JPH04193970A - Vacuum device - Google Patents
Vacuum deviceInfo
- Publication number
- JPH04193970A JPH04193970A JP32807790A JP32807790A JPH04193970A JP H04193970 A JPH04193970 A JP H04193970A JP 32807790 A JP32807790 A JP 32807790A JP 32807790 A JP32807790 A JP 32807790A JP H04193970 A JPH04193970 A JP H04193970A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- sealing
- vacuum device
- packing
- quartz glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 10
- 238000012856 packing Methods 0.000 claims abstract description 9
- 229920000642 polymer Polymers 0.000 claims abstract description 5
- 230000007797 corrosion Effects 0.000 claims abstract description 4
- 238000005260 corrosion Methods 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 238000007789 sealing Methods 0.000 abstract description 14
- 238000005530 etching Methods 0.000 abstract description 8
- 239000003566 sealing material Substances 0.000 abstract description 6
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 3
- 230000002035 prolonged effect Effects 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、真空装置の特にシール構造に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a vacuum device, particularly a seal structure.
従来の真空装置は、例えば半導体製造装置における酸化
シリコン膜のエツチング装置の覗き窓を例に取れば、第
３図に示すように、真空容器３１の一部に溝を切り内部
にゴム製のＯリング３２を挟み込み、外部から石英ガラ
ス３３等の覗き窓によって蓋をし、真空の保持を行なっ
ていた。In a conventional vacuum device, for example, if we take the observation window of a silicon oxide film etching device in a semiconductor manufacturing device as an example, a groove is cut in a part of a vacuum container 31 and a rubber O A vacuum was maintained by sandwiching the ring 32 and covering it from the outside with a viewing window made of quartz glass 33 or the like.
しかしながら、従来技術では、エツチング装置の真空容
器内部でプラズマ化したＣＦ４等のガスによるエツチン
グが行なわれるとふっ素ガスの作用によってゴム製のＯ
リングが腐食されてしまう。However, in the conventional technology, when etching is performed using a gas such as CF4 that has been turned into plasma inside the vacuum chamber of an etching device, the rubber O
The ring is corroded.
また、覗き窓の外部から、容器内の基板等を加熱するた
めハロゲンランプ等の光エネルギーの入射による加熱が
行なわれる場合は、Ｏリングの温度上昇によって更に劣
化が進む。Furthermore, when heating is performed by the incidence of light energy from a halogen lamp or the like to heat the substrate or the like inside the container from outside the viewing window, the temperature of the O-ring increases and the deterioration progresses further.
Ｏリングが劣化した場合、真空容器内部のパーティクル
の増加やシール性の悪化が顕著となり、半導体製造装置
に適用した場合は、エツチング特性やＣＶＤ膜の品質が
低下する。また、真空装置では真空容器内部を大気に戻
さないことが真空装置の安定性と稼働率を高めることが
らＯリングの交換サイクルは長い方が望ましい。When the O-ring deteriorates, the number of particles inside the vacuum container increases and the sealing performance deteriorates, and when applied to semiconductor manufacturing equipment, the etching characteristics and the quality of the CVD film deteriorate. Furthermore, in a vacuum device, it is desirable to have a long O-ring replacement cycle because not returning the inside of the vacuum container to the atmosphere increases the stability and operating rate of the vacuum device.
しかるに本発明は、かかる課題を解決するものであり、
その目的とするところは、真空装置の覗き窓等に使用さ
れるゴムなどの高分子で出来たのパッキングの寿命を延
ばし、パーティクルの増加がなく、シール性の良好な真
空装置を提供することである。However, the present invention solves these problems,
The purpose of this is to extend the life of the packing made of polymers such as rubber used for the viewing windows of vacuum equipment, and to provide vacuum equipment with good sealing properties and no increase in particles. be.
本発明による真空装置は、
１）真空容器側の内壁の少なくとも一部が石英ガラスと
狭角をなし、かつ真空シール用の高分子類のパッキング
の他に金属あるいは耐腐食性材料で出来たシールを備え
ている
２）Ｍ求項１記載のシールの一部に切り欠きが設けであ
る
３）請求項１記載のシールの接触面の内径が、真空装置
側の窓の開孔部の最大径よりも小さいことを特徴とする
。The vacuum device according to the present invention has the following features: 1) At least a part of the inner wall on the vacuum container side forms a narrow angle with quartz glass, and in addition to the vacuum sealing polymer packing, there is a seal made of metal or a corrosion-resistant material. 2) A notch is provided in a part of the seal according to claim 1. 3) The inner diameter of the contact surface of the seal according to claim 1 is the maximum diameter of the opening of the window on the vacuum device side. It is characterized by being smaller than.
以下本発明の実施例における真空装置を、半導体製造に
おける酸化シリコン膜のエツチング装置の覗き窓を例に
とって第１図に基づき詳細に説明する。Hereinafter, a vacuum apparatus according to an embodiment of the present invention will be described in detail with reference to FIG. 1, taking as an example a viewing window of an etching apparatus for a silicon oxide film in semiconductor manufacturing.
まず、真空容器１１の覗き窓に接する内壁は窓である石
英ガラス１３に対して約７０度の角度のテーパーを持つ
ように加工されている。容器の覗き窓と接触する面には
溝が切ってあり、ゴム製のＯリング１２がはめ込まれて
いる。First, the inner wall of the vacuum container 11 in contact with the viewing window is processed to have a taper at an angle of about 70 degrees with respect to the quartz glass 13 serving as the window. A groove is cut into the surface of the container that comes into contact with the viewing window, into which a rubber O-ring 12 is fitted.
この容器の外部から、アルミ合金で出来た断面が円形の
リング１４を接触させる。このリングの一部は熱の変化
や減圧時の圧縮に対応し、石英ガラスの損傷を防ぐため
に円の直径方向に対して斜めに切り欠きが設けである。A ring 14 made of aluminum alloy and having a circular cross section is brought into contact with the container from the outside. A portion of this ring is cut out diagonally to the diameter of the circle to accommodate changes in heat and compression during depressurization, and to prevent damage to the quartz glass.
この上に石英ガラスで出来た覗き窓１３をはめ込み、外
部から容器に固定する。A viewing window 13 made of quartz glass is fitted onto this and fixed to the container from the outside.
容器内を減圧すると、ゴム製のＯリング１２は圧縮され
て真空のシールを行う。ＣＦ、等のプラズマエツチング
ガスに対してはアルミ合金製のリング１４によってゴム
製のＯリング１２は保護され、劣化は生じない。その結
果パーティクルなどの発生抑えられるとともにシール性
の寿命は向上し、稼動率が高まり品質の低下も無くなっ
た。When the pressure inside the container is reduced, the rubber O-ring 12 is compressed to create a vacuum seal. The rubber O-ring 12 is protected by the aluminum alloy ring 14 from plasma etching gas such as CF, and no deterioration occurs. As a result, the generation of particles has been suppressed, the life of the seal has been improved, the operating rate has increased, and there has been no deterioration in quality.
ここで、金属製のリングを用いている理由は、プラズマ
エツチング時の温度上昇を考慮しているからであり、温
度上昇が少ない場合はエツチングガスに対する耐腐食性
の高い材料を用いることで同様に適用できる。この場合
、金属製のシール材では、変形率が低く、熱膨張率が高
いことでリングの一部に切り欠きを設けたが材料や使用
温度、圧力によって特に切り欠きを持たなくても効果が
得られる。The reason why a metal ring is used here is to take into account the temperature rise during plasma etching.If the temperature rise is small, a material with high corrosion resistance against etching gas can be used. Applicable. In this case, metal sealing material has a low deformation rate and high thermal expansion coefficient, so a notch was provided in a part of the ring, but depending on the material, operating temperature, and pressure, it may be effective even without a notch. can get.
また、シール材の形状については、覗き窓の形状に合わ
せて四角でも楕円形でも同様に形成可能である。シール
材の断面の形状については、容器の内壁と覗き窓の両方
に接触すればよく第２図（ａ）に示すように接触断面が
点で行われても、第２図（ｂ）に示すように面で行われ
ても充分な効果が得られる。この場合、シールが接触す
る面の内径は、真空装置側の窓の開孔部の内径よりも小
さくなる。Furthermore, the shape of the sealing material may be square or oval in accordance with the shape of the viewing window. Regarding the shape of the cross section of the sealing material, it is sufficient that it contacts both the inner wall of the container and the viewing window, even if the contact cross section is made at a point as shown in FIG. 2(a), or as shown in FIG. 2(b). A sufficient effect can be obtained even if it is performed on a surface like this. In this case, the inner diameter of the surface with which the seal contacts is smaller than the inner diameter of the opening of the window on the vacuum device side.
容器側のテーパーの角度についても、直角では、石英ガ
ラスとのシール性が良くないが、覗き窓とのなす角が狭
角であれば真空容器及びシール材から石英ガラスを押す
力が生じ充分なシール性が得られる。Regarding the angle of the taper on the container side, if it is at a right angle, the sealing performance with the quartz glass will not be good, but if the angle formed with the viewing window is narrow, a force will be generated to push the quartz glass from the vacuum container and the sealing material, and it will not be sufficient. Provides sealing properties.
さらに、本発明では、覗き窓に限らず、光エネルギーの
入射用の窓や他の金属製の構成部品同士をパッキングす
る高分子材料の保護用のシールとして、広く適用できる
。Further, the present invention can be widely applied not only to a viewing window but also as a window for the incidence of light energy and a protective seal for a polymeric material used to pack other metal components together.
以上の如く本発明によれば、真空装置の高分子材料で出
来たパッキングをエツチングガスから保護し、寿命を延
ばすことにより、パーティクルの増加がなく、シール性
とその寿命の良好な真空装置を提供できる。As described above, according to the present invention, the packing made of a polymeric material of the vacuum device is protected from etching gas and its lifespan is extended, thereby providing a vacuum device that does not generate particles and has good sealing performance and a long lifespan. can.
第１図は、本発明の一実施例における真空装置の覗き窓
のシール構造の概略断面図である。
第２図は、本発明の一実施例における真空装置の覗き窓
のシール構造の概略断面図である。
第３図は、従来の真空装置の覗き窓のシール構造の概略
断面図である。
１１．２１．３１・・・真空容器
１２．２２．３２・・・Ｏリング
１３．２３．３３・・・石英ガラス
１４．２４ ・・・シール材
￥ １ ロ
皐 ３ 霞FIG. 1 is a schematic cross-sectional view of a sealing structure for a viewing window of a vacuum apparatus in an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of a sealing structure for a viewing window of a vacuum apparatus in an embodiment of the present invention. FIG. 3 is a schematic cross-sectional view of a sealing structure of a viewing window of a conventional vacuum device. 11.21.31...Vacuum container 12.22.32...O-ring 13.23.33...Quartz glass 14.24...Sealing material ¥1 Rogo 3 Kasumi
Claims (1)
構成部品間の結合と真空の保持のためのシールを行う真
空装置において、 １）真空容器側の内壁の少なくとも一部が石英ガラスと
狭角をなし、かつ前記真空シール用の前記高分子類のパ
ッキングの他に金属あるいは耐腐食性材料で出来たシー
ルを備えていることを特徴とする真空装置。 ２）前記真空シールの一部に切り欠きが設けてあること
を特徴とする請求項１記載の真空装置。 ３）前記真空シールの接触面の内径が、前記真空装置側
の窓の開孔部の最大径よりも小さいことを特徴とする請
求項１記載の真空装置。[Claims] In a vacuum device that uses packing made of polymers to bond component parts such as quartz glass and seal for maintaining vacuum, 1) at least a part of the inner wall on the vacuum container side is 1. A vacuum device comprising a seal formed at a narrow angle with quartz glass and made of metal or a corrosion-resistant material in addition to the polymer packing for the vacuum seal. 2) The vacuum device according to claim 1, wherein a notch is provided in a part of the vacuum seal. 3) The vacuum device according to claim 1, wherein the inner diameter of the contact surface of the vacuum seal is smaller than the maximum diameter of the opening of the window on the vacuum device side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32807790A JPH04193970A (en) | 1990-11-28 | 1990-11-28 | Vacuum device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32807790A JPH04193970A (en) | 1990-11-28 | 1990-11-28 | Vacuum device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04193970A true JPH04193970A (en) | 1992-07-14 |
Family
ID=18206256
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32807790A Pending JPH04193970A (en) | 1990-11-28 | 1990-11-28 | Vacuum device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04193970A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104701157A (en) * | 2015-03-31 | 2015-06-10 | 上海华力微电子有限公司 | Plasma etching apparatus with top disc for reducing edge etching rate |
-
1990
- 1990-11-28 JP JP32807790A patent/JPH04193970A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104701157A (en) * | 2015-03-31 | 2015-06-10 | 上海华力微电子有限公司 | Plasma etching apparatus with top disc for reducing edge etching rate |
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