JPH04219645A - Optical disk - Google Patents
Optical diskInfo
- Publication number
- JPH04219645A JPH04219645A JP7978391A JP7978391A JPH04219645A JP H04219645 A JPH04219645 A JP H04219645A JP 7978391 A JP7978391 A JP 7978391A JP 7978391 A JP7978391 A JP 7978391A JP H04219645 A JPH04219645 A JP H04219645A
- Authority
- JP
- Japan
- Prior art keywords
- film
- recording
- damage
- moisture absorption
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 21
- 238000010521 absorption reaction Methods 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 230000001681 protective effect Effects 0.000 claims abstract description 25
- 229920003023 plastic Polymers 0.000 claims abstract description 20
- 230000002265 prevention Effects 0.000 claims description 33
- 230000003449 preventive effect Effects 0.000 claims description 8
- 230000007774 longterm Effects 0.000 abstract description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 17
- 239000010410 layer Substances 0.000 description 14
- 229910007277 Si3 N4 Inorganic materials 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 239000011241 protective layer Substances 0.000 description 9
- 229910052681 coesite Inorganic materials 0.000 description 6
- 229910052906 cristobalite Inorganic materials 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 229910052682 stishovite Inorganic materials 0.000 description 6
- 229910052905 tridymite Inorganic materials 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 102100032047 Alsin Human genes 0.000 description 2
- 101710187109 Alsin Proteins 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229910005091 Si3N Inorganic materials 0.000 description 1
- 229910003564 SiAlON Inorganic materials 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】この発明は、光によって情報を記
録再生する光ディスクに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical disc for recording and reproducing information using light.
【0002】0002
【従来の技術】図3は、例えば特開昭60−19796
4号公報、または特開平1−292639号公報に示さ
れる従来の光ディスクを示す断面図である。図において
、1は例えばポリカーボネートよりなるプラスチック基
板、2はSi3 N4 エンハンス層、3はTbFeC
o磁性層、4はSi3 N4 保護層である。5はエポ
キシ系の樹脂保護層、6は例えばSi3 N4 誘電体
膜であり、基板1の損傷および吸湿による反りを防止す
る膜である。2. Description of the Related Art FIG. 3 shows, for example,
4 is a sectional view showing a conventional optical disc disclosed in Japanese Patent Application Laid-Open No. 1-292639. In the figure, 1 is a plastic substrate made of polycarbonate, 2 is a Si3N4 enhancement layer, and 3 is a TbFeC
o magnetic layer, and 4 is a Si3 N4 protective layer. 5 is an epoxy resin protective layer, and 6 is, for example, a Si3 N4 dielectric film, which is a film that prevents damage to the substrate 1 and warping due to moisture absorption.
【0003】一般に、光ディスクの基板材料には、透明
プラスチック基板1が量産性に優れるのでよく用いられ
る。ところが、プラスチック基板1の場合、長期間湿度
の高い状態に置かれると基板1の加水分解により反りが
発生したり、周囲の環境が変化すると、一時的な基板の
吸湿過程により反ったりする。大きな反りが発生すると
、アクチュエーターのフォーカスサーボが安定に追従で
きなくなり、誤動作やエラーを生じるという問題があっ
た。また、傷つき易いという問題もあった。そこで、防
止膜6にて基板1の損傷および吸湿を防止していた。[0003] In general, a transparent plastic substrate 1 is often used as a substrate material for optical discs because it is excellent in mass production. However, in the case of the plastic substrate 1, if it is left in a humid state for a long period of time, it will warp due to hydrolysis of the substrate 1, or if the surrounding environment changes, it will warp due to a temporary moisture absorption process of the substrate. When large warpage occurs, the focus servo of the actuator cannot follow the focus stably, causing malfunctions and errors. There was also the problem that they were easily damaged. Therefore, the prevention film 6 was used to prevent damage and moisture absorption to the substrate 1.
【0004】0004
【発明が解決しようとする課題】しかしながら、長期的
にみた場合、プラスチック基板1の表面が基板内部の水
分により加水分解して変質したり、損傷および吸湿防止
膜6自体が劣化して剥離しやすいという問題点があった
。[Problems to be Solved by the Invention] However, in the long term, the surface of the plastic substrate 1 may be hydrolyzed by moisture inside the substrate and deteriorate, or the moisture absorption prevention film 6 itself may deteriorate and peel off easily. There was a problem.
【0005】この発明は、上記のような問題点を解消す
るためになされたものであり、損傷および吸湿防止膜6
の剥離を防止することで長期信頼性が得られる光ディス
クを提供することを目的とする。The present invention has been made to solve the above-mentioned problems, and provides a damage and moisture absorption prevention film 6.
The object of the present invention is to provide an optical disc that can obtain long-term reliability by preventing peeling of the disc.
【0006】[0006]
【課題を解決するための手段】本発明に係る光ディスク
は、透明プラスチック基板の一面に形成され光によって
情報を記録再生する記録膜、上記透明プラスチック基板
の上記記録膜と反対側の面に形成され上記基板の損傷お
よび吸湿を防止する膜、および上記防止膜を覆うように
形成される保護膜を備えたものである。[Means for Solving the Problems] An optical disc according to the present invention includes a recording film formed on one surface of a transparent plastic substrate for recording and reproducing information using light, and a recording film formed on the surface of the transparent plastic substrate opposite to the recording film. The device includes a film for preventing damage and moisture absorption of the substrate, and a protective film formed to cover the preventive film.
【0007】また、本発明のさらに別の発明に係る光デ
ィスクは、透明プラスチック基板の一面に形成され光に
よって情報を記録再生する記録膜、上記透明プラスチッ
ク基板の上記記録膜と反対側の面で記録再生に利用する
領域に相対する領域よりも広く形成され上記基板の損傷
および吸湿を防止する膜、並びに記録再生に利用しない
領域に相対する領域で上記防止膜の境界を被覆する保護
膜を備えたものである。[0007] An optical disc according to still another aspect of the present invention includes a recording film formed on one surface of a transparent plastic substrate for recording and reproducing information using light; A film that is formed to be wider than an area facing the area used for reproduction and prevents damage and moisture absorption to the substrate, and a protective film that covers the boundary of the preventive film in an area facing the area not used for recording and reproduction. It is something.
【0008】[0008]
【作用】この発明における光ディスクは、記録膜を形成
する面と反対側の基板表面に形成した損傷および吸湿防
止膜を覆うようにさらに保護膜を形成することにより、
長期使用においても、損傷および吸湿防止膜が剥離しな
い高信頼性光ディスクが得られる。[Operation] The optical disc of the present invention has the following advantages: by further forming a protective film to cover the damage and moisture absorption prevention film formed on the surface of the substrate opposite to the surface on which the recording film is formed,
A highly reliable optical disc with no damage or peeling of the moisture absorption prevention film even after long-term use can be obtained.
【0009】さらに、本発明の別の発明における光ディ
スクは、基板の損傷および吸湿を防止する膜を記録再生
に利用する領域に相対する領域よりも広く形成すると共
に、記録再生に利用しない領域に相対する領域で上記防
止膜の境界を被覆する保護膜を備えたので、特に剥離し
易い防止膜の境界を記録再生に影響のないように、保護
膜で保護することが可能である。Furthermore, in the optical disk according to another aspect of the present invention, the film for preventing substrate damage and moisture absorption is formed to be wider than the area opposite to the area used for recording and reproduction, and the film is formed to be wider than the area opposite to the area used for recording and reproduction. Since the protective film is provided to cover the boundary of the preventive film in the area where the protective film is removed, it is possible to protect the boundary of the preventive film, which is particularly likely to peel off, with the protective film so as not to affect recording and reproduction.
【0010】0010
【実施例】実施例1.以下、この発明の一実施例を図を
もとに説明する。図1はこの発明の一実施例による光デ
ィスクを示す断面図であり、図において、1は透明プラ
スチック基板、2はSi3 N4 エンハンス層、3は
TbFeCo磁性層、4はSi3 N4 保護層、5は
エポキシ系の樹脂保護層、6は例えばSi3 N4 誘
電体膜であり、基板1の損傷および吸湿防止膜、7は損
傷および吸湿防止膜6を覆うように形成された保護膜で
ある。[Example] Example 1. An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a cross-sectional view showing an optical disk according to an embodiment of the present invention. In the figure, 1 is a transparent plastic substrate, 2 is a Si3N4 enhancement layer, 3 is a TbFeCo magnetic layer, 4 is a Si3N4 protective layer, and 5 is an epoxy The system resin protective layer 6 is, for example, a Si3 N4 dielectric film, and is a damage and moisture absorption prevention film for the substrate 1, and 7 is a protective film formed to cover the damage and moisture absorption prevention film 6.
【0011】次に製造方法について説明する。透明プラ
スチック基板1の案内溝が形成された面に、Si3 N
4 エンハンス層2、TbFeCo磁性層3、Si3
N4 保護層4をこの順に、マグネトロンスパッタ法に
より成膜し、これらの層を覆うようにエポキシ系の樹脂
保護層5をスピンコートにより形成した。次に、記録膜
3と反対側の基板面の記録膜3が形成された領域より広
い領域に、Si3 N4 誘電体よりなる損傷および吸
湿防止膜6を2100オングストローム形成した。Next, the manufacturing method will be explained. Si3N is applied to the surface of the transparent plastic substrate 1 on which the guide groove is formed.
4 Enhancement layer 2, TbFeCo magnetic layer 3, Si3
A N4 protective layer 4 was formed in this order by magnetron sputtering, and an epoxy resin protective layer 5 was formed by spin coating to cover these layers. Next, a damage and moisture absorption prevention film 6 made of Si3N4 dielectric material was formed to a thickness of 2100 angstroms in an area wider than the area where the recording film 3 was formed on the opposite side of the substrate surface from the recording film 3.
【0012】このようにして得られた光ディスクについ
て、波長830nmのレーザー光にて、記録再生特性を
調べたところ、Si3 N4 誘電体よりなる損傷およ
び吸湿防止膜6が形成されていないディスクとほぼ同様
の記録再生特性が得られた。これは一般に表面反射率を
最小にする条件When the recording and reproducing characteristics of the thus obtained optical disc were examined using a laser beam with a wavelength of 830 nm, it was found that it was almost the same as a disc on which the damage and moisture absorption prevention film 6 made of the Si3N4 dielectric was not formed. Recording and reproducing characteristics were obtained. This is generally the condition that minimizes surface reflectance.
【0013】膜厚t=λ/2n×mFilm thickness t=λ/2n×m
【0014】(λ:波長、n:屈折率:m:整数)(λ: wavelength, n: refractive index, m: integer)
【0
015】の関係にてm=1とした場合に相当する。0
This corresponds to the case where m=1 in the relationship #015.
【0016】次に、Si3 N4 誘電体よりなる損傷
および吸湿防止膜6の全面を覆うように保護膜7として
紫外線硬化樹脂をスピンコートにより形成した後、紫外
線照射装置により硬化させた。Next, an ultraviolet curing resin was formed as a protective film 7 by spin coating so as to cover the entire surface of the damage and moisture absorption prevention film 6 made of Si3N4 dielectric, and then cured using an ultraviolet irradiation device.
【0017】なお、保護膜7としては屈折率が基板1に
用いたポリカーボネートと同等のものが好ましいが紫外
線硬化樹脂以外にもエポキシ樹脂などの熱硬化樹脂を用
いることもできる。The protective film 7 is preferably made of polycarbonate having a refractive index similar to that of the polycarbonate used for the substrate 1, but other than ultraviolet curable resins, thermosetting resins such as epoxy resins can also be used.
【0018】このディスクを、80℃90%RHに10
00時間投入したところ、Si3 N4 誘電体損傷お
よび吸湿防止膜6に剥離は見られず、良好な信頼性を示
した。[0018] This disk was heated at 80°C and 90%RH for 10 minutes.
After 00 hours of use, no damage to the Si3N4 dielectric or peeling of the moisture absorption prevention film 6 was observed, indicating good reliability.
【0019】実施例2.Si3 N4 誘電体損傷およ
び吸湿防止膜6の代わりに屈折率約1.6のAl2O3
膜2600オングストロームを用いた以外、実施例1
と同様にしたディスクを、80℃90%RHに1000
時間投入したところ、Al2 O3 膜6に剥離は見ら
れず、良好な信頼性を示した。Example 2. Si3 N4 Al2O3 with a refractive index of about 1.6 in place of the dielectric damage and moisture absorption prevention film 6
Example 1 except that a film of 2600 angstroms was used.
A disk prepared in the same manner as above was heated to 80℃ and 90%RH for 1000 minutes.
No peeling was observed in the Al2O3 film 6 during the test, indicating good reliability.
【0020】実施例3.Si3 N4 誘電体損傷およ
び吸湿防止膜6の代わりに屈折率約1.7のSiO膜2
500オングストロームを用いた以外、実施例1と同様
にしたディスクを、80℃90%RHに1000時間投
入したところ、SiO膜6に剥離は見られず、良好な信
頼性を示した。Example 3. Si3 N4 SiO film 2 with a refractive index of about 1.7 in place of the dielectric damage and moisture absorption prevention film 6
When a disk prepared in the same manner as in Example 1 except that a thickness of 500 angstroms was used was placed at 80° C. and 90% RH for 1000 hours, no peeling was observed in the SiO film 6, indicating good reliability.
【0021】実施例4.Si3 N4 誘電体損傷およ
び吸湿防止膜6の代わりに屈折率約1.5のSiO2
膜2800オングストロームを用いた以外、実施例1と
同様にしたディスクを、80℃90%RHに1000時
間投入したところ、SiO2 膜6に剥離は見られず、
良好な信頼性を示した。Example 4. Si3 N4 SiO2 with a refractive index of about 1.5 in place of the dielectric damage and moisture absorption prevention film 6
When a disk prepared in the same manner as in Example 1 except that a film of 2800 angstroms was used was placed at 80° C. and 90% RH for 1000 hours, no peeling was observed in the SiO2 film 6.
It showed good reliability.
【0022】実施例5.Si3 N4 誘電体損傷およ
び吸湿防止膜6の代わりに屈折率約1.6のSiON膜
2600オングストロームを用いた以外、実施例1と同
様にしたディスクを、80℃90%RHに1000時間
投入したところ、SiON膜6に剥離は見られず、良好
な信頼性を示した。Example 5. A disk prepared in the same manner as in Example 1 except that a 2600 angstrom SiON film with a refractive index of about 1.6 was used in place of the dielectric damage and moisture absorption prevention film 6 was placed at 80° C. and 90% RH for 1000 hours. No peeling was observed in the SiON film 6, indicating good reliability.
【0023】実施例6.Si3 N4 誘電体損傷およ
び吸湿防止膜6の代わりに屈折率約2.1のTa2O5
膜2000オングストロームを用いた以外、実施例1
と同様にしたディスクを、80℃90%RHに1000
時間投入したところ、Ta2 O5 膜に剥離は見られ
ず、良好な信頼性を示した。Example 6. Si3 N4 Ta2O5 with a refractive index of about 2.1 in place of the dielectric damage and moisture absorption prevention film 6
Example 1 except that a film of 2000 angstroms was used.
A disk prepared in the same manner as above was heated to 80℃ and 90%RH for 1000 minutes.
No peeling was observed in the Ta2O5 film over time, indicating good reliability.
【0024】実施例7.Si3 N4 誘電体損傷およ
び吸湿防止膜6の代わりに屈折率約1.8のAlN膜2
300オングストロームを用いた以外、実施例1と同様
にしたディスクを、80℃90%RHに1000時間投
入したところ、AlN膜6に剥離は見られず、良好な信
頼性を示した。Example 7. Si3 N4 AlN film 2 with a refractive index of about 1.8 in place of the dielectric damage and moisture absorption prevention film 6
When a disk made in the same manner as in Example 1 except that 300 angstroms was used was placed at 80° C. and 90% RH for 1000 hours, no peeling was observed in the AlN film 6, indicating good reliability.
【0025】実施例8.Si3 N4 誘電体損傷およ
び吸湿防止膜6の代わりに屈折率約2.1のAlSiN
膜2000オングストロームを用いた以外、実施例1と
同様にしたディスクを、80℃90%RHに1000時
間投入したところ、AlSiN膜6に剥離は見られず、
良好な信頼性を示した。Example 8. Si3 N4 AlSiN with a refractive index of about 2.1 in place of the dielectric damage and moisture absorption prevention film 6
When a disk made in the same manner as in Example 1 except that a film of 2000 angstroms was used was placed at 80° C. and 90% RH for 1000 hours, no peeling was observed in the AlSiN film 6.
It showed good reliability.
【0026】実施例9.Si3 N4 誘電体損傷およ
び吸湿防止膜6の代わりに屈折率約2.0のSiAlO
N膜2100オングストロームを用いた以外、実施例1
と同様にしたディスクを、80℃90%RHに1000
時間投入したところ、SiAlON膜6に剥離は見られ
ず、良好な信頼性を示した。Example 9. Si3 N4 SiAlO with a refractive index of about 2.0 in place of the dielectric damage and moisture absorption prevention film 6
Example 1 except that an N film of 2100 angstroms was used.
A disk prepared in the same manner as above was heated to 80℃ and 90%RH for 1000 minutes.
No peeling was observed in the SiAlON film 6 over time, indicating good reliability.
【0027】実施例10.Si3 N4 誘電体損傷お
よび吸湿防止膜6の代わりに屈折率約2.3のZnS膜
1800オングストロームを用いた以外、実施例1と同
様にしたディスクを、80℃90%RHに1000時間
投入したところ、ZnS膜6に剥離は見られず、良好な
信頼性を示した。Example 10. A disk prepared in the same manner as in Example 1 except that a 1800 angstrom ZnS film with a refractive index of about 2.3 was used instead of the Si3N4 dielectric damage and moisture absorption prevention film 6 was placed at 80° C. and 90% RH for 1000 hours. No peeling was observed in the ZnS film 6, indicating good reliability.
【0028】実施例11.Si3 N4 誘電体損傷お
よび吸湿防止膜6の代わりに屈折率約2.0のZnSー
SiO2 膜2100オングストロームを用いた以外、
実施例1と同様にしたディスクを、80℃90%RHに
1000時間投入したところ、ZnSーSiO2膜6に
剥離は見られず、良好な信頼性を示した。Example 11. Except that a 2100 angstrom ZnS-SiO2 film with a refractive index of about 2.0 was used instead of the Si3N4 dielectric damage and moisture absorption prevention film 6.
When a disk prepared in the same manner as in Example 1 was placed at 80° C. and 90% RH for 1000 hours, no peeling was observed in the ZnS-SiO2 film 6, indicating good reliability.
【0029】実施例12.Si3 N4 誘電体損傷お
よび吸湿防止膜6の代わりに屈折率約2.0のZnSe
ーSiO2 膜2100オングストロームを用いた以外
、実施例1と同様にしたディスクを、80℃90%RH
に1000時間投入したところ、ZnSeーSiO2
膜6に剥離は見られず、良好な信頼性を示した。Example 12. Si3 N4 ZnSe with a refractive index of about 2.0 is used instead of the dielectric damage and moisture absorption prevention film 6.
-A disk made in the same manner as in Example 1 except that a SiO2 film of 2100 angstroms was used was heated at 80°C and 90%RH.
When it was put in for 1000 hours, ZnSe-SiO2
No peeling was observed in the film 6, indicating good reliability.
【0030】実施例13.Si3 N4 誘電体損傷お
よび吸湿防止膜6の代わりに屈折率約2.1のAlGe
N膜2000オングストロームを用いた以外、実施例1
と同様にしたディスクを、80℃90%RHに1000
時間投入したところ、AlGeN膜6に剥離は見られず
、良好な信頼性を示した。Example 13. Si3 N4 AlGe with a refractive index of about 2.1 in place of the dielectric damage and moisture absorption prevention film 6
Example 1 except that an N film of 2000 angstroms was used.
A disk prepared in the same manner as above was heated to 80℃ and 90%RH for 1000 minutes.
No peeling was observed in the AlGeN film 6 over time, indicating good reliability.
【0031】なお、上記実施例ではTbFeCo磁性層
3の両側にSi3N4 エンハンス層2とSi3 N4
保護層4が設けられている場合について説明したが、
磁性層のみの場合にも上記実施例と同様の効果が得られ
るのは明白である。In the above embodiment, the Si3N4 enhancement layer 2 and the Si3N4 enhancement layer 2 are provided on both sides of the TbFeCo magnetic layer 3.
Although the case where the protective layer 4 is provided has been explained,
It is obvious that the same effects as in the above embodiment can be obtained even in the case of only a magnetic layer.
【0032】実施例14.図2はこの発明の他の実施例
による光ディスクの片側断面を示している。この例では
、防止膜6は基板1の記録膜3と反対側の面で記録再生
に利用する領域に相対する領域よりも広く形成されてお
り、保護膜7は記録再生に利用しない領域に相対する領
域で防止膜6の境界を被覆するように形成されている。
このため、特に剥離し易い防止膜6の境界を記録再生に
影響のないように、保護膜7で保護することが可能であ
る。Example 14. FIG. 2 shows a half cross section of an optical disc according to another embodiment of the invention. In this example, the preventive film 6 is formed wider on the surface of the substrate 1 opposite to the recording film 3 than the area facing the area used for recording/reproduction, and the protective film 7 is formed opposite the area not used for recording/reproduction. It is formed so as to cover the boundary of the preventive film 6 in the area where the protective film 6 is formed. Therefore, it is possible to protect the boundary of the prevention film 6, which is particularly susceptible to peeling, with the protective film 7 so as not to affect recording and reproduction.
【0033】次に製造方法について説明する。まず、直
径90mmの透明プラスチック基板1の案内溝が形成さ
れた面に、Si3 N4 エンハンス層2、TbFeC
o磁性層3、およびSi3 N4 保護層4をこの順に
、マグネトロンスパッタ法により、半径18mm〜43
mmの領域に成膜し、これらの層を覆うようにエポキシ
系の樹脂保護層5をスピンコートにより形成した。この
うち、情報の記録再生に利用する領域は半径23mm〜
40mmである。次に、記録膜3と反対側の基板面の半
径18mm〜43mmの領域に、Si3 N4 誘電体
よりなる損傷および吸湿防止膜6を2100オングスト
ローム形成した。Next, the manufacturing method will be explained. First, a Si3N4 enhancement layer 2, a TbFeC
o The magnetic layer 3 and the Si3N4 protective layer 4 are sputtered in this order with a radius of 18 mm to 43 mm by magnetron sputtering.
Films were formed in an area of 1.0 mm, and an epoxy resin protective layer 5 was formed by spin coating to cover these layers. Of these, the area used for recording and reproducing information has a radius of 23 mm ~
It is 40mm. Next, a damage and moisture absorption prevention film 6 made of Si3N4 dielectric material was formed to a thickness of 2100 angstroms in an area with a radius of 18 mm to 43 mm on the substrate surface on the side opposite to the recording film 3.
【0034】このようにして得られた光ディスクについ
て、波長830nmのレーザー光にて、記録再生特性を
調べたところ、Si3 N4 誘電体よりなる損傷およ
び吸湿防止膜6が形成されていないディスクとほぼ同様
の記録再生特性が得られた。これは一般に表面反射率を
最小にする条件When the recording and reproducing characteristics of the thus obtained optical disc were examined using a laser beam with a wavelength of 830 nm, it was found that it was almost the same as a disc on which the damage and moisture absorption prevention film 6 made of Si3N4 dielectric was not formed. Recording and reproducing characteristics were obtained. This is generally the condition that minimizes surface reflectance.
【0035】膜厚t=λ/2n×mFilm thickness t=λ/2n×m
【0036】(λ:波長、n:屈折率:m:整数)(λ: wavelength, n: refractive index, m: integer)
【0
037】の関係にてm=1とした場合に相当する。0
This corresponds to the case where m=1 in the relationship:
【0038】次に、Si3 N4 誘電体よりなる損傷
および吸湿防止膜6の境界を被覆するように半径15m
m〜22mmと41mm〜44mmの円環状に、あらか
じめこの形に切り抜いた圧着性接着剤のついたフィルム
をはりつけ保護膜7とした。Next, a radius of 15 m was formed so as to cover the boundary of the damage and moisture absorption prevention film 6 made of Si3N4 dielectric.
A protective film 7 was obtained by gluing a film coated with a pressure-adhesive adhesive, cut out in advance into annular shapes of m to 22 mm and 41 mm to 44 mm.
【0039】このディスクを、80℃90%RHに10
00時間投入したところ、Si3 N4 誘電体よりな
る損傷および吸湿防止膜6に剥離は見られず、良好な信
頼性を示した。[0039] This disc was heated at 80°C and 90%RH for 10 minutes.
After 00 hours of use, no damage or peeling of the moisture absorption prevention film 6 made of the Si3N4 dielectric was observed, indicating good reliability.
【0040】[0040]
【発明の効果】以上のように、本発明によれば、透明プ
ラスチック基板の一面に形成され光によって情報を記録
再生する記録膜、上記透明プラスチック基板の上記記録
膜と反対側の面に形成され上記基板の反りを防止する膜
、および上記損傷および吸湿防止膜を覆うように形成さ
れた保護膜を備えたので、上記損傷および吸湿防止膜の
剥離を防止することで長期信頼性が得られる効果がある
。As described above, according to the present invention, there is a recording film formed on one surface of a transparent plastic substrate for recording and reproducing information using light, and a recording film formed on the surface of the transparent plastic substrate opposite to the recording film. Equipped with a film that prevents warping of the substrate and a protective film formed to cover the damage and moisture absorption prevention film, the effect is that long-term reliability can be achieved by preventing the damage and moisture absorption prevention film from peeling off. There is.
【0041】また、本発明の別の発明によれば、透明プ
ラスチック基板の一面に形成され光によって情報を記録
再生する記録膜、上記透明プラスチック基板の上記記録
膜と反対側の面で記録再生に利用する領域に相対する領
域よりも広く形成され上記基板の損傷および吸湿を防止
する膜、並びに上記記録再生に利用しない領域に相対す
る領域で上記防止膜の境界を被覆する保護膜を備えたの
で、特に剥離し易い防止膜の境界を記録再生に影響のな
いように、保護膜で保護することが可能となる。According to another aspect of the present invention, there is provided a recording film formed on one surface of the transparent plastic substrate for recording and reproducing information using light; and a recording film formed on one surface of the transparent plastic substrate for recording and reproducing information using light; A film that is formed to be wider than an area facing the area to be used and prevents damage and moisture absorption to the substrate, and a protective film that covers the boundary of the preventive film in an area facing the area not to be used for recording and reproduction. In particular, it becomes possible to protect the boundary of the prevention film, which is easily peeled off, with a protective film so as not to affect recording and reproduction.
【図面の簡単な説明】[Brief explanation of the drawing]
【図1】この発明の一実施例による光ディスクを示す断
面図である。FIG. 1 is a sectional view showing an optical disc according to an embodiment of the present invention.
【図2】この発明の他の実施例による光ディスクを示す
断面図である。FIG. 2 is a sectional view showing an optical disc according to another embodiment of the invention.
【図3】従来の光ディスクを示す断面図である。FIG. 3 is a sectional view showing a conventional optical disc.
1 透明プラスチック基板 3 記録膜 6 損傷および吸湿防止膜 7 保護膜 1 Transparent plastic substrate 3 Recording film 6 Damage and moisture absorption prevention film 7 Protective film
Claims (2)
れ光によって情報を記録再生する記録膜、上記透明プラ
スチック基板の上記記録膜と反対側の面に形成され上記
基板の損傷および吸湿を防止する膜、並びに上記防止膜
を覆うように形成される保護膜を備えた光ディスク。1. A recording film formed on one surface of a transparent plastic substrate for recording and reproducing information using light; a film formed on a surface of the transparent plastic substrate opposite to the recording film for preventing damage and moisture absorption to the substrate; and an optical disc comprising a protective film formed to cover the above-mentioned prevention film.
れ光によって情報を記録再生する記録膜、上記透明プラ
スチック基板の上記記録膜と反対側の面で記録再生に利
用する領域に相対する領域よりも広く形成され上記基板
の損傷および吸湿を防止する膜、並びに記録再生に利用
しない領域に相対する領域で上記防止膜の境界を被覆す
る保護膜を備えた光ディスク。2. A recording film formed on one surface of a transparent plastic substrate for recording and reproducing information using light, the area being wider than the area facing the area used for recording and reproducing on the surface of the transparent plastic substrate opposite to the recording film. An optical disc comprising a film formed to prevent damage and moisture absorption on the substrate, and a protective film covering the boundary of the preventive film in an area opposite to an area not used for recording and reproduction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7978391A JPH04219645A (en) | 1990-08-29 | 1991-04-12 | Optical disk |
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2-231974 | 1990-08-29 | ||
JP23197490 | 1990-08-29 | ||
JP2-245020 | 1990-09-13 | ||
JP24502090 | 1990-09-13 | ||
JP2-315182 | 1990-11-19 | ||
JP31518290 | 1990-11-19 | ||
JP7978391A JPH04219645A (en) | 1990-08-29 | 1991-04-12 | Optical disk |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04219645A true JPH04219645A (en) | 1992-08-10 |
Family
ID=27466353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7978391A Pending JPH04219645A (en) | 1990-08-29 | 1991-04-12 | Optical disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04219645A (en) |
-
1991
- 1991-04-12 JP JP7978391A patent/JPH04219645A/en active Pending
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