JPH04145060A - Improved process for producing benzene sulfonamide compound - Google Patents
Improved process for producing benzene sulfonamide compoundInfo
- Publication number
- JPH04145060A JPH04145060A JP2268467A JP26846790A JPH04145060A JP H04145060 A JPH04145060 A JP H04145060A JP 2268467 A JP2268467 A JP 2268467A JP 26846790 A JP26846790 A JP 26846790A JP H04145060 A JPH04145060 A JP H04145060A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- compound
- picoline
- reaction
- chloro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 benzene sulfonamide compound Chemical class 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims description 18
- 238000006243 chemical reaction Methods 0.000 claims abstract description 43
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 claims abstract description 14
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- CSKNSYBAZOQPLR-UHFFFAOYSA-N benzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=CC=C1 CSKNSYBAZOQPLR-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 10
- 239000011261 inert gas Substances 0.000 claims abstract description 10
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 5
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 150000001448 anilines Chemical class 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 abstract description 21
- 238000006482 condensation reaction Methods 0.000 abstract description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 12
- 239000002904 solvent Substances 0.000 abstract description 8
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N N-phenyl amine Natural products NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 abstract description 7
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract description 5
- 229910000041 hydrogen chloride Inorganic materials 0.000 abstract description 5
- 239000007789 gas Substances 0.000 abstract description 4
- 239000003905 agrochemical Substances 0.000 abstract description 2
- 150000003840 hydrochlorides Chemical class 0.000 abstract description 2
- 150000007514 bases Chemical class 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 2
- 239000004599 antimicrobial Substances 0.000 abstract 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 28
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 9
- 229940124530 sulfonamide Drugs 0.000 description 8
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical class CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 7
- AOJFQRQNPXYVLM-UHFFFAOYSA-N pyridin-1-ium;chloride Chemical compound [Cl-].C1=CC=[NH+]C=C1 AOJFQRQNPXYVLM-UHFFFAOYSA-N 0.000 description 6
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- LOCWBQIWHWIRGN-UHFFFAOYSA-N 2-chloro-4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1Cl LOCWBQIWHWIRGN-UHFFFAOYSA-N 0.000 description 2
- SSULGNXFUGLULI-UHFFFAOYSA-N 4-chloro-3-(trifluoromethyl)benzenesulfonyl chloride Chemical compound FC(F)(F)C1=CC(S(Cl)(=O)=O)=CC=C1Cl SSULGNXFUGLULI-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- BVHLGVCQOALMSV-JEDNCBNOSA-N L-lysine hydrochloride Chemical compound Cl.NCCCC[C@H](N)C(O)=O BVHLGVCQOALMSV-JEDNCBNOSA-N 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 150000008331 benzenesulfonamides Chemical class 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229960005337 lysine hydrochloride Drugs 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- RBWMYPKAPIYTJQ-VMBFOHBNSA-N (1R,2S,5S)-6,6-dimethyl-N-[(2S)-1-oxo-3-[(3S)-2-oxopyrrolidin-3-yl]propan-2-yl]-3-[2-[4-(trifluoromethoxy)phenoxy]acetyl]-3-azabicyclo[3.1.0]hexane-2-carboxamide Chemical compound CC1([C@@H]2[C@H]1[C@H](N(C2)C(=O)COC3=CC=C(C=C3)OC(F)(F)F)C(=O)N[C@@H](C[C@@H]4CCNC4=O)C=O)C RBWMYPKAPIYTJQ-VMBFOHBNSA-N 0.000 description 1
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 description 1
- XMOROKRPCMAQKT-UHFFFAOYSA-N 2,5-dichloro-n-(2-chloro-4-nitrophenyl)benzenesulfonamide Chemical compound ClC1=CC([N+](=O)[O-])=CC=C1NS(=O)(=O)C1=CC(Cl)=CC=C1Cl XMOROKRPCMAQKT-UHFFFAOYSA-N 0.000 description 1
- NCWSYSKAWNIXRK-UHFFFAOYSA-N 2-chloro-N-[2-chloro-4-(trifluoromethyl)phenyl]benzenesulfonamide Chemical compound ClC1=C(C=CC(=C1)C(F)(F)F)NS(=O)(=O)C1=C(C=CC=C1)Cl NCWSYSKAWNIXRK-UHFFFAOYSA-N 0.000 description 1
- HYOCOKLORFSRQR-UHFFFAOYSA-N 2-chloro-n-(2-chloro-4-nitrophenyl)-5-(trifluoromethyl)benzenesulfonamide Chemical compound ClC1=CC([N+](=O)[O-])=CC=C1NS(=O)(=O)C1=CC(C(F)(F)F)=CC=C1Cl HYOCOKLORFSRQR-UHFFFAOYSA-N 0.000 description 1
- OVOIWWCVZOAOHT-UHFFFAOYSA-N 2-chloro-n-[2-chloro-4-(trifluoromethyl)phenyl]-5-(trifluoromethyl)benzenesulfonamide Chemical compound ClC1=CC(C(F)(F)F)=CC=C1NS(=O)(=O)C1=CC(C(F)(F)F)=CC=C1Cl OVOIWWCVZOAOHT-UHFFFAOYSA-N 0.000 description 1
- CXMVNXYQQWQYJU-UHFFFAOYSA-N 3,4-dichloro-n-[2-chloro-4-(trifluoromethyl)phenyl]benzenesulfonamide Chemical compound ClC1=CC(C(F)(F)F)=CC=C1NS(=O)(=O)C1=CC=C(Cl)C(Cl)=C1 CXMVNXYQQWQYJU-UHFFFAOYSA-N 0.000 description 1
- PFUKZFFEUQXNRF-UHFFFAOYSA-N 3-methylpyridin-1-ium;chloride Chemical compound [Cl-].CC1=CC=C[NH+]=C1 PFUKZFFEUQXNRF-UHFFFAOYSA-N 0.000 description 1
- XJCVRTZCHMZPBD-UHFFFAOYSA-N 3-nitroaniline Chemical compound NC1=CC=CC([N+]([O-])=O)=C1 XJCVRTZCHMZPBD-UHFFFAOYSA-N 0.000 description 1
- QTALZEUGNUVOIZ-UHFFFAOYSA-N 4-chloro-n-[2-chloro-4-(trifluoromethyl)phenyl]-3-(trifluoromethyl)benzenesulfonamide Chemical compound ClC1=CC(C(F)(F)F)=CC=C1NS(=O)(=O)C1=CC=C(Cl)C(C(F)(F)F)=C1 QTALZEUGNUVOIZ-UHFFFAOYSA-N 0.000 description 1
- QQHGBOTVPDXYJQ-UHFFFAOYSA-N 4-chloro-n-[2-chloro-4-(trifluoromethyl)phenyl]benzenesulfonamide Chemical compound ClC1=CC(C(F)(F)F)=CC=C1NS(=O)(=O)C1=CC=C(Cl)C=C1 QQHGBOTVPDXYJQ-UHFFFAOYSA-N 0.000 description 1
- XVMSFILGAMDHEY-UHFFFAOYSA-N 6-(4-aminophenyl)sulfonylpyridin-3-amine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=N1 XVMSFILGAMDHEY-UHFFFAOYSA-N 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003899 bactericide agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000007810 chemical reaction solvent Chemical class 0.000 description 1
- XTHPWXDJESJLNJ-UHFFFAOYSA-N chlorosulfonic acid Substances OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- GNVDAZSPJWCIQZ-UHFFFAOYSA-N flusulfamide Chemical compound ClC1=CC([N+](=O)[O-])=CC=C1NS(=O)(=O)C1=CC=C(Cl)C(C(F)(F)F)=C1 GNVDAZSPJWCIQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000855 fungicidal effect Effects 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- WZJMHIIQSPNXBD-UHFFFAOYSA-N n-(2-chloro-4-nitrophenyl)-2,4-dimethylbenzenesulfonamide Chemical compound CC1=CC(C)=CC=C1S(=O)(=O)NC1=CC=C([N+]([O-])=O)C=C1Cl WZJMHIIQSPNXBD-UHFFFAOYSA-N 0.000 description 1
- YXCHUJNDWUXLKF-UHFFFAOYSA-N n-(2-chloro-4-nitrophenyl)-3-(trifluoromethyl)benzenesulfonamide Chemical compound ClC1=CC([N+](=O)[O-])=CC=C1NS(=O)(=O)C1=CC=CC(C(F)(F)F)=C1 YXCHUJNDWUXLKF-UHFFFAOYSA-N 0.000 description 1
- PCQZDTRKWNZEFC-UHFFFAOYSA-N n-(2-chloro-4-nitrophenyl)-4-methylbenzenesulfonamide Chemical compound C1=CC(C)=CC=C1S(=O)(=O)NC1=CC=C([N+]([O-])=O)C=C1Cl PCQZDTRKWNZEFC-UHFFFAOYSA-N 0.000 description 1
- PZBATUNEVLSDIG-UHFFFAOYSA-N n-(2-chloro-4-nitrophenyl)benzenesulfonamide Chemical compound ClC1=CC([N+](=O)[O-])=CC=C1NS(=O)(=O)C1=CC=CC=C1 PZBATUNEVLSDIG-UHFFFAOYSA-N 0.000 description 1
- YGCZILBZSKPBHM-UHFFFAOYSA-N n-[2-chloro-4-(trifluoromethyl)phenyl]-3-(trifluoromethyl)benzenesulfonamide Chemical compound FC(F)(F)C1=CC=CC(S(=O)(=O)NC=2C(=CC(=CC=2)C(F)(F)F)Cl)=C1 YGCZILBZSKPBHM-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野〕
本発明は式(III)
1?″
〔式中、R1及びR″は水素原子、塩素原子又はメチル
基であり、R2は水素原子、塩素原子又はトリフルオロ
メチル基であり、またR4はニトロ基、又はトリフルオ
ロメチル基である。〕で表されるベンゼンスルホンアミ
ド化合物の改良された製造法に関する。Detailed Description of the Invention (Industrial Field of Application) The present invention relates to the formula (III) or a trifluoromethyl group, and R4 is a nitro group or a trifluoromethyl group.
式(I[l)のベンゼンスルホンアミド化合物は農薬分
野において殺菌剤として有用な化合物である。The benzenesulfonamide compound of formula (I[l) is a compound useful as a fungicide in the agrochemical field.
〔従来の技jネi及び発明が解決しようとする課題〕従
来よりスルホンアミド化合物の成る種のものは殺菌効果
があることが知られている。[Prior Art and Problems to be Solved by the Invention] It has been known that sulfonamide compounds have a bactericidal effect.
例えば特開昭58−219159号公報には下式〔式中
、X及びYはそれぞれ水素原子又はメチル基を示し、Z
はメチル基、ハロゲン原子又はニトロ基を示し、nは1
〜3の整数である。〕で表される3−ニトロヘンゼンス
ルホンアミド系の化合物が殺菌剤として開示されている
。For example, JP-A-58-219159 describes the following formula [wherein X and Y each represent a hydrogen atom or a methyl group, and Z
represents a methyl group, a halogen atom, or a nitro group, and n is 1
It is an integer of ~3. A 3-nitrohenzenesulfonamide-based compound represented by the following is disclosed as a bactericidal agent.
また特開昭61−200959.61−200960.
61−205247.61−205248.61−23
3660.61−271270号公報等によれば、式(
I[I)のスルホンアミド系化合物は前記特開昭58−
219159号記載の化合物よりも卓越した殺菌効果を
示し、工業的に価値の高い化合物であるとされている。Also, JP-A-61-200959.61-200960.
61-205247.61-205248.61-23
According to Publication No. 3660.61-271270, etc., the formula (
The sulfonamide compound of I[I] is disclosed in the above-mentioned JP-A-58-
It is said to have a more excellent bactericidal effect than the compound described in No. 219159, and is a compound of high industrial value.
ベンゼンスルホンアミド化合物の製造法としては、−船
釣には相当するベンゼンスルホニルクロリド類とアニリ
ン類とを等モルないしはそれ以上のピリジン存在下に縮
合させる方法にて製造される。事実特開昭58−219
159号公報では3−ニトロ−4−メチル−N−(2−
クロル−5−ニトロフェニル)ヘンゼンスルホンアミド
を製造する方法として、トルエン溶媒中で2−クロル−
5−ニトロアニリンと等モルの3−ニトロ−4−メチル
ヘンゼンスルホニルクロリドとを等モル量のピリジンの
存在下に還流下に縮合させている。しかしながら該方法
ではピリジンのような比較的高価な塩基を反応基質に対
しで等モル量もの多量使用しているにも拘らず、目的生
成物の収率はたかだか50%強程度にすぎない。The benzenesulfonamide compound is produced by condensing benzenesulfonyl chlorides and anilines, which are equivalent to those used in boat fishing, in the presence of equimolar or more pyridine. In fact, Japanese Patent Publication No. 58-219
159, 3-nitro-4-methyl-N-(2-
As a method for producing chloro-5-nitrophenyl)henzenesulfonamide, 2-chloro-5-nitrophenyl)
5-nitroaniline and an equimolar amount of 3-nitro-4-methylhenzenesulfonyl chloride are condensed under reflux in the presence of an equimolar amount of pyridine. However, in this method, although a relatively expensive base such as pyridine is used in equimolar amounts relative to the reaction substrate, the yield of the desired product is only about 50% or more.
一方、式(II)のスルホンアミド化合物の製造法に関
しては特開昭61−205247号公報に下式(TV)
「
〔式中、R’、R”は水素原子又は塩素原子を示す。〕
〕開開昭61−200960公報に下式(V)〔式中、
p、21rb及びR7は水素原子、塩素原子又はメチル
基を示す。〕のスルホンアミド化合物の製造法が開示さ
れているが、それによれば相当するベンゼンスルホニル
クロリド類とアニリン類とをオルソジクロロベンゼン中
ピリジン存在下に180°C付近の温度で縮合させる方
法にて製造しているが、その収率は40〜50%程度に
すぎない。On the other hand, regarding the method for producing the sulfonamide compound of formula (II), the following formula (TV) is described in JP-A-61-205247:
"[In the formula, R' and R" represent a hydrogen atom or a chlorine atom. ]
] The following formula (V) [in the formula,
p, 21rb and R7 represent a hydrogen atom, a chlorine atom or a methyl group. ] has been disclosed, and according to this method, the corresponding benzenesulfonyl chlorides and anilines are condensed in orthodichlorobenzene in the presence of pyridine at a temperature of around 180°C. However, the yield is only about 40-50%.
このように例えば式(I[I)のスルホンアミド化合物
の製造において収率が低い原因として考えられることは
、
1)P−ニトロアニリン及び置換P−ニトロアニリン類
はニトロ基の強い電子吸引性の為にアミノ基の塩基性が
低下しており、その為反応性が著しく低くなっている。Thus, for example, the reasons for the low yield in the production of the sulfonamide compound of formula (I Therefore, the basicity of the amino group has decreased, and the reactivity has therefore decreased significantly.
2)〇−位に塩素原子を有する0−クロル−P−ニトロ
アニリンはその反応性がさらに低下しているばかりでな
り、〇−位の塩素原子により立体障害の影響が生しる可
能性がある。2) The reactivity of 0-chloro-P-nitroaniline, which has a chlorine atom at the 〇-position, is only further reduced, and the chlorine atom at the 〇-position may cause steric hindrance. be.
3)アニリン側の反応性の低下により、縮合条件がその
分苛酷となり、原料等の分解等副反応を誘起し易くなる
。3) Due to the decrease in reactivity on the aniline side, the condensation conditions become harsher, making it easier to induce side reactions such as decomposition of raw materials.
4)反応系中に水分が存在するとベンゼンスルホニルク
ロリド類の加水分解反応が誘起される。4) The presence of water in the reaction system induces a hydrolysis reaction of benzenesulfonyl chlorides.
などである。etc.
このように反応性の低下しているアニリン類とベンゼン
スルホニルクロリド類の縮合反応収率を改良する方法と
して、本発明者らは先に有機塩基性触媒の存在下に窒素
等の不活性ガスを反応系中に吹き込みなから縮合反応を
実施する方法を提案した(特開昭63−57565号)
。As a method to improve the condensation reaction yield of anilines and benzenesulfonyl chlorides, which have decreased reactivity, the present inventors first introduced an inert gas such as nitrogen in the presence of an organic basic catalyst. He proposed a method of carrying out the condensation reaction by blowing into the reaction system (Japanese Patent Application Laid-open No. 57565/1983).
.
この方法により式(I[l)の化合物の収率は飛躍的に
向上させることができた。例えば、4−クロロ3−トリ
フルオロメチルベンゼンスルホニルクロリドと2−クロ
ロ−4−ニトロアニリンの縮合において、0−ジクロロ
ベンゼン中有機塩基性触媒の存在下に窒素ガスを系中に
吹き込みながら反応を行うことで目的の4−クロロ−3
−トリフルオロメチル−(2−クロロ−4−ニトロフェ
ニル)ヘンゼンスルホンアミドが80%以上の収率で製
造できる。By this method, the yield of the compound of formula (I[l) could be dramatically improved. For example, in the condensation of 4-chloro3-trifluoromethylbenzenesulfonyl chloride and 2-chloro-4-nitroaniline, the reaction is carried out in 0-dichlorobenzene in the presence of an organic basic catalyst while blowing nitrogen gas into the system. Therefore, the desired 4-chloro-3
-Trifluoromethyl-(2-chloro-4-nitrophenyl)henzenesulfonamide can be produced with a yield of 80% or more.
ところで前記改良法においては有機塩基性触媒として、
ピリジンが最も好ましい塩基として考えられていた。事
実当該出願特許にもそのような記述がなされている。確
かにピリジンは好ましい塩基であることに変わりはない
。しかしながら、その後この縮合反応を更に詳細に検討
の結果、ピリジンを塩基として用いた場合には、当該方
法を工業化する上で成る一つの問題を生しることがわか
った。即ち、ピリジンを塩基として使用した場合、反応
の進行に伴って生成するピリジン塩酸塩の結晶が反応機
の上部さらにはコンデンサ一部に付着し、その量は反応
の進行に伴って徐々に増加する。By the way, in the improved method, as an organic basic catalyst,
Pyridine was considered the most preferred base. In fact, the patent application in question also contains such a statement. Certainly, pyridine remains a preferred base. However, as a result of further detailed study of this condensation reaction, it was found that the use of pyridine as a base poses a problem in industrializing the method. That is, when pyridine is used as a base, crystals of pyridine hydrochloride are formed as the reaction progresses and adhere to the upper part of the reactor and even to a part of the condenser, and the amount gradually increases as the reaction progresses. .
そしてこの塩酸塩は還流する溶媒では簡単には溶解せず
、それ故スケールが大きくなった場合には時にコンデン
サーの閉塞等のトラブルを生しる可能性があり、工業化
に際しては問題点の一つになる。さらには反応系中の触
媒としてのピリジンの絶対量が減少し、反応速度の低下
にもなる。This hydrochloride is not easily dissolved in refluxing solvents, and therefore, if the scale becomes large, it may sometimes cause problems such as condenser clogging, which is one of the problems in industrialization. become. Furthermore, the absolute amount of pyridine as a catalyst in the reaction system decreases, resulting in a decrease in the reaction rate.
このピリジン塩酸塩のコンデンサー等への付着のメカニ
ズムを考えてみると、一つには反応系中にて生成したピ
リジン塩酸塩が窒素等の不活性ガスの流れによって昇華
的に気相部に飛散して温度の低い所で固化すること、ま
た一つには反応温度が通常はピリジンの沸点よりも高い
為に気相中のピリジン濃度は比較的高く、系中より上が
ってきた塩酸ガスとピリジンとが気相部にて反応してと
リジン塩酸塩を形成して固着することのいずれかと考え
られる。Considering the mechanism by which pyridine hydrochloride adheres to condensers, etc., one is that pyridine hydrochloride generated in the reaction system is sublimated and dispersed into the gas phase by the flow of inert gas such as nitrogen. Because the reaction temperature is usually higher than the boiling point of pyridine, the concentration of pyridine in the gas phase is relatively high, and the hydrochloric acid gas and pyridine that have risen from the system It is thought that the lysine hydrochloride reacts with the lysine hydrochloride in the gas phase and becomes fixed.
本発明者らは、前記したようなピリジン触媒下での縮合
反応における反応操作上の問題点に鑑み、縮合反応の収
率を低下させることなく、且つ塩酸塩の固着によるトラ
ブルを生しせしめない塩基性触媒について鋭意検討した
。In view of the problems in reaction operation in the condensation reaction under a pyridine catalyst as described above, the present inventors have devised a method that does not reduce the yield of the condensation reaction and does not cause troubles due to the fixation of hydrochloride. We conducted extensive research on basic catalysts.
その結果、β−ピコリンまたはT−ピコリンを塩基とし
て用いた場合には縮合反応中、塩酸塩のコンデンサ一部
への付着は全く認められず、しかも反応自体さらに円滑
に進行することを見出した。As a result, it was found that when β-picoline or T-picoline was used as a base, no hydrochloride was observed to adhere to a portion of the capacitor during the condensation reaction, and the reaction itself proceeded more smoothly.
また、ピコリン類の中でもα−ピコリンを塩基として使
用した場合にはピリジンと同様に塩酸塩の固結現象が認
められた。このような知見は従来全く知られてなく、こ
れらの知見をさらに展開させることにより本発明を完成
するに至った。Furthermore, among the picolines, when α-picoline was used as a base, the caking phenomenon of hydrochloride was observed as in the case of pyridine. Such findings were completely unknown in the past, and the present invention was completed by further developing these findings.
即ち、本発明は式(I)
〔式中、R’及びR3は水素原子、塩素原子又はメチル
基を示し、R2は水素原子、塩素原子又はトリフルオロ
メチル基を示す.〕で表されるベンゼンスルホニルクロ
リド類と、式(It)
I
〔式中、R4はニトロ基、シアノ基又はトリフルオロメ
チル基を示す。〕で表されるアニリン類とを塩基性物質
の存在下に縮合させて、式(nT)K+
〔式中、R1、R2、R3及びR4はそれぞれ式(I)
及び(If)のそれと同じ〕で表されるベンゼンスルホ
ンアミド化合物を製造する方法において、塩基性物質と
してβ−ピコリンまたはγーピコリンを使用することを
特徴とする式(I[I)のベンゼンスルホンアミド化合
物の改良された製造法である。That is, the present invention provides compounds of formula (I) [wherein R' and R3 represent a hydrogen atom, a chlorine atom, or a methyl group, and R2 represents a hydrogen atom, a chlorine atom, or a trifluoromethyl group]. benzenesulfonyl chlorides represented by the formula (It) I [wherein R4 represents a nitro group, a cyano group or a trifluoromethyl group]; [In the formula, R1, R2, R3 and R4 are each represented by the formula (I)
and (same as that of (If))], wherein the benzenesulfonamide compound of formula (I) is characterized in that β-picoline or γ-picoline is used as the basic substance. An improved method for producing compounds.
以下に本発明の方法を詳述する。The method of the present invention will be explained in detail below.
式(I)のベンゼンスルホニルクロリド類と式(I[)
のアニリン類との縮合反応において、これらの使用割合
は式(I)化合物1モルに対して、式(II)化合物を
0.5〜2モル、好ましくはO17〜1.3モル用いる
。使用割合がこの範囲をはずれた場合は、副生物の増加
を生じ易くなるばかりでなく、工業的には原料原単位上
も不利となる。Benzenesulfonyl chlorides of formula (I) and formula (I[)
In the condensation reaction with anilines, the proportion of these compounds used is 0.5 to 2 mol, preferably 17 to 1.3 mol, of the compound of formula (II) per 1 mol of the compound of formula (I). If the usage ratio is outside this range, not only will by-products be likely to increase, but it will also be industrially disadvantageous in terms of raw material consumption.
本発明の方法においては式(+)化合物と式(■)化合
物の縮合反応は、通常有111f@媒中で実施される。In the method of the present invention, the condensation reaction of the formula (+) compound and the formula (■) compound is usually carried out in a 111f@ medium.
使用される有機溶媒は反応に不活性なものであれば特に
制限はないが、反応後の目的生成物の単離方法の簡便化
等を考慮して、通常はトルエン、キシレン、モノクロル
ベンゼンまたはO−ジクロルベンゼンなどの芳香族炭化
水素またはハロゲン化炭化水素系溶媒が使用される。勿
論該縮合反応は全く溶媒を使用しなくても殆ど遜色なく
進行するが、この場合反応の基質によっては基質濃度が
著しく高くなる為に分解等の副反応を誘起し易くなり、
その為収率ならびに品質の低下を招くこともあり、また
縮合マスの取扱い上の問題などから工業的には前記有機
溶媒を用いた方が望ましい。溶媒の使用量としては式(
I)化合物11i量部に対して0.4重量部以上が良い
。使用量の上限については特に制限はないが、あまり過
剰に使用することは基質濃度を下げ反応速度を低下させ
ることになるだけでなく、容積効率の点でも工業的には
不利になると言わざるを得ない。それ故通常は式(I)
化合物1重量部に対して5重量部以下、より好ましくは
2重量部以下で使用される。The organic solvent used is not particularly limited as long as it is inert to the reaction, but in order to simplify the method of isolating the desired product after the reaction, toluene, xylene, monochlorobenzene, or O2 is usually used. - Aromatic hydrocarbon or halogenated hydrocarbon solvents such as dichlorobenzene are used. Of course, the condensation reaction proceeds without using any solvent at all, but in this case, depending on the substrate for the reaction, the substrate concentration becomes extremely high, making it easy to induce side reactions such as decomposition.
This may lead to a decrease in yield and quality, and due to problems in handling the condensation mass, it is preferable to use the above-mentioned organic solvents from an industrial perspective. The amount of solvent used is calculated using the formula (
I) The amount is preferably 0.4 parts by weight or more based on the amount of compound 11i. There is no particular restriction on the upper limit of the amount used, but it must be said that using too much will not only lower the substrate concentration and reduce the reaction rate, but will also be industrially disadvantageous in terms of volumetric efficiency. I don't get it. Therefore, usually formula (I)
It is used in an amount of 5 parts by weight or less, more preferably 2 parts by weight or less, per 1 part by weight of the compound.
本発明においては塩基性触媒の存在下に縮合反応が実施
されるが、この塩基性触媒としてβ−ピコリンまたはT
−ピコリンを使用することに特徴を有するものであり、
これにより反応時の塩基性物質の塩酸塩固着によるトラ
ブルの防止さらには反応の円滑な進行を促進し、収率お
よび品質の向上につなげられるものである。In the present invention, the condensation reaction is carried out in the presence of a basic catalyst, and the basic catalyst may be β-picoline or T
- It is characterized by the use of picoline,
This prevents troubles caused by fixation of the hydrochloride of the basic substance during the reaction, and also promotes the smooth progress of the reaction, leading to improved yield and quality.
本発明に使用されるβ−ピコリンまたはγ−ピコリンは
通常はそれぞれ単独で使用されるが、両者を併用するこ
とも可能である。β−ピコリンまたはT−ピコリンの使
用量は少なすぎると塩基としての効果が小さく反応の円
滑な進行が抑制され、またあまり過剰に使用するのは実
質的には意味がない、それ飲代(I)化合物に対して0
.01〜1.0モル比、好ましくは0.1〜0.5モル
比の範囲で使用される。β-picoline or γ-picoline used in the present invention is usually used alone, but it is also possible to use both in combination. If the amount of β-picoline or T-picoline used is too small, its effect as a base will be small and the smooth progress of the reaction will be inhibited, and if it is used in excess, it is practically meaningless. )0 for the compound
.. It is used in a molar ratio of 0.01 to 1.0, preferably 0.1 to 0.5.
本発明の縮合反応は、反応基質の式(I)、弐(II)
化合物及び塩基触媒や、必要あらば溶媒を反応容器に仕
込み、130〜200℃、好ましくは140〜180℃
に加熱維持し、同温度で好ましくは3〜15時間攪拌し
ながら行う、その際発生する塩化水素を反応系外に強制
的に除去する必要があり、そのために本発明においては
不活性ガスを反応液中に吹き込みながら行う。In the condensation reaction of the present invention, reaction substrates of formulas (I) and (II)
A compound, a base catalyst, and a solvent if necessary are charged into a reaction vessel, and heated to 130 to 200°C, preferably 140 to 180°C.
It is necessary to forcibly remove the hydrogen chloride generated at this time from the reaction system, and for this purpose, in the present invention, an inert gas is added to the reaction system. Do this by blowing into the liquid.
この不活性ガスの反応系への導入により、反応で生成し
た塩化水素を速やかに系外に除去することができ、反応
の円滑な進行を促進して、結果として高収率で目的のス
ルホンアミド化合物を製造することができる0反応で生
成した塩化水素は塩基としてのβ−ピコリンまたはT−
ピコリンと塩を形成すると考えられるが、この塩は比較
的高い温度条件下では容易に分解されて、しかも塩化水
素のみ不活性ガスに随伴されて反応系外に除去されるも
のと考えられる。不活性ガスとしては空気、窒素、炭酸
ガス、ヘリウムまたはアルゴンなどの一般的な不活性ガ
スを挙げることができるが、通常は窒素ガスが多用され
る。不活性ガスの吹き込み量は反応のスケール等により
一義的に決めることは出来ないが、塩基としてのβ−ピ
コリンまたはγ−ピコリン、或いは溶媒の顕著な同伴に
伴うロスを防止できる範囲で設定すればよい。By introducing this inert gas into the reaction system, the hydrogen chloride produced in the reaction can be quickly removed from the system, promoting the smooth progress of the reaction and resulting in the desired sulfonamide in high yield. The hydrogen chloride produced in the reaction that can produce the compound is β-picoline or T-picoline as a base.
It is thought that a salt is formed with picoline, but this salt is easily decomposed under relatively high temperature conditions, and only hydrogen chloride is thought to be accompanied by an inert gas and removed from the reaction system. Examples of the inert gas include common inert gases such as air, nitrogen, carbon dioxide, helium, and argon, but nitrogen gas is usually used frequently. The amount of inert gas blown cannot be determined uniquely depending on the scale of the reaction, etc., but if it is set within a range that can prevent loss due to significant entrainment of β-picoline or γ-picoline as a base, or solvent. good.
反応後、反応混合物から目的の式(I[l)のスルホン
アミド化合物の単動は種々の方法があるが、−例を示せ
ば以下の通りである。After the reaction, the desired sulfonamide compound of formula (I[l)] can be isolated from the reaction mixture using various methods, examples of which are as follows.
反応液に必要ならば適当量の縮合反応に使用したものと
同種の溶媒及び温水を装入し、室温まで冷却した後、析
出した結晶を濾取して目的生成物のベンゼンスルホンア
ミド類を得、これを必要ならばカラムクロマトグラフィ
ーもしくは再結晶に付す。If necessary, the reaction solution is charged with an appropriate amount of the same type of solvent and hot water as used in the condensation reaction, and after cooling to room temperature, the precipitated crystals are collected by filtration to obtain the desired benzenesulfonamides. , this is subjected to column chromatography or recrystallization if necessary.
本発明方法により製造できる式(Ill)化合物として
は以下のベンゼンスルホンアミド類が挙げられる。Examples of the compound of formula (Ill) that can be produced by the method of the present invention include the following benzenesulfonamides.
210ローN−(2−クロロ−4−ニトロフェニル)ベ
ンゼンスルホンアミド、3−クロロ−N−(2−クロロ
−4ニトロフエニル)ベンゼンスルホンアミド、4−ク
ロロ−N−(2−クロロ−4−ニトロフェニル)ベンゼ
ンスルホンアミド、2.5−ジクロロ−N−(2−クロ
ロ−4−ニトロフェニル)ベンゼンスルホンアミド、3
.4−シクロローN−(2−クロロ−4−ニトロフェニ
ル)ベンゼンスルホンアミド、2,4.5− )シクロ
ローN−(2−クロロ4−ニトロフェニル)ベンゼンス
ルホンアミド、2クロロ−4−メチル−N−(2−クロ
ロ−4−ニトロフェニル)ベンゼンスルホンアミド、3
−クロロ−4−メチル−N(211:lロー4−ニトロ
フェニル)ベンゼンスルホンアミド、2−メチル−5−
クロロ−N−(2−クロロ−4−ニトロフェニル)ベン
ゼンスルホンアミド、4−メチルN−(2−クロロ−4
−ニトロフェニル)ベンゼンスルホンアミド、2,4−
ジメチル−N−(2−クロロ−4−ニトロフェニル)ベ
ンゼンスルホンアミド、3− トリフルオロメチル−N
−(2−クロロ−4−ニトロフェニル)ベンゼンスルホ
ンアミド、3−トリフルオロメチル−4−クロロ−N−
(2−クロロ−4−ニトロフェニル)ベンゼンスルホン
アミド、2−クロロ−5−トリフルオロメチル−N−(
2−クロロ−4−ニトロフェニル)ベンゼンスルホンア
ミド、2.4−ジクロロ−5−トリフルオロメチルN−
(2−クロロ−4−ニトロフェニル)ベンゼンスルホン
アミド、2−クロロ−N−(2−クロロ−4−トリフル
オロメチルフェニル)ベンゼンスルホンアミド、3クロ
ロ−N−(2−クロロ−4−トリフルオロメチルフェニ
ル)ベンゼンスルホンアミド、4−クロロ−N−(2ク
ロロ−4−トリフルオロメチルフェニル)ベンゼンスル
ホンアミド、2,5−ジクロロ−N−(2−クロロ−4
トリフルオロメチルフエニル)ベンゼンスルホンアミド
、3.4−ジクロロ−N−(2−クロロ−4−トリフル
オロメチルフェニル)ベンゼンスルホンアミド、3−ク
ロロ−4−メチル−N−(2−クロロ−4−トリフルオ
ロメチルフェニル)ベンゼンスルホンアミド、2−メチ
ル−5−クロロ−N−(2−クロロ−4−トリフルオロ
メチルフェニル)ベンゼンスルホンアミド、3−トリフ
ルオロメチル−N−(2−クロロ−4−トリフルオロメ
チルフェニル)ベンゼンスルホンアミド、3−トリフル
オロメチル−4−クロロ−N−(2−クロロ−4−トリ
フルオロメチルフェニル)ベンゼンスルホンアミド、2
−クロロ−5−トリフルオロメチル−N−(2−クロロ
−4トリフルオロメチルフエニル)ベンゼンスルホンア
ミド、2.4−ジクロロ−5−トリフルオロメチル−N
(2−クロロ−4−トリフルオロメチルフェニル)ベン
ゼンスルホンアミドなどである。210 rho N-(2-chloro-4-nitrophenyl)benzenesulfonamide, 3-chloro-N-(2-chloro-4-nitrophenyl)benzenesulfonamide, 4-chloro-N-(2-chloro-4-nitrophenyl) phenyl)benzenesulfonamide, 2,5-dichloro-N-(2-chloro-4-nitrophenyl)benzenesulfonamide, 3
.. 4-cycloN-(2-chloro-4-nitrophenyl)benzenesulfonamide, 2,4.5-)cycloN-(2-chloro4-nitrophenyl)benzenesulfonamide, 2chloro-4-methyl-N -(2-chloro-4-nitrophenyl)benzenesulfonamide, 3
-chloro-4-methyl-N(211:l rho-4-nitrophenyl)benzenesulfonamide, 2-methyl-5-
Chloro-N-(2-chloro-4-nitrophenyl)benzenesulfonamide, 4-methylN-(2-chloro-4
-nitrophenyl)benzenesulfonamide, 2,4-
Dimethyl-N-(2-chloro-4-nitrophenyl)benzenesulfonamide, 3-trifluoromethyl-N
-(2-chloro-4-nitrophenyl)benzenesulfonamide, 3-trifluoromethyl-4-chloro-N-
(2-chloro-4-nitrophenyl)benzenesulfonamide, 2-chloro-5-trifluoromethyl-N-(
2-chloro-4-nitrophenyl)benzenesulfonamide, 2,4-dichloro-5-trifluoromethyl N-
(2-chloro-4-nitrophenyl)benzenesulfonamide, 2-chloro-N-(2-chloro-4-trifluoromethylphenyl)benzenesulfonamide, 3chloro-N-(2-chloro-4-trifluoro methylphenyl)benzenesulfonamide, 4-chloro-N-(2chloro-4-trifluoromethylphenyl)benzenesulfonamide, 2,5-dichloro-N-(2-chloro-4
trifluoromethylphenyl)benzenesulfonamide, 3,4-dichloro-N-(2-chloro-4-trifluoromethylphenyl)benzenesulfonamide, 3-chloro-4-methyl-N-(2-chloro-4 -trifluoromethylphenyl)benzenesulfonamide, 2-methyl-5-chloro-N-(2-chloro-4-trifluoromethylphenyl)benzenesulfonamide, 3-trifluoromethyl-N-(2-chloro-4 -trifluoromethylphenyl)benzenesulfonamide, 3-trifluoromethyl-4-chloro-N-(2-chloro-4-trifluoromethylphenyl)benzenesulfonamide, 2
-Chloro-5-trifluoromethyl-N-(2-chloro-4-trifluoromethylphenyl)benzenesulfonamide, 2,4-dichloro-5-trifluoromethyl-N
(2-chloro-4-trifluoromethylphenyl)benzenesulfonamide and the like.
また本発明で用いる式日)化合物のベンゼンスルホニル
クロリド類、例えば3−トリフロロメチル−4−クロロ
ベンゼンスルホニルクロリドは、のようにO−クロロヘ
ンシトリフロリドにクロルスルホン酸を反応させて得る
ことができ、また式(■)化合物の2−クロロアニリン
類は染料中間体として公知の化合物であり容易に人手で
きる。Furthermore, the benzenesulfonyl chlorides of the compounds used in the present invention, such as 3-trifluoromethyl-4-chlorobenzenesulfonyl chloride, can be obtained by reacting O-chlorobenzene trifluoride with chlorosulfonic acid as follows. The 2-chloroaniline compound of formula (■) is a compound known as a dye intermediate and can be easily produced manually.
本発明の方法によれば縮合反応中に使用した塩基の塩酸
塩がコンデンサー等に固着してラインを閉塞させるトラ
ブルを生じる可能性は全くなく、しかも反応が円滑に進
行する為、高収率でスルホンアミド化合物を製造するこ
とができるので、工業的にも極めて価値の高い製造法で
ある。According to the method of the present invention, there is no possibility that the hydrochloride of the base used during the condensation reaction will stick to the condenser etc. and cause problems such as clogging the line, and the reaction proceeds smoothly, resulting in high yield. Since it is possible to produce sulfonamide compounds, it is an extremely valuable production method from an industrial perspective.
以下、実施例により本発明の詳細な説明する。 Hereinafter, the present invention will be explained in detail with reference to Examples.
実施例1
5001d四ツロフラスコに4−クロロ−3−トリフル
オロメチルヘンゼンスルホニルクロリド69.8 g
(0,25モル)、2−クロロ−4−ニトロアニリン4
3.6 g (0,253モル)、β−ピコリン4.6
5 g (0,05モル)及びキシレン25gを装入し
、油浴上にて160°Cに昇温し、同温度で10時間反
応させた。この間反応液中に窒素ガスを15I11/分
の流速で流した。反応中、反応フラスコ上部ならびにコ
ンデンサ一部にはβ−ピコリン塩酸塩の固結は一切観察
されず、円滑に反応が進行した。Example 1 69.8 g of 4-chloro-3-trifluoromethylhenzensulfonyl chloride in a 5001d four-way flask
(0.25 mol), 2-chloro-4-nitroaniline 4
3.6 g (0,253 mol), β-picoline 4.6
5 g (0.05 mol) and 25 g of xylene were charged, heated to 160°C on an oil bath, and reacted at the same temperature for 10 hours. During this time, nitrogen gas was flowed into the reaction solution at a flow rate of 15I11/min. During the reaction, no solidification of β-picoline hydrochloride was observed in the upper part of the reaction flask or in a part of the condenser, and the reaction proceeded smoothly.
反応後、反応液中に25gのキシレンを装入し、100
℃まで冷却後、100gの温水を添加し攪拌下、徐々に
冷却しながら晶析させた。室温まで冷却したのち析出し
ている結晶を吸引濾過し、水洗ののち50M1のメタノ
ールで洗浄後乾燥することにより、淡黄色の4−クロロ
−3−トリフルオロメチル−N−(2クロロ−4−ニト
ロフェニル)ベンゼンスルホンアミド93.1gを得た
。After the reaction, 25 g of xylene was charged into the reaction solution, and 100 g of xylene was added to the reaction solution.
After cooling to ℃, 100 g of warm water was added and crystallization was carried out while stirring and gradually cooling. After cooling to room temperature, the precipitated crystals were suction filtered, washed with water, washed with 50M1 methanol, and dried to give pale yellow 4-chloro-3-trifluoromethyl-N-(2chloro-4- 93.1 g of (nitrophenyl)benzenesulfonamide was obtained.
収率: 88.7%(対4−クロロ−3−トリフルオロ
メチルヘンゼンスルホニルクロリド)
尚、このものは高速液体クロマトグラフィーにて分析の
結果、純度99.2%であった。Yield: 88.7% (vs. 4-chloro-3-trifluoromethylhenzenesulfonyl chloride) The purity of this product was 99.2% as a result of analysis by high performance liquid chromatography.
実施例2及び比較例1.2
実施例1においてβ−ピコリンの代わりに7−ピコリン
、ピリジンまたはα−ピコリンを用いる他は実施例1と
同様に行った。結果を表−1に示す。Example 2 and Comparative Example 1.2 The same procedure as in Example 1 was carried out except that 7-picoline, pyridine or α-picoline was used instead of β-picoline. The results are shown in Table-1.
(以下余白)
表−1
実施例3〜6
ベンゼンスルホニルクロリド、置換アニリン及び反応溶
媒を種々変えてβ−ピコリンまたはT−ピコリン存在下
に縮合反応を行った結果を表−2に示す。(Left blank space below) Table 1 Examples 3 to 6 Table 2 shows the results of condensation reactions performed in the presence of β-picoline or T-picoline with various benzenesulfonyl chloride, substituted anilines, and reaction solvents.
尚、反応中は系中に窒素ガスを10〜20d/分の速度
で吹き込んだ。また・反応後生酸したスルホンアミド化
合物の単離は実施例1に準じて行った。During the reaction, nitrogen gas was blown into the system at a rate of 10 to 20 d/min. Also, the isolation of the sulfonamide compound which was produced after the reaction was carried out according to Example 1.
(以下余白)(Margin below)
Claims (1)
チル基を示し、R^2は水素原子、塩素原子又はトリフ
ルオロメチル基を示す。〕で表されるベンゼンスルホニ
ルクロリド類と、式(II) ▲数式、化学式、表等があります▼(II) (式中、R^4はニトロ基、又はトリフルオロメチル基
を示す。〕で表されるアニリン類とを塩基性物質の存在
下に縮合させて、 式(III) ▲数式、化学式、表等があります▼(III) (式中、R^1、R^2、R^3及びR^4はそれぞれ
式( I )及び式(II)のそれと同じ〕で表されるベン
ゼンスルホンアミド化合物を製造する方法において、塩
基性物質としてβ−ピコリンまたはγ−ピコリンを使用
することを特徴とする式(III)のベンゼンスルホンア
ミド化合物の改良された製造法。 2、β−ピコリンまたはγ−ピコリンの使用量が式(I
I)のアニリン類に対して0.01〜1.0モル比の範
囲である請求項1記載の方法。 3、反応を不活性ガス気流下に行う請求項1記載の方法
。[Claims] 1. Formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) [In the formula, R^1 and R^3 represent a hydrogen atom, a chlorine atom, or a methyl group, and R^ 2 represents a hydrogen atom, a chlorine atom, or a trifluoromethyl group. ] and the benzenesulfonyl chloride represented by the formula (II) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(II) (In the formula, R^4 represents a nitro group or a trifluoromethyl group.) Formula (III) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(III) (In the formula, R^1, R^2, R^3 and A method for producing a benzenesulfonamide compound represented by formula (I) and formula (II), respectively, in which R^4 is the same as that of formula (I) and formula (II), characterized in that β-picoline or γ-picoline is used as the basic substance. An improved method for producing a benzenesulfonamide compound of formula (III). 2. The amount of β-picoline or γ-picoline to be used is
The method according to claim 1, wherein the molar ratio to the anilines in I) ranges from 0.01 to 1.0. 3. The method according to claim 1, wherein the reaction is carried out under an inert gas stream.
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Cited By (1)
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CN102491924A (en) * | 2011-12-14 | 2012-06-13 | 天津市筠凯化工科技有限公司 | Preparation method for N-(2- chlorine-4-phenyl)-4- chlorine-3-trifluoromethyl benzene sulfonamide |
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Publication number | Priority date | Publication date | Assignee | Title |
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JPS6357565A (en) * | 1986-08-27 | 1988-03-12 | Mitsui Toatsu Chem Inc | Production of benzenesulfonamides |
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1990
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JPS6357565A (en) * | 1986-08-27 | 1988-03-12 | Mitsui Toatsu Chem Inc | Production of benzenesulfonamides |
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CN102491924A (en) * | 2011-12-14 | 2012-06-13 | 天津市筠凯化工科技有限公司 | Preparation method for N-(2- chlorine-4-phenyl)-4- chlorine-3-trifluoromethyl benzene sulfonamide |
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