JPH04148811A - Position detecting apparatus - Google Patents

Position detecting apparatus

Info

Publication number
JPH04148811A
JPH04148811A JP2272927A JP27292790A JPH04148811A JP H04148811 A JPH04148811 A JP H04148811A JP 2272927 A JP2272927 A JP 2272927A JP 27292790 A JP27292790 A JP 27292790A JP H04148811 A JPH04148811 A JP H04148811A
Authority
JP
Japan
Prior art keywords
cast
luminous flux
mark
diffracted light
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2272927A
Other languages
Japanese (ja)
Inventor
Masakazu Matsugi
Kenji Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2272927A priority Critical patent/JPH04148811A/en
Priority claimed from EP91303846A external-priority patent/EP0455443B1/en
Publication of JPH04148811A publication Critical patent/JPH04148811A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073Alignment marks and their environment
    • G03F9/7076Mark details, e.g. phase grating mark, temporary mark

Abstract

PURPOSE: To make it possible to detect the amount of position deviation in high accuracy by providing two alignment marks on a first object and a second object, and specifying the incident direction of luminous flux for alignment into the first object.
CONSTITUTION: Luminous flux 7 is cast on an alignment mark 3. The diffracted light generated at this time is cast on an alignment mark 5. The center of gravity of the diffracted light from the mark 5 in the incident surface is detected with a detecting part 11 as the incident position of the luminous flux 7. Luminous flux 8 is cast on an alignment mark 4 by the same way. The diffracted light produced at this time is cast on an alignment mark 6. The center of gravity of the diffracted light from the mark 6 at the incident surface is detected with a detecting part 12 as the incident position of the luminous flux 8. At this time, the luminous flux 7 cast on the mark 3 and the luminous flux 8 cast on the mark 4 are cast on a reference plane T from the different directions at the slant angles. The positions with respect to the surfaces of objects 1 and 2 are determined by utilizing the position data from the detecting parts 11 and 12.
COPYRIGHT: (C)1992,JPO&Japio
JP2272927A 1990-10-11 1990-10-11 Position detecting apparatus Pending JPH04148811A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2272927A JPH04148811A (en) 1990-10-11 1990-10-11 Position detecting apparatus

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2272927A JPH04148811A (en) 1990-10-11 1990-10-11 Position detecting apparatus
EP91303846A EP0455443B1 (en) 1990-05-01 1991-04-29 Positional deviation detecting method and apparatus
DE69128164T DE69128164T2 (en) 1990-05-01 1991-04-29 Method and apparatus for the detection of position deviations
US08/242,066 US5481363A (en) 1990-05-01 1994-05-13 Positional deviation detecting method

Publications (1)

Publication Number Publication Date
JPH04148811A true JPH04148811A (en) 1992-05-21

Family

ID=17520698

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2272927A Pending JPH04148811A (en) 1990-10-11 1990-10-11 Position detecting apparatus

Country Status (1)

Country Link
JP (1) JPH04148811A (en)

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