JPH0393136A - Crt panel - Google Patents

Crt panel

Info

Publication number
JPH0393136A
JPH0393136A JP22869689A JP22869689A JPH0393136A JP H0393136 A JPH0393136 A JP H0393136A JP 22869689 A JP22869689 A JP 22869689A JP 22869689 A JP22869689 A JP 22869689A JP H0393136 A JPH0393136 A JP H0393136A
Authority
JP
Japan
Prior art keywords
film
translucent
pattern
optical multilayer
panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22869689A
Other languages
Japanese (ja)
Inventor
Toku Tsutsugi
筒木 徳
Keiichi Kohama
恵一 小浜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP22869689A priority Critical patent/JPH0393136A/en
Publication of JPH0393136A publication Critical patent/JPH0393136A/en
Pending legal-status Critical Current

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  • Surface Treatment Of Glass (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)

Abstract

PURPOSE:To improve antistatic property and antireflective property and prevent attachment of dust, a fingerprint, etc., by forming a pattern film where a translucent electric conductor portion is installed together with a translucent dielectric portion on the outermost surface of optical multilayer film. CONSTITUTION:The CRT panel is constituted of an optical multilayer film 7 made up of medium refractivity film 2, high refractivity film 3 and low refractivity film 4 on a glass substrate 1 and a pattern film 8 where a translucent electric conductor body portion 5 communicating to the end face from the center on the surface of the optical multilayer 7 is formed like stripes in the silicone film of a translucent dielectric portion 6. In the pattern film 8 formed on the outermost surface, a linear translucent electric conductor portion 5 with a width d and the band-like translucent dielectric portion 6 with a width e are formed like stripes. The translucent electric conductor body is formed of ITO (SnO2-In2O3 at 10wt.%) film and the translucent dielectric portion 6 is formed of dimethyl polysiloxane film 8. It is thereby possible to have antireflective property, antistatic property and antifouling property and also to be used as a panel-face switch.

Description

【発明の詳細な説明】 [産業上の利用分野コ 本発明はコンピュータなどの表示装置として用いられる
CRTの画面を覆うCRTパネルに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a CRT panel that covers the screen of a CRT used as a display device for computers and the like.

[従来の技術] 従来、CRTパネルの表面部での反fJJ紡止性を高め
る方法として、光学多層膜をコーティングしたり、表面
を粗面化する方法が知られている。またパネル表面のチ
ャージアップに起因する手で触れた時の不快感や、ホコ
リの付着を防止するためにパネル外面に導電性を付与し
て帯電防止を図ることも知られている。たとえば、透明
基板上に金属膜を介して特定の2層の低屈折率誘電体膜
を形成して帯電防止機能を有する導電性反則防止膜付着
透明板の開示がある(特開昭64−79041号公報〉
。しかしながら、反射防止性と帯電防止性を性能良くあ
わせもつCRTパネルは、まだ知られていない。
[Prior Art] Conventionally, methods of coating with an optical multilayer film or roughening the surface have been known as methods of increasing anti-fJJ spinning properties on the surface of a CRT panel. It is also known to provide electrical conductivity to the outer surface of the panel to prevent charging, in order to prevent discomfort when touching the panel surface due to charge-up and to prevent dust from adhering to the panel surface. For example, there is a disclosure of a conductive anti-fouling film attached transparent plate having an antistatic function by forming two specific low refractive index dielectric films on a transparent substrate via a metal film (Japanese Patent Laid-Open No. 64-79041). Publication>
. However, a CRT panel that has good antireflection and antistatic properties is not yet known.

さらに近年、パネル面にスイッチ機能を形成したパネル
面スイッチを有するCRTパネルも知られている。
Furthermore, in recent years, CRT panels having panel surface switches in which switch functions are formed on the panel surface have also been known.

[発明が解決しようとする課題] CRTパネルに光学多層膜を用いる場合、最外表面層を
構成する膜材料は、屈折により像に歪みが生じるのを防
止したり、表面での光の反躬により表示が見にくくなる
のを防止するためガラス基板よりも低屈折率をもつ材料
でなければならない。
[Problems to be Solved by the Invention] When using an optical multilayer film in a CRT panel, the film material constituting the outermost surface layer is used to prevent image distortion due to refraction and to prevent light reflection on the surface. In order to prevent the display from becoming difficult to see, the material must have a refractive index lower than that of the glass substrate.

しかし低屈折率で導電性を有する材利は知られていない
However, no material with low refractive index and electrical conductivity is known.

またCRTパネルの最外表面を粗面化したうえで、導電
性材料をコーティングする方法が考えられるが、表面の
粗面化による反射防止性は精々2〜3%程度の向上しか
認められない。さらにコーティングする導電性材料によ
っては、反射率が3%以上に高くなるという問題点を有
する。
Another method is to roughen the outermost surface of the CRT panel and then coat it with a conductive material, but the roughening of the surface can only improve antireflection by about 2 to 3% at most. Furthermore, there is a problem in that the reflectance may be as high as 3% or more depending on the conductive material to be coated.

本発明は上記の事情に鑑みてなされたもので、反射防止
性、帯電防止性、防汚性を備え、パネル面スイッチとし
ても使用できるCRTパネルとすることを目的とする。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a CRT panel that has antireflection properties, antistatic properties, and antifouling properties, and can also be used as a panel surface switch.

[課題を解決するための手段] 本発明のCRTパネルは、ガラス基板と該ガラス基板表
面に形成された光学多層膜とよりなるCRTパネルであ
って、該光学多層膜の最外表面にはストライプ状または
網目状に連続する線状の透光性導電体部と、該透光性導
電体部が形成されていない部分に形成された透光性誘電
体部とよりなるパタン皮膜をもつことを特徴とする。
[Means for Solving the Problems] The CRT panel of the present invention is a CRT panel consisting of a glass substrate and an optical multilayer film formed on the surface of the glass substrate, and the outermost surface of the optical multilayer film has a stripe. A pattern film consisting of a linear light-transmitting conductor portion continuous in a shape or a mesh shape and a light-transmitting dielectric portion formed in a portion where the light-transmitting conductor portion is not formed. Features.

このCRTパネルは、電子ビームを蛍光面にあてて映像
をだしテレビ、コンピューターの表示装置として使用ざ
れる画像表示管である。光学多層膜はその表示画像を見
易くするために、表面の乱反射などを防止するものであ
る。通常屈折率の異なる皮膜を積層して多層膜を形成し
ている。
The CRT panel is an image display tube that produces images by directing electron beams onto a fluorescent screen and is used as a display device for televisions and computers. The optical multilayer film prevents diffused reflection on the surface in order to make the displayed image easier to see. Usually, films with different refractive indexes are stacked to form a multilayer film.

光学多層膜の最外表面に形成ざれるパタン皮膜は、透明
で、導電性を有する透光性導電体部がストライプ状また
は網目状に連続する線状のパタン形状で透光性誘電体部
中に形成されている。その線状のパタン形状としては、
たとえば線状、紐状、格子状、亀甲状の空隙部をもって
連なった線状でCRTパネルの中央部から端部側に連通
した導電経路が形成ざれている。
The patterned film formed on the outermost surface of the optical multilayer film is transparent and has a linear pattern in which the light-transmitting conductor part having electrical conductivity is continuous in a stripe or mesh shape. is formed. As for the linear pattern shape,
For example, conductive paths are formed in the form of linear, string-like, grid-like, or hexagonal-like voids that communicate from the center of the CRT panel to the ends.

この透光性導電体部は、周囲を透光性誘電体部で絶縁ざ
れパネルの表面の導電性を高めて帯電防止性を付与し、
パネル面スイッチのスイッチの回路として利用すること
ができる。この透光性導電体部には、固有抵抗の小ざい
金属、金属の合金または金属酸化物でかつ透光性のもの
で形成される。
This light-transmitting conductor part is surrounded by a light-transmitting dielectric part to increase the conductivity of the surface of the insulation panel and impart antistatic properties.
It can be used as a switch circuit for panel switches. This light-transmitting conductor portion is made of a metal, metal alloy, or metal oxide having a low specific resistance and is light-transmitting.

たとえばITO,It化錫、ALI薄膜などが利用でき
る。なお透光性導電体部の形状で亀甲状の場合は、亀甲
の内部に誘電体部が形成されていることが絶縁性および
透光性を高めるために好ましい。
For example, ITO, It tin oxide, ALI thin film, etc. can be used. Note that when the shape of the transparent conductor part is a hexagonal shell, it is preferable that a dielectric part be formed inside the hexagonal shell in order to improve insulation and translucency.

またこの透光性導電体は透光性誘電部より透明性がやや
低いので占有面積を小さくすることが透明性を高めるた
めに好ましい。
Further, since the transparency of this light-transmitting conductor is slightly lower than that of the light-transmitting dielectric portion, it is preferable to reduce the occupied area in order to improve transparency.

この透光性導電体部の経路が連続して端面に引出ざれて
いるので表面上での静電電位を下げて帯電防止を効果的
におこなうことができる。
Since the path of the light-transmitting conductor portion is continuously drawn out to the end face, the electrostatic potential on the surface can be lowered and charging can be effectively prevented.

透光性誘電体部は、シリコーン皮膜で溌水性、防汚性を
有し表面へのホコリや指紋などの付着を阻止するととも
に反射防止性、透過性をもち絶縁性を示す。この透光性
,ltli体部としては、シロキサン系のジメチルボリ
シロキサン、フエニルメチルボリシロキサン、フッ化ア
ルキルメチルボリシロキサン、シアノアルキルメチルボ
リシロキサンなどのシリコーン皮膜で前記の透光性導電
体部が形成されていない部分を埋めてパタンか形威され
る。そしてこの透光性誘電体部の膜厚は、透光性導電体
部の膜厚より薄くすることでパネル表面に凹凸を形成し
て粗面化することができるとともに導電性を高め、反銅
防止性や帯電防止性および防汚性を一層向上できるので
好ましい。この透光性誘電体部と透光性導電体部の膜厚
の差は、2倍以上であることが上記の防止効果を高める
ために好ましい。
The light-transmitting dielectric part is a silicone film that has water repellency and stain resistance, prevents dust and fingerprints from adhering to the surface, and also has antireflection properties, transparency, and insulating properties. This light-transmitting conductor part is made of a silicone film such as siloxane-based dimethylborisiloxane, phenylmethylborisiloxane, fluorinated alkylmethylborisiloxane, or cyanoalkylmethylborisiloxane. A pattern or shape is created by filling in the unformed parts. By making the film thickness of this light-transmitting dielectric part thinner than that of the light-transmitting conductor part, it is possible to form irregularities on the panel surface to make it rough, and to increase conductivity. It is preferable because it can further improve the preventive properties, antistatic properties, and antifouling properties. It is preferable that the difference in film thickness between the light-transmitting dielectric portion and the light-transmitting conductor portion be at least twice as large in order to enhance the above-mentioned prevention effect.

このパタン皮膜は、光学多層膜の上にまず透光性誘電体
部のシリコーン皮膜を全面に形成した後、エッチングに
より所定のパタンを形戒して透光性導電体部をそのパタ
ン上に形成するか、逆に透光性導電体部のパタンを形成
した後でシリコーン皮膜を塗布して形成することができ
る。
This pattern film is made by first forming a silicone film of a transparent dielectric part on the entire surface of the optical multilayer film, then etching it to form a predetermined pattern, and forming a transparent conductor part on the pattern. Alternatively, conversely, the silicone film can be formed by forming the pattern of the light-transmitting conductor part and then applying the silicone film.

[作用] このCRTパネルは、最外表向に透光性導電体部と透光
性誘電体部が併設されて形成ざれたパタン皮膜をもつ。
[Function] This CRT panel has a patterned film in which a light-transmitting conductor portion and a light-transmitting dielectric portion are provided side by side on the outermost surface.

この透光性導電体部がCRTパネルの表面に帯電する静
電気を導電性を利用して外部に除去し、透光性誘電体部
はシリコーン皮膜の特性によりCRTパネルの表面の透
過性、反則防止性および防汚性を付与してパネルの表示
を見易くする。ざらに透光性導電体部の導電性を利用し
てパネル面スイッチを形成することができる。
This light-transmitting conductor part uses conductivity to remove static electricity that accumulates on the surface of the CRT panel to the outside, and the light-transmitting dielectric part improves the transparency of the surface of the CRT panel and prevents fouling due to the characteristics of the silicone film. To make the display on the panel easier to read by imparting anti-fouling properties and antifouling properties. A panel surface switch can be formed by roughly utilizing the conductivity of the transparent conductor portion.

[実施例] 以下実施例により具体的に説明する。[Example] This will be explained in detail below using examples.

このCRTパネルは、第1図の断面模式図に示すように
ガラス基板1の表面に中屈折率膜2、次いで高屈折率I
I3、低屈折率膜4からなる光学多層膜7と、光学多層
膜7の表面に中央から端面に連通ずる透光性導電体部5
が透光性誘電体部6のシリコーン膜中にストライプ状に
形成されたパタン皮膜8とで構或されている。
As shown in the cross-sectional schematic diagram of FIG.
I3, an optical multilayer film 7 consisting of a low refractive index film 4, and a transparent conductor portion 5 on the surface of the optical multilayer film 7 that communicates from the center to the end surface.
The pattern film 8 is formed in a stripe shape in the silicone film of the light-transmitting dielectric part 6.

光学多層膜7は、ガラス基板1側より膜厚83nmの中
屈折率(n=1.65)のアルミナ皮膜2、膜厚110
nmの高屈折率(n=2.50>の酸化チタン皮膜3、
膜厚B5nmの低屈折率(n=1.45)の二酸化珪素
皮膜4とからなる。
The optical multilayer film 7 includes an alumina film 2 with a medium refractive index (n=1.65) with a film thickness of 83 nm and a film thickness of 110 nm from the glass substrate 1 side.
titanium oxide film 3 with a high refractive index of nm (n=2.50>
It consists of a silicon dioxide film 4 with a film thickness B of 5 nm and a low refractive index (n=1.45).

なお上記の光学多層膜7は、イオンプレーテイング装置
で550/4nの式(nは材料の屈折率である〉に基づ
き算出した膜厚にそれぞれ成膜した。但し酸化チタン皮
膜3は550/2nで算出し、二酸化珪素皮膜4はシリ
コーン皮膜6の膜厚分の10nm分差し引いた膜厚とし
た。
The above optical multilayer film 7 was formed using an ion plating apparatus to a film thickness calculated based on the formula 550/4n (n is the refractive index of the material). However, the titanium oxide film 3 was formed with a film thickness of 550/2n. The thickness of the silicon dioxide film 4 was obtained by subtracting 10 nm from the thickness of the silicone film 6.

最外表面に形成ざれたパタン皮膜8は、第2図の部分拡
大模式的斜視図に示す様に線状(幅d)の透光性導電体
部5と帯状(幅e)の透光性誘電体部6がストライプ状
に形成されている。
The pattern film 8 formed on the outermost surface has a linear (width d) translucent conductor portion 5 and a band-shaped (width e) translucent conductor portion 5, as shown in the partially enlarged schematic perspective view of FIG. The dielectric portion 6 is formed in a stripe shape.

透光性導電体部5は膜厚34nm、線幅dが0.1II
IIのITO(10重量%のSn02−IrlzOx)
Illで、透光性誘電体部6は膜厚10nmで帯状幅e
が0.9mのジメチルポリシロキサン皮膜8で形成され
ている。
The transparent conductor portion 5 has a film thickness of 34 nm and a line width d of 0.1II.
II ITO (10 wt% Sn02-IrlzOx)
In Ill, the transparent dielectric portion 6 has a film thickness of 10 nm and a strip width e.
is formed of a 0.9 m dimethylpolysiloxane film 8.

パタン皮膜8の成膜には、イオンプレーティング装置で
まず酸素分圧4.OX10− 2Pa,高周波電力30
0W,直流電圧500Vの条件で光学多層膜7上の全面
にITO膜を成膜した。このITO膜を第2図に示すス
トライプ状のパタン形状にプラズマエッチングをおこな
った(アルゴン導入圧3.Ox10− ’ Pa、高周
波電力300W〉。第3図にその断面模式図を示す。I
TO膜を所定のパタンにエッチングした後、5重量%の
ボリジメチルシロキサンを溶解したn−へキサン溶液を
表面に塗布した。塗布後60〜70℃で20分乾燥した
後、300℃で20分の焼付けをおこなって透光性誘電
体部6のシリコーン皮膜を形成した。このシリコーン皮
膜は低屈折率膜の二酸化珪素皮膜4と接着して密着性は
良好であった。
To form the patterned film 8, first use an ion plating device at an oxygen partial pressure of 4. OX10-2Pa, high frequency power 30
An ITO film was formed on the entire surface of the optical multilayer film 7 under conditions of 0 W and a DC voltage of 500 V. This ITO film was subjected to plasma etching into the striped pattern shown in Fig. 2 (argon introduction pressure 3.Ox10-' Pa, high frequency power 300 W). Fig. 3 shows a schematic cross-sectional view of the ITO film.
After etching the TO film into a predetermined pattern, an n-hexane solution containing 5% by weight of boridimethylsiloxane was applied to the surface. After coating, it was dried at 60 to 70°C for 20 minutes, and then baked at 300°C for 20 minutes to form a silicone film of the transparent dielectric portion 6. This silicone film adhered to the silicon dioxide film 4, which was a low refractive index film, and had good adhesion.

このシリ]一ン皮膜を酸エッチングして透光性導電体部
5上のシリコーン皮膜を除去して第1図に示すCRTパ
ネルを作製した。
This silicone film was acid-etched to remove the silicone film on the transparent conductor portion 5, thereby producing the CRT panel shown in FIG.

(実施例2〉 このCRTパネルは,実施例1の場合と同様の構成でた
だ最外表面のパタン皮1119のパタン形状を亀甲状の
網目状としたものである。第4図にそのパタン形状の部
分拡大模式図を示す。
(Example 2) This CRT panel has the same configuration as in Example 1, except that the pattern shape of the pattern skin 1119 on the outermost surface is a hexagonal mesh. A partially enlarged schematic diagram is shown.

このパタン皮1119は、光学多層WA7の上全面にま
ず実施例1のジメチルボリシロキサンの溶液を塗布して
焼付けて透光性誘電体部6のシリコーン皮膜を形成した
。このシリ」一ン皮膜の膜厚はIQnmとした。次いで
第4図に示す亀甲状のパタンを酸によるエッチングでシ
リコーンを除去して形成した。シリコーン皮膜の幅<a
>は0.9Nn、透光性導電体部5の線幅(b)は0.
1%とした。
This pattern skin 1119 was obtained by first applying the dimethylbolysiloxane solution of Example 1 to the entire upper surface of the optical multilayer WA7 and baking it to form a silicone film of the light-transmitting dielectric portion 6. The film thickness of this silicone film was set to IQ nm. Next, the silicone was removed by acid etching to form a hexagonal pattern shown in FIG. Width of silicone film <a
> is 0.9Nn, and the line width (b) of the transparent conductor portion 5 is 0.9Nn.
It was set at 1%.

その断面模式図を第5図に示す。A schematic cross-sectional view is shown in FIG.

引き続き、イオンプレーティング装置によりIToを膜
厚34nmに或膜して透光性導電体部5を形成した。
Subsequently, ITo was deposited to a thickness of 34 nm using an ion plating device to form a transparent conductor portion 5.

このITO皮膜をイソプロビルアルコールを含んだガー
ゼで軽く表面を拭きこすると、シリ」一ン皮膜上に積層
されたITOは除去され第4図の亀甲状のパタンをもつ
パタン皮膜8が形成できた。
When the surface of this ITO film was lightly wiped with gauze containing isopropyl alcohol, the ITO layered on the silicone film was removed and a patterned film 8 having a hexagonal pattern as shown in Fig. 4 was formed. .

このITO膜は二酸化珪素皮膜4との密着性は良好であ
った。
This ITO film had good adhesion to the silicon dioxide film 4.

(実施例3) この場合もパタン皮膜10のパタンを変え第6図に示す
パネル面スイッチとなるパタン形状とした以外は実施例
1と同じ構或のC.RTバネルである。すなわち、第6
図に示す1ブロックのパタンの喘部に電極をf,gまた
はh,i状に設け、そのパネル面上の静電容量の変化を
測定して指が触れたかどうかを検出してスイッチを作動
させるパネル面スイッチを形成した。
(Example 3) In this case as well, a C.I.C. This is an RT panel. That is, the sixth
Electrodes are placed in the shape of f, g or h, i on the pane of the one block pattern shown in the figure, and the switch is activated by measuring the change in capacitance on the panel surface and detecting whether it is touched by a finger. We have created a panel surface switch that allows you to

このパタン皮膜10は、第7図に第6図の電極f.q部
分の拡大模式図に示すように透光性導電体をストライプ
を亀甲状の空隙部をもつ形状で形成し、かつ端部が両端
部に連通しない櫛歯状のパタン形状で、その両端に電極
が形成ざれる構成となっている。
This pattern film 10 is shown in FIG. 7 as shown in FIG. As shown in the enlarged schematic diagram of part q, the transparent conductor is formed into a stripe shape with a tortoise-shell-shaped void, and the end part is a comb-like pattern shape that does not communicate with both ends. The structure is such that no electrodes are formed.

このパタン皮膜10の製造は、先ず実施例2の場合と同
様にシリコーン皮膜を光学多層膜7の上に全面に或膜し
た後、エッチングにより第7図に示すi歯形状のパタン
を形成した。以後は実施例2の場合と同様な処理をおこ
なってパタン皮膜10を形成した。このCRTパネルは
、面スイッチとして使用に耐える作動性を示した。
The pattern film 10 was manufactured by first coating the entire surface of the optical multilayer film 7 with a silicone film in the same manner as in Example 2, and then etching to form the i-tooth-shaped pattern shown in FIG. Thereafter, the same treatment as in Example 2 was performed to form the pattern film 10. This CRT panel exhibited operability sufficient to be used as a surface switch.

(評価結果) 実施例1において透光性導電体部5の線幅d、透光性誘
電体部6の幅eを変化させた時の分光光度計(光路径1
0φm>による反剣率と透過率の測定結果を表1に示す
(Evaluation Results) In Example 1, when the line width d of the transparent conductor part 5 and the width e of the transparent dielectric part 6 were changed, the spectrophotometer (optical path diameter 1
Table 1 shows the measurement results of anti-sword rate and transmittance using 0φm>.

CRTパネル表面の反射率が通常ガラスでは約第 1 表 8%であるのに対して本実施例では2%以下であり反射
防止性が著しく向上した。また透過率も85%以上あり
透明性もほとんど低下していない。
While the reflectance of the surface of a CRT panel is about 8% for ordinary glass, it was less than 2% in this example, and the antireflection properties were significantly improved. Furthermore, the transmittance was 85% or more, and the transparency was hardly decreased.

さらに表面電位と時閤との関係においても第8図のグラ
フに示すように電位の低下時間が短く?!電防止効果が
向上した。なお、透光性導電体部5の幅dを広げ透光性
誘電体部6の幅eを狭めると第1表の2に示すように反
射率および透過率がやや低下する。これは透光性導電体
部5は膜厚が厚いことおよび屈折率が光学多層膜の最表
面と異なることなるため透光性誘電体部6より透過性が
低くなる。従って、透光性導電体部5の線幅dを広くす
るには限度があることを示唆している。
Furthermore, regarding the relationship between surface potential and time difference, as shown in the graph of Figure 8, the potential drop time is short. ! Improved anti-static effect. Note that when the width d of the light-transmitting conductor portion 5 is widened and the width e of the light-transmitting dielectric portion 6 is narrowed, the reflectance and transmittance decrease slightly as shown in 2 of Table 1. This is because the transparent conductor portion 5 has a thick film thickness and has a refractive index different from that of the outermost surface of the optical multilayer film, so that its transmittance is lower than that of the transparent dielectric portion 6. This suggests that there is a limit to increasing the line width d of the transparent conductor portion 5.

実施例2のCRTパネルについても同様に反躬第2表 率、透過率、表面電位と時間との関係の測定をおこなっ
た。結果を第2表および第8図に示す。実施例1に比べ
て反則率と透過率はやや低下しているが使用上特に問題
になる程度ではない。また表面電位の低下の速度は実施
例1と同じであった。
Regarding the CRT panel of Example 2, the relationship between the reflection rate, transmittance, and surface potential versus time was similarly measured. The results are shown in Table 2 and Figure 8. Although the fouling rate and transmittance are slightly lower than those in Example 1, they are not at a level that poses a particular problem in use. Further, the rate of decrease in surface potential was the same as in Example 1.

またシリコーン皮膜6と透光性導電体部5との膜厚差に
より表面の凹凸、粗面化が図られ反射防止効果が一層向
上した。透光性導電体部5の膜厚が透光性誘電体部6よ
り大きいことで表面に突出しているため静電気の除去効
果を高めることができる。
Furthermore, the difference in film thickness between the silicone film 6 and the transparent conductor portion 5 makes the surface uneven and rough, further improving the antireflection effect. Since the film thickness of the transparent conductor part 5 is larger than that of the transparent dielectric part 6 and it protrudes from the surface, the effect of removing static electricity can be enhanced.

[効果] 本発明のCRTパネルは上記のように光学多層膜の最外
表面に透光性導電体部と透光性誘電体部が併設されたパ
タン皮膜を形成している。このパタン皮膜が帯電防止性
、反射防止性を高め、ホコリや指紋等の付着を防ぎ、表
面のチ7−ジアップに起因する手に触れたときの不快感
が解消できる。
[Effects] As described above, in the CRT panel of the present invention, a pattern film in which a light-transmitting conductor portion and a light-transmitting dielectric portion are provided is formed on the outermost surface of the optical multilayer film. This pattern film improves antistatic properties and antireflection properties, prevents the adhesion of dust, fingerprints, etc., and eliminates the discomfort caused by surface scratches when touched.

すなわち、透光性導電体部が表面の電位を逃がして帯電
防止性を高め、透光性誘電体部のシロキサン皮膜が反射
防止性、防汚性を高めるため両者の機能を同時に発揮さ
せることができる。また透光性導電体部を利用してパネ
ル面スイッチを形成することもできる。
In other words, the light-transmitting conductor part dissipates the surface potential and improves antistatic properties, and the siloxane film on the light-transmitting dielectric part enhances anti-reflection and antifouling properties, making it possible to exhibit both functions at the same time. can. Furthermore, a panel surface switch can also be formed using the transparent conductor portion.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は実施例1のCRTパネルの断面模式図であり、
第2図はパタン皮膜の部分拡大模式図であり、第3図は
実施例1の透光性導電体部を形成した状態を示す断面模
式図であり、第4図は実施例2のパタン皮膜の部分拡大
模式図であり、第5図は実施例2の透光性誘電体部を形
成した状態を示す断面模式図であり、第6図は実施例3
のパタン皮膜の模式図であり、第7図は第6図の透光性
導電体部の部分拡大模式図であり、第8図はパネル表面
の表面電位と時間の関係を示すグラフである。 1・・・ガラス基板  5・・・透光性導電体部6・・
・透光性誘電体部 7・・・光学多層膜8、9、10・
・・パタン皮膜
FIG. 1 is a schematic cross-sectional view of the CRT panel of Example 1,
FIG. 2 is a partially enlarged schematic diagram of the pattern film, FIG. 3 is a cross-sectional schematic diagram showing the state in which the transparent conductor portion of Example 1 is formed, and FIG. 4 is the pattern film of Example 2. FIG. 5 is a schematic cross-sectional view showing a state in which the transparent dielectric portion of Example 2 is formed, and FIG. 6 is a schematic cross-sectional view of Example 3.
FIG. 7 is a partially enlarged schematic diagram of the transparent conductor portion of FIG. 6, and FIG. 8 is a graph showing the relationship between the surface potential of the panel surface and time. 1...Glass substrate 5...Transparent conductor part 6...
・Transparent dielectric part 7...optical multilayer film 8, 9, 10・
・Pattern film

Claims (1)

【特許請求の範囲】[Claims] (1)ガラス基板と該ガラス基板表面に形成された光学
多層膜とよりなるCRTパネルであって、該光学多層膜
の最外表面にはストライプ状または網目状に連続する線
状の透光性導電体部と、該透光性導電体部が形成されて
いない部分に形成された透光性誘電体部とよりなるパタ
ン皮膜をもつことを特徴とするCRTパネル。
(1) A CRT panel consisting of a glass substrate and an optical multilayer film formed on the surface of the glass substrate, in which the outermost surface of the optical multilayer film has a linear transmissive property continuous in a stripe or mesh pattern. A CRT panel characterized by having a patterned film consisting of a conductive portion and a transparent dielectric portion formed in a portion where the transparent conductive portion is not formed.
JP22869689A 1989-09-04 1989-09-04 Crt panel Pending JPH0393136A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22869689A JPH0393136A (en) 1989-09-04 1989-09-04 Crt panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22869689A JPH0393136A (en) 1989-09-04 1989-09-04 Crt panel

Publications (1)

Publication Number Publication Date
JPH0393136A true JPH0393136A (en) 1991-04-18

Family

ID=16880369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22869689A Pending JPH0393136A (en) 1989-09-04 1989-09-04 Crt panel

Country Status (1)

Country Link
JP (1) JPH0393136A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6268704B1 (en) 1997-02-12 2001-07-31 Hitachi, Ltd Color cathode ray tube equipped with field leak preventing coating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6268704B1 (en) 1997-02-12 2001-07-31 Hitachi, Ltd Color cathode ray tube equipped with field leak preventing coating
US6348770B1 (en) 1997-02-12 2002-02-19 Hitachi, Ltd. Color cathode ray tube equipped with field leak preventing coating

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