JPH04193958A - Formation of patina - Google Patents

Formation of patina

Info

Publication number
JPH04193958A
JPH04193958A JP32498290A JP32498290A JPH04193958A JP H04193958 A JPH04193958 A JP H04193958A JP 32498290 A JP32498290 A JP 32498290A JP 32498290 A JP32498290 A JP 32498290A JP H04193958 A JPH04193958 A JP H04193958A
Authority
JP
Japan
Prior art keywords
patina
copper
thin film
electrodeposition
chemical conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32498290A
Other languages
Japanese (ja)
Inventor
Haruki Sato
佐藤 治樹
Hideo Tamanoi
英雄 玉野井
Iseo Nakamura
中村 伊勢男
Minoru Sugiyama
實 杉山
Shingo Odawara
小田原 信吾
Katsuhito Nakagawa
勝仁 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KOYO KENSETSU KOGYO KK
Eneos Corp
Original Assignee
KOYO KENSETSU KOGYO KK
Nippon Mining Co Ltd
Nikko Kyodo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KOYO KENSETSU KOGYO KK, Nippon Mining Co Ltd, Nikko Kyodo Co Ltd filed Critical KOYO KENSETSU KOGYO KK
Priority to JP32498290A priority Critical patent/JPH04193958A/en
Publication of JPH04193958A publication Critical patent/JPH04193958A/en
Pending legal-status Critical Current

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  • Electroplating And Plating Baths Therefor (AREA)
  • Chemical Treatment Of Metals (AREA)

Abstract

PURPOSE:To form patina excellent in adhesion by subjecting a copper thin film formed on the surface of a substrate by electrodeposition to chemical treatment and thereafter executing forced oxidation treatment. CONSTITUTION:The thin film of copper or a copper allay is formed by electrodeposition on the surface of a substrate on which patina shall be formed, and after that, the above thin film is subjected to chemical treatment and is successively subjected to forced oxidation treatment. In this way, patina having a deep color tone almost same as that of natural one and extremely excellent in adhesion can stably be formed on every kinds of substrates in a short time without requiring special equipment. This is applicable in a wide field not only for roof materials but also for building inside wall materials, ornaments or the like.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 この発明は、基材との密着性に優れた緑青を生産性良く
安定して形成する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for stably forming a patina with excellent adhesion to a substrate with good productivity.

〈従来技術とその課題〉 従来から、神社・仏閣の屋根材等に用いられた銅の表面
が長い年月の間に大気中の酸素、水蒸気。
<Conventional technology and its challenges> Over the years, the surface of copper, which has been used for the roofing of shrines and temples, has been exposed to oxygen and water vapor in the atmosphere.

炭酸ガス、硫化物乃至は塩化物等の作用によって優雅で
美しい緑色の緑青(CuCOx ・Cu(OH)z。
An elegant and beautiful green patina (CuCOx ・Cu(OH)z.

Cu S Oa・3 Cu(OH)z、CuCfz・3
 Cu−(OH)z等の塩基性銅塩)に覆われることは
良く知られているが、この緑青層は重厚で独特の美観を
醜し出すばかりでなく防食皮膜としての作用をも発揮し
、そのため緑青に覆われた銅屋根等は数百年に及ぶ耐久
性を示すこととなる。
Cu S Oa・3 Cu(OH)z, CuCfz・3
It is well known that copper salts (such as basic copper salts such as Cu- (OH) As a result, copper roofs covered in patina can last for hundreds of years.

そこで、近年、天然に近い緑青を人工的に短期間で発生
させて基材の腐食防止や装飾乃至美術的な効果を狙った
“緑青被膜形成品”が、屋根・材のみならず建築内壁材
や装飾品等にも見られるようになり、これまでにも天然
に近い緑青被膜を人工的に形成させる手段に関する提案
が数多くなされてきた。
Therefore, in recent years, "patina film-forming products" that artificially generate a natural-looking patina in a short period of time to prevent corrosion of base materials and have decorative or artistic effects have been developed, not only for roofs and materials but also for interior walls of buildings. It has come to be seen in ornaments and ornaments, and many proposals have been made to date on means of artificially forming a patina that is close to natural.

5これら従来の人工緑青形成手段を大別すると次の通り
である。
5 These conventional artificial patina formation means can be broadly classified as follows.

(A)薬液と接触させる化成処理法(例えば特公昭57
−51468号として提案された方法等)。
(A) Chemical conversion treatment method in which contact is made with a chemical solution (for example,
-51468, etc.).

(B)薬液中で電解処理する方法(例えば特公昭55−
12117号として提案された方法等)。
(B) Method of electrolytic treatment in a chemical solution (for example,
12117, etc.).

(C)基材を化成処理した後、その上に更に塗装を施す
方法(例えば特開昭55−8491号として提案された
方法等)。
(C) A method in which a base material is subjected to a chemical conversion treatment and then further coated (for example, a method proposed in JP-A No. 55-8491).

(D)緑青色形成物質を含む塗料で塗装する方法(例え
ば特開昭55−139467号として提案された方法等
)。
(D) A method of painting with a paint containing a green-blue-forming substance (for example, the method proposed in JP-A-55-139467).

(E)サント′ブラストにより表面を粗面化した銅板表
面に銅又は銅合金の粉末を接着剤で接着した後、塩化ア
ンモニウムや硫酸アンモニウム等の人工緑青発生液を塗
布する方法(例えば特公昭57−52425号として提
案された方法等)。
(E) A method in which copper or copper alloy powder is adhered with an adhesive to the surface of a copper plate whose surface has been roughened by sand blasting, and then an artificial patina-generating liquid such as ammonium chloride or ammonium sulfate is applied (for example, 52425, etc.).

しかしながら、上記の人工緑青形成手段は、実際上 a)緑青の発生速度が遅い。However, the above-mentioned artificial patina formation means are practically a) The rate of development of patina is slow.

b)緑青被膜が剥離し易く、製造設備に多額の費用がか
かる。
b) The patina coating is easy to peel off, and manufacturing equipment costs a lot of money.

C)緑青色を安定して形成させることができず、不均一
で色調が劣る。
C) Unable to stably form green-blue color, resulting in non-uniformity and poor color tone.

d)緑青の密着性が良くない。d) Poor adhesion of patina.

e)緑青色被膜を形成するための工数が多く、生産性が
悪い。
e) Many man-hours are required to form the green-blue coating, resulting in poor productivity.

等の問題が指摘されるものであり、更には、何れも一般
的に基材が銅又は銅合金にほぼ限定される上、発生させ
た緑青の表面を塗装等によって保護しなければ基材との
十分な密着性を保てないとの問題を有するものでもあっ
た。しかも、塗料膜による緑青の保護策では、紫外線に
よって塗膜組成物の劣化が起きることから上記問題の根
本的な解決策となり得るものではなかった。
Problems such as these have been pointed out, and furthermore, the base material is generally limited to copper or copper alloy, and if the patina surface is not protected by painting etc. There was also the problem that sufficient adhesion could not be maintained. Moreover, the protection of patina by using a paint film cannot provide a fundamental solution to the above problem because the paint film composition deteriorates due to ultraviolet rays.

このようなことから、本発明の目的は、 [密着性に優
れた均一色調の緑青被膜を、基材の種類を問わず、また
特殊な設備を要することなく、短時間に安定して形成し
得る比較的安価な手段1を確立することに置かれた。
Therefore, the purpose of the present invention is to stably form a patina film with excellent adhesion and uniform color tone in a short time regardless of the type of substrate and without requiring special equipment. The aim was to establish a relatively inexpensive means of obtaining 1.

く課題を解決するための手段〉 本発明者等は、上記目的を達成すべ(様々な観点に立っ
て鋭意研究を重ねた結果、 a)緑青を形成しようとする基材表面に銅又は銅合金か
ら成る薄膜を形成し、次いでこの薄膜を化成処理して、
その後に強制酸化する処理を組み合わせると、基材の材
質に左右されることな(その表面に密着性の非常に優れ
た均一色調の緑青被膜を短時間で形成させることができ
る。
Means for Solving the Problems> The present inventors have achieved the above objects (as a result of intensive research from various viewpoints). forming a thin film consisting of, and then subjecting this thin film to a chemical conversion treatment,
If this is combined with a subsequent forced oxidation treatment, it is possible to form a uniformly colored verdigris film with excellent adhesion on the surface of the substrate in a short period of time, regardless of the material of the substrate.

b) Lかも、基材表面に銅又は銅合金から成る薄膜を
形成させる手段として電着法を採用すれば、薄膜形成の
ため格別に特殊な設備を要することがなく、また基板の
取り扱いが容易であってコスト的にも有利であるばかり
か、電着条件の調整によって生成する緑青の密着性を一
段と向上させることかできる。
b) If electrodeposition is used as a means of forming a thin film made of copper or copper alloy on the surface of a substrate, no special equipment is required to form the thin film, and the substrate can be easily handled. Not only is this advantageous in terms of cost, but the adhesion of the patina produced can be further improved by adjusting the electrodeposition conditions.

との知見を得ることができた。We were able to obtain this knowledge.

本発明は、上記知見事項等を基にして完成されたもので
あり、 「緑青を形成しようとする基材表面に銅又は銅合金から
成る薄膜を電着形成させた後、該薄膜を化成処理し、続
いて強制酸化処理を施すことにより、密着性が十分に優
れ、かつ良好な外観の緑青を短時間に安定形成し得るよ
うにした点」に特徴を有している。
The present invention was completed based on the above-mentioned findings, etc., and includes the following: ``After a thin film made of copper or copper alloy is electrodeposited on the surface of a base material on which patina is to be formed, the thin film is subjected to chemical conversion treatment. By subsequently performing a forced oxidation treatment, it is possible to stably form a patina with sufficiently excellent adhesion and a good appearance in a short period of time.

ここで、“緑青を形成しようとする基材”とは銅及び銅
合金に代表される金属材料のみならず、セラミック、瓦
、木材3合成樹脂等の何れであっても差し支えがなく、
格別にその材質が制限されるものではない。ただ、基材
が金属材料以外の場合には、電着法により “銅又は銅
合金から成る薄膜″を形成するための前処理、例えば無
電解めっき又はスパッタリング法等の公知の方法により
予め表面を導電化する処理を施す必要のあることば言う
までもない。
Here, the "base material on which patina is to be formed" is not limited to metal materials such as copper and copper alloys, but may also be ceramics, roof tiles, wood 3 synthetic resins, etc.
The material is not particularly limited. However, if the base material is not a metal material, the surface must be pretreated by a known method such as electroless plating or sputtering to form a "thin film made of copper or copper alloy" by electrodeposition. Needless to say, it needs to be treated to make it conductive.

以下、本発明をその作用・効果と共により詳細かつ具体
的に説明する。
Hereinafter, the present invention will be explained in more detail and concretely along with its functions and effects.

本発明に係る緑青形成法においては、まず電着法によっ
て緑青を形成させようとする基材の表面に“銅又は銅合
金から成る薄膜”が形成される。
In the patina formation method according to the present invention, a "thin film made of copper or copper alloy" is first formed on the surface of the base material on which patina is to be formed by electrodeposition.

薄膜の厚さは特に限定されるものではないが、通常は1
〜100gm程度、好ましくは5〜40卿程度とするの
が良い。勿論、膜厚が1gm未満であっても緑青の形成
は可能であるが、この場合には薄膜に亀裂等が生じ易い
ため好ましくない。一方、膜厚が1100trを超える
と満足できる色調を得ることが難しくなり、また生産コ
ストの面でも好ましくない。
The thickness of the thin film is not particularly limited, but is usually 1
It is good to set it to about 100 gm, preferably about 5 to 40 gm. Of course, it is possible to form a patina even if the film thickness is less than 1 gm, but in this case it is not preferable because cracks are likely to occur in the thin film. On the other hand, if the film thickness exceeds 1100 tr, it becomes difficult to obtain a satisfactory color tone and is also unfavorable in terms of production cost.

勿論、基材表面への金属系薄膜形成手段としては電着法
の他に真空蒸着法、スパッタリング法。
Of course, methods for forming a metallic thin film on the surface of the substrate include the electrodeposition method, the vacuum evaporation method, and the sputtering method.

イオンブレーティング法、溶射法等が知られているが、
電着法の場合には、前述した如く、「“銅又は銅合金か
ら成る薄膜”を形成させる際に特殊な設備を必要としな
い」、「基材の取り扱いが容易である4、 Iコスト的
に有利である」等の利点を有するほか、電着条件の調整
によりその後に生成させる緑青の密着性を一段と向上さ
せることができるので極めて有利となる。
Ion blating method, thermal spraying method, etc. are known, but
In the case of electrodeposition, as mentioned above, ``no special equipment is required to form a thin film made of copper or copper alloy,'' and ``the base material is easy to handle4. In addition to this, it is extremely advantageous because the adhesion of the patina produced subsequently can be further improved by adjusting the electrodeposition conditions.

なお、本発明に従い電着法によって“銅又は銅合金薄膜
”を形成させるには、例えば公知の“酸性の硫酸銅浴”
或いは“アルカリ性のシアン化銅浴”等の電解液組成、
電解条件等をそのまま適用するだけでも良いが、出来れ
ば本出願人が先に提案した電気銅めっき法(特願平1−
232866号)における条件、即ち電流密度ニア5A
/dm以上で、めっき液の流速: l m/sec以上
なる条件(電流密度は100 A /d rd程度、め
っき液流速は1.5m/sec程度がより好適)の下で
“銅又は銅合金薄膜”を電着させるのが望ましい。なぜ
なら、上記条件下で“銅又は銅合金薄膜”を電着形成さ
せた場合は、その後の処理によって生成する緑青の密着
性が一段と良好になり、基材と強固に密着した緑青層を
より安定に形成できるからである。
In addition, in order to form a "copper or copper alloy thin film" by electrodeposition according to the present invention, for example, a known "acidic copper sulfate bath" is used.
Or electrolyte composition such as "alkaline copper cyanide bath",
It is possible to simply apply the electrolytic conditions as they are, but if possible, it would be better to use the electrolytic copper plating method proposed earlier by the present applicant (Patent Application No.
232866), i.e. current density near 5A
/dm or more, and the flow rate of the plating solution is 1 m/sec or more (the current density is preferably about 100 A/d rd, and the plating solution flow rate is more preferably about 1.5 m/sec). It is desirable to electrodeposit a thin film. This is because when a "copper or copper alloy thin film" is electrodeposited under the above conditions, the adhesion of the patina produced by subsequent processing becomes even better, making the patina layer firmly adhered to the base material more stable. This is because it can be formed into

そして、基材上に形成される“銅又は銅合金から成る薄
膜”自体の表面粗さについては特に限定されるものでは
ないが、薄膜表面の粗さが3即未満では緑青の発色度合
いが低く、一方、50悶を超えると母材と薄膜の密着強
度が低下する傾向が見られることから、通常は3〜50
jon、好ましくは5〜40屑とするのが良い。
The surface roughness of the "thin film made of copper or copper alloy" itself formed on the base material is not particularly limited, but if the roughness of the thin film surface is less than 3, the degree of patina will be low. On the other hand, if it exceeds 50 degrees, the adhesion strength between the base material and the thin film tends to decrease, so it is usually 3 to 50 degrees.
1, preferably 5 to 40 pieces.

ところで、基材表面への“銅又は銅合金から成る薄膜”
の形成に先立って該基材表面を粗面化することは、基材
と“銅又は銅合金から成る薄膜”との密着性の向上、ひ
いては形成される緑青被膜の密着性を向上させる上で極
めて好ましいことである。従って、銅又は銅合金から成
る薄膜形成処理の前には、必要に応じて基材表面の粗面
化処理が施され、基材表面の−様な粗化と一時的な表面
の活性化が図られる。
By the way, "thin film made of copper or copper alloy" on the surface of the base material
Roughening the surface of the base material prior to the formation of the coating improves the adhesion between the base material and the "thin film made of copper or copper alloy", and thus the adhesion of the patina coating to be formed. This is extremely desirable. Therefore, before forming a thin film made of copper or copper alloy, the surface of the base material is roughened as necessary to prevent roughening of the base material surface and temporary surface activation. It will be planned.

基材表面の粗面化法としては、一般に化学的方法(電気
化学的方法も含む)と物理的方法(機械的方法)の2種
類が知られている。前者の例としては“酸又はアルカリ
に浸漬する方法(即ち、エツチング処理法)”や“電解
法”等が、そして後者の例としては“ブラスト法”、“
ウォータージェット法″、“動カニ具法”、“手工具法
”等を挙げることができる。従って、本発明に係る“銅
又は銅合金から成る薄膜”の形成に先立つ基材の粗面化
に際しては、該基材の種類や目的とする緑青形成高表面
の粗さ等によって粗面化法を適宜選択する必要がある。
Generally, two types of methods for roughening the surface of a substrate are known: a chemical method (including an electrochemical method) and a physical method (mechanical method). Examples of the former include "method of immersion in acid or alkali (i.e., etching method)" and "electrolytic method," and examples of the latter include "blasting method" and "
Examples include "water jet method", "moving crab method", "hand tool method", etc. Therefore, when roughening the surface of the base material prior to forming the "thin film made of copper or copper alloy" according to the present invention, It is necessary to appropriately select a surface roughening method depending on the type of the substrate and the desired roughness of the patina-forming high surface.

例えば、基材が金属材料の場合には、基材表面の粗面化
を高能率で実施できる上、同時に基材表面に発生してい
た錆その他の腐食生成物等の除去も成される“ブラスト
法”が好適と言える。
For example, when the base material is a metal material, the surface of the base material can be roughened with high efficiency, and at the same time, rust and other corrosion products generated on the base material surface can be removed. It can be said that "blasting method" is suitable.

しかも、ブラスト法では、研削材として珪砂、スティー
ルグリソド、スティールショノト、溶融アルミナ(人造
コランダム)、アランダム、カーボランダム、グラスビ
ーズ、合成樹脂粒子等の如き各種の硬度2粒度を持った
ものが使用されるので、基材の種類その他に合わせて好
適なものを適宜選択することが可能であることに加え、
ブラスト条件により表面粗さの調整も可能であると言う
長所もある。
Moreover, in the blasting method, abrasive materials with various hardness levels such as silica sand, steel grisode, steel shonot, fused alumina (artificial corundum), alundum, carborundum, glass beads, synthetic resin particles, etc. are used as the abrasive material. is used, so it is possible to select a suitable one according to the type of base material etc.
Another advantage is that the surface roughness can be adjusted by changing the blasting conditions.

なお、ブラスト法については種々の観点から種類分けが
なされており、例えば研削材の吹付は手法の観点からは
“圧縮空気によってプラストする方法”と“遠心力によ
ってプラストする方法”とに分類でき、また吹付ける研
削材の乾湿状態からは“乾式法”と“湿式法”に分類で
きるが、本発明においてはその種類や組み合わせに格別
な制限はない。
In addition, blasting methods are classified into types from various viewpoints. For example, from the viewpoint of the method, spraying of abrasive materials can be classified into "method of blasting using compressed air" and "method of blasting using centrifugal force." Further, depending on the dry and wet state of the abrasive to be sprayed, it can be classified into "dry method" and "wet method", but in the present invention, there are no particular restrictions on the types or combinations thereof.

粗面化処理後の基材の表面粗さは、3IXm以上、好ま
しくは10〜30gInとするのが良い。これは、該表
面粗さが3卿未満では“銅又は銅合金から成る薄膜”と
の密着性改善効果が顕著ではないからである。一方、上
記表面粗さが50−を超えた場合には、前記密着性は良
好となるものの母材(基材)に生じる歪が問題となるな
ど現実的ではない。
The surface roughness of the base material after the surface roughening treatment is preferably 3 IXm or more, preferably 10 to 30 gIn. This is because when the surface roughness is less than 3 degrees, the effect of improving the adhesion with the "thin film made of copper or copper alloy" is not significant. On the other hand, if the surface roughness exceeds 50 -, although the adhesion will be good, it is not practical because distortion occurring in the base material may become a problem.

さて、本発明において、基材の表面に“銅又は銅合金か
ら成る薄膜”が電着形成されると、次に該薄膜に化成処
理が施される。
Now, in the present invention, once a "thin film made of copper or a copper alloy" is electrodeposited on the surface of a base material, the thin film is then subjected to a chemical conversion treatment.

一般に、“化成処理”とは、成る金属を特定条件に調整
された腐食液(化成処理液)と化学反応させ、その金属
の表面に固着性のある水に不溶性の腐食生成物層を形成
させる処理を言い、その腐食生成物の物理的又は化学的
性質を利用して防錆。
In general, "chemical conversion treatment" involves chemically reacting the metal with a corrosive solution (chemical treatment solution) adjusted to specific conditions to form a layer of water-insoluble corrosion products that stick to the surface of the metal. Rust prevention is a process that utilizes the physical or chemical properties of corrosion products.

塗装下地、塑性加工用潤滑下地等への適用がなされてい
る。
It has been applied to paint bases, lubricating bases for plastic working, etc.

本発明で言う化成処理もほぼ同じ概念であるか、化成処
理の後に強制酸化処理が施される点からすれば概念を異
にするとも言える。
The chemical conversion treatment referred to in the present invention has almost the same concept, or it can be said that the concept is different in that forced oxidation treatment is performed after the chemical conversion treatment.

本発明で使用される化成処理液は、銅又は銅合金表面に
水に不溶性の腐食生成物層を形成するものであればその
種類を問うものではない。そして、このようなものとし
て、従来よりアンモニウム塩。
The chemical conversion treatment liquid used in the present invention is not limited to any type as long as it forms a water-insoluble corrosion product layer on the surface of copper or copper alloy. And as such, traditionally ammonium salts.

塩酸、カセイソーダ、硫化物9gL酸塩、硝酸塩。Hydrochloric acid, caustic soda, sulfide 9gL salt, nitrate.

酢酸塩、炭酸塩1重炭酸塩、ミョウバン等を含んだ溶液
及びこれらを組合わせたもの(人工緑青発生液と称され
るものを含むことは勿論であり、溶媒も水に限るもので
はない)が知られているが、より具体的な例として次の
化成処理液が挙げられる。
Solutions containing acetate, carbonate monobicarbonate, alum, etc., and combinations thereof (of course, this includes what is called an artificial patina-generating solution, and the solvent is not limited to water) is known, but more specific examples include the following chemical conversion treatment liquid.

a)塩酸、硝酸及び硫酸アンモニウムにアルカリ金属塩
化物及び/又はアルカリ土類金属塩化物を加えた水溶液
a) An aqueous solution prepared by adding an alkali metal chloride and/or an alkaline earth metal chloride to hydrochloric acid, nitric acid and ammonium sulfate.

b)塩化第二銅を添加した水溶液。b) Aqueous solution with addition of cupric chloride.

C)アルカリ金属塩化物及び/又はアルカリ土類金属塩
化′!#(例えばNaC!、  K(j、 NHaCl
等)に硫酸銅を加えた水溶液(この場合、アルカリ金属
塩化物及び/又はアルカリ土類金属塩化物を含んだ水溶
液で処理し、続いて硫酸銅を含む水溶液で処理すると言
う2段処理や、順序がこれとは逆の2段処理としても同
様の結果が得られる)。
C) Alkali metal chloride and/or alkaline earth metal chloride'! #(e.g. NaC!, K(j, NHaCl
) is treated with an aqueous solution containing copper sulfate (in this case, an aqueous solution containing an alkali metal chloride and/or alkaline earth metal chloride), followed by treatment with an aqueous solution containing copper sulfate, Similar results can be obtained by performing two-stage processing in the opposite order.)

上述したように、本発明においては化成処理液の種類に
は格別な制限はなく、これらの化成処理液(有効成分濃
度も格別に限定されないが、通常は5〜50重量%、好
ましくは20〜30重量%である)を“銅又は銅合金か
ら成る薄膜”に塗布、スプレー等の方法、又は該薄膜を
前記化成処理液に浸漬する等の方法で化成処理が行われ
る。
As mentioned above, in the present invention, there is no particular restriction on the type of chemical conversion treatment liquid, and these chemical conversion treatment liquids (the active ingredient concentration is also not particularly limited, but are usually 5 to 50% by weight, preferably 20 to 50% by weight). The chemical conversion treatment is carried out by coating or spraying a "thin film made of copper or copper alloy" or by immersing the thin film in the chemical conversion treatment solution.

この化成処理によって“銅又は銅合金から成る薄膜”上
には水に不溶性の腐食生成物層が形成されるが、この腐
食生成物層にはCu、 CuzO,CuO又はCu(○
H)z、 CuCZ、 CuCZ2等が複雑に共存して
いるのではないかと推定される。
This chemical conversion treatment forms a water-insoluble corrosion product layer on the "thin film made of copper or copper alloy," but this corrosion product layer contains Cu, CuzO, CuO, or Cu(○
It is presumed that H)z, CuCZ, CuCZ2, etc. coexist in a complex manner.

この場合、電着によって形成された“銅又は銅合金から
成る薄膜”は化成反応が生じ易く、好結果が得られる。
In this case, the "thin film made of copper or copper alloy" formed by electrodeposition tends to undergo a chemical conversion reaction, and good results can be obtained.

これは、電着皮膜は金属U織の結合が弱くて非晶質に近
いため、該皮膜の電極電位が比較的厚な状態となってい
ることに起因していると考えら耗る。
This is thought to be due to the fact that the electrodeposited film has a relatively thick electrode potential because the bond between the metal U weaves is weak and it is almost amorphous.

次に、上述のように化成処理された“銅及び銅合金より
成る薄膜”は強制酸化処理され、密着性の優れた緑青の
形成がなされる。
Next, the "thin film made of copper and copper alloy" that has been chemically treated as described above is subjected to forced oxidation treatment to form a patina with excellent adhesion.

強制酸化の手段としては“酸化性の液体を用る方法″、
“酸化性の気体を用いる方法”或いは“電解による方法
”等があるが、基材の取り扱い容易性や緑青の密着性等
を考慮した場合には“気体を用いる方法”が好ましいと
言える。
As a means of forced oxidation, "method using oxidizing liquid",
There are methods such as "method using oxidizing gas" and "method using electrolysis," but it can be said that "method using gas" is preferable when considering ease of handling of the base material, adhesion of patina, etc.

酸化性の気体としては空気や酸素ガス等が一般的である
が、処理速度(即ち緑青の形成速度)を考えた場合には
オゾン(03)が最も好ましく、強制酸化にはオゾン含
有雰囲気中に曝す手法が推奨される。この場合、オゾン
濃度には特に制限はなく、通常のオゾン発生器によって
雰囲気中にオゾンを混入する程度で十分である。
Air, oxygen gas, etc. are commonly used as oxidizing gases, but ozone (03) is the most preferable when considering processing speed (i.e. patina formation rate). An exposure method is recommended. In this case, there is no particular limit to the ozone concentration, and it is sufficient to mix ozone into the atmosphere using a normal ozone generator.

そして、化成処理を施した“銅又は銅合金より成る薄膜
”をオゾンによって強制酸化する場合、該強制酸化処理
は化成処理によって生成した化成処理膜が乾燥してしま
う前に実施することが望ましい。つまり、化成処理膜に
湿気(水分)が十分に存在する状態で(好ましくは化成
処理後直ちに)オゾン含有雰囲気中へ入れて酸化すると
、より短時間で密着性の極めて優れた緑青皮膜を形成す
ることができる。
When a "thin film made of copper or copper alloy" that has been subjected to a chemical conversion treatment is forcibly oxidized with ozone, it is desirable to carry out the forced oxidation treatment before the chemical conversion film formed by the chemical conversion treatment dries. In other words, if the chemical conversion film is oxidized by placing it in an ozone-containing atmosphere in the presence of sufficient moisture (preferably immediately after the chemical conversion treatment), a patina film with extremely excellent adhesion will be formed in a shorter time. be able to.

この“化成処理した銅又は銅合金薄膜の強制酸化”によ
る緑青の形成機構については現在のところ明確に解明さ
れていないが、この処理により生成した緑青がX線回折
によって化学的に安定な塩基性塩化第二銅(CuC/z
・3cu(OH)zlであると確認されている。
The mechanism of formation of patina due to this "forced oxidation of chemically treated copper or copper alloy thin film" has not been clearly elucidated at present, but the patina produced by this treatment has been found to be chemically stable and basic by X-ray diffraction. Cupric chloride (CuC/z
- Confirmed to be 3 cu (OH) zl.

化成処理した銅又は銅合金薄膜の強制酸化処理時間は、
オゾン処理(オゾン含有雰囲気に曝す処理)を例にした
場合、オゾン濃度及びオゾン含有ガス量等によっても異
なるが、市販のオゾン発生器を用いれば通常は約10〜
60分程度で十分である。ただ、市販のオゾン発生器を
用いた処理では約10秒程度で表面の色が変化すること
から、この程度の時間で反応が開始するものと考えられ
る。
Forced oxidation treatment time for chemically treated copper or copper alloy thin film is:
Taking ozone treatment (treatment of exposure to an ozone-containing atmosphere) as an example, it will vary depending on the ozone concentration and the amount of ozone-containing gas, etc., but if a commercially available ozone generator is used, it will usually be about 10~
About 60 minutes is sufficient. However, since the surface color changes in about 10 seconds in treatment using a commercially available ozone generator, it is thought that the reaction starts in about this amount of time.

強制酸化処理が終了した後、緑青か形成じだ基材は好適
には乾燥を兼ねた養生を行う。この養生では特に加熱す
る必要はなく、通常、室温で2〜24時間行えば十分で
ある。
After the forced oxidation treatment is completed, the verdigris-forming substrate is preferably cured and dried. There is no particular need for heating in this curing, and it is usually sufficient to carry out the curing at room temperature for 2 to 24 hours.

このようにして、密着性の極めて優れた均一色調の緑青
を短時間で形成することができる。
In this way, it is possible to form a uniformly colored patina with extremely good adhesion in a short time.

続いて、本発明を実施例によって更に具体的に説明する
Next, the present invention will be explained in more detail with reference to Examples.

〈実施例〉 実施例 1 まず、予め脱脂された銅板(220mm幅X250ts
長×0.3WM厚)を準備し、粒径#50〜#250の
アランダム粉を用いた空気圧1.5〜5 kg/ ee
l (L )圧)での吹付はブラスト処理によって銅板
表面の粗面化処理を行った。
<Example> Example 1 First, a pre-degreased copper plate (220mm width x 250ts
(length x 0.3 WM thickness) and air pressure 1.5 to 5 kg/ee using alundum powder with particle size #50 to #250.
The spraying at 1 (L) pressure was used to roughen the surface of the copper plate by blasting.

次に、前記銅板(粗化面)を陰極、そして鉛板を陽極と
し、硫酸銅溶液(CuS O,−5H2O: 150g
/β、H2SO4:80g/’)を電解液に用いて、電
流密度: 80 A/dr&。
Next, using the copper plate (roughened surface) as a cathode and the lead plate as an anode, a copper sulfate solution (CuSO, -5H2O: 150 g
/β, H2SO4: 80g/') as the electrolyte, current density: 80 A/dr&.

めっき液の流速: 1.5m/sec。Flow rate of plating solution: 1.5 m/sec.

液温:55℃ の条件で5分間電解を行い、上記銅板の表面に新たな銅
の薄膜を電着形成させた。
Electrolysis was performed for 5 minutes at a liquid temperature of 55° C. to form a new copper thin film by electrodeposition on the surface of the copper plate.

次いで、前記銅薄膜に化成処理液である塩化第二銅30
重量%の水溶液を刷毛で均一に塗布して化成処理を行い
、生成膜が湿気を十分含有しているうちにオゾン酸化ボ
ックス(0,2+y?)に装入し、オゾン発生器(コー
ヨーテソクス■製のKW−70重量機、01発生量:約
9 g/hrlよりオゾン含有空気を3j!/+win
の割合で15分間吹き込んだ。
Next, the copper thin film is coated with cupric chloride 30, which is a chemical conversion treatment solution.
% by weight aqueous solution is uniformly applied with a brush to perform chemical conversion treatment, and while the resulting film contains sufficient moisture, it is charged into an ozone oxidation box (0,2+y?) and placed in an ozone generator (Koyote Sox). ■ KW-70 heavy duty machine, 01 generation amount: Approximately 9 g/hrl, ozone-containing air is 3j!/+win
It was blown for 15 minutes at a rate of .

この強制酸化処理の後、緑青が形成された銅板をオゾン
酸化用ボックスより取り出して室温で8時間の乾燥を兼
ねた養生を行った。
After this forced oxidation treatment, the copper plate on which the patina had been formed was taken out from the ozone oxidation box and cured at room temperature for 8 hours, which also served as drying.

そして、上記処理によって形成された緑青の観察を行っ
たところ、該緑青は重厚な青味を帯びた緑色の色調を呈
しており、緑青被膜を指先でこすっても全く剥離物を生
ずることがなく、天然緑青と同等以上に優れた密着性を
有していることが確認された。
When the patina formed by the above treatment was observed, it was found that the patina had a deep bluish green tone, and even when the patina film was rubbed with a fingertip, no peeling occurred. It was confirmed that the adhesion was superior to that of natural patina.

更に、X線回折による分析よって、本発明法により形成
された緑青は天然緑青の主成分である塩基性塩化第二銅
(Cu(lJz・3Cu(OH)z)であることも確認
された。
Furthermore, analysis by X-ray diffraction confirmed that the patina formed by the method of the present invention is basic cupric chloride (Cu(lJz·3Cu(OH)z), which is the main component of natural patina.

実施例 2 銅板表面の粗面化を“公知の化学研磨液を用いたエツチ
ング処理”によって行ったほかは、実施例1と同じ条件
で処理し緑青を形成させた。
Example 2 A copper plate was treated under the same conditions as in Example 1, except that the surface of the copper plate was roughened by "etching using a known chemical polishing solution" to form a patina.

このようにして得られた緑青被膜は、均一で剥離物の全
(ない密着性の極めて優れたものであった。
The patina coating thus obtained was uniform and had excellent adhesion with no peeling.

これらの実施例以外にも、銅又は銅合金薄膜の形成に種
々条件の電着法、また公知の種々の化成処理液(人工緑
青発生液と呼ばれるものをも含む)、並びに強制酸化手
段として種々の酸化性液体、酸化性気体を適用する方法
を様々に組み合わせた試験を行ったが、何れも本発明法
に従えば前記実施例の場合とほぼ同様に良好な結果を得
られることが確認された。
In addition to these examples, electrodeposition methods under various conditions for forming copper or copper alloy thin films, various known chemical conversion treatment solutions (including those called artificial patina generation solutions), and various forced oxidation methods are also available. Tests were conducted using various combinations of methods for applying oxidizing liquids and oxidizing gases, and it was confirmed that in all cases, if the method of the present invention was followed, good results could be obtained that were almost the same as those in the above examples. Ta.

く効果の総括〉 以上に説明した如く、この発明によれば、天然緑青とほ
ぼ同じ重厚な色調を呈すると共に極めて密着性の優れた
緑青を、格別に特殊な設備等を要することなくあらゆる
種類の基材上に短時間に安定して形成することが可能と
なり、屋根材のみならず、建築内壁材や装飾品等の幅広
い分野での適用が期待されるなど、産業上極めて有用な
効果がもたらされる。
Summary of Effects> As explained above, according to the present invention, patina that exhibits almost the same deep color tone as natural patina and has extremely excellent adhesion can be applied to all types of patina without requiring any special equipment. It can be stably formed on a base material in a short time, and is expected to be applied not only to roofing materials, but also to a wide range of fields such as interior wall materials and decorative items, bringing extremely useful effects industrially. It can be done.

Claims (4)

【特許請求の範囲】[Claims] (1)緑青を形成しようとする基材表面に銅又は銅合金
から成る薄膜を電着形成させた後、該薄膜を化成処理し
、続いて強制酸化処理を施すことを特徴とする緑青の形
成方法。
(1) Formation of a patina characterized by electrodepositing a thin film made of copper or copper alloy on the surface of a substrate on which a patina is to be formed, then subjecting the thin film to a chemical conversion treatment, and subsequently subjecting it to a forced oxidation treatment. Method.
(2)銅又は銅合金から成る薄膜の電着を、電流密度:
75A/dm^2以上, めっき液の流速:1m/sec以上 にそれぞれ制御しつつ実施する、請求項1に記載の緑青
の形成方法。
(2) Electrodeposition of thin films made of copper or copper alloys at current density:
The method for forming a patina according to claim 1, which is carried out while controlling the flow rate of the plating solution to be 75 A/dm^2 or more and a flow rate of the plating solution to be 1 m/sec or more.
(3)化成処理後の強制酸化がオゾン含有雰囲気に曝す
処理にて行われる、請求項1又は2に記載の緑青の形成
方法。
(3) The method for forming a patina according to claim 1 or 2, wherein the forced oxidation after the chemical conversion treatment is performed by exposing it to an ozone-containing atmosphere.
(4)緑青を形成しようとする基材表面を粗面化し、そ
の後で銅又は銅合金から成る薄膜を電着形成させる、請
求項1乃至3の何れかに記載の緑青の形成方法。
(4) The method for forming a patina according to any one of claims 1 to 3, wherein the surface of the base material on which the patina is to be formed is roughened, and then a thin film made of copper or a copper alloy is formed by electrodeposition.
JP32498290A 1990-11-27 1990-11-27 Formation of patina Pending JPH04193958A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32498290A JPH04193958A (en) 1990-11-27 1990-11-27 Formation of patina

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32498290A JPH04193958A (en) 1990-11-27 1990-11-27 Formation of patina

Publications (1)

Publication Number Publication Date
JPH04193958A true JPH04193958A (en) 1992-07-14

Family

ID=18171808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32498290A Pending JPH04193958A (en) 1990-11-27 1990-11-27 Formation of patina

Country Status (1)

Country Link
JP (1) JPH04193958A (en)

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