JPH04152696A - Organic resin multilayer wiring board - Google Patents

Organic resin multilayer wiring board

Info

Publication number
JPH04152696A
JPH04152696A JP27810890A JP27810890A JPH04152696A JP H04152696 A JPH04152696 A JP H04152696A JP 27810890 A JP27810890 A JP 27810890A JP 27810890 A JP27810890 A JP 27810890A JP H04152696 A JPH04152696 A JP H04152696A
Authority
JP
Japan
Prior art keywords
layers
layer
wiring
resin
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27810890A
Other languages
Japanese (ja)
Other versions
JP2551223B2 (en
Inventor
Shinichi Hasegawa
真一 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP27810890A priority Critical patent/JP2551223B2/en
Publication of JPH04152696A publication Critical patent/JPH04152696A/en
Application granted granted Critical
Publication of JP2551223B2 publication Critical patent/JP2551223B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To prevent cracks from occurring to the corners of a wiring and an insulating layer and to enable signals to propagate at a high speed by a method wherein conductor wiring layers and insulating layers are alternately laminated on an organic resin multilayer wiring board and an insulating layer interposed between the signal layer and the ground layer out of the laminated conductor wiring layers is formed of benzocyclobutane resin. CONSTITUTION:Conductor wiring layers such as ground layers 3a and 3b, signal wiring layers 4a and 4b, a power supply signal transfer layer 7, or an electric component mounting layer 8 and polyimide resin insulating layers 5a-5d are alternately laminated to form a polyimide resin multilayer wiring board where BCB resin insulating layers 6a and 6b are formed between the ground layers 3a and 3b and the signal wiring layers 4a and 4b. The insulating layers between the ground layers 3a and 3b and the signal wiring layers 4a and 4b are lower in permittivity than the polyimide resin insulating layer normal in permittivity, so that signals can be made to propagate at a high speed. As the BCB resin insulating layers 6a and 6b are formed only between the ground layers 3a and 3b and the signal wiring layers 4a and 4b, cracks can be prevented from occurring to the corners of a wiring or an insulating layer.

Description

【発明の詳細な説明】 技術分野 本発明は有機樹脂多層配線基板に関し、特に電子機器で
用いられる多層配線基板に関する。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to an organic resin multilayer wiring board, and particularly to a multilayer wiring board used in electronic equipment.

従来技術 従来、ポリイミド樹脂多層配線基板においては、第2図
に示すように、セラミック(またはガラスセラミック)
多層配線基板11上に電源層12やグランド層16 a
、  16 b、あるいは信号配線層1.7a、17b
や電源・信号乗換え層18の導体配線層と、ポリイミド
樹脂絶縁層15a〜15fとが交互に積層されて構成さ
れていた。
Conventional technology Conventionally, in polyimide resin multilayer wiring boards, ceramic (or glass ceramic)
A power layer 12 and a ground layer 16a are formed on the multilayer wiring board 11.
, 16b, or signal wiring layers 1.7a, 17b
The conductor wiring layer of the power/signal transfer layer 18 and the polyimide resin insulating layers 15a to 15f were alternately laminated.

導体配線層の間はヴイアホール14により電気的に接続
されており、セラミック多層配線基板11上の最上層に
は電気部品搭載層10が設けられていた。
The conductive wiring layers were electrically connected by via holes 14, and an electrical component mounting layer 10 was provided in the uppermost layer on the ceramic multilayer wiring board 11.

電子材料として好材料といわれている一般的なポリイミ
ド樹脂では、多層配線基板の配線の信号の伝播速度に影
響する誘電率が3.4〜3.8程度であり、さらに誘電
率を下げることにより高速の伝播速度を実現しようとす
ると、さらに低誘電率のポリイミドを使用することにな
る。現在、誘電率が2.9〜3.0程度のポリイミド樹
脂も出されている。
General polyimide resin, which is said to be a good material as an electronic material, has a dielectric constant of about 3.4 to 3.8, which affects the propagation speed of signals in the wiring of multilayer wiring boards. In order to achieve higher propagation speeds, polyimide with an even lower dielectric constant must be used. Currently, polyimide resins with a dielectric constant of about 2.9 to 3.0 are also available.

また、ベンゾシクロブテン樹脂(以下BCB樹脂とする
)を用いた多層配線基板としては、配線層4層と絶縁層
4層とからなり、絶絶縁膜厚が約30 ミク07の多層
配線基板が開発されている。
Additionally, as a multilayer wiring board using benzocyclobutene resin (hereinafter referred to as BCB resin), a multilayer wiring board has been developed that consists of four wiring layers and four insulation layers, and has an insulation film thickness of approximately 30 microns. has been done.

このような従来のポリイミド樹脂多層配線基板ては、誘
電率が3.4〜3.8程度のポリイミドを使用している
が、高速の伝播速度を実現するためにポリイミドの誘電
率をそれ以上下げると、ポリイミドの膜強度が低下して
しまい、実用化することが難しいという問題がある。
Such conventional polyimide resin multilayer wiring boards use polyimide with a dielectric constant of about 3.4 to 3.8, but in order to achieve high propagation speeds, it is necessary to lower the dielectric constant of polyimide further. However, there is a problem in that the strength of the polyimide film decreases, making it difficult to put it into practical use.

また、BCB樹脂を用いた場合、BCB樹脂は誘電率が
2.6とポリイミドより低く、電気的に優れた特性を有
しているが、熱膨張率がポリイミド樹脂と同程度の4.
Ox 10−5(1/”C)でありながら、伸び率が2
.2%と低いために、BCB樹脂のみで多層配線基板の
高多層化を行うと、上層にいくにしたがって応力が大き
くなり、導体配線の応力が集中する配線の角部にクラッ
クが発生したり、あるいは絶縁膜自身の応力が絶縁膜の
膜強度を上回って最終的に絶縁層にクラックが発生して
しまうという問題がある。
In addition, when using BCB resin, BCB resin has a dielectric constant of 2.6, which is lower than polyimide, and has excellent electrical properties, but a coefficient of thermal expansion of 4.6, which is about the same as that of polyimide resin.
Although Ox 10-5 (1/”C), the elongation rate is 2
.. Since the stress is as low as 2%, if a multilayer wiring board is made with only BCB resin, the stress will increase as you go to the upper layer, and cracks may occur at the corners of the wiring where the stress of the conductor wiring is concentrated. Alternatively, there is a problem in that the stress of the insulating film itself exceeds the film strength of the insulating film, eventually causing cracks in the insulating layer.

発明の目的 本発明は上記のような従来のものの問題点を除去すべく
なされたもので、配線の角部や絶縁層にクラックが発生
することなく、高速の信号伝播速度を実現することがで
きる有機樹脂多層配線基板の提供を目的とする。
Purpose of the Invention The present invention has been made to eliminate the problems of the conventional ones as described above, and can realize a high signal propagation speed without causing cracks in the corners of the wiring or the insulating layer. The purpose is to provide an organic resin multilayer wiring board.

発明の構成 本発明による有機樹脂多層配線基板は、導体配線層と有
機樹脂の絶縁層とが交互に積層された有機樹脂多層配線
基板であって、前記導体配線層のうち信号層とグランド
層との間の前記絶縁層をベンゾシクロブテン樹脂で構成
し、他の前記絶縁層をポリイミド樹脂で構成したことを
特徴とする。
Structure of the Invention The organic resin multilayer wiring board according to the present invention is an organic resin multilayer wiring board in which conductor wiring layers and organic resin insulating layers are alternately laminated. The insulating layer between them is made of benzocyclobutene resin, and the other insulating layer is made of polyimide resin.

実施例 次に、本発明の一実施例について図面を参照して説明す
る。
Embodiment Next, an embodiment of the present invention will be described with reference to the drawings.

第1図は本発明の一実施例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of the present invention.

図において、セラミック(またはガラスセラミック)多
層配線基板1には銅または金などの導体がメツキ法て厚
さ10 !りOン、線幅25 iりaノで電源層2が形
成されている。
In the figure, a ceramic (or glass ceramic) multilayer wiring board 1 is plated with a conductor such as copper or gold to a thickness of 10! The power supply layer 2 is formed with a line width of 25° and a line width of 25°.

このセラミック多層配線基板1上に、400℃以下でキ
ュアできるタイプのポリイミド樹脂で、ヴイアホール9
aを有するポリイミド樹脂絶縁層5aが20!クロン厚
で形成されている。
On this ceramic multilayer wiring board 1, a via hole 9 is made of a polyimide resin that can be cured at 400°C or less.
The polyimide resin insulating layer 5a having a is 20! It is formed with a chrome thickness.

ここで、キュア温度が400℃以下のポリイミドを使用
する理由は、ベンゾシクロブテン樹脂(以下BCB樹脂
とする)の重量減少開始温度が430℃であるため、キ
ュア温度を430℃以下にする必要があるためである。
Here, the reason for using polyimide with a curing temperature of 400°C or lower is that the temperature at which benzocyclobutene resin (hereinafter referred to as BCB resin) starts to lose weight is 430°C, so the curing temperature needs to be 430°C or lower. This is because there is.

このポリイミド樹脂絶縁層5aの上にグランド層3aと
信号配線層4aとがメツキ法で形成されるのであるが、
これらグランド層3aと信号配線層4aとの間にBCB
樹脂で、ヴイアホール9bを有するBCB樹脂絶縁層6
aが20 ミクjン厚で形成されている。
A ground layer 3a and a signal wiring layer 4a are formed on this polyimide resin insulating layer 5a by a plating method.
BCB between the ground layer 3a and the signal wiring layer 4a
BCB resin insulating layer 6 made of resin and having via holes 9b
A is formed with a thickness of 20 microns.

信号配線層4aの上には400℃以下でキュアできるタ
イプのポリイミド樹脂で、ヴイアホール9Cを有するポ
リイミド樹脂絶縁層5bが20 !りrJン厚で形成さ
れている。
On the signal wiring layer 4a, there is a polyimide resin insulating layer 5b made of a type of polyimide resin that can be cured at 400° C. or lower and having via holes 9C. It is formed with a thickness of RJ.

ポリイミド樹脂絶縁層5bの上には信号配線層4bがメ
ツキ法で形成され、信号配線層4bの上にヴイアホール
9dを有するBCB樹脂絶縁層6bが204り0ン厚で
形成され、その上にグランド層3bがメツキ法で形成さ
れている。
A signal wiring layer 4b is formed on the polyimide resin insulation layer 5b by a plating method, and a BCB resin insulation layer 6b having a thickness of 204 mm and having via holes 9d is formed on the signal wiring layer 4b. Layer 3b is formed by a plating method.

さらに、グランド層3bの上にはヴイアホール9eを有
するポリイミド樹脂絶縁層5cが20ミクaン厚で形成
され、ポリイミド樹脂絶縁層5cの上に電源・信号乗換
え層7がメツキ法で形成され、電源・信号乗換え層7の
上にヴイアホール9fを有するポリイミド樹脂絶縁層5
dが20 !’lrjン厚で形成され、その上に電気部
品搭載層8がメツキ法で形成されている。
Further, on the ground layer 3b, a polyimide resin insulating layer 5c having a via hole 9e is formed with a thickness of 20 μm, and on the polyimide resin insulating layer 5c, a power/signal transfer layer 7 is formed by a plating method.・Polyimide resin insulating layer 5 having via hole 9f on signal transfer layer 7
d is 20! The electrical component mounting layer 8 is formed thereon by a plating method.

ここで、本実施例ではBCB樹脂をグランド層3a、3
bと信号配線層4a、4bとの間にのみ使用しているの
で、従来のBCB樹脂のみで多層配線基板の高多層化を
行う場合のように、配線の角部や絶縁層にクラックが発
生することがなくなる。
Here, in this embodiment, the BCB resin is used for the ground layers 3a, 3.
Since it is used only between the BCB resin and the signal wiring layers 4a and 4b, cracks do not occur at the corners of the wiring or in the insulation layer, as in the case of increasing the number of layers in a multilayer wiring board using only conventional BCB resin. There's nothing left to do.

また、信号の配線遅延がグランド層3a、3bと信号配
線層4a、4bとの間の絶縁層の誘電率で決まるため、
この部分に誘電率が低いBCB樹脂を使用することによ
って、配線基板材料としての電気特性を改善することが
でき、高速の信号伝播速度を実現することができる。
Furthermore, since the signal wiring delay is determined by the dielectric constant of the insulating layer between the ground layers 3a, 3b and the signal wiring layers 4a, 4b,
By using BCB resin, which has a low dielectric constant, in this part, the electrical characteristics as a wiring board material can be improved, and a high signal propagation speed can be realized.

このように、グランド層3a、3bや信号配線層4a、
4b、あるいは電源・信号乗換え層7や電気部品搭載層
8などの導体配線層とポリイミド樹脂絶縁層5a〜5d
が交互に積層されたポリイミド樹脂多層配線基板におい
て、グランド層3a。
In this way, the ground layers 3a, 3b, the signal wiring layer 4a,
4b, or conductive wiring layers such as the power/signal transfer layer 7 and the electrical component mounting layer 8 and polyimide resin insulation layers 5a to 5d.
In a polyimide resin multilayer wiring board in which layers are alternately laminated, the ground layer 3a.

3bと信号配線層4g、4bとの間にBCB樹脂絶縁層
6a、6bを形成するようにすることによって、誘電率
が3.4〜3.8程度の一般的なポリイミド樹脂の絶縁
層に比べて、グランド層3a、3bと信号配線層4a、
4bとの間の絶縁層の誘電率が2.6に下がるので、高
速の信号伝播速度を実現することができる。
By forming the BCB resin insulating layers 6a and 6b between the signal wiring layers 3b and the signal wiring layers 4g and 4b, the dielectric constant is about 3.4 to 3.8 compared to a general polyimide resin insulating layer. The ground layers 3a, 3b and the signal wiring layer 4a,
Since the dielectric constant of the insulating layer between the insulating layer and the insulating layer 4b is lowered to 2.6, a high signal propagation speed can be achieved.

また、BCB樹脂の絶縁層をグランド層3a。Further, an insulating layer of BCB resin is used as a ground layer 3a.

3bと信号配線層4a、4bとの間にのみ使用するので
、BCB樹脂のみて多層配線基板の高多層化を行う場合
のように配線の角部や絶縁層にクラックが発生するのを
防ぐことができる。
3b and the signal wiring layers 4a and 4b, it prevents cracks from occurring at the corners of the wiring or in the insulating layer, as would be the case when building a multilayer wiring board with high multilayers using only BCB resin. I can do it.

よって、配線の角部や絶縁層にクラックが発生すること
なく、高速の信号伝播速度を実現することができる。
Therefore, a high signal propagation speed can be achieved without cracking the corners of the wiring or the insulating layer.

発明の詳細 な説明したように本発明によれば、有機樹脂多層配線基
板上に交互に積層された導体配線層のうち信号層とグラ
ンド層との間の絶縁層をベンゾシクロブテン樹脂で構成
するようにすることによって、配線の角部や絶縁層にク
ラックが発生することなく、高速の信号伝播速度を実現
することができるという効果がある。
DETAILED DESCRIPTION OF THE INVENTION According to the present invention, the insulating layer between the signal layer and the ground layer among the conductor wiring layers alternately laminated on the organic resin multilayer wiring board is made of benzocyclobutene resin. By doing so, there is an effect that a high signal propagation speed can be realized without cracking the corners of the wiring or the insulating layer.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す断面図、第2図は従来
例を示す断面図である。 主要部分の符号の説明 1・・・・・・セラミック多層配線基板3a、3b・・
・・・・グランド層 4a、4b・・・・・・信号配線層
FIG. 1 is a sectional view showing one embodiment of the present invention, and FIG. 2 is a sectional view showing a conventional example. Explanation of symbols of main parts 1...Ceramic multilayer wiring board 3a, 3b...
...Ground layers 4a, 4b...Signal wiring layer

Claims (1)

【特許請求の範囲】[Claims] (1)導体配線層と有機樹脂の絶縁層とが交互に積層さ
れた有機樹脂多層配線基板であって、前記導体配線層の
うち信号層とグランド層との間の前記絶縁層をベンゾシ
クロブテン樹脂で構成し、他の前記絶縁層をポリイミド
樹脂で構成したことを特徴とする有機樹脂多層配線基板
(1) An organic resin multilayer wiring board in which conductive wiring layers and organic resin insulating layers are alternately laminated, wherein the insulating layer between the signal layer and the ground layer of the conductive wiring layer is made of benzocyclobutene. An organic resin multilayer wiring board comprising a resin, and the other insulating layer comprising a polyimide resin.
JP27810890A 1990-10-17 1990-10-17 Organic resin multilayer wiring board Expired - Fee Related JP2551223B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27810890A JP2551223B2 (en) 1990-10-17 1990-10-17 Organic resin multilayer wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27810890A JP2551223B2 (en) 1990-10-17 1990-10-17 Organic resin multilayer wiring board

Publications (2)

Publication Number Publication Date
JPH04152696A true JPH04152696A (en) 1992-05-26
JP2551223B2 JP2551223B2 (en) 1996-11-06

Family

ID=17592739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27810890A Expired - Fee Related JP2551223B2 (en) 1990-10-17 1990-10-17 Organic resin multilayer wiring board

Country Status (1)

Country Link
JP (1) JP2551223B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5959359A (en) * 1996-09-05 1999-09-28 Nec Corporation Semiconductor device with a copper wiring pattern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5959359A (en) * 1996-09-05 1999-09-28 Nec Corporation Semiconductor device with a copper wiring pattern

Also Published As

Publication number Publication date
JP2551223B2 (en) 1996-11-06

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