JPH04226465A - Device for processing waterless planographic printing plate - Google Patents

Abstract

PURPOSE:To provide a device for processing a waterless PS plate having an improved mechanism for removing development residue such as silicone rubber suspended in a processing soln. at the time of processing the waterless PS plate. CONSTITUTION:In a device for processing a waterless planographic printing plate, a developing soln. is recovered in a processing soln. tank 5 after development, fed again to the processing part and utilized under circulation. In this system, a filter 61 is connected to the tank 5 and development residue such as silicone rubber is separated from the processing soln. after processing.

Description

[Detailed description of the invention]

0001

[Industrial Application Field] The present invention relates to a processing apparatus for waterless lithographic printing plates (hereinafter abbreviated as waterless PS plates), and more specifically, the present invention relates to a processing apparatus for waterless lithographic printing plates (hereinafter abbreviated as waterless PS plates). The present invention relates to a waterless PS plate processing apparatus having an improved mechanism for removing so-called development residue such as silicone rubber. Furthermore, the present invention is applicable not only to the processing solution for development, but also to the removal of development residue carried into the processing solution used in subsequent steps.

0002

[Prior Art] Currently known waterless PS plates have a photoreleasable, photocurable, water-insoluble or photoadhesive photosensitive layer and a silicone rubber layer as an ink repellent layer laminated on a support such as aluminum. Furthermore, a protective film is laminated on the surface as necessary.

There are several methods for developing the above-mentioned waterless PS plate after exposure, but the basic principle is to supply a developer to the photosensitive layer side of the waterless PS plate and develop the surface. The silicone rubber layer in the image area is removed by rubbing with a brush roller. In this method, the developer is stored in a developer tank and is supplied from above the brush roller by a pump, and the developer containing the scraped silicone rubber layer is collected in the developer tank. The waste is collected, circulated by a pump, and reused.

In conventional apparatuses, a filter is placed between the developer tank and the pump to prevent developer residue from being supplied to the processing section.

[0005] Also, the Toray waterless lithography automatic developing machine TWL
860 and TWL1160 use a conventional filter installed between the developer tank and the pump to remove developer residue.In addition, the developer tank is equipped with an overflow outlet to remove developer residue due to its small specific gravity. The developer residue floating on the surface is removed to the outside by replenishing 1 liter of developer per minute of operation and removing a large amount of overflow.

[0006] Furthermore, Japanese Patent Application Laid-Open No. 2-220060, 2-2-
No. 220061 discloses that a collection tank for developer scum is placed in parallel with a developer tank, and the developer in the surface layer where developer scum is floating is poured into the collection tank by overflow.
A system for separating development residue is described.

[0007]

[Problems to be Solved by the Invention] The development residue of the silicone rubber layer mentioned above (1) re-adheres to the plate surface to be processed and causes white spots in image areas and stains in non-image areas during printing; Pumps, filters, shower nozzles, etc. may become clogged, making it impossible to perform treatment, increasing the effort required for cleaning, and deteriorating maintainability. The amount of liquid supplied to the plate material decreases, and developability deteriorates. This is causing problems such as: It has also been pointed out that there are harmful effects caused by contamination of the developer tank due to developer residue.

[0008] Furthermore, the above-mentioned problem occurs not only in the developer but also in the development residue carried into the processing solution in the subsequent process.

Among the conventional techniques for removing developer residue described above, a filter device is provided in a part of the developer circulation system, and
The method that mainly uses a filter to remove development residue is
The filter gets clogged quickly, its lifespan is not long enough, and the maintenance load is large, and the system in which developer residue is directly discharged to the outside together with the developer due to overflow is unfavorable in terms of environmental hygiene. Furthermore, the method of discharging and removing a large amount of overflow is not preferable because it is inefficient and increases cost.

[0010]Furthermore, the system in which the developer scum collection tank is provided in parallel with the developer tank has the disadvantage that the device becomes larger accordingly, and the transfer of developer scum from the developer tank to the collection tank is not always sufficient. There are also some drawbacks.

[0011] In view of the above, the present invention provides a water tank having an improved developer residue removal mechanism that is simple, efficient, and has a light maintenance load, and is capable of quickly removing developer residue that has flowed into a developer tank. The purpose is to clarify the PS version processing device.

0012

[Means for Solving the Problems] The present invention provides a processing solution tank in a PS plate processing apparatus of a type in which processing solution after processing is collected in a developer tank and further supplied to a processing section for circulation use. The method is characterized in that a filter is disposed in the processing solution to separate the developer residues such as silicone rubber from the processing solution in which the developer residues, such as silicone rubber, are mixed after the processing is completed.

[0013]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the waterless PS plate processing apparatus according to the present invention will be explained in more detail according to the embodiments shown in the accompanying drawings.

As shown in FIG. 1, in the waterless PS plate processing apparatus to which the first embodiment is applied, the waterless PS plate 1 is conveyed in a horizontal state, and is subjected to a developing process A, a first washing process B, and a post-waterless PS plate processing apparatus. After going through a treatment step C and a second water washing step D, it is transported outside.

The developer stored in the developer tank 5 is supplied to the pump 7 through the filter 61, and is sprayed from the shower nozzle 51 by the operation of the pump 7, either directly or onto the brush roller 21. - Supplied to the surface of the waterless PS plate via 22 and 23. After the processing steps, the developer containing the developer residue falls by gravity into a receiving section 7 provided below the development process section, and is collected in the developer tank 5.

The developer tank 5 is provided with a submerged filter 65 having a mesh size of 10 μm to 1 mm, particularly preferably 50 μm to 500 μm. Filter 6 installed in the liquid
5 prevents waste from flowing into the piping even when the processing liquid is sucked by the pump, thereby preventing clogging of the filter provided in the piping. Furthermore, when the circulation is stopped, the silicone rubber scum floats and the filter in the liquid does not become clogged. The scum concentrated above the liquid is easily discharged by overflow. Development scum such as silicone rubber is separated and prevented from being supplied to the processing section again by liquid circulation.

2 to 4 show other embodiments of the present invention, and the one shown in FIG. 2 has a submerged filter 65 suspended at the lower end of the receiving part 6, and This is to remove the developer scum floating upwards together with the overflowing developer, and at the same time prevent the developer scum from diffusing into the developer tank 5.

In the system shown in FIG. 3, the developer tank 5 is partitioned, one of which is used as an auxiliary tank, and a submerged filter 65 is arranged, and the developer residue is transferred to the auxiliary tank along with the processing liquid overflowing from the main tank. This is to remove development residue.

In the filter shown in FIG. 4, a submerged filter 65 is attached to the lower end of the receiving portion 6, and is constructed so that it can be easily replaced by opening the lid as shown.

Note that the present invention is not limited to the developer tank, but may be applied to a processing liquid tank for a subsequent process.

[0021]

According to the waterless PS plate processing apparatus of the present invention, the developer residue such as silicone rubber mixed in the developer collected in the tank after the processing process or the processing solution in the subsequent process is removed from the developer tank 5. Since it is separated by the filter 65 provided in the developer tank 5 and does not reach the subsequent circulation path, it is useful for preventing dirt on the developer tank 5 itself and preventing clogging of the filter 61 in the circulation system, which solves the above-mentioned problem. be done.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram showing the entire waterless PS plate processing apparatus.

FIG. 2 is a schematic diagram showing another embodiment.

FIG. 3 is a schematic diagram showing another embodiment.

FIG. 4 is a schematic diagram showing another embodiment.

[Explanation of symbols]

1 Waterless PS version 3 Conveyance roller 5 Developer tank 6 Receiving part 7 Pump 21　Brush roller 22 Brush roller 23 Brush roller 51 Shower nozzle 61 Filter 65 Submerged filter

Claims (1)

[Claims] Claim 1: In a waterless lithographic printing plate processing apparatus in which the processed developer is collected in a processing solution tank and further supplied to a processing section for circulation use, a filter is disposed in the processing solution tank. A processing apparatus for waterless planographic printing plates, characterized in that, after the processing is completed, the development residues, such as silicone rubber, are separated from the processing solution in which the development residues are mixed.