JPH04219189A - Treating equipment and treatment for treated waste liquid of nonsilver salt photosensitive material - Google Patents
Treating equipment and treatment for treated waste liquid of nonsilver salt photosensitive materialInfo
- Publication number
- JPH04219189A JPH04219189A JP40376490A JP40376490A JPH04219189A JP H04219189 A JPH04219189 A JP H04219189A JP 40376490 A JP40376490 A JP 40376490A JP 40376490 A JP40376490 A JP 40376490A JP H04219189 A JPH04219189 A JP H04219189A
- Authority
- JP
- Japan
- Prior art keywords
- waste liquid
- liquid
- treated waste
- processing
- liquid level
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 147
- 239000002699 waste material Substances 0.000 title claims abstract description 75
- 239000000463 material Substances 0.000 title claims abstract description 16
- 150000003839 salts Chemical class 0.000 title abstract 3
- 238000010438 heat treatment Methods 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 12
- 238000001816 cooling Methods 0.000 claims abstract description 6
- 238000012545 processing Methods 0.000 claims description 60
- 238000001704 evaporation Methods 0.000 claims description 33
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 11
- 239000012141 concentrate Substances 0.000 abstract description 5
- 230000008020 evaporation Effects 0.000 description 22
- 238000011084 recovery Methods 0.000 description 17
- 239000010802 sludge Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 230000005856 abnormality Effects 0.000 description 6
- 239000007787 solid Substances 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 3
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 230000004397 blinking Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は感光性物質として非銀塩
を使用した感光材料の現像処理に伴なって生じる廃液(
以下「処理廃液」という)の処理装置に関し、さらに詳
しくは、処理廃液を加熱濃縮して固形分と水とに分離す
る処理に用いる装置及び方法に関する。[Industrial Application Field] The present invention relates to waste liquid (
The present invention relates to a processing apparatus for processing waste liquid (hereinafter referred to as "processed waste liquid"), and more specifically relates to an apparatus and method used to heat and concentrate the processed waste liquid and separate it into solid content and water.
【0002】0002
【従来の技術】従来、非銀塩感光材料、例えば感光性成
分としてジアゾ化合物、o−キノンジアジド等を使用し
た感光層を支持体上に設けた感光性平版印刷版の処理廃
液の処理方法は、処理廃液を廃液処理業者に引き取って
もらうか、多額の費用をかけて廃液処理施設を作って処
理する方法しかなく、処理廃液の処理の作業性及びコス
トに問題がある。BACKGROUND ART Conventionally, methods for treating waste liquid from processing of photosensitive lithographic printing plates in which a photosensitive layer using a non-silver salt photosensitive material such as a diazo compound, o-quinone diazide, etc. as a photosensitive component is provided on a support are as follows: The only methods available are to have a waste liquid treatment company take over the treated waste liquid or to spend a large amount of money to build a waste liquid treatment facility and process it, which poses problems in the workability and cost of processing the treated waste liquid.
【0003】このような問題の改良を目的として、処理
廃液を蒸発釜内で加熱濃縮して水と固形分(スラッジ)
に分離する方法が幾つか提案されているが、これらの処
理工程を自動的に行う制御手段は未だ知られていない。[0003] In order to improve this problem, the treated waste liquid is heated and concentrated in an evaporator to remove water and solids (sludge).
Although several methods have been proposed for separating the two, there is still no known control means for automatically performing these processing steps.
【0004】0004
【発明の目的】本発明の目的は、第1に、非銀塩感光材
料の廃液処理を加熱濃縮釜で加熱し水と固形分とに分離
する技術において、長期間の稼働を安定に行い得る技術
を提供することであり、第2に、上記処理廃液の処理作
業の作業性が改善された処理技術を提供することである
。OBJECTS OF THE INVENTION The first object of the present invention is to provide a technology for treating waste liquid of non-silver salt photosensitive materials by heating it in a heating concentrator and separating it into water and solids, which can be operated stably for a long period of time. The second object is to provide a processing technology that improves the workability of processing the above-mentioned treated waste liquid.
【0005】[0005]
【発明の構成】本発明の上記目的は、下記(1)の処理
装置及び下記(2)の処理方法によって達成される。DESCRIPTION OF THE INVENTION The above objects of the present invention are achieved by the following processing apparatus (1) and the following processing method (2).
【0006】(1)非銀塩感光材料の処理廃液を減圧条
件下で加熱して蒸発濃縮せしめる手段、これによって生
じた蒸気を冷却凝縮する手段、及びこの凝縮液を溜める
手段を備えた非銀塩感光材料の処理廃液の処理装置にお
いて、該処理装置の稼働開始時及び稼働終了時の動作が
自動的に行われる制御手段を有することを特徴とする非
銀塩感光材料の処理廃液の処理装置。(1) A non-silver photosensitive material equipped with means for heating and evaporating and concentrating the processing waste liquid of non-silver salt photosensitive materials under reduced pressure conditions, means for cooling and condensing the resulting vapor, and means for storing the condensed liquid. A processing apparatus for processing waste liquid of non-silver salt photosensitive materials, characterized in that the processing apparatus includes a control means for automatically performing operations at the start and end of operation of the processing apparatus. .
【0007】(2)上記(1)に記載の処理装置を用い
、該処理装置の稼動開始時から稼動終了時までの操作を
自動的に行うことを特徴とする非銀塩感光材料の処理廃
液の処理方法。(2) Processing waste liquid for non-silver salt photosensitive materials, characterized in that the processing apparatus described in (1) above is used, and the operations of the processing apparatus are automatically performed from the start of operation to the end of operation. processing method.
【0008】以下、図面に基づき本発明を説明する。The present invention will be explained below based on the drawings.
【0009】第1図は本発明に係る処理装置の実施例を
示す構成図である。本図において、1は処理装置(図示
せず)から排出された処理廃液を入れる処理廃液タンク
、2は処理廃液タンク1内の処理廃液の液面を検出する
液面センサで、液面の低下を検知し、図示しない制御機
構により処理廃液を補充するか、警報装置を作動させる
か、処理装置の稼働を停止するようになっている。3は
処理廃液を加熱して水分等を蒸発させ濃縮する蒸発釜、
4は処理廃液タンク1内の処理廃液を蒸発釜3へ送る配
管、5は配管4の途中に設けた処理廃液中の分散物を取
り除くためのフィルタ、6は電磁弁、7は処理廃液を加
熱するための通電により発熱する加熱部材で、蒸発釜3
の上部から懸下されたラセン状の発熱部を有している。
10は蒸発釜3内の処理廃液の液面を検出する液面検出
部で、蒸発釜3の側壁外に連通管11を設け、この連通
管11に液面センサ12が内設されている。液面センサ
12により検知された液面の検知信号は図示しない制御
機構に入力され、図示しないタイマにより任意のタイム
ラグを設けて電磁弁6の開閉を制御し、処理廃液タンク
1から蒸発釜3への処理廃液の流入を制御し、蒸発釜3
内の液面レベルが一定範囲に保たれるようになっている
。FIG. 1 is a block diagram showing an embodiment of a processing apparatus according to the present invention. In this figure, 1 is a processing waste liquid tank that holds the processing waste liquid discharged from the processing equipment (not shown), and 2 is a liquid level sensor that detects the liquid level of the processing waste liquid in the processing waste liquid tank 1. is detected, and a control mechanism (not shown) replenishes the processing waste liquid, activates an alarm device, or stops the operation of the processing device. 3 is an evaporation pot that heats the treated waste liquid to evaporate and concentrate water, etc.;
4 is a pipe that sends the treated waste liquid in the treated waste liquid tank 1 to the evaporator 3; 5 is a filter installed in the middle of the pipe 4 to remove dispersion in the treated waste liquid; 6 is a solenoid valve; and 7 is a heating unit for heating the treated waste liquid. A heating member that generates heat when energized to
It has a helical heating section suspended from the top. Reference numeral 10 denotes a liquid level detection unit for detecting the liquid level of the treated waste liquid in the evaporation pot 3. A communication pipe 11 is provided outside the side wall of the evaporation pot 3, and a liquid level sensor 12 is installed inside the communication pipe 11. The liquid level detection signal detected by the liquid level sensor 12 is input to a control mechanism (not shown), and a timer (not shown) controls the opening and closing of the solenoid valve 6 with an arbitrary time lag, and the liquid is transferred from the treated waste liquid tank 1 to the evaporation pot 3. The inflow of the treated waste liquid is controlled, and the evaporation pot 3
The liquid level inside is maintained within a certain range.
【0010】15は蒸発釜3内の処理廃液から蒸発した
蒸気を冷却し凝縮させる空冷器、16は空冷器15を冷
却するためのファンである。18は蒸発釜3内で処理廃
液が加熱濃縮されて生じた濃縮物(スラッジ)を入れる
スラッジ回収タンク、19は蒸発釜3とスラッジ回収タ
ンク18の間の管路に設けられたスラッジ排出弁(好ま
しくはバタフライ弁である)、20は蒸発釜3内で突沸
が起った時に蒸発釜3内の処理廃液をスラッジ回収タン
ク18へ逃がすための配管、21は配管20の途中に設
けた電磁弁である。Reference numeral 15 is an air cooler for cooling and condensing the vapor evaporated from the treated waste liquid in the evaporator 3, and 16 is a fan for cooling the air cooler 15. Reference numeral 18 denotes a sludge recovery tank for storing the concentrate (sludge) produced by heating and concentrating the treated waste liquid in the evaporator 3, and 19 a sludge discharge valve ( (preferably a butterfly valve); 20 is a pipe for releasing the treated waste liquid in the evaporator 3 to the sludge recovery tank 18 when bumping occurs in the evaporator 3; 21 is a solenoid valve provided in the middle of the pipe 20; It is.
【0011】蒸発釜3において、23は蒸発釜3から空
冷器15へ蒸気を送る管路内の流体の流れを良くして該
管路の詰まりを無くするため蒸発釜3内に空気を流入さ
せるための空気吸入口、24は空気吸入口23からの空
気の吸入量を調節したり必要により遮断するための電磁
弁、25、26は蒸発釜3内の液面を検出するための液
面センサで、排気ポンプ33、電磁弁6の故障時に液面
の異常を検知して図示しない制御機構により処理装置の
稼働を停止するようになっている。27は温度センサで
、稼働中の蒸発釜3の内部にオーバーヒートの異常が発
生したとき、突沸等による事故を防止するため、蒸発釜
3内の上部空隙部の温度を検知し、検知された温度が所
定の温度以上になったら電磁弁21を開いて蒸発釜3内
の液を回収タンクへ排出し、同時に電磁弁24を閉じて
蒸発釜3内の液が外部へ溢出するのを防止するように構
成されている。30は空冷器15で凝縮した液体を入れ
る受液器、31は受液器30内の液体を回収タンク32
へ送る送液ポンプ、33は蒸発釜3の内部を減圧し、か
つ蒸発釜3内で蒸発した蒸気を空冷器15へ吸引するた
めの排気ポンプである。35は液面センサで、液面が所
定範囲の上限を検知すると回収ポンプ31が作動し、下
限を検知すると回収ポンプ31の作動が停止するように
なっている。36も液面センサで、液面が液面センサ3
6に達する異常が発生すると装置の稼働が停止するよう
になっている。37は温度センサで、空冷用のファン1
6の故障などで凝縮されない高温の流体が受液器15へ
入ったときに装置の稼働を停止させるためのものである
。38は回収タンクに設けた液面センサで、回収タンク
32内の液面の上限を検知して図示しない警報装置等を
作動させるものである。In the evaporator 3, a reference numeral 23 allows air to flow into the evaporator 3 in order to improve the flow of fluid in the pipe that carries the steam from the evaporator 3 to the air cooler 15 and to eliminate clogging of the pipe. 24 is a solenoid valve for adjusting the intake amount of air from the air suction port 23 or shutting it off as necessary; 25 and 26 are liquid level sensors for detecting the liquid level in the evaporating pot 3; When the exhaust pump 33 or the electromagnetic valve 6 fails, an abnormality in the liquid level is detected and the operation of the processing apparatus is stopped by a control mechanism (not shown). 27 is a temperature sensor that detects the temperature of the upper cavity inside the evaporator 3 in order to prevent accidents such as bumping when an overheating abnormality occurs inside the evaporator 3 during operation, and detects the detected temperature. When the temperature reaches a predetermined value or higher, the solenoid valve 21 is opened to discharge the liquid in the evaporator 3 to a recovery tank, and at the same time the solenoid valve 24 is closed to prevent the liquid in the evaporator 3 from overflowing to the outside. It is composed of 30 is a liquid receiver into which the liquid condensed in the air cooler 15 is placed, and 31 is a recovery tank 32 for collecting the liquid in the liquid receiver 30.
The liquid sending pump 33 is an exhaust pump for reducing the pressure inside the evaporating pot 3 and sucking the vapor evaporated in the evaporating pot 3 into the air cooler 15. 35 is a liquid level sensor, and when the liquid level detects the upper limit of a predetermined range, the recovery pump 31 is activated, and when the lower limit is detected, the operation of the recovery pump 31 is stopped. 36 is also a liquid level sensor, and the liquid level is the liquid level sensor 3.
When an abnormality reaching 6 occurs, the operation of the device is stopped. 37 is a temperature sensor and air cooling fan 1
This is to stop the operation of the device when high-temperature fluid that is not condensed enters the liquid receiver 15 due to a failure of the liquid receiver 15 or the like. Reference numeral 38 denotes a liquid level sensor provided in the recovery tank, which detects the upper limit of the liquid level in the recovery tank 32 and activates an alarm device (not shown) or the like.
【0012】次に、第1図に示す装置例の動作を説明す
る。Next, the operation of the example device shown in FIG. 1 will be explained.
【0013】まず、非銀塩感光材料の処理装置から排出
された処理廃液は処理廃液タンク1に入れられる。排気
ポンプ33の作動により蒸発釜3内が減圧状態となり、
処理廃液タンク1内の処理廃液は配管4を通って蒸発釜
3へ送られるが、これは液面センサ12と図示しない制
御機構により電磁弁6の開閉を制御して処理廃液タンク
1からの処理液の蒸発釜3内への流入を制御し、蒸発釜
3内の液面レベルが一定範囲になるまで蒸発釜3内へ処
理廃液が流入し、その後は該液面レベルが一定範囲内に
なるように電磁弁の開閉が制御される。蒸発釜3内の圧
力条件は、蒸発釜3内の上部空隙部分の圧力を0〜−7
0cmHgの範囲とすることが適当であり、より好まし
くは−20〜−60cmHgの範囲である。First, processing waste liquid discharged from a processing apparatus for non-silver salt photosensitive materials is put into a processing waste liquid tank 1. Due to the operation of the exhaust pump 33, the pressure inside the evaporating pot 3 is reduced,
The treated waste liquid in the treated waste liquid tank 1 is sent to the evaporation pot 3 through the pipe 4, but this is done by controlling the opening and closing of the solenoid valve 6 by the liquid level sensor 12 and a control mechanism (not shown). The flow of liquid into the evaporation pot 3 is controlled, and the treated waste liquid flows into the evaporation pot 3 until the liquid level in the evaporation pot 3 falls within a certain range, after which the liquid level falls within a certain range. The opening and closing of the solenoid valve is controlled as follows. The pressure conditions in the evaporator 3 are such that the pressure in the upper cavity in the evaporator 3 is 0 to -7.
A suitable range is 0 cmHg, more preferably a range of -20 to -60 cmHg.
【0014】蒸発釜3へ送られた処理廃液は、加熱部材
7で加熱される。加熱されて処理廃液から蒸発した気体
は蒸発釜3の上部から電磁弁24を経て吸入された空気
と共に空冷器15へ送られ、凝縮されて受液器30に収
容され、凝縮されない気体は排気ポンプ33を経て外部
に放出される。受液器30に収容された液体は送液ポン
プ31で回収タンク32へ送られる。The treated waste liquid sent to the evaporator 3 is heated by a heating member 7. Gas that has been heated and evaporated from the treated waste liquid is sent to the air cooler 15 together with the air sucked from the upper part of the evaporator 3 through the solenoid valve 24, where it is condensed and stored in the receiver 30, and the gas that is not condensed is sent to the exhaust pump. 33 and is released to the outside. The liquid contained in the liquid receiver 30 is sent to a recovery tank 32 by a liquid sending pump 31.
【0015】このような処理において、蒸発釜3内の処
理廃液は蒸発によって逐次その液面が低下して行くが、
該液面を液面センサ12で検知し、一定の液面レベルの
範囲が保たれるように電磁弁6の作動が制御される。In such a process, the liquid level of the treated waste liquid in the evaporator 3 gradually decreases due to evaporation;
The liquid level is detected by a liquid level sensor 12, and the operation of the electromagnetic valve 6 is controlled so as to maintain a constant liquid level range.
【0016】また、蒸発釜3内に何らかの原因で過熱状
態を生じたり、突沸が起こると、温度センサ27により
蒸発釜3内の上部空隙部の温度異常を検知し、図示しな
い制御機構により電磁弁21及び24が開き、蒸発釜3
内の液がスラッジ回収タンク18に排出され、同時に空
気吸入口23が閉じられて空気吸入口23から蒸発釜3
内の液が蒸発釜3外に溢出するのが防止される。また、
受液器30内の温度の異常を温度センサ37が検知する
と図示しない制御機構により処理装置の稼働が停止され
る。Furthermore, if an overheating state or bumping occurs in the evaporator 3 for some reason, the temperature sensor 27 detects an abnormal temperature in the upper cavity of the evaporator 3, and a control mechanism (not shown) turns on the solenoid valve. 21 and 24 open, evaporating pot 3
The liquid inside is discharged to the sludge collection tank 18, and at the same time, the air inlet 23 is closed and the liquid is discharged from the evaporation pot 3.
The liquid inside is prevented from overflowing to the outside of the evaporation pot 3. Also,
When the temperature sensor 37 detects an abnormality in the temperature inside the liquid receiver 30, the operation of the processing device is stopped by a control mechanism (not shown).
【0017】第2図は、前記処理装置を収めた処理装置
本体の外面に設けた該処理装置の操作のパネルを示す正
面図である。FIG. 2 is a front view showing a panel for operating the processing apparatus provided on the outer surface of the main body of the processing apparatus housing the processing apparatus.
【0018】100は処理装置の本体、101は操作用
パネルを設けた制御カバー、102は本体100の内部
のスラッジ回収タンク18などを交換する際に開閉する
カバーで、いずれも図示しないヒンジ部材により開閉可
能に本体100に取り付けられている。101a、10
1bは開閉のためのとっ手である。103は処理装置全
体のメインスイッチで、制御カバー101を開いた内部
に設けられている。104は処理装置を稼働させるスタ
ートボタン、105は稼働を停止させるエンドボタン、
106は加熱部材7への通電を点灯によって表示し異常
時には点滅するキー、107は液面センサ25、温度セ
ンサ27、37で検知された異常を知らせるキー、10
8は液面センサ26で検知された蒸発釜3内の液面の異
常低下を知らせるキー、109は処理廃液タンク1内の
処理廃液が空になった時に点滅するランプで、液面セン
サ2による検知結果により作動するようになっている。
110は回収タンク32内の液面が上限に達した時に点
滅表示するキーで、液面センサ38の液面の検知結果に
より作動するようになっている。111は設定した稼働
時間(稼働時間は濃縮倍率に対応する)に達しスラッジ
回収タンク18の交換をランプの点滅で表示するキーで
ある。100 is the main body of the processing device, 101 is a control cover provided with an operation panel, and 102 is a cover that is opened and closed when replacing the sludge collection tank 18 inside the main body 100, all of which are connected by hinge members (not shown). It is attached to the main body 100 so that it can be opened and closed. 101a, 10
1b is a handle for opening and closing. 103 is a main switch for the entire processing device, and is provided inside the control cover 101 when it is opened. 104 is a start button for operating the processing device; 105 is an end button for stopping the operation;
106 is a key that indicates energization of the heating member 7 by lighting and blinks when an abnormality occurs; 107 is a key that indicates an abnormality detected by the liquid level sensor 25 and the temperature sensors 27 and 37;
Reference numeral 8 indicates a key that indicates an abnormal drop in the liquid level in the evaporation pot 3 detected by the liquid level sensor 26, and 109 is a lamp that blinks when the treated waste liquid in the treated waste liquid tank 1 is empty, which is detected by the liquid level sensor 2. It is activated based on the detection results. Reference numeral 110 is a key that flashes when the liquid level in the recovery tank 32 reaches the upper limit, and is activated according to the result of the liquid level detection by the liquid level sensor 38. Reference numeral 111 is a key that indicates replacement of the sludge recovery tank 18 by blinking a lamp when the set operating time (the operating time corresponds to the concentration ratio) has been reached.
【0019】次に、第3図及び第4図に示すフローチャ
ートに従って第1図に示す装置の制御手段の動作につい
て説明する。Next, the operation of the control means of the apparatus shown in FIG. 1 will be explained according to the flowcharts shown in FIGS. 3 and 4.
【0020】第3図は処理装置の稼働開始時の動作の概
略を示すフローチャートである。自動現像機から排出さ
れた処理廃液を処理廃液タンク1に入れた後、メインス
イッチ103をオンにし(200)、必要により稼働時
間の設定を行い、スタートボタン205を押すと(20
1)、電磁弁6、24が開き(202)、次いで排気ポ
ンプ33が作動し(203)、空気が空気吸入口23か
ら蒸発釜3内に導入され、受液器30の上部から排気ポ
ンプ33を介して排出されるが、蒸発釜3内の圧力は外
気より低下し、これにより自動的に処理廃液の蒸発釜3
内への供給が開始される。次いで、蒸発釜3の液面制御
機構が作動する(204)。蒸発釜3内の処理廃液の液
面が液面センサ12により所定の高さに達したことが検
知されると(205)、加熱部材7へ通電が開始され(
206)、また、ファン16の作動が開始されて(20
7)加熱濃縮が開始される。上記液面制御機構の作動は
、蒸発釜3内の液面が液面センサ12により所定の高さ
に達したことが検知されると、タイマーが作動し、所定
時間(例えば2秒以上)後に電磁弁6が閉じ、処理廃液
の蒸発釜3への供給が停止する。液面センサ12によっ
て液面が検出されなくなると所定時間(例えば2秒以上
)後に電磁弁6が開き、処理廃液タンク1内の処理廃液
が蒸発釜3内に供給される。加熱濃縮によって蒸発釜3
内の処理廃液が蒸発し液面が低下すると、上記動作が繰
り返されて蒸発釜3内の液面レベルが所定の範囲に維持
され処理廃液の加熱濃縮処理が進行する。FIG. 3 is a flowchart showing an outline of the operation at the start of operation of the processing device. After putting the processing waste liquid discharged from the automatic developing machine into the processing waste liquid tank 1, turn on the main switch 103 (200), set the operating time if necessary, and press the start button 205 (200).
1), the solenoid valves 6 and 24 open (202), then the exhaust pump 33 operates (203), air is introduced into the evaporation pot 3 from the air intake port 23, and the exhaust pump 33 is introduced from the upper part of the liquid receiver 30. However, the pressure inside the evaporator 3 is lower than that of the outside air, and as a result, the treated waste liquid is automatically discharged from the evaporator 3.
Supply to the interior will begin. Next, the liquid level control mechanism of the evaporating pot 3 is activated (204). When it is detected by the liquid level sensor 12 that the liquid level of the treated waste liquid in the evaporating pot 3 has reached a predetermined height (205), electricity is started to be applied to the heating member 7 (
206), and the operation of the fan 16 is started (20
7) Heat concentration is started. The liquid level control mechanism operates when the liquid level in the evaporating pot 3 is detected to have reached a predetermined height by the liquid level sensor 12, a timer is activated, and after a predetermined time (for example, 2 seconds or more), The solenoid valve 6 closes, and the supply of treated waste liquid to the evaporation pot 3 is stopped. When the liquid level is no longer detected by the liquid level sensor 12, the electromagnetic valve 6 opens after a predetermined time (for example, 2 seconds or more), and the treated waste liquid in the treated waste liquid tank 1 is supplied into the evaporation pot 3. Evaporation pot 3 by heating concentration
When the treated waste liquid in the evaporator 3 evaporates and the liquid level drops, the above operations are repeated to maintain the liquid level in the predetermined range and the heating concentration process of the treated waste liquid proceeds.
【0021】蒸発釜3から蒸発した蒸気は空冷器15で
冷却されて凝縮し、凝縮液が受液器30に溜まる。受液
器30の内部に設けられた液面センサ35により、液面
が所定範囲の上限を検知すると回収ポンプ31が作動し
て凝縮液を回収タンクへ送り、下限を検知すると回収ポ
ンプ31の作動が停止する。この動作が処理中連続して
自動的に行われる。The vapor evaporated from the evaporating pot 3 is cooled and condensed by the air cooler 15, and the condensed liquid is collected in the receiver 30. When the liquid level sensor 35 installed inside the liquid receiver 30 detects that the liquid level is at the upper limit of a predetermined range, the recovery pump 31 is activated to send the condensed liquid to the recovery tank, and when the lower limit is detected, the recovery pump 31 is activated. stops. This operation is continuously and automatically performed during processing.
【0022】第4図は処理装置の稼働終了時の動作の概
略を示すフローチャートである。処理装置の稼働を終え
たい時に、エンドボタン105を押すと(300)、加
熱部材7への通電が停止され(301)、タイマが自動
的に作動して所定の時間(好ましくは1時間位)経過後
に排気ポンプ33、回収ポンプ31及びファン16への
電力供給がオフとなり、これらの作動が停止する(30
2、303、304)。
また、電磁弁6及び24が同時に閉じ、最後にメインス
イッチ103をオフにし(305)、リーク弁を開いて
減圧状態を解除して稼働を終了する。FIG. 4 is a flowchart showing an outline of the operation when the processing apparatus finishes operating. When you want to end the operation of the processing device, press the end button 105 (300), the power supply to the heating member 7 is stopped (301), and the timer is automatically activated for a predetermined period of time (preferably about 1 hour). After the elapse of time, the power supply to the exhaust pump 33, recovery pump 31, and fan 16 is turned off, and their operation stops (30
2, 303, 304). Further, the electromagnetic valves 6 and 24 are closed simultaneously, and finally the main switch 103 is turned off (305), the leak valve is opened, the reduced pressure state is released, and the operation is ended.
【0023】本発明において、蒸発釜としては、ステン
レススチール、フッ素樹脂(例えばテフロン)等の保護
膜を有する金属等で作られた円筒状の釜を用いることが
できる。蒸発釜内で処理廃液の加熱に用いる加熱部材と
しては、ニクロム線、石英ヒータ、テフロンヒータ、カ
ートリッジヒータ、棒状ヒータ、パネルヒータのように
加工成型されたヒータを用いることができる。蒸発釜の
処理廃液が収容される部分の容積は加熱部材への供給電
力1kW当たり1〜10lが適当であり、好ましくは1
.0〜5lである。また、泡の流出及び突沸を防ぐため
に、上部の空隙部分の容積は処理廃液収容部分の容積の
0.5〜4倍が好ましく、より好ましくは0.7〜2.
5倍である。
処理廃液タンクから蒸発釜までの配管は、酸及びアルカ
リに強い材料で作製されたものであることが好ましい。In the present invention, as the evaporation pot, a cylindrical pot made of metal having a protective film such as stainless steel or fluororesin (eg, Teflon) can be used. As the heating member used to heat the treated waste liquid in the evaporator, a processed heater such as a nichrome wire, a quartz heater, a Teflon heater, a cartridge heater, a rod-shaped heater, or a panel heater can be used. The volume of the portion of the evaporator that accommodates the treated waste liquid is suitably 1 to 10 liters per kW of power supplied to the heating member, preferably 1 to 10 liters per kW of power supplied to the heating member.
.. It is 0 to 5 liters. In addition, in order to prevent bubbles from flowing out and bumping, the volume of the upper cavity is preferably 0.5 to 4 times the volume of the treated waste liquid storage section, more preferably 0.7 to 2.
It is 5 times more. The piping from the treated waste liquid tank to the evaporator is preferably made of a material that is resistant to acids and alkalis.
【0024】蒸発釜内で蒸発した蒸気を凝縮させる手段
としては、前記のような空冷器に限らず、種々の熱交換
手段を使用することができる。The means for condensing the vapor evaporated in the evaporator is not limited to the air cooler as described above, but various heat exchange means can be used.
【0025】処理廃液が高分子化合物の分散物を含有し
ている場合、あらかじめフィルタでこれを取り除いて蒸
発釜内へ入れることが好ましい。これにより、蒸発釜内
部の発熱部材による加熱により処理廃液から生成する固
形物の粘性化が避けられる。本発明が適用される処理廃
液には、感光性物質としてジアゾ樹脂、o−キノンジア
ジド化合物、フォトポリマー等を用いたネガ型やポジ型
の感光性平版印刷版(PS版)の現像液、水洗水、不感
脂化処理液等の廃液が包含される。[0025] When the treated waste liquid contains a dispersion of a polymer compound, it is preferable to remove this in advance with a filter and introduce it into the evaporation vessel. This prevents the solids generated from the treated waste liquid from becoming viscous due to heating by the heat generating member inside the evaporator. The processing waste liquid to which the present invention is applied includes developer solutions for negative and positive photosensitive lithographic printing plates (PS plates) using diazo resins, o-quinone diazide compounds, photopolymers, etc. as photosensitive substances, and washing water. , waste liquids such as desensitizing treatment liquids are included.
【0026】[0026]
【実施例】以下、実施例で本発明の方法を更に具体的に
説明する。EXAMPLES The method of the present invention will be explained in more detail in the following examples.
【0027】処理した処理廃液は下記の通りである。The treated waste liquid is as follows.
【0028】処理廃液
自動現像機PSU−820(コニカ(株)製)を用い、
ポジ型PS版(菊全)の23版とネガ型PS版の22版
を現像液としてSD−32(ネガ・ポジ共通現像液、コ
ニカ(株)製)を用いた現像処理において排出された水
洗廃液とした。水洗廃液に含まれる成分は、ポジ型PS
版の場合、PS版の感光層に含まれるフェノール樹脂、
色素等、支持体から溶出したアルミニウム、及び現像液
中のケイ酸カリウム、ノニオン界面活性剤等であり、ネ
ガ型PS版の場合、PS版の感光層に含まれるアクリル
系樹脂、色素等、支持体から溶出したアルミニウム、及
び現像液中のアルコール系溶剤、有機アミン、アニオン
界面活性剤等である。上記水洗廃液のpHは約8、粘度
は1.05cP(BL粘度計(東京計器製造所))であ
った。[0028] Using a processing waste liquid automatic processor PSU-820 (manufactured by Konica Corporation),
Water discharged during the development process using SD-32 (common negative/positive developer, manufactured by Konica Corporation) as the developer for the 23rd edition of the positive PS plate (Kikuzen) and the 22nd edition of the negative PS plate. It was treated as waste liquid. The components contained in the washing waste liquid are positive PS
In the case of plates, phenolic resins contained in the photosensitive layer of PS plates,
Dye, etc., aluminum eluted from the support, potassium silicate in the developer, nonionic surfactant, etc. In the case of a negative PS plate, acrylic resin, dye, etc. contained in the photosensitive layer of the PS plate, support These include aluminum eluted from the body, alcoholic solvents in the developer, organic amines, anionic surfactants, etc. The pH of the washing waste liquid was approximately 8, and the viscosity was 1.05 cP (BL viscometer (Tokyo Keiki Seisakusho)).
【0029】上記処理廃液を第1図に示す処理装置を使
用して処理した。蒸発釜3の容量は処理廃液収容容量を
8l、上部空隙部分の容積を8lとし、加熱部材7には
半導体ヒータを用い、交流100V、10Aの通電を行
った。蒸発釜3内の圧力を35〜42cmHgとした。The above treated waste liquid was treated using the treatment apparatus shown in FIG. The capacity of the evaporation pot 3 was 8 liters for storing treated waste liquid, and 8 liters for the volume of the upper space. A semiconductor heater was used as the heating member 7, and electricity was applied at 100 V AC and 10 A. The pressure inside the evaporation pot 3 was set at 35 to 42 cmHg.
【0030】その結果、稼動の開始から終了まで、簡単
な操作で極めて安定した処理を行うことができた。As a result, extremely stable processing could be performed with simple operations from the start to the end of operation.
【0031】[0031]
【発明の効果】本発明によれば、非銀塩感光材料の処理
廃液を蒸発釜内で減圧下に加熱濃縮して水と固形分とに
分離する処理作業の作業性が改善される。According to the present invention, the workability of the processing operation is improved, in which waste liquid from processing non-silver salt photographic materials is heated and concentrated under reduced pressure in an evaporator to separate it into water and solids.
第1図は本発明に係る処理装置の例を示す構成図、第2
図は該処理装置の操作用パネルを示す正面図、第3図、
第4図は本発明の制御手段の動作の概略を示すフローチ
ャートである。FIG. 1 is a configuration diagram showing an example of a processing device according to the present invention, and FIG.
The figure is a front view showing the operation panel of the processing device, FIG.
FIG. 4 is a flow chart showing an outline of the operation of the control means of the present invention.
1・・・処理廃液タンク
2、25、26、35、36、38・・・液面センサ3
・・・蒸発釜
6、21、24・・・電磁弁
7・・・加熱部材
15・・・空冷器
16・・・ファン
18・・・スラッジ回収タンク
27、37・・・温度センサ
30・・・受液器
32・・・回収タンク
33・・・排気ポンプ1... Processing waste liquid tank 2, 25, 26, 35, 36, 38... Liquid level sensor 3
... Evaporation pot 6, 21, 24 ... Solenoid valve 7 ... Heating member 15 ... Air cooler 16 ... Fan 18 ... Sludge recovery tank 27, 37 ... Temperature sensor 30 ...・Liquid receiver 32...Recovery tank 33...Exhaust pump
Claims (2)
加熱して蒸発濃縮せしめる手段、これによって生じた蒸
気を冷却凝縮する手段、及びこの凝縮液を溜める手段を
備えた非銀塩感光材料の処理廃液の処理装置において、
該処理装置の稼働開始時及び稼働終了時の動作が自動的
に行われる制御手段を有することを特徴とする非銀塩感
光材料の処理廃液の処理装置。Claim 1: A non-silver salt comprising means for heating and evaporating and concentrating the processing waste liquid of non-silver salt photosensitive materials under reduced pressure conditions, means for cooling and condensing the vapor generated thereby, and means for storing the condensed liquid. In processing equipment for processing waste liquid of photosensitive materials,
A processing apparatus for processing waste liquid of non-silver salt photosensitive materials, characterized in that the processing apparatus has a control means that automatically performs operations at the start and end of operation of the processing apparatus.
置の稼動開始時から稼動終了時までの操作を自動的に行
うことを特徴とする非銀塩感光材料の処理廃液の処理方
法。2. A method for processing waste liquid from processing non-silver salt photosensitive materials, comprising using the processing apparatus according to claim 1 and automatically performing operations from the start of operation to the end of operation of the processing apparatus. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40376490A JPH04219189A (en) | 1990-12-19 | 1990-12-19 | Treating equipment and treatment for treated waste liquid of nonsilver salt photosensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40376490A JPH04219189A (en) | 1990-12-19 | 1990-12-19 | Treating equipment and treatment for treated waste liquid of nonsilver salt photosensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04219189A true JPH04219189A (en) | 1992-08-10 |
Family
ID=18513494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP40376490A Pending JPH04219189A (en) | 1990-12-19 | 1990-12-19 | Treating equipment and treatment for treated waste liquid of nonsilver salt photosensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04219189A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3715134A1 (en) * | 2019-03-29 | 2020-09-30 | Sumitomo Heavy Industries Finetech, Ltd. | Liquid circulation device for machine tool and tank |
-
1990
- 1990-12-19 JP JP40376490A patent/JPH04219189A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3715134A1 (en) * | 2019-03-29 | 2020-09-30 | Sumitomo Heavy Industries Finetech, Ltd. | Liquid circulation device for machine tool and tank |
CN111745544A (en) * | 2019-03-29 | 2020-10-09 | 住友重机械精科技株式会社 | Liquid circulation device and tank for machine tool |
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