JPH04148991A - Positive type photosensitive planographic printing plate - Google Patents
Positive type photosensitive planographic printing plateInfo
- Publication number
- JPH04148991A JPH04148991A JP27479690A JP27479690A JPH04148991A JP H04148991 A JPH04148991 A JP H04148991A JP 27479690 A JP27479690 A JP 27479690A JP 27479690 A JP27479690 A JP 27479690A JP H04148991 A JPH04148991 A JP H04148991A
- Authority
- JP
- Japan
- Prior art keywords
- aluminum plate
- oxide film
- pref
- anodic
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 24
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 24
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000003792 electrolyte Substances 0.000 claims abstract description 7
- 238000007743 anodising Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 9
- 229920005989 resin Polymers 0.000 abstract description 8
- 239000011347 resin Substances 0.000 abstract description 8
- 150000001875 compounds Chemical class 0.000 abstract description 6
- 239000007864 aqueous solution Substances 0.000 abstract description 5
- 239000010407 anodic oxide Substances 0.000 abstract description 4
- 230000003647 oxidation Effects 0.000 abstract description 3
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- 238000005238 degreasing Methods 0.000 abstract description 2
- 150000008049 diazo compounds Chemical class 0.000 abstract description 2
- 229920003986 novolac Polymers 0.000 abstract description 2
- 239000005011 phenolic resin Substances 0.000 abstract description 2
- 239000010731 rolling oil Substances 0.000 abstract description 2
- 239000004094 surface-active agent Substances 0.000 abstract description 2
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 3
- 238000000034 method Methods 0.000 description 13
- 239000002253 acid Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000000975 dye Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000981 basic dye Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- -1 and jetanolamine Chemical class 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- ZRUOTKQBVMWMDK-UHFFFAOYSA-N 2-hydroxy-6-methylbenzaldehyde Chemical compound CC1=CC=CC(O)=C1C=O ZRUOTKQBVMWMDK-UHFFFAOYSA-N 0.000 description 1
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000010680 novolac-type phenolic resin Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002989 phenols Chemical group 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- AODQPPLFAXTBJS-UHFFFAOYSA-M victoria blue 4R Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[N+](C)C1=CC=CC=C1 AODQPPLFAXTBJS-UHFFFAOYSA-M 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はアルミニウム支持体上に感光層を設けた感光性
平版印刷版(PS版)に関するものである。更に詳しく
は、非画像部が染色されることなく容易に現像できるポ
ジ型感光性平版印刷版に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a photosensitive lithographic printing plate (PS plate) in which a photosensitive layer is provided on an aluminum support. More specifically, the present invention relates to a positive photosensitive lithographic printing plate that can be easily developed without dyeing non-image areas.
一般に、平版印刷版に使用されるアルミニウム支持体は
、親水性、保水性に優れていることか要求され、そのた
めに機械的、化学的又は電気化学的な方法により、砂目
立てすることかよく知られている。さらに、この砂目立
てした表面の機械的強度を増すため、さらに保水性を増
すために表面を陽極酸化することが知られている。通常
、2g/イ〜5g/rd程度の陽極酸化皮膜を設け、保
水性がよく、かつ表面の機械的強度の大きい支持体が一
般に使用されている。In general, aluminum supports used in lithographic printing plates are required to have excellent hydrophilicity and water retention, and for this purpose, it is well known that they must be grained by mechanical, chemical, or electrochemical methods. It is being Furthermore, in order to increase the mechanical strength of this grained surface, it is known to anodize the surface in order to further increase water retention. Usually, a support is used which is provided with an anodic oxide film of about 2 g/i to 5 g/rd, has good water retention, and has a high surface mechanical strength.
この表面に0−キノンジアジドを含むポジ型感光層を設
けてポジ型のPS版を作成すると、現像後に、非画像部
か着色してしまうという問題がある。これを解決するた
めに、例えば特開昭57195697号公報には縮合ア
リールスルホン酸すI・リウムで処理することか提案さ
れている。この方法によれば」二連した非画像部の着色
を防止できるか、その反面耐刷性か低下するという欠点
があった。If a positive PS plate is prepared by providing a positive photosensitive layer containing 0-quinonediazide on the surface, there is a problem that non-image areas become colored after development. In order to solve this problem, for example, Japanese Patent Application Laid-Open No. 57195697 proposes treatment with condensed arylsulfonic acid I.lium. According to this method, it is possible to prevent coloring of two consecutive non-image areas, but on the other hand, there is a drawback that printing durability is reduced.
従って、本発明の目的は、画像部か支持体に強固に密着
し、しかも非画像部に着色を生じにくいポジ型感光性平
版印刷版を提供することにある。Accordingly, an object of the present invention is to provide a positive-working photosensitive lithographic printing plate in which the image area is firmly adhered to the support and the non-image area is less likely to be colored.
本発明者は、上記の目的を達成すべく鋭意検討した結果
、砂目立てしたアルミニウム表面に水和酸化皮膜を設け
た後、硫酸電解液中で陽極酸化して得られた支持体上に
、0−キノンジアジドを含む感光層を設けることにより
、上記の目的が達成されることを見い出し、本発明をな
すに至ったものである。As a result of intensive studies to achieve the above object, the inventors of the present invention provided a hydrated oxide film on a grained aluminum surface and then anodized it in a sulfuric acid electrolyte. - It has been discovered that the above object can be achieved by providing a photosensitive layer containing quinonediazide, and the present invention has been completed.
以下、本発明について順を追って詳しく説明する。Hereinafter, the present invention will be explained in detail step by step.
本発明において用いられるアルミニウム板は純アルミニ
ウム又はアルミニウムを主成分とし、微量の異原子を含
むアルミニウム合金等の板状体である。この異原子には
、珪素、鉄、マンガン、銅、マグネシウム、クロム、亜
鉛、ビスマス、ニッケル、チタンなどがある。異原子の
含有率は高々10重景%以下である。本発明に好適なア
ルミニウムは純アルミニウムであるか、完全に純粋なア
ルミニウムは、製練技術上製造が困難であるのて、てき
るだけ異原子の含有率の低いものかよい。又、上述した
程度の含有率のアルミニウム合金てあれば、本発明に適
用しうる素材ということができる。The aluminum plate used in the present invention is a plate-like body of pure aluminum or an aluminum alloy containing aluminum as a main component and a trace amount of foreign atoms. These foreign atoms include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, and titanium. The content of foreign atoms is at most 10% or less. Aluminum suitable for the present invention is pure aluminum, or since completely pure aluminum is difficult to produce due to smelting technology, it is preferable to use aluminum with as low a content of foreign atoms as possible. Furthermore, any aluminum alloy having the above-mentioned content can be said to be a material that can be applied to the present invention.
このように本発明に適用されるアルミニウム板は、その
組成が特定されるものではな〈従来公知、公用の素材の
ものを適宜利用することができる。本発明に用いられる
アルミニウム板の厚さは、およそ0.1 ff1m 〜
0.5 mm程度である。As described above, the composition of the aluminum plate applied to the present invention is not specified; conventionally known and publicly used materials can be used as appropriate. The thickness of the aluminum plate used in the present invention is approximately 0.1 ff1m ~
It is approximately 0.5 mm.
アルミニウム板を陽極酸化するに先立ぢ、表面の圧延油
を除去するための、例えば界面活性剤又はアルカリ性水
溶液で処理する脱脂処理、及び砂目立処理か所望により
行なわれる。Prior to anodizing the aluminum plate, degreasing treatment, such as treatment with a surfactant or alkaline aqueous solution, and graining treatment are carried out, if desired, to remove rolling oil from the surface.
砂目立て処理方法には、機械的に表面を粗面化する方法
、電気化学的に表面を溶解する方法及び化学的に表面を
選択溶解させる方法がある。機械的に表面を粗面化する
方法としては、ボール研摩法、ブラシ研摩法、ブラスト
研摩法、パフ研摩法等と称せられる公知の方法を用いる
ことができる。Graining treatment methods include a method of mechanically roughening the surface, a method of electrochemically dissolving the surface, and a method of selectively dissolving the surface chemically. As a method for mechanically roughening the surface, known methods such as ball polishing, brush polishing, blast polishing, puff polishing, etc. can be used.
また、電気化学的な粗面化法としては塩酸又は硝酸電解
液中で交流又は直流により、行なう方法がある。また、
特開昭54−63902号公報に開示されているように
両者を組合せた方法も利用することかできる。Further, as an electrochemical surface roughening method, there is a method in which alternating current or direct current is used in a hydrochloric acid or nitric acid electrolyte. Also,
It is also possible to use a method that combines both methods, as disclosed in Japanese Patent Application Laid-Open No. 54-63902.
このように粗面化されたアルミニウム板は、必要に応じ
てアルカリエツチング処理及び中和処理される。The aluminum plate thus roughened is subjected to alkali etching treatment and neutralization treatment as necessary.
このように処理された表面には、水和酸化皮膜か設けら
れる。水和酸化皮膜は、熱水中にアルミニウム板を浸漬
することにより形成される。好ましい温度は50°C〜
+00°Cで適宜選択される。The surface thus treated is provided with a hydrated oxide film. A hydrated oxide film is formed by immersing an aluminum plate in hot water. The preferred temperature is 50°C~
It is selected appropriately at +00°C.
又、短時間で表面に水和酸化皮膜を形成するには、アル
カリ性溶液、好ましくはpH8〜12の溶液中て50〜
100°Cにして浸漬するのが好ましい。In addition, in order to form a hydrated oxide film on the surface in a short period of time, it is necessary to add
It is preferable to immerse at 100°C.
好ましいアルカリ剤としては、アルカリ土類、アルカリ
金属の水酸化物や、アンモニア水、トリエタノールアミ
ン、モノエタノールアミン、ジェタノールアミン等のア
ミン類や炭酸ソーダ、炭酸カリ等の炭酸塩が用いられる
。処理時間は、10秒〜300秒の範囲から適宜選択す
ればよい。Preferred alkaline agents include hydroxides of alkaline earth elements and alkali metals, amines such as aqueous ammonia, triethanolamine, monoethanolamine, and jetanolamine, and carbonates such as soda carbonate and potassium carbonate. The processing time may be appropriately selected from the range of 10 seconds to 300 seconds.
このように処理した表面は引き続き陽極酸化処理される
。The surface thus treated is subsequently anodized.
好ましい電解液は硫酸である。リン酸、蓚酸、クロム酸
等もよ(知られた電解液であるか、公害上の問題や電圧
が高くなる等の問題があり、工業生産上は不向きである
。A preferred electrolyte is sulfuric acid. Phosphoric acid, oxalic acid, chromic acid, etc. are also known electrolytes, and are not suitable for industrial production because they have problems such as pollution and high voltage.
陽極酸化の処理条件は、一般的には電解質の濃度が1〜
80重量%溶液、液温は5〜70℃、電流密度5〜60
A/dm2、電圧1〜100V1電解時間10秒〜50
分の範囲にあれば適当である。The processing conditions for anodic oxidation are generally such that the electrolyte concentration is 1 to 1.
80% by weight solution, liquid temperature 5-70℃, current density 5-60
A/dm2, voltage 1~100V1 electrolysis time 10 seconds~50
It is appropriate if it is within the range of minutes.
陽極酸化皮膜の量は0.1〜I Og/rrrが好適て
あるか、より好ましくは1〜6 glrdの範囲である
。このように陽極酸化皮膜を設けた表面に、0ギノンジ
アジドを含むポジ型感光性ジアゾ化合物層を設ける。The amount of anodized film is preferably in the range of 0.1 to I Og/rrr, more preferably in the range of 1 to 6 glrd. A positive photosensitive diazo compound layer containing Oginonediazide is provided on the surface provided with the anodic oxide film in this manner.
特に好ましい0−キノンジアシド化合物はO−ナフ)・
キノンジアシド化合物であり、例えば米国特許第2.7
66、118号、同第2.767、092号、同第2、
772.972号、同第2.859.112号、同第2
.907.665号、同第3.046.110号、同第
3.046.111号、同第3046115号、同第3
.046.118号、同第3.046.119号、同第
3.046.1.20号、同第3.046. +2]号
、同第3、046.122号、同第3.046.123
号、同第3.061,430号、同第3.1.02.8
09号、同第3.106.465号、同第3、635.
709号、同第3.647.443号の各明細書をはし
め、多数の刊行物に記されており、これらは好適に使用
することかできる。これらの内でも、特に芳香族ヒトロ
ギシ化合物の0−ナフトキノンジアジドスルホン酸エス
テルまたは○−ナフI・キノンジアジドカルボン酸エス
テル、および芳香族アミノ化合物のO−ナフトキノンジ
アジドスルホン酸アミドまたは0−ナフトキノンシアシ
トカルボン酸アミドが好ましく、特に米国特許第3.6
35.709号明細書に記されているピロガロールとア
セトンとの縮合物に0−ナフトキノンジアジドスルホン
酸をエステル反応させたもの、米国特許第4.0281
11号明細書に記されている末端にヒドロキシ基を存す
るポリエステルにO−ナフトキノンジアジドスルホン酸
、または0−ナフトキノンシアシトカルボン酸をエステ
ル反応させたもの、英国特許第1.494.043号明
細書に記されているようなpヒドロキシスチレンのホモ
ポリマーまたはこれと他の共重合し得るモノマーとの共
重合体に0−ナフトキノンジアジドスルホン酸または0
−ナフトキノンジアジドカルボン酸をエステル反応させ
たもの、米国特許第3.759.7] ]号明細書に記
されているようなp−アミノスチレンと他の共重合しう
るモノマーとの共重合体に0−ナフトキノンジアジドス
ルポン酸または0−ナフトキノンシアシトカルボン酸を
アミド反応させたものは非常にすぐれている。Particularly preferred O-quinonediaside compounds are O-naf).
Quinonediaside compounds, such as those described in U.S. Patent No. 2.7
66, No. 118, No. 2.767, 092, No. 2,
No. 772.972, No. 2.859.112, No. 2
.. 907.665, 3.046.110, 3.046.111, 3046115, 3
.. 046.118, 3.046.119, 3.046.1.20, 3.046. +2] No. 3, No. 046.122, No. 3.046.123
No. 3.061,430, No. 3.1.02.8
No. 09, No. 3.106.465, No. 3, 635.
No. 709 and No. 3.647.443, and are described in numerous publications, which can be suitably used. Among these, in particular, 0-naphthoquinonediazide sulfonic acid ester or ○-naph I quinonediazidecarboxylic acid ester of aromatic hydroxyl compounds, and O-naphthoquinonediazide sulfonic acid amide or 0-naphthoquinone cyasitocarboxylic acid of aromatic amino compounds. Amides are preferred, especially U.S. Pat.
35.709, a condensate of pyrogallol and acetone subjected to an ester reaction with 0-naphthoquinonediazide sulfonic acid, U.S. Patent No. 4.0281
British Patent No. 1.494.043, which is obtained by subjecting O-naphthoquinonediazide sulfonic acid or O-naphthoquinone cyasitocarboxylic acid to an ester reaction with a polyester having a hydroxyl group at the end as described in Specification No. 11. A homopolymer of p-hydroxystyrene or a copolymer of this with other copolymerizable monomers as described in
- an ester reaction product of naphthoquinonediazidecarboxylic acid, U.S. Pat. No. 3,759.7]. Those obtained by subjecting 0-naphthoquinone diazide sulfonic acid or 0-naphthoquinone cyasitocarboxylic acid to an amide reaction are very excellent.
これらの0−キノンジアジド化合物は、単独で使用する
ことができるが、アルカリ可溶性樹脂と混合して用いた
方か好ましい。好適なアルカリ可溶性樹脂には、ノボラ
ック型フェノール樹脂が含まれ、具体的には、フェノー
ルホルムアルデヒド樹脂、O−クレゾールホルムアルデ
ヒド樹脂、mクレゾールホルムアルデヒド樹脂なとか含
まれる。更に米国特許第4.123.279号明細書に
記されている様に上記のようなフェノール樹脂と共に、
t−プチルフェノールポルムアルデヒト樹脂のような炭
素数3〜8のアルキル基で置換されたフェノールまたは
クレゾールとホルムアルデヒドとの縮合物とを併用する
と、より一層好ましい。アルカリ可溶性樹脂は、感光層
を構成する組成物の全重量を基準として約50〜約85
重量%、より好ましくは60〜80重量%、含存させら
れる。These O-quinonediazide compounds can be used alone, but it is preferable to use them in combination with an alkali-soluble resin. Suitable alkali-soluble resins include novolac type phenolic resins, and specifically include phenol formaldehyde resins, O-cresol formaldehyde resins, m-cresol formaldehyde resins, and the like. Furthermore, as described in U.S. Pat. No. 4,123,279, along with the above-mentioned phenolic resins,
It is even more preferable to use a phenol substituted with an alkyl group having 3 to 8 carbon atoms, such as t-butylphenolpolmaldehyde resin, or a condensate of cresol and formaldehyde. The alkali-soluble resin has a content of about 50 to about 85% based on the total weight of the composition constituting the photosensitive layer.
% by weight, more preferably 60-80% by weight.
0−キノンジアシド化合物を含む感光性組成物には、必
要に応して更に染料、可塑剤、例えば英国特許第]、
401.463号、同第1.039.475号、米国特
許第3.969.118号の各明細書に記されているよ
うなプリントアウト性能を与える成分などの添加剤を加
えることができる。The photosensitive composition containing the 0-quinonediaside compound may optionally further contain dyes, plasticizers, such as British Patent No.],
Additives can be added, such as components that provide printout performance, such as those described in U.S. Pat. No. 401.463, U.S. Pat.
染料としては、塩基性染料および油溶性染料かある。具
体的には、ビクトリア・ピュア・ブルー・BOH、ビク
トリア・ブルー・BR、メチル・バイオレット、アイゼ
ン・マラカイト・グリーン(以上、保止ケ谷化学工業製
)、パテント・ピュア・ブルー・VX10−ダミンB1
メチレン・ブルー(以上、住人化学工業製)等の塩基性
染料、並びにスーダン・ブルー・■、ビクトリア・ブル
ー・F4R(、以上、B、A、S、P、製)、オイル−
・ブルー・#603、オイル−・ブルー・BO3,オイ
ル−・ブルー・IIN(以上、オリエント化学工業製)
等の油溶性染料があげられる。Dyes include basic dyes and oil-soluble dyes. Specifically, Victoria Pure Blue BOH, Victoria Blue BR, Methyl Violet, Eisen Malachite Green (manufactured by Hodogaya Chemical Industry), Patent Pure Blue VX10-Damine B1.
Basic dyes such as methylene blue (manufactured by Sumima Kagaku Kogyo), Sudan Blue ■, Victoria Blue F4R (manufactured by B, A, S, P), oil-
・Blue・#603, Oil-・Blue・BO3, Oil-・Blue・IIN (manufactured by Orient Chemical Industry)
Oil-soluble dyes such as
これらの染料の中でも塩基性染料が好ましく、特にその
対アニオンか例えばナフタレンスルホン酸のようなスル
ホン酸基1個を唯一の交換基として有するものであるも
のか最も好ましい。Among these dyes, basic dyes are preferred, and most preferably those whose counter anion has one sulfonic acid group, such as naphthalene sulfonic acid, as the only exchange group.
光分解性酸発生剤としては1.2−ナフトキノン−(2
)−4−スルホン酸クロリドの他に、O
特開昭53−36223号公報に記載のトリハロメチル
−2−ピロンやトリハロメチルトリアジン、特開昭55
−62444号公報に記載の種々のOナフトキノンジア
シド化合物、特開昭55−77742号公報に記載の2
−トリハロメチル5−アリール−1,3,4−オキサジ
アゾール化合物などを添加することかできる。As a photodegradable acid generator, 1,2-naphthoquinone-(2
)-4-Sulfonic acid chloride, O trihalomethyl-2-pyrone and trihalomethyltriazine described in JP-A-53-36223, JP-A-55
Various O naphthoquinonediaside compounds described in Japanese Patent Application Laid-Open No. 55-77742,
-Trihalomethyl5-aryl-1,3,4-oxadiazole compounds and the like can be added.
O−キノンジアジ)・化合物を含む感光層及びその現像
液の更なる詳細は米国特許第4.259.434号に詳
しく記載されている。Further details of photosensitive layers containing O-quinone diazi) compounds and their developers are described in detail in U.S. Pat. No. 4,259,434.
上記の感光層は、乾燥後の重量で1〜3 g/in:の
厚みて支持体上に塗布される。The photosensitive layer described above is coated onto the support to a thickness of 1 to 3 g/in (weight after drying).
本発明をさらに詳細に説明するため、以下実施例を示す
。EXAMPLES In order to explain the present invention in more detail, Examples are shown below.
実施例
JI31050アルミニウムシートをバミスー水懸濁液
を研磨剤として、回転ナイロンブラシで表面を砂目立て
した。このときの表面粗さ(中心線平均粗さ)は0.5
μであった。水洗後、10%苛性ソーダ水溶液を70°
Cに温めた溶液中に浸漬して、アルミニウムの溶解量か
6g/rdとなるようにエツチングした。水洗後、30
%硝酸水溶液に1分間浸漬して中和し、十分水洗した。EXAMPLE The surface of a JI31050 aluminum sheet was grained using a rotating nylon brush using a vamisu water suspension as an abrasive. The surface roughness at this time (center line average roughness) is 0.5
It was μ. After washing with water, add 10% caustic soda solution at 70°C.
It was immersed in a solution warmed to C and etched so that the amount of aluminum dissolved was 6 g/rd. After washing with water, 30
% nitric acid aqueous solution for 1 minute to neutralize it, and thoroughly washed with water.
その後に、0.7%硝酸水溶液中で、陽極時電圧13ボ
ルト、陰極時電圧6ボルトの矩形波交番波形を用いて(
特開昭52−77702号公報実施例に記載されている
電源波形)20秒間電解粗薄化を行い、20%硫酸の5
0°C溶液中に浸漬して表面を洗浄した後、水洗した。After that, in a 0.7% nitric acid aqueous solution, using a square wave alternating waveform with an anode voltage of 13 volts and a cathode voltage of 6 volts (
Power supply waveform described in the example of JP-A-52-77702) Electrolytic coarsening was performed for 20 seconds, and 20% sulfuric acid
After cleaning the surface by immersing it in a 0°C solution, it was washed with water.
この表面を下記の様に処理した。This surface was treated as follows.
■ イオン交換水を沸騰させその溶液中に5分間浸漬し
た。(基板■)
■ K OHを用いてpH9に調整した溶液を100°
Cに沸騰させ1分間浸漬した。(基板■)また同時に、
何も処理しない基板■も準備して、これら基板■、■、
■の表面に、175 g/I!の硫酸溶液中(7,5g
/Aのアルミニウムイオンを含む)、30°Cで陽極酸
化皮膜をそれぞれIg/m2.2g/ポ、3g/rd設
けた。■ Ion-exchanged water was boiled and immersed in the solution for 5 minutes. (Substrate ■) ■ A solution adjusted to pH 9 using K OH at 100°
C. and immersed in water for 1 minute. (Substrate ■) At the same time,
I also prepared a substrate ■ that does not undergo any processing, and these substrates ■, ■,
175 g/I on the surface of ■! in a sulfuric acid solution (7.5 g
2.2 g/m and 3 g/rd of Ig/m, respectively, were applied at 30°C.
このようにして作成した基板に下記組成物を乾燥後の塗
布重量か2.5 g / gとなるように塗布して感光
層を設けた。A photosensitive layer was provided on the substrate thus prepared by applying the following composition to a coating weight after drying of 2.5 g/g.
感光性組成物
クレゾールノボラック樹脂 2.00gエチレ
ンジクロライド 16 [?2−メトキシエ
ヂルアセテート 12 gこのようにして作られた
感光性平版印刷版を、真空焼枠中て、透明ポジティブフ
ィルムを通して1mの距離から3kwのメタルハライド
ランプにより、50秒間露光を行なったのち、SiO□
/Na2Oのモル比か1.74の珪酸ナトリウムの5.
26%水溶液(1)H= 12.7 )で現像した。Photosensitive composition Cresol novolac resin 2.00g Ethylene dichloride 16 [? 12 g of 2-methoxyedyl acetate The photosensitive lithographic printing plate thus prepared was exposed in a vacuum printing frame through a transparent positive film for 50 seconds using a 3 kW metal halide lamp from a distance of 1 m. SiO□
/Na2O molar ratio 5. of sodium silicate with a molar ratio of 1.74.
It was developed with a 26% aqueous solution (1) H=12.7).
このように現像した後、非画像部の着色を紫外分光吸収
法を用いて測定した。(着色していない支持体との差を
600nmての光学濃度の差とじて表わした。)またこ
の印刷版を用いて印刷を行った。耐刷枚数を表1に示す
。After developing in this manner, the coloration of the non-image area was measured using ultraviolet spectroscopic absorption method. (The difference with the uncolored support was expressed as the difference in optical density at 600 nm.) Printing was also carried out using this printing plate. Table 1 shows the number of printed sheets.
表1の結果より、本発明法の優れた効果が分かる。The results in Table 1 demonstrate the excellent effects of the method of the present invention.
表 1
〔発明の効果〕
本発明のポジ型感光性平版印刷版は、画像部と支持体の
密着力に優れ、しかも非画像部に着色を生じにくい。Table 1 [Effects of the Invention] The positive photosensitive lithographic printing plate of the present invention has excellent adhesion between the image area and the support, and is less likely to cause coloring in the non-image area.
Claims (1)
た後、硫酸電解液中で陽極酸化して得られた支持体上に
、o−キノンジアジドを含む感光層を設けてなるポジ型
感光性平版印刷版。A positive photosensitive lithographic printing plate comprising a support obtained by forming a hydrated oxide film on a grained aluminum surface and then anodizing it in a sulfuric acid electrolyte, and providing a photosensitive layer containing o-quinonediazide on the support. .
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27479690A JPH04148991A (en) | 1990-10-12 | 1990-10-12 | Positive type photosensitive planographic printing plate |
EP91113603A EP0471351B1 (en) | 1990-08-16 | 1991-08-13 | Method for preparing substrate for lithographic printing plates, substrate for lithographic printing plates prepared by the method and presensitized plate comprising the substrate |
DE69106454T DE69106454T2 (en) | 1990-08-16 | 1991-08-13 | Manufacturing method for a substrate for lithographic printing plates, substrate for lithographic printing plates produced by this method and presensitized plate containing the substrate. |
US07/745,414 US5282952A (en) | 1990-08-16 | 1991-08-15 | Method for preparing substrate for lithographic printing plates, substrate for lithographic printing plates prepared by the method and presensitized plate comprising the substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27479690A JPH04148991A (en) | 1990-10-12 | 1990-10-12 | Positive type photosensitive planographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04148991A true JPH04148991A (en) | 1992-05-21 |
Family
ID=17546688
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27479690A Pending JPH04148991A (en) | 1990-08-16 | 1990-10-12 | Positive type photosensitive planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04148991A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6362795A (en) * | 1986-09-04 | 1988-03-19 | Fuji Photo Film Co Ltd | Production of support for planographic printing plate |
-
1990
- 1990-10-12 JP JP27479690A patent/JPH04148991A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6362795A (en) * | 1986-09-04 | 1988-03-19 | Fuji Photo Film Co Ltd | Production of support for planographic printing plate |
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