JPH04151506A - Measuring method for film thickness by use of fluorescent x-ray - Google Patents

Measuring method for film thickness by use of fluorescent x-ray

Info

Publication number
JPH04151506A
JPH04151506A JP27563390A JP27563390A JPH04151506A JP H04151506 A JPH04151506 A JP H04151506A JP 27563390 A JP27563390 A JP 27563390A JP 27563390 A JP27563390 A JP 27563390A JP H04151506 A JPH04151506 A JP H04151506A
Authority
JP
Japan
Prior art keywords
sample
ray
fluorescent
primary
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27563390A
Other languages
Japanese (ja)
Other versions
JP2961384B2 (en
Inventor
Masao Sato
正雄 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP27563390A priority Critical patent/JP2961384B2/en
Publication of JPH04151506A publication Critical patent/JPH04151506A/en
Application granted granted Critical
Publication of JP2961384B2 publication Critical patent/JP2961384B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To enable checkup of a position by a simple operation and to make a measured value correct by narrowing down a primary X-ray by a collimator having a flat hole and by applying it onto the surface of a sample with the longitudinal direction of the sample made parallel to the longitudinal direction of the flat shape of the collimator. CONSTITUTION:A primary X-ray 20 generated from an X-ray source 1 is made to be a primary X-ray beam 20 having a slender shape by a collimator 2 having a rectangular hole 2a and is applied to a sample. The sample has slender-line- shaped parts 4a formed in a large number and the X-ray 20 is applied to these parts. Besides, the sample is set on a sample stage 3 being movable for each step and the movement for each step is made in the width direction of the shape of the beam of the X-ray 20. A fluorescent X-ray 21 generated by application of the X-ray 20 to the slender-line parts 4a of the sample is detected by an X-ray detector 5 and the detected X-ray 21 is sent as a signal to an amplifier 6 and amplified. This amplified signal is sent to a multichannel analyzer 7 and a controlling arithmetic element 9, and a film thickness computed from the intensity of the fluorescent X-ray of the signal is outputted as data.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、一次X線を試料に照射し、試料から発生する
螢光XvAO量を測定することにより、試料表面に形成
されている膜の厚みを測定する螢光XSa*厚測定方法
にかんするものである。
Detailed Description of the Invention [Industrial Application Field] The present invention measures the amount of fluorescent XvAO generated from the sample by irradiating the sample with primary This article relates to a fluorescent XSa* thickness measurement method for measuring thickness.

〔従来の技術〕[Conventional technology]

数十ミクロンから数置すの幅の細い長い形状の試料を螢
光X線測定により、試料表面に形成されている膜の膜厚
を測定する方法は、一次X線を試料の幅より狭い平面形
状の丸い孔を有するコリメータで絞り、細く絞った一次
X線を正確に位置を合わせて試料に照射していた。細く
絞った一次X線を正確に試料に照射するために、拡大率
の高い顕微鏡で試料を観察したり、CCDカメラで試料
を撮像したりしていた。
A method of measuring the film thickness of a film formed on the surface of a sample using fluorescent X-ray measurement of a thin long sample with a width of several tens of microns or more is to use primary X-rays on a plane narrower than the width of the sample. A collimator with a round hole was used to narrow down the primary X-rays, and the sample was irradiated with precisely aligned primary X-rays. In order to accurately irradiate a sample with narrowly focused primary X-rays, the sample must be observed using a microscope with high magnification or imaged using a CCD camera.

(発明が解決しようとする課題) 螢光X線による膜厚測定においては、一次X線の照射量
が少なくなると、螢光X線の量がすくなくなり、膜厚測
定の精度が低くなる。つまり、試料が細くなればなるほ
ど膜厚測定の精度が低くなる。また、一次X線照射位置
を合わせるのに、微小試料をなるべく大きくしてモニタ
ーするため、光学系の倍率を大きくする必要があるが、
細線が複数本並ぶ電子部品業界でのTABのような試料
の場合、何本目の試料を測定しているがわからなくなっ
てしまうことがある。更に、一次X線の照射位置が光学
系の観察位置がずれて一次X線照射が試料に対してずれ
てしまう等の課題あった。
(Problems to be Solved by the Invention) In film thickness measurement using fluorescent X-rays, when the irradiation amount of primary X-rays decreases, the amount of fluorescent X-rays decreases, and the accuracy of film thickness measurement decreases. In other words, the thinner the sample, the lower the accuracy of film thickness measurement. In addition, in order to adjust the primary X-ray irradiation position and monitor the microsample as large as possible, it is necessary to increase the magnification of the optical system.
In the case of samples such as TAB used in the electronic component industry, where multiple thin wires are lined up, it may become unclear which sample is being measured. Further, there was a problem in that the irradiation position of the primary X-rays was shifted from the observation position of the optical system, and the primary X-ray irradiation was shifted with respect to the sample.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は上記課題を解決するためになされたものであり
、螢光X線にて試料の膜厚を測定する方法において、一
次X線を平面形状が幅が試料の幅より狭くなっている偏
平形状の孔を有するコリメータで絞って試料表面に試料
の長手方向と前記コリメータ偏平形状の長手方向とを並
行にして照射し、且つ、試料を載置している試料ステー
ジを試料の細線形状の幅方向に、コリメータ幅より少な
い量をステップ送りし、各送りステップ毎に試料から発
生する螢光X線を測定する螢光X線による膜厚測定方法
である。
The present invention has been made to solve the above problems, and is a method for measuring the film thickness of a sample using fluorescent X-rays. A collimator having a shaped hole is used to irradiate the sample surface so that the longitudinal direction of the sample is parallel to the longitudinal direction of the flat collimator shape, and the sample stage on which the sample is placed is aligned with the width of the thin line shape of the sample. This is a film thickness measurement method using fluorescent X-rays, in which the sample is fed in steps by an amount smaller than the width of the collimator, and the fluorescent X-rays generated from the sample are measured at each feeding step.

〔作用〕[Effect]

一次X線を絞るためのコリメータの孔の平面形状が偏平
しているため長細形状の試料に対して、比較的大面積に
て試料に一次X線を照射することができる。したがって
、螢光X線の量も多くなり、測定精度が高くなる。また
、試料をその幅方向に少しつづステップ送りするため、
一次X線の試料への照射位置が多少ずれていても、その
螢光X線量により一次X線照射位置を決定することがで
きる0例えば、基板10に膜11が試料上面のみに形成
されている試料、つまり断面形状が第3図のような場合
、図に対して上方からの一次X線照射による螢光XvA
O量は、一次X線照射が試料に対して完全に左右にずれ
ているときはゼロであり、一次X線が試料に対して左右
の端に照射しているときは螢光X線の量は多少ふえ、完
全に試料の表面を一次X線の照射がなされたときに螢光
X線の量はピークになる。つまり、一次X′41Aの試
料に対する照射位置と試料から発生する螢光X線量の関
係は第2a図のようになる。つまり、ピークの値の螢光
X線量がその膜厚を表していることになる。
Since the planar shape of the hole of the collimator for focusing the primary X-rays is flat, it is possible to irradiate the sample with the primary X-rays over a relatively large area even for an elongated sample. Therefore, the amount of fluorescent X-rays increases, and measurement accuracy increases. In addition, since the sample is fed step by step in the width direction,
Even if the primary X-ray irradiation position on the sample is slightly shifted, the primary X-ray irradiation position can be determined based on the amount of fluorescent X-rays. For example, the film 11 is formed on the substrate 10 only on the top surface of the sample. When the sample, that is, the cross-sectional shape is as shown in Figure 3, the fluorescence XvA caused by primary X-ray irradiation from above the figure.
The amount of O is zero when the primary X-ray irradiation is completely shifted to the left and right with respect to the sample, and the amount of fluorescent X-ray is zero when the primary X-ray irradiates the sample at the left and right edges. The amount of fluorescent X-rays increases somewhat, and the amount of fluorescent X-rays reaches its peak when the surface of the sample is completely irradiated with primary X-rays. In other words, the relationship between the irradiation position of the primary X'41A on the sample and the amount of fluorescent X-rays generated from the sample is as shown in FIG. 2a. In other words, the peak amount of fluorescent X-rays represents the film thickness.

また、断面矩形の基板!00表面全体にNilが形成さ
れている第3b図のような試料の場合、試料の端を一次
X線で照射したときが螢光CX線の量が多くなる。これ
は端の部分が試料の表面から見た場合試料全体が膜の材
質で生成されているようになるためである。つまり、一
次X線の試料に対する照射位置と試料から発生する螢光
X線量の関係は第2b図のようになる。つまり、ピーク
の値とピーク値との間の螢光X線量がその膜厚を表して
いることになる。
Also, a board with a rectangular cross section! In the case of a sample as shown in FIG. 3b in which Nil is formed on the entire 00 surface, the amount of fluorescent CX-rays increases when the edge of the sample is irradiated with primary X-rays. This is because when the end portions are viewed from the surface of the sample, the entire sample appears to be made of the membrane material. In other words, the relationship between the irradiation position of the primary X-ray on the sample and the amount of fluorescent X-rays generated from the sample is as shown in FIG. 2b. In other words, the amount of fluorescent X-rays between the peak values represents the film thickness.

以上のように、試料の観察拡大率を大きくすることなく
、試料を少しづつステップ移動させて、試料の正確な(
膜厚を正しく表した螢光X線!#)値を検出することが
できる。そして比較的低倍率の観察で実施できるため、
試料全体のめくてい位1を容易に特定できる。
As described above, the sample can be moved step by step without increasing the observation magnification of the sample to obtain accurate (
Fluorescent X-rays that accurately represent film thickness! #) The value can be detected. And since it can be carried out with relatively low magnification,
The turning point 1 of the entire sample can be easily identified.

〔実施例〕〔Example〕

以下、本発明の実施例を図面に基づいて説明する。第1
図は本発明に係わる螢光X線膜厚測定装置の概略を示す
システム構成図である。Iは一次X線を発生するX線源
であり、X線源1より発生した一次X線20は平面形状
が細長い矩形形状をした孔2aを有するコリメータ2に
より細長い形状をした一次X線ビーム20となり、試料
4を照射する。試料は細線形状をした部分4aが多数形
成されておりその部分に一次X線を照射する。コリメー
タ2の孔2aの形状の幅は試料細線4aの幅より狭くな
りでおり、孔2aの長手方向は試料4の大きさ及び螢光
X線を検出するX線検出器5の性能等により限定される
が長い方がよい。
Embodiments of the present invention will be described below based on the drawings. 1st
The figure is a system configuration diagram schematically showing a fluorescent X-ray film thickness measuring device according to the present invention. I is an X-ray source that generates primary X-rays, and the primary X-rays 20 generated from the X-ray source 1 are converted into an elongated primary X-ray beam 20 by a collimator 2 having a hole 2a having an elongated rectangular planar shape. Then, sample 4 is irradiated. The sample has many thin wire-shaped portions 4a, and these portions are irradiated with primary X-rays. The width of the hole 2a of the collimator 2 is narrower than the width of the thin sample wire 4a, and the longitudinal direction of the hole 2a is limited by the size of the sample 4 and the performance of the X-ray detector 5 for detecting fluorescent X-rays. However, the longer the better.

一次xvAビーム20の形状の長手方向は試料の細線形
状をした部分4aの長手方向と一致するように照射する
ように配置されている。
The primary xvA beam 20 is irradiated so that its longitudinal direction coincides with the longitudinal direction of the thin line-shaped portion 4a of the sample.

また、試料4はステップごとに移動できる試料ステージ
3に載置されている。試料ステージ3のステップ毎の移
動は一次X線20のビーム形状の幅方向つまり、試料4
の細線形状をした部分4aの幅方向に移動するものであ
る。その移動量は一次X線20のビーム形状の幅より狭
い量(ミクロンオーダの量)である。
Further, the sample 4 is placed on a sample stage 3 that can be moved step by step. The movement of the sample stage 3 for each step is in the width direction of the beam shape of the primary X-ray 20, that is, the movement of the sample 4
It moves in the width direction of the thin line-shaped portion 4a. The amount of movement is narrower than the width of the beam shape of the primary X-ray 20 (an amount on the order of microns).

ここで、コリメータ2により絞られた一次X線を試料4
の細線部4aに照射して発生した螢光X線21を単位時
間当たりの量としてX線検出器5にて検出する。
Here, the primary X-rays focused by the collimator 2 are transferred to the sample 4.
The X-ray detector 5 detects the fluorescent X-rays 21 generated by irradiating the thin wire portion 4a as the amount per unit time.

X線検出器で検出された螢光X線21を信号としてアン
プ6に送り増幅する。
Fluorescent X-rays 21 detected by the X-ray detector are sent as a signal to an amplifier 6 for amplification.

アンプ6にて増幅された信号はマルチチャンネルアナラ
イザ7、制御演算部9に送られその螢光X線強から演算
し膜厚をデータとしてアウトプットする0次に、演真器
9の演算が終了すると試料ステージ3の移動を制御する
ステージコントローラ8に信号を送り、試料をミクロン
オーダで移動させる0以上の操作を繰り返して、第2a
図または第2b図のデータを得る。
The signal amplified by the amplifier 6 is sent to the multi-channel analyzer 7 and the control calculation section 9, which calculates the intensity of the fluorescent X-rays and outputs the film thickness as data.Then, the calculation of the emitter 9 is completed. Then, a signal is sent to the stage controller 8 that controls the movement of the sample stage 3, and 0 or more operations are repeated to move the sample on the order of microns.
Obtain the data in Figure or Figure 2b.

第2図aのデータが得られた場合は、試料4の測定位置
の膜厚はピークの値を基に膜厚換算する。
When the data shown in FIG. 2a is obtained, the film thickness at the measurement position of sample 4 is converted into film thickness based on the peak value.

また、第2図すのデータが得られた場合は、試料4の測
定位置の膜厚はピークとピークとの間のの値を基に膜厚
換算する。
Further, when the data shown in Figure 2 is obtained, the film thickness at the measurement position of sample 4 is converted into film thickness based on the value between the peaks.

〔発明の効果〕〔Effect of the invention〕

以上述べたように、細線形状が沢山並んだ試料を簡単な
操作(拡大率の大きな観察手段を必要としないで)位置
の確認が容易にでき、かつ測定値を正確にして膜厚測定
ができるという効果がある。
As mentioned above, it is possible to easily confirm the position of a sample with many thin line shapes (without requiring observation means with a large magnification), and to accurately measure the film thickness. There is an effect.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係わる螢光X&i膜厚測定装置の概略
を示すシステム構成図、第2a図は第3a図の試料試料
ステージ位置と螢光X線量の関係を示すグラフ、第2b
図は第3b図の試料試料ステージ位置と螢光X線量の関
係を示すグラフ、第3a図及び第3b図はそれぞれ、試
料の断面を示す断面図である。 1・・X線源      2・・コリメータ2a・コリ
メータ孔   3・・試料ステージ4・・試料    
   4a・試料の細線部分5・・X線検出器    
6・・アンプ7・・マルチチャンネルアナライザ 8・・ステージコントローラ ・制御演算部 ・基板 1・膜 20・一次X線ビーム 以 上
Fig. 1 is a system configuration diagram showing an outline of the fluorescent X&I film thickness measuring device according to the present invention, Fig. 2a is a graph showing the relationship between the sample stage position and the fluorescent X-ray dose in Fig. 3a, and Fig. 2b is
The figure is a graph showing the relationship between the sample stage position and the fluorescent X-ray dose in Fig. 3b, and Figs. 3a and 3b are sectional views showing the cross section of the sample, respectively. 1... X-ray source 2... Collimator 2a, collimator hole 3... Sample stage 4... Sample
4a・Fine line part of sample 5・X-ray detector
6...Amplifier 7...Multi-channel analyzer 8...Stage controller, control calculation section, substrate 1, membrane 20, primary X-ray beam and above

Claims (1)

【特許請求の範囲】 少なくとも1本以上の細線形状の試料に一次X線を照射
し、前記試料から発生する螢光X線強度を測定して、前
記試料の表面に形成された膜の厚さを測定する方法にお
いて、 前記一次X線を平面形状が幅が前記試料の幅より狭くな
っている偏平形状の孔を有するコリメータで絞って前記
試料表面に前記試料の長手方向と前記コリメータ偏平形
状の長手方向とを並行にして照射し、 且つ、前記試料を載置している試料ステージを前記試料
の細線形状の幅方向に、前記コリメータ幅より少ない量
をステップ送りし、各送りステップ毎に試料から発生す
る螢光X線を測定する螢光X線による膜厚測定方法。
[Scope of Claims] At least one or more fine wire-shaped sample is irradiated with primary X-rays, and the intensity of fluorescent X-rays generated from the sample is measured to determine the thickness of the film formed on the surface of the sample. In the method of measuring the primary irradiate in parallel with the longitudinal direction, and step-feed the sample stage on which the sample is placed in the width direction of the thin line shape of the sample by an amount smaller than the width of the collimator, and move the sample at each feeding step. A film thickness measurement method using fluorescent X-rays that measures fluorescent X-rays generated from.
JP27563390A 1990-10-15 1990-10-15 Film thickness measurement method using fluorescent X-ray Expired - Fee Related JP2961384B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27563390A JP2961384B2 (en) 1990-10-15 1990-10-15 Film thickness measurement method using fluorescent X-ray

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27563390A JP2961384B2 (en) 1990-10-15 1990-10-15 Film thickness measurement method using fluorescent X-ray

Publications (2)

Publication Number Publication Date
JPH04151506A true JPH04151506A (en) 1992-05-25
JP2961384B2 JP2961384B2 (en) 1999-10-12

Family

ID=17558181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27563390A Expired - Fee Related JP2961384B2 (en) 1990-10-15 1990-10-15 Film thickness measurement method using fluorescent X-ray

Country Status (1)

Country Link
JP (1) JP2961384B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007502421A (en) * 2003-08-12 2007-02-08 エックス−レイ オプティカル システムズ インコーポレーテッド X-ray fluorescence system with an aperture mask for the analysis of patterned surfaces

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007502421A (en) * 2003-08-12 2007-02-08 エックス−レイ オプティカル システムズ インコーポレーテッド X-ray fluorescence system with an aperture mask for the analysis of patterned surfaces
JP4724662B2 (en) * 2003-08-12 2011-07-13 エックス−レイ オプティカル システムズ インコーポレーテッド X-ray fluorescence system with an aperture mask for the analysis of patterned surfaces

Also Published As

Publication number Publication date
JP2961384B2 (en) 1999-10-12

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