JPH0422905A - Production of optical wavegauide - Google Patents
Production of optical wavegauideInfo
- Publication number
- JPH0422905A JPH0422905A JP2126870A JP12687090A JPH0422905A JP H0422905 A JPH0422905 A JP H0422905A JP 2126870 A JP2126870 A JP 2126870A JP 12687090 A JP12687090 A JP 12687090A JP H0422905 A JPH0422905 A JP H0422905A
- Authority
- JP
- Japan
- Prior art keywords
- additive
- porous glass
- waveguide
- refractive index
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000005373 porous glass Substances 0.000 claims abstract description 40
- 239000011521 glass Substances 0.000 claims abstract description 23
- 239000000654 additive Substances 0.000 claims abstract description 20
- 239000010410 layer Substances 0.000 claims abstract description 17
- 230000000996 additive effect Effects 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 13
- 239000002344 surface layer Substances 0.000 claims abstract description 9
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- 238000001020 plasma etching Methods 0.000 claims abstract description 7
- 238000003980 solgel method Methods 0.000 claims abstract description 6
- 230000002194 synthesizing effect Effects 0.000 claims abstract description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 18
- 150000004703 alkoxides Chemical group 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract 3
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000010936 titanium Substances 0.000 description 27
- 239000000243 solution Substances 0.000 description 13
- 239000000126 substance Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000011148 porous material Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- 229910010280 TiOH Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- -1 for example Chemical compound 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 1
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Optical Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光通信用デバイス等に使用される光導波路の製
造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing an optical waveguide used in optical communication devices and the like.
多孔質ガラスを使用した光導波路の製造に関する従来の
技術としては、例えば特開昭６３−１７５８０８号公報
に記載されるような方法がある。As a conventional technique for manufacturing an optical waveguide using porous glass, there is a method described in, for example, Japanese Patent Laid-Open No. 175808/1983.
この方法では、５ｉｆｔ、Ｉ”ｈ Ｄ 、 Ｂｅ Ｏｓ
を成分とするガラスを６００℃に加熱することによりＢ
ｔｕｓ ＮａｔＯ相と５ｌｏｔ相に分相させ、Ｈ（Ｊ
でエツチングすることにより、ＢｇＯｓ Ｎａρ相を
溶出させ、多孔質ガラスを得る。そして、この多孔質ガ
ラスにチタンアルコラード、水、アルコールを含む溶液
を拡散させ、導波路とすべき部分にレーザーを照射し加
熱することにより、チタンを定着させる。次に導波路部
分以外のチタンを含む溶液を除去する。このチタンを導
波路部分の形状に定着させた多孔質ガラスを焼結し、透
明ガラス化することにより光導波路を得ている。In this method, 5ift, I”h D , Be Os
By heating the glass containing B to 600℃
tus NatO phase and 5 lot phase, and H(J
By etching the glass, the BgOs Naρ phase is eluted and a porous glass is obtained. Then, a solution containing titanium alcohol, water, and alcohol is diffused into this porous glass, and the portion to be used as a waveguide is irradiated with a laser and heated to fix titanium. Next, the solution containing titanium is removed from areas other than the waveguide portion. An optical waveguide is obtained by sintering the porous glass in which this titanium is fixed in the shape of the waveguide portion and making it transparent glass.
上記の従来技術では、多孔質ガラス全体にチタンを含む
溶液を拡散させ、導波路とすべき部分にのみレーザーを
照射するなどとして、チタンを定着させていたが、通常
のＳｉＯｘを主成分とする多孔質ガラスを使用していた
ため、安定にチタンをガラス中に定着させることは困難
であった。更に、導波路部分以外にもチタンが拡散して
いるため、これを洗い流しにより除去する工程が必須で
あっ１が、導波路部分以外のチタンを完全に洗い流すこ
とは困難であった。In the above-mentioned conventional technology, titanium was fixed by diffusing a titanium-containing solution throughout the porous glass and irradiating a laser only on the part that should be used as a waveguide. Since porous glass was used, it was difficult to stably fix titanium in the glass. Furthermore, since titanium is diffused in areas other than the waveguide portion, a step of removing it by washing is essential, but it has been difficult to completely wash away titanium other than the waveguide portion.
従って光導波路の製造方法において、ガラス中特に導波
路部分に必要とされる添加物を安定に添加、定着し、し
かも導波路以外の部分には添加物の拡散を来さない手段
の開発が求められており、本発明はこれを課題としてな
されたものである。Therefore, in the manufacturing method of optical waveguides, there is a need for the development of a means for stably adding and fixing the necessary additives into the glass, especially in the waveguide part, and without causing the additives to diffuse into parts other than the waveguide. The present invention has been made with this in mind.
上記課題を解決する本発明の光導波路の製造方法は、ゾ
ルゲル法により多孔質ガラスを合成する工程と、該多孔
質ガラスの表面層に屈折率を上昇させる添加物を添加す
る工程と、熱処理により該多孔質ガラスを透明ガラス化
する工程と、その後導波路となるべき部分以外の添加物
を含む層を除去する工程を含むことを特徴とする。The method for manufacturing an optical waveguide of the present invention that solves the above problems includes a step of synthesizing porous glass by a sol-gel method, a step of adding an additive that increases the refractive index to the surface layer of the porous glass, and a step of heat treatment. The method is characterized in that it includes a step of converting the porous glass into transparent glass, and then a step of removing the layer containing the additive other than the portion to become the waveguide.
本発明においては、上記多孔質ガラスの表面層に屈折率
を上昇させる添加物を添加する工程は、Ｔｉ、Ｇｅ又は
Ｍのアルコキシドの少なくとも１種以上と８皿のアルコ
キシドとを含有する溶液の加水分解溶液に上記多孔質ガ
ラスを液浸することによることが特に好ましい。In the present invention, the step of adding an additive that increases the refractive index to the surface layer of the porous glass includes adding water to a solution containing at least one or more Ti, Ge, or M alkoxides and eight alkoxides. Particularly preferred is immersion of the porous glass in a decomposition solution.
また本発明においては、上記その後導波路となるべき部
分以外の添加物を含む層を除去する工程は、反応性イオ
ンエツチングによることが特に好ましい。Further, in the present invention, it is particularly preferable that the step of removing the layer containing the additive other than the portion to become the waveguide is performed by reactive ion etching.
以下、図面を参照して本発明を説明する。本発明では原
料アルコキシド、水、アルコールにｐＨ調整剤としてア
ンモニア水等を加えて混合撹拌し、ゾル溶液を調製し、
これをゲル化、乾燥して乾燥ゲル体を作成する。この乾
燥ゲル体を５００°Ｃ以上の酸素雰囲気中で熱処理して
炭素成分を除去し緻密化することにより多孔質ガラスｌ
とし〔第１図の（８１部分〕、この多孔質ガラス１の表
面層を容器３内の屈折率を上昇させる物質を含む溶液２
中に液浸し〔第１図の（ｂ１部分〕、表面層にのみ屈折
率を上昇させる物質を添加する〔第１図のｆｃ１部分］
ｉｉは添加物を含まない多孔質ガラス、１２は屈折率上
昇物質を含有する多孔質ガラス（高屈折率層ともいう）
を示す。その後１０００℃以上での熱処理により該多孔
質ガラス１１．１２を透明ガラス化し、導波路となるべ
き部分２２以外の高屈折率層を反応性イオンエツチング
などの方法により除去する〔第１図の（ｄ１部分〕。第
２図はこのようにして得られたりッジ型光導波路の斜視
図である。The present invention will be described below with reference to the drawings. In the present invention, a sol solution is prepared by adding aqueous ammonia or the like as a pH adjuster to the raw material alkoxide, water, and alcohol, and mixing and stirring the mixture.
This is gelled and dried to create a dry gel body. This dry gel body is heat-treated in an oxygen atmosphere at 500°C or higher to remove carbon components and become densified, resulting in porous glass.
[Part 81 in FIG.
Immerse in liquid [(b1 part in Figure 1)] and add a substance that increases the refractive index only to the surface layer [fc1 part in Figure 1]
ii is porous glass that does not contain additives; 12 is porous glass that contains a refractive index increasing substance (also referred to as a high refractive index layer)
shows. Thereafter, the porous glass 11, 12 is made transparent by heat treatment at 1000° C. or higher, and the high refractive index layer other than the portion 22 that is to become a waveguide is removed by a method such as reactive ion etching [(see Fig. 1) d1 section]. Fig. 2 is a perspective view of the wedge-shaped optical waveguide obtained in this manner.
本発明においては、ゾルゲル法により作成した乾燥ゲル
体を５００℃以上の酸素雰囲気中で熱処理して多孔質ガ
ラスを得ているが、これはゲル中に含まれる炭素成分を
除去するための処理である。In the present invention, porous glass is obtained by heat-treating a dry gel body created by the sol-gel method in an oxygen atmosphere at 500°C or higher, but this is a treatment to remove carbon components contained in the gel. be.
このようにしてゾルゲル法により合成した多孔質ガラス
は多量のＯＨ基を含有している。このＯＨ基が屈折率を
上昇させる働きのあるＴｉやＧｅなどとＳｉを化学的に
結合させるため、通常の多孔質ガラスを使用した従来の
技術に比べて、本発明によるものはＴｉやＧｅなどがガ
ラス中により安定に捕獲される。The porous glass thus synthesized by the sol-gel method contains a large amount of OH groups. These OH groups chemically bond Si with Ti, Ge, etc., which have the function of increasing the refractive index. is more stably captured in the glass.
本発明において多孔質ガラス体に添加する屈折率を上昇
させる物質としては、例えばＴｉ、 Ｇｅ、 Ａｉ！。In the present invention, examples of substances that increase the refractive index added to the porous glass body include Ti, Ge, and Ai! .
Ｐ等を挙げることができる。Examples include P.
特にＴｉ、 Ｇｅ、 Ａｊ！等のアルコキシドの加水分
解溶液を用いると、以下Ｔｉで代表して説明するが、Ｏ
Ｈ基を有するＴｉ （ミＴｉ ＯＨ）が形成される。Especially Ti, Ge, Aj! When using a hydrolyzed solution of alkoxides such as
Ti with H groups (mi-TiOH) is formed.
このＴｉのＯＨが多孔質ガラス表面のＯＨと脱水反応し
て、＝Ｔｉ −ＯＳｉ ＝の結合がガラス表面に形成さ
れる。よってＴｉイオン（例えばＴｉ塩水溶液）に浸漬
して添加する場合より、非常に安定となる。The OH of this Ti undergoes a dehydration reaction with the OH on the surface of the porous glass, and a =Ti-OSi= bond is formed on the glass surface. Therefore, it is much more stable than when it is added by immersing it in Ti ions (for example, an aqueous Ti salt solution).
この場合、ガラス表面に多量のＯＨが存在する必要があ
るが、本発明で用いるゾルゲル法で作成した多孔質ガラ
スは、前記のようにその表面にも内部にも多量のＯＨが
存在することが確かめられているので非常に好都合であ
る。In this case, a large amount of OH needs to exist on the glass surface, but the porous glass prepared by the sol-gel method used in the present invention does not have to contain a large amount of OH both on its surface and inside, as described above. This is very convenient as it has been confirmed.
さらにまた、本発明においては、Ｔｉ等のアルコキシド
にＳｌのアルコキシドを共存させた加水分解溶液を用い
ることが特に好ましい。Ｓｌのアルコキシドの共存なし
に多孔質ガラス中に添加すると、ガラスの細孔表面にの
みＴｉ等が反応により付着（結合）するが、Ｓｉアルコ
キシドを同時に添加すると、ＯＨ基を有するＳｉにより
細孔を満たして新たにガラスが形成されるので、Ｔｊ等
はこの細孔内に新しく形成されたガラス内部にも結合を
形成して分布する。よって細孔表面のみに付着する場合
より高濃度に且つ安定にＴｉ等を添加できる。Furthermore, in the present invention, it is particularly preferable to use a hydrolyzed solution in which an alkoxide such as Ti and an alkoxide of Sl coexist. If Sl is added to porous glass without the coexistence of alkoxide, Ti, etc. will attach (bond) only to the pore surface of the glass through reaction, but if Si alkoxide is added at the same time, Si with OH groups will close the pores. Since a new glass is formed by filling the pores, Tj and the like form bonds and are distributed inside the newly formed glass as well. Therefore, Ti and the like can be added at a higher concentration and more stably than when adhering only to the pore surface.
本発明においてＴｉ、 Ｇｅ、 Ａｔ’、 Ｓｉ等のア
ルコキシドとしては、例えばメトキシド、エトキシド等
を挙げることができる。加水分解溶液はアルコキシド類
、水、アルコールからなり、更に、ｐＨ調整剤を添加し
てもよい。アルコールとしては例えばメタノール、エタ
ノール、１−プロパツール、ｎ−プロパツール、ｎ−ブ
タノール、ｉ−ブタノール ｔ−ブタノール等を使用す
るこができる。加水分解溶液のｐＨは３〜１１程度が好
ましい。In the present invention, examples of alkoxides such as Ti, Ge, At', and Si include methoxide and ethoxide. The hydrolysis solution consists of alkoxides, water, and alcohol, and may further include a pH adjuster. As the alcohol, for example, methanol, ethanol, 1-propanol, n-propanol, n-butanol, i-butanol, t-butanol, etc. can be used. The pH of the hydrolysis solution is preferably about 3 to 11.
多孔質ガラスを屈折率を上昇させる物質を含む溶液に液
浸して、第１図ｆｃｌの１２の高屈折率層を形成する際
、高屈折率層の厚さは液浸時間と多孔質ガラスの密度に
より制御することができる。本発明に用いる多孔質ガラ
スの密度範囲は０．８〜１゜５ ｇ／ｃｘｌ程度が好ま
しい。When immersing porous glass in a solution containing a substance that increases the refractive index to form the 12 high refractive index layers shown in FIG. It can be controlled by density. The density range of the porous glass used in the present invention is preferably about 0.8 to 1.5 g/cxl.
１０００℃以上での熱処理により多孔質ガラスを透明ガ
ラス化する前に通常はＣｉｔ処理を８００℃以上で行い
、続いて８００℃以上でのへ処理によりガラス中のＯＨ
基を除去する。前記のようにＯＨ基はＧｅやＴｉなどを
ガラス中に安定に捕獲する働きはあるが、最後までガラ
ス中に残った場合には伝送損失の原因となる。そこで、
ＧｅやＴｉを定着させた後、Ｃｐｔ処理によりＯＨをＣ
ｉ！と置換し、更に缶処理によりガラス中に残ったＣ１
をＯと置換してＳｉｎ！を形成することでＯＨ基を取り
除く必要がある。Before turning porous glass into transparent glass by heat treatment at 1000°C or higher, Cit treatment is usually performed at 800°C or higher, and then OH treatment in the glass is performed at 800°C or higher.
remove the group. As mentioned above, the OH group has the function of stably capturing Ge, Ti, etc. in the glass, but if it remains in the glass to the end, it causes transmission loss. Therefore,
After fixing Ge and Ti, OH is removed by Cpt treatment.
i! C1 remaining in the glass due to can treatment
Replace O with Sin! It is necessary to remove the OH group by forming .
導波路形状に高屈折率部分を形成する工程において、従
来技術では導波路部分以外のＴｉやＧｅ等を完全に取り
除くことが出来ず、これが伝送損失の原因となっていた
が、本発明では導波路部分以外のＴｉやＧｅを含む層を
反応性イオンエツチングなどにより完全に除去している
ので、この点心配はない。反応性イオンエツチングなど
により導波路となるべき部分以外の高屈折率層を除去す
る方法は従来公知の技術によればよい。In the process of forming a high refractive index portion in the shape of a waveguide, conventional techniques were unable to completely remove Ti, Ge, etc. from areas other than the waveguide, which caused transmission loss. There is no need to worry about this because the layer containing Ti and Ge other than the wave path portion is completely removed by reactive ion etching or the like. A conventionally known technique may be used to remove the high refractive index layer other than the portion to become a waveguide by reactive ion etching or the like.
以下に本発明を実施例により具体的に説明するが、本発
明はこれに限定されるものではない。EXAMPLES The present invention will be specifically explained below using Examples, but the present invention is not limited thereto.
実施例
メチルシリケート４０−９水４０−、エタノ−クロ０ｍ
Ｚ、０．ＩＮアンモニア水１．５−を混合撹拌し、室温
で１日放置してゲル化させた。このゲルを６０℃から１
５０℃までｌＯ日日間けて昇温しながら乾燥させ、その
後１℃の昇温速度で８００℃まで昇温し、８００℃で３
日間、Ｏ１雰囲気中に保持する第１の熱処理を行った。Example Methyl silicate 40-9 Water 40-, Ethano-chloro 0m
Z, 0. 1.5-liter of IN ammonia water was mixed and stirred, and the mixture was allowed to stand at room temperature for one day to form a gel. This gel was heated at 60℃ for 1
Dry it while raising the temperature to 50℃ for 10 days, then increase the temperature to 800℃ at a rate of 1℃, and dry it at 800℃ for 3 days.
A first heat treatment was performed in which the sample was held in an O1 atmosphere for 1 day.
このようにして得られた多孔質ガラス表面をＴｉ（−０
□Ｃ，Ｈ，）と５ｉ（ＱＣ）Ｉ、）＊の加水分解溶液に
液浸して多孔質ガラスの表面層にＴｉを拡散させた。次
にこの多孔質ガラスを８００℃〜１０００℃で６雰囲気
に３時間保持し、その後頁に１”Ｃ／分の昇温速度で１
２００℃まで昇温し、２時間保持して透明ガラス化した
。含浸層厚さは８〜１２＃ｌｌであった。また、加水分
解溶液中のＴｉ濃度１．５〜２，５重量％の場合、導波
路部分に添加されたＴＩ濃度は１重量％であった。この
ような表層に高屈折率層を持つガラスの表面に蒸着によ
り導波路形状にα−８Ｉ（アモルファスシリコン）を付
着させ、反応性イオンエツチングにより導波路部分以外
の高屈折率層を除去した。得られた導波路の伝送損失は
０．１ ｄＢ ／ ｃａ＋であった。The porous glass surface thus obtained was coated with Ti(-0
Ti was diffused into the surface layer of the porous glass by immersion in a hydrolyzed solution of □C,H, ) and 5i(QC)I, )*. This porous glass was then held at 800°C to 1000°C for 3 hours in an atmosphere of 6°C, after which it was heated to
The temperature was raised to 200°C and maintained for 2 hours to form transparent vitrification. The impregnated layer thickness was 8-12 #ll. Further, when the Ti concentration in the hydrolysis solution was 1.5 to 2.5% by weight, the TI concentration added to the waveguide portion was 1% by weight. α-8I (amorphous silicon) was deposited on the surface of such a glass having a high refractive index layer in the shape of a waveguide by vapor deposition, and the high refractive index layer other than the waveguide portion was removed by reactive ion etching. The transmission loss of the obtained waveguide was 0.1 dB/ca+.
本発明による光導波路は、複雑な工程を必要としないの
で量産に適している。また、導波路部分以外には添加物
が存在しないので、伝送損失を低く抑えることができ、
光通信の分野でもスイッチ等のデバイスとして利用する
ことができる。The optical waveguide according to the present invention does not require complicated processes and is therefore suitable for mass production. In addition, since there are no additives in areas other than the waveguide, transmission loss can be kept low.
It can also be used as devices such as switches in the field of optical communications.
第１図は本発明のフロー図であり、第２図は本発明によ
り作成されたりッジ型光導波路の斜視図である。
１：多孔質ガラス、１１：多孔質ガラス（屈折率を上昇
させる物質を含まない層）、１２：多孔質ガラス（屈折
率を上昇させる物質を含む層）、２：屈折率を上昇させ
る物質を含む溶液、２１：透明ガラス（屈折率を上昇さ
せる物質を含まない）、２２＋透明ガラスの導波路部分
（屈折率を上昇させる物質を含む）、３：容器を示す。FIG. 1 is a flow diagram of the present invention, and FIG. 2 is a perspective view of a wedge-type optical waveguide made according to the present invention. 1: Porous glass, 11: Porous glass (layer not containing a substance that increases the refractive index), 12: Porous glass (layer containing a substance that increases the refractive index), 2: A layer containing a substance that increases the refractive index 21: transparent glass (contains no substance that increases the refractive index); 22+ waveguide portion of transparent glass (contains a substance that increases the refractive index); 3: container.
Claims (3)
、該多孔質ガラスの表面層に屈折率を上昇させる添加物
を添加する工程と、熱処理により該多孔質ガラスを透明
ガラス化する工程と、その後導波路となるべき部分以外
の添加物を含む層を除去する工程を含むことを特徴とす
る光導波路の製造方法。(1) a step of synthesizing porous glass by a sol-gel method, a step of adding an additive that increases the refractive index to the surface layer of the porous glass, and a step of turning the porous glass into transparent glass by heat treatment, A method for manufacturing an optical waveguide, the method comprising the step of thereafter removing the layer containing the additive other than the portion to become the waveguide.
添加物を添加する工程は、Ｔｉ、Ｇｅ又はＡｌのアルコ
キシドの少なくとも１種以上とＳｉのアルコキシドとを
含有する溶液の加水分解溶液に該多孔質ガラスを液浸す
ることによることを特徴とする請求項（１）記載の光導
波路の製造方法。(2) The step of adding an additive that increases the refractive index to the surface layer of the porous glass is performed by adding an additive to the surface layer of the porous glass into a hydrolyzed solution containing at least one alkoxide of Ti, Ge, or Al and an alkoxide of Si. 2. The method of manufacturing an optical waveguide according to claim 1, wherein the method comprises immersing the porous glass in liquid.
含む層を除去する工程は、反応性イオンエッチングによ
ることを特徴とする請求項（１）記載の光導波路の製造
方法。(3) The method for manufacturing an optical waveguide according to claim (1), wherein the step of removing the layer containing the additive other than the portion to become the waveguide is performed by reactive ion etching.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2126870A JPH0422905A (en) | 1990-05-18 | 1990-05-18 | Production of optical wavegauide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2126870A JPH0422905A (en) | 1990-05-18 | 1990-05-18 | Production of optical wavegauide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0422905A true JPH0422905A (en) | 1992-01-27 |
Family
ID=14945878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2126870A Pending JPH0422905A (en) | 1990-05-18 | 1990-05-18 | Production of optical wavegauide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0422905A (en) |
-
1990
- 1990-05-18 JP JP2126870A patent/JPH0422905A/en active Pending
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