increasing operating costs or causing problems such as electrode contamination during electrolysis. Can be rendered harmless.
Claims (4)
化された鉄塩とを含む廃液に次の(A) 〜(C) の
処理工程を順次行うことを特徴とする廃液の処理方法。 (A) 低級イオウ化合物を処理する微生物処理工程、
(B) 電解処理工程、 (C) pH4〜7.5で鉄イオンをリン酸塩および/
または他の無機塩・酸との複塩として沈殿除去する工程
。1. A method for treating a waste liquid, which comprises sequentially performing the following treatment steps (A) to (C) on a waste liquid containing a lower sulfur compound and an iron salt solubilized with a chelating agent. (A) Microbial treatment step for treating lower sulfur compounds;
(B) Electrolytic treatment step, (C) Ferrous ions are converted into phosphate and/or at pH 4-7.5.
Or the process of precipitating and removing it as a double salt with other inorganic salts and acids.
処理であることを特徴とする請求項(1) 記載の廃液
の処理方法。2. The method for treating waste liquid according to claim 1, wherein the microbial treatment in step (A) is activated sludge treatment.
して微生物処理を組合せることを特徴とする請求項(1
) 記載の廃液の処理方法。[Claim 3] Claim (1) characterized in that microbial treatment is further combined as a step (D) after the treatment of all the steps.
) How to treat the waste liquid described.
ることを特徴とする請求項(1) 記載の廃液の処理方
法。4. The method for treating waste liquid according to claim 1, wherein the waste liquid to be treated is a photographic development processing waste liquid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3016013A JPH04235788A (en) | 1991-01-14 | 1991-01-14 | Treatment of waste solution containing lower sulfur compound and soluble iron salt |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3016013A JPH04235788A (en) | 1991-01-14 | 1991-01-14 | Treatment of waste solution containing lower sulfur compound and soluble iron salt |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04235788A true JPH04235788A (en) | 1992-08-24 |
Family
ID=11904693
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3016013A Pending JPH04235788A (en) | 1991-01-14 | 1991-01-14 | Treatment of waste solution containing lower sulfur compound and soluble iron salt |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04235788A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100325922B1 (en) * | 1999-11-30 | 2002-02-27 | 이병헌 | Method for treating unresolvable wastewater |
JP2011527233A (en) * | 2008-07-07 | 2011-10-27 | アレヴァ エンペー ゲゼルシャフト ミット ベシュレンクテル ハフツング | Method for the preparation of waste solutions containing organic substances and metals in the form of ions, generated during wet chemical cleaning of normal or nuclear technical equipment |
-
1991
- 1991-01-14 JP JP3016013A patent/JPH04235788A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100325922B1 (en) * | 1999-11-30 | 2002-02-27 | 이병헌 | Method for treating unresolvable wastewater |
JP2011527233A (en) * | 2008-07-07 | 2011-10-27 | アレヴァ エンペー ゲゼルシャフト ミット ベシュレンクテル ハフツング | Method for the preparation of waste solutions containing organic substances and metals in the form of ions, generated during wet chemical cleaning of normal or nuclear technical equipment |
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