JPH04149185A - Unsaturated organosilicon compound - Google Patents
Unsaturated organosilicon compoundInfo
- Publication number
- JPH04149185A JPH04149185A JP27486490A JP27486490A JPH04149185A JP H04149185 A JPH04149185 A JP H04149185A JP 27486490 A JP27486490 A JP 27486490A JP 27486490 A JP27486490 A JP 27486490A JP H04149185 A JPH04149185 A JP H04149185A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- compound
- reaction
- group
- halogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000003961 organosilicon compounds Chemical class 0.000 title claims description 6
- 125000005843 halogen group Chemical group 0.000 claims abstract description 8
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 7
- 125000004104 aryloxy group Chemical group 0.000 claims abstract description 6
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 5
- 239000000126 substance Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 abstract description 23
- 229910003471 inorganic composite material Inorganic materials 0.000 abstract description 6
- 239000002516 radical scavenger Substances 0.000 abstract description 6
- XJFZOSUFGSANIF-UHFFFAOYSA-N 3-chloro-2-(chloromethyl)prop-1-ene Chemical compound ClCC(=C)CCl XJFZOSUFGSANIF-UHFFFAOYSA-N 0.000 abstract description 5
- 150000003512 tertiary amines Chemical class 0.000 abstract description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 abstract description 4
- 239000005749 Copper compound Substances 0.000 abstract description 3
- 230000003197 catalytic effect Effects 0.000 abstract description 3
- 150000001880 copper compounds Chemical class 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 229930195733 hydrocarbon Natural products 0.000 abstract description 2
- 239000011256 inorganic filler Substances 0.000 abstract description 2
- 229910003475 inorganic filler Inorganic materials 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 3
- 239000004215 Carbon black (E152) Substances 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 239000003566 sealing material Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 36
- 238000004458 analytical method Methods 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 9
- -1 2-phenylpropyl Chemical group 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 238000004817 gas chromatography Methods 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000000921 elemental analysis Methods 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 3
- 229940045803 cuprous chloride Drugs 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000012433 hydrogen halide Substances 0.000 description 3
- 229910000039 hydrogen halide Inorganic materials 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- LQEUNVMRBBCABI-UHFFFAOYSA-N trichloro-[2-(trichlorosilylmethyl)prop-2-enyl]silane Chemical compound Cl[Si](Cl)(Cl)CC(=C)C[Si](Cl)(Cl)Cl LQEUNVMRBBCABI-UHFFFAOYSA-N 0.000 description 3
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 3
- 239000005052 trichlorosilane Substances 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- AOJFQRQNPXYVLM-UHFFFAOYSA-N pyridin-1-ium;chloride Chemical compound [Cl-].C1=CC=[NH+]C=C1 AOJFQRQNPXYVLM-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 2
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- KWISWUFGPUHDRY-UHFFFAOYSA-N 1-Chloro-2-methylpropene Chemical compound CC(C)=CCl KWISWUFGPUHDRY-UHFFFAOYSA-N 0.000 description 1
- YTKRILODNOEEPX-UHFFFAOYSA-N 1-chlorobut-2-ene Chemical compound CC=CCCl YTKRILODNOEEPX-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- OHXAOPZTJOUYKM-UHFFFAOYSA-N 3-Chloro-2-methylpropene Chemical compound CC(=C)CCl OHXAOPZTJOUYKM-UHFFFAOYSA-N 0.000 description 1
- VLRGXXKFHVJQOL-UHFFFAOYSA-N 3-chloropentane-2,4-dione Chemical compound CC(=O)C(Cl)C(C)=O VLRGXXKFHVJQOL-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 108700018454 CDC15 Proteins 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 238000005684 Liebig rearrangement reaction Methods 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 101150081467 cdc15 gene Proteins 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- SOYVLBDERBHIME-UHFFFAOYSA-N chloro(diethyl)silicon Chemical compound CC[Si](Cl)CC SOYVLBDERBHIME-UHFFFAOYSA-N 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000002933 cyclohexyloxy group Chemical group C1(CCCCC1)O* 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XKBAVCUSVIEVHR-UHFFFAOYSA-N dibromo(methyl)silane Chemical compound C[SiH](Br)Br XKBAVCUSVIEVHR-UHFFFAOYSA-N 0.000 description 1
- PFMKUUJQLUQKHT-UHFFFAOYSA-N dichloro(ethyl)silicon Chemical compound CC[Si](Cl)Cl PFMKUUJQLUQKHT-UHFFFAOYSA-N 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- XNAFLNBULDHNJS-UHFFFAOYSA-N dichloro(phenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=CC=C1 XNAFLNBULDHNJS-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- XSGHLZBESSREDT-UHFFFAOYSA-N methylenecyclopropane Chemical compound C=C1CC1 XSGHLZBESSREDT-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- DNAJDTIOMGISDS-UHFFFAOYSA-N prop-2-enylsilane Chemical class [SiH3]CC=C DNAJDTIOMGISDS-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 229940032330 sulfuric acid Drugs 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- IBOKZQNMFSHYNQ-UHFFFAOYSA-N tribromosilane Chemical compound Br[SiH](Br)Br IBOKZQNMFSHYNQ-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- DNAPJAGHXMPFLD-UHFFFAOYSA-N triiodosilane Chemical compound I[SiH](I)I DNAPJAGHXMPFLD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は、有機−無機複合材の接着性の向上などに有用
である不飽和有機ケイ素化合物に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an unsaturated organosilicon compound useful for improving the adhesion of organic-inorganic composite materials.
有機−無機複合材の接着性の向上に用いられる有機ケイ
素化合物としては、ビニルトリメトキシシラン、アリル
トリメトキシシラン、3−クロロプロピルトリメトキシ
シラン、3−アミノプロピルトリメトキシシラン、3−
グリシドキシプロピルトリメトキシシラン、3−メタク
リロキシプロピルトリメトキシシラン、3−メルカプト
プロピルトリメトキシシランなどの種々のシランカンブ
リング剤が知られている。しかしながら、これらの有機
ケイ素化合物はいずれも加水分解性シリル基が1個であ
るため、十分な接着強度が得られにくいという欠点があ
った。そのため、接着性の向上という目的から、複数の
加水分解性シリル基を有する化合物が望まれていた。Examples of organosilicon compounds used to improve the adhesiveness of organic-inorganic composite materials include vinyltrimethoxysilane, allyltrimethoxysilane, 3-chloropropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, and 3-aminopropyltrimethoxysilane.
Various silane cambling agents are known, such as glycidoxypropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, and 3-mercaptopropyltrimethoxysilane. However, since all of these organosilicon compounds have one hydrolyzable silyl group, they have the disadvantage that it is difficult to obtain sufficient adhesive strength. Therefore, for the purpose of improving adhesiveness, a compound having a plurality of hydrolyzable silyl groups has been desired.
本発明の目的は、有機−無機複合材の接着性の向上に有
用である2個の加水分解性シリル基を有する新規な有機
ケイ素化合物を提供することである。An object of the present invention is to provide a novel organosilicon compound having two hydrolyzable silyl groups that is useful for improving the adhesion of organic-inorganic composites.
(発明の構成〕
本発明者は斯かる目的を達成するべく鋭意検討した結果
、本発明を完成するに至った。(Structure of the Invention) The present inventor has completed the present invention as a result of intensive studies to achieve the above object.
即ち本発明は、
一般式
%式%)
(式中、Rは置換又は非置換の1価の炭化水素基:Yは
ハロゲン原子、アルコキシ基及びアリールオキシ基から
選ばれる加水分解性基;nは0〜3の整数を示す)
で表される不飽和有機ケイ素化合物である。That is, the present invention is based on the general formula % formula %) (wherein, R is a substituted or unsubstituted monovalent hydrocarbon group; Y is a hydrolyzable group selected from a halogen atom, an alkoxy group, and an aryloxy group; n is a (represents an integer from 0 to 3).
本発明の化合物(1)において、Rは置換又は非置換の
1価の炭化水素基である。Rとしては、例えばメチル基
、エチル基、プロピル基、ブチル基、ペンチル基、ヘキ
シル基、ヘプチル基、オクチル基、ノニル基、デシル基
、ドデシル基のようなアルキル基;シクロペンチル基、
シクロヘキシル基のようなシクロアルキル基;2−フェ
ニルエチル基、2−フェニルプロピル基のようなアラル
キル基;フェニル基、トリル基のようなアリール基;ビ
ニル基、アリル基のようなアルケニル基;及びこれらの
1価の炭化水素基の炭素原子に結合した水素原子が部分
的にハロゲン原子、シアノ基などで置換されたクロロメ
チル基、クロロフェニル基、3,3.3−トリフルオロ
プロピル基、シアノエチル基のような置換炭化水素基が
例示される。これらの中でも、原料の入手及び合成が容
易なことから炭素数1〜4の飽和炭化水素基、とりわけ
メチル基が好ましい。In the compound (1) of the present invention, R is a substituted or unsubstituted monovalent hydrocarbon group. Examples of R include alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, and dodecyl; cyclopentyl;
Cycloalkyl groups such as cyclohexyl; aralkyl groups such as 2-phenylethyl and 2-phenylpropyl; aryl groups such as phenyl and tolyl; alkenyl groups such as vinyl and allyl; and chloromethyl group, chlorophenyl group, 3,3,3-trifluoropropyl group, cyanoethyl group in which the hydrogen atom bonded to the carbon atom of the monovalent hydrocarbon group is partially substituted with a halogen atom, cyano group, etc. Such substituted hydrocarbon groups are exemplified. Among these, a saturated hydrocarbon group having 1 to 4 carbon atoms, particularly a methyl group, is preferred because it is easy to obtain raw materials and synthesize.
本発明の化合物(1)において、Yは加水分解性基であ
り、例えば塩素、臭素、ヨウ素のようなハロゲン原子;
メトキシ基、エトキシ基、n−プロポキシ基、i−プロ
ポキシ基、メトキシエトキシ基、n−ブトキシ基、5e
c−ブトキシ基、i−ブトキシ基、t−ブトキシ基、シ
クロへキシルオキシ基のようなアルコキシ基;及びフェ
ノキシ基のようなアリールオキシ基が例示される。これ
らの中でも、合成の容易さの点では塩素原子が、また実
用上の安定性、適度な反応性などの点ではメトキシ基が
好ましい。In the compound (1) of the present invention, Y is a hydrolyzable group, for example, a halogen atom such as chlorine, bromine, or iodine;
Methoxy group, ethoxy group, n-propoxy group, i-propoxy group, methoxyethoxy group, n-butoxy group, 5e
Examples include alkoxy groups such as c-butoxy, i-butoxy, t-butoxy, and cyclohexyloxy; and aryloxy groups such as phenoxy. Among these, a chlorine atom is preferred in terms of ease of synthesis, and a methoxy group is preferred in terms of practical stability and appropriate reactivity.
本発明の化合物(1)において、nは加水分解性基Yの
数であり、0〜3の整数である。本発明化合物(1)を
有機−無機複合材の接着性向上に使用する場合、nは1
〜3であることが好ましく、とりわけ3であることが望
ましい。In the compound (1) of the present invention, n is the number of hydrolyzable groups Y, and is an integer of 0 to 3. When the compound (1) of the present invention is used to improve the adhesion of organic-inorganic composite materials, n is 1
-3 is preferable, and 3 is especially desirable.
本発明の化合物(1)の製法の一例を以下に説明する。An example of the method for producing compound (1) of the present invention will be explained below.
本発明の化合物(1)のうち、Yがハロゲン原子である
ものは次の方法により製造することができる。Among the compounds (1) of the present invention, those in which Y is a halogen atom can be produced by the following method.
即ち、3−10ロー2−クロロメチルプロペンC)I、
=C(CHICl)2 (II )と−
数式
(式中、R及びnは前記と同じであり、Xはハロゲン原
子である)
で表されるヒドロハロゲノシラン化合物とを触媒量の銅
化合物の存在下に、第三アミンを塩化水素捕捉剤として
反応させる方法によって得られる。この化学反応式を式
(1)に示す。That is, 3-10 rho 2-chloromethylpropene C)I,
=C(CHICl)2 (II) and -
A hydrohalogenosilane compound represented by the formula (wherein R and n are the same as above, and X is a halogen atom) is mixed with a tertiary amine as a hydrogen chloride scavenger in the presence of a catalytic amount of a copper compound. It can be obtained by a method of reacting as This chemical reaction formula is shown in formula (1).
R1−n
CHz−C(CHzCI)z + 2H3iXll+
2B(II) (III)
R3−7
一千 C)Iz=C(CHzSiX、)z +
28’HC1(1)(Ia)
(式中、I?、X及びnは前記と同じであり、Bは第三
アミンである)
また、本発明の化合物(1)のうち、Yがアルコキシ基
又はアリールオキシ基であるものは次の方法により製造
することができる。R1-n CHz-C(CHzCI)z + 2H3iXll+
2B(II) (III) R3-7 1,000 C) Iz=C(CHzSiX,)z +
28'HC1(1)(Ia) (In the formula, I?, Or an aryloxy group can be produced by the following method.
即ち、反応式(1)で得られた化合物(Ia)と−数式
%式%()
(式中、Yはアルコキシ基又はアリールオキシ基である
)
で表される活性水素を有する化合物を脱ハロゲン化水素
反応させる方法によって得られる。この化学反応式を式
(2)に示す。That is, the compound (Ia) obtained by reaction formula (1) and the compound having active hydrogen represented by the formula % (in the formula, Y is an alkoxy group or an aryloxy group) are dehalogenated. Obtained by a method of hydrogenation reaction. This chemical reaction formula is shown in formula (2).
R3−,1
C)12=c(CH25iX1.)Z + 2
n y−。R3-,1 C)12=c(CH25iX1.)Z + 2
ny-.
(Ia) (TV)R3−,1
−〉 CHz=C(CHzSiYn )z +
2n Hχ (2)(Ib)
(式中、R,X、 Y及びnは前記と同じである)反応
式(1)において、原料として使用される3−10ロー
2−10ロメチルブロペン(■)は公知物質であり、3
−クロロ−2−メチルプロペンを塩化スルフリルで塩素
化する方法(欧州特許第159508号明細書)、ある
いはメチレンシクロプロパンに塩素ガスを作用させる方
法(R,Koester、 S、Arora、 P、B
ringer ; JustusLiebigs An
n、 CheIll、、 10.16]9 (1973
))などによって得られる。(Ia) (TV)R3-,1-> CHz=C(CHzSiYn)z+
2n Hχ (2) (Ib) (In the formula, R, It is a known substance, and 3
- A method of chlorinating chloro-2-methylpropene with sulfuryl chloride (European Patent No. 159508) or a method of acting chlorine gas on methylenecyclopropane (R, Koester, S, Arora, P, B
ringer ; Justus Liebigs An
n, CheIll,, 10.16]9 (1973
)) etc.
反応式(1)において、原料として使用されるヒドロハ
ロゲノシラン化合物(III)も公知物質である。ヒド
ロハロゲノシラン化合物(III)としては、例えばト
リクロロシラン、メチルジクロロシラン、ジメチルクロ
ロシラン、エチルジクロロシラン、ジエチルクロロシラ
ン、フエニルジクロロシランのようなヒドロクロロシラ
ン;トリブロモシラン、メチルジブロモシランのような
ヒドロブロモシラン;及びトリヨードシランのようなヒ
ドロヨードシランが例示される。In reaction formula (1), the hydrohalogenosilane compound (III) used as a raw material is also a known substance. Examples of the hydrohalogenosilane compound (III) include hydrochlorosilanes such as trichlorosilane, methyldichlorosilane, dimethylchlorosilane, ethyldichlorosilane, diethylchlorosilane, and phenyldichlorosilane; hydrobromosilanes such as tribromosilane and methyldibromosilane; Silane; and hydroiodosilane such as triiodosilane are exemplified.
これらの中でも、原料の入手、反応性などの点でトリク
ロロシランが特に好ましい。Among these, trichlorosilane is particularly preferred in terms of availability of raw materials, reactivity, and the like.
反応式(1)において、塩化水素捕捉剤として使用され
る第三アミンとしては、例えばトリエチルアミン、トリ
ブチルアミン、ピリジン、N。In reaction formula (1), examples of the tertiary amine used as a hydrogen chloride scavenger include triethylamine, tributylamine, pyridine, and N.
N−ジメチルアニリンなどが例示される。これらの中で
も、反応性の点でトリエチルアミンが特に好ましい。Examples include N-dimethylaniline. Among these, triethylamine is particularly preferred in terms of reactivity.
反応式(1)において、触媒に使用される銅化合物とし
ては、塩化第一銅、塩化第二銅、臭化第一銅、臭化第二
銅、酸化第一銅、酸化第二銅、硫酸銅などが例示される
。これらの中でも、入手の容易さや触媒活性の点で、塩
化第一銅が特に好ましい。触媒の使用量は特に限定され
ないが、3−クロロ−2−クロロメチルプロペン(II
)に対して0.01モル%以上、10モル%未満の範囲
が好ましい。0.01モル%未満では反応性が遅く、短
時間に良好な収率をあげることができない。一方、10
モル%以上用いても特に加えただけの効果がない。In reaction formula (1), the copper compounds used in the catalyst include cuprous chloride, cupric chloride, cuprous bromide, cupric bromide, cuprous oxide, cupric oxide, and sulfuric acid. Examples include copper. Among these, cuprous chloride is particularly preferred in terms of availability and catalytic activity. The amount of catalyst used is not particularly limited, but 3-chloro-2-chloromethylpropene (II
) is preferably in the range of 0.01 mol % or more and less than 10 mol %. If it is less than 0.01 mol %, the reactivity is slow and a good yield cannot be achieved in a short period of time. On the other hand, 10
Even if more than mol% is used, there is no particular effect of adding it.
反応式(1)において、有機溶媒は必須とするものでは
ないが、反応によってアミン塩酸塩が生成するため、通
常は有機溶媒の存在下に行われる。このような有機溶媒
としては、反応物質に対して不活性なものが望ましく、
例えばヘキサン、ヘプタンのような脂肪族炭化水素;シ
クロヘキサンのような脂環式炭化水素;ベンゼン、トル
エン、キシレンのような芳香族炭化水素;ジエチルエー
テル、テトラヒドロフラン、エチレングリコールジエチ
ルエーテルのようなエーテル類;酢酸エステルのような
エステル類;アセトン、メチルエチルケトンのようなケ
トン類;及びアセトニリトル、ジメチルホルムアミド、
ジメチルアセトアミド、ジメチルスルホキシド、ヘキサ
メチルリン酸トリアミドのような非プロトン極性溶媒な
どが例示される。また、これら有機溶媒は単独又は2種
類以上を混合して使用することが可能である。有機溶媒
の使用量は特に限定されないが、反応物質の合計重量に
対して10重量%以上、1000重量%未溝の範囲とす
ることが好ましい。In reaction formula (1), although an organic solvent is not essential, since amine hydrochloride is produced by the reaction, the reaction is usually carried out in the presence of an organic solvent. Such organic solvents are preferably inert to the reactants;
For example, aliphatic hydrocarbons such as hexane and heptane; alicyclic hydrocarbons such as cyclohexane; aromatic hydrocarbons such as benzene, toluene, and xylene; ethers such as diethyl ether, tetrahydrofuran, and ethylene glycol diethyl ether; Esters such as acetate; ketones such as acetone, methyl ethyl ketone; and acetonitrile, dimethylformamide,
Examples include aprotic polar solvents such as dimethylacetamide, dimethylsulfoxide, and hexamethylphosphoric triamide. Further, these organic solvents can be used alone or in combination of two or more. The amount of the organic solvent used is not particularly limited, but it is preferably in the range of 10% by weight or more and 1000% by weight based on the total weight of the reactants.
反応式(1)′において、3−クロロ−2−クロロメチ
ルプロペン(II)、ヒドロハロゲノシラン化合物(I
[[)及び第三アミンの使用割合は特に限定されないが
、化学量論量を用いて反応させることが経済上好ましい
。In reaction formula (1)', 3-chloro-2-chloromethylpropene (II), a hydrohalogenosilane compound (I
Although the proportions of [[) and tertiary amine to be used are not particularly limited, it is economically preferable to use stoichiometric amounts for the reaction.
反応式(1)の反応は、触媒、第三アミン及び有機溶媒
を反応容器に仕込み、これに3−クロロ−2−クロロメ
チルプロペン(II)とヒドロハロゲノシラン(Ill
)の混合物を少量ずつ滴下反応させる方法によって行う
ことが、反応制御上好ましい、この反応は−20〜10
0°C1好ましくは0〜50°Cの温度範囲で行われる
。反応時の圧力は特に限定されないが、通常、常圧が適
用される0反応時間は反応条件によるが、通常001〜
10時間で十分である。In the reaction of reaction formula (1), a catalyst, a tertiary amine, and an organic solvent are placed in a reaction vessel, and 3-chloro-2-chloromethylpropene (II) and hydrohalogenosilane (II) are added to the reaction vessel.
) is preferably added dropwise in small quantities in order to control the reaction.
It is carried out at a temperature range of 0°C, preferably 0 to 50°C. The pressure during the reaction is not particularly limited, but normal pressure is usually applied.The reaction time depends on the reaction conditions, but is usually 001~
10 hours is sufficient.
反応式(2)において、原料として使用される活性水素
含有化合物(IV)としては、例えばメチルアルコール
、エチルアルコール、n−プロピルアルコール、i−プ
ロピルアルコール、メトキシエチルアルコール、n−ブ
チルアルコール、5ec−ブチルアルコール、i−ブチ
ルアルコール、t−ブチルアルコール、シクロヘキシル
アルコールのようなアルコール;及びフェノールなどが
例示される。これらの中でも、メチルアルコールが好適
に使用される。In reaction formula (2), the active hydrogen-containing compound (IV) used as a raw material includes, for example, methyl alcohol, ethyl alcohol, n-propyl alcohol, i-propyl alcohol, methoxyethyl alcohol, n-butyl alcohol, 5ec- Alcohols such as butyl alcohol, i-butyl alcohol, t-butyl alcohol, and cyclohexyl alcohol; and phenol are exemplified. Among these, methyl alcohol is preferably used.
反応式(2)において、有機溶媒の使用は必須とするも
のではないが、使用する場合は、反応式(1)で説明し
た有機溶媒に関する事項が適用できる。In Reaction Formula (2), the use of an organic solvent is not essential, but when used, the matters regarding organic solvents explained in Reaction Formula (1) can be applied.
反応式(2)の反応は、反応容器に反応式(1)によっ
て得られた化合物(I a)及び必要に応じて有機溶媒
を仕込み、これに化学量論量の活性水素含有化合物(I
V)を滴下反応させる方法で行うことが好ましい。更に
好ましくは、反応を円滑に進めるために、副生ずるハロ
ゲン化水素を除去することが望ましく、例えば反応系を
減圧状態とする、反応系に窒素ガス、ヘリウムガスなど
の不活性ガスを導入する、あるいは反応系に化学量論量
に相当するハロゲン化水素捕捉剤を添加することが好ま
しい。このようなハロゲン化水素捕捉剤としては、反応
式(1)で説明した塩化水素捕捉剤と同様のものが適用
できる。In the reaction of Reaction Formula (2), the compound (I a) obtained by Reaction Formula (1) and an organic solvent as needed are placed in a reaction vessel, and a stoichiometric amount of the active hydrogen-containing compound (I
It is preferable to carry out the reaction by dropping V). More preferably, in order for the reaction to proceed smoothly, it is desirable to remove the hydrogen halide produced as a by-product, for example, by reducing the pressure of the reaction system, or introducing an inert gas such as nitrogen gas or helium gas into the reaction system. Alternatively, it is preferable to add a stoichiometric amount of a hydrogen halide scavenger to the reaction system. As such a hydrogen halide scavenger, the same hydrogen chloride scavenger as explained in reaction formula (1) can be applied.
この反応は、−20℃〜100℃、好ましくは0〜60
°Cの温度範囲で行われる。反応時の圧力は特に限定さ
れないが、常圧又は減圧が好ましい。This reaction is carried out at -20°C to 100°C, preferably from 0 to 60°C.
It is carried out in the temperature range of °C. The pressure during the reaction is not particularly limited, but normal pressure or reduced pressure is preferred.
反応時間は反応条件によるが、通常0.5〜24時間で
十分である。Although the reaction time depends on the reaction conditions, 0.5 to 24 hours is usually sufficient.
反応式(1)及び反応式(2)によって得られた反応混
合物からの本発明の化合物(I)の単離及び精製は、有
機合成化合物の分野で一般に使用されている手法によっ
て行うことができ、例えば減圧蒸留によって目的物質を
単離することが可能である。Isolation and purification of the compound (I) of the present invention from the reaction mixture obtained by Reaction Formula (1) and Reaction Formula (2) can be performed by methods commonly used in the field of organic synthetic compounds. For example, it is possible to isolate the target substance by distillation under reduced pressure.
本発明の化合物(I)は、無機材料表面と反応もしくは
相互作用する加水分解性シリル基を複数有しているため
、半導体封止材などの有機−無機複合材の接着性及びそ
の信頼性の向上に有効である。更に、有機−無機複合材
において、機械的特性の向上、電気的特性の向上、耐水
・耐湿性の向上、作業性の改善、無機充填材の高配合に
よるコストダウンなどの効果も期待できる。Since the compound (I) of the present invention has a plurality of hydrolyzable silyl groups that react or interact with the surface of an inorganic material, it improves the adhesiveness and reliability of organic-inorganic composite materials such as semiconductor encapsulating materials. Effective for improvement. Furthermore, in organic-inorganic composite materials, effects such as improved mechanical properties, improved electrical properties, improved water and moisture resistance, improved workability, and cost reduction due to high content of inorganic fillers can be expected.
更に、本発明の化合物(1)は、高選択的な精密有機合
成において非常に重要な反応剤として知られているアリ
ルトリメトキシシランなどのアリルシラン化合物と類似
の分子構造を有しているため、合成化学的な有用性も極
めて高いと考えられる。Furthermore, the compound (1) of the present invention has a molecular structure similar to allylsilane compounds such as allyltrimethoxysilane, which is known as a very important reactant in highly selective precision organic synthesis. It is also considered to be extremely useful in synthetic chemistry.
以下において、実施例を掲げ本発明を更に詳しく説明す
るが、本発明の範囲は以下の実施例のみに限定されるも
のではない。EXAMPLES Below, the present invention will be explained in more detail with reference to examples, but the scope of the present invention is not limited only to the following examples.
実施例1
1.3−ビス(トリクロロシリル)−2−メチレンプロ
パンの合成
撹拌機、温度針、滴下漏斗、還流冷却器及び氷バスを備
えた内容積500ca lのフラスコに、塩化第一銅0
.5g (0,005モル)、トリエチルアミン50.
5g (0,5モル)及びジエチルエーテル100gを
仕込み、撹拌を開始した。Example 1 Synthesis of 1.3-bis(trichlorosilyl)-2-methylenepropane A 500 cal flask equipped with a stirrer, temperature needle, addition funnel, reflux condenser and ice bath was charged with 0 cuprous chloride.
.. 5g (0,005 mol), triethylamine 50.
5 g (0.5 mol) and 100 g of diethyl ether were charged, and stirring was started.
これに、滴下漏斗より3−クロロ−2−クロロメチルプ
ロペン31.3g (0,25モル)とトリクロロシラ
ン68.0g(0,5モル)の混合溶液を液温20〜3
0℃になるように適宜冷却しながら1時間かけて滴下し
た。滴下終了後、液温20″Cで2時間撹拌し、ガスク
ロマトグラフィー分析により原料である3−クロロ−2
−クロロメチルプロペンのピークがほぼ消失しているこ
とを確認した。To this, a mixed solution of 31.3 g (0.25 mol) of 3-chloro-2-chloromethylpropene and 68.0 g (0.5 mol) of trichlorosilane was added from a dropping funnel at a liquid temperature of 20 to 3 mol.
The mixture was added dropwise over 1 hour while being appropriately cooled to 0°C. After the dropwise addition was completed, the solution was stirred for 2 hours at a temperature of 20"C, and the raw material 3-chloro-2 was analyzed by gas chromatography.
- It was confirmed that the peak of chloromethylpropene had almost disappeared.
次いで、トリエチルアミン塩酸塩を濾過し、ジエチルエ
ーテル50gで洗浄後、濾液を蒸留して沸点120〜1
22℃/’1ITorrの留分を分取した結果、無色透
明液状の1,3−ビス(トリクロロシリル)−2−メチ
レンプロパン56.5g (収率70.0%)を得た。Next, triethylamine hydrochloride was filtered, washed with 50 g of diethyl ether, and the filtrate was distilled to a boiling point of 120-1.
As a result of fractionating the fraction at 22° C./'1 Torr, 56.5 g (yield 70.0%) of 1,3-bis(trichlorosilyl)-2-methylenepropane was obtained as a colorless transparent liquid.
このもののガスクロマトグラフィー分析、元素分析、赤
外吸収スペクトル分析及びIn核磁気共鳴吸収分析の結
果は下記の通りであり、次式の分子構造であることを確
認した。The results of gas chromatography analysis, elemental analysis, infrared absorption spectrum analysis, and In nuclear magnetic resonance absorption analysis of this product were as follows, and it was confirmed that it had the molecular structure of the following formula.
・ガスクロマトグラフィー分析: 94.0%・元素分
析:
実測値 Si ; 17.29% C;14.98%H
;1.92% C1; 65.81%計算値 54
; 17.39% C;14.88%H;1.87%
C1; 65.86%・赤外1収スペクトル分析(液
膜法)二波数(c+w−’) 帰 属
3050〜2850 (、−R
1630C= C
・’H核磁気共鳴吸収分析(90MHz、 CDCl3
中):位置 化学シフトδ(ppm) 積分強度 多
重度a 5.00 2)1
sb 2.35 4Hs実施例
2
1.3−ビス(トリメトキシシリル)−2−メチレンプ
ロパン
撹拌機、温度計、滴下漏斗、還流冷却器及び氷バスを備
えた内容積11のフラスコに、実施例1の1.3−ビス
(トリクロロシリル)−2−メチレンプロパン48.4
g (0,15モル)及びn−ヘキサン200gを仕
込み、撹拌を開始し、液温10°Cに冷却した。・Gas chromatography analysis: 94.0% ・Elemental analysis: Actual value Si; 17.29% C; 14.98% H
;1.92% C1; 65.81% calculated value 54
; 17.39% C; 14.88% H; 1.87%
C1; 65.86% Infrared 1 yield spectrum analysis (liquid film method) dual wave number (c+w-') Attribution 3050-2850 (,-R 1630C=C ・'H nuclear magnetic resonance absorption analysis (90MHz, CDCl3
(middle): Position Chemical shift δ (ppm) Integrated intensity Multiplicity a 5.00 2) 1
sb 2.35 4Hs Example 2 1.3-Bis(trimethoxysilyl)-2-methylenepropane In a flask of internal volume 11 equipped with a stirrer, thermometer, addition funnel, reflux condenser and ice bath, Example 1, 1,3-bis(trichlorosilyl)-2-methylenepropane 48.4
g (0.15 mol) and 200 g of n-hexane were charged, stirring was started, and the liquid temperature was cooled to 10°C.
これに、滴下漏斗よりメチルアルコール28.8g (
0,9モル)及びピリジン71.2g (0,9モル)
の混合溶液を液温10〜20°Cになるように保持しな
がら1時間かけて滴下した。滴下終了後、液温20°C
で2時間撹拌し、ガスクロマトグラフィー分析により1
,3−ビス(トリクロロシリル)−2−メチレンプロパ
ンのピークが消失していることを確認した。To this, add 28.8 g of methyl alcohol (
0.9 mol) and 71.2 g (0.9 mol) of pyridine
The mixed solution was added dropwise over 1 hour while maintaining the liquid temperature at 10 to 20°C. After dropping, the liquid temperature is 20°C.
After stirring for 2 hours at
, 3-bis(trichlorosilyl)-2-methylenepropane was confirmed to have disappeared.
次いで、副生したピリジン塩酸塩を濾過し、減圧蒸留に
より沸点128〜131°C/16Torrの留分を分
取した結果、無色透明液状の1,3−ビス(トリメトキ
シシリル)−2−メチレンプロパン26.9gを得た。Next, the by-produced pyridine hydrochloride was filtered, and a fraction with a boiling point of 128-131°C/16 Torr was collected by vacuum distillation. As a result, 1,3-bis(trimethoxysilyl)-2-methylene was obtained as a colorless transparent liquid. 26.9 g of propane was obtained.
これは、1.3−ビス(トリクロロシリル)−2−メチ
レンプロパンに対して60.0%の収率であった。This was a yield of 60.0% based on 1,3-bis(trichlorosilyl)-2-methylenepropane.
このもののガスクロマトグラフィー分析、元素分析、赤
外吸収スペクトル分析、1H核磁気共鳴吸収分析及び質
量スペクトル分析の結果は下記の通りであり、次式の分
子構造であることを確認した。The results of gas chromatography analysis, elemental analysis, infrared absorption spectrum analysis, 1H nuclear magnetic resonance absorption analysis, and mass spectrum analysis of this product were as follows, and it was confirmed that it had the molecular structure of the following formula.
b c
・ガスクロマトグラフィー分析: 93.9%・元素分
析:
実測値 Si ; 23.60% C;36.20%)
1 ;8.10% 0 ;32.10%計算値
Si ; 23.70% C;36.13%H;8.0
8% 0 ;32.09 %・赤外吸収スペクト
ル分析(液膜法):波数(cm−’) 帰 属
3050〜2850 C−R
1640C=C
1100〜1080 Si −0CR3・“H核
磁気共鳴吸収分析(90MHz、 CDC15中)
:位置 化学シフトδ(ppm) 積分強度 多重度
a 4.80 28
sb 1.10 4H
sC3,5018Hsb c ・Gas chromatography analysis: 93.9% ・Elemental analysis: Actual value Si; 23.60% C; 36.20%)
1 ; 8.10% 0 ; 32.10% calculated value
Si; 23.70% C; 36.13% H; 8.0
8% 0; 32.09%・Infrared absorption spectrum analysis (liquid film method): Wave number (cm-') Attribution 3050~2850 C-R 1640C=C 1100~1080 Si-0CR3・"H nuclear magnetic resonance absorption Analysis (90MHz, in CDC15)
:Position Chemical shift δ (ppm) Integrated intensity Multiplicity a 4.80 28
sb 1.10 4H
sC3,5018Hs
Claims (1)
ハロゲン原子、アルコキシ基及びアリールオキシ基から
選ばれる加水分解性基;nは0〜3の整数を示す) で表される不飽和有機ケイ素化合物。[Claims] 1. General formula▲ Numerical formula, chemical formula, table, etc.▼ (In the formula, R is a substituted or unsubstituted monovalent hydrocarbon group; Y is a halogen atom, an alkoxy group, or an aryloxy group. An unsaturated organosilicon compound represented by a selected hydrolyzable group; n is an integer of 0 to 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27486490A JPH04149185A (en) | 1990-10-12 | 1990-10-12 | Unsaturated organosilicon compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27486490A JPH04149185A (en) | 1990-10-12 | 1990-10-12 | Unsaturated organosilicon compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04149185A true JPH04149185A (en) | 1992-05-22 |
Family
ID=17547636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27486490A Pending JPH04149185A (en) | 1990-10-12 | 1990-10-12 | Unsaturated organosilicon compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04149185A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5605991A (en) * | 1996-03-21 | 1997-02-25 | Shell Oil Company | Multifunctional initiator from divinyl dislane |
-
1990
- 1990-10-12 JP JP27486490A patent/JPH04149185A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5605991A (en) * | 1996-03-21 | 1997-02-25 | Shell Oil Company | Multifunctional initiator from divinyl dislane |
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