JPH04214775A - Electrically conductive paste and electrically conductive coating film - Google Patents
Electrically conductive paste and electrically conductive coating filmInfo
- Publication number
- JPH04214775A JPH04214775A JP2341076A JP34107690A JPH04214775A JP H04214775 A JPH04214775 A JP H04214775A JP 2341076 A JP2341076 A JP 2341076A JP 34107690 A JP34107690 A JP 34107690A JP H04214775 A JPH04214775 A JP H04214775A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- conductive
- conductive paste
- derivative
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012799 electrically-conductive coating Substances 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 33
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000000843 powder Substances 0.000 claims abstract description 32
- 229920001577 copolymer Polymers 0.000 claims abstract description 31
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 21
- 239000011230 binding agent Substances 0.000 claims abstract description 18
- 239000000654 additive Substances 0.000 claims abstract description 14
- 239000002904 solvent Substances 0.000 claims abstract description 14
- 230000000996 additive effect Effects 0.000 claims abstract description 11
- 229920000620 organic polymer Polymers 0.000 claims abstract description 10
- -1 halogen ions Chemical class 0.000 claims description 30
- 238000000576 coating method Methods 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 23
- 239000011248 coating agent Substances 0.000 claims description 22
- 125000003118 aryl group Chemical group 0.000 claims description 14
- 229920000642 polymer Polymers 0.000 claims description 9
- 229910052736 halogen Inorganic materials 0.000 claims description 7
- 150000001412 amines Chemical class 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 3
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 238000007639 printing Methods 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 150000002892 organic cations Chemical class 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 239000000178 monomer Substances 0.000 abstract description 30
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 27
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 10
- 229920002554 vinyl polymer Polymers 0.000 abstract description 10
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 abstract description 9
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 abstract description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract description 6
- 229960005070 ascorbic acid Drugs 0.000 abstract description 4
- 239000002211 L-ascorbic acid Substances 0.000 abstract description 3
- 235000000069 L-ascorbic acid Nutrition 0.000 abstract description 3
- 238000013329 compounding Methods 0.000 abstract 2
- 229910052751 metal Inorganic materials 0.000 description 33
- 239000002184 metal Substances 0.000 description 33
- 239000010410 layer Substances 0.000 description 30
- 229920005989 resin Polymers 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 17
- 229910052802 copper Inorganic materials 0.000 description 17
- 239000010949 copper Substances 0.000 description 17
- 239000003822 epoxy resin Substances 0.000 description 14
- 229920000647 polyepoxide Polymers 0.000 description 14
- 230000000694 effects Effects 0.000 description 13
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- 239000004020 conductor Substances 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 9
- 230000003647 oxidation Effects 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- 239000005011 phenolic resin Substances 0.000 description 8
- 229920001187 thermosetting polymer Polymers 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 238000001723 curing Methods 0.000 description 7
- 150000002739 metals Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- 229920000877 Melamine resin Polymers 0.000 description 6
- 239000011889 copper foil Substances 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229920001568 phenolic resin Polymers 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 5
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 229920003180 amino resin Polymers 0.000 description 5
- 239000013522 chelant Substances 0.000 description 5
- 239000002738 chelating agent Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000003085 diluting agent Substances 0.000 description 5
- 230000009257 reactivity Effects 0.000 description 5
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 5
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical group NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OYHQOLUKZRVURQ-HZJYTTRNSA-N Linoleic acid Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(O)=O OYHQOLUKZRVURQ-HZJYTTRNSA-N 0.000 description 3
- 239000004640 Melamine resin Substances 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000004898 kneading Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 3
- 229920001225 polyester resin Polymers 0.000 description 3
- 239000004645 polyester resin Substances 0.000 description 3
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 3
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 3
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 3
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- GWYFZTJDIQALEB-UHFFFAOYSA-N 2-ethenylbenzene-1,4-diol Chemical compound OC1=CC=C(O)C(C=C)=C1 GWYFZTJDIQALEB-UHFFFAOYSA-N 0.000 description 2
- XCZKKZXWDBOGPA-UHFFFAOYSA-N 2-phenylbenzene-1,4-diol Chemical compound OC1=CC=C(O)C(C=2C=CC=CC=2)=C1 XCZKKZXWDBOGPA-UHFFFAOYSA-N 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- 239000005642 Oleic acid Substances 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
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- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 125000004103 aminoalkyl group Chemical group 0.000 description 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
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- 238000013007 heat curing Methods 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 2
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- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
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- OYHQOLUKZRVURQ-IXWMQOLASA-N linoleic acid Natural products CCCCC\C=C/C\C=C\CCCCCCCC(O)=O OYHQOLUKZRVURQ-IXWMQOLASA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
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- 125000005358 mercaptoalkyl group Chemical group 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
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- 239000003973 paint Substances 0.000 description 2
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- 150000002989 phenols Chemical class 0.000 description 2
- HKOOXMFOFWEVGF-UHFFFAOYSA-N phenylhydrazine Chemical compound NNC1=CC=CC=C1 HKOOXMFOFWEVGF-UHFFFAOYSA-N 0.000 description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 2
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- 230000002265 prevention Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 235000003441 saturated fatty acids Nutrition 0.000 description 2
- 150000004671 saturated fatty acids Chemical class 0.000 description 2
- 238000006277 sulfonation reaction Methods 0.000 description 2
- 125000001174 sulfone group Chemical group 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- KQTIIICEAUMSDG-UHFFFAOYSA-N tricarballylic acid Chemical compound OC(=O)CC(C(O)=O)CC(O)=O KQTIIICEAUMSDG-UHFFFAOYSA-N 0.000 description 2
- 229960001124 trientine Drugs 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 239000004711 α-olefin Substances 0.000 description 2
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- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- JNNKWUPPLJTSSJ-UHFFFAOYSA-N chloromethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCl JNNKWUPPLJTSSJ-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000005265 dialkylamine group Chemical group 0.000 description 1
- YXVFQADLFFNVDS-UHFFFAOYSA-N diammonium citrate Chemical compound [NH4+].[NH4+].[O-]C(=O)CC(O)(C(=O)O)CC([O-])=O YXVFQADLFFNVDS-UHFFFAOYSA-N 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- CZHYKKAKFWLGJO-UHFFFAOYSA-N dimethyl phosphite Chemical compound COP([O-])OC CZHYKKAKFWLGJO-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- PMMYEEVYMWASQN-UHFFFAOYSA-N dl-hydroxyproline Natural products OC1C[NH2+]C(C([O-])=O)C1 PMMYEEVYMWASQN-UHFFFAOYSA-N 0.000 description 1
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- 238000006266 etherification reaction Methods 0.000 description 1
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- 150000002429 hydrazines Chemical class 0.000 description 1
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- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
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- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
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- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
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- 229940049918 linoleate Drugs 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
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- 230000014759 maintenance of location Effects 0.000 description 1
- 229940049920 malate Drugs 0.000 description 1
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- 235000011090 malic acid Nutrition 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical group NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- LVQPBIMCRZQQBC-UHFFFAOYSA-N methoxymethyl 2-methylprop-2-enoate Chemical compound COCOC(=O)C(C)=C LVQPBIMCRZQQBC-UHFFFAOYSA-N 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- ULYOZOPEFCQZHH-UHFFFAOYSA-N n-(methoxymethyl)prop-2-enamide Chemical compound COCNC(=O)C=C ULYOZOPEFCQZHH-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
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- 239000011664 nicotinic acid Substances 0.000 description 1
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- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 239000010680 novolac-type phenolic resin Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- 239000004006 olive oil Substances 0.000 description 1
- 235000008390 olive oil Nutrition 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229940044654 phenolsulfonic acid Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- COLNVLDHVKWLRT-UHFFFAOYSA-N phenylalanine Natural products OC(=O)C(N)CC1=CC=CC=C1 COLNVLDHVKWLRT-UHFFFAOYSA-N 0.000 description 1
- 229940067157 phenylhydrazine Drugs 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 125000005496 phosphonium group Chemical group 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical class OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 1
- 239000010665 pine oil Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000005076 polymer ester Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 239000011134 resol-type phenolic resin Substances 0.000 description 1
- 239000003813 safflower oil Substances 0.000 description 1
- 235000005713 safflower oil Nutrition 0.000 description 1
- ORIHZIZPTZTNCU-YVMONPNESA-N salicylaldoxime Chemical compound O\N=C/C1=CC=CC=C1O ORIHZIZPTZTNCU-YVMONPNESA-N 0.000 description 1
- 229960000581 salicylamide Drugs 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000008159 sesame oil Substances 0.000 description 1
- 235000011803 sesame oil Nutrition 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical group 0.000 description 1
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- FGMPLJWBKKVCDB-UHFFFAOYSA-N trans-L-hydroxy-proline Natural products ON1CCCC1C(O)=O FGMPLJWBKKVCDB-UHFFFAOYSA-N 0.000 description 1
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- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 1
- OUYCCCASQSFEME-UHFFFAOYSA-N tyrosine Natural products OC(=O)C(N)CC1=CC=C(O)C=C1 OUYCCCASQSFEME-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 239000008158 vegetable oil Substances 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Conductive Materials (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyurethanes Or Polyureas (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は長期間にわたって密着性を維持したままで良好
な導電性を有する導電性ペースト、及び導電性塗膜に関
する。より詳しくは、紙・フェノール樹脂基板やガラス
・エポキシ樹脂基板などの回路基板上に、スクリーン印
刷等で塗布後加熱硬化することにより、金属や絶縁層と
の優れた密着性を維持したままで、長期間にわたって良
好な導電性を有するものであり、回路基板の電磁波ノイ
ズ対策用もしくは回路基板の配線用の導体に適した導電
性ペースト、及び導電性塗膜に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a conductive paste and a conductive coating film that have good conductivity while maintaining adhesion over a long period of time. More specifically, it is applied onto circuit boards such as paper/phenol resin boards, glass/epoxy resin boards, etc. by screen printing, and then heated and cured, thereby maintaining excellent adhesion to metals and insulating layers. The present invention relates to a conductive paste that has good conductivity over a long period of time and is suitable for use as a countermeasure against electromagnetic noise on a circuit board or as a conductor for wiring on a circuit board, and a conductive coating film.
一般に導電性ペーストは、エポキシ樹脂、飽和ポリエス
テル樹脂、アクリル樹脂、フェノール樹脂等の有機バイ
ンダー(以下バインダーと略す)と導電性粉末及び溶剤
とから基本的に構成されている。In general, a conductive paste is basically composed of an organic binder (hereinafter abbreviated as binder) such as an epoxy resin, a saturated polyester resin, an acrylic resin, or a phenol resin, a conductive powder, and a solvent.
この導電性ペーストは、従来から回路基板用の導体とし
て用いられている。また最近では、プリント回路基板の
電磁波シールド材料として導電性ペーストを使用する試
みも始まっている。即ち、この応用は基板上にアースパ
ターンを含む回路パターンを有する導電層を形成してな
る印刷配線基板において、前記基板の導電層が設けられ
た面のアースパターンの部分を除いて基板上に導電層を
覆うように絶縁層が印刷され、前記基板の絶縁層を覆い
アースパターンに接続するように導電性ペーストを印刷
することにより、電磁波シールド層を形成させ、電磁波
ノイズ対策用回路基板の導体として使用するものである
(特開昭63−15497号や実開昭55−29276
号)。This conductive paste has been conventionally used as a conductor for circuit boards. Recently, attempts have also begun to use conductive paste as an electromagnetic shielding material for printed circuit boards. That is, this application applies to a printed wiring board in which a conductive layer having a circuit pattern including a ground pattern is formed on the board, and a conductive layer is formed on the board except for the part of the ground pattern on the surface of the board on which the conductive layer is provided. An insulating layer is printed to cover the layer, and a conductive paste is printed to cover the insulating layer of the board and connect it to the ground pattern, thereby forming an electromagnetic shielding layer, which can be used as a conductor for a circuit board for electromagnetic noise countermeasures. (Japanese Unexamined Patent Publication No. 15497/1983 and Japanese Utility Model Application No. 29276/1983)
issue).
導電性ペーストの中でも特に導電性銅ペーストは高価な
導電性銀ペーストに替わる導体として注目されている。Among conductive pastes, conductive copper paste in particular is attracting attention as a conductor that can replace expensive conductive silver paste.
しかしながら、この導電性銅ペーストは銅が銀よりも本
質的に酸化されやすく、酸化により電気絶縁性の酸化皮
膜を形成するという欠点を有しているため、導電性銀ペ
ーストに比べて安価である反面、ペースト状態もしくは
加熱硬化膜状態での長期間にわたる導電性の維持という
点に実用上の大きな問題点を残していた。However, this conductive copper paste has the disadvantage that copper is inherently more easily oxidized than silver, and oxidation forms an electrically insulating oxide film, so it is less expensive than conductive silver paste. On the other hand, there remains a major practical problem in maintaining electrical conductivity over a long period of time in a paste state or a heat-cured film state.
この欠点に対してこれまでに各種の酸化防止剤、金属キ
レート剤等の添加剤を添加することが行なわれている。To address this drawback, it has been attempted to add various additives such as antioxidants and metal chelating agents.
例えば、導電性銅ペーストに対しアントラセン誘導体や
有機チタン化合物を加えることが提案されているが、十
分な導電性と導電性の長期安定性は未だ得られていない
。For example, it has been proposed to add an anthracene derivative or an organic titanium compound to a conductive copper paste, but sufficient conductivity and long-term stability of conductivity have not yet been achieved.
また、金属キレート形成剤としてモノエタノールアミン
、ジエタノールアミン等を添加して酸化を防止し、導電
性を維持する提案(特開昭62−230869号、特開
昭62−252482号)、アセチルアセトン等の金属
キレート化合物を添加して導電性を向上させようとする
提案(特開平2−66802号)がなされている。しか
しながら、これら金属キレート形成剤等を添加した場合
、導電性の維持、向上の効果は得られるとしても反面、
金属銅などの基材表面との密着性が低下するという問題
が生じていた。In addition, proposals have been made to prevent oxidation and maintain conductivity by adding monoethanolamine, diethanolamine, etc. as metal chelate forming agents (JP-A-62-230869, JP-A-62-252482), and metals such as acetylacetone. A proposal has been made to improve conductivity by adding a chelate compound (Japanese Unexamined Patent Publication No. 2-66802). However, when these metal chelate forming agents are added, although the effect of maintaining and improving conductivity can be obtained, on the other hand,
A problem has arisen in that the adhesion to the surface of a base material such as metallic copper is reduced.
また、還元剤を用いて金属銅に形成された酸化皮膜の酸
化物を還元することにより導電性の維持、向上を図る試
みも種々なされている。Furthermore, various attempts have been made to maintain and improve electrical conductivity by reducing the oxide of the oxide film formed on metallic copper using a reducing agent.
例えば、還元剤としてγ−アミノイソプロピルトリエト
キシシランを用いることにより導電性の向上が期待でき
るとする提案(特開昭50−6638号)、還元剤とし
て2−ヒドロキシ−3−フェノキシプロピルフォスファ
イトなどの銅の還元性物質を用いることにより導電性の
向上、導電性保持力の向上が期待できるとする提案(特
公昭52−24936号)等がなされている。For example, it has been proposed that conductivity can be improved by using γ-aminoisopropyltriethoxysilane as a reducing agent (Japanese Patent Application Laid-Open No. 1983-6638), 2-hydroxy-3-phenoxypropyl phosphite, etc. as a reducing agent. It has been proposed (Japanese Patent Publication No. 52-24936) that it is expected to improve conductivity and conductivity retention by using a reducing substance of copper.
しかしながら還元剤を添加する場合にも、金属キレート
形成剤等の添加の場合と同様に低分子体の配合により密
着性が低下するという一般的な問題点が残されており、
前記の提案においてもこれらの問題点は充分に解消され
ていない。However, even when adding a reducing agent, there remains the general problem that adhesion deteriorates due to the combination of low molecular weight substances, as in the case of adding metal chelate forming agents, etc.
Even in the above-mentioned proposals, these problems have not been sufficiently solved.
このように特に金属銅のように表面酸化により電気絶縁
性の酸化皮膜を形成しやすい金属の場合、還元剤の添加
により酸化皮膜の酸化物を還元することにより、導電性
を向上することは達成できる。In this way, especially in the case of metals that easily form an electrically insulating oxide film through surface oxidation, such as metallic copper, it is possible to improve conductivity by reducing the oxides in the oxide film by adding a reducing agent. can.
しかし、従来の導電性ペーストでは一般に酸化皮膜に対
しては密着性は有するも金属銅表面等との密着性が欠如
しているため、還元剤の添加による酸化物の還元により
導電性が向上するに伴い密着性が低下するというのが実
情であった。However, conventional conductive pastes generally have adhesion to oxide films but lack adhesion to metal copper surfaces, etc., so conductivity is improved by reducing the oxide by adding a reducing agent. The actual situation was that the adhesion deteriorated as a result.
このように従来の導電性ペーストは、一般に回路基板上
の金属や絶縁層との密着性が十分ではなく、電磁波ノイ
ズ対策用回路基板の電磁波シールド層の導体や回路基板
の配線用の導体として用いた場合、その信頼性に欠ける
という問題点を指摘されている。As described above, conventional conductive pastes generally do not have sufficient adhesion to metals and insulating layers on circuit boards, and are not used as conductors for electromagnetic shielding layers of circuit boards for electromagnetic noise countermeasures or as conductors for circuit board wiring. However, the problem of lack of reliability has been pointed out.
密着性に対する改善策としては、種々のものが報告され
ているが、例えばバインダーの改良例として、メラミン
樹脂及びポリオールとポリエステル樹脂又は/及びアル
キド樹脂を用いて金属や絶縁層との密着性の改善を試み
た例(特開昭62−253675号)や、メラミン樹脂
とアクリル樹脂との混合物を用いて金属との密着性の改
善を試みた例(特開昭63−83178号)や、ポリ−
p−ヒドロキシスチレンを用いて絶縁層との密着性及び
溶剤による剥離性の改善を試みた例(特開昭60−26
0663号)もあるが、いずれの方法においても密着性
の改善はなお不十分であって、金属や絶縁層との密着性
を十分に保証するには至っていなかった。Various measures have been reported to improve adhesion. For example, as an example of improving the binder, improving the adhesion with metals and insulating layers by using melamine resin, polyol, polyester resin, and/or alkyd resin. (Japanese Unexamined Patent Publication No. 62-253675), an example where a mixture of melamine resin and acrylic resin was used to improve the adhesion to metal (Japanese Unexamined Patent Publication No. 63-83178), and poly-
An example of using p-hydroxystyrene to improve adhesion to an insulating layer and removability with a solvent (Japanese Unexamined Patent Publication No. 60-26
No. 0663), but in either method, the improvement in adhesion was still insufficient, and adhesion to metals and insulating layers could not be fully guaranteed.
このように導電性と密着性は、従来の導電性ペーストに
おいては一般に二率背反の関係にあるため、密着性を維
持したままで導電性の向上が期待できる導電性ペースト
は未だ見い出されていないのが実情である。In this way, conductivity and adhesion are generally in a trade-off relationship in conventional conductive pastes, so a conductive paste that can be expected to improve conductivity while maintaining adhesion has not yet been found. That is the reality.
しかし、当業界では金属銅等の酸化を防止することによ
り導電性の維持、向上を図ると同時に、金属銅との密着
性をも有する導電性ペースト、換言すれば、密着性を維
持したままで導電性の向上を期待できる導電性ペースト
の開発が期待されている。However, in the industry, conductive pastes that maintain and improve conductivity by preventing oxidation of metal copper, etc., also have adhesion to metal copper, in other words, conductive pastes that maintain adhesion. The development of a conductive paste that can be expected to improve conductivity is expected.
本発明はかかる現状に鑑みて、導電性ペーストの酸化安
定性による導電性の維持、向上及び基板との密着性の改
善を鋭意検討した結果、ヒドロキシスチレン系共重合体
及び/又はその誘導体をバインダー成分として用い、か
つ還元剤を添加剤として配合すれば、金属表面及び絶縁
層表面との親和性、反応性を高めることが可能で、上記
目的を達成できることを見出し、本発明を完成するに至
った。In view of the current situation, the present invention has been developed as a result of intensive studies to maintain and improve conductivity through oxidation stability of conductive paste and to improve adhesion to substrates. It was discovered that by using it as a component and blending a reducing agent as an additive, it is possible to increase the affinity and reactivity with the metal surface and the surface of the insulating layer, and the above object can be achieved, and the present invention was completed. Ta.
即ち本発明の要旨は、導電性粉末、有機バインダー、添
加剤、及び溶剤を必須成分とする導電性ペーストにおい
て、該有機バインダーが重量平均分子量1,000〜2
00万のヒドロキシスチレン系共重合体及び/又はその
誘導体を含有し、該添加剤として還元剤を含有すること
を特徴とする導電性ペースト、及び導電性塗膜に関する
ものである。That is, the gist of the present invention is to provide a conductive paste containing a conductive powder, an organic binder, an additive, and a solvent as essential components, wherein the organic binder has a weight average molecular weight of 1,000 to 2.
The present invention relates to a conductive paste containing a hydroxystyrene copolymer and/or a derivative thereof, and a reducing agent as an additive, and a conductive coating film.
本発明によると、有機バインダー中に含有される有機高
分子に導入する置換基の種類及びその密度を調整するこ
とによって、金属表面に対する親和性、反応性を制御し
、導電性粉末の酸化安定性を高めるとともに、金属や絶
縁層との密着性を高めることができる。According to the present invention, by adjusting the type and density of substituents introduced into the organic polymer contained in the organic binder, the affinity and reactivity to the metal surface can be controlled, and the oxidation stability of the conductive powder can be improved. It is possible to increase the adhesion with metals and insulating layers.
本発明において有機バインダー中に含有される有機高分
子としては、例えば次の一般式(I):〔式中、m≧0
、n≧3で、それぞれ一般式(I)の有機高分子の重量
平均分子量が1,000〜200万になるまでの任意の
数、
;0≦k≦2、
;0≦p≦2、
;0<u≦2、
(但し、k、p、uは重合体中の平均
値を示す。)
;R1〜R2はH又は炭素数1〜5のアルキル基、
;Xは重合性のビニル系単量体、
;Y、Zは同種又は異種であり、かつ
又は炭素数1〜18のアルキル基もしくはアリール基か
ら選ばれるものである(式中、;MはH、アルカリ金属
、アルカリ土類金属又はアミン類などの有機カチオン
;Y1、Y4はハロゲン
;Y2−、Y3−はハロゲンイオン、有機酸アニオン、
無機酸アニオンなどの対イオン;WはSまたはO
;R4〜R8は同種または異種であって直鎖または分岐
鎖アルキル基、アルキル誘導体基、芳香族基、またはH
、さらにR6とR7はN基とで環を形成していてもかま
わない。In the present invention, the organic polymer contained in the organic binder is, for example, the following general formula (I): [where m≧0
, n≧3, respectively, an arbitrary number until the weight average molecular weight of the organic polymer of general formula (I) is 1,000 to 2,000,000; 0≦k≦2; 0≦p≦2; 0<u≦2, (However, k, p, and u indicate the average value in the polymer.); R1 and R2 are H or an alkyl group having 1 to 5 carbon atoms; X is a polymerizable vinyl monomer; ; Y and Z are the same or different, and or selected from alkyl groups or aryl groups having 1 to 18 carbon atoms (wherein, M is H, an alkali metal, an alkaline earth metal or Organic cations such as amines; Y1 and Y4 are halogens; Y2- and Y3- are halogen ions, organic acid anions,
A counter ion such as an inorganic acid anion; W is S or O; R4 to R8 are the same or different and are a linear or branched alkyl group, an alkyl derivative group, an aromatic group, or H
, Furthermore, R6 and R7 may form a ring with an N group.
;R9〜R15は同種または異種であって直鎖または分
岐鎖アルキル基、アルキル誘導体基、芳香族基、または
H
;q、s、tは0又は1
;rは0、1又は2を示す)〕
で表されるヒドロキシスチレン系共重合体及びその誘導
体が挙げられる。; R9 to R15 are the same or different and are linear or branched alkyl groups, alkyl derivative groups, aromatic groups, or H; q, s, and t are 0 or 1; r is 0, 1, or 2) ] Hydroxystyrene copolymers represented by these and derivatives thereof are mentioned.
上記一般式(I)において、m、n、k、p、uはある
一定の範囲の任意の数(実数)である。In the above general formula (I), m, n, k, p, and u are arbitrary numbers (real numbers) within a certain range.
重合体を構成する単量体について考えるならば、k、p
は当然整数であり、構成単位のブロックごとに考えるな
らば、mは整数であり、そして分子ごとに考えるならば
、nは整数である。しかしながら重合体はその本質にお
いて、混合物であり、そして重合体の性質はその混合物
の性質としてとらえる方が、その個々の構成単位を問題
にするよりも適切である。従って、本発明において、m
、n、k、p、uは重合体中の平均値として表示される
ものである。If we consider the monomers that make up the polymer, k, p
is naturally an integer, if we consider each block of constituent units, m is an integer, and if we consider each molecule, n is an integer. However, polymers are essentially mixtures, and it is more appropriate to consider the properties of a polymer as a property of the mixture than with its individual constituent units. Therefore, in the present invention, m
, n, k, p, and u are expressed as average values in the polymer.
上記一般式(I)で表されるヒドロキシスチレン系共重
合体又はその誘導体は、一般式(I)においてYまたは
Zで表されるような置換基を有するかあるいは有しない
ところの、ヒドロキシスチレン、ヒドロキシ−α−メチ
ルスチレン、あるいはヒドロキシ−α−エチルスチレン
等のヒドロキシスチレン系単量体同士のみの共重合体、
あるいはこれらのヒドロキシスチレン系単量体と他の重
合性のビニル系単量体(X)との共重合体であり得る。The hydroxystyrene copolymer represented by the above general formula (I) or its derivative has hydroxystyrene, which has or does not have a substituent represented by Y or Z in the general formula (I), A copolymer of only hydroxystyrene monomers such as hydroxy-α-methylstyrene or hydroxy-α-ethylstyrene,
Alternatively, it may be a copolymer of these hydroxystyrene monomers and another polymerizable vinyl monomer (X).
重合単位のヒドロキシスチレン系単量体は、オルソ体、
メタ体、パラ体あるいはこれらの混合物であってもよい
が、パラ体あるいはメタ体が好ましい。The hydroxystyrene monomer of the polymerized unit is ortho form,
It may be a meta-form, a para-form or a mixture thereof, but a para-form or a meta-form is preferable.
また共重合体である場合の他のビニル系単量体(X)と
しては、アニオン系、カチオン系等のイオン性単量体や
ノニオン性単量体、メタクリレート、ビニルエステル、
ビニルエーテル、マレート、フマレート、α−オレフィ
ンなどの公知の化合物を挙げることができる。In addition, other vinyl monomers (X) in the case of a copolymer include ionic monomers such as anionic and cationic monomers, nonionic monomers, methacrylates, vinyl esters,
Known compounds such as vinyl ether, malate, fumarate, and α-olefin can be mentioned.
これらの化合物の具体例としては、アクリル酸、メタク
リル酸、クロトン酸、イタコン酸、マレイン酸、フマー
ル酸、シトラコン酸、又はそれらの無水物及びそのモノ
アルキルエステルやカルボキシエチルビニルエーテル、
カルボキシプロピルビニルエーテル等の不飽和カルボン
酸単量体、スチレンスルホン酸、アリルスルホン酸、2
−アクリルアミド−2−メチルプロパンスルホン酸等の
不飽和スルホン酸単量体、ビニルホスホン酸、ビニルホ
スフェート、アクリル酸エチルホスフェート、メタクリ
ル酸エチルホスフェート等の不飽和リン酸単量体、アク
リルアミド、メタクリルアミド、マレイン酸アミド、マ
レイン酸イミド等のα,β−不飽和カルボン酸アミド、
アクリル酸メチル、メタクリル酸メチル、アクリル酸エ
チル、メタクリル酸エチル、アクリル酸ブチル、メタク
リル酸ブチル、パーフルオロアルキルエチルメタクリレ
ート、ステアリルメタクリレート、ヒドロキシエチルア
クリレート、ヒドロキシプロピルアクリレート、2−ア
ミノエチルメタクリレート塩酸塩、ジメチルアミノエチ
ルメタクリレート、メトキシメチルメタクリレート、ク
ロルメチルメタクリレート、ジクロルトリアジニルアミ
ノエチルメタクリレート、及びマレイン酸、フマル酸、
イタコン酸のジエステル等、α,β−不飽和カルボン酸
のエステル、メチロールアクリルアミド、メチロールメ
タクリルアミド、メトキシメチルアクリルアミドなどの
不飽和カルボン酸の置換アミド類、アクリロニトリル、
メタクリロニトリル等のα,β−不飽和カルボン酸のニ
トリル、酢酸ビニル、塩化ビニル、クロル酢酸ビニルな
どの外、ジビニルベンゼン等のジビニル化合物、ビニリ
デン化合物、スチレンに代表される芳香族ビニル化合物
、ビニルピリジンやビニルピロリドンに代表される複素
環ビニル化合物、ビニルケトン化合物、ビニルエーテル
化合物、ビニルアミド化合物、エチレン、プロピレン等
のモノオレフィン化合物、ブタジエン、イソプレン、ク
ロプレン等の共役ジオレフィン化合物、アリルアルコー
ル、酢酸アリル等のアリル化合物、並びにグリシジルメ
タクリレート等で代表される単量体の群から選択される
1種以上の単量体が使用される。Specific examples of these compounds include acrylic acid, methacrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, citraconic acid, or anhydrides thereof, and their monoalkyl esters and carboxyethyl vinyl ethers.
Unsaturated carboxylic acid monomers such as carboxypropyl vinyl ether, styrene sulfonic acid, allyl sulfonic acid, 2
- Acrylamide - Unsaturated sulfonic acid monomers such as 2-methylpropanesulfonic acid, unsaturated phosphoric acid monomers such as vinylphosphonic acid, vinyl phosphate, acrylic acid ethyl phosphate, methacrylic acid ethyl phosphate, acrylamide, methacrylamide, α,β-unsaturated carboxylic acid amides such as maleic acid amide and maleic acid imide;
Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, perfluoroalkylethyl methacrylate, stearyl methacrylate, hydroxyethyl acrylate, hydroxypropyl acrylate, 2-aminoethyl methacrylate hydrochloride, dimethyl Aminoethyl methacrylate, methoxymethyl methacrylate, chloromethyl methacrylate, dichlorotriazinyl aminoethyl methacrylate, and maleic acid, fumaric acid,
Diesters of itaconic acid, etc., esters of α,β-unsaturated carboxylic acids, substituted amides of unsaturated carboxylic acids such as methylol acrylamide, methylol methacrylamide, methoxymethyl acrylamide, acrylonitrile,
Nitriles of α,β-unsaturated carboxylic acids such as methacrylonitrile, vinyl acetate, vinyl chloride, vinyl chloroacetate, etc., divinyl compounds such as divinylbenzene, vinylidene compounds, aromatic vinyl compounds represented by styrene, vinyl Heterocyclic vinyl compounds such as pyridine and vinylpyrrolidone, vinyl ketone compounds, vinyl ether compounds, vinylamide compounds, monoolefin compounds such as ethylene and propylene, conjugated diolefin compounds such as butadiene, isoprene, and cloprene, allyl alcohol, allyl acetate, etc. One or more monomers selected from the group of monomers represented by allyl compounds, glycidyl methacrylate, etc. are used.
これらの単量体のうち特に限定されるものではなく、い
ずれでも使用できるが具体的には、次のようなものが好
適に使用される。Among these monomers, any one can be used without any particular limitation, but specifically, the following monomers are preferably used.
本発明においては、前記のようにヒドロキシスチレン系
単量体同士のみの共重合でもよいが、他の重合性のビニ
ル系単量体(X)との共重合とする場合には、ヒドロキ
シスチレン系単量体/他のビニル系単量体(X)の割合
は、モル比で1/10〜20/1までが適当である。In the present invention, copolymerization of only hydroxystyrene monomers may be performed as described above, but when copolymerizing with other polymerizable vinyl monomers (X), hydroxystyrene monomers may be copolymerized with each other. The ratio of monomer/other vinyl monomer (X) is suitably from 1/10 to 20/1 in terms of molar ratio.
ビニル系単量体(X)の割合がヒドロキシスチレン系単
量体より10倍量(モル比)を超えるとポリヒドロキシ
スチレン系単量体の効果が発揮されないので好ましくな
く、ビニル系単量体(X)の割合が1/20未満では、
共重合させる効果が発揮されないので、あえてビニル系
単量体(X)と共重合させる必要はない。If the proportion of the vinyl monomer (X) exceeds 10 times the amount (molar ratio) of the hydroxystyrene monomer, the effect of the polyhydroxystyrene monomer will not be exhibited, which is undesirable. If the ratio of X) is less than 1/20,
Since the effect of copolymerization is not exhibited, there is no need to intentionally copolymerize with the vinyl monomer (X).
従って、本発明においてはこのようなビニル系単量体(
X)の個数はm≧0である。Therefore, in the present invention, such vinyl monomers (
The number of X) is m≧0.
またヒドロキシスチレン系単量体の置換基については、
以下のようなものが挙げられる。Regarding the substituents of hydroxystyrene monomers,
Examples include:
(イ)
ここでMはアルカリ金属またはアルカリ土類金属であり
、例えばLi、Na、K、Mg、Ca、Sr、Ba等が
適当である。スルホン基の導入は発煙硫酸または無水硫
酸などをスルホン化剤として用いる通常のスルホン化法
により達成できる。(a) Here, M is an alkali metal or an alkaline earth metal, and suitable examples include Li, Na, K, Mg, Ca, Sr, and Ba. Introduction of a sulfone group can be achieved by a conventional sulfonation method using fuming sulfuric acid or sulfuric anhydride as a sulfonation agent.
(ロ)
ここでR4〜R8は同種または異種であって直鎖または
分岐鎖アルキル基、アルキル誘導体基、芳香族基または
H、さらにR6とR7はN基とで環を形成していてもか
まわない。また、Y2−は、ハロゲンイオン、有機酸ア
ニオン、無機酸アニオンなどの対イオンを示す。(b) Here, R4 to R8 may be the same or different, and may be a linear or branched alkyl group, an alkyl derivative group, an aromatic group, or H, and R6 and R7 may form a ring with an N group. do not have. Moreover, Y2- represents a counter ion such as a halogen ion, an organic acid anion, or an inorganic acid anion.
ここで、直鎖または分岐鎖アルキル基としては、炭素数
1〜36のものが挙げられ、アルキル誘導体基としては
、ヒドロキシアルキル基、アミノアルキル基、ホスホア
ルキル基、メルカプトアルキル基等が挙げられ、芳香族
基としては炭素数1〜16の直鎖、分岐鎖アルキル基で
置換されたベンジル基等が挙げられる。好ましくは、直
鎖または分岐鎖アルキル基、ヒドロキシアルキル基、あ
るいは炭素数1〜5の直鎖又は分岐鎖アルキル基で置換
された芳香族基が挙げられる。上記第3級アミノ基の導
入は、例えばジアルキルアミンとホルムアルデヒドとを
用いるマンニッヒ反応により容易に第4級アンモニウム
塩基の導入は、例えば上記第3級アミノ化物に対するハ
ロゲン化アルキルによるメンシュトキン反応により容易
に
(ハ)
ここでR4、R5は前記に同じであり、R9〜R12は
同種または異種であって、直鎖または分岐鎖アルキル基
、アルキル誘導体基、芳香族基、またはHを表わす。ま
た、WはSまたはOであり、qは0又は1、rは0、1
又は2を示す。ここで直鎖または分岐鎖アルキル基とし
ては炭素数1〜36のものが、アルキル誘導体基として
はヒドロキシアルキル基、アミノアルキル基、メルカプ
トアルキル基、ホスホアルキル基等が挙げられ、芳香族
基としては炭素数1〜16の直鎖または分岐鎖アルキル
基で置換されたフェニル基が挙げられる。好ましくは炭
素数18の直鎖又は分岐鎖アルキル基、ヒドロキシアル
キル基、あるいは炭素数1〜5の直鎖または分岐鎖アル
キル基で置換された芳香族基が挙げられる。式(ハ−1
)で表されるものは例えば特開昭53−71190号公
報に開示されているように、ヒドロキシスチレン系共重
合体をメチロール化した後にリン酸またはリン酸エステ
ル基導入体と反応させることによって得られる。式(ハ
−2)で表されるヒドロキシスチレン系共重合体は例え
ば特開昭53−47489号公報に開示されているよう
に、ヒドロキシスチレン系共重合体をまずハロゲン化ま
たはハロメチル化し、それに3価のリン化合物を反応(
アルプゾフ反応)させ、ついでそれを熱転位させること
によって得られる。Here, examples of straight-chain or branched alkyl groups include those having 1 to 36 carbon atoms, and examples of alkyl derivative groups include hydroxyalkyl groups, aminoalkyl groups, phosphoalkyl groups, mercaptoalkyl groups, etc. Examples of the aromatic group include a benzyl group substituted with a straight chain or branched alkyl group having 1 to 16 carbon atoms. Preferred examples include straight-chain or branched-chain alkyl groups, hydroxyalkyl groups, or aromatic groups substituted with straight-chain or branched-chain alkyl groups having 1 to 5 carbon atoms. The above-mentioned tertiary amino group can be easily introduced by, for example, the Mannich reaction using a dialkylamine and formaldehyde, and the quaternary ammonium base can be easily introduced by, for example, the Menshutkin reaction of the above-mentioned tertiary aminated compound with an alkyl halide ( c) Here, R4 and R5 are the same as above, and R9 to R12 are the same or different and represent a linear or branched alkyl group, an alkyl derivative group, an aromatic group, or H. In addition, W is S or O, q is 0 or 1, r is 0 or 1
or 2. Here, straight-chain or branched-chain alkyl groups include those having 1 to 36 carbon atoms, examples of alkyl derivative groups include hydroxyalkyl groups, aminoalkyl groups, mercaptoalkyl groups, phosphoalkyl groups, etc., and aromatic groups include Examples include phenyl groups substituted with straight chain or branched alkyl groups having 1 to 16 carbon atoms. Preferred examples include a straight-chain or branched alkyl group having 18 carbon atoms, a hydroxyalkyl group, or an aromatic group substituted with a straight-chain or branched alkyl group having 1 to 5 carbon atoms. Formula (Ha-1
) is obtained by methylolizing a hydroxystyrene copolymer and then reacting it with a phosphoric acid or phosphate ester group-introduced product, as disclosed in JP-A-53-71190, for example. It will be done. The hydroxystyrene copolymer represented by formula (H-2) is obtained by first halogenating or halomethylating the hydroxystyrene copolymer, and then adding 3 Reacts with phosphorus compounds of valence (
Arpusov reaction) and then thermal rearrangement.
(ニ)
ここでR4、R5は前記に同じであり、R13、R14
、R15は同種または異種であって、直鎖または分岐鎖
アルキル基、アルキル誘導体基、芳香族基、またはHを
表わす。またSは0又は1を示す。また、Y3−はハロ
ゲンイオン、有機酸アニオン、無機酸アニオンなどの対
イオンを示す。(d) Here, R4 and R5 are the same as above, and R13 and R14
, R15 are the same or different and represent a linear or branched alkyl group, an alkyl derivative group, an aromatic group, or H. Further, S represents 0 or 1. Moreover, Y3- represents a counter ion such as a halogen ion, an organic acid anion, or an inorganic acid anion.
このホスホニウム基を含むヒドロキシスチレン系共重合
体の製造は例えば特開昭61−34444号公報に示さ
れているように、ハロゲン化水素とホルムアルデヒドと
を作用させて、ハロゲノメチル化(例えば−CH2Cl
化)を行ない、次いで3価の亜リン酸エステル類を作用
すれば容易に得られる。The production of this hydroxystyrene copolymer containing a phosphonium group is, for example, as shown in JP-A No. 61-34444, by reacting hydrogen halide with formaldehyde, resulting in halogenomethylation (for example, -CH2Cl
) and then treated with trivalent phosphite.
(ホ)
ここでY1、Y4はハロゲンを、R4、R5、R6は前
記に同じ。tは0又は1を示す。(E) Here, Y1 and Y4 are halogens, and R4, R5, and R6 are the same as above. t indicates 0 or 1.
(ヘ)その他に、炭素数1〜18のアルキル基もしくは
アリール基が挙げられる。(f) Other examples include alkyl groups or aryl groups having 1 to 18 carbon atoms.
一般式(I)において、前記のヒドロキシスチレン系単
量体の置換基であるY、Zの個数は重合体中の平均値で
、0≦k≦2、0≦p≦2であり、また、OHの個数は
0<u≦2である。In the general formula (I), the number of substituents Y and Z of the hydroxystyrene monomer is an average value in the polymer, and is 0≦k≦2, 0≦p≦2, and The number of OH is 0<u≦2.
本発明における有機バインダー成分として用いることの
できるヒドロキシスチレン系共重合体及び/又はその誘
導体はその重量平均分子量が1,000〜200万の範
囲に、好ましくは1,000〜100万の範囲である。The hydroxystyrene copolymer and/or its derivative that can be used as the organic binder component in the present invention has a weight average molecular weight in the range of 1,000 to 2,000,000, preferably in the range of 1,000 to 1,000,000. .
この理由は有機高分子の分子量が本発明の効果に影響を
与え、分子量が1,000未満の低分子体では導電性粉
末の酸化安定性が得られにくく、反面分子量が200万
を超えると良好な導電性が得られにくい。このようなも
のを得るには、一般式(I)で表される繰り返し単位は
、通常n≧3である。The reason for this is that the molecular weight of the organic polymer affects the effect of the present invention, with low molecular weight substances having a molecular weight of less than 1,000, it is difficult to obtain oxidation stability of the conductive powder, while on the other hand, when the molecular weight exceeds 2 million, it is good. It is difficult to obtain good conductivity. In order to obtain such a product, the repeating unit represented by the general formula (I) is usually n≧3.
アミノ基、リン酸基、スルホン基等の極性基(水酸基、
芳香環は含まない)は有機高分子の金属粉末との親和性
、反応性を高める点で特に重要であり、その好ましい極
性基密度の範囲は、分子量500単位当たり平均0.0
1〜5個の間にある。極性基密度が0.01未満だと金
属粉末との親和性が悪くて問題となり、5個を超えると
得られるペーストの耐食性が低下して問題となるからで
ある。導電性粉末の耐食性向上の点からはアミノ基系、
メチロール基及びリン系の極性基が好ましい。水酸基は
金属粉末の耐食性向上及び絶縁層との密着性向上にとっ
て重要であり、直接置換基としてついていた方が、また
その数が多い方が効果がよく発揮されるので好ましい。Polar groups such as amino groups, phosphoric acid groups, sulfone groups (hydroxyl groups,
(does not contain aromatic rings) is particularly important in terms of increasing the affinity and reactivity of organic polymers with metal powders, and the preferred range of polar group density is an average of 0.0 per 500 units of molecular weight.
Between 1 and 5. If the polar group density is less than 0.01, the affinity with the metal powder will be poor, which will cause a problem, and if it exceeds 5, the corrosion resistance of the resulting paste will decrease, which will cause a problem. From the point of view of improving the corrosion resistance of conductive powder, amino-based
A methylol group and a phosphorus-based polar group are preferred. The hydroxyl group is important for improving the corrosion resistance of the metal powder and the adhesion with the insulating layer, and it is preferable that the hydroxyl group is directly attached as a substituent, or that a large number of hydroxyl groups are attached because the effect is better exhibited.
上記の有機高分子の分子量、構成単位、極性基の種類と
密度、主鎖の種類等の因子は本発明の導電性ペーストの
バインダーにとって本質的役割を果たす重要な因子であ
る。Factors such as the molecular weight, structural unit, type and density of polar groups, and type of main chain of the organic polymer described above are important factors that play an essential role for the binder of the conductive paste of the present invention.
ヒドロキシスチレン系共重合体及びその誘導体のほとん
どは熱可塑性樹脂なので、熱硬化性樹脂を併用すること
が好ましい。熱硬化性樹脂を用いる場合の配合割合は目
的に応じて異なってくるが、導電性粉末100重量部に
対しヒドロキシスチレン系共重合体及び/又はその誘導
体が0.1〜60重量部、好ましくは1〜45重量部、
更に好ましくは5〜35重量部の範囲であり、かつ熱硬
化性樹脂とヒドロキシスチレン系共重合体及び/又はそ
の誘導体との和が5〜85重量部であることが好ましい
。Since most of the hydroxystyrene copolymers and their derivatives are thermoplastic resins, it is preferable to use thermosetting resins in combination. The blending ratio when using a thermosetting resin varies depending on the purpose, but the hydroxystyrene copolymer and/or its derivative is preferably 0.1 to 60 parts by weight per 100 parts by weight of the conductive powder. 1 to 45 parts by weight,
More preferably, the amount is in the range of 5 to 35 parts by weight, and the sum of the thermosetting resin and the hydroxystyrene copolymer and/or its derivative is preferably 5 to 85 parts by weight.
本発明に有効に用いられる熱硬化性樹脂は、フェノール
系樹脂、ユリア樹脂、アミノ樹脂、アルキッド樹脂、ケ
イ素樹脂、フラン樹脂、不飽和ポリエステル樹脂、エポ
キシ樹脂、ポリウレタン樹脂等の公知の熱硬化性樹脂を
用いることができる。Thermosetting resins that can be effectively used in the present invention include known thermosetting resins such as phenolic resins, urea resins, amino resins, alkyd resins, silicone resins, furan resins, unsaturated polyester resins, epoxy resins, and polyurethane resins. can be used.
特にフェノール系樹脂、アミノ樹脂、エポキシ樹脂が好
ましい。Particularly preferred are phenolic resins, amino resins, and epoxy resins.
フェノール系樹脂としては、フェノール、クレゾール、
キシレノール、p−アルキルフェノール、クロルフェノ
ール、ビスフェノールA、フェノールスルホン酸、レゾ
ルシンなどのフェノール性水酸基を有するものにホルマ
リン、フルフラールなどのアルデヒド類を付加、縮合し
た樹脂を挙げることができる。特にレゾール型フェノー
ル系樹脂が好ましい。ノボラック型フェノール系樹脂を
用いる場合はヘキサメチレンテトラミンを併用すること
が好ましい。Examples of phenolic resins include phenol, cresol,
Examples include resins obtained by adding and condensing aldehydes such as formalin and furfural to those having a phenolic hydroxyl group such as xylenol, p-alkylphenol, chlorophenol, bisphenol A, phenolsulfonic acid, and resorcinol. Particularly preferred are resol type phenolic resins. When using a novolac type phenolic resin, it is preferable to use hexamethylenetetramine together.
アミノ樹脂としては、尿素、メラミン、グアナミン、ア
ニリン、スルホンアミドなどのアミノ基にホルマリンを
付加縮合した樹脂を挙げることができ、好ましくはアル
キルエーテル化したメラミン樹脂である。Examples of the amino resin include resins in which formalin is added and condensed to amino groups such as urea, melamine, guanamine, aniline, and sulfonamide, and preferably melamine resins in which formalin is added and condensed with an alkyl ether.
アミノ樹脂の中ではアルキルエーテル化メラミン樹脂が
有効で、重量平均分子量が500以上5万以下の範囲で
かつアルキルエーテル化度が10%以上95%以下(1
00%でトリアジン環1ユニットに対し6個のアルキル
エーテル基が導入される)の範囲が好ましい。Among amino resins, alkyl etherified melamine resins are effective, with a weight average molecular weight in the range of 500 to 50,000 and a degree of alkyl etherification of 10% to 95% (1
00%, six alkyl ether groups are introduced into one triazine ring unit).
上記のアミノ樹脂を用いる場合は硬化反応促進のため、
公知の酸触媒を介在させてもよい。酸性触媒としては、
塩酸、リン酸等の鉱酸の他、リノール酸、オレイン酸等
の有機脂肪酸、オレイン酸フェノール、リノール酸フェ
ノール等の1価又は多価フェノール付加物、シュウ酸、
酒石酸、パラトルエンスルホン酸またはそのアミン塩な
どの有機酸等、公知の酸が挙げられる。When using the above amino resin, to accelerate the curing reaction,
A known acid catalyst may be used. As an acidic catalyst,
In addition to mineral acids such as hydrochloric acid and phosphoric acid, organic fatty acids such as linoleic acid and oleic acid, monohydric or polyhydric phenol adducts such as phenol oleate and phenol linoleate, oxalic acid,
Known acids include organic acids such as tartaric acid, para-toluenesulfonic acid, or amine salts thereof.
エポキシ樹脂としては、ビスフェノール類のジエポキシ
ドが好ましく、例えばシェル化学社製エピコート827
、828、834、1001、1002、1004、1
007、1009、ダウケミカル社製 DER 330
、331、332、334、335、336、337、
660、661、662、667、668、669、チ
バガイギー社製アラルダイト GY 250、260、
280、6071、6084、6097、6099、J
ONES DABNEY社製 EPI−RE 2510
、5101、大日本インキ化学社製エピクロン810、
1000、1010、3010(いずれも商品名)や旭
電化社製EPシリーズがある。さらにエポキシ樹脂とし
て、平均エポキシ基数3以上の、例えばノボラック・エ
ポキシ樹脂も使用することができる。これらのノボラッ
ク・エポキシ樹脂としては、分子量500以上のものが
適している。このようなノボラック・エポキシ樹脂で工
業生産されているものとしては、例えば次のようなもの
がある。チバガイギー社製アラルダイト EPN 11
38、1139、ECN 1273、1280、129
9、ダウケミカル社製 DEN 431、438、シェ
ル化学社製エピコート152、154、ユニオンカーバ
イト社製 ERR−0100、ERRB−0447、E
RLB−0488、日本化薬社製 EOCN シリーズ
等がある。また、必要に応じてさらにエポキシ樹脂の硬
化触媒や希釈剤を使用することができる。As the epoxy resin, bisphenol diepoxides are preferred, such as Epicoat 827 manufactured by Shell Chemical Co., Ltd.
, 828, 834, 1001, 1002, 1004, 1
007, 1009, DER 330 manufactured by Dow Chemical Company
, 331, 332, 334, 335, 336, 337,
660, 661, 662, 667, 668, 669, Ciba Geigy Araldite GY 250, 260,
280, 6071, 6084, 6097, 6099, J
EPI-RE 2510 manufactured by ONES DABNEY
, 5101, Epicron 810 manufactured by Dainippon Ink Chemical Co., Ltd.
There are 1000, 1010, 3010 (all product names) and the EP series manufactured by Asahi Denka. Further, as the epoxy resin, it is also possible to use a novolak epoxy resin having an average number of epoxy groups of 3 or more, for example. As these novolac epoxy resins, those having a molecular weight of 500 or more are suitable. Examples of industrially produced novolak epoxy resins include the following: Ciba Geigy Araldite EPN 11
38, 1139, ECN 1273, 1280, 129
9. DEN 431, 438 manufactured by Dow Chemical Company, Epicote 152, 154 manufactured by Shell Chemical Company, ERR-0100, ERRB-0447, E manufactured by Union Carbide Company.
RLB-0488, Nippon Kayaku Co., Ltd. EOCN series, etc. Moreover, a curing catalyst and a diluent for the epoxy resin can be further used as necessary.
エポキシ樹脂の硬化触媒としては、ジエチレン・トリア
ミン、トリエチレン・テトラミン、テトラメチレン・ペ
ンタミンなどの脂肪族アミン、ベンジルジメチルアミン
、ジアミノジフェニルメタン、ジアミノジフェニルスル
ホンなどの芳香族アミン、無水マレイン酸、無水フタル
酸、ヘキサヒドロフタル酸無水物、メチルナジック酸無
水物などの酸無水物、p−ジメチルアミノベンゾアルデ
ヒド、三フッ化ホウ素・ピペリジン錯体などを用いるこ
とができる。エポキシ樹脂の希釈剤としては、n−ブチ
ルグリシジルエーテル、オクチレンオキサイド、フェニ
ルグリシジルエーテル、スチレンオキサイド、アリルグ
リシジルエーテル、メタアクリルグリシジルなどの反応
性希釈剤、ジブチルフタレート、ジオクチルフタレート
、トリクレジルホスフェート、トリアセテート、キシレ
ン、ヒマシ油、パイン油などの非反応性希釈剤、アルキ
ル(ノニル)フェノール、ポリグリコール、ポリサルフ
ァイド、スチレンジアリルフタレート、ε−カプロラク
タム、ブチロラクトンなどの準反応性希釈剤を用いるこ
とができる。Epoxy resin curing catalysts include aliphatic amines such as diethylene triamine, triethylene tetramine, and tetramethylene pentamine, aromatic amines such as benzyldimethylamine, diaminodiphenylmethane, and diaminodiphenylsulfone, maleic anhydride, and phthalic anhydride. , hexahydrophthalic anhydride, methylnadic anhydride, p-dimethylaminobenzaldehyde, boron trifluoride/piperidine complex, and the like can be used. Examples of diluents for epoxy resins include reactive diluents such as n-butyl glycidyl ether, octylene oxide, phenyl glycidyl ether, styrene oxide, allyl glycidyl ether, methacryl glycidyl, dibutyl phthalate, dioctyl phthalate, tricresyl phosphate, Non-reactive diluents such as triacetate, xylene, castor oil, pine oil, semi-reactive diluents such as alkyl(nonyl)phenols, polyglycols, polysulfides, styrene diaryl phthalate, ε-caprolactam, butyrolactone can be used.
本発明に用いられる前述の熱硬化性樹脂は単独あるいは
2種以上混合して使用してもよい。The above-mentioned thermosetting resins used in the present invention may be used alone or in combination of two or more.
本発明におけるバインダーの配合割合は、導電性粉末1
00重量部に対して5〜85重量部、好ましくは10〜
45重量部であり、5重量部未満の場合はバインダーの
絶対量が不足して、得られる組成物の流動性が悪くなり
、印刷性が低下すると共に加熱硬化時に導電性粉末が酸
化されやすくなり、導電性の低下をまねく。バインダー
の量が85重量部を超えるときは逆に導電性粉末の絶対
量が不足し、回路を形成するのに必要な導電性が得られ
ない。The blending ratio of the binder in the present invention is 1 part conductive powder
00 parts by weight, 5 to 85 parts by weight, preferably 10 to 85 parts by weight
If the amount is less than 5 parts by weight, the absolute amount of the binder is insufficient, resulting in poor fluidity of the resulting composition, resulting in poor printability and the conductive powder being easily oxidized during heat curing. , leading to a decrease in conductivity. Conversely, when the amount of binder exceeds 85 parts by weight, the absolute amount of conductive powder is insufficient, and the conductivity required to form a circuit cannot be obtained.
本発明において添加剤として用いられる還元剤は、公知
の還元剤を1種又は2種以上用いることができる。具体
的には、例えば、ヒドロキノン、ビニルハイドロキノン
、メチルハイドロキノン、クロルハイドロキノン、フェ
ニルハイドロキノン、t−ブチルハイドロキノン、カテ
コールなどのジヒドロキシベンゼン環を有する化合物、
ビニルハイドロキノンのホモポリマー及びコーポリマー
、ハイドロキノン/ホルムアルデヒド系フェノール樹脂
、カテコール/ホルムアルデヒド系フェノール樹脂、1
,4−ジヒドロキシナフタレン/ホルムアルデヒド樹脂
、ポリビニルカテコール樹脂などのジヒドロキシベンゼ
ン環を有する樹脂、o−アミノフェノール、m−アミノ
フェノール、2−アミノ−4−メチルフェノール、2−
アミノ−4−ニトロフェノール、2−アミノ−4−クロ
ロフェノールなどのアミノフェノール類、2,2’−ジ
ピリジル、2,2’−ジピコリル、2,2’−ジキノリ
ルなどのピリジル誘導体、L−アスコルビン酸、亜リン
酸、次亜リン酸などのリン系化合物、亜リン酸ジメチル
、亜リン酸トリメチル、ホスフィン誘導体などの亜リン
酸誘導体などが挙げられる。As the reducing agent used as an additive in the present invention, one or more known reducing agents can be used. Specifically, for example, compounds having a dihydroxybenzene ring such as hydroquinone, vinylhydroquinone, methylhydroquinone, chlorohydroquinone, phenylhydroquinone, t-butylhydroquinone, and catechol;
Vinyl hydroquinone homopolymers and copolymers, hydroquinone/formaldehyde phenolic resins, catechol/formaldehyde phenolic resins, 1
, 4-dihydroxynaphthalene/formaldehyde resin, resin having a dihydroxybenzene ring such as polyvinylcatechol resin, o-aminophenol, m-aminophenol, 2-amino-4-methylphenol, 2-
Aminophenols such as amino-4-nitrophenol and 2-amino-4-chlorophenol, pyridyl derivatives such as 2,2'-dipyridyl, 2,2'-dipicolyl, and 2,2'-diquinolyl, L-ascorbic acid , phosphorous compounds such as phosphorous acid and hypophosphorous acid, phosphorous acid derivatives such as dimethyl phosphite, trimethyl phosphite, and phosphine derivatives.
これらのうち特に限定されものではないが、好ましくは
ジヒドロキシベンゼン環を有する化合物、アミノフェノ
ール類、L−アスコルビン酸などである。Among these, compounds having a dihydroxybenzene ring, aminophenols, L-ascorbic acid and the like are preferred, although they are not particularly limited.
還元剤の添加量は、通常0.01〜10重量%、好まし
くは0.1〜5重量%、さらに好ましくは0.1〜2重
量%である。10重量%をこえると密着性が低下し、0
.01重量%未満であると添加効果が薄いので好ましく
ない。The amount of the reducing agent added is usually 0.01 to 10% by weight, preferably 0.1 to 5% by weight, and more preferably 0.1 to 2% by weight. If it exceeds 10% by weight, the adhesion will decrease and 0.
.. If it is less than 0.01% by weight, the effect of addition will be weak, so it is not preferable.
本発明においては、金属キレート剤を添加剤として用い
てもよい。金属キレート剤とは、金属イオンを選択吸着
するものであり、金属イオンに配位してキレート化合物
を作るものであれば特に限定されるものではなく、金属
キレート剤として一般に使用されているものをそのまま
用いることができる。例えば各種のアミン類としてo−
アミノフェノールなどの環状アミン、モノエタノールア
ミン、ジエタノールアミン、トリエタノールアミン、エ
チレンジアミン、トリエチレンジアミン、トリエチレン
テトラミンなどの脂肪族アミン、EDTA(エチレンジ
アミン四酢酸)、NTA(ニトリロ三酢酸)、CDTA
(t−1,2−シクロヘキサンジアミン−N,N,N’
,N’−四酢酸水和物)、DTPA(ジエチレントリア
ミン五酢酸)などのポリアミノカルボン酸類、ジビニル
ベンゼン/グリシジルメタクリレート/スチレン共重合
体のようなグリシジルメタクリレート共重合体、ポリビ
ニルアミンおよびビニルアミン/ビニルアルコール共重
合体等の誘導体、o−ニトロフェノール樹脂、高分子エ
ステルにヒドロキシルアミンを反応させて得られる高分
子ヒドロキサム酸、コハク酸、酢酸、プロピオン酸、ト
リカルバリル酸、フミン酸、フミン酸アンモニウム、ニ
トロフミン酸などのカルボン酸、クエン酸、乳酸、酒石
酸、グリセリン酸、リンゴ酸、グルコン酸、トロパ酸、
ベンジル酸、マニデル酸、アトロラクチン酸、グリコー
ル酸、アスコルビン酸などのヒドロキシカルボン酸、サ
リチル酸、サリチルアミド、サリチルヒドロキシサム酸
、サリチルアルドキシム、サリチルヒドラジド、N,N
’−ビスサリチロイルヒドラジンなどのサリチル酸系化
合物、フェニルアラニン、チロシン、アントラニル酸、
トリプトファン、ヒスチジン、アスパラギン酸、グルタ
ミン酸、リジン、アルギニン等のアミノ酸、プロリン、
ヒドロキシプロリン等のイミノ酸、ニコチン酸等のピリ
ジンカルボン酸、ヒドラジン、フェニルヒドラジン、ヒ
ドラゾベンゼン等のヒドラジン類、一塩酸ヒドラジン、
硫酸ヒドラジン等のヒドラジニウム塩、ラウリルメルカ
プタンなどが挙げられる。In the present invention, a metal chelating agent may be used as an additive. A metal chelating agent is one that selectively adsorbs metal ions, and is not particularly limited as long as it coordinates with metal ions to form a chelate compound. It can be used as is. For example, as various amines, o-
Cyclic amines such as aminophenol, aliphatic amines such as monoethanolamine, diethanolamine, triethanolamine, ethylenediamine, triethylenediamine, triethylenetetramine, EDTA (ethylenediaminetetraacetic acid), NTA (nitrilotriacetic acid), CDTA
(t-1,2-cyclohexanediamine-N,N,N'
, N'-tetraacetic acid hydrate), polyaminocarboxylic acids such as DTPA (diethylenetriaminepentaacetic acid), glycidyl methacrylate copolymers such as divinylbenzene/glycidyl methacrylate/styrene copolymer, polyvinylamine and vinylamine/vinyl alcohol copolymers. Derivatives such as polymers, o-nitrophenol resin, polymer hydroxamic acid obtained by reacting polymer ester with hydroxylamine, succinic acid, acetic acid, propionic acid, tricarballylic acid, humic acid, ammonium humate, nitrofumic acid Carboxylic acids, citric acid, lactic acid, tartaric acid, glyceric acid, malic acid, gluconic acid, tropic acid, etc.
Hydroxycarboxylic acids such as benzylic acid, manideric acid, atrolactic acid, glycolic acid, ascorbic acid, salicylic acid, salicylamide, salicylhydroxysamic acid, salicylaldoxime, salicylhydrazide, N,N
Salicylic acid compounds such as '-bissalicyloylhydrazine, phenylalanine, tyrosine, anthranilic acid,
Amino acids such as tryptophan, histidine, aspartic acid, glutamic acid, lysine, arginine, proline,
Imino acids such as hydroxyproline, pyridine carboxylic acids such as nicotinic acid, hydrazines such as hydrazine, phenylhydrazine, and hydrazobenzene, hydrazine monohydrochloride,
Examples include hydrazinium salts such as hydrazine sulfate, lauryl mercaptan, and the like.
本発明における金属キレート剤としては、前記のように
特に限定されるものではないが、好ましくは本発明の導
電性ペーストに用いる溶剤に溶けやすいものが用いられ
る。The metal chelating agent in the present invention is not particularly limited as described above, but preferably one that is easily soluble in the solvent used in the conductive paste of the present invention is used.
金属キレート剤の添加量は通常0.01〜5重量%、好
ましくは0.05〜2重量%、さらに好ましくは0.1
〜1重量%である。添加量が0.01重量%未満である
と添加効果が充分でなく、5重量%を超えると密着性の
低下、耐マイグレーション性の低下をまねくので好まし
くない。The amount of metal chelating agent added is usually 0.01 to 5% by weight, preferably 0.05 to 2% by weight, more preferably 0.1% by weight.
~1% by weight. If the amount added is less than 0.01% by weight, the addition effect will not be sufficient, and if it exceeds 5% by weight, this will lead to a decrease in adhesion and migration resistance, which is not preferable.
本発明の導電性ペーストには、導電性粉末の酸化防止又
は分散性付与のため、飽和・不飽和脂肪酸又はその金属
塩や高級脂肪族アミンの中から選ばれる1種又は2種以
上の添加剤を用いてもよい。The conductive paste of the present invention contains one or more additives selected from saturated/unsaturated fatty acids, metal salts thereof, and higher aliphatic amines in order to prevent oxidation or impart dispersibility to the conductive powder. may also be used.
好ましい飽和脂肪酸としては、例えばパルミチン酸、ス
テアリン酸、アラキン酸などが挙げられ、好ましい不飽
和脂肪酸としては、例えばオレイン酸、リノール酸など
が挙げられる。それらの金属塩としては、例えばナトリ
ウム塩、カリウム塩などが挙げられる。また、不飽和脂
肪酸を60%以上含有するような、例えば大豆油、ゴマ
油、オリーブ油、サフラワー油などの植物油を用いるこ
とも可能である。添加量は導電性粉末100重量部に対
して添加剤の総和が0.1〜20重量部、好ましくは0
.5〜10重量部である。0.1重量部未満の場合は添
加効果がほとんど現れず、20重量部を超える場合は添
加量に見合う分散性の向上が得られないばかりでなく、
逆に得られる塗膜の導電性やその耐久性が低下してしま
う。Preferred saturated fatty acids include, for example, palmitic acid, stearic acid, and arachidic acid, and preferred unsaturated fatty acids include, for example, oleic acid and linoleic acid. Examples of such metal salts include sodium salts and potassium salts. It is also possible to use vegetable oils containing 60% or more of unsaturated fatty acids, such as soybean oil, sesame oil, olive oil, and safflower oil. The additive amount is 0.1 to 20 parts by weight, preferably 0.1 to 20 parts by weight, based on 100 parts by weight of the conductive powder.
.. It is 5 to 10 parts by weight. If the amount is less than 0.1 parts by weight, the effect of addition will hardly be seen, and if it exceeds 20 parts by weight, not only will the improvement in dispersibility commensurate with the amount added be not achieved,
On the contrary, the conductivity and durability of the resulting coating film are reduced.
また、本発明に用いられる高級脂肪族アミンはアミノ基
を有する有機化合物であれば何でも使用可能であり、他
の置換基をもっていてもよい。例えば、α−オレフィン
から導かれるヒドロキシル基をもったアミンであっても
よい。しかし、導電性粉末と共に用いることの必要性か
ら、例えば溶剤に溶けない固体のものなどは使用できな
い。好ましいものは炭素数8〜22の高級脂肪族アミン
である。Moreover, any organic compound having an amino group can be used as the higher aliphatic amine used in the present invention, and may have other substituents. For example, it may be an amine having a hydroxyl group derived from an α-olefin. However, because of the need to use it together with conductive powder, for example, solid materials that do not dissolve in solvents cannot be used. Preferred are higher aliphatic amines having 8 to 22 carbon atoms.
かかる高級アミンとしては、ステアリルアミン、パルミ
チルアミン、ペヘニルアミン、セチルアミン、オクチル
アミン、デシルアミン、ラウリルアミンのような飽和モ
ノアミン、オレイルアミンのような不飽和モノアミン、
ステアレルプロピレンジアミン、オレイルプロピレンジ
アミンのようなジアミン等が挙げられる。Such higher amines include saturated monoamines such as stearylamine, palmitylamine, phenylamine, cetylamine, octylamine, decylamine, laurylamine, unsaturated monoamines such as oleylamine,
Examples include diamines such as stearylpropylene diamine and oleylpropylene diamine.
本発明においては高級脂肪族アミンは、導電性粉末10
0重量部に対してその総和が0.1〜10重量部の割合
で用いられるのが好ましい。In the present invention, the higher aliphatic amine is used as a conductive powder 10
It is preferable that the total amount is 0.1 to 10 parts by weight based on 0 parts by weight.
本発明に用いる導電性粉末としては、銅粉末、銀粉末、
半田粉末、ニッケル粉末、アルミニウム粉末等の金属粉
末、及び表面に上記金属の被膜層を有する粉末が挙げら
れる。その形態は樹枝状、フレーク状、球状、不定型の
いずれの形態であっても良いが、平均粒子径は100μ
m以下であることが好ましく、1〜30μm程度がより
好ましい。The conductive powder used in the present invention includes copper powder, silver powder,
Examples include metal powders such as solder powder, nickel powder, and aluminum powder, and powders having a coating layer of the above metal on the surface. The shape may be dendritic, flaky, spherical, or amorphous, but the average particle size is 100 μm.
It is preferably less than m, more preferably about 1 to 30 μm.
30μmを超えると導電性粉末の高密度充填が難しくな
り、導電性が低下するとともに、印刷性が悪くなるから
である。上記導電性粉末の使用形態としては単独又は混
合系で使用できる。上記金属粉末の純度は高い方が好ま
しい。特に銅粉末については、回路基板の導体に用いら
れている銅箔又はめっき銅層の純度と一致するものが最
も好ましい。This is because if the thickness exceeds 30 μm, it becomes difficult to pack the conductive powder at a high density, resulting in decreased conductivity and poor printability. The above-mentioned conductive powder can be used alone or in a mixed system. The higher the purity of the metal powder, the better. In particular, the copper powder most preferably has a purity that matches the purity of the copper foil or plated copper layer used for the conductor of the circuit board.
また、本発明のヒドロキシスチレン系共重合体及び/又
はその誘導体の作用効果は金属銅粉末を用いた場合によ
り顕著に発現されるので、本発明は導電性銅ペーストの
製造にとって特に重要である。Furthermore, the effects of the hydroxystyrene copolymer and/or its derivatives of the present invention are more pronounced when metallic copper powder is used, so the present invention is particularly important for the production of conductive copper pastes.
導電性粉末の配合量は、硬化塗膜状態において50〜9
5重量%の範囲で用いられ、好ましくは60〜90重量
%、更に好ましくは70〜85重量%である。The amount of conductive powder is 50 to 9 in the cured coating state.
It is used in a range of 5% by weight, preferably 60 to 90% by weight, more preferably 70 to 85% by weight.
配合量が50重量%未満では十分な導電性が得られず、
逆に95重量%を超える時は導電性粉末が十分バインド
されず、得られる塗膜ももろくなり、塗膜の耐久性か低
下するとともにスクリーン印刷性も悪くなる。If the blending amount is less than 50% by weight, sufficient conductivity cannot be obtained,
On the other hand, when the amount exceeds 95% by weight, the conductive powder is not sufficiently bound and the resulting coating film becomes brittle, resulting in decreased durability and poor screen printability.
本発明の導電性ペーストを製造するには、例えば、まず
ヒドロキシスチレン系共重合体及び/又はその誘導体を
溶剤に溶かし、次いで熱硬化性樹脂と導電性粉末とを加
え、これをディスパーやボールミルや三本ロール等によ
り十分均一に混練して導電性ペーストを調製する。To produce the conductive paste of the present invention, for example, first dissolve the hydroxystyrene copolymer and/or its derivative in a solvent, then add the thermosetting resin and conductive powder, and process this using a disper, ball mill, or A conductive paste is prepared by sufficiently uniformly kneading with a triple roll or the like.
ここで用いることるできる溶剤としては、ベンゼン、ト
ルエン、ヘキサノン、ジオキサン、ソルベントナフサ、
工業用ガソリン、酢酸セロソルブ、エチルセロソルブ、
ブチルセロソルブ、ブチルセロソルブアセテート、ブチ
ルカルビトールアセテート、ジメチルホルムアミド、ジ
メチルアセトアミド、N−メチルピロリドン、イソプロ
ピルアルコール、ブタノールなどのアルコール系、メチ
ルエチルケトン、メチルイソブチルケトンなどのケトン
系等の公知の溶剤が挙げられる。溶剤の配合量は混練機
の種類、混線条件及び溶剤の種類によって異なってくる
。混練終了後のペースト粘度がスクリーン印刷の行なえ
る範囲で溶剤量を調製することが好ましい。Solvents that can be used here include benzene, toluene, hexanone, dioxane, solvent naphtha,
Industrial gasoline, cellosolve acetate, cellosolve ethyl,
Known solvents include alcohols such as butyl cellosolve, butyl cellosolve acetate, butyl carbitol acetate, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, isopropyl alcohol, butanol, and ketones such as methyl ethyl ketone and methyl isobutyl ketone. The amount of solvent blended varies depending on the type of kneader, cross-wire conditions, and type of solvent. It is preferable to adjust the amount of solvent so that the viscosity of the paste after kneading is within a range that allows screen printing.
本発明の導電性ペーストを用いて、回路基板上に電磁波
シールド層を設けた電磁波ノイズ対策用回路基板を作製
する方法は、例えば金属張積層板よりエッチドフォル法
によって形成させた導電回路上に加熱硬化型又は紫外線
硬化型の有機絶縁体をアースパターン部を除いて塗布し
て絶縁層を設け、絶縁体層上に本発明に係る導電性ペー
ストを用いて、スクリーン印刷によってアースパターン
に接続するように絶縁体層上のほぼ全面に導電性ペース
トを塗布し、これを加熱硬化させることにより、有効な
電磁波シールド層を有した電磁波ノイズ対策用回路基板
を作製することができる。この回路基板は静電シールド
層としても有効に活用することができる。A method for producing a circuit board for preventing electromagnetic noise by providing an electromagnetic shielding layer on a circuit board using the conductive paste of the present invention is, for example, to fabricate a circuit board for preventing electromagnetic noise by providing an electromagnetic shielding layer on the circuit board. An insulating layer is provided by applying a heat-curable or ultraviolet-curing organic insulator except for the ground pattern portion, and the conductive paste according to the present invention is used on the insulator layer and connected to the ground pattern by screen printing. By applying a conductive paste to almost the entire surface of the insulating layer and curing it by heating, it is possible to produce a circuit board for electromagnetic noise countermeasures having an effective electromagnetic shielding layer. This circuit board can also be effectively used as an electrostatic shield layer.
さらに本発明の導電性ペーストを回路基板の配線用の導
体として使用する方法は、従来と同様の方法が使用でき
る。塗布する絶縁基板は、ガラス・エポキシ樹脂基板、
紙、フェノール樹脂基板、セラミック基板、ポリカーボ
ネート樹脂基板、ポリエチレンテレフタレート樹脂基板
、ポリイミド樹脂基板、ポリオレフィン樹脂基板、塩化
ビニル樹脂基板、ポリエステル樹脂基板、ABS樹脂基
板、ポリメチルメタクリレート樹脂基板、メラミン樹脂
基板、フェノール樹脂基板、エポキシ樹脂基板、ガラス
基板などいずれてもよい。配線形成方法はスクリーン印
刷、凹版印刷、スプレー又はハケ塗り等により塗布する
方法を用いることができる。Further, the conductive paste of the present invention can be used as a conductor for wiring on a circuit board by a conventional method. The insulating substrates to be coated are glass/epoxy resin substrates,
Paper, phenolic resin substrate, ceramic substrate, polycarbonate resin substrate, polyethylene terephthalate resin substrate, polyimide resin substrate, polyolefin resin substrate, vinyl chloride resin substrate, polyester resin substrate, ABS resin substrate, polymethyl methacrylate resin substrate, melamine resin substrate, phenol Any of resin substrates, epoxy resin substrates, glass substrates, etc. may be used. As a wiring formation method, a coating method such as screen printing, intaglio printing, spraying, or brush coating can be used.
本発明において導電性塗膜とは、本発明の導電性ペース
トを乾燥硬化させて得られる1×10−2Ω・cm以下
の体積固有抵抗を有する硬化体もしくは硬化塗膜を意味
するものとする。In the present invention, the conductive coating film refers to a cured body or cured coating film having a volume resistivity of 1×10 −2 Ω·cm or less obtained by drying and curing the conductive paste of the present invention.
本発明の導電性ペーストは以下1)〜5)の特徴的作用
を有する。The conductive paste of the present invention has the following characteristic effects 1) to 5).
1)バインダー成分として用いるヒドロキシスチレン系
共重合体及び/又はその誘導体が金属表面との親和性、
反応性に優れるため、加熱硬化時に導電性粒子の接触部
以外の表面に緻密な保護膜が形成され、金属粉末の防錆
性が増加する。つまり、長期間にわたる導電性の維持が
可能となる。1) The hydroxystyrene copolymer and/or its derivative used as a binder component has affinity with the metal surface,
Due to its excellent reactivity, a dense protective film is formed on the surface of the conductive particles other than the contact area during heat curing, increasing the rust prevention properties of the metal powder. In other words, conductivity can be maintained for a long period of time.
2)1)の理由により回路基板上に塗布した場合、アー
スパターン部の銅箔に対する密着力が向上する。2) For the reason 1), when applied on a circuit board, the adhesion of the ground pattern portion to the copper foil is improved.
3)2)の理由により、還元剤を添加することにより電
気絶縁性の酸化皮膜の酸化物を還元しても、銅箔に対す
る密着力を維持することができる。従って、還元剤との
併用により、密着性を維持したままで導電性の維持、向
上が可能となる。3) For the reason 2), even if the oxide of the electrically insulating oxide film is reduced by adding a reducing agent, the adhesion to the copper foil can be maintained. Therefore, when used in combination with a reducing agent, it is possible to maintain and improve conductivity while maintaining adhesion.
4)ヒドロキシスチレン系共重合体及び/又はその誘導
体の作用により有機絶縁層との密着力が向上する。4) Adhesion to the organic insulating layer is improved by the action of the hydroxystyrene copolymer and/or its derivative.
5)ヒドロキシスチレン系共重合体及び/又はその誘導
体のキレート作用によりペースト状態での金属粉末の防
錆性が向上し、導電性の長期維持が可能となる。5) The chelating action of the hydroxystyrene copolymer and/or its derivative improves the rust prevention properties of the metal powder in a paste state, making it possible to maintain electrical conductivity for a long period of time.
以下、実施例及び比較例に基づいて本発明を更に詳細に
説明するが、本発明は係る実施例にのみ限定されるもの
ではない。実施例及び比較例において「部」とは「重量
部」を意味する。Hereinafter, the present invention will be explained in more detail based on Examples and Comparative Examples, but the present invention is not limited only to these Examples. In Examples and Comparative Examples, "parts" means "parts by weight."
ペースト調製・印刷
第1表に示す導電性粉末、第2表に示すヒドロキシスチ
レン系共重合体及び/又はその誘導体、第3表に示す熱
硬化性樹脂、第4表に示す還元剤、及びその他の添加剤
を第5表に示す組成となるようにディスパーや三本ロー
ルにより十分均一に混練して導電性ペーストを調製する
。得られた各導電性ペーストを用いて180〜250メ
ッシュのテトロン製スクリーンを装着したスクリーン印
刷機によって、予め有機絶縁層(太陽インキ社製S−2
22、HR−6)が40〜50μmの厚さに印刷.硬化
されたガラス.エポキシ樹脂基板(CEM−3)上に幅
2mm、全長36cmのパターンを印刷した。次に14
0〜160℃で10〜30分間加熱硬化し、厚さ20〜
30μmのペースト硬化膜を得た。Paste Preparation/Printing Conductive powders shown in Table 1, hydroxystyrene copolymers and/or derivatives thereof shown in Table 2, thermosetting resins shown in Table 3, reducing agents shown in Table 4, and others. A conductive paste is prepared by thoroughly and uniformly kneading the additives shown in Table 5 using a disperser or a triple roll. Using each of the obtained conductive pastes, an organic insulating layer (S-2 manufactured by Taiyo Ink Co., Ltd.
22, HR-6) was printed to a thickness of 40 to 50 μm. hardened glass. A pattern with a width of 2 mm and a total length of 36 cm was printed on an epoxy resin substrate (CEM-3). Next 14
Heat cured at 0 to 160℃ for 10 to 30 minutes to a thickness of 20 to
A paste cured film of 30 μm was obtained.
上記の過程で得た導電回路について諸特性を調べた結果
を第6表に示す。Table 6 shows the results of examining various characteristics of the conductive circuit obtained through the above process.
導電性の測定
塗膜の導電性とは、加熱硬化された塗膜の体積固有抵抗
をデジタルマルチメーター(アドバンテスト社製 R6
551)を用いて2端子法により測定した値である。Measurement of conductivity The conductivity of a paint film is measured by measuring the volume resistivity of a heat-cured paint film using a digital multimeter (Advantest R6).
551) by the two-terminal method.
なお、体積固有抵抗の算出式を(1)式に示す。Note that the formula for calculating the volume resistivity is shown in formula (1).
R:電極間の抵抗値(Ω)
t:塗膜の厚さ(cm)
W:塗膜の幅(cm)
L:電極間の距離(cm)
耐湿性試験
塗膜の耐湿性とは、60℃、95%相対湿度の環境下で
500時間の放置試験を行ない、その前後での抵抗値の
変化率WRを(2)式により求めた。R: Resistance value between electrodes (Ω) t: Thickness of coating film (cm) W: Width of coating film (cm) L: Distance between electrodes (cm) Moisture resistance test Moisture resistance of a coating film is 60 A storage test was conducted for 500 hours in an environment of 95% relative humidity at 95% relative humidity, and the rate of change in resistance value WR before and after the test was determined using equation (2).
R0:試験前の塗膜の抵抗値(Ω)
R500:500時間試験後の抵抗値(Ω)WRの値に
より塗膜の耐湿性を次の如く表示する。R0: Resistance value of the coating film before the test (Ω) R500: Resistance value after the 500 hour test (Ω) The moisture resistance of the coating film is expressed as follows based on the value of WR.
A:WRが30%未満
B:WRが30%以上100%未満
C:WRが100%以上
初期密着性試験
塗膜の密着性には、硫酸/クエン酸アンモニウム(1:
1)の5%水溶液、40℃にて30秒間浸漬して表面酸
化皮膜を溶解後、ジェットエアーで風乾した金属銅表面
を有する銅泊及び有機絶縁層(太陽インキ社製 S−2
22、HR−6)上に本発明の導電性ペーストを20〜
30μmの厚さにスクリーン印刷し、硬化後JIS K
5400(1979)の碁盤目試験方法に準じて、塗
膜上に互いに直交する縦横11本ずつの平行線を1mm
の間隔で引いて、1cm2中に100個のます目ができ
るように碁盤目状の切り傷を付け、その上からセロハン
テープで塗膜を引き剥がした時に銅泊や有機絶縁層上に
残る塗膜の碁盤目個数を求めた。判定基準は次の通りで
ある。A: WR is less than 30% B: WR is 30% or more and less than 100% C: WR is 100% or more Initial adhesion test The adhesion of the coating film was determined using sulfuric acid/ammonium citrate (1:
After dissolving the surface oxide film by dipping in a 5% aqueous solution of 1) at 40°C for 30 seconds, a copper foil and organic insulating layer (manufactured by Taiyo Ink Co., Ltd. S-2) having a metallic copper surface was air-dried with jet air.
22, HR-6) with conductive paste of the present invention on top of 20~
Screen printed to a thickness of 30 μm and JIS K after curing
5400 (1979), 1 mm parallel lines of 11 vertical and horizontal lines perpendicular to each other were drawn on the coating film.
The coating film that remains on the copper foil or organic insulating layer when the coating film is peeled off using cellophane tape after making a grid-like cut so that there are 100 squares in 1 cm2. The number of pieces on the grid was calculated. The judgment criteria are as follows.
A:100/100
B:90/100以上〜100/100未満C:50/
100以上〜90/100未満D:0/100以上〜1
0/100未満はんだ試験後の密着性
試験基板表面に有機酸系のフラックスをはけで塗布した
後、260℃の溶融はんだ槽に10秒間浸漬した。基板
が室温に戻るまで放置した後、前記の方法で密着性試験
を行ない、前記の判定基準に従って判定した。A: 100/100 B: 90/100 or more to less than 100/100 C: 50/
100 or more - less than 90/100 D: 0/100 or more - 1
Adhesion test after solder test less than 0/100 Organic acid flux was applied to the surface of the substrate with a brush, and then immersed in a molten solder bath at 260° C. for 10 seconds. After the substrate was left to cool to room temperature, an adhesion test was conducted using the method described above, and judgment was made according to the criteria described above.
比較例
第6表に示す組成の導電性ペーストを調製し、実施例と
同様に基板に導体を形成した後、塗膜の体積固有抵抗を
測定し、耐湿性、耐熱性、印刷性、密着性、はんだ試験
後の密着性を調べた。結果を第6表に併せて示す。Comparative Example After preparing a conductive paste with the composition shown in Table 6 and forming a conductor on a substrate in the same manner as in the example, the volume resistivity of the coating film was measured, and the moisture resistance, heat resistance, printability, and adhesion were measured. , the adhesion was investigated after the solder test. The results are also shown in Table 6.
(以下余白)
第6表は本発明に係る導電性ペーストおよび導電性塗膜
の各種特性を比較例とともに示したものである。(The following is a blank space) Table 6 shows various characteristics of the conductive paste and conductive coating film according to the present invention, together with comparative examples.
本発明実施例No.1〜19の導電性ペーストはそれぞ
れ還元剤の配合により高い導電性が達成され、かつPH
S(ポリヒドロキシスチレン)又はその誘導体の配合に
より還元剤配合による密着力の低下が抑制され、優れた
密着性を維持できていることがわかる。Invention Example No. Each of the conductive pastes Nos. 1 to 19 achieves high conductivity by adding a reducing agent, and has a PH of
It can be seen that the addition of S (polyhydroxystyrene) or its derivative suppresses the decrease in adhesion caused by the addition of the reducing agent, and maintains excellent adhesion.
これらを含まない比較例No.20〜26のペーストは
上記のどちらかの物性が不足していることがわかる。Comparative example No. not including these. It can be seen that pastes Nos. 20 to 26 lack one of the above physical properties.
以上、本発明の新規な導電性ペーストを用いれば密着性
を維持したまま高い導電性の実現が可能であることがわ
かる。As described above, it is understood that high conductivity can be achieved while maintaining adhesion by using the novel conductive paste of the present invention.
本発明の導電性ペーストは上記のように特定の化学構造
を有する有機高分子、即ちヒドロキシスチレン系共重合
体及び/又はその誘導体をバインダー成分に用い、かつ
、還元剤を添加剤として配合したところに大きな特徴を
有している。本発明によると、ヒドロキシスチレン系共
重合体及び/又はその誘導体に導入する置換基の種類及
びその密度の調整によって、金属表面との親和性、反応
性を制御して導電性粉末の酸化安定性を向上させ、ひい
てはペーストの導電性を長期間にわたって維持すること
が可能である。さらには銅箔表面や絶縁層との密着性を
大幅に改善することが可能である。The conductive paste of the present invention uses an organic polymer having a specific chemical structure as described above, that is, a hydroxystyrene copolymer and/or its derivative as a binder component, and contains a reducing agent as an additive. It has major characteristics. According to the present invention, the oxidation stability of the conductive powder can be improved by controlling the affinity and reactivity with the metal surface by adjusting the type and density of substituents introduced into the hydroxystyrene copolymer and/or its derivative. It is possible to improve the conductivity of the paste and maintain the conductivity of the paste for a long period of time. Furthermore, it is possible to significantly improve the adhesion between the copper foil surface and the insulating layer.
従って、例えば本発明による導電性銅ペーストを用いれ
ば、従来の銅ペーストの大きな欠点とされていた耐久性
(酸化安定性)や基材との密着性の大幅な改善を図るこ
とが可能である。この新規な銅ペーストを利用すれば、
回路基板上に極めて信頼性が高く、かつ効果の大きい電
磁波シールド層を容易にそして安定的に形成することが
できる。Therefore, for example, by using the conductive copper paste of the present invention, it is possible to significantly improve the durability (oxidation stability) and adhesion to the substrate, which were considered to be major drawbacks of conventional copper pastes. . By using this new copper paste,
An extremely reliable and highly effective electromagnetic shielding layer can be easily and stably formed on a circuit board.
同様に、回路基板の配線用の導体として用いた場合にお
いても、信頼性の高い配線を形成することが可能である
。また、電子機器部品、回路部品の電極などにも有効に
使用できる。これらの効果は産業上極めて大きいもので
ある。Similarly, when used as a conductor for wiring on a circuit board, it is possible to form highly reliable wiring. It can also be effectively used as electrodes for electronic equipment parts and circuit parts. These effects are extremely significant industrially.
特許出願人 花王株式会社Patent applicant: Kao Corporation
Claims (3)
び 溶剤を必須成分とする導電性ペーストにおいて、該有機
バインダーが重量平均分子量1,000〜200万のヒ
ドロキシスチレン系共重合体及び/又はその誘導体を含
有し、該添加剤として還元剤を含有することを特徴とす
る導電性ペースト。1. A conductive paste comprising a conductive powder, an organic binder, an additive, and a solvent as essential components, wherein the organic binder is a hydroxystyrene copolymer and/or a hydroxystyrene copolymer having a weight average molecular weight of 1,000 to 2,000,000. A conductive paste comprising a derivative thereof and a reducing agent as the additive.
そ の誘導体が次の一般式(I)で表される有機高分子であ
ることを特徴とする請求項(1)記載の導電性ペースト
。 一般式(I): 〔式中、m≧0、n≧3で、それぞれ一般式(I)の有
機高分子の重量平均分子量が1,000〜200万にな
るまでの任意の数、 ;0≦k≦2、 ;0≦p≦2、 ;0<u≦2、 (但し、k、p、uは重合体中の平均 値を示す。) ;R1〜R2はH又は炭素数1〜5のアルキル基、 ;Xは重合性のビニル系単量体、 ;Y、Zは同種又は異種であり、かつ 又は炭素数1〜18のアルキル基もしくはアリール基か
ら選ばれるものである(式中、;MはH、アルカリ金属
、アルカリ土類金属又はアミン類などの有機カチオン ;Y1、Y4はハロゲン ;Y2−、Y3−はハロゲンイオン、有機酸アニオン、
無機酸アニオンなどの対イオン;WはSまたはO ;R4〜R8は同種または異種であって直鎖または分岐
鎖アルキル基、アルキル誘導体基、芳香族基、またはH
、さらにR6とR7はN基とで環を形成していてもかま
わない。 ;R9〜R15は同種または異種であって直鎖または分
岐鎖アルキル基、アルキル誘導体基、芳香族基、または
H ;q、s、tは0又は1 ;rは0、1又は2を示す)〕2. The conductive paste according to claim 1, wherein the hydroxystyrene copolymer and/or its derivative is an organic polymer represented by the following general formula (I). General formula (I): [wherein m≧0, n≧3, each of which is an arbitrary number until the weight average molecular weight of the organic polymer of general formula (I) is 1,000 to 2,000,000, ;0 ≦k≦2, ;0≦p≦2, ;0<u≦2, (However, k, p, and u indicate the average value in the polymer.); R1 to R2 are H or carbon number 1 to 5 an alkyl group; ; ; M is H, an alkali metal, an alkaline earth metal, or an organic cation such as amines; Y1 and Y4 are halogens; Y2- and Y3- are halogen ions, organic acid anions,
A counter ion such as an inorganic acid anion; W is S or O; R4 to R8 are the same or different and are a linear or branched alkyl group, an alkyl derivative group, an aromatic group, or H
, Furthermore, R6 and R7 may form a ring with an N group. ; R9 to R15 are the same or different and are linear or branched alkyl groups, alkyl derivative groups, aromatic groups, or H; q, s, and t are 0 or 1; r is 0, 1, or 2) ]
ーストを基 材上に塗布または印刷後、硬化してなることを特徴とす
る導電性塗膜。3. A conductive coating film, which is obtained by coating or printing the conductive paste according to claim 1 or 2 on a substrate and then curing the paste.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2341076A JPH04214775A (en) | 1990-11-30 | 1990-11-30 | Electrically conductive paste and electrically conductive coating film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2341076A JPH04214775A (en) | 1990-11-30 | 1990-11-30 | Electrically conductive paste and electrically conductive coating film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04214775A true JPH04214775A (en) | 1992-08-05 |
Family
ID=18343027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2341076A Pending JPH04214775A (en) | 1990-11-30 | 1990-11-30 | Electrically conductive paste and electrically conductive coating film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04214775A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005314671A (en) * | 2004-04-02 | 2005-11-10 | Dainippon Printing Co Ltd | Method for producing conductive resin cured product and composition for conductive resin cured product |
JP2008111079A (en) * | 2006-10-31 | 2008-05-15 | Sumitomo Bakelite Co Ltd | Liquid resin composition, semiconductor wafer with adhesive layer, semiconductor device with adhesive layer and semiconductor package |
CN102363891A (en) * | 2011-11-18 | 2012-02-29 | 山东金宝电子股份有限公司 | Double photoelectrolysis copper foil replacing rolled copper foil and used for production of flexible copper clad laminate, and production process of double photoelectrolysis copper foil |
-
1990
- 1990-11-30 JP JP2341076A patent/JPH04214775A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005314671A (en) * | 2004-04-02 | 2005-11-10 | Dainippon Printing Co Ltd | Method for producing conductive resin cured product and composition for conductive resin cured product |
JP2008111079A (en) * | 2006-10-31 | 2008-05-15 | Sumitomo Bakelite Co Ltd | Liquid resin composition, semiconductor wafer with adhesive layer, semiconductor device with adhesive layer and semiconductor package |
CN102363891A (en) * | 2011-11-18 | 2012-02-29 | 山东金宝电子股份有限公司 | Double photoelectrolysis copper foil replacing rolled copper foil and used for production of flexible copper clad laminate, and production process of double photoelectrolysis copper foil |
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