JPH04118945U - Vacuum chuck for polishing - Google Patents
Vacuum chuck for polishingInfo
- Publication number
- JPH04118945U JPH04118945U JP3040591U JP3040591U JPH04118945U JP H04118945 U JPH04118945 U JP H04118945U JP 3040591 U JP3040591 U JP 3040591U JP 3040591 U JP3040591 U JP 3040591U JP H04118945 U JPH04118945 U JP H04118945U
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- vacuum chuck
- suction
- retainer
- specific gravity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 22
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000000853 adhesive Substances 0.000 claims abstract description 6
- 230000001070 adhesive effect Effects 0.000 claims abstract description 6
- 239000000945 filler Substances 0.000 claims abstract description 6
- 239000011347 resin Substances 0.000 claims abstract description 6
- 229920005989 resin Polymers 0.000 claims abstract description 6
- 230000005484 gravity Effects 0.000 claims description 13
- 239000003575 carbonaceous material Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 abstract description 19
- 238000007517 polishing process Methods 0.000 abstract description 10
- 239000003082 abrasive agent Substances 0.000 abstract description 6
- 239000011148 porous material Substances 0.000 description 6
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229920001568 phenolic resin Polymers 0.000 description 5
- 239000005011 phenolic resin Substances 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 238000005087 graphitization Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000004801 process automation Methods 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Jigs For Machine Tools (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
(57)【要約】 （修正有）
【目的】 校正工程、研磨工程とも同一の研磨材を利用
でき、研磨作業を容易にし、かつ工程の自動化を可能に
した研磨用バキュームチャックを提供する。
【構成】 吸引孔４を有するリテーナー部２に吸引部３
が内接された研磨用バキュームチャック１において、リ
テーナー部２がカサ比重１．７以上の緻密質カーボン材
料からなり、また吸引部３はカサ比重０．７〜１．０の
多孔質カーボン材料で各々構成され、かつ該リテーナー
部２と吸引部３との接触面４をカーボンフィラー混入樹
脂接着剤５で固着してなる研磨用バキュームチャック。
(57) [Summary] (with amendments) [Purpose] To provide a vacuum chuck for polishing that can use the same abrasive material in both the calibration process and the polishing process, facilitates the polishing work, and enables automation of the process. [Configuration] A suction part 3 is attached to a retainer part 2 having a suction hole 4.
In the polishing vacuum chuck 1 in which a A vacuum chuck for polishing in which the contact surface 4 between the retainer part 2 and the suction part 3 is fixed with a carbon filler-containing resin adhesive 5.
Description
【０００１】0001
本考案は、シリコンウエハー等の金属製薄板またはセラミック製薄板の研磨に 用いる研磨用バキュームチャックに関する。 This invention is suitable for polishing thin metal plates such as silicon wafers or thin ceramic plates. This invention relates to a polishing vacuum chuck to be used.
【０００２】0002
従来より、シリコンウエハー等の金属製薄板またはセラミック製薄板を研磨す るには、各部がセラミック製のバキュームチャックが用いられている。 Traditionally, metal thin plates such as silicon wafers or ceramic thin plates have been polished. To do this, a vacuum chuck with all parts made of ceramic is used.
【０００３】 従来のバキュームチャックでの研磨方法は、まず、バキュームチャックの表面 を研磨し（校正工程、図３）、次いで、該表面に被研磨板を載せ、吸引孔より− １００〜６００ｍｍＨｇで吸引して被研磨板を固着し、研磨作業を行なう（研磨 工程、図４）。また、必要に応じて、吸引孔より加圧水を挿入し洗浄する工程を 加える（洗浄工程、図５）。0003 The conventional method of polishing a vacuum chuck is to first polish the surface of the vacuum chuck. (calibration process, Fig. 3), then place the plate to be polished on the surface and - from the suction hole. The plate to be polished is fixed by suction at 100 to 600 mmHg, and the polishing work is performed (polishing process, Figure 4). In addition, if necessary, a process of inserting pressurized water through the suction hole for cleaning can be performed. (Washing step, Figure 5).
【０００４】 このように研磨作業は、校正工程を行ない、次いで研磨工程を２〜３回、さら に研磨板を交換して、再び校正工程というようにこれらの工程が繰り返される。0004 In this way, the polishing process involves performing a calibration process, then repeating the polishing process 2 to 3 times, and then repeating the process again. These steps are repeated by replacing the polishing plate and repeating the calibration process.
【０００５】[0005]
しかし、従来のバキュームチャックは、各部材がセラミック製のため、粗研磨 （例えば、砥石加工の場合、＃３００〜４００）を行なう校正工程と、細研磨（ 例えば、砥石加工の場合＃４０００〜８０００）を行なう研磨工程では、それぞ れ適応した研磨材を使用しなければならず、粗研磨を行なう校正工程の研磨材で 統一すれば、被研磨板の面精度が悪化し、面にキズが付き、また、細研磨用の研 磨工程の研磨材を用いれば、校正工程の研磨に時間がかかりすぎ、研磨材を工程 ごとに交換する必要があり、作業が煩雑で、また自動化に難があった。 However, in conventional vacuum chucks, each member is made of ceramic, so rough polishing is required. (For example, in the case of whetstone processing, #300-400) and a calibration process that performs fine polishing ( For example, in the polishing process where grindstone #4000 to #8000 is used, each It is necessary to use an abrasive material that is suitable for If they are standardized, the surface precision of the plate to be polished will deteriorate, scratches will occur on the surface, and the polishing process for fine polishing will be difficult. If an abrasive material is used in the polishing process, it will take too much time to polish in the calibration process. It was necessary to replace it every time, which made the work complicated and difficult to automate.
【０００６】 このため、同一の研磨材を利用でき工程の自動化を可能にした研磨方法の開発 が望まれていた。[0006] For this reason, we developed a polishing method that can use the same polishing material and automate the process. was desired.
【０００７】[0007]
そこで、本考案者は、これら前記問題点を解決した研磨方法を提供することを 目的とし鋭意研究を重ねた結果、バキュームチャックのリテーナー部を特定の緻 密質カーボン材料として、また吸引部を特定の多孔質カーボン材料として、これ らをカーボンフィラー混入の樹脂で接着すれば、前記問題点が解決できるとの知 見を得て本考案を完成した。 Therefore, the inventor of the present invention aims to provide a polishing method that solves these problems. As a result of intensive research, we have developed a vacuum chuck retainer with specific precision. This can be used as a dense carbon material or as a specific porous carbon material for the suction part. It is known that the above-mentioned problems can be solved by bonding them with resin containing carbon filler. Based on these findings, we completed the present invention.
【０００８】 つまり、本考案は、吸引孔４を有するリテーナー部２に吸引部３が内接された 研磨用バキュームチャック１において、リテーナー部２がカサ比重１．７以上の 緻密質カーボン材料からなり、また吸引部３はカサ比重０．７〜１．０の多孔質 カーボン材料で各々構成され、かつ該リテーナー部２と吸引部３との接触面をカ ーボンフィラー混入樹脂接着剤で固着してなる研磨用バキュームチャックである 。That is, the present invention provides a polishing vacuum chuck 1 in which a suction part 3 is inscribed in a retainer part 2 having suction holes 4, in which the retainer part 2 is made of a dense carbon material with a bulk specific gravity of 1.7 or more. , and the suction parts 3 are each made of a porous carbon material with a bulk specific gravity of 0.7 to 1.0, and the contact surface between the retainer part 2 and the suction part 3 is fixed with a carbon filler-containing resin adhesive. This is a vacuum chuck for polishing.
【０００９】 以下、本考案の一実施態様を図面に基づいて説明するが、本考案のバキューム チャックの形状等はこれらに限定されるものでない。[0009] Hereinafter, one embodiment of the present invention will be explained based on the drawings. The shape of the chuck is not limited to these.
【００１０】 図１は、本考案のバキュームチャックの断面図、図２は、その底面図を示す。0010 FIG. 1 is a sectional view of the vacuum chuck of the present invention, and FIG. 2 is a bottom view thereof.
【００１１】 本考案のバキュームチャック１は、吸引孔４を有するリテーナー部２に吸引部 ３が内接されており、吸引孔の数は、一又は複数個を適宜設ける。[0011] In the vacuum chuck 1 of the present invention, a suction part 3 is inscribed in a retainer part 2 having suction holes 4, and one or more suction holes are provided as appropriate.
【００１２】 リテーナー部２は、カサ比重１．７以上の極力ポアのない緻密質カーボン材料 を用いることが必要で、特に好ましくは、カサ比重１．７〜２．０で極力ポアの ない特にラバープレスで成形後、焼成，黒鉛化した黒鉛質材料が好ましい。カサ 比重が１．７未満では、吸引時のエアー流入が激しくなりチャック機能が低下し 好ましくない。0012 The retainer part 2 is made of a dense carbon material with a bulk specific gravity of 1.7 or more and as few pores as possible. Particularly preferably, the bulk specific gravity is 1.7 to 2.0 and the pores are as small as possible. In particular, a graphite material formed by molding with a rubber press, firing, and graphitization is preferable. Casa If the specific gravity is less than 1.7, air will flow in heavily during suction and the chuck function will deteriorate. Undesirable.
【００１３】 吸引部３は、カサ比重０．７〜１．０の多孔質カーボン材料で構成する必要が あり、カサ比重０．７未満だと吸引時に粒が破壊されて剥離し、材料の粒の結合 による強度が低下するおそれがあり、また、カサ比重が１．０を越えると吸引が 不十分となりチャック機能が低下するため好ましくない。[0013] The suction part 3 must be made of a porous carbon material with a bulk specific gravity of 0.7 to 1.0. Yes, if the bulk specific gravity is less than 0.7, the particles will be destroyed and peeled off during suction, and the particles of the material will not bond together. In addition, if the bulk specific gravity exceeds 1.0, suction may decrease. This is not preferable because it becomes insufficient and the chuck function deteriorates.
【００１４】 また、多孔質カーボン材料は、上記のカサ比重の範囲でポア孔が平均直径２０ 〜５０μｍであることが好ましく、ポア孔が２０μｍ未満では研磨材の目詰りが 発生しやすく、また５０μｍを越えるとチャツク機能が低下するため好ましくな い。[0014] In addition, the porous carbon material has pores with an average diameter of 20 mm within the above bulk specific gravity range. It is preferable that the diameter is ~50 μm, and if the pore size is less than 20 μm, the abrasive material may become clogged. It is not preferable because it is easy to occur, and if it exceeds 50 μm, the chuck function will deteriorate. stomach.
【００１５】 特に粉末状または球状の不溶融性フェノール樹脂と、粉末状または球状の溶融 性フェノール樹脂とをメカノケミカル法により乾式混合して、不溶融性フェノー ル樹脂の表面を溶融性フェノール樹脂で被覆したのち加圧下で成形、硬化し、つ いで焼成、炭化することによって得られる材料がポアー直径が均一でかつ曲げ強 さが２００〜５５０ｋｇ／ｃｍ2と高強度であり最も好ましい。In particular, a powdered or spherical infusible phenolic resin and a powdered or spherical meltable phenolic resin are dry mixed by a mechanochemical method, and the surface of the infusible phenolic resin is coated with the meltable phenolic resin. The material obtained by molding and hardening under pressure, followed by firing and carbonization is most preferable because it has uniform pore diameter and high bending strength of 200 to 550 kg/cm 2 .
【００１６】 リテーナー部２と吸収部３は内接する接着面を黒鉛粉、カーボンブラック、カ ーボンフアイバー等のカーボンフィラー混入樹脂（例えば、フェノール、エポキ シ樹脂等）の接着剤で固着することによって一体化する。[0016] The retainer part 2 and the absorbent part 3 are coated with graphite powder, carbon black, carbonate, etc. – Carbon filler-containing resins such as carbon fiber (e.g. phenol, epoxy resin) They are integrated by fixing them with adhesive (such as plastic resin, etc.).
【００１７】[0017]
以下、本考案の実施例を説明する。 実施例 １００ｍｍφ×厚さ３０ｍｍの吸引部を、カサ比重０．８、ポア平均直径３０ μｍの多孔質カーボン材料（商品名：ＶＣＰ、日本カーボン株式会社製）で作成 した。 Examples of the present invention will be described below. Example The suction part is 100 mmφ x 30 mm thick, with a bulk specific gravity of 0.8 and an average pore diameter of 30. Created with μm porous carbon material (product name: VCP, manufactured by Nippon Carbon Co., Ltd.) did.
【００１８】 また、吸収孔を３設け、前記吸収部の内接部を有し、外径１４０φ×厚さ６０ ｍｍのリテーナー部を、カサ比重１．９０の緻密質カーボン（商品名：ＥＸ−１ ３、日本カーボン株式会社製）で作成した。[0018] In addition, it has three absorption holes, has an internal part of the absorption part, and has an outer diameter of 140φ and a thickness of 60mm. The retainer part is made of dense carbon (product name: EX-1) with a bulk specific gravity of 1.90. 3, manufactured by Nippon Carbon Co., Ltd.).
【００１９】 次いで、リテーナー部と吸収部の内接面に黒鉛粉混入フェノール樹脂接着剤（ 商品名：ＧＢＴ、日本カーボン株式会社製）で接着し、チャックを形成した。[0019] Next, apply graphite powder-containing phenolic resin adhesive ( (trade name: GBT, manufactured by Nippon Carbon Co., Ltd.) to form a chuck.
【００２０】 得られた製品を砥石＃６０００で校正工程を行ない、被研磨材として、１１０ ｍｍφ×厚み１ｍｍのシリコンウエハーを載せ、−４００ｍｍＨｇで吸引し、校 正工程に用いた砥石＃６０００で研磨した。これらの工程を繰返し、研磨後、被 研磨材を目視にて検査したところ、全く異常もなく、連続使用が可能であること が明かになった。[0020] The obtained product was subjected to a calibration process using a grindstone #6000, and a grinding wheel #110 was used as the material to be polished. Place a silicon wafer of mmφ x 1 mm thickness, vacuum at -400 mmHg, and calibrate. It was polished using the #6000 grindstone used in the normal process. After repeating these steps and polishing, Visual inspection of the abrasive material revealed no abnormalities and can be used continuously. became clear.
【００２１】[0021]
本考案によれば、校正工程、研磨工程とも同一の研磨材を利用でき、研磨作業 を容易にし、かつ工程の自動化を可能にした研磨用バキュームチャックを提供す ることができる。 According to the present invention, the same abrasive material can be used for both the calibration process and the polishing process, and the polishing process We provide vacuum chucks for polishing that facilitate the process and enable process automation. can be done.
【図１】本考案のバキュームチャックの断面図。FIG. 1 is a sectional view of a vacuum chuck of the present invention.
【図２】本考案のバキュームチャックの底面図。FIG. 2 is a bottom view of the vacuum chuck of the present invention.
【図３】従来のバキュームチャックの校正工程を示す断
面図。FIG. 3 is a sectional view showing a calibration process of a conventional vacuum chuck.
【図４】従来のバキュームチャックの研磨工程を示す断
面図。FIG. 4 is a cross-sectional view showing a conventional vacuum chuck polishing process.
【図５】従来のバキュームチャックの洗浄工程を示す断
面図。FIG. 5 is a sectional view showing a cleaning process of a conventional vacuum chuck.
【符号の説明】１ バキュームチャツク ２、２’ リテーナー部 ３、３’ 吸収部 ４ 吸収孔 ５ カーボンフィラー混入樹脂接着剤 ６ 被研磨材[Explanation of symbols] 1 Vacuum chuck 2, 2' Retainer part 3, 3' Absorption part 4 Absorption hole 5 Carbon filler-containing resin adhesive 6 Material to be polished
Claims (1)
３が内接された研磨用バキュームチャック１において、
リテーナー部２がカサ比重１．７以上の緻密質カーボン
材料からなり、また吸引部３はカサ比重０．７〜１．０
の多孔質カーボン材料で各々構成され、かつ該リテーナ
ー部２と吸引部３との接触面をカーボンフィラー混入樹
脂接着剤５で固着してなる研磨用バキュームチャック。1. A polishing vacuum chuck 1 in which a suction part 3 is inscribed in a retainer 2 having a suction hole 4,
The retainer part 2 is made of a dense carbon material with a bulk specific gravity of 1.7 or more, and the suction part 3 is made of a dense carbon material with a bulk specific gravity of 0.7 to 1.0.
The polishing vacuum chuck is made of a porous carbon material, and the contact surface between the retainer part 2 and the suction part 3 is fixed with a carbon filler-containing resin adhesive 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1991030405U JP2577093Y2 (en) | 1991-04-04 | 1991-04-04 | Vacuum chuck for polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1991030405U JP2577093Y2 (en) | 1991-04-04 | 1991-04-04 | Vacuum chuck for polishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04118945U true JPH04118945U (en) | 1992-10-23 |
| JP2577093Y2 JP2577093Y2 (en) | 1998-07-23 |
Family
ID=31914016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1991030405U Expired - Lifetime JP2577093Y2 (en) | 1991-04-04 | 1991-04-04 | Vacuum chuck for polishing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2577093Y2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50121505A (en) * | 1974-03-13 | 1975-09-23 | ||
| JPS61257733A (en) * | 1986-05-21 | 1986-11-15 | Tokuda Seisakusho Ltd | Electrostatic chuck |
| JPH02143131U (en) * | 1989-04-28 | 1990-12-05 |
-
1991
- 1991-04-04 JP JP1991030405U patent/JP2577093Y2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50121505A (en) * | 1974-03-13 | 1975-09-23 | ||
| JPS61257733A (en) * | 1986-05-21 | 1986-11-15 | Tokuda Seisakusho Ltd | Electrostatic chuck |
| JPH02143131U (en) * | 1989-04-28 | 1990-12-05 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2577093Y2 (en) | 1998-07-23 |
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