JPH0413658U - - Google Patents
Info
- Publication number
- JPH0413658U JPH0413658U JP5502890U JP5502890U JPH0413658U JP H0413658 U JPH0413658 U JP H0413658U JP 5502890 U JP5502890 U JP 5502890U JP 5502890 U JP5502890 U JP 5502890U JP H0413658 U JPH0413658 U JP H0413658U
- Authority
- JP
- Japan
- Prior art keywords
- sealing member
- cooling gas
- processing apparatus
- gas passage
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000112 cooling gas Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims 3
- 239000007789 gas Substances 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図は本案装置の概略縦断面図、第２図は本
案装置の要部拡大縦断面半截図、第３図は他の実
施例を示す要部縦断面図、第４図は他の実施例を
示す要部縦断面半截図、第５図は従来装置の概略
縦断面図、第６図は従来装置の要部縦断面図、第
７図は他の従来装置の要部縦断面図である。
１ａ……ガス導入管、１ｃ……冷却ガス通流路
、１ｄ……ガス吐出孔、２……ガス出口、３１…
…プラズマ生成室、３３……導波管、３６……窓
材、４０……Ｏリング、４１……冷却水路。
Fig. 1 is a schematic longitudinal cross-sectional view of the proposed device, Fig. 2 is an enlarged vertical cross-sectional half-sectional view of the main part of the proposed device, Fig. 3 is a longitudinal cross-sectional view of the main part showing another embodiment, and Fig. 4 is another embodiment. FIG. 5 is a schematic vertical cross-sectional view of a conventional device, FIG. 6 is a vertical cross-sectional view of a principal portion of a conventional device, and FIG. 7 is a vertical cross-sectional view of a principal portion of another conventional device. be. 1a...Gas introduction pipe, 1c...Cooling gas passage, 1d...Gas discharge hole, 2...Gas outlet, 31...
...Plasma generation chamber, 33... Waveguide, 36... Window material, 40... O ring, 41... Cooling water channel.
Claims (1)
れたプラズマ生成室を有するプラズマプロセス装
置において、 前記シール部材に沿つて設けられた冷却ガス通
流路と、 該シール部材近傍に冷却ガスを吐出させるよう
に該冷却ガス通流路に連結された吐出孔と を具備することを特徴とするプラズマプロセス装
置。[Claims for Utility Model Registration] A plasma processing apparatus having a plasma generation chamber whose opening is sealed by a window material through a sealing member, comprising: a cooling gas passage provided along the sealing member; A plasma processing apparatus comprising: a discharge hole connected to the cooling gas passage so as to discharge cooling gas near the sealing member.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5502890U JPH0413658U (en) | 1990-05-25 | 1990-05-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5502890U JPH0413658U (en) | 1990-05-25 | 1990-05-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0413658U true JPH0413658U (en) | 1992-02-04 |
Family
ID=31577617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5502890U Pending JPH0413658U (en) | 1990-05-25 | 1990-05-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0413658U (en) |
-
1990
- 1990-05-25 JP JP5502890U patent/JPH0413658U/ja active Pending
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