JPH04225357A - Projection type exposure device - Google Patents

Projection type exposure device

Info

Publication number
JPH04225357A
JPH04225357A JP2408093A JP40809390A JPH04225357A JP H04225357 A JPH04225357 A JP H04225357A JP 2408093 A JP2408093 A JP 2408093A JP 40809390 A JP40809390 A JP 40809390A JP H04225357 A JPH04225357 A JP H04225357A
Authority
JP
Japan
Prior art keywords
11b
reticle
lens groups
groups 11a
focus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2408093A
Other versions
JP3049774B2 (en
Inventor
Naomasa Shiraishi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2408093A priority Critical patent/JP3049774B2/en
Priority claimed from DE69132120A external-priority patent/DE69132120D1/en
Publication of JPH04225357A publication Critical patent/JPH04225357A/en
Priority claimed from US08/376,676 external-priority patent/US7656504B1/en
Priority claimed from US08/488,409 external-priority patent/US6252647B1/en
Publication of JP3049774B2 publication Critical patent/JP3049774B2/en
Application granted granted Critical
Priority claimed from US10/202,007 external-priority patent/US6710855B2/en
Priority claimed from US10/759,603 external-priority patent/US6897942B2/en
Priority claimed from US10/759,604 external-priority patent/US6885433B2/en
Priority claimed from US10/759,598 external-priority patent/US6967710B2/en
Anticipated expiration legal-status Critical
Application status is Expired - Lifetime legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70325Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lens
    • G03F7/70333Focus drilling, e.g. FLEX
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Abstract

PURPOSE: To enhance resolution and depth of focus at the time of projecting and exposing a circuit pattern, etc.
CONSTITUTION: A reticle 16 is irradiated with an illuminating luminous flux from a light source 1 through plural fly-eye lens groups 11A and 11B separating from each other, and then, the image of a reticle pattern 17 is formed and projected on a wafer (photosensitive substrate) 20 by a projecting optical system 18. Each outgoing end side 11b of the lens groups 11A and 11B is conjugated with the pupil 19 of the projecting optical system 18, respective lens groups 11A and 11B are held in one body at a discretizing position decentering from an optical axis AX by the amount which is decided in accordance with the periodicity of the reticle pattern 17. High resolution and the great depth of focus can be attained, and also, the uniformity of illuminance distribution on the reticle can be maintained in a good state.
COPYRIGHT: (C)1992,JPO&Japio
JP2408093A 1990-12-27 1990-12-27 Projection exposure apparatus and method, and device manufacturing method Expired - Lifetime JP3049774B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2408093A JP3049774B2 (en) 1990-12-27 1990-12-27 Projection exposure apparatus and method, and device manufacturing method

Applications Claiming Priority (16)

Application Number Priority Date Filing Date Title
JP2408093A JP3049774B2 (en) 1990-12-27 1990-12-27 Projection exposure apparatus and method, and device manufacturing method
DE69132120A DE69132120D1 (en) 1990-11-15 1991-11-15 Method and apparatus for projection exposure
EP99203179A EP0967524A3 (en) 1990-11-15 1991-11-15 Projection exposure method and apparatus
DE69132120T DE69132120T2 (en) 1990-11-15 1991-11-15 Method and apparatus for projection exposure
EP91310550A EP0486316B1 (en) 1990-11-15 1991-11-15 Projection exposure method and apparatus
US08/376,676 US7656504B1 (en) 1990-08-21 1995-01-20 Projection exposure apparatus with luminous flux distribution
US08/472,930 US6211944B1 (en) 1990-08-21 1995-06-07 Projection exposure method and apparatus
US08/488,409 US6252647B1 (en) 1990-11-15 1995-06-07 Projection exposure apparatus
US09/960,952 US20020033936A1 (en) 1990-11-15 2001-09-25 Projection exposure method and apparatus
US10/073,937 US6704092B2 (en) 1990-11-15 2002-02-14 Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane
US10/195,421 US6665050B2 (en) 1990-11-15 2002-07-16 Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis
US10/202,007 US6710855B2 (en) 1990-11-15 2002-07-25 Projection exposure apparatus and method
US10/679,151 US20040080733A1 (en) 1990-08-21 2003-10-06 Projection exposure method with luminous flux distribution
US10/759,603 US6897942B2 (en) 1990-11-15 2004-01-20 Projection exposure apparatus and method
US10/759,604 US6885433B2 (en) 1990-11-15 2004-01-20 Projection exposure apparatus and method
US10/759,598 US6967710B2 (en) 1990-11-15 2004-01-20 Projection exposure apparatus and method

Publications (2)

Publication Number Publication Date
JPH04225357A true JPH04225357A (en) 1992-08-14
JP3049774B2 JP3049774B2 (en) 2000-06-05

Family

ID=18517589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2408093A Expired - Lifetime JP3049774B2 (en) 1990-12-27 1990-12-27 Projection exposure apparatus and method, and device manufacturing method

Country Status (1)

Country Link
JP (1) JP3049774B2 (en)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5633101A (en) * 1993-09-14 1997-05-27 Nikon Corporation Mask and projection exposure method
US5640284A (en) * 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus
US5695274A (en) * 1994-03-23 1997-12-09 Olympus Optical Co., Ltd. Illuminating optical system for use in projecting exposure device
US6084655A (en) * 1991-02-22 2000-07-04 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
US6151102A (en) * 1996-04-09 2000-11-21 Nikon Corporation Projection exposure apparatus
WO2005041277A1 (en) 2003-10-28 2005-05-06 Nikon Corporation Lighting optical device and projection aligner
JP2005166871A (en) * 2003-12-02 2005-06-23 Nikon Corp Illumination optical device, projection aligner, exposure method and device manufacturing method
JP2010153878A (en) * 2010-01-14 2010-07-08 Nikon Corp Polarization conversion member, lighting optical device, projection exposure device, exposing method, and method of manufacturing device
JP2010157743A (en) * 2010-01-14 2010-07-15 Nikon Corp Illumination optical apparatus, projection aligner, exposure method, and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8861084B2 (en) 2004-01-16 2014-10-14 Carl Zeiss Smt Ag Polarization-modulating optical element
JP2015515140A (en) * 2012-04-16 2015-05-21 カール・ツァイス・エスエムティー・ゲーエムベーハー Optical system of microlithography projection exposure apparatus
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9581911B2 (en) 2004-01-16 2017-02-28 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
DE102017201244A1 (en) 2016-01-27 2017-07-27 Disco Corporation Exposure device
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6084655A (en) * 1991-02-22 2000-07-04 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
US5640284A (en) * 1992-09-11 1997-06-17 Nikon Corporation Optical reflector, illumination optical system, light source system and illumination optical apparatus
US5633101A (en) * 1993-09-14 1997-05-27 Nikon Corporation Mask and projection exposure method
US5695274A (en) * 1994-03-23 1997-12-09 Olympus Optical Co., Ltd. Illuminating optical system for use in projecting exposure device
US6095667A (en) * 1994-03-23 2000-08-01 Olympus Optical Co., Ltd. Illuminating optical system for use in projecting exposure device
US6151102A (en) * 1996-04-09 2000-11-21 Nikon Corporation Projection exposure apparatus
US6654097B1 (en) 1996-04-09 2003-11-25 Nikon Corporation Projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
EP3229076A2 (en) 2003-10-28 2017-10-11 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
WO2005041277A1 (en) 2003-10-28 2005-05-06 Nikon Corporation Lighting optical device and projection aligner
EP2645407A2 (en) 2003-10-28 2013-10-02 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
EP2645406A2 (en) 2003-10-28 2013-10-02 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
EP2645405A2 (en) 2003-10-28 2013-10-02 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
EP2654073A2 (en) 2003-10-28 2013-10-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
EP2927935A2 (en) 2003-10-28 2015-10-07 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
JP2005166871A (en) * 2003-12-02 2005-06-23 Nikon Corp Illumination optical device, projection aligner, exposure method and device manufacturing method
US9316772B2 (en) 2004-01-16 2016-04-19 Carl Zeiss Smt Gmbh Producing polarization-modulating optical element for microlithography system
US9581911B2 (en) 2004-01-16 2017-02-28 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8861084B2 (en) 2004-01-16 2014-10-14 Carl Zeiss Smt Ag Polarization-modulating optical element
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2010153878A (en) * 2010-01-14 2010-07-08 Nikon Corp Polarization conversion member, lighting optical device, projection exposure device, exposing method, and method of manufacturing device
JP2010157743A (en) * 2010-01-14 2010-07-15 Nikon Corp Illumination optical apparatus, projection aligner, exposure method, and device manufacturing method
JP4553066B2 (en) * 2010-01-14 2010-09-29 株式会社ニコン Polarization conversion member, illumination optical apparatus, projection exposure apparatus, exposure method, and device manufacturing method
US9817317B2 (en) 2012-04-16 2017-11-14 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus
JP2015515140A (en) * 2012-04-16 2015-05-21 カール・ツァイス・エスエムティー・ゲーエムベーハー Optical system of microlithography projection exposure apparatus
DE102017201244A1 (en) 2016-01-27 2017-07-27 Disco Corporation Exposure device

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