JPH04179115A - Contracted projection aligner - Google Patents

Contracted projection aligner

Info

Publication number
JPH04179115A
JPH04179115A JP2303484A JP30348490A JPH04179115A JP H04179115 A JPH04179115 A JP H04179115A JP 2303484 A JP2303484 A JP 2303484A JP 30348490 A JP30348490 A JP 30348490A JP H04179115 A JPH04179115 A JP H04179115A
Authority
JP
Japan
Prior art keywords
stage
interferometers
michelson
arranged
slip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2303484A
Inventor
Makoto Ikejiri
Kazuhisa Tajima
Original Assignee
Nec Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nec Kyushu Ltd filed Critical Nec Kyushu Ltd
Priority to JP2303484A priority Critical patent/JPH04179115A/en
Publication of JPH04179115A publication Critical patent/JPH04179115A/en
Application status is Pending legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70775Position control

Abstract

PURPOSE: To enable the slip and the gradient in the Z axial direction on the reflection surface to be monitored per shot by a method wherein Michelson's interferometers are respectively arranged in X, Y, Z axial directions on a stage to mount a semiconductor wafer and mobile mirrors perpendicularly opposing to the laser beams oscillated from respective interferometers are fitted to the stage.
CONSTITUTION: Mobil mirrors 2-5 are fitted to the side of a stage 1. Next, Michelson's laser interferometers 6, 8 are arranged on the perpendicular surfaces of X Z of the mobile mirror 2 while the Michelson's laser interferometers 7, 9 are arranged on the perpendicular surfaces of X Z of the mobile mirror 3. Through these procedures, in order to contact-project the pattern on the semiconductor wafer 10 on a stage 1, the gradient and the slip of the stage 1 can be constantly monitored thereby enabling the mechanical error due to aging, etc., in the device to be corrected.
COPYRIGHT: (C)1992,JPO&Japio
JP2303484A 1990-11-08 1990-11-08 Contracted projection aligner Pending JPH04179115A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2303484A JPH04179115A (en) 1990-11-08 1990-11-08 Contracted projection aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2303484A JPH04179115A (en) 1990-11-08 1990-11-08 Contracted projection aligner

Publications (1)

Publication Number Publication Date
JPH04179115A true JPH04179115A (en) 1992-06-25

Family

ID=17921508

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2303484A Pending JPH04179115A (en) 1990-11-08 1990-11-08 Contracted projection aligner

Country Status (1)

Country Link
JP (1) JPH04179115A (en)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06151277A (en) * 1992-10-30 1994-05-31 Canon Inc Aligner
WO1999028790A1 (en) * 1997-12-02 1999-06-10 Asm Lithography B.V. Interferometer system and lithographic apparatus comprising such a system
EP1285222A1 (en) * 2000-05-17 2003-02-26 Zygo Corporation Interferometric apparatus and method
US6674510B1 (en) 1999-03-08 2004-01-06 Asml Netherlands B.V. Off-axis levelling in lithographic projection apparatus
US6819433B2 (en) 2001-02-15 2004-11-16 Canon Kabushiki Kaisha Exposure apparatus including interferometer system
US6924884B2 (en) 1999-03-08 2005-08-02 Asml Netherlands B.V. Off-axis leveling in lithographic projection apparatus
KR100578140B1 (en) * 2004-10-07 2006-05-10 삼성전자주식회사 Interferometer System For Measuring Displacement And Exposure System Using The Same
US7116401B2 (en) 1999-03-08 2006-10-03 Asml Netherlands B.V. Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
WO2007097466A1 (en) * 2006-02-21 2007-08-30 Nikon Corporation Measuring device and method, processing device and method, pattern forming device and method, exposing device and method, and device fabricating method
US8054472B2 (en) 2006-02-21 2011-11-08 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9690214B2 (en) 2006-02-21 2017-06-27 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06151277A (en) * 1992-10-30 1994-05-31 Canon Inc Aligner
WO1999028790A1 (en) * 1997-12-02 1999-06-10 Asm Lithography B.V. Interferometer system and lithographic apparatus comprising such a system
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
EP1347336A1 (en) * 1997-12-02 2003-09-24 ASML Netherlands B.V. Interferometer system and lithographic apparatus comprising such a system
US7019815B2 (en) 1999-03-08 2006-03-28 Asml Netherlands B.V. Off-axis leveling in lithographic projection apparatus
US6674510B1 (en) 1999-03-08 2004-01-06 Asml Netherlands B.V. Off-axis levelling in lithographic projection apparatus
US7202938B2 (en) 1999-03-08 2007-04-10 Asml Netherlands B.V. Off-axis levelling in lithographic projection apparatus
US6882405B2 (en) 1999-03-08 2005-04-19 Asml Netherlands B.V. Off-axis levelling in lithographic projection apparatus
US6924884B2 (en) 1999-03-08 2005-08-02 Asml Netherlands B.V. Off-axis leveling in lithographic projection apparatus
US7206058B2 (en) 1999-03-08 2007-04-17 Asml Netherlands B.V. Off-axis levelling in lithographic projection apparatus
US7116401B2 (en) 1999-03-08 2006-10-03 Asml Netherlands B.V. Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
EP1285222A1 (en) * 2000-05-17 2003-02-26 Zygo Corporation Interferometric apparatus and method
EP1285222A4 (en) * 2000-05-17 2006-11-15 Zygo Corp Interferometric apparatus and method
US6819433B2 (en) 2001-02-15 2004-11-16 Canon Kabushiki Kaisha Exposure apparatus including interferometer system
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
KR100578140B1 (en) * 2004-10-07 2006-05-10 삼성전자주식회사 Interferometer System For Measuring Displacement And Exposure System Using The Same
US7433048B2 (en) 2004-10-07 2008-10-07 Samsung Electronics Co., Ltd. Interferometer systems for measuring displacement and exposure systems using the same
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
WO2007097466A1 (en) * 2006-02-21 2007-08-30 Nikon Corporation Measuring device and method, processing device and method, pattern forming device and method, exposing device and method, and device fabricating method
JP2012094899A (en) * 2006-02-21 2012-05-17 Nikon Corp Processing apparatus and method, pattern forming apparatus, exposure device and method, and method for manufacturing device
US9857697B2 (en) 2006-02-21 2018-01-02 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
US8027021B2 (en) 2006-02-21 2011-09-27 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
US10012913B2 (en) 2006-02-21 2018-07-03 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
US9690214B2 (en) 2006-02-21 2017-06-27 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
JP5177674B2 (en) * 2006-02-21 2013-04-03 株式会社ニコン Measuring apparatus and method, pattern forming apparatus and method, and device manufacturing method
US9989859B2 (en) 2006-02-21 2018-06-05 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
US10409173B2 (en) 2006-02-21 2019-09-10 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
US9329060B2 (en) 2006-02-21 2016-05-03 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
US10088759B2 (en) 2006-02-21 2018-10-02 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
US10088343B2 (en) 2006-02-21 2018-10-02 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
US10234773B2 (en) 2006-02-21 2019-03-19 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
US10132658B2 (en) 2006-02-21 2018-11-20 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
US10345121B2 (en) 2006-02-21 2019-07-09 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
US8054472B2 (en) 2006-02-21 2011-11-08 Nikon Corporation Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
US10139738B2 (en) 2006-02-21 2018-11-27 Nikon Corporation Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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