JPH04178357A - Fluorine-containing compound and preparation thereof and lubricant composition containing fluorine-containing compound and magnetic recording medium - Google Patents
Fluorine-containing compound and preparation thereof and lubricant composition containing fluorine-containing compound and magnetic recording mediumInfo
- Publication number
- JPH04178357A JPH04178357A JP2307391A JP30739190A JPH04178357A JP H04178357 A JPH04178357 A JP H04178357A JP 2307391 A JP2307391 A JP 2307391A JP 30739190 A JP30739190 A JP 30739190A JP H04178357 A JPH04178357 A JP H04178357A
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- containing compound
- formula
- recording medium
- metal thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 60
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 59
- 239000011737 fluorine Substances 0.000 title claims abstract description 59
- 150000001875 compounds Chemical class 0.000 title claims abstract description 57
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 51
- 239000000314 lubricant Substances 0.000 title claims abstract description 50
- 239000000203 mixture Substances 0.000 title claims description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 239000010409 thin film Substances 0.000 claims abstract description 28
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims abstract description 24
- 150000002148 esters Chemical class 0.000 claims abstract description 15
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims abstract description 12
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims abstract description 8
- -1 fluoroalkyl ether Chemical compound 0.000 claims abstract description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 7
- UWTDFICHZKXYAC-UHFFFAOYSA-N boron;oxolane Chemical compound [B].C1CCOC1 UWTDFICHZKXYAC-UHFFFAOYSA-N 0.000 claims abstract description 5
- 230000005294 ferromagnetic effect Effects 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 239000010408 film Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 230000001681 protective effect Effects 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 230000002195 synergetic effect Effects 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 230000001050 lubricating effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 21
- 239000011241 protective layer Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000000434 field desorption mass spectrometry Methods 0.000 description 8
- 238000005461 lubrication Methods 0.000 description 8
- 239000002994 raw material Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 6
- 229920000570 polyether Polymers 0.000 description 6
- 239000004721 Polyphenylene oxide Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 150000001338 aliphatic hydrocarbons Chemical group 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 125000003709 fluoroalkyl group Chemical group 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910020598 Co Fe Inorganic materials 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002519 Co-Fe Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910020676 Co—N Inorganic materials 0.000 description 1
- 101150000419 GPC gene Proteins 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は高精度な潤滑が要求される精密機械、精密部品
の潤滑剤あるいは界面活性剤、離型剤、防錆剤等に有用
な新規含フッ素化合物とその製造方法およびその含フッ
素化合物を含有する潤滑剤組成物およびその含フッ素化
合物を潤滑剤層に含有させた磁気テープ、磁気ディスク
等の磁気記録媒体に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention is a novel fluorine-containing lubricant useful as a lubricant, a surfactant, a mold release agent, a rust preventive agent, etc. for precision machines and precision parts that require high-precision lubrication. The present invention relates to a compound, a method for producing the same, a lubricant composition containing the fluorine-containing compound, and a magnetic recording medium such as a magnetic tape or a magnetic disk in which the fluorine-containing compound is contained in a lubricant layer.
従来の技術
機械装置、部品の小型化、高精度化に伴いそれらの摺動
部における潤滑形態も流体潤滑から境界潤滑へと移行し
てきている。とりわけ、VTR1磁気デイスク等の電子
機器、電子部品においては、記録密度の向上を目的とし
た強磁性金属薄膜の採用により、磁気テープや磁気ディ
スクと磁気ヘッドとの摺動には高精度の潤滑が必要とな
ってきた。BACKGROUND OF THE INVENTION As mechanical devices and parts become smaller and more precise, the type of lubrication in their sliding parts has shifted from fluid lubrication to boundary lubrication. In particular, in electronic devices and electronic components such as VTR1 magnetic disks, the use of ferromagnetic metal thin films to improve recording density provides highly accurate lubrication for the sliding movement between magnetic tapes, magnetic disks, and magnetic heads. It has become necessary.
たとえば、蒸着テープやハードディスクではその耐久性
、実用信軌性を確保しながら磁気記録媒体と磁気ヘッド
とのスペーシングロスを極力小さくして高出力化を計る
ために、磁性層表面の潤滑剤層はわずか数10人の厚さ
となるように形成される。For example, in vapor deposited tapes and hard disks, in order to minimize spacing loss between the magnetic recording medium and magnetic head while ensuring durability and practical reliability, a lubricant layer on the surface of the magnetic layer is required. is formed so that it is only a few tens of people thick.
したがって、この潤滑剤層を形成させる材料としては、
特に潤滑性能に優れた有機化合物の開発が重要な課題と
なっている。Therefore, the materials for forming this lubricant layer are:
In particular, the development of organic compounds with excellent lubrication performance is an important issue.
金属薄膜型磁気記録媒体用の潤滑剤としては、その分子
内にフロロカーボン鎖を有するものが金属薄膜との適合
性に優れているため、多数のフロロカーボン系潤滑剤が
提案されている(たとえば、特開昭61−107527
号公報、特開昭61−107528号公報、特開昭61
−107529号公報、特開昭62−92225号公報
、特開昭62−92226号公報、特開昭62−922
27号公報)。また、パーフロロアルキルポリエーテル
鎖から成る化合物を磁気記録媒体用の潤滑剤とじたもの
も提案されている(たとえば、米国特許第3、778.
308号明細書、特開昭60−109028号公報)。As lubricants for metal thin film magnetic recording media, many fluorocarbon-based lubricants have been proposed because those with fluorocarbon chains in their molecules have excellent compatibility with metal thin films (for example, Kaisho 61-107527
No. 61-107528, JP-A-61-107528, JP-A-61-107528
-107529, JP 62-92225, JP 62-92226, JP 62-922
Publication No. 27). Additionally, compounds comprising perfluoroalkyl polyether chains have been proposed as lubricants for magnetic recording media (for example, U.S. Pat. No. 3,778.
(Specification No. 308, Japanese Unexamined Patent Publication No. 109028/1983).
一方、本発明の含フッ素化合物に類似の分子構造を有す
るものとしては、
CF、 CF3R。On the other hand, those having a molecular structure similar to the fluorine-containing compound of the present invention include CF and CF3R.
l ll
03F70+CFCF20→、 CFCONRzCOO
l(〔式中、R1は水素または炭素数1〜12の脂肪族
アルキル基を示し、R2は炭素数1.2または5の脂肪
族アルキレン基を示し、nはO〜8の整数を示す。〕が
界面活性剤として提案されている。l ll 03F70+CFCF20→, CFCONRzCOO
l([In the formula, R1 represents hydrogen or an aliphatic alkyl group having 1 to 12 carbon atoms, R2 represents an aliphatic alkylene group having 1.2 or 5 carbon atoms, and n represents an integer of 0 to 8. ] has been proposed as a surfactant.
(米国特許第3.798.265号明細書)。(U.S. Pat. No. 3,798,265).
本発明の含フッ素化合物と類似の化合物の製造方法が特
開昭64−26539号公報において、ポリフッ素化化
合物の製造方法として提案されている。これは、具体的
には、不飽和第2アミノアルコールに飽和第2アミノア
ルコールを加えた混合物を水素化し、その結果得られた
ものをエポキシ化またはエステル化反応させることによ
りポリフッ素化アミノアルコールまたはそのエステルを
得るというものである。A method for producing a compound similar to the fluorine-containing compound of the present invention is proposed in JP-A-64-26539 as a method for producing a polyfluorinated compound. Specifically, polyfluorinated amino alcohol or The goal is to obtain the ester.
発明が解決しようとする課題
金属薄膜型磁気記録媒体用の潤滑剤は金属膜表面あるい
は保護膜表面と磁気ヘッド表面に強く付着してそれらの
表面に潤滑剤による被覆層を形成し、それらの被覆層の
接触点、すなわち磁気記録媒体と磁気ヘッドとの摺動面
において潤滑剤分子間で容易にせん断されることが重要
である。ところで、磁気記録媒体用の潤滑剤として従来
公知のパーフロロアルキルポリエーテルはその分子表面
のほとんどすべてがフッ素原子で覆われているために分
子間のせん断性は良好であるが、その分子の極性が弱い
ために金属薄膜表面あるいは保護膜表面と磁気ヘッド表
面に付着する力は弱い。この欠点を改善するために、パ
ーフロロアルキルポリエーテルの分子末端に各種の極性
基を導入したものが提案されているが、その分子量が3
.000以上のものは極性基導入の効果があまり得られ
ず、極性基の効果を高めるために分子量を低減すると、
パーフロロアルキルポリエーテル分子間の相互作用が小
さいためにそれ自体の蒸発による潤滑剤の減少が生しる
。すなわち、パーフロロアルキルポリエーテルやその末
端基変性物は金属薄膜表面あるいは保護膜表面と磁気ヘ
ッド表面への付着性や安定性が悪く、その結果、これら
の化合物を金属薄膜型磁気記録媒体用の潤滑剤に用いた
ものは耐久信顧性、特に磁性金属の凝着が磁気ヘット′
表面で発生しやすい低湿度環境下における性能に問題を
有していた。Problems to be Solved by the Invention Lubricant for metal thin film magnetic recording media strongly adheres to the surface of the metal film or protective film and the surface of the magnetic head, forming a coating layer of lubricant on those surfaces. It is important that the lubricant molecules are easily sheared at the contact point of the layers, that is, the sliding surface between the magnetic recording medium and the magnetic head. By the way, perfluoroalkyl polyether, which is conventionally known as a lubricant for magnetic recording media, has good intermolecular shearing properties because almost all of its molecular surface is covered with fluorine atoms, but the polarity of the molecules Since the magnetic head is weak, the adhesion force between the metal thin film surface or protective film surface and the magnetic head surface is weak. In order to improve this drawback, it has been proposed that various polar groups are introduced into the molecular terminals of perfluoroalkyl polyether, but the molecular weight of the perfluoroalkyl polyether is 3.
.. If the molecular weight is more than 000, the effect of introducing a polar group cannot be obtained much, and if the molecular weight is reduced to enhance the effect of the polar group,
The small interaction between perfluoroalkyl polyether molecules results in loss of lubricant due to its own evaporation. In other words, perfluoroalkyl polyethers and their end group-modified products have poor adhesion and stability to metal thin film surfaces, protective film surfaces, and magnetic head surfaces, and as a result, these compounds cannot be used for metal thin film magnetic recording media. The lubricant used has durability and reliability, especially the adhesion of magnetic metal to the magnetic head.
There was a problem with performance in low humidity environments where it is likely to occur on the surface.
一方、前記先行文献に記載されるフロロカーボン系潤滑
剤は金属薄膜との適合性に優れているため、金属薄膜型
磁気記録媒体に適用されてきたが、湿度が10%RH以
下となる低湿度環境下においては充分な耐久性が得られ
ないという問題を有していた。On the other hand, the fluorocarbon-based lubricant described in the above-mentioned prior document has excellent compatibility with metal thin films and has been applied to metal thin film magnetic recording media; There was a problem in that sufficient durability could not be obtained at the bottom.
以上のことを考慮して種々検討した結果、同一分子内に
フロロアルキルエーテル末端基と脂肪族炭化水素末端基
と特定の極性末端基とを有する含フッ素化合物が金属薄
膜型磁気記録媒体用の潤滑剤として最適であるという結
論に達した。As a result of various studies taking the above points into consideration, we found that a fluorine-containing compound having a fluoroalkyl ether end group, an aliphatic hydrocarbon end group, and a specific polar end group in the same molecule is a suitable lubricant for metal thin film magnetic recording media. We have reached the conclusion that it is the best choice as a drug.
ところで、本発明の含フッ素化合物の製造にあたり、前
記従来技術による方法を用いると、単一なフッ素化合物
は得られずに、分子構造が異なる3種類のフン素化化合
物が混合するという問題を有していた。また、フッ素化
化合物を高純度に得るためには、シリカカラムなどで精
製する必要があり、コスト高になるという点で問題を有
していた。By the way, when the above-mentioned conventional method is used to produce the fluorine-containing compound of the present invention, a single fluorine compound cannot be obtained, but there is a problem in that three types of fluorinated compounds having different molecular structures are mixed. Was. Furthermore, in order to obtain a highly pure fluorinated compound, it is necessary to purify it using a silica column or the like, which poses a problem in that it increases costs.
本発明は上記の結論および新規の製造方法によりなされ
たものであり、金属薄膜型磁気記録媒体に対して良好な
耐久信頼性を付与する新規含フッ素化合物およびその含
フッ素化合物を含有する潤滑剤組成物およびその含フッ
素化合物を潤滑剤層に含有させた磁気テープ、磁気ディ
スク等の磁気記録媒体を提供することを目的とする。The present invention has been achieved based on the above-mentioned conclusion and a new manufacturing method, and provides a novel fluorine-containing compound and a lubricant composition containing the fluorine-containing compound, which impart good durability and reliability to metal thin film magnetic recording media. An object of the present invention is to provide a magnetic recording medium such as a magnetic tape or a magnetic disk in which a lubricant layer contains a fluorine-containing compound and a fluorine-containing compound thereof.
課題を解決するための手段
上記の目的を達成するための本発明は、以下の1〜4に
示す構成とする。Means for Solving the Problems The present invention for achieving the above objects has the following configurations 1 to 4.
(1)一般式(I)
〔式中、Rfは炭素数6〜5oのフロロアルキリエーテ
ル末端基を示し、Rは脂肪族アルキル末端基もしくは脂
肪族アルケニル末端基を示す。〕で表わされる含フッ素
化合物。(1) General formula (I) [Wherein, Rf represents a fluoroalkyriether terminal group having 6 to 5 carbon atoms, and R represents an aliphatic alkyl terminal group or an aliphatic alkenyl terminal group. ] A fluorine-containing compound represented by
(2)一般式〔■〕
〔式中、Rfは炭素数6〜50のフロロアルキルエーテ
ル末端基を示し、Rは脂肪族アルキル末端基もしくは脂
肪族アルケニル末端基を示す。〕で表わされる含フッ素
アルキルアミドエステルとポランテトラヒドロフランコ
ンプレックスのテトラヒドロフラン溶液を反応させ、カ
ルボニル基を還元することを特徴とする一般式〔■〕で
表わされる含フッ素化合物の製造方法。(2) General formula [■] [In the formula, Rf represents a fluoroalkyl ether terminal group having 6 to 50 carbon atoms, and R represents an aliphatic alkyl terminal group or an aliphatic alkenyl terminal group. A method for producing a fluorine-containing compound represented by the general formula [■], which comprises reacting a fluorine-containing alkylamide ester represented by the formula with a tetrahydrofuran solution of a porantetrahydrofuran complex to reduce a carbonyl group.
(3)一般式([〕で表わされる含フッ素化合物を含有
することを特徴とする潤滑剤組成物。(3) A lubricant composition characterized by containing a fluorine-containing compound represented by the general formula ([]).
(4)非磁性支持体上に強磁性金属薄膜が形成されてい
る磁気記録媒体において、前記強磁性金属薄膜上に直接
あるいは保護膜を介して一般式〔■〕で表わされる含フ
ッ素化合物を少なくとも1種類以上含有する潤滑剤層が
形成されていることを特徴とする磁気記録媒体。(4) In a magnetic recording medium in which a ferromagnetic metal thin film is formed on a non-magnetic support, at least a fluorine-containing compound represented by the general formula [■] is added directly or via a protective film to the ferromagnetic metal thin film. A magnetic recording medium characterized in that a lubricant layer containing one or more types is formed.
本発明の含フッ素化合物の末端基としては、たとえば下
記に示すようなものがある。Examples of the terminal group of the fluorine-containing compound of the present invention include those shown below.
脂肪族炭化水素末端基すなわち脂肪族アルキル末端基お
よび脂肪族アルケニル末端基としては、C,H2□1−
CイH2m−、−
Ch Hzk、+ CHC,IH2,、−C,H2い
1
(ただし、k、1およびmは8以上の整数、nは0もし
くは1以上の整数を示す。)
等があり、これらの末端基の総炭素数は8〜3゜(好ま
しくは12〜26)が適しており、総炭素数が7以下や
31以上では潤滑性が充分ではない。Aliphatic hydrocarbon terminal groups, that is, aliphatic alkyl terminal groups and aliphatic alkenyl terminal groups, include C,H2□1-CiH2m-, -Ch Hzk, +CHC,IH2,, -C,H2i1 (however, , k, 1 and m are integers of 8 or more, and n is an integer of 0 or 1 or more. If the total number of carbon atoms is 7 or less or 31 or more, the lubricity is not sufficient.
フロロアルキルエーテル末端基としては、F+C,F、
O−升、 C2F4CH2−Ch、O÷C,F40→
TセCF 20→−、−cp、co2−CF3
CF3
F+CFCF20→、 CFCFIz−CF。As the fluoroalkyl ether terminal group, F+C, F,
O-masu, C2F4CH2-Ch, O÷C, F40→
TseCF 20→-, -cp, co2-CF3
CF3 F+CFCF20→, CFCFIz-CF.
cp、0+CFzCFO→]「←CF 20→、−cp
2C’)l 2−CF3 、 CF、 R
CF、O÷CFCFzO+TCFCONC2H4−CF
+
□
Cc l F z O+CF z CF O−+T+C
F z O+−CF z CHz−(ただし、mは1〜
15.nは1〜45の整数を示し、Rは水素または炭素
数1〜12の脂肪族アルキル基を示す。)
等があり、これらの末端基の総炭素数は6〜5゜(好ま
しくはlO〜30)が適しており、総炭素数が5以下で
は潤滑性が充分ではなく、総炭素数が51以上では極性
末端基の効果が低下する。cp, 0+CFzCFO→] "←CF 20→, -cp
2C') l 2-CF3, CF, R CF, O÷CFCFzO+TCFCONC2H4-CF
+ □ Cc l F z O+CF z CF O-+T+C
F z O+-CF z CHz- (however, m is 1~
15. n represents an integer of 1 to 45, and R represents hydrogen or an aliphatic alkyl group having 1 to 12 carbon atoms. ) etc., and the total number of carbon atoms in these end groups is suitably 6 to 5 degrees (preferably 10 to 30); if the total number of carbon atoms is less than 5, the lubricity is not sufficient, and if the total number of carbon atoms is 51 or more, In this case, the effect of the polar end group is reduced.
つぎに、本発明の含フッ素化合物の製造方法について説
明する、本発明の含フン素化合物は、前記一般式〔■〕
で表わされる含フッ素アルキルアミドエステルのテトラ
ヒドロフラン(THF)ン容液にボランTHFコンプレ
ックスのTHF溶液を添加し、還流させてカルボニル基
を還元し、アミンとすることにより製造することができ
る、本発明の含フッ素化合物の原料である前記一般式〔
■〕で表わされる含フッ素アルキルアミドエステルは、
ボランTHFコンプレックスと高い反応性を示すため単
一の化合物を高純度かつ高収率で得ることができること
を発見した、本発明の含フッ素化合物はこの発見により
、低コストから工業的規模で製造することが可能となっ
た。Next, the method for producing the fluorine-containing compound of the present invention will be explained. The fluorine-containing compound of the present invention has the general formula [■]
The present invention can be produced by adding a THF solution of a borane THF complex to a tetrahydrofuran (THF) solution of a fluorine-containing alkylamide ester represented by the formula, and refluxing the solution to reduce the carbonyl group to form an amine. The above general formula [
■] The fluorine-containing alkylamide ester represented by
It was discovered that a single compound can be obtained with high purity and high yield because it shows high reactivity with borane THF complex.With this discovery, the fluorine-containing compound of the present invention can be manufactured at low cost on an industrial scale. It became possible.
本発明の潤滑剤組成物としては一般式〔1〕で表わされ
る含フッ素化合物単独あるいはこれらと他の潤滑剤との
混合物が通しており、前記他の潤滑剤としてはフロロカ
ーボン系潤滑剤の使用が好ましい。とりわけ、特開昭6
1−107527号公報、特開昭61−107528号
公報、特開昭61−107529号公報、特開昭62−
92225号公報、特開昭62−92226号公報、特
開昭62−92227号公報等に記載されているものが
好適である。さらにその他公知の潤滑剤、防錆剤等を混
合使用することもできる。The lubricant composition of the present invention includes a fluorine-containing compound represented by the general formula [1] alone or a mixture of these and other lubricants, and as the other lubricant, a fluorocarbon-based lubricant may be used. preferable. In particular, JP-A-6
1-107527, JP-A-61-107528, JP-A-61-107529, JP-A-62-
Those described in JP-A-92225, JP-A-62-92226, JP-A-62-92227, etc. are suitable. Furthermore, other known lubricants, rust preventives, etc. may also be used in combination.
一般式〔I〕で表わされる含フン素化合物は潤滑剤組成
物中に20%以上、好ましくは30%以上含有させるこ
とが必要で、20%未満であると本発明の効果が得られ
難い。The fluorine-containing compound represented by general formula [I] must be contained in the lubricant composition in an amount of 20% or more, preferably 30% or more, and if it is less than 20%, it is difficult to obtain the effects of the present invention.
次に、一般式[1)で表わされる含フン素化合物を含有
する潤滑剤層を形成した強磁性金属薄膜型磁気記録媒体
の例について説明する。Next, an example of a ferromagnetic metal thin film type magnetic recording medium in which a lubricant layer containing a fluorine-containing compound represented by the general formula [1] is formed will be described.
強磁性金属薄膜型磁気記録媒体の磁性層上には前記潤滑
剤組成物が直接あるいは保護層を介して通常の湿式塗布
法あるいは真空蒸着等の乾式塗布法により形成される。The lubricant composition is formed directly or via a protective layer on the magnetic layer of the ferromagnetic metal thin film type magnetic recording medium by a conventional wet coating method or a dry coating method such as vacuum deposition.
その付着量としては表面1ボ当り0.05〜100■、
好ましくは0.1〜50■となるように薄層状に存在さ
せる。The amount of adhesion is 0.05 to 100 cm per 1 hole on the surface.
It is preferably present in a thin layer with a thickness of 0.1 to 50 cm.
強磁性金属薄膜としては、Co、Co−Ni。Examples of the ferromagnetic metal thin film include Co and Co-Ni.
Co−Cr、Co−Fe、Co−Ni−Cr、Co−N
i−Fe、 Co−Ni −P、 Co−Ni −
Ta等あるいはこれらの部分酸化されたものが適用でき
、これらの薄膜は真空蒸着法、スパッタリング法、イオ
ンブレーティング法、メツキ法等により形成される。ま
た、必要に応じてCr、Ti等の下地層を設けることも
可能であり、下地層を含めた強磁性金属薄膜の厚みとし
ては500〜5,000人が適当である。強磁性金属薄
膜の表面には必要に応してCr、W、NiP等の金属系
保護層、5iO3SiC,カーボン、グラファイト、ダ
イヤモンドライクカーボン等の無機系保護層、フッ素樹
脂、シリコン樹脂、エポキシ樹脂、ポリアミド樹脂、プ
ラズマ重合生成物、放射線重合生成物等の有機系保護層
あるいは複合系保護層等を形成させることができる。Co-Cr, Co-Fe, Co-Ni-Cr, Co-N
i-Fe, Co-Ni-P, Co-Ni-
Ta or a partially oxidized version thereof can be used, and these thin films can be formed by vacuum evaporation, sputtering, ion blasting, plating, or the like. Further, it is also possible to provide an underlayer of Cr, Ti, etc. if necessary, and the appropriate thickness of the ferromagnetic metal thin film including the underlayer is 500 to 5,000. On the surface of the ferromagnetic metal thin film, if necessary, a metallic protective layer such as Cr, W, NiP, etc., an inorganic protective layer such as 5iO3SiC, carbon, graphite, diamond-like carbon, fluororesin, silicone resin, epoxy resin, An organic protective layer or a composite protective layer made of polyamide resin, plasma polymerization product, radiation polymerization product, etc. can be formed.
非磁性支持体としてはガラス、セラミックス等の酸化物
、AI!、合金、Ti合金等の金属あるいはポリエステ
ル、ポリイミド、ポリアミドイミド、ポリカーボネート
、ポリアクリレート等のプラスチック層を主体として用
いることができる。さらに、その表面には必要に応して
Co−Pメツキ、ポリイミドコーテイング膜等を形成さ
せたものや微小粒状、山状、波状等の突起、テクスチャ
加工による突起等を設けたものが使用できる。それらの
支持体の表面粗さとしては最大高さRmaχ、で50〜
600人が適当である。また、その形状としてはテープ
、フィルム、シート、ディスク、カード、ドラム等目的
に応して選定することができる。Non-magnetic supports include oxides such as glass and ceramics, and AI! , alloys, and Ti alloys, or plastic layers such as polyester, polyimide, polyamideimide, polycarbonate, and polyacrylate. Furthermore, the surface may be coated with Co--P plating, polyimide coating film, etc., or may have microscopic, mountain-like, wavy, etc. protrusions, textured protrusions, etc., as required. As for the surface roughness of those supports, the maximum height Rmaχ is 50~
600 people is appropriate. Further, its shape can be selected from tape, film, sheet, disk, card, drum, etc. depending on the purpose.
作用
本発明の含フッ素化合物は同一分子内にフロロアルキル
エーテル末端基と脂肪族炭化水素末端基と特定の極性末
端基とを有しており、その分子量が数100〜3,00
0程度であるために極性末端基の効果が充分発揮され、
金属薄膜表面あるいは保護膜表面と磁気ヘッド表面にこ
の極性末端基が強く付着する。また、フロロアルキルエ
ーテル末’4Mは表面に露出してその表面の低エネルギ
ー化に寄与し、非粘着面を形成する。さらに、脂肪族炭
化水素末端基は柔軟な炭素−炭素結合鎖であり、かつ、
隣接する他の分子の炭化水素鎖との適度な分子間相互作
用で配向するために良好な潤滑性を示す。Function The fluorine-containing compound of the present invention has a fluoroalkyl ether terminal group, an aliphatic hydrocarbon terminal group, and a specific polar terminal group in the same molecule, and has a molecular weight of several 100 to 3,000.
Since it is about 0, the effect of the polar end group is fully exhibited,
These polar terminal groups strongly adhere to the surface of the metal thin film or protective film and to the surface of the magnetic head. Further, the fluoroalkyl ether powder '4M is exposed on the surface, contributes to lowering the energy of the surface, and forms a non-adhesive surface. Furthermore, the aliphatic hydrocarbon end group is a flexible carbon-carbon bond chain, and
It exhibits good lubricity because it is oriented through moderate intermolecular interactions with the hydrocarbon chains of other adjacent molecules.
したがって、これらの各末端基の相乗効果により過酷な
低湿度環境を含む全環境において良好な潤滑性能を発現
し、金属薄膜型磁気記録媒体の耐久信転性に関する問題
は解決されることになる。Therefore, due to the synergistic effect of these end groups, good lubrication performance is exhibited in all environments including harsh low-humidity environments, and the problem regarding the durability and reliability of metal thin film magnetic recording media is solved.
実施例
以下、実施例1〜4においては含フッ素化合物の例とそ
の製造方法について、実施例5〜12においてはそれら
の含フッ素化合物を含有する潤滑剤組成物を用いた磁気
記録媒体の例について具体的に述べる。Examples Below, Examples 1 to 4 describe examples of fluorine-containing compounds and their manufacturing methods, and Examples 5 to 12 describe examples of magnetic recording media using lubricant compositions containing these fluorine-containing compounds. Let's be specific.
実施例1
弐F−+CF (CF3) cFzO→TCF(CFz
)CONHC+aH37で表わされる含フッ素第2アル
キルアミドエステル91.4g (0,10モル)と無
水テトラヒドロフラン(THF)300dを攪拌翼と滴
下ロートを備えた1!のフラスコに採取し、乾燥した高
純度窒素を1分間流した後15〜20“Cのウォーター
バス上で攪拌しながらIMボランTHFコンプレックス
のTHF?容液300dを約2時間で滴下した。ひき続
き18時間還流と攪拌を続けて反応を完結させた。反応
終了後、反応溶液を5〜10゛Cに冷却して蒸留水Lo
omを注意深く滴下して加水分解を行った。つぎに6N
塩酸50dを加え、反応溶液を85〜90°Cに加熱し
て、大気中でTHFを留去した後、還流と攪拌を続けな
がら6N水酸化ナトリムLoomを約1時間で滴下して
、アミンを単離した。得られた反応混合物をクロロホル
ム溶液とし、この溶液を蒸留水でpHが7になるまで繰
り返し洗浄した後、この溶液を無水芒硝で乾燥させた。Example 1 2F-+CF (CF3) cFzO→TCF(CFz
) 91.4 g (0.10 mol) of a fluorine-containing secondary alkylamide ester represented by CONHC+aH37 and 300 d of anhydrous tetrahydrofuran (THF) were mixed into a 1! equipped with a stirring blade and a dropping funnel. After flowing dry high-purity nitrogen for 1 minute, 300 d of THF solution of IM borane THF complex was added dropwise over about 2 hours while stirring on a water bath at 15-20"C. The reaction was completed by continuing refluxing and stirring for 18 hours. After the reaction was completed, the reaction solution was cooled to 5~10°C and distilled water Lo
om was carefully added dropwise to perform hydrolysis. Next 6N
After adding 50 d of hydrochloric acid and heating the reaction solution to 85-90°C and distilling off THF in the atmosphere, 6N sodium hydroxide Loom was added dropwise over about 1 hour while continuing to reflux and stirring to remove the amine. isolated. The resulting reaction mixture was made into a chloroform solution, and this solution was repeatedly washed with distilled water until the pH reached 7, and then this solution was dried with anhydrous sodium sulfate.
つぎに、クロロホルムを留去し、反応混合物をベンゼン
溶液とした後、5°Cに冷却して未反応の含フッ素第2
アルキルアミドエステル原料を除去して、融点が80°
Cの白色固体を得た。この白色固体は赤外分光分析(I
R) 、GPCおよび有機質量分析(FD−MS)によ
り、出発原料および副生成物を含まない式Aで表わされ
る含フン素化合物であることが判明した。Next, chloroform was distilled off and the reaction mixture was made into a benzene solution, which was then cooled to 5°C and unreacted fluorine-containing secondary
By removing the alkylamide ester raw material, the melting point is 80°
A white solid of C was obtained. This white solid was analyzed by infrared spectroscopy (I
R), GPC and organic mass spectrometry (FD-MS) revealed that it was a fluorine-containing compound represented by formula A containing no starting materials and by-products.
IR;カルボニル基1.640cm−’の吸収ピーク消
滅
GPC;含フッ素第2アルキルアミドエステル原料検出
されず
F D−MS ; m/ e 900に主ピーク有実施
例2
式CF30÷CF zcF (CF z) Oモコヒヒ
CF2O刊−1−CF、C0NHC14H29(平均分
子量1000. m、 nは1〜9の整数)で表わさ
れる含フッ素第2アルキルアミドエステル100.0g
(0,10モル)と無水THF300−を攪拌翼と滴
下ロートを備えた12のフラスコに採取し、乾燥した高
純度窒素ガスを1分間流した後、15〜20″Cのウォ
ーターハス上で攪拌しながらIMのバランTHFコンプ
レックスのTHF溶液300dを約2時間で滴下した。IR: Absorption peak of carbonyl group 1.640 cm-' disappeared GPC: Fluorine-containing secondary alkylamide ester raw material not detected FD-MS: Main peak at m/e 900 Example 2 Formula CF30÷CF zcF (CF z 100.0g of fluorine-containing secondary alkylamide ester represented by O Mokobahi CF2O-1-CF, CONHC14H29 (average molecular weight 1000.m, n is an integer from 1 to 9)
(0.10 mol) and anhydrous THF300- were collected in 12 flasks equipped with a stirring blade and a dropping funnel, and after flowing dry high-purity nitrogen gas for 1 minute, they were stirred on a water bath at 15-20"C. Meanwhile, 300 d of THF solution of IM's Balun THF complex was added dropwise over about 2 hours.
ひき続き、18時間還流と攪拌を続けて反応を完結させ
た。反応終了後、反応溶液を5〜10°Cに冷却して、
蒸留水100戚を注意深く滴下して加水分解を行った。Subsequently, refluxing and stirring were continued for 18 hours to complete the reaction. After the reaction is completed, the reaction solution is cooled to 5-10°C,
Hydrolysis was carried out by carefully dropping 100ml of distilled water.
つぎに6N塩素50成を加え、反応溶液を85〜90°
Cに加熱して、大気中でTHFを留去した後、還流と攪
拌を続けながら6N水酸化ナトリウム100−を約1時
間で滴下して、アミンを単離した。得られた反応混合物
を実施例1と同様な精製処理を行なって、融点55°C
の白色固体を得た。この白色固体は、IR,(:。Next, 50% of 6N chlorine was added, and the reaction solution was heated to 85-90°.
The mixture was heated to a temperature of 100.degree. C. and THF was distilled off in the air, and then 6N sodium hydroxide (100.degree.) was added dropwise over about 1 hour while refluxing and stirring was continued to isolate the amine. The obtained reaction mixture was purified in the same manner as in Example 1, and the melting point was 55°C.
A white solid was obtained. This white solid is IR, (:.
PCおよびFD−MSにより出発原料および副生成物を
含まない弐Bで表わされる含フッ素化合物であることが
判明した。It was found by PC and FD-MS to be a fluorine-containing compound represented by 2B containing no starting materials or by-products.
IR;カルボニル基1+640cm−’の吸収ピーク消
滅
GPC,含フッ素第2アルキルアミドエステル原料検出
されず
F D−MS ; m/ e 890に主ピーク有実施
例3
弐F−+CJF60←−CZF4CONHC18H3S
(平均分子量2.740.nは1〜15の整数)で
表わされる含フッ゛素第2アルキルアミドエステルを原
料として、実施例1と同様の製造方法によってワックス
状半固体を得た。このワックス状半固体はIR,GPC
およびFD−MSにより、出発原料および副生成物を含
まない式Cで表わされる含フッ素化合物であることが判
明した。IR: Absorption peak of carbonyl group 1+640 cm-' disappeared GPC, fluorine-containing secondary alkylamide ester raw material not detected FD-MS: Main peak at m/e 890 Example 3 2F-+CJF60←-CZF4CONHC18H3S
A waxy semi-solid was obtained by the same manufacturing method as in Example 1 using a fluorine-containing secondary alkylamide ester having an average molecular weight of 2.740.n as an integer of 1 to 15 as a raw material. This waxy semi-solid is IR, GPC
And, by FD-MS, it was found to be a fluorine-containing compound represented by formula C containing no starting materials and by-products.
IR,カルボニル基1.640cm−’の吸収ピーク消
滅
GPC,含フッ素第2アルキルアミドエステル原料検出
されず
FD−MS ;m/e 2,730に主ピーク有(以
下余白)
実施例4
式CeLF20→CF zCF (CF 3)0−+T
−+CF zo+T−CF zCONHC+oHz+(
平均分子量1430. m、 nは1〜20の整数)
で表わされる含フッ素第2アルキルアミドエステルを原
料として実施例1と同様の製造方法によって、ワックス
状半固体を得た。このワックス状半固体は、IR,GP
CおよびFD−MSにより、出発原料および副生成物を
含まない式りで表わされる含フッ素化合物であることが
判明した。IR, absorption peak of carbonyl group 1.640 cm-' disappears GPC, fluorine-containing secondary alkylamide ester raw material not detected FD-MS; main peak at m/e 2,730 (blank below) Example 4 Formula CeLF20→ CF zCF (CF 3)0-+T
-+CF zo+T-CF zCONHC+oHz+(
Average molecular weight 1430. m and n are integers from 1 to 20)
A waxy semi-solid was obtained by the same manufacturing method as in Example 1 using the fluorine-containing secondary alkylamide ester represented by as a raw material. This waxy semisolid is IR, GP
C and FD-MS revealed that it was a fluorine-containing compound represented by the formula containing no starting materials or by-products.
■R;カルボニル基1,640cm−’の吸収ピーク消
滅
cpc、含フッ素第2アルキルアミドエステル原料検出
されず
FD−MS ;m/e 1,420に主ピーク有実施
例5
ポリエステルフィルム内に添加されたシリカ微粒子によ
る勾配のゆるやかな粒状突起(平均高さ70人、直径1
μm)が表面100μボ当り数個存在し、しかも重合触
媒残渣に起因する微粒子による比較的大きな突起を極力
低減させたポリエステルフィルムの表面に、直径150
人のシリカコロイド粒子を核とし紫外線硬化エポキシ樹
脂を結合剤とする急峻な山状突起を151m”当りlX
l0’個となるように形成させたものを非磁性基板とし
た。その上に連続真空斜め蒸着法によりCo−Ni強磁
性金属薄膜(Ni含有量20%、膜厚1000人)を微
量の酸素の存在下で形成させた。薄膜中の酸素含有量は
原子分率で5%であった。■R: Absorption peak of carbonyl group disappeared at 1,640 cm-' CPC, fluorine-containing secondary alkylamide ester raw material not detected FD-MS; main peak at m/e 1,420 Example 5 Added to polyester film Granular projections with a gentle slope made of fine silica particles (average height 70 people, diameter 1
150 μm) are present on the surface of the polyester film, which has several protrusions per 100 μm on the surface, and which has minimized relatively large protrusions caused by fine particles caused by polymerization catalyst residue.
Steep mountain-like protrusions made of human silica colloid particles as a core and UV-cured epoxy resin as a binder are 1X per 151 m.
A non-magnetic substrate was formed so that 10' pieces were formed. A Co--Ni ferromagnetic metal thin film (Ni content: 20%, film thickness: 1000 mm) was formed thereon by continuous vacuum oblique evaporation in the presence of a trace amount of oxygen. The oxygen content in the thin film was 5% in atomic fraction.
この試料に前記本発明の含フッ素化合物あるいはそれら
と従来公知の潤滑剤との混合物を各々別々に金属薄膜表
面1M当り10■の存在量となるように塗布して潤滑剤
層を形成させた後、所定幅に裁断して磁気テープを作製
した。これらのテープを23°C15%RH環境下で市
販ビデオデツキに掛けて繰り返し走行時の出力特性を測
定し、RF出力が初期値に対し3dB低下するがあるい
は出力変動の発生し始めるまでの走行回数を求めた。こ
れらの結果を第1表に示す。なお、用いた本発明の含フ
ッ素化合物は前記の実施例番号で第1表中に示した。ま
た、本発明の含フッ素化合物と従来公知の潤滑剤との混
合物により潤滑剤層を形成した例も併せて記した。After applying the fluorine-containing compound of the present invention or a mixture of the same and a conventionally known lubricant to this sample in an amount of 10 cm per 1M of the metal thin film surface, a lubricant layer was formed. A magnetic tape was produced by cutting the tape into a predetermined width. These tapes were hung on a commercially available video deck in an environment of 23°C and 15% RH, and the output characteristics were measured during repeated runs, and the number of runs until the RF output decreased by 3 dB from the initial value or the output began to fluctuate was determined. I asked for it. These results are shown in Table 1. The fluorine-containing compounds of the present invention used are shown in Table 1 with the above-mentioned Example numbers. An example in which a lubricant layer was formed from a mixture of the fluorine-containing compound of the present invention and a conventionally known lubricant was also described.
(以下余白)
第 1 表
第1表より、本発明の含フッ素化合物を合作する潤滑剤
層を有する磁気テープ試料はすべて低湿度中における繰
り返し走行耐久性に優れていることがわかる。一方、従
来公知の潤滑剤のみから成る潤滑剤層を有する磁気テー
プ試料は比較例の通り、低湿度中での耐久性に劣る。(The following is a blank space) Table 1 From Table 1, it can be seen that all the magnetic tape samples having a lubricant layer containing the fluorine-containing compound of the present invention are excellent in repeated running durability in low humidity. On the other hand, magnetic tape samples having a lubricant layer consisting only of a conventionally known lubricant have poor durability in low humidity, as shown in the comparative example.
実施例12
直径95皿、厚さ1.2−のA2合金板の表面に厚さ2
5μmの非磁性N1−P合金メツキを施し、テクスチャ
加工により平均粗さ50人、最大高さ300人の突起を
形成したものを非磁性基板とした。その上にスパッタリ
ング法によって厚さ1.300人のCr下地と厚さ60
0人のCo−Ni強磁性金属薄膜を形成し、さらにその
上にスパッタリング法によって厚さ200人のグラファ
イト保護層を形成させたものを試料Aとする。前記にお
いて、グラファイト保護層の代わりにプラズマCVD法
によって厚さ50人のダイヤモンドライクカーボン保護
層を形成させたものを試料Bとする。これらの試料に前
記本発明の含フッ素化合物あるいはそれらと従来公知の
潤滑剤との混合物を各々別々に保護層表面1rrf当り
10■の存在量となるように塗布して潤滑剤層を形成さ
せた。これらの磁気ディスクを23“C15%RH環境
下でC3S耐久試験を実施し、摩擦係数が1.0を超え
た時点のC5S回数またはヘッドクラッシュ発生時のC
3S回数で耐久性の判定を行なった。これらの結果を第
2表に示す。Example 12 A plate with a thickness of 2 on the surface of an A2 alloy plate with a diameter of 95 and a thickness of 1.2
The nonmagnetic substrate was plated with a nonmagnetic N1-P alloy of 5 μm and had protrusions with an average roughness of 50 mm and a maximum height of 300 mm formed by texturing. On top of that, a Cr base layer with a thickness of 1.300 mm and a thickness of 60 mm was applied by sputtering.
Sample A is obtained by forming a Co--Ni ferromagnetic metal thin film with a thickness of 200 nm, and further forming a graphite protective layer with a thickness of 200 nm on top of it by sputtering. Sample B was prepared by forming a diamond-like carbon protective layer with a thickness of 50 mm by plasma CVD instead of the graphite protective layer. A lubricant layer was formed by separately applying the fluorine-containing compound of the present invention or a mixture of the same and a conventionally known lubricant to each of these samples in an amount of 10 cm/rrf of the surface of the protective layer. . These magnetic disks were subjected to a C3S durability test in a 23"C 15% RH environment, and the number of C5S at which the friction coefficient exceeded 1.0 or the C at the time of a head crash was measured.
Durability was evaluated based on the number of 3S cycles. These results are shown in Table 2.
なお、用いた本発明の含フッ素化合物は前記の実施例番
号で第2表中に示した。また、本発明の含フッ素化合物
と従来公知の潤滑剤との混合物により潤滑剤層を形成し
た例も併せて記した。The fluorine-containing compounds of the present invention used are shown in Table 2 with the above-mentioned Example numbers. An example in which a lubricant layer was formed from a mixture of the fluorine-containing compound of the present invention and a conventionally known lubricant was also described.
(以下余白)
第 2 表
第2表より、本発明の含フッ素化合物を含有する潤滑剤
層を有する磁気ディスク試料はすべて低湿度中における
C3S耐久性に優れていることがわかる。一方、従来公
知の潤滑剤のみから成る潤滑剤層を有する磁気ディスク
試料は比較例の通り、低湿度中での耐久性に劣る。(The following is a blank space) Table 2 From Table 2, it can be seen that all the magnetic disk samples having a lubricant layer containing the fluorine-containing compound of the present invention have excellent C3S durability in low humidity. On the other hand, a magnetic disk sample having a lubricant layer consisting only of a conventionally known lubricant has poor durability in low humidity, as shown in the comparative example.
発明の効果
本発明の含フッ素化合物は同一分子内にフロロアルキル
エーテル末端基と脂肪族炭化水素末端基とイミノ末端基
とを有する特異構造のものであり、それらの各末端基の
相乗硬化により過酷な低湿度環境を含む全環境において
良好な潤滑性能を発現する。Effects of the Invention The fluorine-containing compound of the present invention has a unique structure having a fluoroalkyl ether end group, an aliphatic hydrocarbon end group, and an imino end group in the same molecule, and due to the synergistic hardening of these end groups, it can withstand harsh conditions. Demonstrates good lubrication performance in all environments, including low humidity environments.
したがって、本発明の含フッ素化合物はそれ単独での利
用はもちろんのこと、それらと従来公知の化合物との混
合物から成る潤滑剤として、さらにはそれらを潤滑剤層
とする磁気記録媒体として利用できるためにその工業的
価値は非常に大きい。Therefore, the fluorine-containing compounds of the present invention can be used not only alone, but also as a lubricant consisting of a mixture of them and conventionally known compounds, and furthermore, as a magnetic recording medium using them as a lubricant layer. Its industrial value is enormous.
Claims (4)
ル末端基を示し、Rは脂肪族アルキル末端基もしくは脂
肪族アルケニル末端基を示す。〕で表わされる含フッ素
化合物。(1) General formula [I] ▲Mathematical formulas, chemical formulas, tables, etc.▼[I] [In the formula, Rf represents a fluoroalkyl ether terminal group having 6 to 50 carbon atoms, and R represents an aliphatic alkyl terminal group or an aliphatic alkyl terminal group. Indicates an aliphatic alkenyl end group. ] A fluorine-containing compound represented by
ル末端基を示し、Rは脂肪族アルキル末端基もしくは脂
肪族アルケニル末端基を示す。〕で表わされる含フッ素
アルキルアミドエステルとボランテトラヒドロフランコ
ンプレックスのテトラヒドロフラン溶液を反応させ、カ
ルボニル基を還元することを特徴とする一般式〔 I 〕
で表わされる含フッ素化合物の製造方法。(2) General formula [II] ▲ Numerical formulas, chemical formulas, tables, etc. are included ▼ [II] [In the formula, Rf represents a fluoroalkyl ether terminal group having 6 to 50 carbon atoms, and R represents an aliphatic alkyl terminal group or an aliphatic alkyl ether terminal group. The group represents an alkenyl end group. General formula [I] characterized in that the fluorine-containing alkylamide ester represented by ] is reacted with a tetrahydrofuran solution of a borane tetrahydrofuran complex to reduce the carbonyl group.
A method for producing a fluorine-containing compound represented by
有することを特徴とする潤滑剤組成物。(3) A lubricant composition containing a fluorine-containing compound represented by the general formula [I].
る磁気記録媒体において、前記強磁性金属薄膜上に直接
あるいは保護膜を介して一般式〔 I 〕で表わされる含
フッ素化合物を少なくとも1種類以上含有する潤滑剤層
が形成されていることを特徴とする磁気記録媒体。(4) In a magnetic recording medium in which a ferromagnetic metal thin film is formed on a non-magnetic support, at least a fluorine-containing compound represented by the general formula [I] is added directly or via a protective film to the ferromagnetic metal thin film. A magnetic recording medium characterized in that a lubricant layer containing one or more types is formed.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2307391A JPH04178357A (en) | 1990-11-13 | 1990-11-13 | Fluorine-containing compound and preparation thereof and lubricant composition containing fluorine-containing compound and magnetic recording medium |
US07/757,941 US5252400A (en) | 1990-11-13 | 1991-09-12 | Fluorine-containing compounds |
EP19910308936 EP0486142B1 (en) | 1990-11-13 | 1991-09-30 | Fluorine containing compounds and their use as lubricants in magnetic recording media |
DE1991615650 DE69115650T2 (en) | 1990-11-13 | 1991-09-30 | Compounds containing fluorine and their use as lubricants in magnetic recording media |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2307391A JPH04178357A (en) | 1990-11-13 | 1990-11-13 | Fluorine-containing compound and preparation thereof and lubricant composition containing fluorine-containing compound and magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04178357A true JPH04178357A (en) | 1992-06-25 |
Family
ID=17968488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2307391A Pending JPH04178357A (en) | 1990-11-13 | 1990-11-13 | Fluorine-containing compound and preparation thereof and lubricant composition containing fluorine-containing compound and magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04178357A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007026513A1 (en) * | 2005-08-30 | 2007-03-08 | Unimatec Co., Ltd. | Fluoroether having terminal alkylamino group and method for producing same |
-
1990
- 1990-11-13 JP JP2307391A patent/JPH04178357A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007026513A1 (en) * | 2005-08-30 | 2007-03-08 | Unimatec Co., Ltd. | Fluoroether having terminal alkylamino group and method for producing same |
JPWO2007026513A1 (en) * | 2005-08-30 | 2009-03-05 | ユニマテック株式会社 | Fluoroether having terminal alkylamino group and process for producing the same |
US7566806B2 (en) | 2005-08-30 | 2009-07-28 | Unimate Co., Ltd. | Alkylamino group-terminated fluoroether and process for producing the same |
JP4798133B2 (en) * | 2005-08-30 | 2011-10-19 | ユニマテック株式会社 | Fluoroether having terminal alkylamino group and process for producing the same |
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