JPH04180529A - Method for removing iridium in rhodium - Google Patents
Method for removing iridium in rhodiumInfo
- Publication number
- JPH04180529A JPH04180529A JP30988090A JP30988090A JPH04180529A JP H04180529 A JPH04180529 A JP H04180529A JP 30988090 A JP30988090 A JP 30988090A JP 30988090 A JP30988090 A JP 30988090A JP H04180529 A JPH04180529 A JP H04180529A
- Authority
- JP
- Japan
- Prior art keywords
- rhodium
- soln
- iridium
- anion exchange
- exchange resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052703 rhodium Inorganic materials 0.000 title claims description 36
- 239000010948 rhodium Substances 0.000 title claims description 36
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 title claims description 36
- 238000000034 method Methods 0.000 title claims description 25
- 229910052741 iridium Inorganic materials 0.000 title claims description 24
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 title claims description 24
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000003957 anion exchange resin Substances 0.000 claims abstract description 16
- 239000007800 oxidant agent Substances 0.000 claims abstract description 15
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000002253 acid Substances 0.000 claims abstract description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000460 chlorine Substances 0.000 claims abstract description 5
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 5
- 238000005406 washing Methods 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 abstract description 8
- 230000003647 oxidation Effects 0.000 abstract description 3
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- 239000011347 resin Substances 0.000 abstract 3
- 229920005989 resin Polymers 0.000 abstract 3
- 230000001105 regulatory effect Effects 0.000 abstract 2
- 238000011084 recovery Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000010953 base metal Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920001429 chelating resin Polymers 0.000 description 1
- 238000009388 chemical precipitation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000009918 complex formation Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- -1 platinum group metals Chemical class 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Landscapes
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、ロジウム溶液中のイリジウムの除去方法に関
するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for removing iridium from a rhodium solution.
（従来技術とその問題点）
従来、廃触媒やメツキ廃液から回収する白金族金属の精
製は、化学的沈澱分離を主とした湿式法で行われている
、
特に、ロジウムの精製はロジウムを水酸化物や亜硝酸塩
として沈澱させ分離する煩雑な操作を繰り返すため、多
くの労力と時間を必要としてきた。(Prior art and its problems) Conventionally, the purification of platinum group metals recovered from waste catalysts and metallurgical waste liquids has been carried out by a wet method mainly based on chemical precipitation separation. The complicated process of precipitating and separating oxides and nitrites is repeated, which requires a lot of effort and time.
また、ロジウム以外の貴金属や卑金属が完全に除去され
ない欠点があったっ
一方、ロジウムの精製に陰イオン交換樹脂を用いるとロ
ジウム以外の貴金属を除去することができるが、イリジ
ウムだけは完全に除去されないという欠点があり、ロジ
ウムが陰イオン交換樹脂に吸着され、回収率が低下する
という欠点もあった。In addition, while there was a drawback that noble metals and base metals other than rhodium were not completely removed, using anion exchange resin to purify rhodium makes it possible to remove noble metals other than rhodium, but only iridium is not completely removed. Another drawback is that rhodium is adsorbed on the anion exchange resin, reducing the recovery rate.
（発明の目的）
本発明は、上記欠点を解消し、ロジウム溶液中のイリジ
ウムを容易にかつ効率良く除去できる方法を提供せんと
するものである。(Objective of the Invention) The present invention aims to eliminate the above-mentioned drawbacks and provide a method that can easily and efficiently remove iridium from a rhodium solution.
（問題点を解決するための手段）
本発明は、塩化物イオンを含むロジウム溶液からイリジ
ウムを除去する方法に於いて、該ロジウム溶液に酸化剤
を加えて、酸濃度を２〜６規定に調製し、５０°Ｃ以上
に加熱し、冷却後、陰イオン交換樹脂に通液し、次いて
陰イオン交換樹脂を塩酸て水押し洗浄することを特徴と
するロジウム中のイリジウムの除去方法で、前記酸化剤
か過酸化水素又は塩素であるロジウム中のイリジウムの
除去方法である。(Means for Solving the Problems) The present invention provides a method for removing iridium from a rhodium solution containing chloride ions, in which an oxidizing agent is added to the rhodium solution to adjust the acid concentration to 2 to 6 normal. A method for removing iridium from rhodium, which is characterized by heating to 50° C. or higher, cooling, passing the solution through an anion exchange resin, and then washing the anion exchange resin with hydrochloric acid and water press. A method for removing iridium from rhodium using oxidizing agents such as hydrogen peroxide or chlorine.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
塩化物イオンを含むロジウム溶液のロジウムは塩化物錯
体であればよく、そのロジウム含有濃度は特に限定する
ものではないが、経済性を考慮して１〜１００ｇ／ｆの
範囲で行うのが良い。The rhodium in the rhodium solution containing chloride ions may be a chloride complex, and the rhodium content concentration is not particularly limited, but it is preferably in the range of 1 to 100 g/f in consideration of economic efficiency.
酸濃度は２〜６規定の範囲で調製するのがよい。The acid concentration is preferably adjusted within the range of 2 to 6 normal.
２規定以下の酸濃度では、塩化物錯体の形成が不完全な
ことが多く、ロジウムが陰イオン交換樹脂に吸着されて
、ロジウムの回収率を低下したり、洗い水を多く必要と
する。At an acid concentration of 2N or less, the formation of a chloride complex is often incomplete, and rhodium is adsorbed to the anion exchange resin, reducing the recovery rate of rhodium or requiring a large amount of washing water.
一方、６規定以上では、加熱の際に塩酸の蒸発が多くな
るので経済的に好ましくない。On the other hand, if it is higher than 6N, a large amount of hydrochloric acid will evaporate during heating, which is economically unfavorable.
また、酸化剤を加えて５０°Ｃ以上に加熱するのは、上
記イリジウムの酸化を完全にさせ、クロロ錯体を形成さ
せるためて、この操作によりイリジウムが陰イオン交換
績１脂に強く吸着され、ロジウム中のイリジウムを効率
よく除去できる。In addition, adding an oxidizing agent and heating to 50°C or higher is in order to completely oxidize the iridium and form a chloro complex. Iridium in rhodium can be removed efficiently.
また、ロジウムはクロロ錯体を完全に形成することから
、陰イオン交換樹脂に吸着されにくくなり、ロジウムの
回収率を向上させることができる。Furthermore, since rhodium completely forms a chloro complex, it is less likely to be adsorbed by an anion exchange resin, and the recovery rate of rhodium can be improved.
酸化剤としては過酸化水素または塩素なとの溶液から除
去しやすい酸化剤がよく、添加量はイリジウム当量の２
倍以上であることか必要である。As the oxidizing agent, an oxidizing agent that can be easily removed from a solution with hydrogen peroxide or chlorine is preferred, and the amount added is 2 equivalents of iridium.
It is necessary that it be more than double.
加熱温度は５０８Ｃ以上であればよ（、塩酸および酸化
剤の蒸発損失を少なくするためには、高い温度ではない
のがよい。The heating temperature should be 508C or higher (in order to reduce the evaporation loss of hydrochloric acid and the oxidizing agent, the temperature should not be high.
ここで加熱するのは、錯形成を促進させるためと、イリ
ジウムの酸化を完全にするためである。The purpose of heating here is to promote complex formation and to complete oxidation of iridium.
ここで用いる陰イオン交換樹脂は強塩基性陰イオン交換
樹脂であればよく、例えばアンバーライ）ＩＲＡ−４０
０（オルガノ製）、ダイヤイオン５Ａ−１０Ａ（三菱化
成製）等でよい。The anion exchange resin used here may be any strongly basic anion exchange resin, such as Amberly) IRA-40.
0 (manufactured by Organo), Diaion 5A-10A (manufactured by Mitsubishi Kasei), etc. may be used.
通液方法はカラムを用いた通液で、アップフローもしく
はダウンフローで行つ。The liquid is passed through the column using an upflow or downflow method.
その時の通液速度はＳＶ（空間速度）を０． １〜１０
程度にする。The liquid passing rate at that time is SV (space velocity) of 0. 1-10
to a certain degree.
ｓ’ｖ＝ｏ、を以下であると処理速度が少ない、ＳＶが
大きくなるとイリジウムの吸着が進まずにリークするこ
とから、５Ｖ＝０，１−１ｏであることが好ましい。If s'v=o or less, the processing speed will be low, and if SV becomes large, iridium adsorption will not proceed and leakage will occur. Therefore, it is preferable that 5V=0, 1-1o.
次いで、ロジウム溶液を通液した後の前記陰イオン交換
樹脂中に僅かに吸着されたロジウムを洗い出すため、３
規定以上の塩酸で水押しすることがロジウムの回収率を
向上させるために必要である。Next, in order to wash out the rhodium slightly adsorbed in the anion exchange resin after passing the rhodium solution,
Pressing with hydrochloric acid above the specified level is necessary to improve the recovery rate of rhodium.
以下、本発明に係わる実施例を記載するが、該実施例は
本発明を限定するものではない。Examples related to the present invention will be described below, but the examples are not intended to limit the present invention.
（実施例１）
濃塩酸で３Ｎ、３４．５％過酸化水素水で過酸化水素濃
度３．４５％となるように調製したロジウム濃度１０ｇ
／ｆ、イリジウムを１００ｍｇ／ｌ含む塩化ロジウム酸
溶液１００−を１０８℃で１０分間加熱処理した後、室
温まで冷却し、アンバーライトＩＲＡ−４（ｔｏ （オ
ルガノ製）の陰イオン交換樹脂５０ｍ１！を内１１８
ｍｍのカラスカラムに充填した陰イオン交換樹脂層にタ
ウンフロー５Ｖ＝ｌＯで通液し、次いで、該陰イオン交
換樹脂層を６Ｎ塩酸５０ｍ１で水押ししたつ
通液後のロジウム溶液中のロジウムおよびイリジウム当
量を分析したところ、イリジウムの除去率は９９．３先
、ロジウムの回収率は９６．３％であった。(Example 1) Rhodium concentration 10g adjusted to 3N with concentrated hydrochloric acid and 3.45% hydrogen peroxide concentration with 34.5% hydrogen peroxide solution
/f, 100-ml of rhodium chloride acid solution containing 100 mg/l of iridium was heat-treated at 108°C for 10 minutes, cooled to room temperature, and treated with 50 ml of anion exchange resin of Amberlite IRA-4 (to (manufactured by Organo)). 118 of them
The rhodium and Analysis of iridium equivalent showed that the iridium removal rate was 99.3% and the rhodium recovery rate was 96.3%.
（実施例２）
調製する過酸化水素濃度を０．３４５％とした以外は実
施例１と同様に操作してロジウム精製を行った。(Example 2) Rhodium purification was performed in the same manner as in Example 1 except that the hydrogen peroxide concentration to be prepared was 0.345%.
イリジウムの除去率は９２．９％、ロジウム回収率は９
５．３％であった。Iridium removal rate is 92.9%, rhodium recovery rate is 9
It was 5.3%.
（実施例３）
調製する塩酸濃度を６Ｎとした以外は実施例１と同様に
操作した。(Example 3) The same procedure as in Example 1 was carried out except that the concentration of hydrochloric acid to be prepared was 6N.
（実施例４）
加熱する温度を６０℃とした以外は実施例１と同様に操
作した。(Example 4) The same procedure as in Example 1 was performed except that the heating temperature was 60°C.
（実施例５）
加える酸化剤を０．５％塩素水とし、調製する酸化剤の
濃度を０．０５．９ｆ、とした以外は実施例１と同様に
操作した。(Example 5) The same procedure as in Example 1 was carried out except that the oxidizing agent added was 0.5% chlorine water and the concentration of the oxidizing agent prepared was 0.05.9 f.
（参考例１）
調製した塩酸濃度を０，５Ｎとした以外は実施例１と同
様に操作した。(Reference Example 1) The same procedure as in Example 1 was carried out except that the prepared hydrochloric acid concentration was 0.5N.
（参考例２）
調製時に加熱しないで、他は実施例１と同様に操作した
。(Reference Example 2) The procedure was the same as in Example 1 except that heating was not performed during preparation.
（参考例３）
ロジウム溶液通液後の水押しを５０１ｎｌの純水とした
以外は実施例１と同様に操作した。(Reference Example 3) The same procedure as in Example 1 was carried out except that 501 nl of pure water was used as the water press after passing the rhodium solution.
（従来例１） 酸化剤を加えないで、他は実施例１と同様に操作した。(Conventional example 1) The same procedure as in Example 1 was carried out except that no oxidizing agent was added.
（従来例２） 酸化剤を加えないで、他は実施例３と同様に操作した。(Conventional example 2) The same procedure as in Example 3 was carried out except that no oxidizing agent was added.
（従来例３） 酸濃度をＩＮとした以外は従来例１と同様に操作した。(Conventional example 3) The procedure was the same as in Conventional Example 1 except that the acid concentration was set to IN.
（従来例４） 酸化剤を加えないで、他は実施例４と同様に操作した。(Conventional example 4) The same procedure as in Example 4 was carried out except that no oxidizing agent was added.
上記の実施例３〜５、参考例１〜３、従来例１〜４のそ
れぞれ、イリジウムの除去率とロジウムの回収率は下表
の結果であった。The iridium removal rate and rhodium recovery rate of Examples 3 to 5, Reference Examples 1 to 3, and Conventional Examples 1 to 4 are shown in the table below.
ｌ従来例４１ ３８．５ １ ９４．５ ｊ（発明の
効果）
本発明は、塩化物イオンを含むロジウム溶液からイリジ
ウムを除去する方法に於いて、酸濃度を２〜６規定に調
製し、酸化剤を加えて５０°Ｃ以上に加熱し、冷却後、
陰イオン交換樹脂に通液し、次いで陰イオン交換樹脂を
塩酸で水押し洗浄することで、ロジウム溶液からイリジ
ウムを除去することができ、従来のイオン交換方法によ
り効果的に除去できることから、労力と時間を共に軽減
できるロジウム溶液からのイリジウムの画期的除去方法
であるといえる。l Conventional Example 41 38.5 1 94.5 j (Effects of the Invention) The present invention provides a method for removing iridium from a rhodium solution containing chloride ions by adjusting the acid concentration to 2 to 6 normal and oxidizing. Add the agent, heat to 50°C or higher, and after cooling,
Iridium can be removed from the rhodium solution by passing the solution through the anion exchange resin and then washing the anion exchange resin with hydrochloric acid.Iridium can be removed effectively using conventional ion exchange methods, which requires less labor and effort. It can be said that this is an innovative method for removing iridium from a rhodium solution that can save time and time.
出願人 田中貴金属工業株式会社Applicant: Tanaka Kikinzoku Kogyo Co., Ltd.
Claims (2)
を除去する方法に於いて、該ロジウム溶液に酸化剤を加
えて、酸濃度を２〜６規定に調製し、５０℃以上に加熱
し、冷却後、陰イオン交換樹脂に通液し、次いで陰イオ
ン交換樹脂を塩酸で水押し洗浄することを特徴とするロ
ジウム中のイリジウムの除去方法。(1) In the method of removing iridium from a rhodium solution containing chloride ions, an oxidizing agent is added to the rhodium solution to adjust the acid concentration to 2 to 6 normal, heated to 50°C or higher, and after cooling. A method for removing iridium from rhodium, which comprises passing a solution through an anion exchange resin, and then washing the anion exchange resin with hydrochloric acid.
に記載のロジウム中のイリジウムの除去方法。(2) Claim 1, wherein the oxidizing agent is hydrogen peroxide or chlorine.
A method for removing iridium from rhodium as described in .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30988090A JPH04180529A (en) | 1990-11-15 | 1990-11-15 | Method for removing iridium in rhodium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30988090A JPH04180529A (en) | 1990-11-15 | 1990-11-15 | Method for removing iridium in rhodium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04180529A true JPH04180529A (en) | 1992-06-26 |
Family
ID=17998418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30988090A Pending JPH04180529A (en) | 1990-11-15 | 1990-11-15 | Method for removing iridium in rhodium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04180529A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001098335A (en) * | 1999-08-05 | 2001-04-10 | Anglo American Platinum Corp Ltd | Separation of platinum group metal |
-
1990
- 1990-11-15 JP JP30988090A patent/JPH04180529A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001098335A (en) * | 1999-08-05 | 2001-04-10 | Anglo American Platinum Corp Ltd | Separation of platinum group metal |
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