JPH0389166U - - Google Patents
Info
- Publication number
- JPH0389166U JPH0389166U JP14878989U JP14878989U JPH0389166U JP H0389166 U JPH0389166 U JP H0389166U JP 14878989 U JP14878989 U JP 14878989U JP 14878989 U JP14878989 U JP 14878989U JP H0389166 U JPH0389166 U JP H0389166U
- Authority
- JP
- Japan
- Prior art keywords
- wall
- liquid supply
- large number
- electrolytic
- electrolytic cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 8
- 238000005363 electrowinning Methods 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 238000007670 refining Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
Landscapes
- Electrolytic Production Of Metals (AREA)
Description
第１図は、本考案電解槽の一実施例を示す斜視
図、第２図は、電解槽短辺側断面として示す本考
案電解槽例の説明図、第３図は、本考案電解槽の
給液側内壁の一実施例を示す説明図、第４図は、
本考案電解槽の排液側内壁の一実施例を示す説明
図である。
１……電解槽、３，７……長手方向側壁、５…
…アノード、９……カソード、１０……電解液供
給管、１１……給液側内壁、１２……給液穴、１
３……隔壁、１５……排液側内壁、１６……排液
穴、１７……下部排出穴、１８……集合排液管、
２０……沈降物排出管。
Fig. 1 is a perspective view showing an embodiment of the electrolytic cell of the present invention, Fig. 2 is an explanatory diagram of an example of the electrolytic cell of the present invention shown as a cross section on the short side of the electrolytic cell, and Fig. 3 is an illustration of the electrolytic cell of the present invention. FIG. 4 is an explanatory diagram showing an example of the inner wall on the liquid supply side.
FIG. 2 is an explanatory diagram showing an embodiment of the drain-side inner wall of the electrolytic cell of the present invention. 1... Electrolytic cell, 3, 7... Longitudinal side wall, 5...
... Anode, 9 ... Cathode, 10 ... Electrolyte supply pipe, 11 ... Liquid supply side inner wall, 12 ... Liquid supply hole, 1
3... Partition wall, 15... Drain side inner wall, 16... Drain hole, 17... Lower drain hole, 18... Collection drain pipe,
20...Sediment discharge pipe.
Claims (1)
して設置されたアノード５及びカソード９それぞ
れの面に直交する側の電解槽１の側壁３，７のそ
れぞれの内側に、間隔をおいて給液側内壁１１及
び排液側内壁１５を設け、給液側内壁１１に多数
の給液穴１２を設け、排液側内壁１５に給液穴１
２に対向して多数の排液穴１６を設けてなる高純
度金属製造用電解層。 In an electrolytic cell for electrolytic refining or electrowinning, a liquid supply side is provided at intervals on the inside of each of the side walls 3, 7 of the electrolytic cell 1 on the side perpendicular to the respective surfaces of the anode 5 and cathode 9 installed in parallel. An inner wall 11 and a drain side inner wall 15 are provided, a large number of liquid supply holes 12 are provided in the liquid supply side inner wall 11, and a large number of liquid supply holes 1 are provided in the liquid drain side inner wall 15.
An electrolytic layer for producing high-purity metals, which is provided with a large number of drainage holes 16 opposite to the electrolytic layer 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14878989U JPH0389166U (en) | 1989-12-25 | 1989-12-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14878989U JPH0389166U (en) | 1989-12-25 | 1989-12-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0389166U true JPH0389166U (en) | 1991-09-11 |
Family
ID=31695223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14878989U Pending JPH0389166U (en) | 1989-12-25 | 1989-12-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0389166U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010537051A (en) * | 2007-08-27 | 2010-12-02 | メットトップ ゲーエムベーハー | How to operate a copper electrolytic cell |
| JP2013036074A (en) * | 2011-08-05 | 2013-02-21 | Jx Nippon Mining & Metals Corp | Method of producing indium hydroxide and compound including indium hydroxide |
| JP2014208871A (en) * | 2013-03-25 | 2014-11-06 | 住友金属鉱山株式会社 | Anode and method of producing the same |
| JP2016033242A (en) * | 2014-07-31 | 2016-03-10 | 佐々木半田工業株式会社 | High-current-density electrolytic refining method of tin |
| JP2016117928A (en) * | 2014-12-19 | 2016-06-30 | 住友金属鉱山株式会社 | Electrolytic device for indium hydroxide powder or tin hydroxide powder, method for producing indium hydroxide powder or tin hydroxide powder, and method for producing sputtering target |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60121292A (en) * | 1983-11-08 | 1985-06-28 | バルター ホルツアー | Method and apparatus for separating copper, for example, from electrolytic bath |
-
1989
- 1989-12-25 JP JP14878989U patent/JPH0389166U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60121292A (en) * | 1983-11-08 | 1985-06-28 | バルター ホルツアー | Method and apparatus for separating copper, for example, from electrolytic bath |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010537051A (en) * | 2007-08-27 | 2010-12-02 | メットトップ ゲーエムベーハー | How to operate a copper electrolytic cell |
| JP2013036074A (en) * | 2011-08-05 | 2013-02-21 | Jx Nippon Mining & Metals Corp | Method of producing indium hydroxide and compound including indium hydroxide |
| JP2014208871A (en) * | 2013-03-25 | 2014-11-06 | 住友金属鉱山株式会社 | Anode and method of producing the same |
| WO2015022846A1 (en) * | 2013-08-13 | 2015-02-19 | 住友金属鉱山株式会社 | Anode and method for manufacturing same |
| JP2016033242A (en) * | 2014-07-31 | 2016-03-10 | 佐々木半田工業株式会社 | High-current-density electrolytic refining method of tin |
| JP2016117928A (en) * | 2014-12-19 | 2016-06-30 | 住友金属鉱山株式会社 | Electrolytic device for indium hydroxide powder or tin hydroxide powder, method for producing indium hydroxide powder or tin hydroxide powder, and method for producing sputtering target |
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